CN108205232A - A kind of optical tunnel and DLP ray machine lighting systems - Google Patents
A kind of optical tunnel and DLP ray machine lighting systems Download PDFInfo
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- CN108205232A CN108205232A CN201611177937.1A CN201611177937A CN108205232A CN 108205232 A CN108205232 A CN 108205232A CN 201611177937 A CN201611177937 A CN 201611177937A CN 108205232 A CN108205232 A CN 108205232A
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- light
- optical tunnel
- light valve
- hot spot
- area
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/208—Homogenising, shaping of the illumination light
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
- Projection Apparatus (AREA)
Abstract
The present invention relates to optical technical fields,More particularly to a kind of optical tunnel and DLP ray machine lighting systems,To improve the utilization rate of the emergent light of optical tunnel and be emitted to light valve hot spot uniformity,The light-emitting surface of the optical tunnel is irregular quadrilateral,The hot spot that the emergent light of the light-emitting surface of optical tunnel is formed on light valve covers the light valve,And the area of the light valve and the ratio of the area of the hot spot are not less than the first proportion threshold value,And no more than the second proportion threshold value,So that the light spot shape for being irradiated to light valve surface is no longer irregular,But closer to the spot size of light valve actual needs on area,It is and identical with light valve surface beam reception area in shape,Also it is conducive to improve utilization rate of the light valve to light beam in this way,And the uniformity of hot spot optical density is more preferable,Thus the embodiment of the present invention is under the premise of ensureing to cover light valve,Improve the utilization rate of optical tunnel emergent light,The uniformity consistency of projected spot is improved simultaneously.
Description
Technical field
The present invention relates to optical technical field more particularly to a kind of optical tunnel and DLP ray machine lighting systems.
Background technology
Laser display shadow casting technique is emerging projection display technique, and laser projection product is relative to light emitting diode
(Light Emitting Diode, LED) projection products have higher brightness and service life.
It is mainly made of in laser projection product comprising light fixture, light fixture even smooth component and a small amount of lens, even light
Component has two kinds of fly's-eye lens and optical tunnel.Since the energy of laser is excessively high, even light is generally carried out using optical tunnel.
The optical tunnel used in the prior art is mainly based on rectangle optical tunnel, for rectangle optical tunnel, incidence surface
All it is rectangle with light-emitting surface.The emergent light of rectangle optical tunnel is by DLP (Digital Light Procession, at digital light
Reason) after other components in ray machine lighting system, light valve can be projected to, the hot spot that the emergent light of optical tunnel is usually required to be formed
Entire light valve is covered, as shown in Fig. 1 (a), the emergent light for optical tunnel of the prior art is projected to light with side incidence
The schematic diagram of valve surface.Wherein, the light-emitting surface of optical tunnel is rectangle ABCD, and light valve is typically also rectangular configuration, such as Fig. 1 (a)
It is shown, A2B2C2D2For rectangular light valve, therefrom, it can be seen that the hot spot A that rectangle optical tunnel emergent light is formed on light valve1B1C1D1
Area be much larger than light valve A2B2C2D2Area and hot spot shape there is a situation where distortion, for another example, with reference to figure 1 (b), be
The emergent light of optical tunnel of the prior art is projected to the schematic diagram on light valve surface, rectangle optical tunnel emergent light with angle incidence
The hot spot A formed on light valve1B1C1D1Area also much larger than light valve A2B2C2D2Area and the shape of hot spot there is also distortions
Situation, thus the projection of rectangle optical tunnel light spot shape usually because crevice projection angle reason there are the distortions of shape, and to protect
Card light valve surface is irradiated to completely, then it is required that projected spot area is slightly larger than light valve surface area, also, in shape
Distortion also easily leads to the inhomogeneities of light brightness distribution, had both caused the waste of luminous energy, and had also easily caused the inhomogeneities of picture.
In conclusion the outgoing light utilization efficiency of optical tunnel is relatively low in the prior art, and the hot spot for being emitted to light valve is not equal enough
It is even.
Invention content
The present invention provides a kind of optical tunnel and DLP ray machine lighting systems, to improve the utilization rate of the emergent light of optical tunnel
And it is emitted to the uniformity of the hot spot of light valve.
In a first aspect, the embodiment of the present invention provides a kind of optical tunnel, the light-emitting surface of the optical tunnel is irregular quadrilateral,
Hot spot that the emergent light of the light-emitting surface of the optical tunnel is formed on light valve covers the light valve, the shape of the hot spot with it is described
The shape of light valve is identical and the ratio of the area of the area and hot spot of the light valve is not less than the first proportion threshold value, and
No more than the second proportion threshold value.
The light-emitting surface of optical tunnel provided in an embodiment of the present invention be irregular quadrilateral, the emergent light of the light-emitting surface of optical tunnel
The hot spot that is formed on light valve covers the light valve, and the ratio of the area of the light valve and the area of the hot spot is not less than the
One proportion threshold value, and no more than the second proportion threshold value so that the light spot shape for being irradiated to light valve surface is no longer irregular, and
It is closer to the spot size and identical with light valve surface beam reception area in shape of light valve actual needs, in this way on area
Also it is conducive to improve utilization rate of the light valve to light beam, and the uniformity of hot spot optical density is more preferable, thus the embodiment of the present invention is ensureing
Under the premise of covering light valve, the utilization rate of optical tunnel emergent light is improved, while improve the uniformity consistency of projected spot.
Second aspect, the embodiment of the present invention provide a kind of DLP ray machines lighting system, including：
Optical tunnel, illumination microscope group as described above；
The light beam of light source of reception is emitted to the illumination microscope group by the optical tunnel, and is incident to DMD light valves surface.
The embodiment of the present invention provides a kind of DLP ray machines lighting system, due to the use of above-mentioned improved optical tunnel so that
The light spot shape for being irradiated to light valve surface is no longer irregular, but big closer to the hot spot of light valve actual needs on area
It is small and identical with light valve surface beam reception area in shape, it is conducive to improve utilization rate of the light valve to light beam, and hot spot light in this way
The uniformity of density is more preferable, thus improves the utilization rate to light source of DLP ray machine lighting systems；And due to the use of the even light
Stick improves the uniformity consistency for being projected to the hot spot on light valve, thus improves the lighting quality of DLP ray machine lighting systems.
Description of the drawings
To describe the technical solutions in the embodiments of the present invention more clearly, make required in being described below to embodiment
Attached drawing is briefly introduced, it should be apparent that, the accompanying drawings in the following description is only some embodiments of the present invention, for this
For the those of ordinary skill in field, without having to pay creative labor, it can also be obtained according to these attached drawings
His attached drawing.
Fig. 1 (a) is optical tunnel light-emitting surface schematic shapes of the prior art；
Fig. 1 (b) is optical tunnel light-emitting surface schematic shapes of the prior art；
Fig. 2 is optical tunnel light-emitting surface schematic shapes provided in an embodiment of the present invention；
Fig. 3 is light valve schematic diagram of the prior art；
Fig. 4 is optical tunnel light-emitting surface schematic diagram of the prior art；
Fig. 5 is hot spot schematic diagram of the prior art；
Fig. 6 is optical tunnel light-emitting surface schematic diagram provided in an embodiment of the present invention；
Fig. 7 is the hot spot schematic diagram in the embodiment of the present invention；
Fig. 8 is optical tunnel light-emitting surface schematic diagram provided in an embodiment of the present invention；
Fig. 9 is the hot spot schematic diagram in the embodiment of the present invention；
Figure 10 is DLP ray machines lighting system schematic diagram provided in an embodiment of the present invention.
Specific embodiment
To make the objectives, technical solutions, and advantages of the present invention clearer, the present invention is made below in conjunction with attached drawing into
It is described in detail to one step, it is clear that described embodiment is only the implementation of part of the embodiment of the present invention rather than whole
Example.Based on the embodiments of the present invention, those of ordinary skill in the art are obtained without making creative work
All other embodiment, shall fall within the protection scope of the present invention.
The embodiment of the present invention is described in further detail with reference to the accompanying drawings of the specification.
Embodiment one
As shown in Fig. 2, for optical tunnel light-emitting surface schematic shapes provided in an embodiment of the present invention, wherein, optical tunnel goes out
Smooth surface is irregular quadrilateral, and the hot spot that the emergent light of the light-emitting surface of optical tunnel is formed on light valve covers the light valve, described
The shape of hot spot is identical with the shape of the light valve and the ratio of the area and the area of the hot spot of the light valve is not less than
First proportion threshold value, and no more than the second proportion threshold value.
It is light valve schematic diagram of the prior art with reference to Fig. 3, light valve is divided into effective display area, delustring from inside to outside
Area, fenestra and epoxy glue area (encapsulation region), the area of light valve refers to the area of effective display area in the embodiment of the present invention, because
This, in practical applications, in setting, the area of guarantee hot spot is needed, which to be not less than, to be had for the first proportion threshold value and the second proportion threshold value
Viewing area area is imitated, and no more than the sum of delustring area and effective display area area, i.e. the edge of hot spot is located in delustring area.
Specific setting for the first proportion threshold value and the second proportion threshold value, depending on actual needs, the present invention does not do specific limit
It is fixed, for example, the first proportion threshold value is preset as 0.9, and the second proportion threshold value is preset as 1, then
(while ensureing that the edge of hot spot is located in delustring area)；Or first proportion threshold value be preset as 0.95, the second proportion threshold value is preset
It is 1, then(while ensureing that the edge of hot spot is located in delustring area).Preferably, light
The area of spot is equal to the area of light valve.
With reference to Fig. 2, wherein, ABCD is the original light-emitting surface of optical tunnel, is mapped to by the light-emitting surface ABCD illumination being emitted
Light valve A2B2C2D2The hot spot of upper formation such as Fig. 1 (a) show A1B1C1D1；And optical tunnel provided in an embodiment of the present invention, light extraction
Face is quadrangle A3B3C3D3, it is on the basis of original light-emitting surface ABCD, four is pruned by the light-emitting surface to rectangle optical tunnel
A side obtains, light-emitting surface A3B3C3D3In light valve A2B2C2D2The hot spot of upper formation is illustrated in figure 2 A4B4C4D4, optical tunnel goes out
Object-image relation, i.e., the illumination of different optical tunnel light-emitting surfaces outgoing are mapped to projection light hot spot each other on the quadrangle and light valve of smooth surface
The hot spot formed on light valve will be different, in embodiments of the present invention, due to ensureing light valve A2B2C2D2Area and hot spot
A4B4C4D4Area and ratio be less than the first proportion threshold value, and no more than the second proportion threshold value, that is, ensure light valve A2B2C2D2Face
Product and hot spot A4B4C4D4Area approximation, so as to be conducive to improve optical tunnel light-emitting surface emergent light utilization rate.
Wherein, as shown in Fig. 2, four vertex A, B, C, D of light-emitting surface ABCD respectively with the hot spot A on light valve4B4C4D4's
Four vertex A4、B4、C4、D4It corresponds.
When the shape of hot spot is identical with the shape of light valve, and hot spot area it is identical with the area of light valve when, optical tunnel
The hot spot that the emergent light of light-emitting surface is formed on light valve fits like a glove with light valve, thus reaches optimal effect, in the situation
Under so that the emergent light of optical tunnel has all been irradiated on light valve substantially, can considerably improve the utilization of the emergent light of optical tunnel
Rate.
Preferably, the ratio of the first long side of the quadrangle ABCD of optical tunnel and the second long side is 0.8~1, wherein, first
Long side is less than or equal to second long side.
By taking Fig. 2 as an example, the first long side of quadrangle ABCD is C3D3, the second long side is A3D3, wherein C3D3≤A3D3, it is practical
In, it is preferable that C3D3:A3D3Between 0.8~1.
Preferably, the ratio of the first short side of quadrangle ABCD and the second short side is 0.7~1, wherein, the first short side is less than
Or equal to second short side.
By taking Fig. 2 as an example, the first short side of quadrangle ABCD is A3B3, the second short side is B3C3, wherein A3B3≤B3C3, it is practical
In, it is preferable that A3B3:B3C3Between 0.7~1.
Preferably, the ratio of the second short side and the second long side is 0.4~0.8, by taking Fig. 2 as an example, wherein, the second short side is
B3C3It is A with the second long side3D3Ratio between 0.4~0.8.
Preferably, the light-emitting surface of optical tunnel provided in an embodiment of the present invention is parallel with the incidence surface of optical tunnel, for example, entering light
Face and light-emitting surface are all perpendicular to the plane of optical tunnel.
With reference to specific embodiment, illustrated come the effect to optical tunnel provided in an embodiment of the present invention.
Embodiment two
As shown in figure 4, for optical tunnel light-emitting surface schematic diagram of the prior art, wherein, nine are had chosen on light-emitting surface
Point (in figure shown in circle) when the emergent light of optical tunnel is incident to light valve in a manner that angle is incident, is formed on light valve
Nine hot spots point corresponding with nine points on the light-emitting surface of optical tunnel in hot spot is as shown in figure 5, wherein, Fig. 5 is existing
Hot spot schematic diagram in technology, wherein, it can be seen that hot spot point is so apparent that deviate from light valve structure, causes optical tunnel light-emitting surface
Emergent light can not be irradiated to light valve surface, thus light source utilization rate is low.
It is optical tunnel light-emitting surface schematic diagram provided in an embodiment of the present invention with reference to figure 6, using the optical tunnel, through experiment point
It analyses, nine hot spot points on the hot spot formed on light valve surface are as shown in fig. 7, wherein, Fig. 7 is in the embodiment of the present invention
Hot spot schematic diagram, it can be seen that it is apparent that compared to hot spot structure shown in fig. 5, hot spot structure shown in Fig. 7 of the embodiment of the present invention
Into region and light valve region more coincide so that optical tunnel goes out light utilization efficiency higher.
Embodiment three
For another example, when the emergent light of optical tunnel is incident to light valve in a manner that side is incident, what the embodiment of the present invention used
Optical tunnel light-emitting surface is as shown in figure 8, using the optical tunnel, through experimental analysis, nine on hot spot formed on light valve surface
A hot spot point is as shown in figure 9, wherein, Fig. 9 is the hot spot schematic diagram in the embodiment of the present invention, it can be seen that it is apparent that compared to figure
Hot spot structure shown in 5, the region that hot spot shown in Fig. 9 of the embodiment of the present invention is formed more coincide with light valve region, because
And so that optical tunnel goes out light utilization efficiency higher.
The light-emitting surface of optical tunnel provided in an embodiment of the present invention be irregular quadrilateral, the emergent light of the light-emitting surface of optical tunnel
The hot spot that is formed on light valve covers the light valve, and the ratio of the area of the light valve and the area of the hot spot is not less than the
One proportion threshold value, and no more than the second proportion threshold value so that the light spot shape for being irradiated to light valve surface is no longer irregular, and
It is closer to the spot size and identical with light valve surface beam reception area in shape of light valve actual needs, in this way on area
Also it is conducive to improve utilization rate of the light valve to light beam, and the uniformity of hot spot optical density is more preferable, thus the embodiment of the present invention is ensureing
Under the premise of covering light valve, the utilization rate of optical tunnel emergent light is improved, while improve the uniformity consistency of projected spot.
Example IV
The embodiment of the present invention also provides a kind of DLP (digital light processing, Digital Light Processing) ray machine photograph
Bright system, as shown in Figure 10, including：
The optical tunnel of any of the above-described embodiment offer of the present invention, illumination microscope group；
The light beam of light source of reception is emitted to the illumination microscope group by the optical tunnel, and is incident to DMD (Digital
Micromirror Device, digital micromirror device) light valve surface.
The embodiment of the present invention provides a kind of DLP ray machines lighting system, due to the use of above-mentioned improved optical tunnel so that
The light spot shape for being irradiated to light valve surface is no longer irregular, but big closer to the hot spot of light valve actual needs on area
It is small and identical with light valve surface beam reception area in shape, it is conducive to improve utilization rate of the light valve to light beam, and hot spot light in this way
The uniformity of density is more preferable, thus improves the utilization rate to light source of DLP ray machine lighting systems；And due to the use of the even light
Stick improves the uniformity consistency for being projected to the hot spot on light valve, thus improves the lighting quality of DLP ray machine lighting systems.
The present invention be with reference to according to the method for the embodiment of the present invention, the flow of equipment (system) and computer program product
Figure and/or block diagram describe.It should be understood that it can be realized by computer program instructions every first-class in flowchart and/or the block diagram
The combination of flow and/or box in journey and/or box and flowchart and/or the block diagram.These computer programs can be provided
The processor of all-purpose computer, special purpose computer, Embedded Processor or other programmable data processing devices is instructed to produce
A raw machine so that the instruction performed by computer or the processor of other programmable data processing devices is generated for real
The device of function specified in present one flow of flow chart or one box of multiple flows and/or block diagram or multiple boxes.
These computer program instructions, which may also be stored in, can guide computer or other programmable data processing devices with spy
Determine in the computer-readable memory that mode works so that the instruction generation being stored in the computer-readable memory includes referring to
Enable the manufacture of device, the command device realize in one flow of flow chart or multiple flows and/or one box of block diagram or
The function of being specified in multiple boxes.
These computer program instructions can be also loaded into computer or other programmable data processing devices so that counted
Series of operation steps are performed on calculation machine or other programmable devices to generate computer implemented processing, so as in computer or
The instruction offer performed on other programmable devices is used to implement in one flow of flow chart or multiple flows and/or block diagram one
The step of function of being specified in a box or multiple boxes.
Although preferred embodiments of the present invention have been described, but those skilled in the art once know basic creation
Property concept, then can make these embodiments other change and modification.So appended claims be intended to be construed to include it is excellent
It selects embodiment and falls into all change and modification of the scope of the invention.
Obviously, various changes and modifications can be made to the invention without departing from essence of the invention by those skilled in the art
God and range.In this way, if these modifications and changes of the present invention belongs to the range of the claims in the present invention and its equivalent technologies
Within, then the present invention is also intended to include these modifications and variations.
Claims (9)
1. a kind of optical tunnel, which is characterized in that the light-emitting surface of the optical tunnel be irregular quadrilateral, the light extraction of the optical tunnel
The hot spot that the emergent light in face is formed on light valve covers the light valve, and the shape of the hot spot is identical with the shape of the light valve,
And the ratio of the area of the light valve and the area of the hot spot is not less than the first proportion threshold value, and no more than the second ratio threshold
Value.
2. optical tunnel as described in claim 1, which is characterized in that the area of the hot spot is equal to the area of the light valve.
3. optical tunnel as claimed in claim 1 or 2, which is characterized in that the first long side of the quadrangle and the quadrangle
The second long side ratio for 0.8~1, first long side is less than or equal to second long side.
4. optical tunnel as claimed in claim 3, which is characterized in that the of the first short side of the quadrangle and the quadrangle
The ratio of two short sides is 0.7~1, and first short side is less than or equal to second short side.
5. optical tunnel as claimed in claim 4, which is characterized in that the ratio of second short side and second long side is
0.4~0.8.
6. optical tunnel as described in claim 1, which is characterized in that the light-emitting surface of the optical tunnel enters light with the optical tunnel
Face is parallel.
7. optical tunnel as claimed in claim 1 or 2, which is characterized in that 0.9≤first proportion threshold value≤second ratio
Example threshold value≤1.
8. optical tunnel as claimed in claim 1 or 2, which is characterized in that the irregular quadrilateral passes through to rectangle optical tunnel
Light-emitting surface prune four sides and obtain.
9. a kind of number light processing DLP ray machine lighting systems, which is characterized in that including：
Optical tunnel, illumination microscope group as described in claim 1 to 8 is any；
The light beam of light source of reception is emitted to the illumination microscope group by the optical tunnel, and is incident to digital micromirror device DMD light valves
Surface.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910472249.5A CN110161790B (en) | 2016-12-19 | 2016-12-19 | DLP ray apparatus lighting system |
| CN201611177937.1A CN108205232B (en) | 2016-12-19 | 2016-12-19 | A kind of optical tunnel and DLP ray machine lighting system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611177937.1A CN108205232B (en) | 2016-12-19 | 2016-12-19 | A kind of optical tunnel and DLP ray machine lighting system |
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| CN201910472249.5A Division CN110161790B (en) | 2016-12-19 | 2016-12-19 | DLP ray apparatus lighting system |
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| CN108205232A true CN108205232A (en) | 2018-06-26 |
| CN108205232B CN108205232B (en) | 2019-07-30 |
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| CN201910472249.5A Active CN110161790B (en) | 2016-12-19 | 2016-12-19 | DLP ray apparatus lighting system |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN110161790A (en) | 2019-08-23 |
| CN108205232B (en) | 2019-07-30 |
| CN110161790B (en) | 2021-05-11 |
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