CN105642086B - A kind of industrial refuse cracking incineration tail gas method of denitration - Google Patents
A kind of industrial refuse cracking incineration tail gas method of denitration Download PDFInfo
- Publication number
- CN105642086B CN105642086B CN201610014077.3A CN201610014077A CN105642086B CN 105642086 B CN105642086 B CN 105642086B CN 201610014077 A CN201610014077 A CN 201610014077A CN 105642086 B CN105642086 B CN 105642086B
- Authority
- CN
- China
- Prior art keywords
- gas
- vapor laser
- rubidium
- rubidium vapor
- energy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/007—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/76—Gas phase processes, e.g. by using aerosols
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/02—Particle separators, e.g. dust precipitators, having hollow filters made of flexible material
- B01D46/023—Pockets filters, i.e. multiple bag filters mounted on a common frame
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/54—Nitrogen compounds
- B01D53/56—Nitrogen oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/40—Nitrogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0283—Flue gases
- B01D2258/0291—Flue gases from waste incineration plants
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/808—Laser
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Biomedical Technology (AREA)
- Dispersion Chemistry (AREA)
- Toxicology (AREA)
- Treating Waste Gases (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The invention discloses a kind of industrial refuse cracking incineration tail gas method of denitration, tail gas passes sequentially through gas superheat protector, thermal type gas quality flow meter, mixed gas flow regulating valve, bag filter, semiconductor pumped rubidium vapor laser array decomposition reactor, flue-gas-cooling system, exhaust fan.The high-energy that rubidium vapor laser is utilized of this method creativeness, nitrogen oxides in exhaust gas is under the direct irradiation of rubidium laser, electrons in nitrogen oxides molecule by rubidium laser high-energy photon bombardment and energy level transition occurs, so as to which the intensity for making N O keys in nitrogen oxides molecule gradually weakens, and scission of link and dissociation finally occurs, it is decomposed into harmless nitrogen and oxygen.
Description
Technical field
The present invention relates to a kind of industrial refuse cracking incineration tail gas method of denitration, belong to the exhaust-gas treatment neck in environmental protection
Domain.
Background technology
Nitrogen oxides（Nitrogen Oxides）It is a kind of major pollutants in atmospheric environment, it includes a variety of chemical combination
Object, such as nitrogen dioxide, nitric oxide, nitrous oxide, nitrogen trioxide, dinitrogen tetroxide, dinitrogen pentoxide, except nitrogen dioxide
Outside, other nitrogen oxides are extremely unstable, meet light, wet or hot can be converted into nitrogen dioxide or nitric oxide, and with nitrogen dioxide
Based on.
The main source of nitrogen oxides is divided into naturally occurring to be generated with mankind's activity, and the nitrogen oxides naturally discharged mainly comes
From the organic matter decomposition in soil and ocean and the catalytic action of lightning, these belong to the nitrogen cycle process of nature；And
The nitrogen oxides overwhelming majority caused by mankind's activity derives from fuel combustion process, this can be to the health of natural environment and the mankind
It causes to seriously endanger.All kinds of nitrogen oxides are respectively provided with different degrees of toxicity, and human respiratory can not only be caused to damage, also
It is the major reason to form acid rain and photochemical fog.
Due to nitrogen oxides to natural environment and human health there is larger harm, in worldwide
Person and researcher are striving to find scientific and efficient administering method.Current existing administering method is summarized as follows：
（1）Direct absorption process：Nitrogen oxides in exhaust gas is directly absorbed or by nitrogen oxidation by using lye or sec-octyl alcohol
Object is converted into other substances that can be utilized.
（2）Solid absorption method：Mainly include sieve method, mud coal method and silica gel method.
（3）It is catalyzed reaction method：Mainly include selective catalysis reduction method（SCR methods）With three-way catalyst method（TWC methods）.
（4）Biological clarification：Mainly include denitrification method, removal of bacteria method, fungi removal method and microalgae removal method.
The shortcomings that above-mentioned tradition administering method, is apparent, and such as investment and operating cost are high, easily catalyst poisoning occur from reduction
Treatment effeciency and occluding device, supplies consumption is higher, nitrogen oxides removal efficiency is low, larger abrasion, reaction item are caused to equipment
Not the problems such as part control can also not generate all kinds of secondary pollutions at that time.Therefore, it is necessary to break away from existing Treatment process route, from net
Change and innovated and changed in the principle administered, develop a kind of nitrogen oxides Treatment process of new type.
Invention content
To solve the above-mentioned problems in the prior art, the present invention provides a kind of industrial refuse cracking incineration tail gas denitration
Method, industrial refuse cracking incineration tail gas enter gas superheat protector, the outlet of gas superheat protector by gas piping
Thermal type gas quality flow meter is connected by gas piping, the outlet of thermal type gas quality flow meter is connected by gas piping to be mixed
Gas flow regulating valve is closed, the outlet of mixed gas flow regulating valve connects bag filter, bag-type dust by gas piping
The outlet of device connects the air intake valve of semiconductor pumped rubidium vapor laser array decomposition reactor left side wall by gas piping, and half
Interleaved is equipped with two groups totally 6 half relatively on upper and lower roof inside conductor pumping rubidium vapor laser array decomposition reactor
Conductor pumps rubidium vapor laser, forms laser array, can generate 6 beam high energy rubidium vapor laser beams, light path perpendicular to
Upper and lower roof is equipped with energy absorption baffle at the opposite roof of each semiconductor pumped rubidium vapor laser face,
The left end of each energy absorption baffle is vertically installed with meshy fire retardant baffle, and parallel with laser beam, meshy fire retardant baffle can
Blocking laser light scattering simultaneously absorbs its scattering energy, prevents local temperature excessively high and makes inside reactor on fire, rubidium vapor laser light
Beam is finally projected to by the channel that adjacent two fan meshy fire retardant baffles are formed on the energy absorption baffle of face, and industrial refuse is split
Change waste gas from incinerator and inside reactor, exhaust gas are entered by the air intake valve of semiconductor pumped rubidium vapor laser array decomposition reactor
In nitrogen oxides under the direct irradiation of high energy rubidium vapor laser light beam, the electrons in nitrogen oxides molecule are by high energy rubidium
Energy level jump can occur after high-energy photon is absorbed for the bombardment of high-energy photon in vapor laser light beam, the electronics in lower level
It moves, to reach the excitation state of higher level, so as to which the intensity for making N-O keys in nitrogen oxides molecule gradually weakens, and makes it final
Occur scission of link and dissociation, the nitrogen oxides in exhaust gas is finally broken down into harmless nitrogen and oxygen, and from semiconductor pumped rubidium
Outlet valve discharge reactor on vapor laser array decomposition reactor right side wall, semiconductor pumped rubidium vapor laser array point
The outlet valve for solving reactor right side wall connects flue-gas-cooling system by gas piping, by semiconductor pumped rubidium vapor laser
Treated that high-temp waste gas is cooled to about 25 ~ 30 DEG C in flue-gas-cooling system for array decomposition reactor, flue-gas-cooling system
Outlet by gas piping connect exhaust fan, the outlet of exhaust fan connects atmospheric environment by gas piping.
The working pressure range of its semiconductor pumped rubidium vapor laser array decomposition reactor is 0.07 ~ 1.05MPa, is worked
Temperature range is 175 ~ 630 DEG C, dischargeable capacity 360m3。
Its semiconductor pumped rubidium vapor laser uses rubidium metal saturated vapor as gain media, and is filled at normal temperatures
The ethane of 36kPa and the helium of 48kPa, the centre wavelength of rubidium vapor laser is 780.2nm, Linewidth 0.22nm, is averaged
Service life was up to 15000 hours.
The advantage of the invention is that：
（1）This system has broken away from existing nitrogen oxides governance model, the creative semiconductor for employing world tip
Rubidium vapor laser technology is pumped, by simple direct energy effect, the intensity of N-O keys in nitrogen oxides molecule is made gradually to subtract
It is weak, and it is made finally to occur scission of link and dissociation, the nitrogen oxides in exhaust gas is finally broken down into harmless nitrogen and oxygen, so as to
Chemical substance zero is realized to use and zero release of pollutant.
（2）Rubidium vapor laser in this system employs array arrangement, and exhaust gas multipass rubidium steam is enable to swash
The direct irradiation of light, improves transformation efficiency, improves the processing capacity of whole system.
（3）Semiconductor pumped rubidium vapor laser has the characteristics that service life is long, and average life is up to 15000
Hour, it is achieved thereby that the low O＆M cost and long-play of processing system.
（4）The nitrogen oxides of exhaust gas concentration for entering processing system can be adjusted, ensure that its concentration is in processing system
It unites suitable concentration range；
Description of the drawings
Fig. 1 is the method flow schematic diagram of the present invention
In figure：1- gas superheats protector, 2- thermal type gas quality flow meters, 3- mixed gas flows regulating valve, 4- cloth
The semiconductor pumped rubidium vapor laser array decomposition reactor of bag dust collector, 5-, 6- flue-gas-cooling systems, 7- exhaust fans
Fig. 2 is the schematic diagram of semiconductor pumped rubidium vapor laser array decomposition reactor
The semiconductor pumped rubidium vapor lasers of 51-, 52- rubidium vapor lasers light beam, 53- energy absorptions baffle, the netted resistances of 54-
Fire baffle, 55- air intake valves, 56- outlet valves
Specific embodiment
Industrial refuse cracking incineration tail gas method of denitration as shown in Figure 1, the system used are protected including gas superheat
Device 1, thermal type gas quality flow meter 2, mixed gas flow regulating valve 3, bag filter 4, semiconductor pumped rubidium vapor laser
Array decomposition reactor 5, flue-gas-cooling system 6, exhaust fan 7；Wherein, industrial refuse cracking incineration tail gas passes through gas piping
Into gas superheat protector 1, the outlet of gas superheat protector 1 connects thermal type gas quality flow meter 2 by gas piping,
The outlet of thermal type gas quality flow meter 2 connects mixed gas flow regulating valve 3 by gas piping, and mixed gas flow is adjusted
The outlet of valve 3 connects bag filter 4 by gas piping, and the outlet of bag filter 4 connects semiconductor by gas piping
Pump the intake valve of 5 left side wall of rubidium vapor laser array decomposition reactor, semiconductor pumped rubidium vapor laser array decomposition reaction
5 inside of device is titanium alloy structure, staggeredly opposite to be equipped with two groups of totally 6 semiconductor pumped rubidium vapor lasers 51, forms laser
Device array, it is the rubidium metal saturated vapor of 8mm as gain media that semiconductor pumped rubidium vapor laser 51, which uses length, and
The ethane of 36kPa and the helium of 48kPa are filled under room temperature, 6 beam high energy rubidium vapor laser beams 52, the middle cardiac wave of laser can be generated
A length of 780.2nm, Linewidth 0.22nm, light path swash perpendicular to upper and lower roof in each semiconductor pumped rubidium steam
Energy absorption baffle 53 is installed at the opposite roof of 51 face of light device, in the left end right angle setting of each energy absorption baffle 53
There is meshy fire retardant baffle 54, parallel with rubidium vapor laser light beam 52, meshy fire retardant baffle 54 can stop laser light scattering and absorb
It scatters energy, prevents local temperature excessively high and makes inside reactor on fire, and rubidium vapor laser light beam 52 passes through adjacent two fan nets
The channel that the fire-retardant baffle 54 of shape is formed finally is projected on the energy absorption baffle 53 of face, and industrial refuse cracking waste gas from incinerator leads to
The air intake valve 55 for crossing semiconductor pumped rubidium vapor laser array decomposition reactor 5 enters inside reactor, the nitrogen oxygen in exhaust gas
Under the direct irradiation of high energy rubidium vapor laser light beam 52, the electrons in nitrogen oxides molecule are swashed compound by high energy rubidium steam
After high-energy photon is absorbed energy level transition can occur for the bombardment of high-energy photon in light light beam 52, the electronics in lower level, with
Reach the excitation state of higher level, so as to which the intensity for making N-O keys in nitrogen oxides molecule gradually weakens, and it is made finally to break
Key and dissociation, the nitrogen oxides in exhaust gas are finally broken down into harmless nitrogen and oxygen, and swash from semiconductor pumped rubidium steam
Outlet valve 56 on 5 right side wall of optical arrays decomposition reactor discharges reactor, and semiconductor pumped rubidium vapor laser array decomposes
The working pressure range of reactor is 0.07 ~ 1.05MPa, and operating temperature range is 175 ~ 630 DEG C, dischargeable capacity 360m3, half
The outlet of conductor pumping rubidium vapor laser array decomposition reactor 5 connects flue-gas-cooling system 6 by gas piping, is led through more than half
Treated that high-temp waste gas is cooled to 25 ~ 30 in flue-gas-cooling system 6 for body pumping rubidium vapor laser array decomposition reactor 5
DEG C, the outlet of flue-gas-cooling system 6 connects exhaust fan 7 by gas piping, and the outlet of exhaust fan 7 is connected by gas piping
Logical atmospheric environment.
Claims (3)
1. a kind of industrial refuse cracking incineration tail gas method of denitration, which is characterized in that industrial refuse cracking incineration tail gas passes through gas
Body pipeline enters gas superheat protector, and the outlet of gas superheat protector connects thermal type gas quality flow by gas piping
Meter, the outlet of thermal type gas quality flow meter connect mixed gas flow regulating valve, mixed gas flow tune by gas piping
The outlet for saving valve connects bag filter by gas piping, and the outlet of bag filter connects semiconductor pump by gas piping
The air intake valve of Pu rubidium vapor laser array decomposition reactor left side wall, semiconductor pumped rubidium vapor laser array decomposition reactor
Inside interleaved on upper and lower roof is opposite to be equipped with two groups of totally 6 semiconductor pumped rubidium vapor lasers, forms laser
Array, can generate 6 beam high energy rubidium vapor laser beams, and light path is steamed perpendicular to upper and lower roof in each semiconductor pumped rubidium
Energy absorption baffle is installed at the opposite roof of vapour laser face, is vertically installed in the left end of each energy absorption baffle
Meshy fire retardant baffle, parallel with laser beam, meshy fire retardant baffle, which can stop laser light scattering and absorb it, scatters energy, prevents
Local temperature is excessively high and makes inside reactor on fire, and rubidium vapor laser light beam is formed logical by adjacent two fan meshy fire retardant baffles
Road is finally projected on the energy absorption baffle of face, and industrial refuse cracking waste gas from incinerator passes through semiconductor pumped rubidium vapor laser
The air intake valve of array decomposition reactor enters inside reactor, and the nitrogen oxides in exhaust gas is in high energy rubidium vapor laser light beam
Under direct irradiation, the electrons in nitrogen oxides molecule are bombarded by high-energy photon in high energy rubidium vapor laser light beam, are in
After high-energy photon is absorbed energy level transition can occur for the electronics of lower level, to reach the excitation state of higher level, so as to make nitrogen
The intensity of N-O keys gradually weakens in oxide molecule, and it is made finally to occur scission of link and dissociation, and the nitrogen oxides in exhaust gas is final
It is broken down into harmless nitrogen and oxygen, and from the outlet on semiconductor pumped rubidium vapor laser array decomposition reactor right side wall
Valve discharges reactor, and the outlet valve of semiconductor pumped rubidium vapor laser array decomposition reactor right side wall passes through gas piping
Flue-gas-cooling system is connected, by semiconductor pumped rubidium vapor laser array decomposition reactor treated high-temp waste gas in flue gas
25 ~ 30 DEG C are cooled in cooling system, the outlet of flue-gas-cooling system connects exhaust fan, exhaust fan by gas piping
Outlet atmospheric environment is connected by gas piping.
2. industrial refuse cracking incineration tail gas method of denitration according to claim 1, which is characterized in that semiconductor pumped rubidium
The working pressure range of vapor laser array decomposition reactor is 0.07 ~ 1.05MPa, and operating temperature range is 175 ~ 630 DEG C, instead
It is 360m to answer device dischargeable capacity3。
3. industrial refuse cracking incineration tail gas method of denitration according to claim 1, which is characterized in that semiconductor pumped rubidium
Vapor laser uses rubidium metal saturated vapor as gain media, and is filled with the ethane of 36KPa and the helium of 48KPa at normal temperatures
Gas, the centre wavelength of rubidium vapor laser is 780.2nm, Linewidth 0.22nm.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610014077.3A CN105642086B (en) | 2016-01-11 | 2016-01-11 | A kind of industrial refuse cracking incineration tail gas method of denitration |
| CN201810235390.9A CN108379994B (en) | 2016-01-11 | 2016-01-11 | Denitration method for industrial waste cracking incineration tail gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610014077.3A CN105642086B (en) | 2016-01-11 | 2016-01-11 | A kind of industrial refuse cracking incineration tail gas method of denitration |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810235390.9A Division CN108379994B (en) | 2016-01-11 | 2016-01-11 | Denitration method for industrial waste cracking incineration tail gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105642086A CN105642086A (en) | 2016-06-08 |
| CN105642086B true CN105642086B (en) | 2018-06-15 |
Family
ID=56486978
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810235390.9A Active CN108379994B (en) | 2016-01-11 | 2016-01-11 | Denitration method for industrial waste cracking incineration tail gas |
| CN201610014077.3A Active CN105642086B (en) | 2016-01-11 | 2016-01-11 | A kind of industrial refuse cracking incineration tail gas method of denitration |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810235390.9A Active CN108379994B (en) | 2016-01-11 | 2016-01-11 | Denitration method for industrial waste cracking incineration tail gas |
Country Status (1)
| Country | Link |
|---|---|
| CN (2) | CN108379994B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3541824A1 (en) * | 1985-11-27 | 1987-06-04 | Man Technologie Gmbh | Process for the desulphurization and denitration of flue gases |
| CN103301741A (en) * | 2013-05-13 | 2013-09-18 | 中国科学院武汉物理与数学研究所 | Method and device for highly purifying gas |
| CN204121955U (en) * | 2014-09-30 | 2015-01-28 | 河北爱节环保科技有限公司 | A kind of exhaust gas purifying treatment system of energy-conserving and environment-protective |
| CN204816005U (en) * | 2015-08-14 | 2015-12-02 | 卢兆晓 | A novel laser smog clarifier for air purification |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0651097B2 (en) * | 1986-10-29 | 1994-07-06 | 株式会社荏原総合研究所 | Method for decomposing and removing nitrous oxide in gas mixture |
| JP4370134B2 (en) * | 2003-09-09 | 2009-11-25 | 三菱重工業株式会社 | Laser decomposition apparatus and decomposition method |
| CN103036139A (en) * | 2012-12-17 | 2013-04-10 | 浙江大学 | Narrow-linewidth tunable semiconductor longitudinal single-ended pump rubidium steam laser optical path system |
-
2016
- 2016-01-11 CN CN201810235390.9A patent/CN108379994B/en active Active
- 2016-01-11 CN CN201610014077.3A patent/CN105642086B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3541824A1 (en) * | 1985-11-27 | 1987-06-04 | Man Technologie Gmbh | Process for the desulphurization and denitration of flue gases |
| CN103301741A (en) * | 2013-05-13 | 2013-09-18 | 中国科学院武汉物理与数学研究所 | Method and device for highly purifying gas |
| CN204121955U (en) * | 2014-09-30 | 2015-01-28 | 河北爱节环保科技有限公司 | A kind of exhaust gas purifying treatment system of energy-conserving and environment-protective |
| CN204816005U (en) * | 2015-08-14 | 2015-12-02 | 卢兆晓 | A novel laser smog clarifier for air purification |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105642086A (en) | 2016-06-08 |
| CN108379994B (en) | 2019-12-06 |
| CN108379994A (en) | 2018-08-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108043194B (en) | A kind of industrial refuse cracking incineration tail gas denitrating system | |
| CN104801178B (en) | Method for simultaneously desulfurizing, denitrifying and removing mercury by combining radical pre-oxidation with wet absorption | |
| CN105251326A (en) | Reduction and oxidation combined denitration system and denitration method thereof | |
| CN103752151B (en) | A kind of magnesium sulfite flue-gas denitration process | |
| CN205867916U (en) | Adsorb desorption catalytic combustion integration equipment | |
| TWI633924B (en) | Method of treating a gas with a gas treatment apparatus | |
| CN205760543U (en) | A kind of novel photoassisted oxidation tower | |
| CN203123795U (en) | Flue gas denitration device using ozone oxidation method | |
| CN104815534B (en) | A kind of ozone joint light excites the VOCs cleaning systems and method of peroxide | |
| CN205073858U (en) | DeNOx systems is united with oxidation to reduction | |
| CN212819068U (en) | Plasma coprocessing high-temperature waste gas device | |
| CN105642086B (en) | A kind of industrial refuse cracking incineration tail gas method of denitration | |
| CN104338425A (en) | Technological method for wet-process flue gas denitration | |
| CN113019121A (en) | Low-temperature SCR (selective catalytic reduction) flue gas denitration device for household garbage incineration plant | |
| CN202844873U (en) | Annular nitric oxide waste gas purifier | |
| CN210398944U (en) | Sterilizing ethylene oxide waste gas catalytic combustion decomposition purifying device | |
| CN104399370A (en) | Lower temperature flue gas SCR (Selective Catalytic Reduction) denitration system and process | |
| CN204637986U (en) | Free radical pre-oxidation is in conjunction with the simultaneous SO_2 and NO removal demercuration system of wet absorption | |
| CN203215697U (en) | Energy-saving denitration incinerator | |
| CN204637949U (en) | A kind of VOCs based on free radical advanced oxidation removes system | |
| CN106000048A (en) | Low-temperature desulfuration and denitration system | |
| CN109126441A (en) | A kind of intelligent flue gas denitration device | |
| CN207025011U (en) | Industrial VOC waste gas concentrates energy-efficient treatment system | |
| CN204768202U (en) | Flue gas desulfurization denitration dust removal integration system | |
| CN108905407A (en) | The method that compound flue gas desulfurization and denitrification takes off white minimum discharge processing |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB03 | Change of inventor or designer information | ||
| CB03 | Change of inventor or designer information |
Inventor after: Dong Qingde Inventor before: Zhang Wenguo |
|
| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20180404 Address after: 262100 west side of Anqiu, Weifang, Zhujianglu Road, Shandong Applicant after: Shandong blue environment Polytron Technologies Inc Address before: 318050 No. 64 South Street, Lunan street, Luqiao District, Zhejiang, Taizhou, Xin'an Applicant before: Zhang Wenguo |
|
| GR01 | Patent grant | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A denitration method for tail gas from cracking and incineration of industrial waste Effective date of registration: 20211210 Granted publication date: 20180615 Pledgee: Anqiu Shandong rural commercial bank Limited by Share Ltd. Pledgor: SHANDONG LANCHI ENVIRONMENT TECHNOLOGY CO.,LTD. Registration number: Y2021370010138 |