CN108275664A - A kind of high temperature sintering method of purification for aluminium nitride - Google Patents

A kind of high temperature sintering method of purification for aluminium nitride Download PDF

Info

Publication number
CN108275664A
CN108275664A CN201711481757.7A CN201711481757A CN108275664A CN 108275664 A CN108275664 A CN 108275664A CN 201711481757 A CN201711481757 A CN 201711481757A CN 108275664 A CN108275664 A CN 108275664A
Authority
CN
China
Prior art keywords
aluminium nitride
furnace body
shoe
pure nitrogen
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201711481757.7A
Other languages
Chinese (zh)
Other versions
CN108275664B (en
Inventor
吴亮
雷丹
贺广东
黄嘉丽
龚加玮
王琦琨
王智昊
黄毅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aochao photoelectric technology (Hangzhou) Co., Ltd
Original Assignee
Suzhou Trend Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suzhou Trend Optoelectronics Technology Co Ltd filed Critical Suzhou Trend Optoelectronics Technology Co Ltd
Priority to CN201711481757.7A priority Critical patent/CN108275664B/en
Publication of CN108275664A publication Critical patent/CN108275664A/en
Application granted granted Critical
Publication of CN108275664B publication Critical patent/CN108275664B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00Nitrogen; Compounds thereof
    • C01B21/06Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/072Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with aluminium
    • C01B21/0728After-treatment, e.g. grinding, purification
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00Single-crystal growth by condensing evaporated or sublimed materials
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/40AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C30B29/403AIII-nitrides
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/80Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/89Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by mass-spectroscopy

Abstract

The invention discloses a kind of high temperature sintering methods of purification for aluminium nitride can effectively remove the impurity in aluminium nitride powder by multiple multisection type heating and thermal insulation, and repeatedly sintering can be further reduced the impurity in aluminium nitride powder;During heating and thermal insulation, it is passed through the high pure nitrogen of flowing, can efficiently take away the impurity in aluminium nitride powder;By the way that the temperature of sintering is increased to long brilliant temperature, removal impurity that can be more efficient;The aluminium nitride polycrystal of obtained surface irregularity is crushed into dusting cover, high temperature sintering cleans again, and controls temperature under long brilliant temperature, with obtain relatively low impurity content, surfacing, regular shape aluminum nitride sintered body.

Description

A kind of high temperature sintering method of purification for aluminium nitride
Technical field
The present invention relates to aluminum-nitride single crystal Material growth technical fields, more particularly to a kind of high temperature sintering for aluminium nitride Method of purification.
Background technology
Aluminium nitride (AlN) is one of third generation semiconductor material with wide forbidden band, has broad-band gap, high-melting-point, high critical breakdown Field strength, high high-temp stability and the excellent properties such as resistant to chemical etching, are mainly used in light emitting diode (LED), laser diode (LD), in the devices such as second harmonic transmitter and surface acoustic wave.AlN crystal is typical direct band-gap semicondictor, AlN under room temperature Theoretical energy gap Eg=6.2eV of crystal.Since AlN crystal has the band gap of 6.2eV, theoretically highly crystalline quality AlN crystal has very high transmissivity in ultraviolet band, is the ideal substrate of ultrashort wavelength (200-270nm) LED or LD devices Material, currently, the transmission band of AlN crystal at ultraviolet end up to 200nm.
The theoretical calculation fusing point of material is 2800 DEG C, dissociation pressure 20MPa, and therefore, it is difficult to use melt vertical pulling method or temperature The technology of gradient freeze method carries out crystal growth.The growing method of AlN monocrystalline is identical as the growing method of SiC single crystal, is to pass through Physical vapor transport(PVT)Growth.Using containing high concentration in the AlN powders used in PVT method growing AIN monocrystalline The impurity such as oxygen, carbon, these impurity can seriously affect nucleation, two-dimensional growth and the crystal quality of AlN monocrystalline in growth course, because This must carry out high temperature purification to AlN raw materials first before crystal growth, fully remove the impurity such as oxygen and carbon therein, improve former The purity of material.
Aluminium nitride crystallizes during high temperature purification in order to prevent, all controls the purification temperature of aln raw material at present Under crystallization temperature, and temperature is higher, and the efficiency of removal of impurities is also higher.
Invention content
The object of the present invention is to provide a kind of high temperature sintering method of purification for aluminium nitride, it can be sintered to obtain impurity and contain Measure lower aluminum nitride sintered body.
In order to achieve the above objectives, the technical solution adopted by the present invention is:
A kind of high temperature sintering method of purification for aluminium nitride includes the steps that carrying out successively(a)And step(b);Wherein, step (a)At least cycle carries out primary, and in step(b)It carries out before;
Step(a):
(1)Aluminium nitride powder is put into shoe, and the shoe is placed in furnace body, and the furnace body is taken out true It is empty;
(2)Heating the shoe makes the temperature of aluminium nitride powder reach 900-1200 DEG C, and keeps 4-8h, by following anti- It answers, takes away partial impurities:
2Al(OH)3=Al2O3+3H2O(g);
2Al(OOH)=Al2O3+H2O(g);
Aluminium nitride powder is sintered into aluminum nitride sintered body in the shoe;
(3)The high pure nitrogen of 50-90Kpa is passed through into the furnace body, while heating the shoe to make aluminum nitride sintered body Temperature reach 1400-1600 DEG C, and keep 4-8h, by reacting as follows, take away partial impurities:
Al2O3(s)+3C+N2(g)=2AlN(g)+3CO(g);
Circulation status of the high pure nitrogen in the furnace body is kept, takes the foreign gas that reaction generates out of the furnace body;
(4)The high pure nitrogen of 50-90Kpa is passed through into the furnace body, while heating the shoe to make aluminum nitride sintered body Temperature reach 2000-2300 DEG C, and keep 6-10h, by reacting as follows, take away partial impurities:
Al2O3+4Al(g)=3Al2O(g);
Circulation status of the high pure nitrogen in the furnace body is kept, takes the foreign gas that reaction generates out of the furnace body;
(5)Cool down to the shoe, the temperature of aluminum nitride sintered body is made to be down to 100 DEG C;
(6)Aluminum nitride sintered body is cooled to room temperature, takes out and crushes aluminum nitride sintered body, be carried out at the same time dusting cover, nitrogenized Aluminium powder;
Step(b):
(7)The aluminium nitride powder obtained after dusting cover is put into the shoe, and the shoe is placed in the stove In body;
(8)Heating the shoe makes the temperature of aluminium nitride powder reach 900-1200 DEG C, and keeps 2-4h, by following anti- It answers, takes away partial impurities:
2Al(OH)3=Al2O3+3H2O(g);
2Al(OOH)=Al2O3+H2O(g);
Aluminium nitride powder is sintered into aluminum nitride sintered body in the shoe;
(9)The high pure nitrogen of 50-90Kpa is passed through into the furnace body, while heating the shoe to make aluminum nitride sintered body Temperature reach 1400-1600 DEG C, and keep 2-4h, by reacting as follows, take away partial impurities:
Al2O3(s)+3C+N2(g)=2AlN(g)+3CO(g);
Circulation status of the high pure nitrogen in the furnace body is kept, takes the foreign gas that reaction generates out of the furnace body;
(10)The high pure nitrogen of 50-90Kpa is passed through into the furnace body, while heating the shoe to make aluminum nitride sintered body Temperature reach 1800-2000 DEG C, and keep 4-8h, by reacting as follows, take away partial impurities:
Al2O3+4Al(g)=3Al2O(g);
Circulation status of the high pure nitrogen in the furnace body is kept, takes the foreign gas that reaction generates out of the furnace body.
Preferably, in step(6)In, pass sequentially through the sieve of 50 mesh, the sieve of 100 mesh, the sieve of 200 mesh, 500 purposes Sieve carries out dusting cover to the aluminum nitride sintered body after crushing, to obtain aluminium nitride powder.
Preferably, in step(5)In, rate of temperature fall is 5-10 DEG C/min.
Preferably, in step(3)In, the high pure nitrogen of 60-80Kpa is passed through into the furnace body.
Preferably, in step(4)In, the high pure nitrogen of 60-80Kpa is passed through into the furnace body.
Preferably, in step(9)In, the high pure nitrogen of 60-80Kpa is passed through into the furnace body.
Preferably, in step(10)In, the high pure nitrogen of 60-80Kpa is passed through into the furnace body.
Due to the application of the above technical scheme, the present invention has following advantages compared with prior art:A kind of use of the present invention In the high temperature sintering method of purification of aluminium nitride, multisection type heating and thermal insulation can effectively remove the impurity in aluminium nitride powder, more Secondary sintering can be further reduced the impurity in aluminium nitride powder;It, being capable of higher by the way that the temperature of sintering is increased to long brilliant temperature The removal impurity of effect;The aluminium nitride polycrystal of obtained surface irregularity is crushed into dusting cover, high temperature sintering cleans again, and And control temperature is under long brilliant temperature, with obtain relatively low impurity content, surfacing, regular shape aluminum nitride sintered body.
Specific implementation mode
Technical scheme of the present invention is further elaborated with reference to specific embodiment.
Above-mentioned a kind of high temperature sintering method of purification for aluminium nitride, for being sintered the aluminum nitride powder containing trace impurity End, in the present embodiment, the purity of the aluminium nitride powder is 99%.Since aluminium nitride is during manufacture and preservation, meeting and air In water and oxygen reaction, generate AlOOH, Al (OH)3、Al2O3Equal impurity, bring the impurity elements such as hydrogen, oxygen, carbon.
In aluminium nitride powder production process:
Al2O3(s)+3C(s)+N2(g)→2AlN(s)+3CO(g);
The reaction causes to contain C impurity and Al in the aluminium nitride powder produced2O3Impurity.
The aerial reaction of aluminium nitride powder:
AlN(s)+2H2O(g)→AlOOH(s)+NH3(g);
AlN(s)+3H2O(g)→Al(OH)3(s)+NH3(g);
AlN(s)+O2(g)→Al2O3(s)+N2(g);
The reaction causes to contain AlOOH impurity As l (OH) in aluminium nitride powder3Impurity, Al2O3Impurity.
Here is an a kind of specific embodiment of aln raw material high temperature purification method, and this method includes carrying out successively Step(a)And step(b);Wherein, step(a)At least cycle carries out primary, and in step(b)It carries out before;In this implementation In example, step(a)It only carries out primary.
Step(a):
(1)Aluminium nitride powder is put into shoe, and shoe is placed in furnace body, and furnace body is vacuumized;
(2)Heating shoe makes the temperature of aluminium nitride powder reach 900-1200 DEG C, and keeps 4-8h, by reacting as follows, Take away partial impurities:
2Al(OH)3=Al2O3+3H2O(g);
2Al(OOH)=Al2O3+H2O(g);
Aluminium nitride powder is sintered into aluminum nitride sintered body in shoe;In the present embodiment, heating heating shoe So that the temperature of aluminium nitride powder is reached 1000 DEG C, and keeps 6h;
(3)The high pure nitrogen of 50-90Kpa is passed through into furnace body, while heating shoe makes the temperature of aluminum nitride sintered body reach To 1400-1600 DEG C, and 4-8h is kept, by reacting as follows, takes away partial impurities:
Al2O3(s)+3C+N2(g)=2AlN(g)+3CO(g);
Circulation status of the high pure nitrogen in furnace body is kept, takes the foreign gas that reaction generates out of furnace body;In the present embodiment, The high pure nitrogen of 60-80Kpa is passed through into furnace body;Heating shoe makes the temperature of aluminum nitride sintered body reach 1500 DEG C, and Keep 6h;
(4)The high pure nitrogen of 50-90Kpa is passed through into furnace body, while heating shoe makes the temperature of aluminum nitride sintered body reach To 2000-2300 DEG C, and 6-10h is kept, by reacting as follows, takes away partial impurities:
Al2O3+4Al(g)=3Al2O(g);
Circulation status of the high pure nitrogen in furnace body is kept, takes the foreign gas that reaction generates out of furnace body;In the present embodiment, The high pure nitrogen of 60-80Kpa is passed through into furnace body;Heating shoe makes the temperature of aluminum nitride sintered body reach 2200 DEG C, and Keep 8h;
In step(4)In, since heating temperature has reached the long brilliant temperature of aluminium nitride, although temperature is higher, impurities removing efficiency it is higher and Impurity-eliminating effect is preferable, but obtained aluminium nitride polycrystal surface irregularity, is not used to crystal growth;
(5)Cool down to shoe, the temperature of aluminum nitride sintered body is made to be down to 100 DEG C;In the present embodiment, rate of temperature fall For 5-10 DEG C/min;
(6)Aluminum nitride sintered body is cooled to room temperature, takes out and crushes aluminum nitride sintered body, be carried out at the same time dusting cover, nitrogenized Aluminium powder;In the present embodiment, the aluminum nitride sintered body that will be cooled to room temperature is wrapped up with high-purity aluminum foil multilayer, the nitrogen that will be wrapped Change aluminum sinter body and is placed on punching press crushing in high rigidity press machine groove;
The sieve of the sieve of 50 mesh, the sieve of 100 mesh, the sieve of 200 mesh, 500 mesh is passed sequentially through to the aluminium nitride burning after crushing Knot body carries out dusting cover, to obtain aluminium nitride powder;Aluminium nitride powder diameter after sieve screens is less than 25um, passes through sieve Aluminium foil impurity is filtered out, ensures the high-purity of aluminium nitride powder;Aluminium nitride powder screening operates in glove box, leads in glove box Enter high pure nitrogen, can avoid aluminium nitride powder and reacted with the vapor in air and oxygen, avoids introducing carbon, oxygen, hydrogen impurity;
Step(b):
(7)The aluminium nitride powder obtained after dusting cover is put into shoe, and shoe is placed in furnace body;
(8)Heating shoe makes the temperature of aluminium nitride powder reach 900-1200 DEG C, and keeps 2-4h, by reacting as follows, Take away partial impurities:
2Al(OH)3=Al2O3+3H2O(g);
2Al(OOH)=Al2O3+H2O(g);
Aluminium nitride powder is sintered into aluminum nitride sintered body in shoe;In the present embodiment, heating shoe makes nitrogen The temperature for changing aluminium powder reaches 1000 DEG C, and keeps 2h;
(9)The high pure nitrogen of 50-90Kpa is passed through into furnace body, while heating shoe makes the temperature of aluminum nitride sintered body reach To 1400-1600 DEG C, and 2-4h is kept, by reacting as follows, takes away partial impurities:
Al2O3(s)+3C+N2(g)=2AlN(g)+3CO(g);
Circulation status of the high pure nitrogen in furnace body is kept, takes the foreign gas that reaction generates out of furnace body;In the present embodiment, The high pure nitrogen of 60-80Kpa is passed through into furnace body;Heating shoe makes the temperature of aluminium nitride powder reach 1500 DEG C, and protects Hold 2h;
(10)The high pure nitrogen of 50-90Kpa is passed through into furnace body, while heating shoe makes the temperature of aluminum nitride sintered body reach To 1800-2000 DEG C, and 4-8h is kept, by reacting as follows, takes away partial impurities:
Al2O3+4Al(g)=3Al2O(g);
Circulation status of the high pure nitrogen in furnace body is kept, takes the foreign gas that reaction generates out of furnace body;In the present embodiment, The high pure nitrogen of 60-80Kpa is passed through into furnace body;Heating shoe makes the temperature of aluminium nitride powder reach 1900 DEG C, and protects Hold 4h.
Due to step(10)In temperature be not up to the long brilliant temperature of aluminium nitride, therefore step(10)After, aluminium nitride The surfacing of sintered body disclosure satisfy that the needs of long crystalline substance.
By the above method, can obtain relatively low impurity content, surfacing, regular shape aluminum nitride sintered body.
In the present embodiment, twice(Three sections every time)High temperature sintering obtains aluminum nitride sintered body, passes through glow discharge spectrometry (GDMS)Test, wherein oxygen content are 150ppm, and carbon content 100ppm, which is high purity silicon nitride aluminum sinter Body.According to actual needs, suitably increase sintering number, to reach the purity of requirement.
The above embodiments merely illustrate the technical concept and features of the present invention, and its object is to allow person skilled in the art Scholar can understand present disclosure and be implemented, and it is not intended to limit the scope of the present invention, all according to the present invention Equivalent change or modification made by Spirit Essence should all cover within the scope of the present invention.

Claims (7)

1. a kind of high temperature sintering method of purification for aluminium nitride, it is characterised in that:Include the steps that carrying out successively(a)And step (b);Wherein, step(a)At least cycle carries out primary, and in step(b)It carries out before;
Step(a):
(1)Aluminium nitride powder is put into shoe, and the shoe is placed in furnace body, and the furnace body is taken out true It is empty;
(2)Heating the shoe makes the temperature of aluminium nitride powder reach 900-1200 DEG C, and keeps 4-8h, by following anti- It answers, takes away partial impurities:
2Al(OH)3=Al2O3+3H2O(g);
2Al(OOH)=Al2O3+H2O(g);
Aluminium nitride powder is sintered into aluminum nitride sintered body in the shoe;
(3)The high pure nitrogen of 50-90Kpa is passed through into the furnace body, while heating the shoe to make aluminum nitride sintered body Temperature reach 1400-1600 DEG C, and keep 4-8h, by reacting as follows, take away partial impurities:
Al2O3(s)+3C+N2(g)=2AlN(g)+3CO(g);
Circulation status of the high pure nitrogen in the furnace body is kept, takes the foreign gas that reaction generates out of the furnace body;
(4)The high pure nitrogen of 50-90Kpa is passed through into the furnace body, while heating the shoe to make aluminum nitride sintered body Temperature reach 2000-2300 DEG C, and keep 6-10h, by reacting as follows, take away partial impurities:
Al2O3+4Al(g)=3Al2O(g);
Circulation status of the high pure nitrogen in the furnace body is kept, takes the foreign gas that reaction generates out of the furnace body;
(5)Cool down to the shoe, the temperature of aluminum nitride sintered body is made to be down to 100 DEG C;
(6)Aluminum nitride sintered body is cooled to room temperature, takes out and crushes aluminum nitride sintered body, be carried out at the same time dusting cover, nitrogenized Aluminium powder;
Step(b):
(7)The aluminium nitride powder obtained after dusting cover is put into the shoe, and the shoe is placed in the stove In body;
(8)Heating the shoe makes the temperature of aluminium nitride powder reach 900-1200 DEG C, and keeps 2-4h, by following anti- It answers, takes away partial impurities:
2Al(OH)3=Al2O3+3H2O(g);
2Al(OOH)=Al2O3+H2O(g);
Aluminium nitride powder is sintered into aluminum nitride sintered body in the shoe;
(9)The high pure nitrogen of 50-90Kpa is passed through into the furnace body, while heating the shoe to make aluminum nitride sintered body Temperature reach 1400-1600 DEG C, and keep 2-4h, by reacting as follows, take away partial impurities:
Al2O3(s)+3C+N2(g)=2AlN(g)+3CO(g);
Circulation status of the high pure nitrogen in the furnace body is kept, takes the foreign gas that reaction generates out of the furnace body;
(10)The high pure nitrogen of 50-90Kpa is passed through into the furnace body, while heating the shoe to make aluminum nitride sintered body Temperature reach 1800-2000 DEG C, and keep 4-8h, by reacting as follows, take away partial impurities:
Al2O3+4Al(g)=3Al2O(g);
Circulation status of the high pure nitrogen in the furnace body is kept, takes the foreign gas that reaction generates out of the furnace body.
2. a kind of high temperature sintering method of purification for aluminium nitride according to claim 1, it is characterised in that:In step (6)In, the sieve of the sieve of 50 mesh, the sieve of 100 mesh, the sieve of 200 mesh, 500 mesh is passed sequentially through to the aluminium nitride after crushing Sintered body carries out dusting cover, to obtain aluminium nitride powder.
3. a kind of high temperature sintering method of purification for aluminium nitride according to claim 1, it is characterised in that:In step (5)In, rate of temperature fall is 5-10 DEG C/min.
4. a kind of high temperature sintering method of purification for aluminium nitride according to claim 1, it is characterised in that:In step (3)In, the high pure nitrogen of 60-80Kpa is passed through into the furnace body.
5. a kind of high temperature sintering method of purification for aluminium nitride according to claim 1, it is characterised in that:In step (4)In, the high pure nitrogen of 60-80Kpa is passed through into the furnace body.
6. a kind of high temperature sintering method of purification for aluminium nitride according to claim 1, it is characterised in that:In step (9)In, the high pure nitrogen of 60-80Kpa is passed through into the furnace body.
7. a kind of high temperature sintering method of purification for aluminium nitride according to claim 1, it is characterised in that:In step (10)In, the high pure nitrogen of 60-80Kpa is passed through into the furnace body.
CN201711481757.7A 2017-12-29 2017-12-29 High-temperature sintering purification method for aluminum nitride Active CN108275664B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201711481757.7A CN108275664B (en) 2017-12-29 2017-12-29 High-temperature sintering purification method for aluminum nitride

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201711481757.7A CN108275664B (en) 2017-12-29 2017-12-29 High-temperature sintering purification method for aluminum nitride

Publications (2)

Publication Number Publication Date
CN108275664A true CN108275664A (en) 2018-07-13
CN108275664B CN108275664B (en) 2021-12-07

Family

ID=62802782

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201711481757.7A Active CN108275664B (en) 2017-12-29 2017-12-29 High-temperature sintering purification method for aluminum nitride

Country Status (1)

Country Link
CN (1) CN108275664B (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109576783A (en) * 2019-01-23 2019-04-05 山东大学 A kind of preprocessing method of raw materials for high quality aluminum nitride crystal growth
CN110015648A (en) * 2019-03-28 2019-07-16 北京中材人工晶体研究院有限公司 A kind of high-purity aluminium nitride powder and aluminium nitride powder method of purification
CN113789573A (en) * 2021-11-16 2021-12-14 山西中科潞安紫外光电科技有限公司 Method for preparing AlN crystal by spontaneous nucleation through PVT method
CN114873570A (en) * 2022-07-11 2022-08-09 山西中科潞安半导体技术研究院有限公司 Method and device for purifying aluminum nitride powder by adopting PVT (polyvinyl dichloride) method
CN116143085A (en) * 2022-12-26 2023-05-23 奥趋光电技术(杭州)有限公司 Preparation method of high-purity aluminum nitride raw material

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4172754A (en) * 1978-07-17 1979-10-30 National Research Development Corporation Synthesis of aluminum nitride
US20030168003A1 (en) * 2001-12-24 2003-09-11 Schowalter Leo J. Method and apparatus for producing large, single-crystals of aluminum nitride
JP2006315940A (en) * 2005-04-13 2006-11-24 Sumitomo Electric Ind Ltd METHOD FOR GROWING AlN SINGLE CRYSTAL AND AlN SINGLE CRYSTAL
CN106395770A (en) * 2016-06-30 2017-02-15 北京华进创威电子有限公司 A purifying device and a purifying method for an aluminium nitride raw material
CN106498491A (en) * 2016-11-02 2017-03-15 中国电子科技集团公司第四十六研究所 A kind of purifying plant of vapor phase method crystal growth raw material and its method of purification
CN106637411A (en) * 2016-12-22 2017-05-10 苏州奥趋光电技术有限公司 Growth method of aluminum nitride single crystals
CN106757322A (en) * 2016-12-22 2017-05-31 苏州奥趋光电技术有限公司 A kind of aln raw material high temperature purification method

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4172754A (en) * 1978-07-17 1979-10-30 National Research Development Corporation Synthesis of aluminum nitride
US20030168003A1 (en) * 2001-12-24 2003-09-11 Schowalter Leo J. Method and apparatus for producing large, single-crystals of aluminum nitride
JP2006315940A (en) * 2005-04-13 2006-11-24 Sumitomo Electric Ind Ltd METHOD FOR GROWING AlN SINGLE CRYSTAL AND AlN SINGLE CRYSTAL
CN106395770A (en) * 2016-06-30 2017-02-15 北京华进创威电子有限公司 A purifying device and a purifying method for an aluminium nitride raw material
CN106498491A (en) * 2016-11-02 2017-03-15 中国电子科技集团公司第四十六研究所 A kind of purifying plant of vapor phase method crystal growth raw material and its method of purification
CN106637411A (en) * 2016-12-22 2017-05-10 苏州奥趋光电技术有限公司 Growth method of aluminum nitride single crystals
CN106757322A (en) * 2016-12-22 2017-05-31 苏州奥趋光电技术有限公司 A kind of aln raw material high temperature purification method

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
KANG HUK LEE, ET AL: "Purification and Size control of AlN Powder for AlN Single Crystal Growth", 《MATERIALS SCIENCE FORUM》 *
SHISHKIN RA, ET AL: "The Advanced Aluminum Nitride Synthesis Methods and Its Applications:Patent Review", 《RECENT PATENTS ON NANOTECHNOLOGY》 *
杨清华等: "氮化铝粉体制备的研究及展望", 《陶瓷学报》 *
汪佳等: "单晶生长用AlN粉料的烧结提纯工艺实验研究", 《半导体光电》 *

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109576783A (en) * 2019-01-23 2019-04-05 山东大学 A kind of preprocessing method of raw materials for high quality aluminum nitride crystal growth
CN110015648A (en) * 2019-03-28 2019-07-16 北京中材人工晶体研究院有限公司 A kind of high-purity aluminium nitride powder and aluminium nitride powder method of purification
CN110015648B (en) * 2019-03-28 2021-05-04 中材人工晶体研究院有限公司 High-purity aluminum nitride powder and aluminum nitride powder purification method
CN113789573A (en) * 2021-11-16 2021-12-14 山西中科潞安紫外光电科技有限公司 Method for preparing AlN crystal by spontaneous nucleation through PVT method
CN114873570A (en) * 2022-07-11 2022-08-09 山西中科潞安半导体技术研究院有限公司 Method and device for purifying aluminum nitride powder by adopting PVT (polyvinyl dichloride) method
CN114873570B (en) * 2022-07-11 2022-09-27 山西中科潞安半导体技术研究院有限公司 Method and device for purifying aluminum nitride powder by adopting PVT (polyvinyl dichloride) method
CN116143085A (en) * 2022-12-26 2023-05-23 奥趋光电技术(杭州)有限公司 Preparation method of high-purity aluminum nitride raw material

Also Published As

Publication number Publication date
CN108275664B (en) 2021-12-07

Similar Documents

Publication Publication Date Title
CN108275664A (en) A kind of high temperature sintering method of purification for aluminium nitride
US7524376B2 (en) Method and apparatus for aluminum nitride monocrystal boule growth
KR101738638B1 (en) Method for producing gallium trichloride gas and method for producing nitride semiconductor crystal
WO2015053341A1 (en) Method for producing group iii nitride crystal, group iii nitride crystal, semiconductor device and apparatus for producing group iii nitride crystal
JP5721095B2 (en) Aluminum nitride crystal particle manufacturing apparatus and aluminum nitride crystal particle manufacturing method
KR101356381B1 (en) Method and apparatus for manufacturing gallium nitride free-standing substrate
CN106757322A (en) A kind of aln raw material high temperature purification method
TW201122149A (en) Reactor, chemical vapor deposition reactor, and metal organic chemical vapor deposition reactor
US6911083B2 (en) Method for producing powders made of gallium nitride and apparatus for producing the same
CN110670135B (en) Gallium nitride single crystal material and preparation method thereof
JP5744052B2 (en) Manufacturing apparatus and manufacturing method of aluminum nitride single crystal
JP2008285401A (en) Method for manufacturing group iii nitride single crystal substrate, and stacked substrate obtained by stacking group iii nitride single crystal substrate
WO2014141959A1 (en) METHOD AND DEVICE FOR MANUFACTURING GALLIUM NITRIDE (GaN) FREE-STANDING SUBSTRATE
CN105463577A (en) Method for producing group iii nitride crystal, and apparatus for producing the same
JP5229735B2 (en) Method for producing AlN crystal
CN101200808A (en) Method for developing zinc oxide crystallite by chemical gas-phase transmitting process
WO2012029864A1 (en) Method for producing silicon carbide single crystal
JP2009221056A (en) Crystal growth method, crystal growth apparatus, and semiconductor device
JP4034261B2 (en) Method for producing group III nitride
JP4590636B2 (en) Method for producing aluminum nitride single crystal
JP4779848B2 (en) Group 13 metal nitride crystal manufacturing method and semiconductor device manufacturing method using the same
KR101539073B1 (en) METHOD FOR MANUFACTURING SEMI-POLAR GaN TEMPLATE
KR101253426B1 (en) Preparation method of aluminum nitride powder
JP2006182596A (en) Method for manufacturing nitride crystal of group iii element, nitride crystal of group iii element obtained by the method, and semiconductor device including the nitride crystal
CN115125617B (en) Method for preparing self-supporting gallium nitride bulk single crystal by setting temperature gradient

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
TA01 Transfer of patent application right

Effective date of registration: 20211111

Address after: 310000 Room 518, floor 5, building 3, 503 Shunfeng Road, Yuhang Economic and Technological Development Zone, Yuhang District, Hangzhou, Zhejiang Province

Applicant after: Aochao photoelectric technology (Hangzhou) Co., Ltd

Address before: 215699 103, building D, international student entrepreneurship Park, No. 1, Guotai North Road, Zhangjiagang City, Suzhou City, Jiangsu Province (Austrian trend Optoelectronics)

Applicant before: Suzhou aoxu Photoelectric Technology Co., Ltd

TA01 Transfer of patent application right
GR01 Patent grant
GR01 Patent grant