CN108043194A - A kind of industrial refuse cracking incineration tail gas denitrating system - Google Patents
A kind of industrial refuse cracking incineration tail gas denitrating system Download PDFInfo
- Publication number
- CN108043194A CN108043194A CN201810000775.7A CN201810000775A CN108043194A CN 108043194 A CN108043194 A CN 108043194A CN 201810000775 A CN201810000775 A CN 201810000775A CN 108043194 A CN108043194 A CN 108043194A
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- gas
- vapor laser
- rubidium vapor
- rubidium
- outlet
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/76—Gas phase processes, e.g. by using aerosols
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/02—Particle separators, e.g. dust precipitators, having hollow filters made of flexible material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/02—Particle separators, e.g. dust precipitators, having hollow filters made of flexible material
- B01D46/023—Pockets filters, i.e. multiple bag filters mounted on a common frame
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/54—Nitrogen compounds
- B01D53/56—Nitrogen oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/40—Nitrogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0283—Flue gases
- B01D2258/0291—Flue gases from waste incineration plants
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/808—Laser
Abstract
The invention discloses a kind of industrial refuse cracking incineration tail gas denitrating system, including gas superheat protector, thermal type gas quality flow meter, mixed gas flow regulating valve, bag filter, semiconductor pumped rubidium vapor laser array decomposition reactor, flue-gas-cooling system, exhaust fan etc..The high-energy that make use of rubidium vapor laser of the system creativeness, nitrogen oxides in exhaust gas is under the direct irradiation of rubidium laser, electrons in nitrogen oxides molecule are subject to the bombardment of rubidium laser high-energy photon and energy level transition occur, so that the intensity of N O keys progressively weakens in nitrogen oxides molecule, and scission of link and dissociation finally occurs, it is decomposed into harmless nitrogen and oxygen；The system can carry out overheating protection according to the intake air temperature of industrial refuse cracking incineration tail gas to whole system；The system can be adjusted exhaust gas nitrous oxides concentration to the concentration range for meeting system design load.
Description
Technical field
The present invention relates to a kind of industrial refuse cracking incineration tail gas denitrating systems, belong to the exhaust-gas treatment neck in environmental protection
Domain.
Background technology
Nitrogen oxides（Nitrogen Oxides）It is a kind of major pollutants in atmospheric environment, it includes a variety of chemical combination
Object, such as nitrogen dioxide, nitric oxide, nitrous oxide, nitrogen trioxide, dinitrogen tetroxide, dinitrogen pentoxide, except nitrogen dioxide
Outside, other nitrogen oxides are extremely unstable, meet light, it is wet or it is hot can be converted into nitrogen dioxide or nitric oxide, and with nitrogen dioxide
Based on.
The main source of nitrogen oxides is divided into naturally occurring to be generated with mankind's activity, and the nitrogen oxides naturally discharged mainly comes
From the organic matter decomposition in soil and ocean and the catalytic action of lightning, these belong to the nitrogen cycle process of nature；And
Nitrogen oxides caused by mankind's activity is most from fuel combustion process, this can be to the health of natural environment and the mankind
It causes to seriously endanger.All kinds of nitrogen oxides are respectively provided with different degrees of toxicity, and human respiratory can not only be caused to damage, also
It is the major reason to form acid rain and photochemical fog.
Due to nitrogen oxides to natural environment and human health there is larger harm, in worldwide
Person and researcher are striving to find scientific and efficient administering method.Current existing administering method is summarized as follows：
（1）Direct absorption process：Nitrogen oxides in exhaust gas is directly absorbed by using lye or sec-octyl alcohol or turns nitrogen oxides
Turn to other substances that can be utilized.
（2）Solid absorption method：Mainly include sieve method, mud coal method and silica gel method.
（3）Catalytic reaction method：Mainly include selective catalysis reduction method（SCR methods）With three-way catalyst method（TWC methods）.
（4）Biological clarification：Mainly include denitrification method, removal of bacteria method, fungi removal method and microalgae removal method.
The shortcomings that above-mentioned tradition administering method, is apparent, and such as investment and operating cost are high, easily catalyst poisoning occur from reduction
Treatment effeciency and occluding device, supplies consumption is higher, nitrogen oxides removal efficiency is low, larger abrasion, reaction item are caused to equipment
Not the problems such as part control can also not generate all kinds of secondary pollutions at that time.Therefore, it is necessary to break away from existing Treatment process route, from net
Change and innovated and changed in the principle administered, develop a kind of nitrogen oxides Treatment process of new type.
The content of the invention
To solve the above-mentioned problems in the prior art, the present invention provides a kind of industrial refuse cracking incineration tail gas denitration
System, the system include gas superheat protector, thermal type gas quality flow meter, mixed gas flow regulating valve, bag-type dust
Device, semiconductor pumped rubidium vapor laser array decomposition reactor, flue-gas-cooling system, exhaust fan etc.；Wherein industrial refuse is split
Change incineration tail gas and gas superheat protector is entered by gas piping, the outlet of gas superheat protector is connected by gas piping
Thermal type gas quality flow meter, the outlet of thermal type gas quality flow meter connect mixed gas flow by gas piping and adjust
Valve, the outlet of mixed gas flow regulating valve connect bag filter by gas piping, and the outlet of bag filter passes through gas
Body pipeline connects the intake valve of semiconductor pumped rubidium vapor laser array decomposition reactor left side wall, and semiconductor pumped rubidium steam swashs
The right side wall outlet valve of optical arrays decomposition reactor connects flue-gas-cooling system by gas piping, and flue-gas-cooling system goes out
Mouth connects exhaust fan by gas piping, and the outlet of exhaust fan connects atmospheric environment by gas piping；Wherein, semiconductor
Pumping rubidium vapor laser array decomposition reactor left side wall be equipped with intake valve, right side wall be equipped with air outlet valve, on upper and lower roof between
Two groups of totally 6 semiconductor pumped rubidium vapor lasers are installed every staggeredly opposite, forms laser array, 6 beams height can be generated
Energy rubidium vapor laser beam, light path is perpendicular to upper and lower roof, on the opposite of each semiconductor pumped rubidium vapor laser face
Energy absorption baffle at roof is installed, meshy fire retardant baffle is vertically installed in the left end of each energy absorption baffle, with swashing
Light light beam is parallel, and meshy fire retardant baffle, which can stop laser light scattering and absorb it, scatters energy, prevents that local temperature is excessively high and makes
Inside reactor is on fire, and rubidium vapor laser light beam is finally projected to face by the passage that adjacent two fan meshy fire retardant baffles are formed
Energy absorption baffle on, industrial refuse cracking waste gas from incinerator passes through semiconductor pumped rubidium vapor laser array decomposition reactor
Left side air intake valve enters inside reactor, and the nitrogen oxides in exhaust gas is under the direct irradiation of rubidium vapor laser, nitrogen oxides
Electrons in molecule are bombarded be subject to rubidium vapor laser high-energy photon, and the electronics in lower level is after high-energy photon is absorbed
Energy level transition can occur, to reach the excitation state of higher level, so that the intensity of N-O keys gradually subtracts in nitrogen oxides molecule
It is weak, and it is made finally to occur scission of link and dissociation, the nitrogen oxides in exhaust gas is finally broken down into harmless nitrogen and oxygen passes through
Outlet valve discharge on reactor right side wall；Wherein, handled by semiconductor pumped rubidium vapor laser array decomposition reactor
High-temp waste gas afterwards, by being discharged after the flue-gas-cooling system cooling of rear end.
The working pressure range of its semiconductor pumped rubidium vapor laser array decomposition reactor is 0.07 ~ 1.05MPa, is worked
Temperature range is 175 ~ 630 DEG C, dischargeable capacity 360m3。
Its semiconductor pumped rubidium vapor laser uses rubidium metal saturated vapor as gain media, and is filled at normal temperatures
The ethane of 36kPa and the helium of 48kPa, the centre wavelength of rubidium vapor laser is 780.2nm, Linewidth 0.22nm, is averaged
Service life up to 15000 it is small when.
The advantage of the invention is that：
（1）The system has broken away from existing nitrogen oxides governance model, and creative employs the semiconductor pumped of world tip
Rubidium vapor laser technology by simple direct energy effect, makes the intensity of N-O keys in nitrogen oxides molecule gradually weaken, and
It is made finally to occur scission of link and dissociation, the nitrogen oxides in exhaust gas is finally broken down into harmless nitrogen and oxygen, so as to fulfill
Chemical substance zero uses and zero release of pollutant.
（2）Rubidium vapor laser in the system employs array arrangement, and exhaust gas multipass rubidium steam is enable to swash
The direct irradiation of light, improves transformation efficiency, improves the processing capacity of whole system.
（3）Semiconductor pumped rubidium vapor laser has the characteristics that service life is long, and average life is up to 15000
Hour, it is achieved thereby that the low O＆M cost and long-play of processing system.
（4）Nitrogen oxides of exhaust gas concentration into processing system can be adjusted, ensure that its concentration is in processing system
It unites suitable concentration range.
Description of the drawings
Fig. 1 is the equipment schematic diagram of the present invention
In figure：1- gas superheats protector, 2- thermal type gas quality flow meters, 3- mixed gas flows regulating valve, 4- cloth bags remove
The semiconductor pumped rubidium vapor laser array decomposition reactor of dirt device, 5-, 6- flue-gas-cooling systems, 7- exhaust fans
Fig. 2 is the schematic diagram of semiconductor pumped rubidium vapor laser array decomposition reactor
The semiconductor pumped rubidium vapor lasers of 51-, 52- rubidium vapor lasers light beam, 53- energy absorptions baffle, 54- meshy fire retardants gear
Plate, 55- air intake valves, 56- outlet valves.
Specific embodiment
Industrial refuse cracking incineration tail gas denitrating system as shown in Figure 1, the system include gas superheat protector 1, heat
Formula gas mass flow gauge 2, mixed gas flow regulating valve 3, bag filter 4, semiconductor pumped rubidium vapor laser array point
Solve reactor 5, flue-gas-cooling system 6, exhaust fan 7；Wherein, industrial refuse cracking incineration tail gas enters gas by gas piping
Body overheat protector 1, the outlet of gas superheat protector 1 connect thermal type gas quality flow meter 2, hot type gas by gas piping
The outlet of weight flowmeter 2 connects mixed gas flow regulating valve 3 by gas piping, mixed gas flow regulating valve 3
Outlet connects bag filter 4 by gas piping, and the outlet of bag filter 4 connects semiconductor pumped rubidium by gas piping
The intake valve of 5 left side wall of vapor laser array decomposition reactor, inside semiconductor pumped rubidium vapor laser array decomposition reactor 5
It is staggeredly opposite that two groups of totally 6 semiconductor pumped rubidium vapor lasers 51 are installed for titanium alloy structure, laser array is formed,
It is the rubidium metal saturated vapor of 8mm as gain media that semiconductor pumped rubidium vapor laser 51, which uses length, and at normal temperatures
The ethane of 36kPa and the helium of 48kPa are filled with, 6 beam high energy rubidium vapor laser beams 52 can be generated, the centre wavelength of laser is
780.2nm, Linewidth 0.22nm, light path is perpendicular to upper and lower roof, in each semiconductor pumped rubidium vapor laser
Energy absorption baffle 53 is installed at the opposite roof of 51 faces, net is vertically installed in the left end of each energy absorption baffle 53
The fire-retardant baffle 54 of shape, parallel with rubidium vapor laser light beam 52, meshy fire retardant baffle 54, which can stop laser light scattering and absorb it, to be dissipated
Energy is penetrated, prevents that local temperature is excessively high and makes inside reactor on fire, rubidium vapor laser light beam 52 passes through the adjacent two netted resistances of fan
The passage that combustion baffle 54 is formed finally is projected on the energy absorption baffle 53 of face, and industrial refuse cracking waste gas from incinerator passes through half
The air intake valve 55 of conductor pumping rubidium vapor laser array decomposition reactor 5 enters inside reactor, the nitrogen oxides in exhaust gas
Under the direct irradiation of high energy rubidium vapor laser light beam 52, the electrons in nitrogen oxides molecule are subject to high energy rubidium vapor laser light
The bombardment of high-energy photon in beam 52, after high-energy photon is absorbed energy level transition can occur for the electronics in lower level, to reach
The excitation state of higher level so that the intensity of N-O keys gradually weakens in nitrogen oxides molecule, and make its finally occur scission of link and
Dissociation, the nitrogen oxides in exhaust gas are finally broken down into harmless nitrogen and oxygen, and from semiconductor pumped rubidium vapor laser battle array
Outlet valve 56 on 5 right side wall of row decomposition reactor discharges reactor, semiconductor pumped rubidium vapor laser array decomposition reaction
The working pressure range of device is 0.07 ~ 1.05MPa, and operating temperature range is 175 ~ 630 DEG C, dischargeable capacity 360m3, semiconductor
The outlet of pumping rubidium vapor laser array decomposition reactor 5 connects flue-gas-cooling system 6 by gas piping, by semiconductor pump
Treated that high-temp waste gas is cooled to 25 ~ 30 DEG C in flue-gas-cooling system 6 for Pu rubidium vapor laser array decomposition reactor 5,
The outlet of flue-gas-cooling system 6 connects exhaust fan 7 by gas piping, and the outlet of exhaust fan 7 is connected by gas piping
Atmospheric environment.
Claims (1)
1. a kind of industrial refuse cracking incineration tail gas denitrating system, which is characterized in that the system includes gas superheat protector, heat
Formula gas mass flow gauge, mixed gas flow regulating valve, bag filter, semiconductor pumped rubidium vapor laser array decompose anti-
Answer device, flue-gas-cooling system, exhaust fan etc.；Wherein industrial refuse cracking incineration tail gas enters gas superheat by gas piping
Protector, the outlet of gas superheat protector connect thermal type gas quality flow meter, thermal type gas quality stream by gas piping
The outlet of gauge connects mixed gas flow regulating valve by gas piping, and the outlet of mixed gas flow regulating valve passes through gas
Pipeline connects bag filter, and the outlet of bag filter connects semiconductor pumped rubidium vapor laser array point by gas piping
The air intake valve of reactor left side wall is solved, the right side wall outlet valve of semiconductor pumped rubidium vapor laser array decomposition reactor is led to
Gas piping connection flue-gas-cooling system is crossed, the outlet of flue-gas-cooling system connects exhaust fan, air draft wind by gas piping
The outlet of machine connects atmospheric environment by gas piping；Wherein, on the left of semiconductor pumped rubidium vapor laser array decomposition reactor
Wall is equipped with intake valve, and right side wall is equipped with air outlet valve, and interleaved is opposite on upper and lower roof is equipped with two groups of totally 6 semiconductor pumps
Pu rubidium vapor laser forms laser array, can generate 6 beam high energy rubidium vapor laser beams, light path is perpendicular to upper and lower top
Wall is equipped with energy absorption baffle, in each energy at the opposite roof of each semiconductor pumped rubidium vapor laser face
The left end of amount absorbing curtain is vertically installed with meshy fire retardant baffle, and parallel with laser beam, meshy fire retardant baffle can stop sharp
Light scattering simultaneously absorbs its scattering energy, prevents that local temperature is excessively high and makes inside reactor on fire, rubidium vapor laser light beam passes through
The passage that adjacent two fan meshy fire retardants baffle is formed finally is projected on the energy absorption baffle of face, and industrial refuse cracking is burned
Exhaust gas enters inside reactor by the left side air intake valve of semiconductor pumped rubidium vapor laser array decomposition reactor, in exhaust gas
Nitrogen oxides under the direct irradiation of rubidium vapor laser, the electrons in nitrogen oxides molecule are subject to rubidium vapor laser high energy light
After high-energy photon is absorbed energy level transition can occur for the bombardment of son, the electronics in lower level, to reach swashing for higher level
State is sent out, so that the intensity of N-O keys gradually weakens in nitrogen oxides molecule, and it is made finally to occur scission of link and dissociation, in exhaust gas
Nitrogen oxides be finally broken down into harmless nitrogen and oxygen and discharged by outlet valve on reactor right side wall；Wherein,
By semiconductor pumped rubidium vapor laser array decomposition reactor treated high-temp waste gas, pass through the flue-gas-cooling system of rear end
It is discharged after cooling；
Wherein, the working pressure range of semiconductor pumped rubidium vapor laser array decomposition reactor is about 0.07 ~ 1.05MPa, work
Make temperature range as 175 ~ 630 DEG C, reactor dischargeable capacity is 360m3；Semiconductor pumped rubidium vapor laser uses rubidium metal
Saturated vapor is filled with the ethane of 36KPa and the helium of 48KPa at normal temperatures as gain media, the center of rubidium vapor laser
Wavelength is 780.2nm, Linewidth 0.22nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201810000775.7A CN108043194B (en) | 2016-01-11 | 2016-01-11 | A kind of industrial refuse cracking incineration tail gas denitrating system |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810000775.7A CN108043194B (en) | 2016-01-11 | 2016-01-11 | A kind of industrial refuse cracking incineration tail gas denitrating system |
| CN201610014076.9A CN105521695B (en) | 2016-01-11 | 2016-01-11 | A kind of industrial refuse cracking incineration tail gas denitrating system |
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| CN201610014076.9A Division CN105521695B (en) | 2016-01-11 | 2016-01-11 | A kind of industrial refuse cracking incineration tail gas denitrating system |
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| CN108043194B CN108043194B (en) | 2019-12-03 |
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| CN201610014076.9A Active CN105521695B (en) | 2016-01-11 | 2016-01-11 | A kind of industrial refuse cracking incineration tail gas denitrating system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113209730A (en) * | 2021-05-18 | 2021-08-06 | 山东蓝驰环境科技股份有限公司 | High-efficient filtration of industrial waste gas adsorbs and combustion processing device |
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| CN105797528A (en) * | 2016-05-20 | 2016-07-27 | 章俊 | Flue gas desulfuration purifying system of thermal power plant |
| CN105935538A (en) * | 2016-06-06 | 2016-09-14 | 浙江文国重工机械有限公司 | Method for removal of dioxin from industrial waste cracking burning tail gas |
| CN107866148B (en) * | 2016-06-28 | 2020-06-09 | 项敬来 | VOCs purification method for petrochemical industrial waste gas |
| CN107854995B (en) * | 2016-06-28 | 2019-03-22 | 项敬来 | A kind of VOCs purification system of petrochemical industry exhaust gas |
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| CN107511044B (en) * | 2016-07-15 | 2020-06-16 | 杭州富阳何氏化纤助剂有限公司 | Processing system for removing benzene series in petrochemical industrial waste gas |
| CN112121616A (en) * | 2020-09-09 | 2020-12-25 | 华中科技大学 | Flue gas multi-pollutant purification device for coupling microwave ultraviolet light with hydrogen peroxide |
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| CN113209730A (en) * | 2021-05-18 | 2021-08-06 | 山东蓝驰环境科技股份有限公司 | High-efficient filtration of industrial waste gas adsorbs and combustion processing device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105521695B (en) | 2018-04-03 |
| CN108043194B (en) | 2019-12-03 |
| CN105521695A (en) | 2016-04-27 |
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Effective date of registration: 20191024 Address after: 311414 No. 810, Kou Kou, Dayuan Town, Fuyang District, Hangzhou, Zhejiang Applicant after: Hangzhou green one environmental protection technology Co., Ltd. Address before: 318050 No. 64 South Street, Lunan street, Luqiao District, Zhejiang, Taizhou, Xin'an Applicant before: Zhang Wenguo |
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