CN108279208B - 45-degree optical fiber sensor based on surface plasmon effect and preparation method - Google Patents

45-degree optical fiber sensor based on surface plasmon effect and preparation method Download PDF

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CN108279208B
CN108279208B CN201810236247.1A CN201810236247A CN108279208B CN 108279208 B CN108279208 B CN 108279208B CN 201810236247 A CN201810236247 A CN 201810236247A CN 108279208 B CN108279208 B CN 108279208B
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optical fiber
substrate
silicon wafer
wafer substrate
glass slide
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CN108279208A (en
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倪海彬
潘超
王婷婷
葛益娴
常建华
刘清惓
倪波
周俊萍
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Nanjing University of Information Science and Technology
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55Specular reflectivity
    • G01N21/552Attenuated total reflection
    • G01N21/553Attenuated total reflection and using surface plasmons
    • G01N21/554Attenuated total reflection and using surface plasmons detecting the surface plasmon resonance of nanostructured metals, e.g. localised surface plasmon resonance
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Abstract

The invention discloses an optical fiber sensor based on surface plasmon effect and 45-degree polishing chamfer and a manufacturing method thereof, wherein the main structure of the sensor is formed by bonding a metal nanopore array structure on an optical fiber with a 45-degree polishing chamfer.

Description

45-degree optical fiber sensor based on surface plasmon effect and preparation method
Technical Field
The invention relates to an optical fiber sensor, in particular to a 45-degree angle optical fiber sensor based on surface plasmons, and belongs to the technical field of optical measurement and sensors.
Background
The optical fiber is a good optical transmission waveguide and has the advantages of light weight, small volume, long transmission distance, no electromagnetic interference and the like. The optical fiber sensor is widely applied to the fields of construction, industrial production, medical treatment, national defense and the like by virtue of the advantages of high sensitivity, high precision and the like.
The surface plasmon is a special electromagnetic wave existing at the interface between the metal and the medium, and has strong binding property to the electric field and the magnetic field under the condition of the propagation of the surface plasmon resonance mode, the field intensity is exponentially attenuated along with the increase of the distance in the direction perpendicular to the interface, and the field intensity and the charge distribution in the metal propagate in a longitudinal wave mode along the direction of the interface. When the plasmon resonance is performed, the energy of the electromagnetic field is limited in a small local part on the interface, the electromagnetic field can be used for transmitting light beams in a small structure, the resonance peak of the surface plasmon can be subjected to red shift along with the increase of the refractive index of the environment or the refractive index of dielectric medium on the interface, and the phenomenon can be used for accurately measuring the change of the refractive index of the local part, so that the electromagnetic field has an important role as environment sensing.
The nano metal hole array has good optical characteristics, namely compared with macroscopic objects and other nano hole arrays, the resonance absorption peak of noble metal is easy to have red shift, and the noble metal nano hole array has strong scattered light, so that the noble metal nano hole array is widely applied in the research fields of ultraviolet visible absorption spectrum, dark field microscopic imaging, local plasma resonance, surface enhanced Raman scattering spectrum, biological sensors, biomedical imaging and the like.
Disclosure of Invention
The invention provides a sensor combining a nano metal hole array and an optical fiber, which aims to solve the problems in the prior art.
In order to achieve the above purpose, the technical scheme provided by the invention is as follows: the utility model provides a 45 degree chamfer fiber sensor based on surface plasmon effect, includes PU basement and optic fibre, PU basement one side is equipped with the nanopore array, optic fibre one end tip is equipped with 45 degree chamfer, PU basement opposite side adhesion is on the optic fibre wall that optic fibre wall and optic fibre tip are acute angle one side, and optic fibre is equipped with 45 degree chamfer one end tip and PU basement are equipped with that nanopore array one side all coats and are had the metal level.
The technical scheme is further designed as follows: the optical fiber comprises an optical fiber, a PU substrate and a glass slide, wherein the optical fiber wall on one side of the optical fiber, to which the PU substrate is adhered, is a smooth plane, one side of the glass slide is adhered to the optical fiber wall on the other side of the optical fiber, and the PU substrate is adhered to the other side of the glass slide.
The nano hole array is a cylindrical hole array, and the nano holes are blind holes.
The axial direction of the nano holes is perpendicular to the arrangement direction of the PU substrate.
One end part of the optical fiber, which is provided with a 45-degree chamfer angle, is coated with silver; the PU substrate is coated with gold on one side provided with the nanopore array.
The PU substrate is provided with a side surface of one side of the nanopore array, and gold is coated at the bottom of the nanopore.
The preparation method for the 45-degree corner cut optical fiber sensor based on the surface plasmon effect comprises the following steps:
step 1, taking a silicon wafer substrate, and manufacturing a nanopore pattern on the silicon wafer substrate by using an electron beam exposure technology;
step 2, cleaning the silicon wafer substrate in the step 1, soaking the substrate in an organosilane solution for 30 minutes, and then flushing the nano-pore structure prepared on the substrate with ethanol and deionized water;
step 3, taking 3ml of UV-curable polymer PDMS, and uniformly spreading the polymer PDMS in the nano holes of the silicon substrate;
step 4, placing the structure obtained in the step 3 in a 60-DEG air blowing box for 3 hours, and stripping PDMS from the silicon substrate;
step 5, uniformly coating PU on the PDMS columnar structure stripped in the step 4, and irradiating with UV light for 60 seconds;
step 6, separating PU from the PDMS adhesive to obtain a PU substrate with a nanopore array, and then depositing gold with the thickness of 90 nanometers on the surface provided with the nanopore;
step 7, taking a glass slide and an optical fiber, respectively ultrasonically cleaning the glass slide and the optical fiber by using acetone, alcohol and deionized water for 10 minutes, and then drying the glass slide and the optical fiber by using nitrogen; treating the glass slide for 5 minutes by using a plasma cleaner;
step 8, cutting the optical fiber to manufacture a section, forming an angle of 45 degrees, and polishing one edge of the optical fiber, which is acute with the section, to form a plane;
step 9, coating an optical fiber adhesive on one side of the polished optical fiber, and adhering the optical fiber on one side of a glass slide glass;
and step 10, adhering the PU substrate with the nanopore array on the other surface of the glass slide glass, thus completing the manufacture of the sensor.
The step of fabricating the nano holes on the silicon wafer substrate in the step 1 comprises the following steps:
step a, a silicon wafer substrate is taken, PMMA glue is used for gluing on the silicon wafer substrate by adopting a spin coating method;
step b, baking the glued silicon wafer substrate in a baking oven at 90 ℃ for 5 to 15 minutes;
step c, the nanometer columnar patterns are aligned at the position to be exposed of the silicon wafer substrate, and then the silicon wafer substrate is subjected to exposure treatment;
step d, placing the exposed silicon wafer substrate into a developing solution for 40 seconds, then rinsing with deionized water, and drying;
step e, after development, placing the silicon wafer substrate into an oven for baking for 15 minutes at 150 ℃;
f, placing the baked silicon wafer substrate into HNA silicon corrosive to corrode;
and g, placing the corroded silicon wafer clamping plate into a plasma photoresist remover, and introducing oxygen to react for photoresist removal to obtain the silicon wafer substrate with the nano holes.
The beneficial effects of the invention are as follows:
the sensor provided by the invention consists of the polished optical fiber with an angle of 45 degrees and the metal nano hole array, compared with the existing sensor, the sensor can detect very small narrow gaps, does not need a large-area detection surface, has the characteristics of low cost, high yield, large scale, easiness in control and the like in the preparation process, is compact in structure size, is easy to integrate on a chip, and has great potential in the chemical biological sensing field.
Drawings
FIG. 1 is a schematic diagram of the structure of the optical fiber test sensor of the present invention.
FIG. 2a is a schematic diagram of the structure of PDMS and silicon substrate in the fabrication steps of the optical fiber sensor according to the present invention.
FIG. 2b is a schematic diagram of the structure of the PDMS gel peeled off in the fabrication step of the optical fiber sensor according to the present invention.
Fig. 2c is a schematic structural diagram of the PU coated PDMS gel in the fabrication step of the optical fiber sensor according to the present invention.
FIG. 2d is a schematic diagram of the structure of a PU with a nanopore array in the fabrication step of the fiber sensor of the present invention.
FIG. 2e is a schematic diagram of a nanopore array with metal deposited in a fiber optic sensor fabrication step according to the present invention.
Fig. 3 is a schematic diagram of the operation of the fiber optic sensor of fig. 1.
FIG. 4 is a graph of reflectance spectra of the fiber optic sensor of FIG. 1 for different environments.
Detailed Description
The invention will now be described in detail with reference to the accompanying drawings and specific examples.
Examples
The 45-degree corner cut optical fiber sensor based on the surface plasmon effect of the embodiment is shown in fig. 1, and structurally comprises a PU substrate 1, a glass slide 2 and an optical fiber 3, wherein a nanopore array is arranged on one side of the PU substrate 1, the nanopore array is a cylindrical hole array, a nanopore is a blind hole, a 45-degree corner cut is arranged at one end of the optical fiber 3, the other side of the PU substrate 1 is adhered to one side of the glass slide 2, the other side of the glass slide 2 is adhered to the optical fiber wall on one side of an acute angle between the optical fiber wall and the optical fiber end, and the metal layer is coated on one side of the optical fiber 3, provided with the 45-degree corner cut, of the one end and the nanopore array.
In this embodiment, in order to obtain a better reflection effect, the axial direction of the nanopore is set to be perpendicular to the setting direction of the PU substrate.
In the embodiment, silver is coated on the end part of the optical fiber, which is provided with the 45-degree chamfer angle; the PU substrate is provided with a side surface of one side of the nanopore array, and gold is coated at the bottom of the nanopore.
As shown in fig. 2a to 2e, the method for manufacturing the 45-degree corner cut optical fiber sensor based on the surface plasmon effect in the embodiment includes the following steps:
step 1a, a silicon wafer substrate is taken and used as a substrate for electron beam exposure, PMMA glue is selected and is coated on the substrate by a spin coating method;
step 1b, baking the glued silicon wafer substrate in a baking oven at 90 ℃ for 5-15 minutes, and accelerating volatilization of a diluent in the adhesive film;
step 1c, accurately overlaying the nano cylindrical graph at the position to be exposed, finding out 3 accurate positions and calibrating to enable the coordinates of the sample platform and the sample to be matched; then exposing the baked silicon wafer substrate;
step 1d, placing the exposed silicon wafer substrate into a developing solution for 40 seconds, then rinsing with deionized water, and drying;
step 1e, after development, placing the silicon wafer substrate into an oven for baking for 15 minutes at 150 ℃;
step 1f, placing the baked silicon wafer substrate into HNA silicon corrosive to corrode;
step 1g, then placing the corroded silicon wafer substrate into a plasma photoresist remover, and introducing oxygen to react for photoresist removal;
step 2, treating the silicon wafer substrate subjected to electron beam exposure by using dimethyl silane for 30 minutes, and then flushing the prepared nano-pore structure on the glass substrate by using ethanol and deionized water;
step 3, uniformly spreading 3ml of UV curable Polymer (PDMS) in the hole array of the silicon substrate;
step 4, placing the PDMS polymer and the silicon substrate in a 60-DEG air blowing box for 3 hours, and slowly stripping the PDMS from the silicon substrate to obtain a PDMS nano-column array;
step 5, uniformly coating PU glue on the nano-pillar array obtained in the step 4, spinning a glass sheet on the PU glue and irradiating the PU glue with UV light for 60 seconds;
step 6, stripping the PDMS glue after irradiation in the step 5 from the PU substrate to obtain a PU substrate with a nanopore array, and then depositing gold with the thickness of 90 nanometers on the surface provided with the nanopores;
step 7, taking a glass slide and an optical fiber, respectively cleaning the glass slide and the optical fiber by using acetone (with the purity of 99.7%), alcohol (with the purity of 99.9%) and deionized water (with the resistivity of 18.2MΩ) for 10 minutes by using ultrasonic waves (40W), drying the glass slide by using nitrogen (with the purity of 99.7%), and then treating the glass slide for 5 minutes by using a plasma cleaner;
step 8, cutting the optical fiber to manufacture a section, forming an angle of 45 degrees, and polishing one side of the optical fiber, which is acute in angle with the section, to form a smooth plane;
step 9, coating an optical fiber adhesive (NOA-61) on one side of the polished optical fiber, and bonding the optical fiber on the back surface of the glass slide glass;
and step 10, adhering the PU substrate provided with the nanopore array and prepared in the step 6 to the other surface of the glass slide glass, and thus completing the manufacture of the sensor.
As shown in fig. 3, the sensor of the present embodiment works on the principle that a polished optical fiber 3 provided with an end face having an angle of 45 degrees is closely attached and bonded to a glass plate glass slide, light transmitted from the optical fiber is first reflected by the end face having an angle of 45 degrees coated with silver to the PU substrate and surface plasmons are excited near the metal nanopore array, partially reflected by the nanopore array, partially coupled again to the optical fiber having an angle of 45 degrees, and transmitted along the optical fiber to the other end of the optical fiber, and a spectrum analyzer 4 is provided at the other end of the optical fiber for analyzing the reflected light. With the change of the refractive index of the surrounding environment, the shift of the plasmon resonance peak on the surface of the nanopore array is caused, and the shift of the narrow-band resonance peak section appears on the reflection spectrum. The narrowband resonance peak value on the reflection spectrum has a one-to-one correspondence with the external environment, so that the external environment can be obtained through calculation.
When the refractive index of the external environment is 1.33 and 1.56 respectively as shown in fig. 4, the reflection spectrum comparison chart measured by the sensor can be seen to cause the shift of the plasmon resonance peak on the surface of the nanopore array when the external environment changes, thereby causing the shift of the narrow-band resonance peak section on the reflection spectrum.
The technical scheme of the invention is not limited to the embodiments, and all technical schemes obtained by adopting equivalent substitution modes fall within the scope of the invention.

Claims (6)

1. A45-degree optical fiber sensor based on a surface plasmon effect is characterized in that: the light-emitting diode comprises a PU substrate and an optical fiber, wherein a nanopore array is arranged on one side of the PU substrate, a 45-degree chamfer is arranged at one end part of the optical fiber, the other side of the PU substrate is adhered to the optical fiber wall on one side of which the optical fiber wall and the optical fiber end part form an acute angle, and a metal layer is coated on one side of the optical fiber, provided with the 45-degree chamfer, of the end part and the side of the PU substrate, provided with the nanopore array;
the optical fiber sensor also comprises a glass slide glass, wherein the optical fiber wall on one side of the optical fiber, to which the PU substrate is adhered, is a smooth plane, one side of the glass slide glass is adhered to the optical fiber wall on the other side of the optical fiber, and the PU substrate is adhered to the other side of the glass slide glass;
the preparation method of the 45-degree optical fiber sensor based on the surface plasmon effect comprises the following steps:
step 1, taking a silicon wafer substrate, and manufacturing a nanopore pattern on the silicon wafer substrate by using an electron beam exposure technology;
step 2, cleaning the silicon wafer substrate in the step 1, soaking the silicon wafer substrate in an organosilane solution for 30 minutes, and then flushing the prepared nano-pore structure on the silicon wafer substrate with ethanol and deionized water;
step 3, taking 3ml of UV-curable polymer PDMS, and uniformly spreading the polymer PDMS in the nano holes of the silicon substrate;
step 4, placing the structure obtained in the step 3 in a 60 ℃ air blowing box for 3 hours, and stripping PDMS from the silicon substrate;
step 5, uniformly coating PU on the PDMS columnar structure stripped in the step 4, and irradiating with UV light for 60 seconds;
step 6, separating PU from the PDMS adhesive to obtain a PU substrate with a nanopore array, and then depositing gold with the thickness of 90 nanometers on the surface provided with the nanopore;
step 7, taking a glass slide and an optical fiber, respectively ultrasonically cleaning the glass slide and the optical fiber by using acetone, alcohol and deionized water for 10 minutes, and then drying the glass slide and the optical fiber by using nitrogen; treating the glass slide glass for 5 minutes by using a plasma cleaner;
step 8, cutting the optical fiber to manufacture a section, forming an angle of 45 degrees, and polishing one edge of the optical fiber, which is acute with the section, to form a plane;
step 9, coating an optical fiber adhesive on one side of the polished optical fiber, and adhering the optical fiber on one side of a glass slide glass;
and step 10, adhering the PU substrate with the nanopore array on the other surface of the glass slide glass, thus completing the manufacture of the sensor.
2. The surface plasmon effect-based 45-degree optical fiber sensor of claim 1 wherein: the nano hole array is a cylindrical hole array, and the nano holes are blind holes.
3. The surface plasmon effect-based 45-degree optical fiber sensor of claim 2 wherein: the axial direction of the nano holes is perpendicular to the arrangement direction of the PU substrate.
4. A 45 degree fiber optic sensor based on surface plasmon effect of claim 3 wherein: one end part of the optical fiber, which is provided with a 45-degree chamfer angle, is coated with silver; the PU substrate is coated with gold on one side provided with the nanopore array.
5. The surface plasmon effect-based 45-degree optical fiber sensor of claim 4 wherein: the PU substrate is provided with a side surface of one side of the nanopore array, and gold is coated at the bottom of the nanopore.
6. The 45-degree optical fiber sensor based on the surface plasmon effect according to claim 1, wherein the step of fabricating the nanopore on the silicon wafer substrate in step 1 is:
step a, a silicon wafer substrate is taken, PMMA glue is used for gluing on the silicon wafer substrate by adopting a spin coating method;
step b, baking the glued silicon wafer substrate in a baking oven at 90 ℃ for 5 to 15 minutes;
step c, the nanometer columnar patterns are aligned at the position to be exposed of the silicon wafer substrate, and then the silicon wafer substrate is subjected to exposure treatment;
step d, placing the exposed silicon wafer substrate into a developing solution for 40 seconds, then rinsing with deionized water, and drying;
step e, after development, placing the silicon wafer substrate into an oven for baking for 15 minutes at 150 ℃;
f, placing the baked silicon wafer substrate into HNA silicon corrosive to corrode;
and g, placing the corroded silicon wafer substrate into a plasma photoresist remover, and introducing oxygen to react for photoresist removal to obtain the silicon wafer substrate with the nano holes.
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