CN108027502B - 光学校正装置，投射物镜，以及微光刻设备 - Google Patents

光学校正装置，投射物镜，以及微光刻设备 Download PDF

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Publication number
CN108027502B
CN108027502B CN201680055946.5A CN201680055946A CN108027502B CN 108027502 B CN108027502 B CN 108027502B CN 201680055946 A CN201680055946 A CN 201680055946A CN 108027502 B CN108027502 B CN 108027502B
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China
Prior art keywords
correction
optical
correction device
optical correction
magnet
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CN201680055946.5A
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English (en)
Chinese (zh)
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CN108027502A (zh
Inventor
H.沃尔特
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0081—Simple or compound lenses having one or more elements with analytic function to create variable power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/04—Simple or compound lenses with non-spherical faces with continuous faces that are rotationally symmetrical but deviate from a true sphere, e.g. so called "aspheric" lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201680055946.5A 2015-09-24 2016-09-06 光学校正装置，投射物镜，以及微光刻设备 Active CN108027502B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102015218329.7A DE102015218329A1 (de) 2015-09-24 2015-09-24 Optische Korrekturanordnung, Projektionsobjektiv mit einer solchen optischen Korrekturanordnung sowie mikrolithografische Apparatur mit einem solchen Projektionsobjektiv
DE102015218329.7 2015-09-24
PCT/EP2016/070981 WO2017050565A1 (de) 2015-09-24 2016-09-06 Optische korrekturanordnung, projektionsobjektiv mit einer solchen optischen korrekturanordnung sowie mikrolithografische apparatur mit einem solchen projektionsobjektiv

Publications (2)

Publication Number Publication Date
CN108027502A CN108027502A (zh) 2018-05-11
CN108027502B true CN108027502B (zh) 2021-07-06

Family

ID=56883789

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201680055946.5A Active CN108027502B (zh) 2015-09-24 2016-09-06 光学校正装置，投射物镜，以及微光刻设备

Country Status (6)

Country Link
US (1) US10859815B2 (https=)
JP (1) JP6842461B2 (https=)
KR (1) KR102683680B1 (https=)
CN (1) CN108027502B (https=)
DE (1) DE102015218329A1 (https=)
WO (1) WO2017050565A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107544130B (zh) * 2016-06-29 2020-05-22 佳能株式会社 附接光学系统、图像捕获光学系统和图像捕获装置
DE102018201495A1 (de) * 2018-01-31 2019-01-10 Carl Zeiss Smt Gmbh Abbildendes optisches System für die Mikrolithographie
NL2024520A (en) * 2019-01-17 2020-08-14 Asml Netherlands Bv Target delivery system
JP7178932B2 (ja) * 2019-03-12 2022-11-28 キヤノン株式会社 露光装置、および物品製造方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10142555A (ja) * 1996-11-06 1998-05-29 Nikon Corp 投影露光装置
TW409304B (en) * 1996-12-28 2000-10-21 Canon Kk Projection exposure apparatus and device manufacturing method
TW200839455A (en) * 2006-10-02 2008-10-01 Zeiss Carl Smt Ag Method for improving the imaging properties of an optical system, and such an optical system
DE102008043321A1 (de) * 2008-01-17 2009-07-23 Carl Zeiss Smt Ag Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102008043243A1 (de) * 2008-10-28 2009-10-29 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie sowie Verfahren zum Verbessern der Abbildungseigenschaften eines Projektionsobjektivs
CN103885176A (zh) * 2014-03-20 2014-06-25 中国科学院西安光学精密机械研究所 相位掩膜板及能够调节中间编码图像品质的波前编码成像系统
DE102013204572A1 (de) * 2013-03-15 2014-09-18 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit hochflexiblem Manipulator

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3303758B2 (ja) * 1996-12-28 2002-07-22 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JP3459773B2 (ja) * 1998-06-24 2003-10-27 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JP2003107311A (ja) * 2001-09-27 2003-04-09 Nikon Corp 光学素子保持装置、鏡筒及び露光装置並びにデバイスの製造方法
JP2003178954A (ja) * 2001-12-12 2003-06-27 Canon Inc 露光装置及びデバイスの製造方法
JP4307140B2 (ja) * 2003-04-25 2009-08-05 キヤノン株式会社 光学素子位置決め装置、それを用いた露光装置、デバイスの製造方法
JP5312058B2 (ja) 2009-01-19 2013-10-09 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
EP2219077A1 (en) 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projection exposure method, projection exposure system and projection objective
US8159753B2 (en) * 2010-05-28 2012-04-17 Universidad De Guanajuato Optical system with variable field depth
NL2009844A (en) 2011-12-22 2013-06-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
DE102012212758A1 (de) * 2012-07-20 2014-01-23 Carl Zeiss Smt Gmbh Systemkorrektur aus langen Zeitskalen
DE102013213545A1 (de) * 2013-07-10 2015-01-15 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10142555A (ja) * 1996-11-06 1998-05-29 Nikon Corp 投影露光装置
TW409304B (en) * 1996-12-28 2000-10-21 Canon Kk Projection exposure apparatus and device manufacturing method
DE69728126T2 (de) * 1996-12-28 2005-01-20 Canon K.K. Projektionsbelichtungsapparat und Verfahren zur Herstellung einer Vorrichtung
TW200839455A (en) * 2006-10-02 2008-10-01 Zeiss Carl Smt Ag Method for improving the imaging properties of an optical system, and such an optical system
DE102008043321A1 (de) * 2008-01-17 2009-07-23 Carl Zeiss Smt Ag Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102008043243A1 (de) * 2008-10-28 2009-10-29 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie sowie Verfahren zum Verbessern der Abbildungseigenschaften eines Projektionsobjektivs
DE102013204572A1 (de) * 2013-03-15 2014-09-18 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit hochflexiblem Manipulator
TW201504769A (zh) * 2013-03-15 2015-02-01 卡爾蔡司Ｓｍｔ有限公司 具有高彈性操作器的投影曝光裝置
CN103885176A (zh) * 2014-03-20 2014-06-25 中国科学院西安光学精密机械研究所 相位掩膜板及能够调节中间编码图像品质的波前编码成像系统

Also Published As

Publication number Publication date
DE102015218329A1 (de) 2017-03-30
KR102683680B1 (ko) 2024-07-11
JP6842461B2 (ja) 2021-03-17
JP2018534612A (ja) 2018-11-22
KR20180058764A (ko) 2018-06-01
CN108027502A (zh) 2018-05-11
WO2017050565A1 (de) 2017-03-30
US20180196256A1 (en) 2018-07-12
US10859815B2 (en) 2020-12-08

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