CN108379994B - Denitration method for industrial waste cracking incineration tail gas - Google Patents
Denitration method for industrial waste cracking incineration tail gas Download PDFInfo
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- CN108379994B CN108379994B CN201810235390.9A CN201810235390A CN108379994B CN 108379994 B CN108379994 B CN 108379994B CN 201810235390 A CN201810235390 A CN 201810235390A CN 108379994 B CN108379994 B CN 108379994B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/007—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/76—Gas phase processes, e.g. by using aerosols
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/02—Particle separators, e.g. dust precipitators, having hollow filters made of flexible material
- B01D46/023—Pockets filters, i.e. multiple bag filters mounted on a common frame
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/54—Nitrogen compounds
- B01D53/56—Nitrogen oxides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/40—Nitrogen compounds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0283—Flue gases
- B01D2258/0291—Flue gases from waste incineration plants
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/808—Laser
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Abstract
The invention discloses a denitration method for industrial waste cracking incineration tail gas, wherein the tail gas sequentially passes through a gas overheat protector, a thermal gas mass flow meter, a mixed gas flow regulating valve, a bag-type dust remover, a semiconductor pump rubidium steam laser array decomposition reactor, a flue gas cooling system and an exhaust fan. The method creatively utilizes the high energy of the rubidium steam laser, electrons in nitrogen oxide molecules in the waste gas are bombarded by high-energy photons of the rubidium laser and undergo energy level transition under the direct irradiation of the rubidium laser, so that the strength of N-O bonds in the nitrogen oxide molecules is gradually weakened, and finally bond breaking and dissociation occur to decompose the nitrogen oxide molecules into harmless nitrogen and oxygen.
Description
Technical Field
The invention relates to a denitration method for industrial waste cracking incineration tail gas, and belongs to the field of waste gas treatment in environmental protection.
Background
Nitrogen Oxides (Nitrogen Oxides) are a major pollutant in the atmospheric environment, and include various compounds, such as Nitrogen dioxide, Nitrogen monoxide, dinitrogen oxide, dinitrogen trioxide, dinitrogen tetroxide, dinitrogen pentoxide, etc., and besides Nitrogen dioxide, other Nitrogen Oxides are extremely unstable, can be converted into Nitrogen dioxide or Nitrogen monoxide when exposed to light, moisture or heat, and are mainly Nitrogen dioxide.
The main sources of nitrogen oxides are divided into natural formation and human activity production, and the naturally emitted nitrogen oxides mainly come from the decomposition of organic matters in soil and ocean and the catalytic action of lightning, which belong to the nitrogen circulation process in the nature; the nitrogen oxides produced by human activities are mostly derived from the combustion process of fuels, which can cause serious harm to the natural environment and human health. Various nitrogen oxides have toxicity of different degrees, and not only can damage the respiratory system of a human body, but also can form an important reason of acid rain and photochemical smog.
Because nitrogen oxides have great harm to the natural environment and human health, researchers and researchers worldwide are striving to find scientific and efficient treatment methods. The existing treatment method is summarized as follows:
(1) Direct absorption method: the nitrogen oxides in the waste gas are directly absorbed by using alkali liquor or octanol, or the nitrogen oxides are converted into other substances which can be utilized.
(2) Solid adsorption method: mainly comprises a molecular sieve method, a peat method and a silica gel method.
(3) the catalytic reaction method comprises the following steps: mainly comprises a selective catalytic reduction method (SCR method) and a three-way catalyst method (TWC method).
(4) A biological purification method: mainly comprises a denitrification method, a bacteria removal method, a fungus removal method and a microalgae removal method.
The traditional treatment method has obvious defects, such as high investment and operation cost, easy occurrence of catalyst poisoning, reduction of treatment efficiency, blockage of equipment, high material consumption, low removal efficiency of nitrogen oxides, great abrasion to equipment, generation of various secondary pollution when reaction conditions are improperly controlled and the like. Therefore, it is necessary to get rid of the existing treatment technical route, innovate and reform from the principle of purification treatment, and develop a brand new type of nitrogen oxide treatment technology.
Disclosure of Invention
In order to solve the problems in the prior art, the invention provides a denitration method for industrial waste cracking incineration tail gas, the industrial waste cracking incineration tail gas enters a gas overheating protector through a gas pipeline, the outlet of the gas overheating protector is connected with a thermal type gas mass flow meter through the gas pipeline, the outlet of the thermal type gas mass flow meter is connected with a mixed gas flow regulating valve through the gas pipeline, the outlet of the mixed gas flow regulating valve is connected with a bag-type dust remover through the gas pipeline, the outlet of the bag-type dust remover is connected with an air inlet valve on the left side wall of a semiconductor pump rubidium steam laser array decomposition reactor through the gas pipeline, two groups of 6 semiconductor pump rubidium steam lasers are oppositely arranged on the upper top wall and the lower top wall at intervals in the semiconductor pump rubidium steam laser array decomposition reactor in a staggered mode to form a laser array, 6 beams of high-, the optical path of the device is vertical to the upper top wall and the lower top wall, an energy absorption baffle is arranged on the opposite top wall opposite to each semiconductor pump rubidium steam laser, a reticular flame-retardant baffle is vertically arranged at the left end of each energy absorption baffle and is parallel to a laser beam, the reticular flame-retardant baffle can block laser scattering and absorb the scattering energy of the laser, the fire in the reactor caused by overhigh local temperature is prevented, the rubidium steam laser beam is finally projected to the energy absorption baffle opposite to the rubidium steam laser beam through a channel formed by two adjacent reticular flame-retardant baffles, industrial refuse cracking incineration waste gas enters the reactor through an air inlet valve of the semiconductor pump rubidium steam laser array decomposition reactor, nitrogen oxides in the waste gas are directly irradiated by the high-energy rubidium steam laser beam, electrons in nitrogen oxide molecules are bombarded by high-energy photons in the high-energy rubidium steam laser beam, and electrons at lower energy levels can generate energy level transition after absorbing the high-energy photons, the high-temperature waste gas treated by the semiconductor pump rubidium steam laser array decomposition reactor is cooled to about 25-30 ℃ in a flue gas cooling system, the outlet of the flue gas cooling system is connected with an exhaust fan through a gas pipeline, and the outlet of the exhaust fan is communicated with the atmospheric environment through a gas pipeline.
The working pressure range of the semiconductor pump rubidium steam laser array decomposition reactor is 0.07-1.05 MPa, the working temperature range is 175-630 ℃, and the effective volume is 360m 3.
The semiconductor pump rubidium vapor laser adopts rubidium metal saturated vapor as a gain medium, 36kPa ethane and 48kPa helium are filled at normal temperature, the central wavelength of the rubidium vapor laser is 780.2nm, the compression line width is 0.22nm, and the average service life can reach 15000 hours.
The invention has the advantages that:
(1) The system gets rid of the existing nitrogen oxide treatment mode, creatively adopts the world-advanced semiconductor pump rubidium steam laser technology, gradually weakens the strength of N-O bonds in nitrogen oxide molecules through simple and direct energy effect, finally breaks the bonds and dissociates the bonds, finally decomposes the nitrogen oxide in waste gas into harmless nitrogen and oxygen, and thus realizes zero use of chemical materials and zero emission of pollutants.
(2) The rubidium steam laser in the system adopts array arrangement, so that waste gas can directly irradiate through rubidium steam laser for many times, the conversion efficiency is improved, and the processing capacity of the whole system is improved.
(3) The semiconductor pump rubidium steam laser has the characteristic of long service life, and the average service life of the semiconductor pump rubidium steam laser can reach 15000 hours, so that the low operation and maintenance cost and long-time operation of a treatment system are realized.
(4) The concentration of nitrogen oxides in the waste gas entering the treatment system can be adjusted to ensure that the concentration of the nitrogen oxides is in a proper concentration range of the treatment system.
Drawings
FIG. 1 is a schematic flow chart of the method of the present invention
In the figure: 1-gas overheat protector, 2-thermal gas mass flowmeter, 3-mixed gas flow regulating valve, 4-bag dust remover, 5-semiconductor pump rubidium steam laser array decomposition reactor, 6-flue gas cooling system and 7-exhaust fan
FIG. 2 is a schematic diagram of semiconductor pump rubidium steam laser array decomposition reactor
51-semiconductor pump rubidium vapor laser, 52-rubidium vapor laser beam, 53-energy absorption baffle, 54-reticular flame-retardant baffle, 55-air inlet valve and 56-air outlet valve.
Detailed Description
As shown in fig. 1, the industrial waste cracking incineration tail gas denitration method uses a system comprising a gas overheat protector 1, a thermal gas mass flow meter 2, a mixed gas flow regulating valve 3, a bag-type dust remover 4, a semiconductor pump rubidium steam laser array decomposition reactor 5, a flue gas cooling system 6 and an exhaust fan 7; wherein, the industrial garbage cracking incineration tail gas enters a gas overheating protector 1 through a gas pipeline, the outlet of the gas overheating protector 1 is connected with a thermal gas mass flow meter 2 through a gas pipeline, the outlet of the thermal gas mass flow meter 2 is connected with a mixed gas flow regulating valve 3 through a gas pipeline, the outlet of the mixed gas flow regulating valve 3 is connected with a bag-type dust remover 4 through a gas pipeline, the outlet of the bag-type dust remover 4 is connected with an air inlet valve on the left side wall of a semiconductor pump rubidium steam laser array decomposition reactor 5 through a gas pipeline, the inside of the semiconductor pump rubidium steam laser array decomposition reactor 5 is of a titanium alloy structure, two groups of semiconductor pump rubidium steam lasers 51 with 6 branches are oppositely arranged in a staggered mode to form a laser array, and the semiconductor pump rubidium steam lasers 51 adopt rubidium metal saturated steam with the length of 8mm as a, ethane of 36kPa and helium of 48kPa are charged at normal temperature, 6 high-energy rubidium steam laser beams 52 can be generated, the central wavelength of the laser is 780.2nm, the compression line width is 0.22nm, the light path of the laser is vertical to the upper top wall and the lower top wall, an energy absorption baffle 53 is arranged at the opposite top wall opposite to each semiconductor pump rubidium steam laser 51, a reticular flame-retardant baffle 54 is vertically arranged at the left end of each energy absorption baffle 53 and is parallel to the rubidium steam laser beams 52, the reticular flame-retardant baffle 54 can block laser scattering and absorb the scattered energy of the laser, the fire in the reactor is prevented due to overhigh local temperature, the rubidium steam laser beams 52 are finally projected to the opposite energy absorption baffle 53 through a channel formed by two adjacent reticular flame-retardant baffles 54, industrial waste cracking gas enters the reactor through an air inlet valve 55 of the semiconductor pump rubidium steam laser array decomposition reactor 5, under the direct irradiation of the high-energy rubidium steam laser beam 52, electrons in nitrogen oxide molecules are bombarded by high-energy photons in the high-energy rubidium steam laser beam 52, electrons at a lower energy level can generate energy level transition after absorbing the high-energy photons so as to reach a higher-level excitation state, so that the strength of an N-O bond in the nitrogen oxide molecules is gradually weakened and finally broken and dissociated, the nitrogen oxide in the waste gas is finally decomposed into harmless nitrogen and oxygen and is discharged out of the reactor from an air outlet valve 56 on the right side wall of the semiconductor pumping rubidium steam laser array decomposition reactor 5, the working pressure range of the semiconductor pumping rubidium steam laser array decomposition reactor is 0.07-1.05 MPa, the working temperature range is 175-630 ℃, the effective volume is 360m3, the outlet of the semiconductor pumping rubidium steam laser array decomposition reactor 5 is connected with a flue gas cooling system 6 through a gas pipeline, the high-temperature waste gas treated by the semiconductor pump rubidium steam laser array decomposition reactor 5 is cooled to 25-30 ℃ in the flue gas cooling system 6, the outlet of the flue gas cooling system 6 is connected with the exhaust fan 7 through a gas pipeline, and the outlet of the exhaust fan 7 is communicated with the atmospheric environment through a gas pipeline.
Claims (2)
1. A denitration method for industrial waste cracking incineration tail gas is characterized in that the industrial waste cracking incineration tail gas enters a gas overheating protector through a gas pipeline, an outlet of the gas overheating protector is connected with a thermal type gas mass flow meter through a gas pipeline, an outlet of the thermal type gas mass flow meter is connected with a mixed gas flow regulating valve through a gas pipeline, an outlet of the mixed gas flow regulating valve is connected with a bag-type dust remover through a gas pipeline, an outlet of the bag-type dust remover is connected with an air inlet valve on the left side wall of a semiconductor pump rubidium steam laser array decomposition reactor through a gas pipeline, two groups of 6 semiconductor pump rubidium steam lasers are oppositely arranged on the upper top wall and the lower top wall at intervals in the semiconductor pump rubidium steam laser array decomposition reactor at intervals in a staggered mode to form a laser array, 6 beams of high-energy rubidium steam laser beams can be, an energy absorption baffle is arranged on the opposite top wall opposite to each semiconductor pump rubidium steam laser, a reticular flame-retardant baffle is vertically arranged at the left end of each energy absorption baffle and is parallel to the laser beam, the reticular flame-retardant baffle can block laser scattering and absorb the scattered energy of the laser, and prevent the inside of the reactor from being ignited due to overhigh local temperature, the rubidium steam laser beam is finally projected to the energy absorption baffle opposite to the rubidium steam laser beam through a channel formed by two adjacent reticular flame-retardant baffles, industrial refuse cracking incineration waste gas enters the inside of the reactor through an air inlet valve of the semiconductor pump rubidium steam laser array decomposition reactor, nitrogen oxides in the waste gas are directly irradiated by the high-energy rubidium steam laser beam, electrons in nitrogen oxide molecules are bombarded by high-energy photons in the high-energy rubidium steam laser beam, and electrons at lower energy level can generate energy level transition after absorbing the high-energy photons, the method is characterized in that the excitation state of a higher level is achieved, so that the strength of N-O bonds in nitrogen oxide molecules is gradually weakened, the nitrogen oxide molecules are finally broken and dissociated, the nitrogen oxide in waste gas is finally decomposed into harmless nitrogen and oxygen, the nitrogen and oxygen are discharged out of the reactor from an air outlet valve on the right side wall of the semiconductor pump rubidium steam laser array decomposition reactor, the air outlet valve on the right side wall of the semiconductor pump rubidium steam laser array decomposition reactor is connected with a flue gas cooling system through a gas pipeline, high-temperature waste gas treated by the semiconductor pump rubidium steam laser array decomposition reactor is cooled to 25-30 ℃ in the flue gas cooling system, the outlet of the flue gas cooling system is connected with an exhaust fan through a gas pipeline, and the outlet of the exhaust fan is communicated with the atmospheric environment through a gas pipeline.
2. The industrial waste cracking incineration tail gas denitration method according to claim 1, characterized in that the working pressure range of the semiconductor pump rubidium steam laser array decomposition reactor is 0.07-1.05 MPa, the working temperature range is 175-630 ℃, the effective volume of the reactor is 360m3, the semiconductor pump rubidium steam laser adopts rubidium metal saturated steam as a gain medium, 36KPa ethane and 48KPa helium are filled at normal temperature, the central wavelength of the rubidium steam laser is 780.2nm, and the compression line width is 0.22 nm.
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| CN201810235390.9A CN108379994B (en) | 2016-01-11 | 2016-01-11 | Denitration method for industrial waste cracking incineration tail gas |
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| CN201610014077.3A CN105642086B (en) | 2016-01-11 | 2016-01-11 | A kind of industrial refuse cracking incineration tail gas method of denitration |
| CN201810235390.9A CN108379994B (en) | 2016-01-11 | 2016-01-11 | Denitration method for industrial waste cracking incineration tail gas |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3541824A1 (en) * | 1985-11-27 | 1987-06-04 | Man Technologie Gmbh | Process for the desulphurization and denitration of flue gases |
| JPS63111927A (en) * | 1986-10-29 | 1988-05-17 | Ebara Res Co Ltd | Method for removing nitrous oxide contained in gaseous mixture |
| JP2005081259A (en) * | 2003-09-09 | 2005-03-31 | Mitsubishi Heavy Ind Ltd | Laser decomposition apparatus and decomposition method therefor |
| CN103036139A (en) * | 2012-12-17 | 2013-04-10 | 浙江大学 | Narrow-linewidth tunable semiconductor longitudinal single-ended pump rubidium steam laser optical path system |
| CN204121955U (en) * | 2014-09-30 | 2015-01-28 | 河北爱节环保科技有限公司 | A kind of exhaust gas purifying treatment system of energy-conserving and environment-protective |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103301741B (en) * | 2013-05-13 | 2015-04-01 | 中国科学院武汉物理与数学研究所 | Method and device for highly purifying gas |
| CN204816005U (en) * | 2015-08-14 | 2015-12-02 | 卢兆晓 | A novel laser smog clarifier for air purification |
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2016
- 2016-01-11 CN CN201810235390.9A patent/CN108379994B/en active Active
- 2016-01-11 CN CN201610014077.3A patent/CN105642086B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3541824A1 (en) * | 1985-11-27 | 1987-06-04 | Man Technologie Gmbh | Process for the desulphurization and denitration of flue gases |
| JPS63111927A (en) * | 1986-10-29 | 1988-05-17 | Ebara Res Co Ltd | Method for removing nitrous oxide contained in gaseous mixture |
| JP2005081259A (en) * | 2003-09-09 | 2005-03-31 | Mitsubishi Heavy Ind Ltd | Laser decomposition apparatus and decomposition method therefor |
| CN103036139A (en) * | 2012-12-17 | 2013-04-10 | 浙江大学 | Narrow-linewidth tunable semiconductor longitudinal single-ended pump rubidium steam laser optical path system |
| CN204121955U (en) * | 2014-09-30 | 2015-01-28 | 河北爱节环保科技有限公司 | A kind of exhaust gas purifying treatment system of energy-conserving and environment-protective |
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| CN105642086A (en) | 2016-06-08 |
| CN105642086B (en) | 2018-06-15 |
| CN108379994A (en) | 2018-08-10 |
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