CN108088427A - A kind of planar laser beam sending method and device - Google Patents

Abstract

The present invention provides a kind of planar laser beam sending method and device, the described method includes：By corresponding first datum mark in the first reference position transmitting L-shaped planar laser beam, making the different piece of the first linear type beamlet that the L-shaped planar laser beam includes, the first benchmark light target corresponding to the second reference position and the corresponding second benchmark light target in the 3rd reference position irradiate simultaneously respectively；The point of irradiation of the first linear type beamlet is obtained compared with the position offset information of the corresponding datum mark of benchmark light target using benchmark light target, at least one of direction of illumination and beam planes normal direction of the first linear type beamlet is adjusted according to the irradiation position offset information, the different piece of the first linear type beamlet is made to be less than predetermined reference plane error threshold to the irradiation position offset of second datum mark and the 3rd datum mark while irradiation respectively.Precision is high, reliability is high, at low cost and be easy to lay.

Description

A kind of planar laser beam sending method and device

Technical field

The present invention relates to automatic measurement field more particularly to a kind of planar laser beam sending method and devices.

Background technology

Displacement detecting, shape changing detection to building or industrial plants have a wide range of applications demand, wherein, to bridge, The displacement of dam and rail or shape changing detection are safe operation, the important technical of production.

At present, collimation line detection method, GPS are included to dam and bridge displacement, the method for shape changing detection（Worldwide navigation system System）And the associated methods of these methods and surface displacement sensor；To rail（Track traffic travels rail）Displacement and deformation Detection includes the measurement of absolute displacement or deformation based on CPIII (Control Point III) or based on total powerstation and measurement The property of vehicle is to displacement or distortion measurement or uses the measurement based on displacement sensor.

Collimation line method mostly sets station method using fixed endpoint, that is, establishes a fixation to dam and bridge displacement, shape changing detection Collimation line measures the deviation value of each displacement punctuate.This method observation is simple, and convenience of calculation is the common side of production unit Method.

GPS detection methods are that the navigator fix sent by GPS/ big-dipper satellites is believed to dam and bridge displacement, shape changing detection The three-dimensional coordinate of number definite ground tested point；Or mating surface displacement sensor monitors dam body surface crack deformation in real time, It is gathered trigger-type or by way of gathering in real time, using wire/wireless telecommunication network transmitting real-time data to monitoring center, The crack progressing situation of dam body is understood in time.

A kind of mode of traveling rail displacement measurement based on displacement sensor is to use eddy current displacement sensor, current Current vortex sensor can overcome sensitive to measured target object material and generate excessive change of sensitivity, measuring range shortening, line Property degree be deteriorated the defects of.

Application No. CN201510932848.2, the patent application of entitled " a kind of collimation line deformation measurement method " A kind of collimation line deformation measurement method is disclosed, can effectively be solved using overall length datum line to sight benchmark, and when datum line is too long, Objective fuzzy, sights low precision, backsight point and measuring point apart from too wide in the gap, telescope error of focusing be affected the problem of, energy Effectively reduce influence of the Atmosphere Refraction to observed result.

Application No. CN201410668036.7, a kind of entitled " total powerstation collimation line method horizontal displacement observation platform And its application method " include：Including pedestal, the slideway being arranged on pedestal, perpendicular to pedestal and can along slideway slide sighting Portion, the pointer for being fixed on alidade bottom are arranged on pedestal and scale face corresponding with reading pointer, laser.In use, Distortion monitoring points after total powerstation collimation line method horizontal displacement observation platform scale face paste is tightly subjected to displacement, are sent by laser Laser determine observed direction, adjustment scale face is vertical with the plane of collimation, three adjusting spirals of turn, it is ensured that pedestal is horizontal, and general The initial scale value at the center of measuring platform face distortion monitoring points position is recorded at this time, finds distortion monitoring points, Zhi Huiguan Scaffold tower operator translates alidade, makes reflector plate and total powerstation telescope inner cross silk weight on alidade with crossline of sight It closes, then the corresponding scale value of reading pointer is write down, initial scale value is subtracted with the scale value, be that the deformation point deviates collimation The displacement in face namely its compared with home position displacement.

Application No. CN201610857432.3, entitled " the track condition on-line monitoring side based on laser monitoring Method " discloses a kind of by telecommunication transmission system, orbit monitoring central apparatus, laser distance detector, microprocessor and communication mould The track condition on-line monitoring method based on laser monitoring that block is realized, can be to the change of the relative spacing between two tracks Change, the variation of level, the variation of track fastening facilities and deformation are monitored on-line, have monitoring real-time good, to burst Property orbit parameter variation can find and alarm in time, test job amount and it is at low cost the characteristics of.

Application No. CN201611156166.8, entitled " a kind of rail track is to the photogrammetric side of detection Method " is disclosed in track detection car movement forward, and rail level camera gathers the list in the presence of fixed geometric distortion at a certain distance Rail image carries out Geometry rectification, matching, splicing to image, and so as to obtain the long rail image of width two dimension, side is carried out to long rail image Edge detects, and can tentatively obtain the inward flange of long rail.Cable architecture light source launches laser plane, laser from vertical rail y direction Plane forms a striation curve that can reflect rail profile feature in Rail Surface, and trackside camera is shot every a distance The striation curve.Striation refinement, rail profile reduction and rail profile matching are carried out to the image that trackside camera obtains, is calculated Go out the fat edges value of rail profile, the long rail inward flange of corresponding position is compensated according to the fat edges value calculated, so as to Long rail inward flange at rail level down 16mm.According to the long rail inward flange, two-dimensional coordinate is established, it is each on edge so as to obtain The coordinate of a point, you can calculate railroad track everywhere arbitrary chord length rail to.

In existing displacement and distortion measurement technology, total station survey equipment costliness efficiency is low, and photogrammetry needs are borrowed Detection trolley is helped, collimation line method sighting mark error in the case where distance is longer is multiplied.

The content of the invention

The present invention provides a kind of planar laser beam sending method and device, for overcoming total station survey equipment costliness efficiency Low, photogrammetry is needed by detection trolley, and collimation line method sighting mark error in the case where distance is longer is multiplied, it is impossible to At least one of measurement efficiency these shortcomings are improved for building observation reference plane.

The present invention provides a kind of planar laser beam sending method, includes the following steps：

By the corresponding first datum mark transmitting L-shaped planar laser beam in the first reference position, make the L-shaped planar laser beam Comprising the first linear type beamlet different piece the first benchmark light target corresponding to the second reference position and the 3rd base respectively Level is put corresponding second benchmark light target and is irradiated simultaneously；

The point of irradiation of the first linear type beamlet is obtained compared with the corresponding datum mark of benchmark light target using benchmark light target Position offset information, the direction of illumination and wave beam of the first linear type beamlet are adjusted according to the irradiation position offset information At least one of face normal direction makes the different piece of the first linear type beamlet respectively to second datum mark and the 3rd The irradiation position offset that datum mark irradiates simultaneously is less than predetermined reference plane error threshold；

Wherein,

The L-shaped planar laser beam includes the first and second linear type beamlets, the thickness of the first and second linear type beamlets Degree dimension equidistant point intersects or intersects vertically, and wherein at least one linear type beamlet is used as detecting the position ginseng of object under test The observation reference plane of position or displacement according to point.

The present invention provides a kind of planar laser beam sending device, includes following module：

Planar laser beam irradiation module, planar laser beam irradiation control module and irradiation position data obtaining module；Wherein,

Planar laser beam irradiation module, for by the corresponding first datum mark transmitting L-shaped planar laser in the first reference position Wave beam makes the different piece for the first linear type beamlet that the L-shaped planar laser beam includes respectively to the second reference position The corresponding second benchmark light target of corresponding first benchmark light target and the 3rd reference position irradiates simultaneously；And for making described The irradiation position that the different piece of one linear type beamlet respectively irradiates second datum mark and the 3rd datum mark simultaneously is inclined Shifting amount is less than predetermined reference plane error threshold；Including laser light source submodule, laser beam shaping submodule block, light reflection surface submodule Block and light reflection surface rotate servo submodule；

Planar laser beam irradiates control module, for controlling the irradiation of planar laser beam irradiation module, makes its warp The different piece for the first linear type beamlet that the L-shaped planar laser beam that the first datum mark emits includes is crossed respectively to the second base Level puts the corresponding second benchmark light target of corresponding first benchmark light target and the 3rd reference position and irradiates simultaneously or make what it emitted First linear type beamlet misses the irradiation position offset of second datum mark and the 3rd datum mark less than predetermined reference plane Poor thresholding, the direction of illumination control submodule including planar laser beam, beam planes normal direction are directed toward control submodule and datum mark At least one of coordinate sub-module stored；

Irradiation position data obtaining module obtains the point of irradiation of the first linear type beamlet compared with this for benchmark light target The position offset information of the corresponding datum mark of benchmark light target, and the irradiation position direct information planar laser beam is irradiated and is controlled Molding block, including at least one of data transmission submodule and optical imaging sensor submodule；

Wherein,

The L-shaped planar laser beam includes the first and second linear type beamlets, the thickness of the first and second linear type beamlets Degree dimension equidistant point intersects or intersects vertically, and wherein at least one linear type beamlet is used as detecting the position ginseng of object under test The observation reference plane of position or displacement according to point.

The method and device that the embodiment of the present invention provides can overcome total station survey equipment costliness efficiency low, photogrammetry It needs by detection trolley, collimation line method sighting mark error in the case where distance is longer is multiplied, it is impossible to be used in structure observation At least one of these shortcomings of reference plane raising measurement efficiency.It is at low cost, precision is high, efficient, have practicability.

Other features and advantages of the present invention will be illustrated in the following description.

Description of the drawings

Fig. 1 is a kind of planar laser beam sending method flow chart that the embodiment of the present invention provides；

Fig. 2 is a kind of planar laser beam sending device composition schematic diagram that the embodiment of the present invention provides.

Embodiment

The present invention provides a kind of planar laser beam sending method and device, for overcoming total station survey equipment costliness efficiency Low, photogrammetry is needed by detection trolley, and collimation line method sighting mark error in the case where distance is longer is multiplied, it is impossible to At least one of measurement efficiency these shortcomings are improved for building observation reference plane.

Understand to make the object, technical solutions and advantages of the present invention clearer, below in conjunction with attached drawing to the reality of the present invention Example is applied to be described in detail.It should be noted that in the case where there is no conflict, the spy in embodiment and embodiment in the application Sign can be mutually combined.

Method citing and device citing provided by the invention are related to concept, are described as follows：

First, second, and third reference position that method and device embodiment provides, be arranged on geographical location and shape invariance or On not labile object, object under test can changed object for geographical location or body form；

Specifically, as geographical location or body form can changed object a kind of example, the row that track traffic uses Sail rail physical location can because vehicle roll or natural cause occur translation and deformation at least one of.

First, second, and third reference position that method and device embodiment provides is located in a different geographical location respectively, Corresponding first, second, and third datum mark is respectively provided with different geographic coordinate values.

Specifically, the geographic coordinate values of first, second, and third datum mark is known or unknown；

The geographic coordinate values of first, second, and third datum mark is unknown, the field applied to the relative displacement of monitoring object position Scape, under the application scenarios, it is only necessary to judge whether testee is subjected to displacement compared with observation reference plane.

Planar laser beam described in method and device embodiment refers to include linear type shape in the cross-sectional shape of wave beam Section；Or the light of linear type shape is included in light spot shape of the beam in the plane perpendicular with the main direction of propagation of wave beam Spot；

Specifically, the specific example of planar laser beam is linear type wave beam, zigzag wave beam, cross wave beam, rich font ripple Any one of beam, river font wave beam, San fonts wave beam, ⊕ fonts wave beam, ⊥ fonts wave beam, ⊿ fonts wave beams and L-shaped wave beam, Because in the cross-sectional shape of the wave beam or beam formed in the plane perpendicular with the main direction of propagation of wave beam The laser beam of linear type shape is included in hot spot.

Preferably, planar laser beam is linear type wave beam or L-shaped wave beam or cross wave beam.

L-shaped wave beam, ⊥ fonts wave beam or cross wave beam all comprising linear type wave beam element or include linear type sub-light Beam；

⊥ fonts wave beam or cross wave beam include L-shaped wave beam element and include L-shaped beamlet.

For the ease of planar laser beam is described, the present embodiment is defined by taking linear type wave beam as an example or specification is as follows The meaning of term, these are also applied for linear type beamlet based on the term meaning that linear type wave beam provides：

Before concrete term meaning is provided, point out initially that：Linear type wave beam described in the present embodiment is with wave beam on the width The facets such as the angle of width angle are the symmetrical wave beam of the plane of symmetry or the symmetrical wave using the angular bisector of beam-width angle as symmetry axis Beam；Linear type wave beam described in the present embodiment is using facets such as the angles at wave beam thickness angle as the symmetrical wave of the plane of symmetry on thickness Beam or using the angular bisector at wave beam thickness angle as the symmetrical wave beam of symmetry axis；

Linear type wave beam refer to wave beam cross-sectional shape or beam in the plane perpendicular with the main direction of propagation of wave beam Light spot shape be linear type；The cross section of the wave beam refers to cutting in the plane perpendicular with the main direction of propagation of wave beam Face；

Linear type wave beam width dimension half-power angle, refer to linear type wave beam a wordline extending direction institute planar partly Power perspective；

Linear type beam angle ties up equidistant point, refers to perpendicular to a wordline hot spot of linear type wave beam or linear type cross section simultaneously And the plane for halving the half-power angle of linear type surface wave beam；

The thickness dimension half-power angle of linear type wave beam, refers to linear type wave beam in the plane vertical with a wordline extending direction Half-power angle；

The thickness dimension equidistant point of linear type wave beam, refers to tie up equidistant point and by linear type perpendicular to linear type beam angle The plane that the thickness dimension half-power angle of wave beam is halved；

The optical axis or optical axis of linear type wave beam refer to the thickness Wei Jiao of linear type beam angle dimension equidistant point and linear type wave beam Divide the intersection in face equally.

Specifically, when the planar laser beam described in the present embodiment for wave beam cross-sectional shape in or beam with When the laser beam of linear type shape is included in the hot spot formed in the perpendicular plane in the main direction of propagation of wave beam, for example, face to face Shape laser beam is zigzag wave beam, cross wave beam, rich font wave beam, river font wave beam, San fonts wave beam, ⊕ font ripples When any one of beam, ⊥ fonts wave beam, ⊿ fonts wave beams and L-shaped wave beam, choosing wherein has the one of linear type beam shape A wave beam composition part will tie up half-power as linear type wave beam element to the width of the linear type wave beam of linear type beam definitions Angle, linear type beam angle dimension equidistant point, the thickness dimension half-power angle of linear type wave beam, the thickness dimension of linear type wave beam The concept of the optical axis or optical axis of equidistant point and linear type wave beam is applied to the linear type wave beam element.

Below in conjunction with the accompanying drawings, method for detecting position provided by the invention citing, system citing are illustrated.

Embodiment one, a kind of planar laser beam sending method citing

Shown in Figure 1, a kind of planar laser beam sending method embodiment provided by the invention includes the following steps：

Step S110 emits L-shaped planar laser beam by corresponding first datum mark in the first reference position, makes the L-shaped face The different piece for the first linear type beamlet that shape laser beam includes the first reference light corresponding to the second reference position respectively The corresponding second benchmark light target of target and the 3rd reference position irradiates simultaneously；

Step S120, the point of irradiation that the first linear type beamlet is obtained using benchmark light target are corresponded to compared with the benchmark light target Datum mark position offset information, the irradiation side of the first linear type beamlet is adjusted according to the irradiation position offset information To at least one of with beam planes normal direction, make the different piece of the first linear type beamlet respectively to second benchmark The irradiation position offset that point and the 3rd datum mark irradiate simultaneously is less than predetermined reference plane error threshold；

Wherein,

The L-shaped planar laser beam includes the first and second linear type beamlets, the thickness of the first and second linear type beamlets Degree dimension equidistant point intersects or intersects vertically, and wherein at least one linear type beamlet is used as detecting the position ginseng of object under test The observation reference plane of position or displacement according to point.

Specifically, the second datum mark corresponds to first observation reference plane the first benchmark light target, which swashs for obtaining planar Irradiation position of the light beam at the second reference position, the 3rd datum mark correspond to first observation reference plane the second benchmark light target, should Light target is used to obtain irradiation position of the planar laser beam at the 3rd reference position.

The method that this implementation provides, further includes：

Using by first datum mark be pointed into second and the 3rd datum mark planar laser beam beam planes as first see Reference plane is surveyed, the position reference point of object under test is obtained compared with the position or position of the observation reference plane using the first measurement light target It moves.

The method that the present embodiment provides, wherein,

The measurement light target, the position reference point comprising object under test or definite comprising the position reference point holding with surveying object Position correspondence point.

The method that the present embodiment provides, wherein,

First, second, and third datum mark, for determining a plane, at least a portion of the plane is as observation benchmark Face, the observation reference plane are used to determine position or the change in location of object under test.

Specifically, when the point position of the second datum mark and the 3rd datum mark is top-bottom layout, first, second, and third benchmark Point determines that is erect the observation base that plane determines a setting as observation reference plane or first, second, and third datum mark Quasi- face；

When the point position of the second datum mark and the 3rd datum mark is left-right layout, first, second, and third datum mark determines one Horizontal plane or transverse plane determine a horizontal as observation reference plane or first, second, and third datum mark or laterally see Survey reference plane；

Further, when erect plane normal direction parallel to horizontal plane when, the setting plane be vertical plane, the vertical plane Interior observation reference plane is Vertical Observation reference plane；When horizontal plane or the normal direction of transverse plane are perpendicular to horizontal plane, The horizontal plane or transverse plane are horizontal plane, and the observation reference plane in the plane is horizontal observation reference plane；

Further, the observation reference plane of setting or Vertical Observation reference plane are used for horizontal stroke of the observed objects compared with observation reference plane To displacement；Laterally observation reference plane or horizontal observation reference plane are used for vertical position of the observed objects compared with the observation reference plane It moves；

Preferably, using Vertical Observation reference plane observed objects compared with the lateral displacement of observation reference plane；It is observed using level Reference plane observed objects compared with the observation reference plane vertical displacement.

In the present embodiment, emit L-shaped planar laser beam by corresponding first datum mark in the first reference position, including：

Make the beam planes intersection for the first and second linear type beamlets that L-shaped planar laser beam includes on light reflection unit Incidence point is less than predetermined incidence point distance with the first datum mark concurrent position or with the range error of first datum mark Error threshold.

The beam planes are that the thickness Wei Jiao for the first and second linear type beamlets that L-shaped planar laser beam includes is put down Facet；

The beam planes intersection is that the thickness Wei Jiao for the first and second linear type beamlets that L-shaped planar laser beam includes is put down The intersection of facet.

The light reflection unit includes light reflection surface and light reflection surface supporting body；

The beam planes intersection for the first and second linear type beamlets that the L-shaped planar laser beam includes is on light reflection unit Incidence point be incidence point on the light reflection surface that is included in light reflection unit.

Specifically, light reflection unit includes any one of light reflection mirror, light reflection eyeglass and optical reflection film.

Specifically, the predetermined incidence point range error thresholding is real number of the value range between 0 to 3 millimeter, no Including 0 value, including 3 values；

Preferably, the predetermined incidence point range error thresholding is real number of the value range between 0 to 0.3 millimeter, is not wrapped 0 value is included, including 0.3 value.

It is described to be included using by the L-shaped planar laser beam of first, second, and third datum mark in the present embodiment First or second linear type beamlet where plane as observation reference plane, including：

The L-shaped planar of predetermined reference plane error threshold is respectively smaller than using the distance with first, second, and third datum mark Plane is as observation reference plane where the thickness dimension equidistant point for the linear type beamlet that laser beam includes；Or

Use the L-shaped planar laser for being less than predetermined reference plane error threshold with the distance of first, second, and third datum mark The optical axis for the linear type beamlet that wave beam includes is formed with the linear type hot spot of the beamlet in the center line of its length direction Plane as observation datum plane.

In the present embodiment, the thickness dimension equidistant point for the linear type beamlet that L-shaped planar laser beam includes is also referred to as The mid-depth face of linear type wave beam.

Specifically, the mid-depth face of the linear type beamlet is by two flat tables to pancake linear type wave beam The equidistant point in face is formed.

Specifically, the predetermined reference plane error threshold is real number of the value range between 0 to 5 millimeter, not including 0 Value, including 5 values；

Preferably, the predetermined reference plane error threshold is real number of the value range between 0 to 0.5 millimeter, is not worth including 0, Including 0.5 value.

The method that the present embodiment provides, wherein,

The different piece for making the first linear type beamlet respectively to second datum mark and the 3rd datum mark simultaneously The irradiation position offset of irradiation is less than predetermined reference plane error threshold, including：

By corresponding first datum mark transmitting " L " shape planar laser beam in the first reference position, make " L " shape planar laser The irradiation of the inflection point of wave beam corresponding to the second reference position the second datum mark, make " L " shape planar laser beam inflection point it Corresponding 3rd datum mark in the 3rd reference position is irradiated in outer horizontal line part or vertical line part simultaneously；First base will be passed through Be pointed on schedule second and the 3rd datum mark " L " shape planar laser beam horizontal line part and vertical line part corresponding beam planes point It Zuo Wei not the first and second observation reference planes；

Preferably, the corresponding beam planes in horizontal line part and vertical line part of " L " shape planar laser beam are orthogonal wave beam Face.

Specifically, described " L " shape planar laser beam is " L " for the cross sectional shape on the vertical plane of its main direction of illumination The wave beam of shape is to include the ⊥ fonts wave beam or ten of " L " shape element for the cross sectional shape on the vertical plane of its main direction of illumination Font wave beam.

In the present embodiment, the meaning of both expression-forms of " L " shape with L-shaped is identical.

Specifically, the predetermined reference plane error threshold is real number of the value range between 0 to 5 millimeter, not including 0 Value, including 5 values；

Preferably, the predetermined reference plane error threshold is real number of the value range between 0 to 0.5 millimeter, is not worth including 0, Including 0.5 value.

In the present embodiment, " L " the shape planar laser beam, to cover the planar laser beam of observation reference plane, including：

The thickness for the first or second linear type beamlet that " L " shape planar laser beam includes ties up equidistant point and three are in not Distance with the datum mark of position is respectively smaller than the planar laser beam of predetermined reference plane error threshold, and the observation reference plane is Through the plane of described three datum marks in different position, it is preferable that the planar laser beam is linear type wave beam or L-shaped The linear type beamlet that planar laser beam includes；Or

Its optical axis is in different in the plane that the center line of its length direction is formed from the linear type hot spot of the wave beam with three The distance of the datum mark of position is respectively smaller than the planar laser beam of predetermined reference plane error threshold, and the observation reference plane is to wear Cross the plane of described three datum marks in different position, it is preferable that the planar laser beam is linear type wave beam or L-shaped face The linear type beamlet that shape laser beam includes.

The benchmark light target, including at least one of one-dimensional, two and three dimensions benchmark light target.

The one-dimensional benchmark light target, including the passive scattering where any one of strip scattering surface or cylindricality scattering surface Body is included in the fixed or movable optical detector laid in a dimension；

The position reference of ranging datum mark or object under test that the passive scattering object or optical detector include for benchmark light target Point is compared with the position for observing reference plane.

The method that the present embodiment provides, wherein,

The two dimension benchmark light target, the passive planar formed including a scattering surface or including being made of a parallel surface Active planar；

The passive planar or active planar and the intersection of observation reference plane are used to measure the trend of hot spot or beam planes or be used for Determine angle of inclination of the benchmark light target compared with observation reference plane.

Specifically, same active or passive parallel surface is to identical normal direction, when the benchmark light target includes During two or more parallel surfaces pair, the normal direction of different parallel surfaces pair is different.

Specifically, same active or passive parallel surface should to that can receive covering from different observation reference planes simultaneously Observe the irradiation of the planar laser beam of reference plane.

Specifically, the scale of the passive parallel surface pair or active parallel surface pair is it is known that the spacing of two parallel surfaces is It is known.

Further, when parallel surface is to having the plane of square edge for two, the square length of side is known.

Further, parallel surface to comprising two have square edge planes on, be laid with known to position Measure index point or measurement control point.

The method that the present embodiment provides, wherein,

The three-dimensional references light target, including a passive parallel surface pair being made of two parallel scattering surfaces or including by two The active parallel surface pair that a parallel surface is formed, the parallel surface is to being used to determine observation reference plane compared with benchmark light target It moves towards or for determining angle of inclination of the benchmark light target compared with observation reference plane.

Specifically, same active or passive parallel surface is to identical normal direction, when the benchmark light target includes During two or more parallel surfaces pair, the normal direction of different parallel surfaces pair is different.

Specifically, same active or passive parallel surface should to that can receive covering from different observation reference planes simultaneously Observe the irradiation of the planar laser beam of reference plane.

Specifically, the scale of the passive parallel surface pair or active parallel surface pair is it is known that the spacing of two parallel surfaces is It is known.

In the present embodiment, as a kind of specific implementation of active parallel surface pair, active parallel surface to comprising first It is rectangular planes or square-shaped planar with the second plane.

In the present embodiment, as a kind of specific implementation of active parallel surface pair, active parallel surface to comprising light visit Device or optical imaging sensor the first plane of place are surveyed as a strip plane or the cruciform plan being made of two strips, The second plane of place is rectangular planes or square-shaped planar.

In the present embodiment, as a kind of specific implementation of passive parallel surface pair, passive parallel surface to comprising scattering The first and second planes where face are rectangular planes or square-shaped planar.

In the present embodiment, as a kind of specific implementation of passive parallel surface pair, passive parallel surface to comprising scattering The first plane where face is a strip plane or the cruciform plan being made of two strips, and the second plane is rectangle Plane or square-shaped planar.

Specifically, same active or passive parallel surface is to identical normal direction, when the benchmark light target includes During two or more parallel surfaces pair, the normal direction of different parallel surfaces pair is different.

Specifically, same active or passive parallel surface should to that can receive covering from different observation reference planes simultaneously Observe the irradiation of the planar laser beam of reference plane.

Further, when parallel surface is to having the plane of square edge for two, the square length of side is known.

Further, parallel surface to comprising two have square edge planes on, be laid with known to position Measure index point or measurement control point.

Specifically, a kind of realization method of the active or passive parallel surface pair included as benchmark light target, including：

Using the first square-shaped planar as the first parallel surface, using the second square-shaped planar as the second parallel surface, first just The square planar length of side is less than the length of side of the second square-shaped planar, and four vertex of the first square-shaped planar are respectively positioned on the second square On the diagonal of plane, the first square-shaped planar is the known numerical value more than zero with the second square-shaped planar spacing, also, the One square-shaped planar and the distance of observation benchmark area source are less than the second square-shaped planar with observing the distance of benchmark area source.

The method that the present embodiment provides, wherein,

It is described to emit L-shaped planar laser beam by corresponding first datum mark in the first reference position, make the L-shaped planar laser The different piece for the first linear type beamlet that wave beam includes the first benchmark light target corresponding to the second reference position and respectively The corresponding second benchmark light target in three reference positions irradiates simultaneously, including following at least one step：

The observation for determining to be determined by first, second, and third datum mark using the coordinate information of first, second, and third datum mark At least one of the normal direction direction of reference plane and Lighting direction reference plane parameter, the base is used using the reference plane parameter Planar laser beam irradiation module described in quasi- face state modulator is at least one for shaft turn in first axle and second axis Dynamic light reflection unit makes the different piece for the first linear type beamlet that the L-shaped planar laser beam includes respectively to second The corresponding first benchmark light target in reference position and the corresponding second benchmark light target in the 3rd reference position irradiate simultaneously；And

The the first linear type beamlet included using L-shaped planar laser beam is at least one in the first and second benchmark light targets Irradiation position information, in first axle and second axis it is at least one for shaft rotate light reflection unit, make the L The different piece for the first linear type beamlet that shape planar laser beam includes the first base corresponding to the second reference position respectively The corresponding second benchmark light target of quasi-optical target and the 3rd reference position irradiates simultaneously.

The method that the present embodiment provides, wherein,

The first axle is vertical axis or vertical direction axis, and second axis is transverse axis or horizontal direction axis；Or, The first axle is transverse axis or horizontal direction axis, and second axis is vertical axis or vertical direction axis；

First axle intersects or intersects vertically with second axis.

Preferably, first axle is vertical direction axis, and second axis is horizontal direction axis；Or first axle is level Azimuth axis, second axis are vertical direction axis.

Specifically, light reflection unit includes any one of light reflection mirror, light reflection eyeglass and optical reflection film.

Specifically, predetermined incidence point range error thresholding is real number of the value range between 0 to 3 millimeter, not including 0 Value, including 3 values；

Preferably, the predetermined incidence point range error thresholding is real number of the value range between 0 to 0.3 millimeter, is not wrapped 0 value is included, including 0.3 value.

As making the different piece of the first linear type beamlet that the L-shaped planar laser beam includes respectively to the second base Level puts a kind of specific reality of the corresponding second benchmark light target of corresponding first benchmark light target and the 3rd reference position while irradiation Existing mode, including：The first portion of the first linear type beamlet is obtained positioned at the second reference position from the second reference position Relative position information between the hot spot and the second datum mark that are generated on benchmark light target obtains the first linear type from the 3rd reference position It is opposite between hot spot and the 3rd datum mark that the second portion of beamlet generates on the benchmark light target positioned at the 3rd reference position Location information, using the relative position information at least one for shaft rotation light reflection in first axle and second axis Unit makes the different piece of the linear type laser beam simultaneously to the second benchmark light target and the 3rd reference light target radiation.

The method that the present embodiment provides, wherein,

It is described using planar laser beam irradiation module described in the reference plane state modulator in first axle and second axis It is at least one to rotate light reflection unit for shaft, further comprise：

With in first axle and second axis it is at least one for shaft rotate light reflection unit include L-shaped planar laser beam The second linear type beamlet different piece the first benchmark light target corresponding to the second reference position, the 3rd reference position respectively The corresponding 3rd benchmark light target of corresponding second benchmark light target and the 4th reference position irradiates simultaneously；

It is described using the first linear type beamlet that L-shaped planar laser beam includes in the first and second benchmark light targets at least The irradiation position information of one, at least one for shaft rotation light reflection unit in first axle and second axis, into One step includes：

With in first axle and second axis it is at least one for shaft rotate light reflection unit include L-shaped planar laser beam The second linear type beamlet different piece the first benchmark light target corresponding to the second reference position, the 3rd reference position respectively The corresponding 3rd benchmark light target of corresponding second benchmark light target and the 4th reference position irradiates simultaneously.

Specifically, the beam planes intersection for the first and second linear type beamlets that L-shaped planar laser beam includes generates Hot spot falls on the second benchmark light target.

The beam planes are that the thickness Wei Jiao for the first and second linear type beamlets that L-shaped planar laser beam includes is put down Facet；

The beam planes intersection is that the thickness Wei Jiao for the first and second linear type beamlets that L-shaped planar laser beam includes is put down The intersection of facet.

Further, it is described to be determined using the coordinate information of first, second, and third datum mark by first, second, and third benchmark At least one of the normal direction direction of the definite observation reference plane of point and Lighting direction reference plane parameter, use the reference plane Parameter using planar laser beam irradiation module described in the reference plane state modulator in first axle and second axis at least One rotates light reflection unit for shaft, makes the different portions for the first linear type beamlet that the L-shaped planar laser beam includes Point the first benchmark light target corresponding to the second reference position and the corresponding second benchmark light target in the 3rd reference position shine simultaneously respectively It penetrates, including：

Using the coordinate information of first, second, and third datum mark, determine that planar laser beam passes through first, second, and third base The normal orientation of its thickness dimension equidistant point, determines light reflection unit around first axle and second according to the normal orientation when on schedule At least one rotational angle in axis makes the planar reflected through light reflection unit laser beam expose to positioned at the second He On the benchmark light target of 3rd reference position；Or

Using the coordinate information of first, second, and third datum mark, determine that planar laser beam passes through first, second, and third base The normal orientation of its thickness dimension equidistant point, determines light reflection unit around first axle and second according to the normal orientation when on schedule At least one rotational angle range in axis, which includes the normal orientation, by the angle In the range of levelling to the reflection direction of light reflection unit, the planar laser beam for making to reflect through light reflection unit is with the side of scanning Formula expose to positioned at second and the 3rd reference position benchmark light target on.

It is in place to obtain the irradiation of the first portion for the first linear type beamlet that L-shaped planar laser beam includes in the present embodiment In the position on the benchmark light target of the second reference position and the relative position relation between the second datum mark and L-shaped planar laser The second portion for the first linear type beamlet that wave beam includes is radiated at the position on the benchmark light target of the 3rd reference position With the relative position relation between the 3rd datum mark, following at least one step is performed：

Optical imaging sensor at the second reference position and at the 3rd reference position is set, is obtained using the optical imaging sensor The first portion for the first linear type beamlet that L-shaped planar laser beam includes is taken to be radiated at the benchmark positioned at the second reference position The first linear type that relative position relation between position and the second datum mark and L-shaped planar laser beam on light target include The second portion of beamlet is radiated at opposite between the position on the benchmark light target of the 3rd reference position and the 3rd datum mark Position relationship；

On the second benchmark light target on the first benchmark light target at the second reference position and at the 3rd reference position light is set to visit Device is surveyed, the first portion that the first linear type beamlet that L-shaped planar laser beam includes is obtained using the optical detector is radiated at Position on the benchmark light target of the second reference position and the relative position relation between the second datum mark and L-shaped planar swash The second portion for the first linear type beamlet that light beam includes is radiated at the position on the benchmark light target of the 3rd reference position Put the relative position relation between the 3rd datum mark；

Optical imaging sensor at the second reference position is set, L-shaped planar laser wave is obtained using the optical imaging sensor The first portion for the first linear type beamlet that beam includes be radiated at position on the benchmark light target of the second reference position with Relative position relation between second datum mark sets optical detector on the second benchmark light target at the 3rd reference position, uses The second portion that the optical detector obtains the first linear type beamlet that L-shaped planar laser beam includes is radiated at positioned at the 3rd base The position on benchmark light target and the relative position relation between the 3rd datum mark that level is put；And

Optical imaging sensor at the first reference position is set, L-shaped planar laser wave is obtained using the optical imaging sensor The first portion for the first linear type beamlet that beam includes be radiated at position on the benchmark light target of the second reference position with Second of the first linear type beamlet that relative position relation and L-shaped planar laser beam between second datum mark include Divide and be radiated at the position on the benchmark light target of the 3rd reference position and the relative position relation between the 3rd datum mark.

Specifically, the described relative position relation between the second datum mark, including take that L-shaped planar laser beam includes The first portion of one linear type beamlet is radiated at position and the second datum mark on the benchmark light target of the second reference position Between the first linear type beamlet for including of distance, relative direction and L-shaped planar laser beam hot spot trend at least one Kind information.

Specifically, the described relative position relation between the 3rd datum mark includes taking that L-shaped planar laser beam includes the The second portion of one linear type beamlet is radiated at position and the second datum mark on the benchmark light target of the 3rd reference position Between the first linear type beamlet for including of distance, relative direction and L-shaped planar laser beam hot spot trend at least one Kind information.

The benchmark light target include the benchmark light target being made of optical imaging sensor and light reflector, optical imaging sensor and Benchmark light target that light-scattering body is formed, the benchmark light target being made of light reflector, the benchmark light target being made of light-scattering body and by At least one of benchmark light target that optical detector is formed.

The benchmark light target being made of light reflector, be included in reflected fudicial light target ad hoc at the second reference position or Borrow the reference light handle that the reflection characteristic of the object at the second reference position is formed.

The benchmark light target being made of light-scattering body, be included in scattering benchmark light target ad hoc at the second reference position or Borrow the reference light handle that the scattering properties of the object at the second reference position is formed.

The method that the present embodiment provides, wherein,

It is described to obtain the point of irradiation of the first linear type beamlet compared with the corresponding base of benchmark light target using benchmark light target Position offset information on schedule, according to the irradiation position offset information adjust the first linear type beamlet direction of illumination and At least one of beam planes normal direction, make the different piece of the first linear type beamlet respectively to second datum mark and The irradiation position offset that 3rd datum mark irradiates simultaneously is less than predetermined reference plane error threshold, including following at least one step Suddenly：

The thickness for obtaining the first linear type beamlet that L-shaped planar laser beam includes ties up equidistant point to the second reference position pair The distance d2 for the second datum mark answered, the thickness for obtaining the first linear type beamlet tie up equidistant point to the 3rd reference position pair The distance d3 for the 3rd datum mark answered；Or using irradiation position data obtaining module obtain that L-shaped planar laser beam includes the The thickness of two linear type beamlets ties up equidistant point to the distance d2 of corresponding second datum mark in the second reference position, obtain this The thickness of two linear type beamlets ties up equidistant point to the distance d4 of corresponding 4th datum mark in the 4th reference position；Judge distance In d2 and distance d3 or judge whether there is to be more than a predetermined reference plane error threshold in distance d2 and distance d4；It is if so, logical Cross the irradiation side for the first and second linear type beamlets that planar laser beam irradiation module adjustment L-shaped planar laser beam includes To at least one of with beam planes normal direction, make distance d2 and distance d3 or distance d2 and distance d4 is made to be respectively less than predetermined benchmark Surface error thresholding；If it is not, the direction of illumination for the first and second linear type beamlets that L-shaped planar laser beam includes is not adjusted then With beam planes normal direction；

The intersection of the thickness dimension equidistant point of the first and second linear type beamlets for including of L-shaped planar laser beam is obtained to the The distance d2 of corresponding second datum mark in two reference positions obtains the first linear type beamlet that L-shaped planar laser beam includes Thickness tie up equidistant point to corresponding 3rd datum mark in the 3rd reference position distance d3；Judge be in distance d2 and distance d3 It is no to there is one to be more than predetermined reference plane error threshold；If so, L-shaped planar laser is adjusted by planar laser beam irradiation module At least one of the direction of illumination for the first and second linear type beamlets that wave beam includes and beam planes normal direction, make distance d2 and Distance d3 is respectively less than predetermined reference plane error threshold；If it is not, do not adjust that L-shaped planar laser beam includes then the first and second one The direction of illumination of font beamlet and beam planes normal direction；And

The intersection of the thickness dimension equidistant point of the first and second linear type beamlets for including of L-shaped planar laser beam is obtained to the The distance d2 of corresponding second datum mark in two reference positions obtains the first linear type beamlet that L-shaped planar laser beam includes Thickness tie up equidistant point to corresponding 3rd datum mark in the 3rd reference position distance d3, obtain L-shaped planar laser beam bag The thickness of the second linear type beamlet contained ties up equidistant point to the distance d4 of corresponding 4th datum mark in the 4th reference position；Sentence Whether turn-off has one to be more than predetermined reference plane error threshold in d2, d3 and distance d4；If so, pass through planar laser beam The direction of illumination of the first and second linear type beamlets and beam planes normal direction that irradiation module adjustment L-shaped planar laser beam includes At least one of, distance d2, d3 and distance d4 is made to be respectively less than predetermined reference plane error threshold；If it is not, L-shaped planar is not adjusted then The direction of illumination of the first and second linear type beamlets and beam planes normal direction that laser beam includes.

In the present embodiment, the planar laser beam is obtained to second datum mark and the 3rd datum mark using benchmark light target Irradiation position information, including：

The L-shaped planar laser of first observation the first benchmark of reference plane light target acquisition is received by wireless channel or wire channel The first linear type beamlet that wave beam includes to the irradiation position information of second datum mark and, by wireless channel or Wire channel receives the one one word that the L-shaped planar laser beam that first observation the second benchmark of reference plane light target obtains includes Shape beamlet is to the irradiation position information of the 3rd datum mark.

The method that the present embodiment provides, further include by by first datum mark be pointed into second and the 3rd datum mark L-shaped face The beam planes for the first linear type beamlet that shape laser beam includes are obtained as the first observation reference plane using the first measurement light target Position or displacement of the position reference point of object under test compared with the observation reference plane are taken, including following at least one step：

The position reference point of object under test is obtained compared with the first observation benchmark in upright state using the first measurement light target The lateral position in face or displacement；

The position reference point of object under test is obtained compared with the first observation benchmark in horizontal state using the first measurement light target The vertical position in face or displacement；

Mobile first measurement light target make it includes the change in location of position reference point of object under test embody determinand body surface The change in location in face is obtained when position reference point is moved on different position compared with the first observation benchmark in upright state The transverse positional offset in face, the lateral position for determining object under test surface using the offset change；And

Mobile first measurement light target make it includes the change in location of position reference point of object under test embody determinand body surface The change in location in face is obtained when position reference point is moved on different position compared with the first observation benchmark in horizontal state The vertical position offset in face, the vertical position for determining object under test surface using the offset change.

It is described by by first datum mark be pointed into second and the 3rd datum mark L-shaped planar laser beam include the The beam planes of one linear type beamlet as the first observation reference plane, joined by the position that object under test is obtained using the first measurement light target Include according to position of the point compared with the observation reference plane or displacement, a kind of specific implementation：

Position determining means, using it includes data transmission module obtain the first observation reference plane from the first measurement light target device Irradiation position information of the beam planes of corresponding planar laser beam at object under test and/or from the second measurement light target device Obtain irradiation position information of the beam planes of the corresponding planar laser beam of the second observation reference plane at object under test.

The position determining means that the present embodiment provides perform the output using the first measurement light target device, will pass through described First datum mark be pointed into second and the 3rd datum mark planar laser beam beam planes as the first observation reference plane, acquisition treats The position reference point of object is surveyed compared with the position of the observation reference plane or the operation of displacement, including following at least one operation step Suddenly：

Using the first measurement light target device export by first datum mark be pointed into second and the 3rd datum mark first see Irradiation position information of the beam planes of the corresponding planar laser beam of reference plane at object under test is surveyed, determines that object under test is opposite In at least one of relative position, relative shift and the relative displacement direction of the first observation reference plane information；And

Using the first measurement light target device export by first datum mark be pointed into second and the 3rd datum mark first see Irradiation position information of the beam planes of the corresponding planar laser beam of reference plane at object under test is surveyed, and is seen using definite first Survey datum-plane position first, second, and third datum mark coordinate information, determine object under test absolute location coordinates, definitely At least one of displacement and absolute displacement direction information.

In the present embodiment, the position reference point of object under test is obtained compared with the horizontal stroke of the first observation reference plane in upright state To position, the position reference point including obtaining object under test observes reference plane normal direction to the first observation reference plane along first Distance is observed along horizontal line direction to the distance of the first observation reference plane and along vertical line direction to first in the distance of reference plane It is at least one.

In the present embodiment, the position reference point of object under test is obtained compared with the first observation reference plane in upright state Lateral displacement, including obtain object under test position reference point along first observation reference plane normal direction to first observation benchmark The current distance in face, along horizontal line direction to first observation reference plane current distance and along vertical line direction to first observation benchmark At least one of the current distance in face, the difference for calculating the current distance and the distance respective direction obtained in the past in obtain The displacement of position reference point.

In the present embodiment, the position reference point of object under test is obtained compared with the first observation reference plane in horizontal state Vertical position, including obtain object under test position reference point along first observation reference plane normal direction to first observation benchmark The distance in face, the distance for observing reference plane to first along horizontal line direction and the distance along vertical line direction to the first observation reference plane At least one of.

In the present embodiment, the position reference point of object under test is obtained compared with the first observation reference plane in horizontal state Vertical displacement, including obtain object under test position reference point along first observation reference plane normal direction to first observation benchmark The current distance in face, along horizontal line direction to first observation reference plane current distance and along vertical line direction to first observation benchmark At least one of the current distance in face, the difference for calculating the current distance and the distance respective direction obtained in the past in obtain The displacement of position reference point.

In the present embodiment, mobile first measurement light target make it includes object under test position reference point change in location body Reveal the change in location on object under test surface, obtain when position reference point is moved on different position compared in upright state First observation reference plane transverse positional offset, using the offset determine object under test surface lateral position change, Including：

Measurement light target is set, which includes the position reference point of object under test, the measurement light target and it includes position Reference point changes with the lateral position on object under test surface and is changed in the horizontal, uses optical imaging sensor or optical detector The position for the hot spot that the planar laser beam by upright state received on detection measurement light target generates, uses the position of the hot spot Distance change between the position for the position reference point for including object under test with measurement light target determines the horizontal position on object under test surface Put variation.

Further, measure light target and include the light reflector or light-scattering body in transverse direction with specific length；Or, measurement light Target includes optical detector, and the detector is transversely arranged photodetector array or is transversely movable optical detector.

Specifically, a kind of specific implementation as measurement light target, the measurement light target prolong along track traffic traveling rail Direction movement is stretched, its change in location embodies the change in location of traveling rail inner surface in moving process, is used in erectting The observation reference plane and measurement light target of state detect the variation of traveling rail lateral position.

Specifically, the movement first measure light target make it includes object under test position reference point change in location body Reveal the change in location on object under test surface, obtain when position reference point is moved on different position compared in horizontal state First observation reference plane vertical position offset, using the offset determine object under test surface vertical position change, Including：

Measurement light target is set, which includes the position reference point of object under test, the measurement light target and it includes position Reference point changes with the vertical position on object under test surface on vertical and is changed, and uses optical imaging sensor or optical detector The position for the hot spot that the planar laser beam by horizontal state received on detection measurement light target generates, using by horizontal state Distance between the position for the position reference point that the position for the hot spot that planar laser beam generates and measurement light target include object under test Variation determines the vertical position variation on object under test surface.

Further, measure light target and include vertical upper light reflector or light-scattering body with specific length；Or, measurement light Target includes optical detector, which is vertically disposed photodetector array or is vertically movable optical detector.

Specifically, a kind of specific implementation as measurement light target, the measurement light target prolong along track traffic traveling rail Direction movement is stretched, its change in location embodies the height change of traveling rail upper surface in moving process, uses transverse direction or horizontal Observation reference plane and measurement light target detect the height change of traveling rail upper surface.

As mobile first measurement light target make it includes the change in location of position reference point of object under test embody determinand A kind of implementation method of the change in location in body surface face, using the traveling rail in track traffic as object under test, along track extension side To the position reference point of traverse measurement traveling rail position, its change in location is made to be consistent with travelling the change in location of track surface, It can be travelled compared with the position offset of the first observation reference plane on different position by measuring the position reference point The position offset of track surface.

In the present embodiment, linear type wave beam or the thickness dimension angle of linear type wave beam element that face shape wave beam includes divide face equally Also beam planes are referred to as.

Further, by by the first datum mark be pointed into second and the 3rd datum mark planar laser beam beam planes make For first observation reference plane and/or, will by the 4th datum mark be pointed into the 5th and the 6th datum mark planar laser beam ripple Beam face is as the second observation reference plane.

The method that the present embodiment provides, wherein,

First dimension is vertical dimension or vertical direction dimension, and the second dimension is transverse dimensions or horizontal direction dimension；It is or, described First dimension is transverse dimensions or horizontal direction dimension, and the second dimension is vertical dimension or vertical direction dimension；

First dimension intersects or intersects vertically with the second dimension.

Preferably, the first dimension is vertical direction dimension, and the second dimension is horizontal direction dimension；Or first dimension for level Direction dimension, the second dimension are vertical direction dimension.

The method that the present embodiment provides further includes horizontal reference point scaling method, specifically comprises the following steps：

The posture of platform where adjusting L-shaped planar laser beam source, is allowed in horizontality；

At least one emission level reference point Calibration of Laser under horizontality into second, third and the 4th benchmark light target Beam.

The horizontal reference point is used on reference-calibrating light target with the first datum at the first reference position in same The point position of point on a horizontal plane, horizontal reference point and datum mark can be identical or different, and one kind as horizontal reference point makes With mode, including：

Establish observe reference plane when, the datum mark that benchmark light target is actually used using its corresponding horizontal reference point as it is to L The irradiation position of shape planar wave beam guides, and is allowed to be irradiated on the corresponding horizontal reference point of the benchmark light target；Such situation Under, horizontal reference point is referred to as benchmark, also, in the point position difference of horizontal reference point and datum mark, the phase of the two It is known to position or spacing.

The horizontal reference point calibration wave beam, it is criss-cross that wave beam, which includes planar laser beam, the hot spot that hot spot is L-shaped, Planar laser beam, hot spot are the planar laser beam of linear type and hot spot is any one of dotted laser beam.

Generating the method for different laser beams includes following at least one step：

By the way that lens are moved into light path, lens are removed to light path and change at least one of position of the lens in light path mode The width of planar laser beam or the length of linear type hot spot are adjusted, makes the width of planar laser beam or the length of linear type hot spot Degree can cover the second datum mark and the 3rd datum mark simultaneously；And

By the way that lens are moved into light path, lens are removed to light path and change at least one of position of the lens in light path mode The thickness of planar laser beam or the thickness of linear type hot spot are adjusted, makes planar laser beam in the second datum mark and the 3rd benchmark Point is with the thickness or the thickness of linear type hot spot convenient for observation.

Embodiment two, a kind of planar laser beam sending device citing

It is shown in Figure 2, a kind of planar laser beam sending device embodiment provided by the invention, including：

Planar laser beam irradiation module 210, planar laser beam irradiation control module 220 and irradiation position data obtaining module 230；Wherein,

Planar laser beam irradiation module 210, for emitting L-shaped face by corresponding first datum mark 241 in the first reference position Shape laser beam makes the different piece for the first linear type beamlet 280 that the L-shaped planar laser beam includes respectively to second The corresponding second benchmark light target 252 in corresponding first benchmark light target, 251 and the 3rd reference position in reference position irradiates simultaneously；With And for making the different piece of the first linear type beamlet 280 respectively to 242 and the 3rd datum mark of the second datum mark The irradiation position offset of 243 irradiations simultaneously is less than predetermined reference plane error threshold；Including laser light source submodule, laser beam Shaping submodule block, light reflection surface submodule and light reflection surface rotate servo submodule；

Planar laser beam irradiates control module 220, for controlling the irradiation of planar laser beam irradiation module 210, Make the different piece of its first linear type beamlet 280 included by L-shaped planar laser beam that the first datum mark 241 emits The first benchmark light target 251 corresponding to the second reference position and the corresponding second benchmark light target 252 in the 3rd reference position are same respectively When irradiate or make the first linear type beamlet 280 that it emits to the photograph of 242 and the 3rd datum mark 243 of the second datum mark Position offset is penetrated less than predetermined reference plane error threshold, direction of illumination control submodule, wave beam including planar laser beam Face normal direction is directed toward at least one of control submodule and benchmark point coordinates sub-module stored；

Irradiation position data obtaining module 230 obtains the point of irradiation phase of the first linear type beamlet 280 for benchmark light target For the position offset information of the corresponding datum mark of benchmark light target, and by the irradiation position direct information planar laser beam Control module is irradiated, including at least one of data transmission submodule and optical imaging sensor submodule；

Wherein,

The L-shaped planar laser beam includes the first and second linear type beamlets, the thickness of the first and second linear type beamlets Degree dimension equidistant point intersects or intersects vertically, and wherein at least one linear type beamlet is used as detecting the position ginseng of object under test The observation reference plane of position or displacement according to point.

Specifically, shown in Figure 2, L-shaped planar laser beam includes the first linear type beamlet 280 and the 2nd 1 word The thickness dimension equidistant point of shape beamlet 290, the first linear type beamlet 280 and the second linear type beamlet 290 intersects or hangs down It is straight intersecting.

Specifically, the beam planes 281 of the first linear type beamlet 280 are the first linear type beamlet 280 in thickness dimension Equidistant point；Angle of the beam planes 291 of second linear type beamlet 290 for the second linear type beamlet 290 in thickness dimension Divide face equally.

Specifically, the second datum mark 242 corresponds to first observation the first benchmark of reference plane light target 251, which is used to obtain L Irradiation position of the shape planar laser beam at the second reference position, the 3rd datum mark 243 correspond to the first observation reference plane second Benchmark light target 252, the light target are used to obtain irradiation position of the L-shaped planar laser beam at the 3rd reference position；4th benchmark Point 244 corresponds to the 3rd benchmark light target 253, which is used to obtain irradiation of the L-shaped planar laser beam at the 4th reference position Position.

In the present embodiment, the first observation reference plane is by the first datum mark 241, the second datum mark 242 and the 3rd datum mark 243 It is common to determine and corresponding with the beam planes 281 of the first linear type beamlet 280；Second observation reference plane is by the first benchmark The 241, second datum mark 242 of point and the 4th datum mark 244 determine jointly, and with the beam planes of the second linear type beamlet 290 291 is corresponding.

The device that the present embodiment provides, wherein,

The planar laser beam irradiates control module 220, for the planar laser beam irradiation module 210 to be controlled to perform warp The corresponding first datum mark transmitting L-shaped planar laser beam in the first reference position is crossed, makes what the L-shaped planar laser beam included The different piece of first linear type beamlet the first benchmark light target corresponding to the second reference position and the 3rd reference position respectively The operation that corresponding second benchmark light target irradiates simultaneously, including following at least one operating procedure：

The observation for determining to be determined by first, second, and third datum mark using the coordinate information of first, second, and third datum mark At least one of the normal direction direction of reference plane and Lighting direction reference plane parameter, using described in the reference plane state modulator Planar laser beam irradiation module using planar laser beam irradiation module described in the reference plane state modulator with first axle and It is at least one for shaft rotation light reflection unit in second axis；And

The the first linear type beamlet included using L-shaped planar laser beam is at least one in the first and second benchmark light targets Irradiation position information, control the planar laser beam irradiation module at least one in first axle and second axis Rotating light reflection unit for shaft makes the different piece of the first linear type beamlet corresponding to the second reference position respectively The corresponding second benchmark light target of first benchmark light target and the 3rd reference position irradiates simultaneously.

The device that the present embodiment provides, wherein,

The first axle is vertical axis or vertical direction axis, and second axis is transverse axis or horizontal direction axis；Or, The first axle is transverse axis or horizontal direction axis, and second axis is vertical axis or vertical direction axis；

First axle intersects or intersects vertically with second axis.

Preferably, first axle is vertical direction axis, and second axis is horizontal direction axis；Or first axle is level Azimuth axis, second axis are vertical direction axis.

Specifically, light reflection unit includes any one of light reflection mirror, light reflection eyeglass and optical reflection film.

Specifically, predetermined incidence point range error thresholding is real number of the value range between 0 to 3 millimeter, not including 0 Value, including 3 values；

Preferably, the predetermined incidence point range error thresholding is real number of the value range between 0 to 0.3 millimeter, is not wrapped 0 value is included, including 0.3 value.

As making the different piece of the first linear type beamlet that the L-shaped planar laser beam includes respectively to the second base Level puts a kind of specific reality of the corresponding second benchmark light target of corresponding first benchmark light target and the 3rd reference position while irradiation Existing mode, including：The first portion of the first linear type beamlet is obtained positioned at the second reference position from the second reference position Relative position information between the hot spot and the second datum mark that are generated on benchmark light target obtains the first linear type from the 3rd reference position It is opposite between hot spot and the 3rd datum mark that the second portion of beamlet generates on the benchmark light target positioned at the 3rd reference position Location information, using the relative position information at least one for shaft rotation light reflection in first axle and second axis Unit makes the different piece of the linear type laser beam simultaneously to the second benchmark light target and the 3rd reference light target radiation.

The device that the present embodiment provides, wherein,

It is described using planar laser beam irradiation module described in the reference plane state modulator in first axle and second axis At least one operation that light reflection unit is rotated for shaft, further comprises：

Planar laser beam irradiation module 210 is controlled at least one in first axle and second axis to rotate light for shaft anti- The different piece for penetrating the second linear type beamlet that unit includes L-shaped planar laser beam respectively corresponds to the second reference position The first benchmark light target 251, corresponding 3rd base in corresponding second benchmark light target, 252 and the 4th reference position in the 3rd reference position Quasi-optical target 253 irradiates simultaneously；

It is described using the first linear type beamlet that L-shaped planar laser beam includes in the first and second benchmark light targets at least The irradiation position information of one, at least one for shaft rotation light reflection unit in first axle and second axis, into One step includes：

Planar laser beam irradiation module 210 is controlled at least one in first axle and second axis to rotate light for shaft anti- The different piece for penetrating the second linear type beamlet that unit includes L-shaped planar laser beam respectively corresponds to the second reference position The first benchmark light target 251, corresponding 3rd base in corresponding second benchmark light target, 252 and the 4th reference position in the 3rd reference position Quasi-optical target 253 irradiates simultaneously.

Specifically, the beam planes intersection for the first and second linear type beamlets that L-shaped planar laser beam includes generates Hot spot falls on the second benchmark light target.

The beam planes are that the thickness Wei Jiao for the first and second linear type beamlets that L-shaped planar laser beam includes is put down Facet；

The beam planes intersection is that the thickness Wei Jiao for the first and second linear type beamlets that L-shaped planar laser beam includes is put down The intersection of facet.

The device that the present embodiment provides, wherein,

The planar laser beam irradiates control module 220, and the first linear type is obtained using benchmark light target for performing The point of irradiation of light beam compared with the corresponding datum mark of benchmark light target position offset information, according to the irradiation position offset information At least one of direction of illumination and beam planes normal direction of the first linear type beamlet is adjusted, makes the first linear type The irradiation position offset that the different piece of light beam respectively irradiates second datum mark and the 3rd datum mark simultaneously is less than pre- The operation of reference plane error threshold is determined, including following at least one operating procedure：

The thickness that the first linear type beamlet that L-shaped planar laser beam includes is obtained using irradiation position data obtaining module is tieed up Equidistant point to corresponding second datum mark in the second reference position distance d2, obtain the first linear type beamlet thickness dimension Equidistant point to corresponding 3rd datum mark in the 3rd reference position distance d3；Or it is obtained using irradiation position data obtaining module The thickness for the second linear type beamlet that L-shaped planar laser beam includes ties up equidistant point to the second reference position corresponding second The distance d2 of datum mark, the thickness for obtaining the second linear type beamlet tie up equidistant point to the 4th reference position the corresponding 4th The distance d4 of datum mark；Judge in distance d2 and distance d3 or judge that whether having one to be more than in distance d2 and distance d4 makes a reservation for Reference plane error threshold；If so, the first He included by planar laser beam irradiation module adjustment L-shaped planar laser beam At least one of the direction of illumination of second linear type beamlet and beam planes normal direction make distance d2 and distance d3 or make distance D2 and distance d4 is respectively less than predetermined reference plane error threshold；If it is not, do not adjust L-shaped planar laser beam includes first and then The direction of illumination of two linear type beamlets and beam planes normal direction；

The first and second linear type beamlets for including of L-shaped planar laser beam are obtained using irradiation position data obtaining module The distance d2 of corresponding second datum mark 242 in 289 to the second reference position of intersection of thickness dimension equidistant point, obtains L-shaped planar 281 to the 3rd reference position the corresponding 3rd of thickness dimension equidistant point for the first linear type beamlet 280 that laser beam includes The distance d3 of datum mark 243；Judge whether there is to be more than a predetermined reference plane error threshold in distance d2 and distance d3；If so, The photograph for the first and second linear type beamlets that L-shaped planar laser beam includes then is adjusted by planar laser beam irradiation module At least one of direction and beam planes normal direction are penetrated, distance d2 and distance d3 is made to be respectively less than predetermined reference plane error threshold；If it is not, The direction of illumination of the first and second linear type beamlets and the beam planes normal direction that L-shaped planar laser beam includes are not adjusted then；With And

The first and second linear type beamlets for including of L-shaped planar laser beam are obtained using irradiation position data obtaining module The distance d2 of corresponding second datum mark 242 in 289 to the second reference position of intersection of thickness dimension equidistant point, obtains L-shaped planar 281 to the 3rd reference position the corresponding 3rd of thickness dimension equidistant point for the first linear type beamlet 280 that laser beam includes The distance d3 of datum mark 243 obtains the thickness dimension angle bisection for the second linear type beamlet 290 that L-shaped planar laser beam includes The distance d4 of corresponding 4th datum mark 244 in 291 to the 4th reference position of face；Judge whether have in distance d2, d3 and distance d4 One is more than predetermined reference plane error threshold；If so, L-shaped planar laser beam is adjusted by planar laser beam irradiation module Comprising the direction of illumination of the first and second linear type beamlets and at least one of beam planes normal direction, make distance d2, d3 and Distance d4 is respectively less than predetermined reference plane error threshold；If it is not, do not adjust that L-shaped planar laser beam includes then the first and second one The direction of illumination of font beamlet and beam planes normal direction.

The device that the present embodiment provides, wherein,

The irradiation position data obtaining module 230, for performing the first linear type for obtaining L-shaped planar laser beam and including Light beam 280 is to the photograph of the first benchmark light target 251 at the second reference position and the second benchmark light target 252 at the 3rd reference position The operation of location information is penetrated, including following operating procedure：

The first portion for obtaining the first linear type beamlet 280 that L-shaped planar laser beam includes is radiated at positioned at the second benchmark The relative position relation and acquisition L-shaped planar laser between position and the second datum mark 242 on the benchmark light target 251 of position The second portion for the first linear type beamlet 280 that wave beam includes is radiated on the benchmark light target 252 of the 3rd reference position Position and the 3rd datum mark 243 between relative position relation.

In the present embodiment, to obtain the irradiation of the first portion for the first linear type beamlet that L-shaped planar laser beam includes The relative position relation and L-shaped planar between position and the second datum mark on the benchmark light target positioned at the second reference position The second portion for the first linear type beamlet that laser beam includes is radiated on the benchmark light target of the 3rd reference position Relative position relation between position and the 3rd datum mark performs following at least one step：

Optical imaging sensor at the second reference position and at the 3rd reference position is set, is obtained using the optical imaging sensor The first portion for the first linear type beamlet that L-shaped planar laser beam includes is taken to be radiated at the benchmark positioned at the second reference position The first linear type that relative position relation between position and the second datum mark and L-shaped planar laser beam on light target include The second portion of beamlet is radiated at opposite between the position on the benchmark light target of the 3rd reference position and the 3rd datum mark Position relationship；

On the second benchmark light target on the first benchmark light target at the second reference position and at the 3rd reference position light is set to visit Device is surveyed, the first portion that the first linear type beamlet that L-shaped planar laser beam includes is obtained using the optical detector is radiated at Position on the benchmark light target of the second reference position and the relative position relation between the second datum mark and L-shaped planar swash The second portion for the first linear type beamlet that light beam includes is radiated at the position on the benchmark light target of the 3rd reference position Put the relative position relation between the 3rd datum mark；

Optical imaging sensor at the second reference position is set, L-shaped planar laser wave is obtained using the optical imaging sensor The first portion for the first linear type beamlet that beam includes be radiated at position on the benchmark light target of the second reference position with Relative position relation between second datum mark sets optical detector on the second benchmark light target at the 3rd reference position, uses The second portion that the optical detector obtains the first linear type beamlet that L-shaped planar laser beam includes is radiated at positioned at the 3rd base The position on benchmark light target and the relative position relation between the 3rd datum mark that level is put；And

Optical imaging sensor at the first reference position is set, L-shaped planar laser wave is obtained using the optical imaging sensor The first portion for the first linear type beamlet that beam includes be radiated at position on the benchmark light target of the second reference position with Second of the first linear type beamlet that relative position relation and L-shaped planar laser beam between second datum mark include Divide and be radiated at the position on the benchmark light target of the 3rd reference position and the relative position relation between the 3rd datum mark.

Specifically, the described relative position relation between the second datum mark, including take that L-shaped planar laser beam includes The first portion of one linear type beamlet is radiated at position and the second datum mark on the benchmark light target of the second reference position Between the first linear type beamlet for including of distance, relative direction and L-shaped planar laser beam hot spot trend at least one Kind information.

Specifically, the described relative position relation between the 3rd datum mark includes taking that L-shaped planar laser beam includes the The second portion of one linear type beamlet is radiated at position and the second datum mark on the benchmark light target of the 3rd reference position Between the first linear type beamlet for including of distance, relative direction and L-shaped planar laser beam hot spot trend at least one Kind information.

The benchmark light target include the benchmark light target being made of optical imaging sensor and light reflector, optical imaging sensor and Benchmark light target that light-scattering body is formed, the benchmark light target being made of light reflector, the benchmark light target being made of light-scattering body and by At least one of benchmark light target that optical detector is formed.

The benchmark light target being made of light reflector, be included in reflected fudicial light target ad hoc at the second reference position or Borrow the reference light handle that the reflection characteristic of the object at the second reference position is formed.

The benchmark light target being made of light-scattering body, be included in scattering benchmark light target ad hoc at the second reference position or Borrow the reference light handle that the scattering properties of the object at the second reference position is formed.

The device that the present embodiment provides, further includes horizontal reference point demarcating module 270, which performs following operation：

The direction of illumination of horizontal reference point Calibration of Laser beam is adjusted using level meter, is horizontally oriented its direction of illumination；

At least one emission level reference point Calibration of Laser under horizontality into second, third and the 4th benchmark light target Beam.

The horizontal reference point is used on reference-calibrating light target with the first datum at the first reference position in same The point position of point on a horizontal plane, horizontal reference point and datum mark can be identical or different, and one kind as horizontal reference point makes With mode, including：

Establish observe reference plane when, the datum mark that benchmark light target is actually used using its corresponding horizontal reference point as it is to L The irradiation position of shape planar wave beam guides, and is allowed to be irradiated on the corresponding horizontal reference point of the benchmark light target；Such situation Under, horizontal reference point is referred to as benchmark, also, in the point position difference of horizontal reference point and datum mark, the phase of the two It is known to position or spacing.

The horizontal reference point calibration wave beam, it is criss-cross that wave beam, which includes planar laser beam, the hot spot that hot spot is L-shaped, Planar laser beam, hot spot are the planar laser beam of linear type and hot spot is any one of dotted laser beam.

Generating the method for different laser beams includes following at least one step：

By the way that lens are moved into light path, lens are removed to light path and change at least one of position of the lens in light path mode The width of planar laser beam or the length of linear type hot spot are adjusted, makes the width of planar laser beam or the length of linear type hot spot Degree can cover the second datum mark and the 3rd datum mark simultaneously；And

By the way that lens are moved into light path, lens are removed to light path and change at least one of position of the lens in light path mode The thickness of planar laser beam or the thickness of linear type hot spot are adjusted, makes planar laser beam in the second datum mark and the 3rd benchmark Point is with the thickness or the thickness of linear type hot spot convenient for observation.

The device that the present embodiment provides, wherein,

Planar laser beam irradiation module 210 and planar laser beam irradiation control module 220 are additionally operable to perform following at least one Kind operation：

By the way that lens are moved into light path, lens are removed to light path and change at least one of position of the lens in light path mode The width of planar laser beam or the length of linear type hot spot are adjusted, makes the width of planar laser beam or the length of linear type hot spot Degree can cover the second datum mark and the 3rd datum mark simultaneously；And

By the way that lens are moved into light path, lens are removed to light path and change at least one of position of the lens in light path mode The thickness of planar laser beam or the thickness of linear type hot spot are adjusted, makes planar laser beam in the second datum mark and the 3rd benchmark Point is with the thickness or the thickness of linear type hot spot convenient for observation.

Specifically, it is described by the way that lens are moved into light path, lens are removed to light path and change position of the lens in light path At least one of mode adjust the width of planar laser beam or the length of linear type hot spot, make the width of planar laser beam Or the length of linear type hot spot can cover the second datum mark and the 3rd datum mark simultaneously, including：

The company of the first datum mark to the second datum mark is calculated using the coordinate of the first datum mark, the second datum mark and the 3rd datum mark Included angle A 1 between the line of line and the first datum mark to the 3rd datum mark, by the way that lens are moved into light path, lens are removed light path The width angle A2 of planar laser beam is adjusted at least one of position of the change lens in light path mode, is more than A2 A1, so that the length of the width of planar laser beam or linear type hot spot can cover the second datum mark and the 3rd benchmark simultaneously Point；

Specifically, it is described by the way that lens are moved into light path, are removed lens in the position of light path and change lens in light path At least one mode adjusts the thickness of planar laser beam or the thickness of linear type hot spot, makes planar laser beam in the second benchmark Point and the 3rd datum mark have the thickness of the thickness or linear type hot spot convenient for observation, including：

The distance D1 of the first datum mark to the second datum mark is calculated using the coordinate of the first datum mark and the second datum mark, uses the The coordinate of one datum mark and the 3rd datum mark calculates the distance D2 of the first datum mark to the 3rd datum mark, is selected from D1 and D2 The greater DG is dissipated using DG and using the wave beam under the first assembled state of lens group in the thickness dimension of planar laser beam Angle a1 calculates wave beam thickness T1 of the wave beam at distance DG；

When T1 is more than predetermined wave beam thickness thresholding, by the way that lens are moved into light path, lens are removed to light path and change lens At least one of position in light path mode makes lens group be in the second assembled state, and the second combination shape is in lens group Under state, it is pre- that there is planar laser beam the wave beam thickness T2 of Angle of beam divergence degree a2, a2 at distance DG in thickness dimension to be less than Fixed wave beam thickness thresholding；

When T1 is not above predetermined wave beam thickness thresholding, the assembled state of lens group is not changed.

Specifically, the optical imaging device is operated in the range of visible ray or non-visible wavelength, as a kind of realization method, A kind of specific semiconductors of optical imagery module include CCD (CHARGE COUPLED DEVICE:Charge coupling device) Image-forming module or CMOS (COMPLEMENTARY METAL OXIDE SEMICONDUCTER:Complementary metal oxide semiconductor) Image-forming module.

Specifically, the CPIII（CONTRL PONT III）Control point is railroad track face control point.

As concrete application mode of the method and system embodiment that provides of the present invention in track traffic, first, second It is as follows with the laying mode of the 3rd datum mark：

Point position as the second datum mark and the 3rd datum mark is a kind of realization method of top-bottom layout, including：

Second datum mark and the 3rd datum mark are arranged on to the front of the first datum mark, also, the 3rd datum mark is arranged on Above two datum marks；

Specifically, the first datum mark is arranged on to the one side of rail running rail, along track extending direction by the second datum mark and Three datum marks are arranged on the front of the first datum mark and positioned at the same sides of track；Or

First datum mark is arranged on to the one side of rail running rail, along track extending direction by the second datum mark and the 3rd datum mark It is arranged on the front of the first datum mark and positioned at the opposite side of track.

Further, the one side that the first datum mark is arranged on to rail running rail, along track extending direction by second Datum mark and the 3rd datum mark are arranged on the front of the first datum mark and are located at the same side of track, including：

Second datum mark is arranged on to the lower part of catenary mast, the 3rd datum mark is arranged on to the top of catenary mast；Or

Second datum mark is arranged on to the lower part of ad hoc measurement pillar, the 3rd datum mark is arranged on ad hoc measurement pillar Top.

Further, the one side that the first datum mark is arranged on to rail running rail, along track extending direction by second Datum mark and the 3rd datum mark are arranged on the front of the first datum mark and are located at the opposite side of track, including：

Second datum mark is arranged in the lower part of the catenary mast of the rail running rail opposite side, by the 3rd datum mark It is arranged on the top of catenary mast；Or

Second datum mark is arranged in the lower part of the ad hoc measurement pillar of the rail running rail opposite side, by the 3rd base The top of ad hoc measurement pillar is arranged on schedule.

Preferably, second datum mark and the 3rd datum mark are on same vertical line, by the first datum mark, the second benchmark The face shape wave beam of point and the 3rd datum mark forms a perpendicular vertical plane.

Point position as the second datum mark and the 3rd datum mark is a kind of realization method of left-right layout, including：

Second datum mark and the 3rd datum mark are arranged on to the front of the first datum mark, also, the 3rd datum mark is arranged on Two datum mark lefts or right；

Specifically, the first datum mark is arranged on to the one side of rail running rail, along track extending direction by the second datum mark and Three datum marks are arranged on the front of the first datum mark, and the second datum mark and the 3rd datum mark is made to be located at the same side of rail running rail And it is located at the not homonymy of the rail running rail with the first datum mark；Or

First datum mark is arranged on to the one side of rail running rail, along track extending direction by the second datum mark and the 3rd datum mark The front of the first datum mark is arranged on, makes the second datum mark and the 3rd datum mark is located at the not homonymy of rail running rail and makes Two datum marks or the 3rd datum mark and the first datum mark are located at the same side of the rail running rail.

Further, the one side that the first datum mark is arranged on to rail running rail, along track extending direction by second Datum mark and the 3rd datum mark are arranged on the front of the first datum mark, and the second datum mark and the 3rd datum mark is made to be located at rail running The same side of rail and the not homonymy for being located at the rail running rail with the first datum mark, including：

At least one in second datum mark and the 3rd datum mark is arranged at CPIII control points；Or

At least one in second datum mark and the 3rd datum mark is arranged at catenary mast；Or

At least one in second datum mark and the 3rd datum mark is arranged at ad hoc measurement pillar.

Further, the one side that the first datum mark is arranged on to rail running rail, along track extending direction by second Datum mark and the 3rd datum mark are arranged on the front of the first datum mark, and the second datum mark and the 3rd datum mark is made to be located at rail running The not homonymy of rail and the second datum mark or the 3rd datum mark and the first datum mark is made to be located at the same side of the rail running rail, Including：

At least one in second datum mark and the 3rd datum mark is arranged at CPIII control points；Or

At least one in second datum mark and the 3rd datum mark is arranged at catenary mast；Or

At least one in second datum mark and the 3rd datum mark is arranged at ad hoc measurement pillar.

Preferably, second datum mark and the 3rd datum mark in the same horizontal line, and by the first datum mark, the The face shape wave beam of two datum marks and the 3rd datum mark forms a horizontal plane.

Method and device provided in an embodiment of the present invention can use in whole or in part electronic technology, photoelectric detecting technology and Automatic control technology is realized；Method provided in an embodiment of the present invention, can in whole or in part by software instruction and/or Hardware circuit is realized；The module or unit that device provided in an embodiment of the present invention includes, may be employed electronic component, light- Electricity/electricity-magnetic switching device, driving/dragging motor are realized.

The preferred embodiment of the above, the simply present invention is not used for limiting protection scope of the present invention.Appoint Technical staff in what field of the present invention, do not depart from disclosed herein spirit and scope on the premise of, Ke Yi Any modification and variation, but protection scope of the present invention defining with appended claims are carried out in the form and details of implementation Subject to scope.

The present invention provides distance measuring method and device, and it is low to overcome total station survey equipment costliness efficiency, and photogrammetry needs Will be by detection trolley, collimation line method sighting mark error in the case where distance is longer is multiplied, it is impossible to be used in structure observation base At least one of these shortcomings of quasi- face raising measurement efficiency.It is at low cost, precision is high, efficient, have practicability.

Claims (10)

1. a kind of planar laser beam sending method, including：

By the corresponding first datum mark transmitting L-shaped planar laser beam in the first reference position, make the L-shaped planar laser beam Comprising the first linear type beamlet different piece the first benchmark light target corresponding to the second reference position and the 3rd base respectively Level is put corresponding second benchmark light target and is irradiated simultaneously；

The point of irradiation of the first linear type beamlet is obtained compared with the corresponding datum mark of benchmark light target using benchmark light target Position offset information, the direction of illumination and wave beam of the first linear type beamlet are adjusted according to the irradiation position offset information At least one of face normal direction makes the different piece of the first linear type beamlet respectively to second datum mark and the 3rd The irradiation position offset that datum mark irradiates simultaneously is less than predetermined reference plane error threshold；

Wherein,

The L-shaped planar laser beam includes the first and second linear type beamlets, the thickness of the first and second linear type beamlets Degree dimension equidistant point intersects or intersects vertically, and wherein at least one linear type beamlet is used as detecting the position ginseng of object under test The observation reference plane of position or displacement according to point.

2. the method for claim 1, wherein

It is described to emit L-shaped planar laser beam by corresponding first datum mark in the first reference position, make the L-shaped planar laser The different piece for the first linear type beamlet that wave beam includes the first benchmark light target corresponding to the second reference position and respectively The corresponding second benchmark light target in three reference positions irradiates simultaneously, including following at least one step：

The observation for determining to be determined by first, second, and third datum mark using the coordinate information of first, second, and third datum mark At least one of the normal direction direction of reference plane and Lighting direction reference plane parameter, the base is used using the reference plane parameter Planar laser beam irradiation module described in quasi- face state modulator is at least one for shaft turn in first axle and second axis Dynamic light reflection unit makes the different piece for the first linear type beamlet that the L-shaped planar laser beam includes respectively to second The corresponding first benchmark light target in reference position and the corresponding second benchmark light target in the 3rd reference position irradiate simultaneously；And

The the first linear type beamlet included using L-shaped planar laser beam is at least one in the first and second benchmark light targets Irradiation position information, in first axle and second axis it is at least one for shaft rotate light reflection unit, make the L The different piece for the first linear type beamlet that shape planar laser beam includes the first base corresponding to the second reference position respectively The corresponding second benchmark light target of quasi-optical target and the 3rd reference position irradiates simultaneously.

3. method as claimed in claim 2, wherein,

It is described using planar laser beam irradiation module described in the reference plane state modulator in first axle and second axis It is at least one to rotate light reflection unit for shaft, further comprise：

With in first axle and second axis it is at least one for shaft rotate light reflection unit include L-shaped planar laser beam The second linear type beamlet different piece the first benchmark light target corresponding to the second reference position, the 3rd reference position respectively The corresponding 3rd benchmark light target of corresponding second benchmark light target and the 4th reference position irradiates simultaneously；

It is described using the first linear type beamlet that L-shaped planar laser beam includes in the first and second benchmark light targets at least The irradiation position information of one, at least one for shaft rotation light reflection unit in first axle and second axis, into One step includes：

With in first axle and second axis it is at least one for shaft rotate light reflection unit include L-shaped planar laser beam The second linear type beamlet different piece the first benchmark light target corresponding to the second reference position, the 3rd reference position respectively The corresponding 3rd benchmark light target of corresponding second benchmark light target and the 4th reference position irradiates simultaneously.

4. the method for claim 1, wherein

It is described to obtain the point of irradiation of the first linear type beamlet compared with the corresponding base of benchmark light target using benchmark light target Position offset information on schedule, according to the irradiation position offset information adjust the first linear type beamlet direction of illumination and At least one of beam planes normal direction, make the different piece of the first linear type beamlet respectively to second datum mark and The irradiation position offset that 3rd datum mark irradiates simultaneously is less than predetermined reference plane error threshold, including following at least one step Suddenly：

The thickness for obtaining the first linear type beamlet that L-shaped planar laser beam includes ties up equidistant point to the second reference position pair The distance d2 for the second datum mark answered, the thickness for obtaining the first linear type beamlet tie up equidistant point to the 3rd reference position pair The distance d3 for the 3rd datum mark answered；Or using irradiation position data obtaining module obtain that L-shaped planar laser beam includes the The thickness of two linear type beamlets ties up equidistant point to the distance d2 of corresponding second datum mark in the second reference position, obtain this The thickness of two linear type beamlets ties up equidistant point to the distance d4 of corresponding 4th datum mark in the 4th reference position；Judge distance In d2 and distance d3 or judge whether there is to be more than a predetermined reference plane error threshold in distance d2 and distance d4；It is if so, logical Cross the irradiation side for the first and second linear type beamlets that planar laser beam irradiation module adjustment L-shaped planar laser beam includes To at least one of with beam planes normal direction, make distance d2 and distance d3 or distance d2 and distance d4 is made to be respectively less than predetermined benchmark Surface error thresholding；If it is not, the direction of illumination for the first and second linear type beamlets that L-shaped planar laser beam includes is not adjusted then With beam planes normal direction；

The intersection of the thickness dimension equidistant point of the first and second linear type beamlets for including of L-shaped planar laser beam is obtained to the The distance d2 of corresponding second datum mark in two reference positions obtains the first linear type beamlet that L-shaped planar laser beam includes Thickness tie up equidistant point to corresponding 3rd datum mark in the 3rd reference position distance d3；Judge be in distance d2 and distance d3 It is no to there is one to be more than predetermined reference plane error threshold；If so, L-shaped planar laser is adjusted by planar laser beam irradiation module At least one of the direction of illumination for the first and second linear type beamlets that wave beam includes and beam planes normal direction, make distance d2 and Distance d3 is respectively less than predetermined reference plane error threshold；If it is not, do not adjust that L-shaped planar laser beam includes then the first and second one The direction of illumination of font beamlet and beam planes normal direction；And

The intersection of the thickness dimension equidistant point of the first and second linear type beamlets for including of L-shaped planar laser beam is obtained to the The distance d2 of corresponding second datum mark in two reference positions obtains the first linear type beamlet that L-shaped planar laser beam includes Thickness tie up equidistant point to corresponding 3rd datum mark in the 3rd reference position distance d3, obtain L-shaped planar laser beam bag The thickness of the second linear type beamlet contained ties up equidistant point to the distance d4 of corresponding 4th datum mark in the 4th reference position；Sentence Whether turn-off has one to be more than predetermined reference plane error threshold in d2, d3 and distance d4；If so, pass through planar laser beam The direction of illumination of the first and second linear type beamlets and beam planes normal direction that irradiation module adjustment L-shaped planar laser beam includes At least one of, distance d2, d3 and distance d4 is made to be respectively less than predetermined reference plane error threshold；If it is not, L-shaped planar is not adjusted then The direction of illumination of the first and second linear type beamlets and beam planes normal direction that laser beam includes.

5. the method as described in claim 1 further includes horizontal reference point scaling method, specifically comprises the following steps：

The posture of platform where adjusting L-shaped planar laser beam source, is allowed in horizontality；

At least one emission level reference point Calibration of Laser under horizontality into second, third and the 4th benchmark light target Beam.

6. a kind of planar laser beam sending device, including：

Planar laser beam irradiation module, planar laser beam irradiation control module and irradiation position data obtaining module；Wherein,

Planar laser beam irradiation module, for by the corresponding first datum mark transmitting L-shaped planar laser in the first reference position Wave beam makes the different piece for the first linear type beamlet that the L-shaped planar laser beam includes respectively to the second reference position The corresponding second benchmark light target of corresponding first benchmark light target and the 3rd reference position irradiates simultaneously；And for making described The irradiation position that the different piece of one linear type beamlet respectively irradiates second datum mark and the 3rd datum mark simultaneously is inclined Shifting amount is less than predetermined reference plane error threshold；Including laser light source submodule, laser beam shaping submodule block, light reflection surface submodule Block and light reflection surface rotate servo submodule；

Planar laser beam irradiates control module, for controlling the irradiation of planar laser beam irradiation module, makes its warp The different piece for the first linear type beamlet that the L-shaped planar laser beam that the first datum mark emits includes is crossed respectively to the second base Level puts the corresponding second benchmark light target of corresponding first benchmark light target and the 3rd reference position and irradiates simultaneously or make what it emitted First linear type beamlet misses the irradiation position offset of second datum mark and the 3rd datum mark less than predetermined reference plane Poor thresholding, the direction of illumination control submodule including planar laser beam, beam planes normal direction are directed toward control submodule and datum mark At least one of coordinate sub-module stored；

Irradiation position data obtaining module obtains the point of irradiation of the first linear type beamlet compared with this for benchmark light target The position offset information of the corresponding datum mark of benchmark light target, and the irradiation position direct information planar laser beam is irradiated and is controlled Molding block, including at least one of data transmission submodule and optical imaging sensor submodule；

Wherein,

The L-shaped planar laser beam includes the first and second linear type beamlets, the thickness of the first and second linear type beamlets Degree dimension equidistant point intersects or intersects vertically, and wherein at least one linear type beamlet is used as detecting the position ginseng of object under test The observation reference plane of position or displacement according to point.

7. device according to claim 6, wherein,

Planar laser beam irradiates control module, for the planar laser beam irradiation module to be controlled to perform by the first benchmark The corresponding first datum mark transmitting L-shaped planar laser beam in position, the first linear type for including the L-shaped planar laser beam The different piece of beamlet the first benchmark light target corresponding to the second reference position and the 3rd reference position corresponding second respectively The operation that benchmark light target irradiates simultaneously, including following at least one operating procedure：

The observation for determining to be determined by first, second, and third datum mark using the coordinate information of first, second, and third datum mark At least one of the normal direction direction of reference plane and Lighting direction reference plane parameter, using described in the reference plane state modulator Planar laser beam irradiation module using planar laser beam irradiation module described in the reference plane state modulator with first axle and It is at least one for shaft rotation light reflection unit in second axis；And

The the first linear type beamlet included using L-shaped planar laser beam is at least one in the first and second benchmark light targets Irradiation position information, control the planar laser beam irradiation module at least one in first axle and second axis Rotating light reflection unit for shaft makes the different piece of the first linear type beamlet corresponding to the second reference position respectively The corresponding second benchmark light target of first benchmark light target and the 3rd reference position irradiates simultaneously.

8. device according to claim 7, wherein,

It is described using planar laser beam irradiation module described in the reference plane state modulator in first axle and second axis At least one operation that light reflection unit is rotated for shaft, further comprises：

Planar laser beam irradiation module is controlled at least one for shaft rotation light reflection in first axle and second axis Unit makes the different piece for the second linear type beamlet that L-shaped planar laser beam includes corresponding to the second reference position respectively First benchmark light target, the corresponding second benchmark light target in the 3rd reference position and the corresponding 3rd benchmark light target in the 4th reference position are same When irradiate；

It is described using the first linear type beamlet that L-shaped planar laser beam includes in the first and second benchmark light targets at least The irradiation position information of one, at least one for shaft rotation light reflection unit in first axle and second axis, into One step includes：

Planar laser beam irradiation module is controlled at least one for shaft rotation light reflection in first axle and second axis Unit makes the different piece for the second linear type beamlet that L-shaped planar laser beam includes corresponding to the second reference position respectively First benchmark light target, the corresponding second benchmark light target in the 3rd reference position and the corresponding 3rd benchmark light target in the 4th reference position are same When irradiate.

9. the apparatus according to claim 1, wherein,

The planar laser beam irradiates control module, and the first linear type beamlet is obtained using benchmark light target for performing Point of irradiation compared with the corresponding datum mark of benchmark light target position offset information, according to the irradiation position offset information adjust At least one of the direction of illumination of the first linear type beamlet and beam planes normal direction make the first linear type beamlet Different piece predetermined base is less than to the irradiation position offset that second datum mark and the 3rd datum mark irradiate simultaneously respectively The operation of quasi- surface error thresholding, including following at least one operating procedure：

The thickness that the first linear type beamlet that L-shaped planar laser beam includes is obtained using irradiation position data obtaining module is tieed up Equidistant point to corresponding second datum mark in the second reference position distance d2, obtain the first linear type beamlet thickness dimension Equidistant point to corresponding 3rd datum mark in the 3rd reference position distance d3；Or it is obtained using irradiation position data obtaining module The thickness for the second linear type beamlet that L-shaped planar laser beam includes ties up equidistant point to the second reference position corresponding second The distance d2 of datum mark, the thickness for obtaining the second linear type beamlet tie up equidistant point to the 4th reference position the corresponding 4th The distance d4 of datum mark；Judge in distance d2 and distance d3 or judge that whether having one to be more than in distance d2 and distance d4 makes a reservation for Reference plane error threshold；If so, the first He included by planar laser beam irradiation module adjustment L-shaped planar laser beam At least one of the direction of illumination of second linear type beamlet and beam planes normal direction make distance d2 and distance d3 or make distance D2 and distance d4 is respectively less than predetermined reference plane error threshold；If it is not, do not adjust L-shaped planar laser beam includes first and then The direction of illumination of two linear type beamlets and beam planes normal direction；

The first and second linear type beamlets for including of L-shaped planar laser beam are obtained using irradiation position data obtaining module The intersection of thickness dimension equidistant point obtains L-shaped planar laser wave to the distance d2 of corresponding second datum mark in the second reference position The thickness for the first linear type beamlet that beam includes ties up equidistant point to the distance of corresponding 3rd datum mark in the 3rd reference position d3；Judge whether there is to be more than a predetermined reference plane error threshold in distance d2 and distance d3；If so, pass through planar laser wave The direction of illumination of the first and second linear type beamlets and beam planes method that beam irradiation module adjustment L-shaped planar laser beam includes At least one of to, distance d2 and distance d3 is made to be respectively less than predetermined reference plane error threshold；If it is not, L-shaped planar is not adjusted then The direction of illumination of the first and second linear type beamlets and beam planes normal direction that laser beam includes；And

The first and second linear type beamlets for including of L-shaped planar laser beam are obtained using irradiation position data obtaining module The intersection of thickness dimension equidistant point obtains L-shaped planar laser wave to the distance d2 of corresponding second datum mark in the second reference position The thickness for the first linear type beamlet that beam includes ties up equidistant point to the distance of corresponding 3rd datum mark in the 3rd reference position D3, the thickness for obtaining the second linear type beamlet that L-shaped planar laser beam includes tie up equidistant point to the 4th reference position pair The distance d4 for the 4th datum mark answered；Judge whether there is to be more than a predetermined benchmark surface error door in distance d2, d3 and distance d4 Limit；If so, the first and second linear types included by planar laser beam irradiation module adjustment L-shaped planar laser beam At least one of the direction of illumination of light beam and beam planes normal direction make distance d2, d3 and distance d4 be respectively less than predetermined reference plane and miss Poor thresholding；If it is not, the direction of illumination and ripple for the first and second linear type beamlets that L-shaped planar laser beam includes are not adjusted then Beam face normal direction.

10. device according to claim 6, further includes horizontal reference point demarcating module, which performs following operation：

The direction of illumination of horizontal reference point Calibration of Laser beam is adjusted using level meter, is horizontally oriented its direction of illumination；

At least one emission level reference point Calibration of Laser under horizontality into second, third and the 4th benchmark light target Beam.