CN108121177A - A kind of alignment measurement systems and alignment methods - Google Patents
A kind of alignment measurement systems and alignment methods Download PDFInfo
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- CN108121177A CN108121177A CN201611075055.4A CN201611075055A CN108121177A CN 108121177 A CN108121177 A CN 108121177A CN 201611075055 A CN201611075055 A CN 201611075055A CN 108121177 A CN108121177 A CN 108121177A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
Abstract
The invention discloses a kind of alignment measurement systems and alignment methods, the system provides four kinds of light beams with different wave length by first light source module and secondary light source module, the opening and closing of different light sources in first light source module and secondary light source module are controlled by light source control module, the light beam that the first light source module being emitted onto by image-forming module on alignment mark, secondary light source module are sent is imaged on respectively on the different position of the first reference grating, the second reference grating；First reference grating and the second reference grating provide the reference marker of different cycles for the different level diffraction lights of four kinds of light beams；Signal acquisition process module acquisition through the first reference grating, the second reference grating light intensity signal and handled and calculated by alignment function and management module and be directed at position.The present invention, which can realize, is carried out at the same time four kinds of wavelength measurement, obtains the optimal wavelength of performance, and the photoetching carried out using the wavelength under the process conditions is produced, and improves Technological adaptability.
Description
Technical field
The present invention relates to technical field of lithography, and in particular to a kind of alignment measurement systems and alignment methods.
Background technology
In semiconducter IC ic manufacturing process, a complete chip is usually required by multiple photolithographic exposure
It can complete.In addition to first time photoetching, the photoetching of remaining level before exposure will be by the figure of the level and with front layer
The secondary figure left that exposes is accurately positioned, and so just be can guarantee between each layer pattern there is correct relative position, that is, is covered
Carve precision.Under normal conditions, alignment precision is the 1/3~1/5 of litho machine resolution ratio index, for 100 nanometers of litho machines
Speech, alignment precision index request are less than 35nm.Alignment precision is one of the key technical indexes of projection mask aligner, and mask and silicon
Alignment precision between piece is the key factor for influencing alignment precision.When characteristic size (Critical Dimension, CD) will
When seeking smaller, the requirement of requirement and resulting alignment precision to alignment precision becomes more stringent, such as the CD of 90nm
Size requires 10nm or smaller alignment precisions.
Alignment between mask and silicon chip can be used mask (coaxial) and be aligned is directed at the mode being combined with silicon chip (off-axis),
The position relationship between mask mark and silicon chip mark is established labeled as bridge with work stage sports platform datum plate.Alignment
Basic process is：First by mask alignment system, the alignment between mask mark and sports platform datum plate mark is realized, then
Using silicon chip alignment system, the alignment between silicon chip mark and work stage sports platform datum plate mark is completed, and then is realized indirectly
Silicon chip mark is aligned between being marked with mask.
A kind of silicon chip (off-axis) is provided in the prior art to Barebone, and alignment photograph is carried out using dual-wavelength laser light source
It is bright, deviation is carried out to the different grade sub-beams of each wavelength using wedge block or clapboard, makes the alignment diffraction light of each wavelength
Spot is imaged respectively to before each level reference grating of different position, is separately detected so as to fulfill 1-7 grades of registration signals.Using
The alignment light source of two kinds of wavelength is carried out to locating tab assembly, although for Single wavelength to Barebone, Technological adaptability improves,
It is that contemporary semiconductor manufacturing process is increasingly sophisticated, the technique number of plies substantially increases, and fits the alignment measurement systems technique of two kinds of wavelength
Answering property is also limited to increasingly.Increase to two kinds of wavelength from Single wavelength, if point out in the prior art two wavelength to quasi-optical using same
One light path, in order to avoid each level hot spot imaging between different wave length overlapping, it is necessary to which 48 wedge blocks replace Single wavelength feelings
12 clapboards of 24 independent wedge blocks or use under condition replace 6 pieces of clapboards in the case of Single wavelength.In the prior art
It is also mentioned that another scheme, will the light paths of two wavelength separate, a respective light path, illuminating bundle is finally by PBS
After (Polarization Beam Splitter, polarization beam apparatus) closes beam, silicon chip face alignment mark is irradiated to, then passes through PBS
The diffracted beam of two wavelength is separated, into respective imaging optical path.This means if wavelength is further added by, light channel structure will
It can increase, be become more complicated so as to cause alignment system bulk, structure.
The content of the invention
The present invention provides a kind of alignment measurement systems and alignment methods, to solve problems of the prior art.
In order to solve the above-mentioned technical problem, the technical scheme is that：A kind of alignment measurement systems, including：
First light source module including first light source and secondary light source, provides the first light beam and second with different wave length
Light beam；
First bundling device carries out conjunction beam to the first light beam and the second light beam；
Secondary light source module including the 3rd light source and the 4th light source, provides the 3rd light beam and the 4th with different wave length
Light beam；
Second bundling device carries out conjunction beam to the 3rd light beam and the 4th light beam；
Light source control module controls the opening and closing of different light sources in first light source module and secondary light source module；
Work stage, silicon chip of the carrying with alignment mark；
First reference grating provides the ginseng of different cycles for the different level diffraction lights of the first light beam and/or the second light beam
Examine mark；
Second reference grating provides the ginseng of different cycles for the different level diffraction lights of the 3rd light beam and/or the 4th light beam
Examine mark；
The light beam that the first light source module, secondary light source module are sent is irradiated to the alignment mark by image-forming module
On, and collect and be imaged on first reference grating, the difference of the second reference grating after the light beam of alignment mark reflection
On position；
Signal acquisition process module, acquisition through the first reference grating, the second reference grating light intensity signal and located
Reason；
Station acquisition and motion-control module gather the location information of work stage；And
Alignment function and management module receive signal acquisition process module and the letter of station acquisition and motion-control module
Number, calculate alignment position.
Further, the image-forming module includes the first image-forming module, the second image-forming module and polarization beam apparatus, and described the
One image-forming module and the second image-forming module are symmetrical arranged on the polarization beam apparatus, and first bundling device and described second closes
The light beam that beam device is sent irradiates the alignment mark after the polarization beam apparatus, the light beam quilt through the alignment mark diffraction
First image-forming module and second image-forming module imaging are respectively enterd after the polarization beam apparatus beam splitting.
Further, first image-forming module and the second image-forming module include the lighting unit set gradually, first
Reflecting element, light beam deflection element, the second reflecting element and imaging len, light beam penetrate the lighting unit after by described first
Reflecting element reflexes to the polarization beam apparatus, is incident to the alignment mark afterwards, the light beam through the alignment mark diffraction
It is imaged successively after the light beam deflection element, the second reflecting element and imaging len after the polarization beam apparatus.
Further, the deflection structure including 3 kinds of deviation angles is mutually arranged on the light beam deflection element forms six kinds
Deviation region.
Further, the signal acquisition process module include respectively with first image-forming module and the second image-forming module
Corresponding first signal acquisition module and secondary signal acquisition module, first signal acquisition module and secondary signal acquisition mould
Block includes detection optical fiber and intensity collection element.
Further, the detection optical fiber includes level-one optical detection optical fiber, three-level optical detection optical fiber, Pyatyi optical detection optical fiber
With seven grades of optical detection optical fiber.
Further, the level-one optical detection optical fiber, three-level optical detection optical fiber, Pyatyi optical detection optical fiber and seven grades of optical detections
Optical fiber is respectively equipped with one.
Further, each level-one optical detection optical fiber, three-level optical detection optical fiber, Pyatyi optical detection optical fiber and seven grades of light
Detection optical fiber corresponds to an intensity collection element respectively.
Further, the level-one optical detection optical fiber and three-level optical detection optical fiber are respectively equipped with one, and the Pyatyi light is visited
It surveys optical fiber and seven grades of optical detection optical fiber is respectively equipped with two.
Further, the level-one optical detection optical fiber and three-level optical detection optical fiber correspond to two intensity collection elements respectively,
Wavelength Splitter is equipped between the level-one optical detection optical fiber and three-level optical detection optical fiber and corresponding intensity collection element, each
The Pyatyi optical detection optical fiber and seven grades of optical detection optical fiber correspond to an intensity collection element respectively.
Further, the intensity collection element uses photodiode.
The present invention also provides a kind of alignment methods of alignment measurement systems, comprise the following steps：
S1：The light beam that first light source module, secondary light source module are sent projects the alignment on silicon chip by image-forming module
Mark；
S2：By institute after the light beam progress diffraction that the alignment mark sends first light source module and secondary light source module
It states image-forming module and distinguishes interference imaging in the first reference grating and the second reference grating；
S3：Signal acquisition process module acquisition through first reference grating, the second reference grating light intensity signal simultaneously
It is handled and is sent to alignment function and management module；
S4：The location information of station acquisition and motion-control module acquisition work stage, and it is sent to alignment function and management
Module；
S5：The alignment function receives the signal acquisition process module and station acquisition and motion control with management module
The signal of module calculates alignment position.
Further, in step S2, the image-forming module carries out Polarization Modulation to the light beam through the alignment mark diffraction,
The diffracted beam of different wave length is made to be imaged respectively to the reference marker of each level of different position.
Further, by light source control module first light source and secondary light source timesharing is controlled to open, while controls the 3rd
Light source and the 4th light source timesharing are opened, and the signal acquisition process module acquisition time is through the first reference grating, the second reference
The light intensity signal of grating is simultaneously sent to alignment function after being handled and is calculated respectively with management module and be directed at position.
Further, first light source, secondary light source, the 3rd light source, the 4th light source are controlled simultaneously by light source control module
It opens, the signal acquisition process module gathers the first~the 4th light through the first reference grating, the second reference grating simultaneously
The light intensity signal of beam is simultaneously sent to alignment function after being handled and is directed at position with management module calculating.
Further, the image-forming module is provided with six kinds of deviation modulation areas, and deviation modulates the first light source respectively
And/or the level-one light of the secondary light source, the three-level light of the first light source and/or the secondary light source, the first light source
Pyatyi light, the Pyatyi light of the secondary light source, seven grades of light of the first light source, seven grades of light of the secondary light source.
Further, the signal acquisition process module collect respectively through first reference grating first light source/
It the level-one light intensity signal of secondary light source, three-level light intensity signal, Pyatyi light intensity signal, seven grades of light intensity signals and collects respectively saturating
Cross level-one light intensity signal, three-level light intensity signal, the Pyatyi light intensity letter of the light source of the 3rd light source of second reference grating/the 4th
Number, seven grades of light intensity signals.
Further, the signal acquisition process module collect respectively through first reference grating first light source and
The level-one light intensity signal of secondary light source, the three-level light intensity signal of first light source and secondary light source, the Pyatyi light intensity letter of first light source
Number, seven grades of light intensity signals of seven grades of light intensity signals of the Pyatyi light intensity signal of secondary light source, first light source and secondary light source and
Collect level-one light intensity signal, the 3rd light source and the 4th light source of the 3rd light source and the 4th light source through second reference grating
Three-level light intensity signal, the Pyatyi light intensity signal of the 3rd light source, the Pyatyi light intensity signal of the 4th light source, seven grades of light of the 3rd light source
Seven grades of light intensity signals of strong signal and the 4th light source；
The first light source of first reference grating and the level-one light intensity signal of secondary light source, first are penetrated to being collected into again
The three-level light intensity signal and the 3rd light source of transmission second reference grating of light source and secondary light source and the level-one of the 4th light source
The three-level light intensity signal of light intensity signal, the 3rd light source and the 4th light source is split, and collects the level-one light of the first light source
Strong signal, the level-one light intensity signal of secondary light source, the three-level light intensity signal of first light source, secondary light source three-level light intensity signal,
The level-one light intensity signal of 3rd light source, the level-one light intensity signal of the 4th light source, three-level light intensity signal, the 4th light source of the 3rd light source
Three-level light intensity signal.
Alignment measurement systems and alignment methods provided by the invention, by setting first light source module and secondary light source module
Four kinds of light beams with different wave length are provided, are controlled by light source control module in first light source module and secondary light source module not
With the opening and closing of light source, first light source module, the secondary light source module being emitted onto by image-forming module on alignment mark
The light beam sent is imaged on respectively on the different position of the first reference grating, the second reference grating；First reference grating and second
Reference grating provides the reference marker of different cycles for the different level diffraction lights of four kinds of light beams；Pass through signal acquisition process module
Acquisition through the first reference grating, the second reference grating light intensity signal and handled, pass through station acquisition and motion control
Module gathers the location information of work stage and is directed at position with management module calculating by alignment function.The present invention not only may be used
It realizes the multi-wavelength time-sharing multiplex of same light path, when the light beam of two wavelength in same light source module being avoided to illuminate simultaneously, is joining
1 grade of light imaging overlapping, the 3 grades of light overlappings of two wavelength on grating are examined, can also realize and measurement is carried out at the same time to four kinds of wavelength, finally
Four kinds of wavelength alignment repeatability of comparison, obtain the wavelength that performance is optimal under the process conditions, the technique item are carried out using the wavelength
Photoetching production under part, improves Technological adaptability.
Description of the drawings
Fig. 1 is the structure diagram of alignment measurement systems in the embodiment of the present invention 1；
Fig. 2 is that first light beam and the second light beam correspond to X, the diffraction pattern distribution map of Y-direction in the embodiment of the present invention 1；
Fig. 3 is the distribution map of modulation areas on light beam deflection element in the embodiment of the present invention 1；
Fig. 4 is the distribution situation that first reference grating surface reference marks in the embodiment of the present invention 1；
Fig. 5 is the structure diagram of Signal acquiring and processing module in the embodiment of the present invention 1；
Fig. 6 is the structure diagram of Signal acquiring and processing module in the embodiment of the present invention 2.
Shown in figure：11st, first light source；12nd, secondary light source；13rd, the 3rd light source；14th, the 4th light source；21st, first beam is closed
Device；22nd, the first bundling device；31st, the first image-forming module；32nd, the second image-forming module；33rd, lighting unit；34th, light beam deflection element；
35th, the second reflecting element；36th, imaging len；37th, polarization beam apparatus；38th, the first reflecting element；4th, work stage；5th, silicon chip；51、
Alignment mark；71st, the first reference grating；72nd, the second reference grating；8th, signal acquisition process module；8a, the first signal processing mould
Block；8b, secondary signal processing module；81st, detection optical fiber；811st, level-one optical detection optical fiber；812nd, three-level optical detection optical fiber；813、
Pyatyi optical detection optical fiber；814th, seven grades of optical detection optical fiber；82nd, intensity collection element；83rd, Wavelength Splitter；9th, station acquisition with
Motion-control module；10th, alignment function and management module.
Specific embodiment
The present invention is described in detail below in conjunction with the accompanying drawings.
Embodiment 1
As shown in Figure 1, the present invention provides a kind of alignment measurement systems, including：
First light source module, including first light source 11 and secondary light source 12, provide the first light beam with different wave length and
Second light beam；In the present embodiment, the laser of first light source 11 and the selection of secondary light source 12 532nm, 633nm.
First bundling device 21 carries out conjunction beam to the first light beam and the second light beam.
Secondary light source module, including the 3rd light source 13 and the 4th light source 14, provide the 3rd light beam with different wave length and
4th light beam；In the present embodiment, the laser of the 3rd light source 13 and the selection of the 4th light source 14 780nm, 852nm.
Second bundling device 22 carries out conjunction beam to the 3rd light beam and the 4th light beam.
Light source control module (not shown) controls opening for different light sources in first light source module and secondary light source module
It opens and closes.
Work stage 4, silicon chip 5 of the carrying with alignment mark 51.
First reference grating 71, the different level diffraction lights for the first light beam and/or the second light beam provide different cycles
Reference marker.Second reference grating 72, the different level diffraction lights for the 3rd light beam and/or the 4th light beam provide different cycles
Reference marker.
The light beam that the first light source module, secondary light source module are sent is irradiated on alignment mark 51 by image-forming module,
And it collects and is imaged on first reference grating 71, the second reference grating 72 not after the light beam of the alignment mark 51 reflection
With on position；The image-forming module include the first image-forming module 31, the second image-forming module 32 and polarization beam apparatus 37, described first
31 and second image-forming module 32 of image-forming module is symmetrical arranged on the polarization beam apparatus 37, first bundling device 21 and described
The light beam that second bundling device 22 is sent irradiates the alignment mark 51 after the polarization beam apparatus 37, through the alignment mark
The light beam of 51 diffraction is respectively enterd first image-forming module 31 and second imaging after 37 beam splitting of polarization beam apparatus
Module imaging 32, in the present embodiment, polarization beam apparatus 37 uses PBS and wave plate combined element.
Preferably, 31 and second image-forming module 32 of the first image-forming module include set gradually lighting unit 33,
First reflecting element 38, light beam deflection element 34, the second reflecting element 35 and imaging len 36.Light beam penetrates the lighting unit
The polarization beam apparatus 37 is reflexed to by first reflecting element 34 after 33, the alignment mark 51 is incident to afterwards, through institute
The light beam of 51 diffraction of alignment mark is stated after the polarization beam apparatus 37 successively through the light beam deflection element 34, the second reflector
It is imaged after part 35 and imaging len 36.The deflection structure including 3 kinds of deviation angles is mutually arranged on the light beam deflection element 34
Six kinds of deviation regions are formed, for six kinds of deviation regions in the first image-forming module 31, are respectively used to first described in deviation
The three-level light of the level-one light of light beam and/or the second light beam, the first light beam and/or the second light beam, the Pyatyi light of the first light beam, second
The Pyatyi light of light beam, seven grades of light of the first light beam, seven grades of light of the second light beam.
As shown in Fig. 2, it is that the first light beam (wavelength 532nm) and the second light beam (wavelength 633nm) correspond to X, Y-direction
Diffraction pattern distribution map, it can be seen from the figure that 1 order diffraction hot spot of the two-beam is largely overlapped, 3 order diffraction hot spots have few
Overlapping is measured, what 5 grades and 7 order diffraction hot spots were completely separate.
The distribution map of modulation areas on light beam deflection element 34 is illustrated in figure 3, can see with reference in Fig. 3, if will
1 grade of light, the 3 grades of light of two-beam put together deviation modulation, then needed in total to 6 light beams (1 grade, two-beam of two-beam
3 grades, 5 grades of the first light beam, 5 grades of the second light beam, 7 grades of the first light beam, 7 grades of the second light beam) carry out deviation modulation, therefore
It needs to form 6 kinds of deviations, be formed by the deflection element of 3 kinds of deviation angles is mutually arranged.In Fig. 4, border circular areas a is to 1 grade of light
Deviation modulation areas is carried out, border circular areas b is that 3 grades of light are carried out with deviation modulation areas, and circle region c 1 is to the 5 of the first light beam
Grade light carry out deviation modulation areas, circle region c 2 for the second light beam 5 grades of light carry out deviation modulation areas, border circular areas d1,
D2 is 7 grades of light deflection modulation areas of two-beam respectively.Deflection element may be employed wedge-shaped panel element or in reflecting element table
The reflecting surface that face increases modulation beam angle is realized.For 1,3 order diffraction light beams, two-beam all passes through the same zone of deflection element
Domain, therefore the deviation modulation angle that light beam is passed through is identical, but due to different wave length, the refractive index of two-beam difference,
Therefore the angle of two-beam has slightly difference after deviation, and the interference image position for being imaged onto reference grating face is most caused to have summary at last
Elementary errors is other, it is therefore desirable to which the reference marker of corresponding level can cover the interference image of two kinds of wavelength.
As shown in figure 4, be the distribution situation (the second reference grating 72 is similar) of 71 surface reference of the first reference grating mark,
Because the refractive index of two-beam is different, there is deviation in the imaging center position of 1 grade, 3 grades light beam, and offset distance can be according to formula
(n1-n2) ﹡ α ﹡ f, which are calculated, obtains, and n1, n2 are respectively the refractive index of the first light beam and the corresponding deflection element of the second light beam, and α is should
The deviation modulation angle of grade sub-beams, f is the focal length of imaging len.In order to cover the interference image of two-beam, 1 grade, 3 grades of ginseng
Examine mark slightly than 5 grades, it is 7 grades big.For 5 grades, 7 grades, the interference image image space of two-beam be it is separated by deviation,
Therefore 5 grades, 7 grades of reference markers only correspond to the interference image of light beam respectively.
Signal acquisition process module 8, acquisition are gone forward side by side through the first reference grating 71, the light intensity signal of the second reference grating 72
Row processing.The signal acquisition process module 8 includes corresponding with 31 and second image-forming module 32 of the first image-forming module respectively
The first signal acquisition module 8a and secondary signal acquisition module 8b, the first signal acquisition module 8a and secondary signal acquisition
Module 8b includes detection optical fiber 81 and intensity collection element 82.The detection optical fiber 81 includes level-one optical detection optical fiber 811, three
Grade optical detection optical fiber 812, Pyatyi optical detection optical fiber 813 and seven grades of optical detection optical fiber 814.As shown in figure 5, the level-one optical detection
Optical fiber 811, three-level optical detection optical fiber 812, Pyatyi optical detection optical fiber 813 and seven grades of optical detection optical fiber 814 are respectively equipped with one.Often
A level-one optical detection optical fiber 811, three-level optical detection optical fiber 812, Pyatyi optical detection optical fiber 813 and seven grades of optical detection optical fiber
817 correspond to an intensity collection element 82 respectively, and the intensity collection element 82 uses photodiode.
Station acquisition and motion-control module 9 gather the location information of work stage.
Alignment function and management module 10, receive signal acquisition process module 8 and station acquisition and motion-control module 9
Signal calculates alignment position.
The present invention also provides a kind of alignment methods of alignment measurement systems, comprise the following steps：
S1：The light beam that first light source module, secondary light source module are sent projects the alignment on silicon chip 5 by image-forming module
Mark 51；
S2：By imaging after the light beam progress diffraction that alignment mark 51 sends first light source module and secondary light source module
Module distinguishes interference imaging in the first reference grating 71 and the second reference grating 72；Specifically, the image-forming module is to through institute
The light beam for stating 51 diffraction of alignment mark carries out Polarization Modulation, and the diffracted beam of different wave length is made to be imaged respectively to the first reference grating
71 or 72 different position of the second reference grating each level reference marker at.
S3：Signal acquisition process module 8 acquisition through the first reference grating 71, the second reference grating 72 light intensity signal simultaneously
It is handled and is sent to alignment function and management module 10；
S4：Station acquisition gathers the location information of work stage 4 with motion-control module 9, and is sent to alignment function and pipe
Manage module 10；
S5：Alignment function receives signal acquisition process module 8 and station acquisition and motion-control module 9 with management module 10
Signal, calculate alignment position.Preferably, by light source control module first light source 11 and 12 timesharing of secondary light source is controlled to beat
It opens, while the 3rd light source 13 and 14 timesharing of the 4th light source is controlled to open, 8 acquisition time of signal acquisition process module is through the
One reference grating 71, the light intensity signal of the second reference grating 72 are simultaneously sent to alignment function after being handled and management module 10 is divided
Position Ji Suan be directed at.The image-forming module is provided with six kinds of deviation modulation areas, and deviation modulates the first light source 11 respectively
And/or the level-one light of the secondary light source 12, the three-level light of the first light source 11 and/or the secondary light source 12, described
The Pyatyi light of one light source 11, the Pyatyi light of the secondary light source 12, seven grades of light of the first light source 11, the secondary light source 12
Seven grades of light.The signal acquisition process module 8 collects the first light source 11/ second through first reference grating 71 respectively
The level-one light intensity signal of light source 12, three-level light intensity signal, Pyatyi light intensity signal, seven grades of light intensity signals and collecting respectively penetrate
The level-one light intensity signal of the 4th light source 14 of the 3rd light source 13/ of second reference grating 72, three-level light intensity signal, Pyatyi light intensity
Signal, seven grades of light intensity signals.Specifically, interference image is imaged to the first reference grating 71 or the second reference grating 72, joined
Mark modulation is examined, is ultimately formed to locating tab assembly optical signal, has corresponding detection after each reference marker of reference grating
Optical fiber 81, to collect alignment optical signal.Since 5 grades, 7 grades of optical signals only correspond to the optical signal of light beam, the 5 of two-beam
Grade, 7 grades of optical signals can gather simultaneously, but 1 grade, include the signal of two-beam in 3 grades of optical signals, therefore gather 1 grade, 3
, it is necessary to which timesharing carries out during grade optical signal.Idiographic flow is：First light source 11, the 3rd light source 13 are first turned on, closes secondary light source
12nd, the 4th light source 14 carries out alignment scanning using the first light beam, the 3rd light beam, and obtains alignment repeatability；It is then switched off first
Light source 11, the 3rd light source 13, open secondary light source 12, the 4th light source 14, and secondary light source 12, the 4th light source 14 carry out alignment and sweep
It retouches, and obtains alignment repeatability；Four kinds of wavelength alignment repeatability of comparison, obtain the wavelength that performance is optimal under the process conditions；Profit
The photoetching carried out with the wavelength under the process conditions produces.
Embodiment 2
As shown in fig. 6, as different from Example 1, the level-one optical detection optical fiber 811 and three-level optical detection optical fiber 812
One is respectively equipped with, the Pyatyi optical detection optical fiber 813 and seven grades of optical detection optical fiber 814 are respectively equipped with two.Preferably, it is described
Level-one optical detection optical fiber 811 and three-level optical detection optical fiber 812 correspond to two intensity collection elements 82, the level-one optical detection respectively
Wavelength Splitter 83 is equipped between optical fiber 811 and three-level optical detection optical fiber 812 and corresponding intensity collection element 82, it is each described
Pyatyi optical detection optical fiber 813 and seven grades of optical detection optical fiber 814 correspond to an intensity collection element 82 respectively.
In the present embodiment, light source control module control first light source 11, secondary light source 12, the 3rd light source 13, the 4th light source
14 open simultaneously, the signal acquisition process module 8 gather simultaneously through the first reference grating 71, the second reference grating 72
The light intensity signal of one~the 4th light beam is simultaneously sent to alignment function after being handled and is directed at position with the calculating of management module 10.It is described
Image-forming module is provided with six kinds of deviation modulation areas, and deviation modulates the first light source 11 and/or the secondary light source 12 respectively
Level-one light, the three-level light of the first light source 11 and/or the secondary light source 12, the Pyatyi light of the first light source 11, institute
State the Pyatyi light of secondary light source 12, seven grades of light of the first light source 11, seven grades of light of the secondary light source 12.The signal is adopted
Collection processing module 8 collects the level-one light intensity of the first light source 11 and secondary light source 12 through first reference grating 71 respectively
The three-level light intensity signal of signal, first light source 11 and secondary light source 12, the Pyatyi light intensity signal of first light source 11, secondary light source 12
Pyatyi light intensity signal, seven grades of light intensity signals of first light source 11 and seven grades of light intensity signals of secondary light source 12 and collect saturating
Cross the 3rd light source 13 of second reference grating 72 and level-one light intensity signal, the 3rd light source 13 and the 4th light of the 4th light source 14
The three-level light intensity signal in source 14, the Pyatyi light intensity signal of the 3rd light source 13, Pyatyi light intensity signal, the 3rd light source of the 4th light source 14
13 seven grades of light intensity signals and seven grades of light intensity signals of the 4th light source 14；Again to being collected into through first reference grating 71
The level-one light intensity signal of first light source 11 and secondary light source 12, first light source 11 and secondary light source 12 three-level light intensity signal and
Level-one light intensity signal, the 3rd light source 13 and the 4th of the 3rd light source 13 and the 4th light source 14 through second reference grating 72
The three-level light intensity signal of light source 14 is split, and collects the level-one light intensity signal of the first light source 11, secondary light source 12
Level-one light intensity signal, the three-level light intensity signal of first light source 11, the three-level light intensity signal of secondary light source 12, the one of the 3rd light source 13
Grade light intensity signal, the level-one light intensity signal of the 4th light source 14, the three-level light intensity signal of the 3rd light source 13, the three-level of the 4th light source 14
Light intensity signal.Specifically, containing the flashlight of two wavelength in 1 grade of light, the signal of two kinds of wavelength is also contained in 3 grades of light
Light, therefore set a Wavelength Splitter 83 after level-one optical detection optical fiber 811 and three-level optical detection optical fiber 812 and separate two-beam
It opens, and information gathering is carried out by an intensity collection element 82 respectively, and the information of acquisition is exported to alignment function and pipe
Manage module 10.There was only a kind of registration signal light of wavelength in 5 grades of light, two-beam is corresponded to there are two reference marker, is corresponding with two
Pyatyi optical detection optical fiber 813 collects flashlight respectively, also there was only a kind of registration signal light of wavelength, two-beam in similary 7 grades of light
Reference marker there are two corresponding, is corresponding with two Pyatyi optical detection optical fiber 813 and collects flashlight respectively.It can be achieved in the present embodiment
It is gathered while the registration signal of the light beam of four kinds of wavelength, without individually carrying out acquisition time again.Due to the light beam of different wave length
A light path is shared, in beam splitting, it is necessary to design dichroic filter plate, increase narrow-band-filter film is harassed to reduce color.
In conclusion alignment measurement systems provided by the invention and alignment methods, by setting first light source module and
Two light source modules provide four kinds of light beams with different wave length, and first light source module and the second light are controlled by light source control module
The opening and closing of different light sources in source module are emitted onto first light source module on alignment mark, the by image-forming module
The light beam that two light source modules are sent is imaged on respectively on the different position of the first reference grating 71, the second reference grating 72；Pass through
First reference grating 71 and the second reference grating 72 provide the reference mark of different cycles for the different level diffraction lights of four kinds of light beams
Note；By the acquisition of signal acquisition process module 8 through the first reference grating 71, the light intensity signal of the second reference grating 72 and progress
Processing gathers the location information of work stage and by alignment function and management mould by station acquisition and motion-control module 9
Block 10 calculates alignment position.The present invention can not only realize the multi-wavelength time-sharing multiplex of same light path, avoid same light source module
In the light beam of two wavelength when illuminating simultaneously, 1 grade of light imaging overlapping, the 3 grades of light overlappings of two wavelength in reference grating can also be real
Measurement now is carried out at the same time to four kinds of wavelength, it is optimal to obtain performance under the process conditions for final four kinds of wavelength alignment repeatability of comparison
Wavelength, carry out photoetching under the process conditions using the wavelength and produce, improve Technological adaptability.
Although embodiments of the present invention are illustrated in specification, these embodiments are intended only as prompting,
It should not limit protection scope of the present invention.It is equal that various omission, substitution, and alteration are carried out without departing from the spirit and scope of the present invention
It should include within the scope of the present invention.
Claims (18)
1. a kind of alignment measurement systems, which is characterized in that including：
First light source module including first light source and secondary light source, provides the first light beam and the second light beam with different wave length；
First bundling device carries out conjunction beam to the first light beam and the second light beam；
Secondary light source module including the 3rd light source and the 4th light source, provides the 3rd light beam and the 4th light beam with different wave length；
Second bundling device carries out conjunction beam to the 3rd light beam and the 4th light beam；
Light source control module controls the opening and closing of different light sources in first light source module and secondary light source module；
Work stage, silicon chip of the carrying with alignment mark；
First reference grating provides the reference mark of different cycles for the different level diffraction lights of the first light beam and/or the second light beam
Note；
Second reference grating provides the reference mark of different cycles for the different level diffraction lights of the 3rd light beam and/or the 4th light beam
Note；
The light beam that the first light source module, secondary light source module are sent is irradiated on the alignment mark by image-forming module, and
Collect the different position that first reference grating, the second reference grating are imaged on after the light beam of alignment mark reflection
On；
Signal acquisition process module, acquisition through first reference grating, the second reference grating light intensity signal and located
Reason；
Station acquisition and motion-control module gather the location information of work stage；And
Alignment function and management module receive signal acquisition process module and the signal of station acquisition and motion-control module, meter
Calculate alignment position.
2. alignment measurement systems according to claim 1, which is characterized in that the image-forming module includes the first imaging mould
Block, the second image-forming module and polarization beam apparatus, first image-forming module and the second image-forming module are on the polarization beam apparatus
It is symmetrical arranged, described in the light beam that first bundling device and second bundling device are sent irradiates after the polarization beam apparatus
Alignment mark respectively enters the first imaging mould after the light beam of the alignment mark diffraction is by the polarization beam apparatus beam splitting
Block and second image-forming module imaging.
3. alignment measurement systems according to claim 2, which is characterized in that first image-forming module and the second imaging mould
Block includes the lighting unit, the first reflecting element, light beam deflection element, the second reflecting element and the imaging len that set gradually,
Light beam reflexes to the polarization beam apparatus through after the lighting unit by first reflecting element, and it is described right to be incident to afterwards
Fiducial mark remember, through the light beam of the alignment mark diffraction after the polarization beam apparatus successively through the light beam deflection element, second
It is imaged after reflecting element and imaging len.
4. alignment measurement systems according to claim 3, which is characterized in that include 3 kinds on the light beam deflection element partially
The deflection structure of dog-ear degree is mutually arranged to form six kinds of deviation regions.
5. alignment measurement systems according to claim 2, which is characterized in that the signal acquisition process module includes difference
The first signal acquisition module corresponding with first image-forming module and the second image-forming module and secondary signal acquisition module, it is described
First signal acquisition module and secondary signal acquisition module include detection optical fiber and intensity collection element.
6. alignment measurement systems according to claim 5, which is characterized in that the detection optical fiber includes level-one optical detection light
Fibre, three-level optical detection optical fiber, Pyatyi optical detection optical fiber and seven grades of optical detection optical fiber.
7. alignment measurement systems according to claim 6, which is characterized in that the level-one optical detection optical fiber, three-level light are visited
It surveys optical fiber, Pyatyi optical detection optical fiber and seven grades of optical detection optical fiber and is respectively equipped with one.
8. alignment measurement systems according to claim 7, which is characterized in that each the level-one optical detection optical fiber, three-level
Optical detection optical fiber, Pyatyi optical detection optical fiber and seven grades of optical detection optical fiber correspond to an intensity collection element respectively.
9. alignment measurement systems according to claim 6, which is characterized in that the level-one optical detection optical fiber and three-level light are visited
It surveys optical fiber and is respectively equipped with one, the Pyatyi optical detection optical fiber and seven grades of optical detection optical fiber are respectively equipped with two.
10. alignment measurement systems according to claim 9, which is characterized in that the level-one optical detection optical fiber and three-level light
Detection optical fiber corresponds to two intensity collection elements, the level-one optical detection optical fiber and three-level optical detection optical fiber and corresponding light respectively
Wavelength Splitter is equipped between strong acquisition elements, each Pyatyi optical detection optical fiber and seven grades of optical detection optical fiber correspond to one respectively
A intensity collection element.
11. alignment measurement systems according to claim 5, which is characterized in that the intensity collection element uses photoelectricity two
Pole pipe.
12. a kind of alignment methods using alignment measurement systems as described in claim 1, which is characterized in that including following step
Suddenly：
S1：The light beam that first light source module, secondary light source module are sent projects the alignment mark on silicon chip by image-forming module；
S2：By institute after the light beam progress diffraction that the alignment mark sends the first light source module and secondary light source module
It states image-forming module and distinguishes interference imaging in the first reference grating and the second reference grating；
S3：Signal acquisition process module acquisition is through first reference grating, the light intensity signal of the second reference grating and progress
It handles and is sent to alignment function and management module；
S4：The location information of station acquisition and motion-control module acquisition work stage, and it is sent to the alignment function and management
Module；
S5：The alignment function receives the signal acquisition process module and station acquisition and motion-control module with management module
Signal, calculate alignment position.
13. alignment methods according to claim 12, which is characterized in that in step S2, the image-forming module is to described in warp
The light beam of alignment mark diffraction carries out Polarization Modulation, and the diffracted beam of different wave length is made to be imaged respectively to each level of different position
Reference marker at.
14. alignment methods according to claim 13, which is characterized in that first light is controlled by light source control module
Source and secondary light source timesharing are opened, while the 3rd light source and the 4th light source timesharing is controlled to open, the signal acquisition process
Module acquisition time through the first reference grating, the light intensity signal of the second reference grating and is sent to alignment function after being handled
It is calculated respectively with management module and is directed at position.
15. alignment methods according to claim 13, which is characterized in that first light is controlled by light source control module
Source, secondary light source, the 3rd light source, the 4th light source open simultaneously, and the signal acquisition process module is gathered simultaneously through the first ginseng
Examine grating, the second reference grating the first~the 4th light beam light intensity signal and alignment function and management are sent to after being handled
Module calculates alignment position.
16. the alignment methods according to claims 14 or 15, which is characterized in that the image-forming module is provided with six kinds of deviations
Modulation areas, respectively deviation modulate the level-one light of the first light source and/or the secondary light source, the first light source and/or
The three-level light of the secondary light source, the Pyatyi light of the first light source, the Pyatyi light of the secondary light source, the first light source
Seven grades of light, seven grades of light of the secondary light source.
17. alignment methods according to claim 14, which is characterized in that the signal acquisition process module is collected respectively
Cross level-one light intensity signal, three-level light intensity signal, Pyatyi the light intensity letter of first light source/secondary light source of first reference grating
Number, seven grades of light intensity signals and the level-one light intensity for collecting the light source of the 3rd light source/the 4th through second reference grating respectively
Signal, three-level light intensity signal, Pyatyi light intensity signal, seven grades of light intensity signals.
18. alignment methods according to claim 15, which is characterized in that the signal acquisition process module is collected respectively
Cross the three-level of the first light source of the first reference grating and level-one light intensity signal of secondary light source, first light source and secondary light source
Light intensity signal, the Pyatyi light intensity signal of first light source, the Pyatyi light intensity signal of secondary light source, seven grades of light intensity signals of first light source
And secondary light source seven grades of light intensity signals and collect through second reference grating the 3rd light source and the 4th light source one
Grade light intensity signal, the 3rd light source and the three-level light intensity signal of the 4th light source, the Pyatyi light intensity signal of the 3rd light source, the 4th light source
Pyatyi light intensity signal, seven grades of light intensity signals of the 3rd light source and seven grades of light intensity signals of the 4th light source；
The first light source of first reference grating and level-one light intensity signal, the first light source of secondary light source are penetrated to being collected into again
With the three-level light intensity signal of secondary light source and through the 3rd light source of second reference grating and the level-one light intensity of the 4th light source
The three-level light intensity signal of signal, the 3rd light source and the 4th light source is split, and collects the level-one light intensity letter of the first light source
Number, the three-level light intensity signal of the three-level light intensity signal of the level-one light intensity signal of secondary light source, first light source, secondary light source, the 3rd
The level-one light intensity signal of light source, the level-one light intensity signal of the 4th light source, the three-level light intensity signal of the 3rd light source, the three of the 4th light source
Grade light intensity signal.
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