CN108165933A - The film plating process of prism - Google Patents
The film plating process of prism Download PDFInfo
- Publication number
- CN108165933A CN108165933A CN201810035926.2A CN201810035926A CN108165933A CN 108165933 A CN108165933 A CN 108165933A CN 201810035926 A CN201810035926 A CN 201810035926A CN 108165933 A CN108165933 A CN 108165933A
- Authority
- CN
- China
- Prior art keywords
- prism
- plating process
- film plating
- coated
- ether
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of film plating process of prism, include the following steps：A) matrix is cleaned；B) it is fixed；C) prepare before vapor deposition；D) it is coated with；E) pickup.The present invention is first dusted oil removing to the surface of prism, then carries out plated film to the surface of prism using vacuum evaporation technique again, facilitates the thickness of control plated film, coating effects are good.
Description
Technical field
The present invention relates to field of optical equipment more particularly to a kind of film plating process of prism.
Background technology
In recent years, optical thin film is coated in plane of crystal, oneself is through being widely used on the various devices of optical film.Prism is
The polyhedron made by transparent material (such as glass, crystal), using very wide in optical instrument.When making prism, in order to subtract
Few reflection loss, increases transmitance, need to deposit anti-reflection film on surface.
Invention content
To overcome disadvantages mentioned above, the purpose of the present invention is to provide a kind of film plating process of prism.
In order to reach object above, the technical solution adopted by the present invention is：A kind of film plating process of prism, including following step
Suddenly：
A) matrix is cleaned：Prism desire coated surface is cleaned up using cleaning solution；
B) it is fixed：Fixation in fixture is put into after no stains are examined under brighter light, fixture is mounted on work
On part frame；
C) prepare before vapor deposition：Vacuum chamber is cleared up, prepare coating materials and is positioned in cold-crucible, by cold-crucible placement and base
On platform, base station and work rest are put into vacuum chamber, by vacuum chamber, heated jig, rotational workpieces frame, fritting coating materials；
D) it is coated with：Baffle can be opened when reaching the pressure of requirement to be deposited, and used when film reaches the thickness of needs
Baffle blocks evaporation source, is coated with completion；
E) pickup：Stop heating after the completion of being coated with and close high pressure valve, allow sample natural cooling, treat vacuum room temperature
Taking-up sample measures after air is filled with when basically reaching room temperature.
Preferably, cleaning solution described in the step a) uses the ether that carbon atom number is 2-6 for the alcohol of 2-6, carbon atom number
Or its mixture.
Preferably, cleaning solution described in the step a) using alcohol and ether mixed liquor, the alcohol and ether
Ratio is 1-4, and the mass concentration ratio of the alcohol and ether is 80%-100%, and scavenging period is 1-10 minutes.
Preferably, the coating materials in the step c) is MgF2。
Preferably, pressure described in the step d) should be less than 6 × 10-3Pa。
Beneficial effects of the present invention：Using above-mentioned steps, oil removing is first dusted to the surface of prism, then again using true
Empty evaporation technique carries out plated film to the surface of prism, facilitates the thickness of control plated film, and coating effects are good.
Specific embodiment
The preferred embodiments of the present invention will be described in detail below so that advantages and features of the invention can be easier to by
It will be appreciated by those skilled in the art that so as to make a clearer definition of the protection scope of the present invention.
【Embodiment one】
A kind of film plating process of prism in the present embodiment, includes the following steps：
A) matrix is cleaned：Prism desire coated surface is cleaned up using cleaning solution；
B) it is fixed：Fixation in fixture is put into after no stains are examined under brighter light, fixture is mounted on work
On part frame；
C) prepare before vapor deposition：Vacuum chamber is cleared up, prepare coating materials and is positioned in cold-crucible, by cold-crucible placement and base
On platform, base station and work rest are put into vacuum chamber, by vacuum chamber, heated jig, rotational workpieces frame, fritting coating materials；
D) it is coated with：Baffle can be opened when reaching the pressure of requirement to be deposited, and used when film reaches the thickness of needs
Baffle blocks evaporation source, is coated with completion；
E) pickup：Stop heating after the completion of being coated with and close high pressure valve, allow sample natural cooling, treat vacuum room temperature
Taking-up sample measures after air is filled with when basically reaching room temperature.
For cleaning solution described in the step a) using the mixed liquor of alcohol and ether, the ratio of the alcohol and ether is 3：
1, the mass concentration ratio of the alcohol and ether is 95%, and scavenging period is 5 minutes.
In the present embodiment, the coating materials in the step c) is MgF2.
In the present embodiment, pressure described in the step d) is 3 × 10-3Pa.
The spectrophotometer of 712 Shanghai Optical Instrument Factory No.2 is used to detect light transmittance for 55%.
【Embodiment two】
A kind of film plating process of prism in the present embodiment, includes the following steps：
A) matrix is cleaned：Prism desire coated surface is cleaned up using cleaning solution；
B) it is fixed：Fixation in fixture is put into after no stains are examined under brighter light, fixture is mounted on work
On part frame；
C) prepare before vapor deposition：Vacuum chamber is cleared up, prepare coating materials and is positioned in cold-crucible, by cold-crucible placement and base
On platform, base station and work rest are put into vacuum chamber, by vacuum chamber, heated jig, rotational workpieces frame, fritting coating materials；
D) it is coated with：Baffle can be opened when reaching the pressure of requirement to be deposited, and used when film reaches the thickness of needs
Baffle blocks evaporation source, is coated with completion；
E) pickup：Stop heating after the completion of being coated with and close high pressure valve, allow sample natural cooling, treat vacuum room temperature
Taking-up sample measures after air is filled with when basically reaching room temperature.
In the present embodiment, cleaning solution described in the step a) uses hexanol, and the mass concentration ratio of the hexanol is
80%, scavenging period is 1 minute.
In the present embodiment, the coating materials in the step c) is MgF2.
In the present embodiment, pressure described in the step d) should be 5 × 10-3Pa.
The spectrophotometer of 712 Shanghai Optical Instrument Factory No.2 is used to detect light transmittance as 40%, less than embodiment one.
【Embodiment three】
A kind of film plating process of prism in the present embodiment, includes the following steps：
A) matrix is cleaned：Prism desire coated surface is cleaned up using cleaning solution；
B) it is fixed：Fixation in fixture is put into after no stains are examined under brighter light, fixture is mounted on work
On part frame；
C) prepare before vapor deposition：Vacuum chamber is cleared up, prepare coating materials and is positioned in cold-crucible, by cold-crucible placement and base
On platform, base station and work rest are put into vacuum chamber, by vacuum chamber, heated jig, rotational workpieces frame, fritting coating materials；
D) it is coated with：Baffle can be opened when reaching the pressure of requirement to be deposited, and used when film reaches the thickness of needs
Baffle blocks evaporation source, is coated with completion；
E) pickup：Stop heating after the completion of being coated with and close high pressure valve, allow sample natural cooling, treat vacuum room temperature
Taking-up sample measures after air is filled with when basically reaching room temperature.
In the present embodiment, cleaning solution described in the step a) uses hexyl ether.The mass concentration ratio of the hexyl ether is
100%, scavenging period is 10 minutes.
In the present embodiment, the coating materials in the step c) is MgF2.
In the present embodiment, pressure described in the step d) should be less than 1 × 10-3Pa.
The spectrophotometer of 712 Shanghai Optical Instrument Factory No.2 is used to detect light transmittance as 33%, less than embodiment one.
The technical concepts and features of embodiment of above only to illustrate the invention, its object is to allow be familiar with technique
People understands present disclosure and is implemented, and it is not intended to limit the scope of the present invention, all according to spirit of the invention
The equivalent change or modification that essence is done, should all cover in protection scope of the present invention.
Claims (5)
1. a kind of film plating process of prism, it is characterised in that：Include the following steps：
A) matrix is cleaned：Prism desire coated surface is cleaned up using cleaning solution；
B) it is fixed：Fixation in fixture is put into after no stains are examined under brighter light, fixture is mounted on work rest
On；
C) prepare before vapor deposition：Vacuum chamber is cleared up, prepare coating materials and is positioned in cold-crucible, by cold-crucible placement and base station
On, base station and work rest are put into vacuum chamber, by vacuum chamber, heated jig, rotational workpieces frame, fritting coating materials；
D) it is coated with：Baffle can be opened when reaching the pressure of requirement to be deposited, and baffle is used when film reaches the thickness of needs
Evaporation source is blocked, is coated with completion；
E) pickup：Stop heating after the completion of being coated with and close high pressure valve, allow sample natural cooling, treat that vacuum room temperature is basic
Taking-up sample measures after air is filled with when reaching room temperature.
2. the film plating process of prism according to claim 1, it is characterised in that：Cleaning solution described in the step a) uses
The ether or its mixture that alcohol that carbon atom number is 2-6, carbon atom number are 2-6.
3. the film plating process of prism according to claim 2, it is characterised in that：Cleaning solution described in the step a) uses
The ratio of the mixed liquor of alcohol and ether, the alcohol and ether is 1-4, and the mass concentration ratio of the alcohol and ether is
80%-100%, scavenging period are 1-10 minutes.
4. the film plating process of prism according to claim 1, it is characterised in that：The coating materials in the step c) is
MgF2。
5. the film plating process of prism according to claim 1, it is characterised in that：Pressure should be less than described in the step d)
6×10-3Pa。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810035926.2A CN108165933A (en) | 2018-01-15 | 2018-01-15 | The film plating process of prism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810035926.2A CN108165933A (en) | 2018-01-15 | 2018-01-15 | The film plating process of prism |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108165933A true CN108165933A (en) | 2018-06-15 |
Family
ID=62514398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810035926.2A Pending CN108165933A (en) | 2018-01-15 | 2018-01-15 | The film plating process of prism |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108165933A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104561908A (en) * | 2014-12-31 | 2015-04-29 | 西南技术物理研究所 | Preparation method for multi-waveband high-reflective film |
| CN106835030A (en) * | 2016-12-13 | 2017-06-13 | 西南技术物理研究所 | Infrared high antireflection film structure of wide-angle multiband and preparation method thereof |
-
2018
- 2018-01-15 CN CN201810035926.2A patent/CN108165933A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104561908A (en) * | 2014-12-31 | 2015-04-29 | 西南技术物理研究所 | Preparation method for multi-waveband high-reflective film |
| CN106835030A (en) * | 2016-12-13 | 2017-06-13 | 西南技术物理研究所 | Infrared high antireflection film structure of wide-angle multiband and preparation method thereof |
Non-Patent Citations (1)
| Title |
|---|
| 蔡文等: "Glan-Taylor棱镜的加工与镀膜工艺研究", 《玻璃与搪瓷》 * |
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|---|---|---|---|
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20180615 |
|
| RJ01 | Rejection of invention patent application after publication |