CN108205232B - A kind of optical tunnel and DLP ray machine lighting system - Google Patents

A kind of optical tunnel and DLP ray machine lighting system Download PDF

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Publication number
CN108205232B
CN108205232B CN201611177937.1A CN201611177937A CN108205232B CN 108205232 B CN108205232 B CN 108205232B CN 201611177937 A CN201611177937 A CN 201611177937A CN 108205232 B CN108205232 B CN 108205232B
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light
optical tunnel
light valve
hot spot
area
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CN108205232A (en
Inventor
李巍
刘显荣
郭汝海
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Qingdao Hisense Laser Display Co Ltd
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Hisense Group Co Ltd
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Priority to CN201910472249.5A priority Critical patent/CN110161790B/en
Priority to CN201611177937.1A priority patent/CN108205232B/en
Publication of CN108205232A publication Critical patent/CN108205232A/en
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details
    • G03B21/20Lamp housings
    • G03B21/208Homogenising, shaping of the illumination light

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Projection Apparatus (AREA)

Abstract

The present invention relates to optical technical fields, more particularly to a kind of optical tunnel and DLP ray machine lighting system, to improve the utilization rate of the emergent light of optical tunnel and be emitted to light valve hot spot uniformity, the light-emitting surface of the optical tunnel is irregular quadrilateral, the hot spot that the emergent light of the light-emitting surface of optical tunnel is formed on light valve covers the light valve, and the ratio of the area of the area of the light valve and the hot spot is not less than the first proportion threshold value, and it is not more than the second proportion threshold value, so that the light spot shape for being irradiated to light valve surface is no longer irregular, but closer to light valve spot size actually required on area, and it is identical as light valve surface beam reception area in shape, also it is conducive to improve light valve in this way to the utilization rate of light beam, and the uniformity of hot spot optical density is more preferable, thus the embodiment of the present invention is under the premise of guaranteeing to cover light valve, it improves The utilization rate of optical tunnel emergent light, while improving the uniformity consistency of projected spot.

Description

A kind of optical tunnel and DLP ray machine lighting system
Technical field
The present invention relates to optical technical field more particularly to a kind of optical tunnel and DLP ray machine lighting systems.
Background technique
Laser display shadow casting technique is emerging projection display technique, and laser projection product is relative to light emitting diode (Light Emitting Diode, LED) projection products have higher brightness and service life.
It include light fixture in laser projection product, light fixture is mainly made of even smooth component and a small amount of lens, even light Component has fly's-eye lens and two kinds of optical tunnel.Since the energy of laser is excessively high, even light is generally carried out using optical tunnel.
Optical tunnel used in the prior art is mainly based on rectangle optical tunnel, for rectangle optical tunnel, incidence surface It is all rectangle with light-emitting surface.The emergent light of rectangle optical tunnel is by DLP (Digital Light Procession, at digital light Reason) after other components in ray machine lighting system, it can be projected to light valve, the hot spot for usually requiring the emergent light of optical tunnel to be formed Entire light valve is covered, as shown in Fig. 1 (a), light is projected to side incidence for the emergent light of optical tunnel in the prior art The schematic diagram of valve surface.Wherein, the light-emitting surface of optical tunnel is rectangle ABCD, and light valve is typically also rectangular configuration, such as Fig. 1 (a) It is shown, A2B2C2D2For rectangular light valve, therefrom, it can be seen that the hot spot A that rectangle optical tunnel emergent light is formed on light valve1B1C1D1 Area be much larger than light valve A2B2C2D2Area and hot spot shape exist distortion the case where, for another example, with reference to Fig. 1 (b), be The emergent light of optical tunnel in the prior art is projected to the schematic diagram on light valve surface, rectangle optical tunnel emergent light with angle incidence The hot spot A formed on light valve1B1C1D1Area also much larger than light valve A2B2C2D2Area and the shape of hot spot there is also distortions The case where, thus the projection of rectangle optical tunnel light spot shape usually because crevice projection angle reason there are the distortions of shape, and to protect Card light valve surface is irradiated to completely, then it is required that projected spot area is slightly larger than light valve surface area, also, in shape Distortion also easily leads to the inhomogeneities of light brightness distribution, had both caused the waste of luminous energy, and had also easily caused the inhomogeneities of picture.
In conclusion the outgoing light utilization efficiency of optical tunnel is lower in the prior art, and the hot spot for being emitted to light valve is not equal enough It is even.
Summary of the invention
The present invention provides a kind of optical tunnel and DLP ray machine lighting system, the utilization rate of the emergent light to improve optical tunnel And it is emitted to the uniformity of the hot spot of light valve.
In a first aspect, the embodiment of the present invention provides a kind of optical tunnel, the light-emitting surface of the optical tunnel is irregular quadrilateral, Hot spot that the emergent light of the light-emitting surface of the optical tunnel is formed on light valve covers the light valve, the shape of the hot spot with it is described The shape of light valve is identical and the ratio of the area of the area and hot spot of the light valve is not less than the first proportion threshold value, and No more than the second proportion threshold value.
The light-emitting surface of optical tunnel provided in an embodiment of the present invention is irregular quadrilateral, the emergent light of the light-emitting surface of optical tunnel The hot spot that is formed on light valve covers the light valve, and the ratio of the area of the area of the light valve and the hot spot is not less than the One proportion threshold value, and it is not more than the second proportion threshold value, so that the light spot shape for being irradiated to light valve surface is no longer irregular, and It is closer light valve spot size actually required on area, and identical as light valve surface beam reception area in shape, in this way Also it is conducive to improve light valve to the utilization rate of light beam, and the uniformity of hot spot optical density is more preferable, thus the embodiment of the present invention is guaranteeing Under the premise of covering light valve, the utilization rate of optical tunnel emergent light is improved, while improving the uniformity consistency of projected spot.
Second aspect, the embodiment of the present invention provide a kind of DLP ray machine lighting system, comprising:
Optical tunnel, illumination microscope group as described above;
Received light beam of light source is emitted to the illumination microscope group by the optical tunnel, and is incident to DMD light valve surface.
The embodiment of the present invention provides a kind of DLP ray machine lighting system, due to having used above-mentioned improved optical tunnel, so that It is no longer irregular for being irradiated to the light spot shape on light valve surface, but big closer to light valve hot spot actually required on area It is small and identical as light valve surface beam reception area in shape, it is conducive to improve light valve in this way to the utilization rate of light beam, and hot spot light The uniformity of density is more preferable, thus improves the utilization rate to light source of DLP ray machine lighting system;And due to using the even light Stick improves the uniformity consistency for the hot spot being projected on light valve, thus improves the lighting quality of DLP ray machine lighting system.
Detailed description of the invention
To describe the technical solutions in the embodiments of the present invention more clearly, make required in being described below to embodiment Attached drawing is briefly introduced, it should be apparent that, drawings in the following description are only some embodiments of the invention, for this For the those of ordinary skill in field, without any creative labor, it can also be obtained according to these attached drawings His attached drawing.
Fig. 1 (a) is optical tunnel light-emitting surface schematic shapes in the prior art;
Fig. 1 (b) is optical tunnel light-emitting surface schematic shapes in the prior art;
Fig. 2 is optical tunnel light-emitting surface schematic shapes provided in an embodiment of the present invention;
Fig. 3 is light valve schematic diagram in the prior art;
Fig. 4 is optical tunnel light-emitting surface schematic diagram in the prior art;
Fig. 5 is hot spot schematic diagram in the prior art;
Fig. 6 is optical tunnel light-emitting surface schematic diagram provided in an embodiment of the present invention;
Fig. 7 is the hot spot schematic diagram in the embodiment of the present invention;
Fig. 8 is optical tunnel light-emitting surface schematic diagram provided in an embodiment of the present invention;
Fig. 9 is the hot spot schematic diagram in the embodiment of the present invention;
Figure 10 is DLP ray machine lighting system schematic diagram provided in an embodiment of the present invention.
Specific embodiment
To make the objectives, technical solutions, and advantages of the present invention clearer, below in conjunction with attached drawing to the present invention make into It is described in detail to one step, it is clear that described embodiments are only a part of the embodiments of the present invention, rather than whole implementation Example.Based on the embodiments of the present invention, obtained by those of ordinary skill in the art without making creative efforts All other embodiment, shall fall within the protection scope of the present invention.
The embodiment of the present invention is described in further detail with reference to the accompanying drawings of the specification.
Embodiment one
As shown in Fig. 2, being optical tunnel light-emitting surface schematic shapes provided in an embodiment of the present invention, wherein optical tunnel goes out Smooth surface is irregular quadrilateral, and the hot spot that the emergent light of the light-emitting surface of optical tunnel is formed on light valve covers the light valve, described The ratio of the area and the area of the hot spot of the shape of the hot spot light valve identical and described with the shape of the light valve is not less than First proportion threshold value, and it is not more than the second proportion threshold value.
It is light valve schematic diagram in the prior art referring to Fig. 3, light valve is divided into effective display area, delustring from inside to outside Area, fenestra and epoxy glue area (encapsulation region), the area of light valve refers to the area of effective display area in the embodiment of the present invention, because This, in practical applications, the first proportion threshold value and the second proportion threshold value need to guarantee the area of hot spot not less than having in setting Viewing area area is imitated, and is not more than the sum of delustring area and effective display area area, is i.e. the edge of hot spot is located in delustring area.
Specific setting for the first proportion threshold value and the second proportion threshold value, depending on actual needs, the present invention, which is not done, to be had Body limits, for example, the first proportion threshold value is preset as 0.9, and the second proportion threshold value is preset as 1, then(while guaranteeing that the edge of hot spot is located in delustring area);Or first proportion threshold value It is preset as 0.95, the second proportion threshold value is preset as 1, then(while guaranteeing hot spot Edge is located in delustring area).Preferably, the area of hot spot is equal to the area of light valve.
Referring to Fig. 2, wherein ABCD is the original light-emitting surface of optical tunnel, is mapped to by the illumination that light-emitting surface ABCD is emitted Light valve A2B2C2D2The hot spot of upper formation such as Fig. 1 (a) show A1B1C1D1;And optical tunnel provided in an embodiment of the present invention, go out light Face is quadrangle A3B3C3D3, it is to prune four by the light-emitting surface to rectangle optical tunnel on the basis of original light-emitting surface ABCD A side obtains, light-emitting surface A3B3C3D3In light valve A2B2C2D2The hot spot of upper formation is illustrated in figure 2 A4B4C4D4, optical tunnel goes out Object-image relation, i.e., the illumination of different optical tunnel light-emitting surface outgoing are mapped to projection light hot spot each other on the quadrangle and light valve of smooth surface The hot spot formed on light valve will be different, in embodiments of the present invention, due to guaranteeing light valve A2B2C2D2Area and hot spot A4B4C4D4Area and ratio less than the first proportion threshold value, and be not more than the second proportion threshold value, i.e., guarantee light valve A2B2C2D2Face Long-pending and hot spot A4B4C4D4Area approximation, thus be conducive to improve optical tunnel light-emitting surface emergent light utilization rate.
Wherein, as shown in Fig. 2, four vertex A, B, C, D of light-emitting surface ABCD respectively with the hot spot A on light valve4B4C4D4's Four vertex A4、B4、C4、D4It corresponds.
When the shape of hot spot and the shape of light valve are identical, and the area of hot spot is identical as the area of light valve, optical tunnel The hot spot that the emergent light of light-emitting surface is formed on light valve fits like a glove with light valve, thus reaches optimal effect, in the situation Under, so that the emergent light of optical tunnel has all been irradiated on light valve substantially, improve the utilization of the emergent light of optical tunnel with can dramatically Rate.
Preferably, the ratio of the first long side and the second long side of the quadrangle ABCD of optical tunnel is 0.8~1, wherein first Long side is less than or equal to second long side.
By taking Fig. 2 as an example, the first long side of quadrangle ABCD is C3D3, the second long side is A3D3, wherein C3D3≤A3D3, practical In, it is preferable that C3D3:A3D3Between 0.8~1.
Preferably, the ratio of the first short side of quadrangle ABCD and the second short side is 0.7~1, wherein the first short side is less than Or it is equal to second short side.
By taking Fig. 2 as an example, the first short side of quadrangle ABCD is A3B3, the second short side is B3C3, wherein A3B3≤B3C3, practical In, it is preferable that A3B3:B3C3Between 0.7~1.
Preferably, the ratio of the second short side and the second long side is 0.4~0.8, by taking Fig. 2 as an example, wherein the second short side is B3C3It is A with the second long side3D3Ratio between 0.4~0.8.
Preferably, the light-emitting surface of optical tunnel provided in an embodiment of the present invention and the incidence surface of optical tunnel are parallel, for example, entering light Face and light-emitting surface are all perpendicular to the plane of optical tunnel.
Below with reference to specific embodiment, to be illustrated to the effect of optical tunnel provided in an embodiment of the present invention.
Embodiment two
As shown in figure 4, being optical tunnel light-emitting surface schematic diagram in the prior art, wherein have chosen nine on light-emitting surface Point (in figure shown in circle) is formed on light valve when the emergent light of optical tunnel is incident to light valve in such a way that angle is incident Nine hot spots point corresponding with nine points on the light-emitting surface of optical tunnel is as shown in Figure 5 in hot spot, wherein Fig. 5 is existing Hot spot schematic diagram in technology, wherein can be seen that, hot spot point is so apparent that deviate from light valve structure, causes optical tunnel light-emitting surface Emergent light can not be irradiated to light valve surface, thus light source utilization rate is low.
It is optical tunnel light-emitting surface schematic diagram provided in an embodiment of the present invention with reference to Fig. 6, using the optical tunnel, through experiment point It analyses, nine hot spot points on the hot spot formed on light valve surface are as shown in Figure 7, wherein Fig. 7 is in the embodiment of the present invention Hot spot schematic diagram, it can be seen that it is apparent that compared to hot spot structure shown in fig. 5, hot spot structure shown in Fig. 7 of the embodiment of the present invention At region and light valve region more coincide so that optical tunnel go out light utilization efficiency it is higher.
Embodiment three
For another example, when the emergent light of optical tunnel is incident to light valve in such a way that side is incident, what the embodiment of the present invention used Optical tunnel light-emitting surface is as shown in figure 8, using the optical tunnel, through experimental analysis, nine on hot spot that are formed on light valve surface A hot spot point is as shown in Figure 9, wherein Fig. 9 is the hot spot schematic diagram in the embodiment of the present invention, it can be seen that it is apparent that compared to figure Hot spot structure shown in 5, the region and light valve region that hot spot shown in Fig. 9 of the embodiment of the present invention is constituted more coincide, because And make the light utilization efficiency out of optical tunnel higher.
The light-emitting surface of optical tunnel provided in an embodiment of the present invention is irregular quadrilateral, the emergent light of the light-emitting surface of optical tunnel The hot spot that is formed on light valve covers the light valve, and the ratio of the area of the area of the light valve and the hot spot is not less than the One proportion threshold value, and it is not more than the second proportion threshold value, so that the light spot shape for being irradiated to light valve surface is no longer irregular, and It is closer light valve spot size actually required on area, and identical as light valve surface beam reception area in shape, in this way Also it is conducive to improve light valve to the utilization rate of light beam, and the uniformity of hot spot optical density is more preferable, thus the embodiment of the present invention is guaranteeing Under the premise of covering light valve, the utilization rate of optical tunnel emergent light is improved, while improving the uniformity consistency of projected spot.
Example IV
The embodiment of the present invention also provides a kind of DLP (digital light processing, Digital Light Processing) ray machine photograph Bright system, as shown in Figure 10, comprising:
The optical tunnel of any of the above-described embodiment offer of the present invention, illumination microscope group;
Received light beam of light source is emitted to the illumination microscope group by the optical tunnel, and is incident to DMD (Digital Micromirror Device, digital micromirror device) light valve surface.
The embodiment of the present invention provides a kind of DLP ray machine lighting system, due to having used above-mentioned improved optical tunnel, so that It is no longer irregular for being irradiated to the light spot shape on light valve surface, but big closer to light valve hot spot actually required on area It is small and identical as light valve surface beam reception area in shape, it is conducive to improve light valve in this way to the utilization rate of light beam, and hot spot light The uniformity of density is more preferable, thus improves the utilization rate to light source of DLP ray machine lighting system;And due to using the even light Stick improves the uniformity consistency for the hot spot being projected on light valve, thus improves the lighting quality of DLP ray machine lighting system.
The present invention be referring to according to the method for the embodiment of the present invention, the process of equipment (system) and computer program product Figure and/or block diagram describe.It should be understood that every one stream in flowchart and/or the block diagram can be realized by computer program instructions The combination of process and/or box in journey and/or box and flowchart and/or the block diagram.It can provide these computer programs Instruct the processor of general purpose computer, special purpose computer, Embedded Processor or other programmable data processing devices to produce A raw machine, so that being generated by the instruction that computer or the processor of other programmable data processing devices execute for real The device for the function of being specified in present one or more flows of the flowchart and/or one or more blocks of the block diagram.
These computer program instructions, which may also be stored in, is able to guide computer or other programmable data processing devices with spy Determine in the computer-readable memory that mode works, so that it includes referring to that instruction stored in the computer readable memory, which generates, Enable the manufacture of device, the command device realize in one box of one or more flows of the flowchart and/or block diagram or The function of being specified in multiple boxes.
These computer program instructions also can be loaded onto a computer or other programmable data processing device, so that counting Series of operation steps are executed on calculation machine or other programmable devices to generate computer implemented processing, thus in computer or The instruction executed on other programmable devices is provided for realizing in one or more flows of the flowchart and/or block diagram one The step of function of being specified in a box or multiple boxes.
Although preferred embodiments of the present invention have been described, it is created once a person skilled in the art knows basic Property concept, then additional changes and modifications can be made to these embodiments.So it includes excellent that the following claims are intended to be interpreted as It selects embodiment and falls into all change and modification of the scope of the invention.
Obviously, various changes and modifications can be made to the invention without departing from essence of the invention by those skilled in the art Mind and range.In this way, if these modifications and changes of the present invention belongs to the range of the claims in the present invention and its equivalent technologies Within, then the present invention is also intended to include these modifications and variations.

Claims (9)

1. a kind of optical tunnel, which is characterized in that the light-emitting surface of the optical tunnel is irregular quadrilateral, and the optical tunnel goes out light The hot spot that the emergent light in face is formed on light valve covers the light valve, and the shape of the hot spot is identical as the shape of the light valve, And the ratio of the area of the area of the light valve and the hot spot is not less than the first proportion threshold value, and is not more than the second ratio threshold Value.
2. optical tunnel as described in claim 1, which is characterized in that the area of the hot spot is equal to the area of the light valve.
3. optical tunnel as claimed in claim 1 or 2, which is characterized in that the first long side of the quadrangle and the quadrangle The second long side ratio be 0.8~1, first long side be less than or equal to second long side.
4. optical tunnel as claimed in claim 3, which is characterized in that the of the first short side of the quadrangle and the quadrangle The ratio of two short sides is 0.7~1, and first short side is less than second short side.
5. optical tunnel as claimed in claim 4, which is characterized in that the ratio of second short side and second long side is 0.4~0.8.
6. optical tunnel as described in claim 1, which is characterized in that the light-emitting surface of the optical tunnel enters light with the optical tunnel Face is parallel.
7. optical tunnel as claimed in claim 1 or 2, which is characterized in that 0.9≤first proportion threshold value≤second ratio Example threshold value≤1.
8. optical tunnel as claimed in claim 1 or 2, which is characterized in that the irregular quadrilateral passes through to rectangle optical tunnel Light-emitting surface prune four sides and obtain.
9. a kind of number light processing DLP ray machine lighting system characterized by comprising
Optical tunnel as described in any of the claims 1 to 8, illumination microscope group;
Received light beam of light source is emitted to the illumination microscope group by the optical tunnel, and is incident to digital micromirror device DMD light valve Surface.
CN201611177937.1A 2016-12-19 2016-12-19 A kind of optical tunnel and DLP ray machine lighting system Active CN108205232B (en)

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CN201611177937.1A CN108205232B (en) 2016-12-19 2016-12-19 A kind of optical tunnel and DLP ray machine lighting system

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