CN108274396B - Low-speed liquid flow control device and method for supplying optical polishing slurry - Google Patents
Low-speed liquid flow control device and method for supplying optical polishing slurry Download PDFInfo
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- CN108274396B CN108274396B CN201711431964.1A CN201711431964A CN108274396B CN 108274396 B CN108274396 B CN 108274396B CN 201711431964 A CN201711431964 A CN 201711431964A CN 108274396 B CN108274396 B CN 108274396B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
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Abstract
The invention relates to a low-speed liquid flow control method for supplying optical polishing slurry. The device used comprises: the liquid storage tank is used for storing the slurry; the liquid suction pipe extends into the liquid storage tank and is connected with a three-way valve, and the three-way valve is also connected with an air filter valve; the three-way valve alternately points to the liquid suction pipe and the air filter valve; one end of the pump is connected with the three-way valve, the other end of the pump is connected with a pipeline, the pipeline is used for conveying slurry, and the pump is used for controlling the flow rate of the slurry; a nozzle disposed at the other end of the conduit. The device and the method provided by the invention save cost, improve the utilization rate of the slurry and conveniently realize low-speed supply.
Description
Technical Field
The invention relates to the technical field of supply devices of optical polishing slurry, in particular to a low-speed liquid flow control device for supplying optical polishing slurry and a low-speed liquid flow control method for supplying optical polishing slurry.
Background
During the grinding and polishing process of the optical element, the pressure and the relative speed generated by the grinding head are transmitted to the surface of the workpiece through the grinding material, so that the material removal is realized. The abrasive is prepared in the form of suspension or solution and is used in the grinding or polishing process, and is called as an abrasive or polishing solution. The processing precision requirement of the optical element is high and reaches submicron level, so that the method has extremely high requirement on the removal rate stability of the material. Wherein a change in the concentration of abrasive particles within the slurry directly affects a change in the material removal rate. In the feeding process, once the slurry is settled, the optical polishing efficiency is greatly influenced.
The supply of slurry is typically powered using a pump, with the slurry being supplied directly to the workpiece surface via a serpentine tube. The prior art scheme is as follows: the slurry feeding speed is increased, so that the liquid moving at high speed scours the settled abrasive, and the abrasive is wrapped and transported. This type of delivery requires the use of excess slurry, which can add significant cost to the process. In particular, the method has a significant limitation in the use of ultra-hard materials (diamond as an abrasive) such as large-diameter elements (meter-diameter, several liters of slurry), silicon carbide and the like.
Due to the increased feed rate, the actual amount of slurry used is much greater than the process demand. To solve this problem, the circulation system can be increased to recycle the slurry, but the risk of slurry contamination is increased, and scratches are likely to be generated on the optical surface, which affects the optical quality. In addition, the use of recycle systems and the raffinate in the recycle system also add to the cost.
Switchable gas and liquid release and delivery devices, systems and methods are disclosed in the prior art, the device comprising: a cartridge configured to include one or more chambers, wherein one or more odoriferous substances are contained in the respective chambers; a housing configured to include a compartment to hold the cartridge; an opening to allow the one or more odoriferous substances to be dispensed from the device to an external environment; and one or more transfer channels formed between the compartment and the opening, wherein each of the one or more transfer channels is configured to facilitate the odoriferous substance from the respective chamber to the opening; and an actuator switch disposed in the respective transmission channel and operable to move between an open position and a closed position based on an applied signal to selectively allow passage of the scented material from the respective transmission path. Although the technical scheme can switch the gas or liquid source for supplying, the mixing of different conveying substances cannot be avoided, an alternate air liquid column cannot be automatically generated, a micro-circulation form cannot be formed, and the technical scheme is difficult to be used for supplying suspension slurry.
There is disclosed in the prior art a pipe for conveying a suspension, the pipe comprising: the PPH plastic layer, the steel pipe layer and the magnet layer; the PPH plastic layer is fixed on the inner side wall of the steel pipe layer; the magnet layer is fixed on the outer side wall of the steel pipe layer; when the suspension is conveyed by the pipeline, the suspension in the suspension is attached to the surface of the PPH plastic layer under the action of the magnetic force of the magnet layer to form a protective layer. The technical scheme of the pipeline for conveying the suspension liquid is that the magnetic iron suspension liquid is adsorbed by the magnet layer to reduce the sedimentation. However, most of the abrasive particles used for optical surface polishing do not have ferromagnetism, and the abrasives often require higher purity and are not suitable for adding auxiliary substances with ferromagnetism, which makes the technical scheme difficult to apply in the optical polishing process.
Disclosure of Invention
In order to solve the above-mentioned problems in the prior art, embodiments of the present invention provide a low-speed liquid flow control apparatus for optical polishing slurry supply and a low-speed liquid flow control method for optical polishing slurry supply.
In the present invention, the abrasive and the polishing liquid mentioned in the background art are collectively referred to as a polishing slurry, simply referred to as a slurry.
In a first aspect, the present invention provides a low-speed fluid flow control device for optical polishing slurry supply, comprising: the liquid storage tank is used for storing the slurry; the liquid suction pipe extends into the liquid storage tank and is connected with a three-way valve, and the three-way valve is also connected with an air filter valve; the three-way valve alternately points to the liquid suction pipe and the air filter valve; one end of the pump is connected with the three-way valve, the other end of the pump is connected with a pipeline, the pipeline is used for conveying slurry, and the pump is used for controlling the flow rate of the slurry; a nozzle disposed at the other end of the conduit.
In the invention, the two-position three-way valve is controlled by the circulating delay relay, so that the three-way valve can be automatically and periodically switched between two states, and the three-way valve can also be called as the two-position three-way valve with the delay circulation function. In the invention, the air filter valve is a filter screen with a hole in the middle or a valve connected with an air filter, and the purpose of the air filter valve is to ensure that the entering air does not contain large-particle impurities, so that the grinding or polishing of the optical surface is avoided being influenced, and the effect can be realized.
In some embodiments, the pump is selected from one of a peristaltic pump, a self-primer pump, or a diaphragm pump.
In some embodiments, the low-speed fluid flow control device further comprises an agitator located inside the fluid reservoir.
In some embodiments, the three-way valve includes a solenoid valve and a time control switch.
In some embodiments, the pipe is made of a material including, but not limited to, one of PU, TPU, EVA, and PVC. Further preferably, the pipe is a polyurethane pipe (PU pipe).
In a second aspect, the present invention also provides a low-speed liquid flow control method for supplying optical polishing slurry, which is performed by using the low-speed liquid flow control apparatus provided by the present invention, and comprises the steps of:
s1, slurry is filled in the liquid storage tank, the three-way valve points to the air filter valve, the pump is in a closed state, and no object is transported in the pipeline;
s2, opening a three-way valve, wherein the three-way valve alternately points to a liquid suction pipe and an air filter valve;
and S3, adjusting the rotation speed of the pump.
In the invention, the circulation time delay relay controls the three-way valve to switch in two states (the three-way valve alternately points to the liquid suction pipe and the air filter valve, namely, the three-way valve alternately switches between a 'pointing liquid suction pipe' and a 'pointing air filter valve', wherein the 'pointing liquid suction pipe' refers to a state that the three-way valve is communicated with the liquid suction pipe at the public end, and the 'pointing air filter valve' refers to a state that the three-way valve is communicated with the air filter valve at the public end).
In some embodiments, the step S2 includes: a three-way valve is opened, the three-way valve is directed to the dip tube and held for a time t1, and the three-way valve is directed to the air filter valve and held for a time t 2.
In some embodiments, t1 ≦ 3s, t2 ≧ 0.5 s. t1 should not be too large to ensure that the aspect ratio of the droplets within the tube is close to 1 and that a sufficiently significant micro-annulus flow is generated. t2 should not be too small, otherwise the amount of air entering the pipe is not sufficient to separate two adjacent droplets.
The value of t1/t2 does not need to be definitely limited, and the effective feeding rate of the slurry can be adjusted by setting the ratio of t1/t 2. Preferably, in some embodiments, 0.1 ≦ t1/t2 ≦ 3.
In some embodiments, the object being conveyed into the conduit is a medium immiscible with the slurry in the reservoir when the three-way valve is directed to the air filter valve.
The invention has the beneficial effects that: the low-speed liquid flow control device for supplying the optical polishing slurry and the low-speed liquid flow control method for supplying the optical polishing slurry provided by the invention save the cost, improve the utilization rate of the slurry and conveniently realize low-speed supply.
Drawings
FIG. 1 is a schematic diagram of interface distribution and surface tension according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of slurry delivery within a feed tube according to an embodiment of the present invention;
FIG. 3 is a schematic structural diagram of a low-speed liquid flow control device according to an embodiment of the invention;
FIG. 4 is a timing diagram illustrating device operation and status according to one embodiment of the present invention.
In the figure, 100, a low-speed liquid flow control device; 1. abrasive particles; 2. a base fluid; 3. a micro-circulation; 5. a contact angle; 8. an air filter valve; 9. a three-way valve; 10. a liquid drawing pipe; 11. a stirrer; 12. a liquid storage tank; 6. sizing agent; 7. air; 13. a pump; 4. a pipeline; 14. a nozzle; 15. an optical element.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be described in further detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not to be construed as limiting the invention.
In the present invention, the abrasives and the polishing liquid (i.e., the mixture of the abrasive particles and the base liquid, which are classified into abrasives and the polishing liquid according to the purpose) mentioned in the background art are collectively referred to as a polishing slurry, and simply referred to as a slurry.
Fig. 3 is a schematic structural diagram of a low-speed fluid flow control apparatus 100 according to an embodiment of the invention, wherein the low-speed fluid flow control apparatus 100 for optical polishing slurry supply includes: a liquid storage tank 12 for storing the slurry 6; the liquid suction pipe 10 extends into the liquid storage tank 12, the liquid suction pipe 10 is connected with a three-way valve 9, and the three-way valve 9 is also connected with an air filter valve 8; the three-way valve alternately points to the liquid suction pipe and the air filter valve; one end of the pump 13 is connected with the three-way valve 9, the other end of the pump 13 is connected with a pipeline 4, the pipeline 4 is used for conveying the slurry 6, and the pump 13 is used for controlling the flow rate of the slurry; a nozzle 14, said nozzle 14 being arranged at the other end of said conduit 4, directing the slurry 6 towards the surface of the optical element 15.
Fig. 1 is a schematic diagram showing interface distribution and surface tension, which is a tensile force perpendicular to a boundary line generated by a liquid surface layer due to an imbalance of molecular attractive force, according to an embodiment of the present invention. The inventors of the present invention found through a large number of experimental studies that the droplets of the base liquid 2, which is mainly water, form a contact angle 5 on the wall surface of the pipe 4 due to the presence of the surface tension σ. Without loss of generality, consider the liquid transport process from left to right as: the reverse resistance exists between the base liquid 2 drop and the pipeline 4, so that the bottom of the base liquid 2 drop generates a flow from right to left relative to the whole base liquid 2 drop; by means of the upward trend of the contact angle, a micro-circulation 3 is formed in the lower half of the droplet of the base liquid 2. When the abrasive particles 1 slowly settle in the liquid drops of the base liquid 2, the micro-circulation 3 plays a role in flushing and stirring, and the abrasive particles 1 are inhibited from depositing on the bottom of the pipe wall of the pipeline 4. If a conventional continuous flow is used instead of a droplet-like form like the droplets of the base liquid 2, no effective micro-circulation 3 can be formed inside the liquid. Moreover, due to the wall resistance of the pipe 4, the flow rate of the bottom liquid is reduced, which is more disadvantageous to avoid the deposition of the abrasive particles 1.
Fig. 2 is a schematic diagram of slurry delivery in a supply pipe according to an embodiment of the present invention, which has been found through a number of experimental studies: the method of achieving bulk slurry 6 delivery includes: in a particular embodiment, the slurry 6 is fed using a conduit 4, and within the conduit 4, a flow of the slurry 6 is formed alternating with a column of air. The pump 13 is used as a kinetic energy and controls the flow rate. A nozzle 14 is inserted at the end of the pipe 4 to direct the slurry 6 to the surface of the optical element 15.
In a specific embodiment, as the power, a pump capable of generating suction pressure may be used, for example, the pump 13 is selected from one of a peristaltic pump, a self-priming pump, and a diaphragm pump.
In a specific embodiment, the low-speed liquid flow control device 100 further comprises an agitator 11, and the agitator 11 is located inside the liquid storage tank 12 and is preferably continuously agitated by the agitator to keep the slurry 6 uniform and consistent.
In a particular embodiment, the three-way valve 9 comprises a solenoid valve and a time control switch for cyclically switching the state of the two-position three-way solenoid valve, creating an alternate delivery of droplets and a column of air.
In a particular embodiment, the pipe 4 is a PU pipe.
In a second aspect, the present invention also provides a low-speed liquid flow control method for supplying optical polishing slurry, which is performed by using the low-speed liquid flow control apparatus provided by the present invention, and comprises the steps of:
s1, slurry is filled in the liquid storage tank, the three-way valve points to the air filter valve, the pump is in a closed state, and no object is transported in the pipeline;
s2, opening a three-way valve, wherein the three-way valve alternately points to a liquid suction pipe and an air filter valve;
and S3, adjusting the rotation speed of the pump.
In a specific embodiment, the step S2 includes: a three-way valve is opened, the three-way valve is directed to the dip tube and held for a time t1, and the three-way valve is directed to the air filter valve and held for a time t 2.
FIG. 4 is a timing diagram illustrating the operation and status of the device according to one embodiment of the present invention. In fig. 4, from top to bottom, the first line is the operation of the three-way valve, the second line is the operation of the pump, and the third line is the pipe state of the pipe. Here, the pipe state refers to a conveyance state within the pipe. In a specific embodiment, the device operation and status timing diagram of an embodiment of the present invention can be described as follows: first, the slurry 6 is stored in the stock tank 12 and continuously stirred by the stirrer 11 to keep the slurry 6 uniform. In a normal state, the three-way valve 9 points to the air filter valve 8, the pump 1 is in a closed state, and no object is transported in the PU pipe. Then, at time line L1, pump 13 is turned on and ambient air is delivered in conduit 4 via air filter valve 8. At time line L2, the three-way valve 9 is opened and the three-way valve 9 starts to alternately point to the dip tube 10 and the air filter valve 8, i.e. alternately switches between the first state and the second state, which can be described as: when the three-way valve 9 points to the liquid suction pipe 10 and is maintained for a period of time t1, recording as a first state, wherein the pipeline state is slurry conveying; the second state is noted when the three-way valve 9 is directed to the air filter valve 8 and maintained for a period of time t2, at which time the pipe state is delivery air. The first state and the second state are alternately switched, and liquid flow conveyed in sections is generated in the pipeline 4 in the form of a section of slurry and a section of air which are arranged in a linear periodic manner. That is, in the first state, the liquid suction pipe (10) is opened, and the air filter valve is kept closed, so that the slurry is conveyed into the pipeline through the pump; in the second state, the three-way valve closes the dip tube (10), keeping open with the air filter valve, to deliver air into the pipe through the pump. Preferably, in the invention, a time relay is used for generating the cyclic delay, and the on-off time setting can be realized by adjusting the oscillation frequency, namely adjusting the resistance value and the capacitance value of the oscillator.
In the above process, preferably, the flow rate of the liquid supply can be adjusted by the following two methods:
(a) the flow rate of the slurry 6 can be adjusted by adjusting the rotation speed of the pump 13; the control of the flow rate by the pump includes both the slurry and the air: the overall effect is to affect the rate at which slurry is supplied to the workpiece surface.
(b) By adjusting the time ratio t1/t2 of the three-way valve 9 in the first state and the second state, the duty cycle of the slurry 6 in the conduit 4 can be adjusted. The inventors of the present invention have found that to better ensure the same feed rate, the flow rate of the liquid/gas is greater and the abrasive is less likely to settle.
Finally, the slurry 6 and air are transported to the nozzle and directed to the optical work surface 15 for grinding or polishing.
In a specific embodiment, t1 is less than or equal to 3s, and t2 is more than or equal to 0.5 s. t1 should not be too large to ensure that the aspect ratio of the droplets within the tube is close to 1 and that a sufficiently significant micro-annulus flow is generated. t2 should not be too small, otherwise the amount of air entering the pipe is not sufficient to separate two adjacent droplets.
The value of t1/t2 does not need to be definitely limited, and the effective feeding rate of the slurry can be adjusted by setting the ratio of t1/t 2. Preferably, in a specific embodiment, 0.1. ltoreq. t1/t 2. ltoreq.3.
In a specific embodiment, when the three-way valve is directed to the air filter valve, the object to be transported into the pipeline is not necessarily air, as long as the medium is immiscible with the slurry in the liquid storage tank. For example, working conditions using water as the base fluid may use castor oil instead of air.
In a specific embodiment, each liquid drop is isolated by air in the pipe of the invention, and the liquid is conveyed in a way of one section of air and one section of liquid. Further, the flow rate of the slurry 6 supply is adjusted by adjusting the time ratio of the three-way valve 9 in the first state and the second state.
The invention has the beneficial effects that: in the case of low-speed supply of the slurry, the abrasive deposition phenomenon can be greatly reduced. The near-net utilization of the slurry is realized, and the slurry in the liquid storage tank can be fully utilized.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the present invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention.
In the description of the present invention, it is to be understood that the terms "central," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the invention and to simplify the description, and are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and are therefore not to be considered limiting of the invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through an intermediate. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.
Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention, and that variations, modifications, substitutions and alterations can be made to the above embodiments by those of ordinary skill in the art within the scope of the present invention.
The above-described embodiments of the present invention should not be construed as limiting the scope of the present invention. Any other corresponding changes and modifications made according to the technical idea of the present invention should be included in the protection scope of the claims of the present invention.
The foregoing embodiments and description have been presented only to illustrate the principles and preferred embodiments of the invention, and various changes and modifications may be made therein without departing from the spirit and scope of the invention as hereinafter claimed.
Claims (8)
1. A low-speed liquid flow control method for supplying optical polishing slurry is characterized in that a using device comprises: the liquid storage tank is used for storing the slurry; the liquid suction pipe extends into the liquid storage tank and is connected with a three-way valve, and the three-way valve is also connected with an air filter valve; the three-way valve alternately points to the liquid suction pipe and the air filter valve; one end of the pump is connected with the three-way valve, the other end of the pump is connected with a pipeline, the pipeline is used for conveying slurry, and the pump is used for controlling the flow rate of the slurry; a nozzle disposed at the other end of the pipe; the control method comprises the following steps:
s1, slurry is filled in the liquid storage tank, the three-way valve points to the air filter valve, the pump is in a closed state, and no object is transported in the pipeline;
s2, opening a three-way valve, wherein the three-way valve alternately points to a liquid suction pipe and an air filter valve; opening a three-way valve, the three-way valve pointing to the liquid suction pipe and keeping for a period of time t1, the three-way valve pointing to the air filter valve and keeping for a period of time t 2; when the three-way valve points to the air filter valve, the object conveyed into the pipeline is a medium which is not mutually soluble with the slurry in the liquid storage tank;
and S3, adjusting the rotation speed of the pump.
2. The method of claim 1, wherein the pump is selected from one of a peristaltic pump, a self-priming pump, and a diaphragm pump.
3. The method of claim 1, further comprising an agitator positioned within the fluid reservoir.
4. The method of claim 1, wherein the three-way valve comprises a solenoid valve and a time control switch.
5. The method of claim 1, wherein the pipe is made of one of PU, EVA and PVC.
6. The method of claim 5, wherein the tubing is made of TPU.
7. The method of claim 1, wherein t1 is less than or equal to 3s, and t2 is greater than or equal to 0.5 s.
8. The method of claim 1, wherein 0.1. ltoreq. t1/t 2. ltoreq.3.
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| CN111408993A (en) * | 2020-03-25 | 2020-07-14 | 中国科学院上海光学精密机械研究所 | Stable automatic liquid dropping device for large-scale ring polishing machine |
| CN112605882A (en) * | 2021-01-11 | 2021-04-06 | 南京长相依贸易有限公司 | Wafer grinding device capable of controlling grinding temperature and grinding agent concentration |
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| CN101208258A (en) * | 2005-03-04 | 2008-06-25 | 波克爱德华兹股份有限公司 | Control of fluid conditions in bulk fluid distribution systems |
| CN102173342A (en) * | 2011-02-24 | 2011-09-07 | 上海鑫霖环境科技有限公司 | System and method for feeding and conveying high-concentration solid powder particle suspension |
| CN202169542U (en) * | 2010-06-03 | 2012-03-21 | 江尻隆夫 | Grinding device |
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| US20060196541A1 (en) * | 2005-03-04 | 2006-09-07 | David Gerken | Control of fluid conditions in bulk fluid distribution systems |
| EP2751255B1 (en) * | 2011-09-01 | 2020-10-21 | GICON Grossmann Ingenieur Consult GmbH | Method and device for feeding gases or gas mixtures into a liquid, suspension, or emulsion in a photobioreactor in a specific manner |
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|---|---|---|---|---|
| CN1247381A (en) * | 1998-08-18 | 2000-03-15 | 液体空气乔治洛德方法利用和研究有限公司 | Equipment and method for transporting substrate mechanical polishing and grinding suspension |
| CN101208258A (en) * | 2005-03-04 | 2008-06-25 | 波克爱德华兹股份有限公司 | Control of fluid conditions in bulk fluid distribution systems |
| CN202169542U (en) * | 2010-06-03 | 2012-03-21 | 江尻隆夫 | Grinding device |
| CN102173342A (en) * | 2011-02-24 | 2011-09-07 | 上海鑫霖环境科技有限公司 | System and method for feeding and conveying high-concentration solid powder particle suspension |
| CN202538706U (en) * | 2011-12-02 | 2012-11-21 | 上海科勒电子科技有限公司 | Liquid feed device for gas and liquid mixing |
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