CN108139687A - 一种光刻设备和光刻系统 - Google Patents

一种光刻设备和光刻系统 Download PDF

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Publication number
CN108139687A
CN108139687A CN201680058663.6A CN201680058663A CN108139687A CN 108139687 A CN108139687 A CN 108139687A CN 201680058663 A CN201680058663 A CN 201680058663A CN 108139687 A CN108139687 A CN 108139687A
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light
sub
light beam
optical switch
optical
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CN201680058663.6A
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CN108139687B (zh
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弗洛里安·朗诺斯
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Huawei Technologies Co Ltd
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Huawei Technologies Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/213—Exposing with the same light pattern different positions of the same surface at the same time

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Integrated Circuits (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

一种光刻设备(100)和光刻系统，该光刻设备(100)包括：光开关(110)和N个光子器件(120)，光开关(110)包括N个子光开关(111，112)，N个子光开关(111，112)与N个光子器件(120,130)一一对应，N为正整数且N≥2；每个子光开关(111，112)的状态包括开启状态和关闭状态，处于开启状态的子光开关(111，112)用于将光束传输至对应的光子器件(120,130)，处于关闭状态的子光开关(111，112)不能将光束传输至对应的光子器件(120,130)；每个光子器件(120,130)包括分束装置(121,131)和聚焦透镜(122,132)。该光刻设备(100)无需改变光刻设备(100)与基材的相对位置即可制备出需要的图案，避免了平移步骤和对准步骤，从而提高了处理效率以及在基材上形成的干涉图案的精确度。

Description

PCT国内申请，说明书已公开。

Claims (11)

  1. PCT国内申请，权利要求书已公开。
CN201680058663.6A 2016-09-09 2016-09-09 一种光刻设备和光刻系统 Active CN108139687B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2016/098563 WO2018045557A1 (zh) 2016-09-09 2016-09-09 一种光刻设备和光刻系统

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CN108139687A true CN108139687A (zh) 2018-06-08
CN108139687B CN108139687B (zh) 2020-01-10

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CN (1) CN108139687B (zh)
WO (1) WO2018045557A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11531280B2 (en) 2018-08-29 2022-12-20 Asml Holding N.V. Compact alignment sensor arrangements

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1658072A (zh) * 2004-02-18 2005-08-24 Asml荷兰有限公司 光刻装置和器件制造方法
US20090268210A1 (en) * 2008-04-28 2009-10-29 James Prince Compact Littrow Encoder
CN102203674A (zh) * 2008-09-22 2011-09-28 Asml荷兰有限公司 光刻设备、可编程图案形成装置和光刻方法
CN102368138A (zh) * 2011-10-19 2012-03-07 广东工业大学 一种大面积tft光刻装置及其光刻方法
CN202306140U (zh) * 2011-10-19 2012-07-04 广东工业大学 一种大面积tft光刻装置
CN102981380A (zh) * 2011-09-07 2013-03-20 上海微电子装备有限公司 用于光刻设备的预对准装置及方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1658072A (zh) * 2004-02-18 2005-08-24 Asml荷兰有限公司 光刻装置和器件制造方法
US20090268210A1 (en) * 2008-04-28 2009-10-29 James Prince Compact Littrow Encoder
CN102203674A (zh) * 2008-09-22 2011-09-28 Asml荷兰有限公司 光刻设备、可编程图案形成装置和光刻方法
CN102981380A (zh) * 2011-09-07 2013-03-20 上海微电子装备有限公司 用于光刻设备的预对准装置及方法
CN102368138A (zh) * 2011-10-19 2012-03-07 广东工业大学 一种大面积tft光刻装置及其光刻方法
CN202306140U (zh) * 2011-10-19 2012-07-04 广东工业大学 一种大面积tft光刻装置

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CN108139687B (zh) 2020-01-10
WO2018045557A1 (zh) 2018-03-15

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