CN108131274B - A kind of vacuum-pumping system - Google Patents
A kind of vacuum-pumping system Download PDFInfo
- Publication number
- CN108131274B CN108131274B CN201711130898.4A CN201711130898A CN108131274B CN 108131274 B CN108131274 B CN 108131274B CN 201711130898 A CN201711130898 A CN 201711130898A CN 108131274 B CN108131274 B CN 108131274B
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- Prior art keywords
- vacuum
- plasma
- pump
- radio
- pipe
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B39/00—Component parts, details, or accessories, of pumps or pumping systems specially adapted for elastic fluids, not otherwise provided for in, or of interest apart from, groups F04B25/00 - F04B37/00
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Abstract
The invention discloses a kind of vacuum-pumping systems, it include plasma chamber, plasma driving source, vacuum pump and multistage connecting pipe, the air inlet pipe of vacuum pump and by between pumping workpiece passed through vacuum pipe connect, and plasma chamber is set on vacuum pipe, plasma is generated under the incentive action of plasma driving source in plasma chamber, macromolecular substances in its plasma pyrolysis vacuum pipe generated, and extract the vacuum-pumping system to be formed and inhibit to return oil out by vacuum pump, plasma driving source is the combination of microwave generator or radio-frequency power supply or microwave generator and radio-frequency power supply, it is connected between plasma chamber and microwave generator by waveguide, it is connect between radio-frequency power supply by driving circuit, it is connect between microwave generator and the combination of radio-frequency power supply by combination.The present invention is combined into a kind of new vacuum-pumping system using plasma generator and vacuum pump technology, consumes energy low in the course of work, does not need other working medias.
Description
Technical field
The present invention relates to vacuum-pumping system fields, relate generally to a kind of vacuum-pumping system.
Background technique
Currently, well known fine pumping system is directly connected in series by mechanical pump and molecular pump.In low vacuum condition
Under by working machine pump, by molecule pump work under high vacuum condition.But it is always to influence this vacuum suction that vacuum pump, which returns oil,
The major issue of system performance.Mechanical pump oil gas and molecular pump oil gas can enter vacuum chamber along vacuum pipe adverse current, pollute
Vacuum chamber surface and internal part, to not be able to satisfy the requirement of high standard vacuum suction.
Summary of the invention
The object of the invention is to remedy the disadvantages of known techniques, provides a kind of vacuum-pumping system, the vacuum suction
System can inhibit to return oily problem, improve vacuum chamber cleanliness.
The present invention is achieved by the following technical solutions:
A kind of vacuum-pumping system includes plasma chamber, plasma driving source, vacuum pump and multistage connecting tube
Road, it is characterised in that: the air inlet pipe of the vacuum pump and connected, and set on vacuum pipe by vacuum pipe between pumping workpiece
Plasma chamber is set, generates plasma under the incentive action of plasma driving source in the plasma chamber,
Macromolecular substances in the plasma pyrolysis vacuum pipe of generation, and extract out from escape pipe by vacuum pump to form inhibition and return
The vacuum-pumping system of oil, the plasma driving source is the energy source that plasma is generated for motivating, here using micro-
The combination of wave producer or radio-frequency power supply or microwave generator and radio-frequency power supply, the plasma chamber and microwave generator it
Between by waveguide connect, connect between radio-frequency power supply by driving circuit, the combination with microwave generator and radio-frequency power supply
Between pass through combination connect.
The vacuum pump be mechanical pump, molecular pump, oil diffusion pump, sliding vane rotary vacuum pump, Roots vaccum pump, cryogenic pump wherein
A kind of or their any combination.
The plasma chamber is the cavity of metal material or the cavity of nonmetallic materials or metal material and Fei Jin
Belong to the cavity of both's combination.
Its principle is: under the incentive action of microwave generator or radio-frequency power supply or their combination in plasma chamber
Plasma is generated, to crack the macromolecular substances on vacuum passage；When pumping fluid gas turns from vacuum pump to vacuum chamber
During shifting, vacuum pump oil gas can be cracked into micro-molecular gas in heating region, and be extracted out by vacuum pump, formed and inhibit true
Sky pump returns the vacuum-pumping system of oil.
The invention has the advantages that
Structure of the invention design rationally, using plasma generator and vacuum pump technology is combined into a kind of new vacuum suction
System consumes energy in the course of work low, does not need other working medias.
Detailed description of the invention
Fig. 1 is an embodiment of the present invention structural schematic diagram.
Fig. 2 is another example structure schematic diagram of the present invention.
Specific embodiment
Embodiment one:
Fig. 1 is a kind of a kind of example structure figure of vacuum-pumping system of the present invention.
A kind of vacuum-pumping system comprising have 2.45G magnetron microwave generator 1, oxygen-free copper waveguide 2, oxygen-free copper
Pipe plasma chamber 3, vacuum pump air inlet pipe 4, vacuum pump escape pipe 5,600L/S molecular pump vacuum suction unit 6, vacuum tube
Road 7, by pumping workpiece 8.
The 2.45G magnetron microwave generator 1 is with oxygen-free copper pipe plasma chamber 3 by 2 phase of oxygen-free copper waveguide
Connection, 3 one end of oxygen-free copper pipe plasma chamber are connected in vacuum pump air inlet pipe 4, and vacuum pump air inlet pipe 4 connects 600L/S points
Son pump vacuum suction unit 6, other end outlet is connected to by vacuum pipe 7 by pumping workpiece 8, by the gas in pumping workpiece 8
Vacuum pipe 7, oxygen-free copper pipe plasma chamber 3, vacuum pump air inlet pipe 4 are passed sequentially through by 600L/S molecular pump vacuum air pump
Group 6 extracts out and is discharged to atmosphere by vacuum pump escape pipe 5.
When oxygen-free copper pipe plasma chamber 3 is in vacuum state, 2.45G magnetron microwave generator 1 is generated micro-
Wave can generate plasma in 3 underexcitation residual gas of oxygen-free copper pipe plasma chamber.By 4 adverse current of vacuum pump air inlet pipe into
The vacuum pump oil gas for entering oxygen-free copper pipe plasma chamber 3 can be cracked into micro-molecular gas under action of plasma, form suppression
Vacuum pump processed returns the vacuum-pumping system of oil.
Embodiment two:
Fig. 2 is a kind of another example structure figure of vacuum-pumping system of the present invention.
A kind of vacuum-pumping system comprising have 5 kilowatts of 2MHz radio-frequency power supplies 9, oxygen-free copper solenoid radio-frequency driven antenna
10, quartz glass tube plasma chamber 11, vacuum pump air inlet pipe 4, vacuum pump escape pipe 5,15L/S mechanical pump 12, vacuum tube
Road 7, by pumping workpiece 8.
The oxygen-free copper spiral shell of 5 kilowatts of 2MHz radio-frequency power supplies 9 and empty set outside quartz glass tube plasma chamber 11
10 circuit of spool radio-frequency driven antenna is connected.11 one end of quartz glass tube plasma chamber is connected to vacuum pump air inlet pipe 4
On, vacuum pump air inlet pipe 4 connects 15L/S mechanical pump 12, and other end outlet is connected to by vacuum pipe 7 by pumping workpiece 8.Quilt
The gas taken out in workpiece 8 passes sequentially through vacuum pipe 7, quartz glass tube plasma chamber 11, vacuum pump air inlet pipe 4 by 15L/
S mechanical pump 12 is extracted out and is discharged to atmosphere by vacuum pump escape pipe 5.
When quartz glass tube plasma chamber 11 is in vacuum state, what 5 kilowatts of 2MHz radio-frequency power supplies 1 generated is penetrated
Frequency wave can be by oxygen-free copper solenoid radio-frequency driven antenna 10 in 11 underexcitation residual gas of quartz glass tube plasma chamber
Body generates plasma.Enter the vacuum pump oil gas meeting of quartz glass tube plasma chamber 11 by 4 adverse current of vacuum pump air inlet pipe
It is cracked into micro-molecular gas under action of plasma, forms the vacuum-pumping system for inhibiting vacuum pump to return oil.
Claims (3)
1. a kind of vacuum-pumping system includes plasma chamber, plasma driving source, vacuum pump and multistage connecting tube
Road, it is characterised in that: the air inlet pipe of the vacuum pump and connected, and set on vacuum pipe by vacuum pipe between pumping workpiece
Plasma chamber is set, generates plasma under the incentive action of plasma driving source in the plasma chamber,
Macromolecular substances in the plasma pyrolysis vacuum pipe of generation, and extract out from escape pipe by vacuum pump to form inhibition and return
The vacuum-pumping system of oil, the plasma driving source are microwave generator or radio-frequency power supply or microwave generator and radio frequency electrical
The combination in source is connected by waveguide between the plasma chamber and microwave generator, passes through drive between radio-frequency power supply
Dynamic circuit connection, is connect between microwave generator and the combination of radio-frequency power supply by the combination of waveguide and driving circuit.
2. a kind of vacuum-pumping system according to claim 1, it is characterised in that: the vacuum pump is molecular pump, oil
Diffusion pump, sliding vane rotary vacuum pump, Roots vaccum pump, cryogenic pump one of which or their any combination.
3. a kind of vacuum-pumping system according to claim 1, it is characterised in that: the plasma chamber is gold
The combined cavity of the cavity or both metal material and nonmetallic materials of the cavity or nonmetallic materials that belong to material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711130898.4A CN108131274B (en) | 2017-11-15 | 2017-11-15 | A kind of vacuum-pumping system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711130898.4A CN108131274B (en) | 2017-11-15 | 2017-11-15 | A kind of vacuum-pumping system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108131274A CN108131274A (en) | 2018-06-08 |
| CN108131274B true CN108131274B (en) | 2019-10-15 |
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ID=62388693
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711130898.4A Active CN108131274B (en) | 2017-11-15 | 2017-11-15 | A kind of vacuum-pumping system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108131274B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102157876B1 (en) * | 2018-08-28 | 2020-09-18 | 한국기계연구원 | Vacuum pump system with remote plasma device |
| CN109545420B (en) * | 2018-11-21 | 2021-01-26 | 中国科学院合肥物质科学研究院 | Ion beam biological irradiation device and method |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0153525A1 (en) * | 1984-02-17 | 1985-09-04 | Stauffer Chemical Company | Pnictide trap for vacuum systems |
| CN1382303A (en) * | 1999-10-25 | 2002-11-27 | 西德尔阿克蒂斯服务公司 | Vacuum circuit for device for treating receptacle with low pressure plasma |
| CN101124410A (en) * | 2005-02-07 | 2008-02-13 | 爱德华兹有限公司 | Ejector pump |
| JP2009156096A (en) * | 2007-12-25 | 2009-07-16 | Fujitsu Microelectronics Ltd | Vacuum pump, and device and method for manufacturing semiconductor device |
-
2017
- 2017-11-15 CN CN201711130898.4A patent/CN108131274B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0153525A1 (en) * | 1984-02-17 | 1985-09-04 | Stauffer Chemical Company | Pnictide trap for vacuum systems |
| CN1382303A (en) * | 1999-10-25 | 2002-11-27 | 西德尔阿克蒂斯服务公司 | Vacuum circuit for device for treating receptacle with low pressure plasma |
| CN101124410A (en) * | 2005-02-07 | 2008-02-13 | 爱德华兹有限公司 | Ejector pump |
| JP2009156096A (en) * | 2007-12-25 | 2009-07-16 | Fujitsu Microelectronics Ltd | Vacuum pump, and device and method for manufacturing semiconductor device |
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| Publication number | Publication date |
|---|---|
| CN108131274A (en) | 2018-06-08 |
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