CN108062005A - A kind of splicing ameliorative way of write-through screen printing system - Google Patents
A kind of splicing ameliorative way of write-through screen printing system Download PDFInfo
- Publication number
- CN108062005A CN108062005A CN201610973504.0A CN201610973504A CN108062005A CN 108062005 A CN108062005 A CN 108062005A CN 201610973504 A CN201610973504 A CN 201610973504A CN 108062005 A CN108062005 A CN 108062005A
- Authority
- CN
- China
- Prior art keywords
- image
- data
- splicing
- write
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a kind of splicing ameliorative ways of write-through screen printing system, the overlapping exposures that the splicing ameliorative way carries out uniformity of energy by the tape attachment locations to exposure image are realized, the overlapping exposures refer to there is the overlapping of one fixed width region in exposure for the adjacent ribbons on exposure image, and the uniformity of energy refers to carry out corner area data clearing processing to the image data for writing spatial light modulator.A kind of splicing ameliorative way of write-through screen printing system of the present invention, realize that the splicing at halftone epigraph strips mosaic improves by the way of overlapping exposures, four angles of the image data to writing spatial light modulator are zeroed out processing simultaneously, so as to reach the uniformity of exposure energy.Splicing ameliorative way processing data amount using the present invention is small, and process is simple.
Description
Technical field
The present invention relates to screen printing technical fields, and in particular to a kind of splicing improvement side of write-through screen printing system
Method.
Background technology
Traditional screen printing system by printer using the film, it is necessary to be made a plate.The film and the camera of early stage
Egative film is similar.It is as follows that plate-making flow is carried out using the film：The film with image is attached to the screen mesh printing plate for having applied photoresists
On, using the Hg lamp irradiation film, there is visuals that the photoresists of halftone with transmitted ray, can be made photosensitive on the film, it will be photosensitive
Halftone develops, and not photosensitive part can be dissolved by the developing after development, so as to form figure on halftone.
There are following defects for traditional method using film plate-making：
1st, consumables cost is high, and traditional silk-screened method for platemaking needs to make the film using film setter, and polychrome printing needs more
Zhang Feilin, the film is i.e. by discarding after printing down, and consumables cost is higher compared with directly making a plate；
2nd, increase process, cause inefficiency of making a plate：Traditional silk-screened lithography process needs pattern-making egative film first, then through shining
Version mechanism version process cycle is longer, inefficiency of making a plate, be thus also possible to cause the problem of more occur and cost of labor,
The increase of time cost；
3rd, the film is fragile：The film itself is yielding to be easily scratched, its service life is caused to be greatly affected greatly；
4th, super large halftone can not be made：It is limited by film area itself, traditional method for platemaking can not make super large halftone；
5th, the precision of images is poor, can not meet the plate-making of small line width figure：Since traditional silk-screened method for platemaking is to pass through pattern
What egative film was replicated with photoresists contact exposure and completed, thus the loss of image detail can be caused in reproduction process, the precision of images
Less than original copy, the phenomenon is particularly evident during the printing down of thick photoresists, therefore traditional film plate-making is usually only applicable to 50 μ
The line width of more than m.
In recent years, researchers have also carried out the trial that some are directly made a plate.Wherein, write-through (also known as direct imaging formula,
Abbreviation DIS) screen printing system because its process is simple, the precision of images is high, write efficiency is fast etc., increasingly favored by advantages.Directly
Formula screen printing system is write generally by host, kinematic system, light source driving controller (LSC), light source (LS), programmable data control
The compositions such as device (PDC) processed, spatial light modulator (SLM), site error correcting module and communication module.Wherein, host is used for
Master control, kinematic system include scanning platform and stepping platform, for control halftone and optical system (including LS, SLM and other
Some for even light, focus on optical element) movement, light source driving controller control light source on off state and light intensity,
Light source provides energy required during exposure, and PDC is connected directly with host, under the control of host SLM is driven to complete exposure task.
In the course of work, halftone position data that the PDC layout datas that are transmitted by host of reception and kinematic system transmit generates in real time
It exposes the optical design needed and SLM is driven to complete exposure task and realize write-through plate-making.SLM is under the driving of PDC, in light source
Irradiation under the action of, penetrate different patterns in substrate halftone upslide.
Image transfer is realized using SLM, and pass through the mobile realization view picture figure of scanning platform and stepping platform in DIS systems
Exposure, but since platform is in itself there are error, the stitching portion of each band of exposing patterns can be caused anamorphose occur.It is logical
Stitching portion anamorphose can be solved the problems, such as by crossing the overlapping exposures in the stitching portion of adjacent ribbons progress one fixed width region, but
The energy that can cause lap is excessive.One kind is proposed in the patent of invention of China Publication No. patent CN 104536269A
It carries out splicing improved mode using SLM Delta Regions, but the data volume of this processing mode is big, data processing complex.
The content of the invention
The purpose of the present invention provides a kind of data volume suitable for write-through screen printing system aiming at above-mentioned deficiency
Small and processing procedure simply splices ameliorative way.
To achieve these goals, the present invention provides a kind of splicing ameliorative way of write-through screen printing system, passes through
The overlapping exposures that the tape attachment locations of exposure image are carried out with uniformity of energy realize that processing procedure is simple, and data volume is small, and
Solve the problems, such as that overlapping exposures portion of energy is excessive.
Technical scheme is as follows：
A kind of splicing ameliorative way of write-through screen printing system, spatial light modulator is by data processing system in the system
Image to be exposed is simultaneously transferred to realization write-through system on halftone by system driving according to the image data that data handling system is sent
Version, the splicing ameliorative way are used to improve the strips mosaic position of halftone epigraph in DIS screen printing systems.Institute
The overlapping exposures realization that splicing ameliorative way carries out uniformity of energy by the tape attachment locations to exposure image is stated, it is described heavy
Folded exposure refers to there is the overlapping of one fixed width region in exposure for the adjacent ribbons on exposure image, and the uniformity of energy is
Refer to and carry out corner area data clearing processing for image to be exposed.
The splicing ameliorative way specifically comprises the following steps：
It determines overlapping exposures peak width step, determines that the data that the two neighboring band needs of image to be exposed are overlapped are wide
Degree；
Black figure step is supplemented, the number be overlapped with the two neighboring band needs will be supplemented at left and right sides of the image to be exposed
According to the black figure of the similary width of width, obtain supplementing the image to be exposed after black figure；
Cutting rod band step scans the width edge that supplements the image to be exposed after black figure and can be scanned according to spatial light modulator
Direction cutting obtains the image data after cutting rod band；
Image data after the cutting rod band is sent to data handling system, the data processing by uniformity of energy step
System will be in the image data write-in spatial light modulator after the cutting rod band.Writing the spatial light modulator
Meanwhile the area data for the similary line number of similary columns being removed on four angles of the image data after the cutting rod band, it obtains
The image data being disposed；
Pattern transfer step, the image data that spatial light modulator is disposed according to will carry out in graphic projection to halftone
The graph exposure of one band；
Stepping moving step, after the completion of the data exposure of a band, stepping platform steppingDistance carries out next band
Exposure,Meet following equation
,
Wherein, L is strip width,It is the phase of image to be exposed described in the definite overlapping exposures peak width step
The data width that adjacent two bands needs are overlapped.
Preferably, the data width and the shifting of scanning platform that the two neighboring band needs of the image to be exposed are overlapped
The distance that dynamic positional precision, the repetitive positioning accuracy of scanning platform and the scanning platform direction of motion deviate straight line meets following public affairs
Formula
,
Wherein,The data width that the two neighboring band needs of the image to be exposed are overlapped is represented,Represent institute
The maximum that the scanning platform direction of motion deviates the distance in its ideal movements direction is stated,Represent that the repetition of the platform is determined
Position precision,Represent the shift position precision of the platform.
Preferably, in the uniformity of energy step, the columns meets, wherein m is a hot spot
Size；The line number is equal to H/4, and wherein H is the line number of spatial light modulator.
The present invention has the advantages that：
The present invention provides a kind of splicing ameliorative way of write-through screen printing system, and halftone is realized by the way of overlapping exposures
Splicing at epigraph strips mosaic improves, while four angles of the image data to writing spatial light modulator are zeroed out place
Reason, so as to reach the uniformity of exposure energy.The data volume generated using the splicing ameliorative way of the present invention is only that triangle splices
The square root of the data volume of mode, data volume is small, and process is simple.
Description of the drawings
Fig. 1 be the present embodiments relate to DIS screen printing systems module composition figure；
Fig. 2 is a kind of step flow chart of the splicing ameliorative way of write-through screen printing system of the embodiment of the present invention；
Fig. 3 is the yaw value value schematic diagrames of the embodiment of the present invention；
Fig. 4 is the schematic diagram of a band of the embodiment of the present invention；
Fig. 5 is that four angles of image data after the cutting rod band to writing DMD of the embodiment of the present invention are zeroed out processing
Schematic diagram；
Fig. 6 is the overlapping exposures area schematic of continuous two bands of the embodiment of the present invention.
Reference sign：
1 --- host, 2 --- kinematic system, 2-1 --- stepping platform, 2-2 --- scanning platform, 2-3 --- platform drive
Device, 3 --- light source driving controller, 4 --- light source, 5 --- programmable data controller, 6 --- spatial light modulator,
7 --- active focus module, 8 --- optical lens, 9 --- synchronization control module, 10 --- communication module.
Specific embodiment
Below in conjunction with attached drawing, technical scheme is clearly and completely described.
It is the specific embodiment of the present invention below.
The splicing ameliorative way of the present invention is suitable for DIS screen printing systems, and Fig. 1 is that the embodiment of the present invention is related to
The module diagram of DIS screen printing systems.As shown in Figure 1, the system includes host 1, kinematic system 2, light source drive control
Device 3, light source 4, programmable data controller 5, spatial light modulator 6, active focus module 7, optical lens 8, site error are repaiied
Positive module 9 and communication module 10.
Host 1 can be PC, all kinds of servers or all kinds of industrial personal computers.The main function of host 1 is to receive domain, caching version
Figure and pretreatment domain and master control PDC, LSC, AF and kinematic system cooperate.Involved domain is generally by CAM softwares
It is responsible for generation, form can be PDF, GDSII, GERBER, ODB++, TIF, BMP, DWG or DPF etc..
Kinematic system 2 is made of stepping platform 2-1, scanning platform 2-2 and platform driver 2-3, and wherein platform drives
Device 2-3 is connected with host 1 and stepping platform 2-1 and scanning platform 2-2 is driven to move.Stepping platform 2-1 carries halftone and drives
Halftone is moved in step direction, and scanning platform 2-2 carries active focus module 7 and optical lens 8 and drives active focus module 7
It is continuously moved in scanning direction with optical lens 8.Scanning direction and step direction are mutually perpendicular to, but each parallel to halftone plane.
Light source driving controller 3 controls the on off state and light intensity of light source 4；Light source is required during exposure for providing
Light energy, during exposure, light source is in normally opened constant current state.Light source can be laser or LED.
Programmable data controller 5 is connected directly 1 with host, under the control of host 1 spatial light modulator 6 is driven to complete
Exposure task.Programmable data controller 5 is by random access memory (RAM), field programmable gate array (FPGA) and spatial light
Modulator control chip (SLMC) forms.Programmable data controller 5 parses the vector graphics or bitmap transmitted by host 1, will
It is handled by systematic parameter, then generates the acceptable forms of SLMC, and drives the projection work of SLMC completion images.This
In embodiment, the SLMC used is the DLP chips that Texas Instrument (TI) provides.
Spatial light modulator 6 mainly according to figure or graph data, under the action of the irradiation of light source, projects in substrate
Different patterns.SLM is by the reflection or refraction to light, the position of graph position and current kinetic system in domain,
It generates the optical design that exposure needs in real time by PDC, SLM is driven to complete exposure task.Digital Micromirror Device (DMD) is SLM
Most common one kind.In the present embodiment, the SLM used is the DMD that TI is provided.
Active focus module 7 controls the distance between optical lens 8 and halftone, and the focal plane of camera lens is made to remain at halftone and is put down
On face；Active focus module 7 is made of high-speed electric expreess locomotive, position sensor and active focus controller.
Site error correcting module 9 receives the real-time position signal that scanning platform 2-2 is sent, then to real-time position signal
It is modified to obtain exact position signal, and exact position signal is delivered to PDC, believed by PDC according to the exact position of reception
Number control SLM designated position project corresponding pattern.
10 uplink of communication module is connected with host 1, and downlink is respectively connected with LSC and AF, is issued for receiving host 1
Control command simultaneously distributes control command to corresponding module.
Fig. 2 is the flow chart of the splicing ameliorative way of the write-through screen printing system of the present embodiment, is specifically comprised the following steps：
In image preprocessing step S1, image to be exposed is pre-processed, forms the graph data that DMD can be used.
In definite overlapping exposures peak width step S2, the number that the two neighboring band needs of image to be exposed are overlapped is determined
According to width.The two neighboring band data width that is overlapped of needs of image to be exposed and the shift position precision of scanning platform,
The distance that the repetitive positioning accuracy and the scanning platform direction of motion of scanning platform deviate straight line meets following equation
,
Wherein,The data width that the two neighboring band needs of the image to be exposed are overlapped is represented,Represent institute
The maximum that the scanning platform direction of motion deviates the distance in its ideal movements direction is stated,Represent that the repetition of the platform is determined
Position precision,Represent the shift position precision of the platform.
The value schematic diagram of yaw is given in Fig. 3, yaw values are a parameters of scanning platform, reaction scanning platform movement
Straightness.Yaw values are exactly the degree that scanning platform actual motion direction deviates ideal movements direction, here with deviation most
Big distance value represents.Why can there is a situation where to deviate ideal movements direction, be because scanning platform is transported along guide rail
Dynamic, guide rail ideally is straight, but is machined with error, it is impossible to be 100% straight, therefore, can exist certain
Deviate the situation of straight line.
In black figure step S3 is supplemented, image to be exposed is each side supplementedThe black figure of width obtains supplementing black figure
Image to be exposed afterwards.
In cutting rod band step S4, the width edge scanning side that the image to be exposed after black figure will be supplemented can be scanned according to DMD
Image data after cutting acquisition cutting rod band.Fig. 4 is schematic diagram of the cutting rod with the latter band.
In uniformity of energy step S5, the image data after cutting rod band is sent to data handling system (DPS), this implementation
DPS is PDC in example.PDC will be in the image data write-in DMD after cutting rod band.Writing the same of the spatial light modulator
When, the area data of the similary line number of similary columns will be removed on four angles of the image data after the cutting rod band, obtained everywhere
Manage the image data finished.Its midrange p meets, wherein m is the size of a hot spot；The row is high in H/
4, wherein H are the line number of spatial light modulator.Fig. 5 is the schematic diagram being zeroed out to the image data at four angles, to be removed
Four region difference of data are as follows：
First region (lower left corner region), row section for 0 to H/4 rows, be classified as 0 toRow；
Two Areas (upper left corner area), row section are 3H/4 to H rows, be classified as 0 toRow；
3rd region (lower right field), row section, to H/4 rows, are classified as 0ExtremelyRow；
4th region (upper right comer region), row section for 3H/4 to H rows, be classified asExtremelyRow.
In pattern transfer step S6, DMD will carry out an item according to the image data being disposed in graphic projection to halftone
The graph exposure of band.
In stepping moving step S7, after the completion of the data exposure of a band, stepping platform steppingDistance carries out next
The exposure of band,Meet following equation
,
Wherein, L is strip width.Fig. 6 is the overlapping exposures area schematic of continuous two bands of the embodiment of the present invention.Wherein
Shadow region is overlapping exposure area.
Use above specific embodiment elaborates technical scheme, it is clear that described embodiment is only
Only it is part of the embodiment of the present invention, instead of all the embodiments.Meanwhile the explanation of above example is only intended to help to manage
Solve the core concept of the present invention, for those of ordinary skill in the art, thought according to the invention, in specific embodiment and
There will be changes in application range.Therefore, based on the embodiments of the present invention, those of ordinary skill in the art are not making
Go out all other embodiment obtained under the premise of creative work, belong to the scope of protection of the invention.In conclusion this theory
Bright book content should not be construed as limiting the invention.
Claims (4)
1. a kind of splicing ameliorative way of write-through screen printing system, spatial light modulator is by data processing in the system
Image to be exposed is simultaneously transferred on halftone according to the image data that data handling system is sent and realizes write-through by system drive
Plate-making, the splicing ameliorative way are used to improve the strips mosaic position of halftone epigraph, which is characterized in that the spelling
The overlapping exposures realization that ameliorative way carries out uniformity of energy by the tape attachment locations to exposure image is connect, the overlapping exposes
Just refer to has the overlapping of one fixed width region in exposure for the adjacent ribbons on exposure image, and the uniformity of energy refers to pair
The image data for writing spatial light modulator carries out corner area data clearing processing.
2. the splicing ameliorative way of a kind of write-through screen printing system according to claim 1, which is characterized in that described
Splicing ameliorative way includes the following steps：
Image preprocessing step pre-processes image to be exposed, forms the figure number that spatial light modulator can use
According to；
It determines overlapping exposures peak width step, determines that the data that the two neighboring band needs of image to be exposed are overlapped are wide
Degree；
Black figure step is supplemented, the number be overlapped with the two neighboring band needs will be supplemented at left and right sides of the image to be exposed
According to the black figure of the similary width of width, obtain supplementing the image to be exposed after black figure；
Cutting rod band step scans the width edge that supplements the image to be exposed after black figure and can be scanned according to spatial light modulator
Direction cutting obtains the image data after cutting rod band；
Image data after the cutting rod band is sent to data handling system, the data processing by uniformity of energy step
System will be in the image data write-in spatial light modulator after the cutting rod band；
It is same by being removed on four angles of the image data after the cutting rod band while spatial light modulator is write
The area data of the similary line number of sample columns, the image data being disposed；
Pattern transfer step, the image data that spatial light modulator is disposed according to will carry out in graphic projection to halftone
The graph exposure of one band；
Stepping moving step, after the completion of the data exposure of a band, stepping platform steppingDistance carries out the exposure of next band
Light,Meet following equation
,
Wherein, L is strip width,It is the adjacent of image to be exposed described in the definite overlapping exposures peak width step
The data width that two band needs are overlapped.
3. a kind of splicing ameliorative way of write-through screen printing system according to claim 2, it is characterised in that：It is described
Determine the two neighboring band data width that is overlapped of needs of image to be exposed described in overlapping exposures peak width step with
The shift position precision of scanning platform, the repetitive positioning accuracy of scanning platform and the scanning platform direction of motion deviate straight line away from
From meeting following equation
,
Wherein,The data width that the two neighboring band needs of the image to be exposed are overlapped is represented,Described in representative
The scanning platform direction of motion deviates the maximum of the distance in its ideal movements direction,Represent the resetting of the platform
Precision,Represent the shift position precision of the platform.
4. a kind of splicing ameliorative way of write-through screen printing system according to claim 2, it is characterised in that：It is described
In uniformity of energy step, the columns meets, wherein p is columns, and m is the size of a hot spot；The row
Number is equal to H/4, and wherein H is the line number of spatial light modulator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610973504.0A CN108062005B (en) | 2016-11-07 | 2016-11-07 | Splicing improvement method of direct-writing type silk screen plate making system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610973504.0A CN108062005B (en) | 2016-11-07 | 2016-11-07 | Splicing improvement method of direct-writing type silk screen plate making system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108062005A true CN108062005A (en) | 2018-05-22 |
| CN108062005B CN108062005B (en) | 2020-12-25 |
Family
ID=62137264
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610973504.0A Active CN108062005B (en) | 2016-11-07 | 2016-11-07 | Splicing improvement method of direct-writing type silk screen plate making system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108062005B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111999984A (en) * | 2019-05-27 | 2020-11-27 | 苏州苏大维格科技集团股份有限公司 | Photoetching method |
| CN114200784A (en) * | 2021-12-24 | 2022-03-18 | 锡凡半导体无锡有限公司 | Maskless laser direct-writing photoetching scanning method capable of improving resolution |
| CN114200783A (en) * | 2021-12-24 | 2022-03-18 | 锡凡半导体无锡有限公司 | Graph splicing method for maskless laser high-precision scanning |
| CN114474963A (en) * | 2022-04-15 | 2022-05-13 | 深圳市先地图像科技有限公司 | Multi-screen frame platemaking data processing method, system and related equipment |
| CN114608803A (en) * | 2020-12-08 | 2022-06-10 | 中国科学院长春光学精密机械与物理研究所 | Pixel overlapping precision testing device for optical seamless splicing of camera focal plane |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080084548A1 (en) * | 2006-10-09 | 2008-04-10 | Lg Electronics Inc. | Maskless exposure apparatus and method of manufacturing substrate for display using the same |
| CN101221373A (en) * | 2008-01-25 | 2008-07-16 | 上海微电子装备有限公司 | Device for correcting illumination homogeneity |
| US20140186595A1 (en) * | 2012-12-27 | 2014-07-03 | Samsung Display Co., Ltd | Method of fabricating display device using maskless exposure apparatus and display device |
| CN104536269A (en) * | 2014-10-24 | 2015-04-22 | 江苏影速光电技术有限公司 | Method for carrying out splicing improvement by DMD (Digital Micromirror Device) triangular domains in tilting type scanning |
-
2016
- 2016-11-07 CN CN201610973504.0A patent/CN108062005B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080084548A1 (en) * | 2006-10-09 | 2008-04-10 | Lg Electronics Inc. | Maskless exposure apparatus and method of manufacturing substrate for display using the same |
| CN101221373A (en) * | 2008-01-25 | 2008-07-16 | 上海微电子装备有限公司 | Device for correcting illumination homogeneity |
| US20140186595A1 (en) * | 2012-12-27 | 2014-07-03 | Samsung Display Co., Ltd | Method of fabricating display device using maskless exposure apparatus and display device |
| CN104536269A (en) * | 2014-10-24 | 2015-04-22 | 江苏影速光电技术有限公司 | Method for carrying out splicing improvement by DMD (Digital Micromirror Device) triangular domains in tilting type scanning |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111999984A (en) * | 2019-05-27 | 2020-11-27 | 苏州苏大维格科技集团股份有限公司 | Photoetching method |
| CN111999984B (en) * | 2019-05-27 | 2021-07-13 | 苏州苏大维格科技集团股份有限公司 | Photoetching method |
| CN114608803A (en) * | 2020-12-08 | 2022-06-10 | 中国科学院长春光学精密机械与物理研究所 | Pixel overlapping precision testing device for optical seamless splicing of camera focal plane |
| CN114608803B (en) * | 2020-12-08 | 2024-05-14 | 中国科学院长春光学精密机械与物理研究所 | Pixel overlapping precision testing device for camera focal plane optical seamless splicing |
| CN114200784A (en) * | 2021-12-24 | 2022-03-18 | 锡凡半导体无锡有限公司 | Maskless laser direct-writing photoetching scanning method capable of improving resolution |
| CN114200783A (en) * | 2021-12-24 | 2022-03-18 | 锡凡半导体无锡有限公司 | Graph splicing method for maskless laser high-precision scanning |
| CN114200783B (en) * | 2021-12-24 | 2024-03-26 | 锡凡半导体无锡有限公司 | Pattern splicing method for maskless laser high-precision scanning |
| CN114474963A (en) * | 2022-04-15 | 2022-05-13 | 深圳市先地图像科技有限公司 | Multi-screen frame platemaking data processing method, system and related equipment |
| CN114474963B (en) * | 2022-04-15 | 2022-07-12 | 深圳市先地图像科技有限公司 | Multi-screen frame platemaking data processing method, system and related equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108062005B (en) | 2020-12-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108062005A (en) | A kind of splicing ameliorative way of write-through screen printing system | |
| CN103329041B (en) | The system and method that optics is pruned | |
| US20070115555A1 (en) | Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method | |
| US7248333B2 (en) | Apparatus with light-modulating unit for forming pattern | |
| CN102656514B (en) | Optical imaging writer system | |
| CN110325918B (en) | Direct imaging exposure apparatus and direct imaging exposure method | |
| CN104155851A (en) | Femtosecond-laser and two-photon polymerization micro-nano machining system and method | |
| CN108073043A (en) | A kind of optical uniformity compensation method of write-through screen printing system | |
| JPH06510397A (en) | narrow field scanner | |
| EP0753796B1 (en) | Scanning exposure method and device manufacturing method using the same | |
| CN107561876A (en) | A kind of new mask-free photolithography system and its technological process | |
| CN102621816B (en) | Method of adopting gray scale mode in write-through photoetching system to improve exposure graph quality | |
| CN103048885A (en) | Ultra-large size flat panel display maskless photolithography system and method | |
| CN106707692A (en) | Maskless lithography system with cooperative work of trans-scale structure | |
| CN109116686A (en) | A kind of DMD multizone laser projection system and exposure method | |
| CN104246615A (en) | Maskless exposure device | |
| CN108062006A (en) | The write-through screen printing system and method for platemaking of a kind of automatic top and bottom plate | |
| CN108062003A (en) | A kind of write-through screen printing system and method for platemaking | |
| KR102439363B1 (en) | Exposure head for exposure device and projection optical system for exposure device | |
| KR101720595B1 (en) | Method and apparatus for producing raster image useable in exposure apparatus based on dmd and recording medium for recording program for executing the method | |
| JP4470558B2 (en) | Light irradiation device | |
| CN103270453A (en) | Criss-cross writing strategy | |
| WO2019169733A1 (en) | Maskless photoetching system and exposure method thereof | |
| US20230367230A1 (en) | Exposure apparatus | |
| CN206523740U (en) | A kind of write-through screen printing equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |