CN108375584A - Infrared optical material microdefect detection device and far infrared microlens - Google Patents
Infrared optical material microdefect detection device and far infrared microlens Download PDFInfo
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- CN108375584A CN108375584A CN201810209430.2A CN201810209430A CN108375584A CN 108375584 A CN108375584 A CN 108375584A CN 201810209430 A CN201810209430 A CN 201810209430A CN 108375584 A CN108375584 A CN 108375584A
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- 239000000463 material Substances 0.000 title claims abstract description 112
- 230000003287 optical effect Effects 0.000 title claims abstract description 76
- 238000001514 detection method Methods 0.000 title claims abstract description 52
- 229910052732 germanium Inorganic materials 0.000 claims abstract description 10
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000005387 chalcogenide glass Substances 0.000 claims abstract description 8
- 239000011521 glass Substances 0.000 claims abstract description 5
- 238000003331 infrared imaging Methods 0.000 claims description 21
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 18
- 238000003384 imaging method Methods 0.000 claims description 11
- 238000009835 boiling Methods 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 8
- 238000004971 IR microspectroscopy Methods 0.000 claims description 4
- 238000011895 specific detection Methods 0.000 claims description 3
- 238000003491 array Methods 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims description 2
- 230000007547 defect Effects 0.000 abstract description 11
- 238000009738 saturating Methods 0.000 abstract description 5
- 229910052710 silicon Inorganic materials 0.000 abstract description 5
- 239000010703 silicon Substances 0.000 abstract description 5
- 208000037656 Respiratory Sounds Diseases 0.000 abstract description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 3
- 239000012535 impurity Substances 0.000 abstract description 3
- 238000012360 testing method Methods 0.000 description 6
- 230000009975 flexible effect Effects 0.000 description 4
- 238000007689 inspection Methods 0.000 description 4
- 230000005611 electricity Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000008439 repair process Effects 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 208000003464 asthenopia Diseases 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 210000000887 face Anatomy 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
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- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Signal Processing (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Abstract
The present invention relates to a kind of infrared optical material microdefect detection device, for the far infrared microlens of the device and the detection method of the detection device, far infrared microlens include：The first lens, the second lens, the third lens and the 4th lens being arranged in order from object side to image side along optical axis；First lens, the third lens and the 4th lens are germanium system glass, and second lens are chalcogenide glass；The object side of first lens and the third lens is spherical surface, image side surface is aspherical；The aspherical of the third lens has diffraction ring band；The object side and image side surface of second lens and the 4th lens are spherical surface.The microdefect that the infrared optical material (silicon, germanium or chalcogenide glass etc.) for the saturating far infrared that far infrared microlens according to the present invention can not observe naked eyes is internal is observed, and the different types of defect such as bubble, impurity and/or crackle can be clearly observed.
Description
Technical field
The present invention relates to a kind of infrared optical material microdefect detection device, for the far infrared microlens of the device
And the detection method of the detection device.The infrared ray sent out using infrared light supply through being tested infrared optical material, transmission it is red
Outside line zooms into picture by infrared microscopy camera lens, and the infrared imaging signal received is converted into electronic signal by infrared detector
Figure is converted by computer afterwards, material internal microdefect is observed to realize.
Background technology
Light microscope is to utilize one or a set of lens, a set of optical amplification system is formed, by microcosmic object or figure
As zooming into the image that human eye can be differentiated, so that people observe microcosmos.Light microscope generally uses visible light
As light source, working method is mostly reflective, is used for the subtle situation in surface of human eye observation's object, can also utilize transmission-type
Working method observes the details of pattern inside transparent object.Light microscope is in addition to can be direct by optical eyepiece with human eye
Observation is outer, can also be equipped with electronic eyepiece, by opto-electronic conversion and signal processing, the figure for being seen light microscope by software
Piece is shown on computer screen, for eye-observation, reduces eye fatigue.
But for saturating infrared optical material, such as monocrystalline germanium, monocrystalline silicon etc., due to being not through to visible light, normal light
The inside microdefect of such material can not be observed by learning microscope, lead to not to judge whether the quality of material meets to make
With requiring.
Invention content
It is an object of the invention to solve the above problems, infrared optical material microdefect can accurately be detected by providing one kind
Infrared optical material microdefect detection device, the far infrared microlens for the device, and pass through the detection device
Detect the detection method of infrared optical material microdefect.
For achieving the above object, it is microcosmic to provide a kind of infrared optical material comprising far infrared microlens by the present invention
Defect detecting device, including：
Adjustment unit is clamped in material, for infrared optical material to be clamped and adjusts the position of infrared optical material；
Infrared imaging unit is located at the side of material clamping adjustment unit, for being focused into infrared optical material
Picture；
Infrared light unit is located at the other side of material clamping adjustment unit, for providing infrared ray；
Bearing unit, for supporting the material clamping adjustment unit, infrared imaging unit and infrared light unit；
The infrared imaging unit includes the far infrared microlens.
According to an aspect of the present invention, further include be located at the material clamping adjustment unit and the infrared light unit it
Between adjustable diaphragm, the diaphragm of the adjustable diaphragm adjusts bore ranging from 5-80mm.
According to an aspect of the present invention, the material clamping adjustment unit includes the folder for infrared optical material to be clamped
Hold platform, the adjustment platform of the bearing grain-clamping table and on the adjustment platform for driving the adjustment platform to move
Adjusting knob.
According to an aspect of the present invention, the infrared imaging unit further includes for adjusting the far infrared microlens
The focusing handwheel of focal length, the far infrared deterctor that is electrically connected with the far infrared microlens.
According to an aspect of the present invention, the infrared light unit includes for providing the infrared light supply of infrared ray, being used for
The power supply for adjusting the infrared light supply intensity adjustment knob of the infrared light supply intensity and powering for the infrared light supply.
According to an aspect of the present invention, the infrared light supply is electric boiling plate, the available temperature of electric boiling plate
Ranging from 50-120 DEG C.
According to an aspect of the present invention, the bearing unit includes supporting material clamping adjustment unit and described red
The pedestal of outer light unit, the holder of bearing on the base, and bearing is on the bracket and can be along the branch
Frame moves up and down the bearing support for supporting the infrared imaging unit.
According to an aspect of the present invention, the pedestal has the groove for installing the infrared light supply；
The infrared light supply intensity adjustment knob and the power supply are installed on the side of the pedestal.
For achieving the above object, the present invention provides a kind of far infrared microlens, including：
The first lens, the second lens, the third lens and the 4th lens being arranged in order from object side to image side along optical axis；
First lens, the third lens and the 4th lens are germanium system glass, and second lens are sulphur system
Glass；
The object side of first lens and the third lens is spherical surface, image side surface is aspherical；
The aspherical of the third lens has diffraction ring band；
The object side and image side surface of second lens and the 4th lens are spherical surface.
For achieving the above object, the present invention provides a kind of detection side of infrared optical material microdefect detection device
Method includes the following steps：
A. infrared optical material is positioned in grain-clamping table, and ensures that infrared optical material and infrared light supply and far infrared are aobvious
Micro lens is parallel；
B. power on, by infrared light supply intensity adjustment knob control electric current size come adjust infrared light supply being capable of spoke
Penetrate the intensity of infrared ray；
C. computer video software is opened, the position of the bore and far infrared microlens of adjustable diaphragm is adjusted；
D. the position that infrared optical material is adjusted by adjusting knob carries out the specific detection of different location imaging.
A scheme according to the present invention, far infrared microlens of the invention can not observe naked eyes saturating remote red
The internal microdefect of the infrared optical material (silicon, germanium or chalcogenide glass etc.) of outside line is observed, and can be clearly observed
The different types of defect such as bubble, impurity and/or crackle, and flaw size is demarcated, defect picture is preserved, so that it is determined that
The quality of infrared optical material.
A scheme according to the present invention, infrared optical material microdefect structure of the detecting device of the invention is simple, far
There is infrared microscopy camera lens itself focusing handwheel can focus, and in addition to this, infrared imaging unit can also be with bearing
Frame is moved up and down along holder, therefore considerably increases the areas imaging of the far infrared microlens in infrared imaging unit, is made
It obtains detection range to greatly increase, testing result is more accurate.
A scheme according to the present invention, material clamping adjustment unit clamping need the infrared optical material that detects can be
The two-dimensional position adjustment on front and back and left and right directions is done on pedestal, thus so that the detection of infrared optical material is more flexible
Property, test position is flexible and changeable, and can make material clamp holds the infrared optical material of each position in adjustment unit can
It is enough accurately to be photographed by far infrared microlens so as to detect no dead angle, ensure the precision of batch detection.
A scheme according to the present invention heats offer infrared ray using electric boiling plate and makes cost reduction, while electricity adds
Hot plate is arranged in the groove that pedestal opens up, and greatly reduced the volume of device so that the structure of device is simpler, repair
Also more convenient.
A scheme according to the present invention, infrared optical material microdefect detection device according to the present invention, work
Wavelength is 7~14 microns, can be to common infrared optical material, such as chalcogenide glass, silicon, germanium, and plates this after anti-reflection film
Class material carries out interior microscopic defect inspection, can not carry out the difficulty of interior microscopic defect inspection before solving to such material
Topic.
Detection method according to the present invention, it is simple and fast to the detection of infrared optical material microdefect, and can be real
Existing batch detection, and dead angle is not present in detection process, ensures to improve detection efficiency while accuracy of detection.
Description of the drawings
Fig. 1 schematically shows a kind of infrared optical material microdefect detection device of embodiment according to the present invention
The stereogram of structure arrangement；
Fig. 2 schematically shows a kind of structural plan of the far infrared microlens of embodiment according to the present invention.
Specific implementation mode
It, below will be to embodiment in order to illustrate more clearly of embodiment of the present invention or technical solution in the prior art
Needed in attached drawing be briefly described.It should be evident that the accompanying drawings in the following description is only some of the present invention
Embodiment for those of ordinary skills without creative efforts, can also be according to these
Attached drawing obtains other attached drawings.
When being described for embodiments of the present invention, term " longitudinal direction ", " transverse direction ", "upper", "lower", " preceding ",
" rear ", "left", "right", "vertical", "horizontal", "top", "bottom" "inner", the orientation or positional relationship expressed by "outside" are to be based on phase
Orientation or positional relationship shown in the drawings is closed, is merely for convenience of description of the present invention and simplification of the description, rather than instruction or dark
Show that signified device or element must have a particular orientation, with specific azimuth configuration and operation, therefore above-mentioned term cannot
It is interpreted as limitation of the present invention.
The present invention is described in detail with reference to the accompanying drawings and detailed description, embodiment cannot go to live in the household of one's in-laws on getting married one by one herein
It states, but therefore embodiments of the present invention are not defined in following implementation.
Fig. 1 schematically shows a kind of infrared optical material microdefect detection device of embodiment according to the present invention
The stereogram of structure arrangement.As shown in Figure 1, infrared optical material microdefect detection device according to the present invention includes material clamp
Hold adjustment unit 1, infrared imaging unit 2, infrared light unit 3 and bearing unit 4.In the present embodiment, material clamping adjustment
Unit 1 is used to that infrared optical material to be clamped and adjusts the specific test position of infrared optical material.Infrared imaging unit 2 is located at
The side of adjustment unit 1 is clamped in material, for infrared optical material focal imaging.Infrared light unit 3 is located at material clamping and adjusts
The other side of whole unit 1, for providing infrared ray.In the present invention, the infrared ray sent out by infrared light unit 3 can penetrate quilt
Infrared optical material is surveyed, shooting imaging is then carried out by infrared imaging unit 2.Bearing unit 4 is used for support material clamping tune
Whole unit 1, infrared imaging unit 2 and infrared light unit 3.
In addition, as shown in Figure 1, in the present embodiment, infrared optical material microdefect detection according to the present invention fills
It further includes adjustable diaphragm 5 to set.As shown in Figure 1, adjustable diaphragm 5 is located between material clamping adjustment unit 1 and infrared light unit 3.
In the present embodiment, the adjustable range of the diaphragm bore of adjustable diaphragm 5 is 5-80mm.
A kind of embodiment according to the present invention, as shown in Figure 1, material clamping adjustment unit 1 includes grain-clamping table 101, adjusts
Flatten platform 102 and adjusting knob 103.In the present embodiment, grain-clamping table 101 is used to that the infrared optics for needing to be detected to be clamped
Material, grain-clamping table 101 are Three-claw type holding structure, can be the detected sample of 5-80mm with clamping dimension.Platform 102 is adjusted to use
It in bearing grain-clamping table 101, adjusts and is provided with adjusting knob 103 on platform 102, it is flat to adjust adjustment by adjusting knob 103
The position of platform 102.In the present embodiment, adjustment platform 102 is two-dimension adjustment platform, can be by adjusting knob 103
The adjusting that the enterprising line position of front and back and left and right directions of Fig. 1 is set, and the amplitude (moving range) adjusted is 0-25mm.In this implementation
In mode, because the clamping of grain-clamping table 101 needs the infrared optical material being detected to be supported on adjustment platform 102, therefore adjust
Leveling platform 102 can drive the grain-clamping table 101 and infrared optical material to be detected to be moved, and infrared optics material is adjusted with this
The test position of material.
A kind of embodiment according to the present invention, as shown in Figure 1, infrared imaging unit (2) includes far infrared microlens
201, focusing handwheel 202 and far infrared deterctor 203.In the present embodiment, focusing handwheel 202 is micro- for adjusting far infrared
The focal length of camera lens 201.Far infrared deterctor 203 is electrically connected with far infrared microlens 201, and far infrared microlens 201 are clapped
The picture signal taken the photograph is converted into electronic signal and is transmitted.In the present invention, far infrared deterctor 203 passes through electric wire 6 and calculating
Thus electronic signal is passed to the equipment such as computer by the connections such as machine, image processor or video converter, soft by video
Electronic signal is converted to image and shown by part.In the present embodiment, far infrared deterctor 203 be 640x480 arrays,
The LWIR Uncooled type detector of 17 microns of pixel spacing.
Fig. 2 schematically shows a kind of structural plan of the far infrared microlens of embodiment according to the present invention.Such as
Shown in Fig. 2, far infrared microlens 201 according to the present invention include four lens, respectively along optical axis from object side to image side
The first lens 2011, the second lens 2012, the third lens 2013 and the 4th lens 2014 being arranged in order.In present embodiment
In, the first lens 2011, the third lens 2013 and the 4th lens 2014 are germanium system glass, and the second lens 2012 are chalcogenide glass.
In the present embodiment, the object side of the first lens 2011 and the third lens 2013 is spherical surface, image side surface is aspheric
Face；The aspherical diffraction surfaces constituted with DOE with diffraction ring of the third lens 2013；Second lens 2012 and the 4th lens 2014
Object side and image side surface be spherical surface.
In the present embodiment, the NA of far infrared microlens 201 is equal to 0.5, and minimum resolution is 6.8 microns, minimum
Operating distance is 18.8 millimeters, and operation wavelength is 7~14 μm.
A kind of embodiment according to the present invention, as shown in Figure 1, infrared light unit 3 includes infrared light supply 301, infrared light
Source strength adjusting knob 302 and power supply 303.In the present embodiment, for infrared light supply 301 for providing infrared ray, infrared ray is saturating
Infrared optical material is crossed to be imaged by infrared imaging unit 2.Infrared light supply intensity adjustment knob 302 is for adjusting infrared light
The intensity for the infrared ray that source 301 provides.Power supply 303 is used to power for infrared light supply 301.In the present embodiment, infrared light supply
Intensity adjustment knob 302 be by adjust power supply 303 provide electric current size come control generated in infrared light supply 301 it is infrared
The intensity size of line.
A kind of embodiment according to the present invention, infrared light supply 301 use electric boiling plate, the temperature that electric boiling plate can provide
Ranging from 50-120 DEG C of degree.In the present embodiment, electric boiling plate generates infrared ray by generating high temperature, and temperature gets over high IR
The intensity of line is bigger.Infrared light supply intensity adjustment knob 302 is added by adjusting the size for the electric current that power supply 303 provides to control electricity
The temperature of hot plate, to control generation infrared ray intensity.
A kind of embodiment according to the present invention, as shown in Figure 1, bearing unit 4 includes pedestal 401, holder 402 and bearing
Frame 403.In the present embodiment, pedestal 401 is used for support material clamping adjustment unit 1 and infrared light unit 3.402, holder
It holds on pedestal 401.Bearing support 403 is supported on holder 402 and can be moved up and down along holder 402 infrared for supporting
Imaging unit 2.In the present embodiment, position of the bearing support 403 on holder 402 is adjusted by screwing knob 404.
As shown in Figure 1, in the present embodiment, material clamping adjustment unit 1 is supported on the upper surface of pedestal 401.Bottom
The transverse center line position of seat 401 offers groove 4011, this groove 4011 faces material clamping adjustment unit 1, and ruler
The very little adjustment size of moving range of platform 102 being clamped in adjustment unit 1 with material is consistent.In the present embodiment, infrared
Light source 301 is mounted in groove 4011, and the shifting of the adjustment platform 102 in adjustment unit 1 is equally clamped in infrared light supply 301 with material
The size of dynamic range is consistent.Infrared light supply intensity adjustment knob 302 and power supply 303 are arranged on the side wall of pedestal 401, power supply
303 and infrared light supply intensity adjustment knob 302 be electrically connected with infrared light supply 301 by the way that the transmission line of electricity in pedestal 401 is arranged.
Above-mentioned setting according to the present invention, far infrared microlens 201 of the invention can not observe naked eyes saturating
The internal microdefect of the infrared optical material (silicon, germanium or chalcogenide glass etc.) of far infrared is observed, and can clearly be seen
The different types of defect such as bubble, impurity and/or crackle is observed, and flaw size is demarcated, preserves defect picture, to
Determine the quality of infrared optical material.
Above-mentioned setting according to the present invention, infrared optical material microdefect structure of the detecting device of the invention is simple, far
There is infrared microscopy camera lens 201 itself focusing handwheel 202 can focus, and in addition to this, infrared imaging unit 2 can also be with
It bearing support 403 to move up and down along holder 402, therefore considerably increases the far infrared microlens in infrared imaging unit 2
201 areas imaging so that detection range greatly increases, and testing result is more accurate.
In addition, the material clamping clamping of adjustment unit 1 needs the infrared optical material detected that can be done on pedestal 401 such as figure
Two-dimensional position adjustment on front and back and left and right directions in 1, thus so that the detection of infrared optical material is more flexible,
Test position is flexible and changeable, and can make material clamp holds the infrared optical material of each position in adjustment unit 1 can
It was accurately photographed by far infrared microlens 201 so that detect no dead angle, ensure the precision of batch detection.
Make cost reduction in addition, being heated using electric boiling plate and providing infrared ray, while electric boiling plate is arranged in pedestal 401
In the groove opened up, the volume of device greatly reduced so that the structure of device is simpler, and repair is also more convenient.
Infrared optical material microdefect detection device according to the present invention, operation wavelength are 7~14 microns, can be right
Common infrared optical material, such as chalcogenide glass, silicon, germanium, and plate such material after anti-reflection film and carry out interior microscopic defect
It checks, interior microscopic defect inspection can not be carried out to such material before solving the problems, such as.
Above-mentioned setting according to the present invention utilizes the actually detected infrared optics of infrared optical material microdefect detection device
The method of material includes the following steps：
A. the two-sided blocky infrared optical material for being processed into minute surface is positioned in grain-clamping table 101, and ensures infrared optics
The inspection surface of material is parallel with infrared light supply 301 and far infrared microlens 201；
B. power on 303, the size of electric current is controlled by infrared light supply intensity adjustment knob 302 to adjust infrared light supply
301 are capable of the intensity of infrared radiation；
C. computer video software is opened, the imaging contexts of detection device show completion on the computer screen.Pass through rotation
Button 404 adjusts the upper and lower position of far infrared microlens 201, while observing video and can find the position of imaging.It adjusts adjustable
The bore of diaphragm 5, the infrared spectral range for needing control infrared light supply 301 to send out according to the size of infrared optical material and detection are big
The small requirement for meeting observation.Diaphragm bore appropriate can ensure accuracy of detection to avoid light leakage.Focusing handwheel 202 is adjusted,
The observation position of mobile far infrared microlens 201；
D. the position that the infrared optical material on adjustment platform 102 in grain-clamping table 101 is adjusted by adjusting knob 103 carries out
The specific detection of different location imaging.
In the present invention, for the picture observed, computer video shows that the scale on software can be to finding defect
Size demarcated, the microdefect image observed can be preserved in software.
The above method according to the present invention, it is simple and fast to the detection of infrared optical material microdefect, and can be real
Existing batch detection, and dead angle is not present in detection process, ensures to improve detection efficiency while accuracy of detection.
The foregoing is merely an embodiment of the invention, are not intended to restrict the invention, for this field
For technical staff, the invention may be variously modified and varied.All within the spirits and principles of the present invention, any made by
Modification, equivalent replacement, improvement etc., should all be included in the protection scope of the present invention.
Claims (11)
1. a kind of infrared optical material microdefect detection device, which is characterized in that including：
Adjustment unit (1) is clamped in material, for infrared optical material to be clamped and adjusts the position of infrared optical material；
Infrared imaging unit (2) is located at the side of material clamping adjustment unit (1), for being focused to infrared optical material
Imaging；
Infrared light unit (3) is located at the other side of material clamping adjustment unit (1), for providing infrared ray；
Bearing unit (4), for supporting the material clamping adjustment unit (1), infrared imaging unit (2) and infrared light unit
(3)；
The infrared imaging unit (2) includes the far infrared microlens (201).
2. infrared optical material microdefect detection device according to claim 1, which is characterized in that further include being located at institute
State the adjustable diaphragm (5) between material clamping adjustment unit (1) and the infrared light unit (3), the light of the adjustable diaphragm (5)
Late bore adjustable range is 5-80mm.
3. infrared optical material microdefect detection device according to claim 1, which is characterized in that the material clamping
Adjustment unit (1) includes being put down for the adjustment of the grain-clamping table of infrared optical material (101), the bearing grain-clamping table (101) to be clamped
Platform (102) and the adjusting knob on the adjustment platform (102) for driving the adjustment platform (102) mobile
(103)。
4. infrared optical material microdefect detection device according to claim 1, which is characterized in that the infrared imaging
Unit (2) further include the focal length for adjusting the far infrared microlens (201) focusing handwheel (202), with it is described remote red
The far infrared deterctor (203) of outer microlens (201) electrical connection.
5. infrared optical material microdefect detection device according to claim 4, which is characterized in that the far infrared is visited
Survey the LWIR Uncooled type detector that device (203) is 640x480 arrays, 17 μm of pixel spacing.
6. infrared optical material microdefect detection device according to claim 1, which is characterized in that the infrared light list
First (3) include for providing the infrared light supply of infrared ray (301), the infrared light for adjusting the infrared light supply (301) intensity
Source strength adjusting knob (302) and the power supply (303) powered for the infrared light supply (301).
7. infrared optical material microdefect detection device according to claim 6, which is characterized in that the infrared light supply
(301) it is electric boiling plate, the available temperature range of electric boiling plate is 50-120 DEG C.
8. infrared optical material microdefect detection device according to claim 6, which is characterized in that the bearing unit
(4) include the pedestal (401) for supporting the material clamping adjustment unit (1) and the infrared light unit (3), be supported on the bottom
Holder (402) on seat (401), and be supported on the holder (402) and can back and forth be moved along the holder (402)
It employs in the bearing support (403) for supporting the infrared imaging unit (2).
9. infrared optical material microdefect detection device according to claim 8, which is characterized in that the pedestal
(401) there is the groove (4011) for installing the infrared light supply (301)；
The infrared light supply intensity adjustment knob (302) and the power supply (303) are installed on the side of the pedestal (401).
10. a kind of far infrared for the infrared optical material microdefect detection device described in any one of claim 1 to 9
Microlens (201), which is characterized in that including：
The first lens (2011) for being arranged in order from object side to image side along optical axis, the second lens (2012), the third lens
(2013) and the 4th lens (2014)；
First lens (2011), the third lens (2013) and the 4th lens (2014) are germanium system glass, described
Second lens (2012) are chalcogenide glass；
The object side of first lens (2011) and the third lens (2013) is spherical surface, image side surface is aspherical；
The aspherical of the third lens (2013) has diffraction ring band；
The object side and image side surface of second lens (2012) and the 4th lens (2014) are spherical surface.
11. a kind of detection side of infrared optical material microdefect detection device as claimed in any one of claims 1-9 wherein
Method includes the following steps：
A. infrared optical material is positioned in grain-clamping table (101), and ensures infrared optical material and infrared light supply (301) and far
Infrared microscopy camera lens (201) is parallel；
B. power on (303), the size of electric current is controlled by infrared light supply intensity adjustment knob (302) to adjust infrared light supply
(301) it is capable of the intensity of infrared radiation；
C. computer video software is opened, the position of the bore and far infrared microlens (201) of adjustable diaphragm (5) is adjusted；
D. the position that infrared optical material is adjusted by adjusting knob (103) carries out the specific detection of different location imaging.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810209430.2A CN108375584A (en) | 2018-03-14 | 2018-03-14 | Infrared optical material microdefect detection device and far infrared microlens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
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| CN111487253A (en) * | 2020-05-26 | 2020-08-04 | 苏州智慧鹿智能科技有限公司 | CCD camera system for detecting surface defects of products |
| CN113176223A (en) * | 2021-03-23 | 2021-07-27 | 中山大学新华学院 | Infrared spectrophotometry detector |
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