CN108018540A - 双功能反应炉 - Google Patents
双功能反应炉 Download PDFInfo
- Publication number
- CN108018540A CN108018540A CN201711486635.7A CN201711486635A CN108018540A CN 108018540 A CN108018540 A CN 108018540A CN 201711486635 A CN201711486635 A CN 201711486635A CN 108018540 A CN108018540 A CN 108018540A
- Authority
- CN
- China
- Prior art keywords
- boiler tube
- reacting furnace
- fire door
- difunctional
- import
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008676 import Effects 0.000 claims abstract description 59
- 238000010438 heat treatment Methods 0.000 claims abstract description 45
- 239000007788 liquid Substances 0.000 claims abstract description 45
- 239000000758 substrate Substances 0.000 claims abstract description 38
- 238000005530 etching Methods 0.000 claims abstract description 32
- 238000006243 chemical reaction Methods 0.000 claims abstract description 24
- 239000000463 material Substances 0.000 claims abstract description 20
- 230000005540 biological transmission Effects 0.000 claims description 29
- 238000001816 cooling Methods 0.000 claims description 18
- 238000007789 sealing Methods 0.000 claims description 12
- 238000001914 filtration Methods 0.000 claims description 9
- 238000012545 processing Methods 0.000 claims description 8
- 230000002093 peripheral effect Effects 0.000 claims description 6
- 239000003507 refrigerant Substances 0.000 claims description 5
- 239000002699 waste material Substances 0.000 claims description 3
- 238000010924 continuous production Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 33
- 238000010586 diagram Methods 0.000 description 8
- 238000011068 loading method Methods 0.000 description 7
- 238000013461 design Methods 0.000 description 5
- 239000012530 fluid Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 229920000742 Cotton Polymers 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000000112 cooling gas Substances 0.000 description 2
- 239000000110 cooling liquid Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229920006169 Perfluoroelastomer Polymers 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000036760 body temperature Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000002320 enamel (paints) Substances 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 230000007096 poisonous effect Effects 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
Claims (16)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711486635.7A CN108018540A (zh) | 2017-12-29 | 2017-12-29 | 双功能反应炉 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711486635.7A CN108018540A (zh) | 2017-12-29 | 2017-12-29 | 双功能反应炉 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN108018540A true CN108018540A (zh) | 2018-05-11 |
Family
ID=62071021
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201711486635.7A Pending CN108018540A (zh) | 2017-12-29 | 2017-12-29 | 双功能反应炉 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN108018540A (zh) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0214522A (ja) * | 1988-06-13 | 1990-01-18 | Tel Sagami Ltd | 熱処理装置のクリーニング方法 |
KR20080057395A (ko) * | 2006-12-20 | 2008-06-25 | 동부일렉트로닉스 주식회사 | 반도체 소자를 제조하기 위한 수평형 퍼니스 |
CN201621944U (zh) * | 2010-03-25 | 2010-11-03 | 长沙科源真空技术有限公司 | 卧式真空电炉可移动式料台结构 |
CN103700585A (zh) * | 2013-11-26 | 2014-04-02 | 上海华力微电子有限公司 | 一种浅沟槽隔离氧化层的制备方法及其装置 |
CN104501599A (zh) * | 2015-01-16 | 2015-04-08 | 中国环境科学研究院 | 多功能高温炉 |
CN105371658A (zh) * | 2015-12-16 | 2016-03-02 | 广东昭信照明科技有限公司 | 一种陶瓷烧结炉 |
CN206247832U (zh) * | 2016-12-13 | 2017-06-13 | 无锡南方声学工程有限公司 | 一种真空清洗炉 |
-
2017
- 2017-12-29 CN CN201711486635.7A patent/CN108018540A/zh active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0214522A (ja) * | 1988-06-13 | 1990-01-18 | Tel Sagami Ltd | 熱処理装置のクリーニング方法 |
KR20080057395A (ko) * | 2006-12-20 | 2008-06-25 | 동부일렉트로닉스 주식회사 | 반도체 소자를 제조하기 위한 수평형 퍼니스 |
CN201621944U (zh) * | 2010-03-25 | 2010-11-03 | 长沙科源真空技术有限公司 | 卧式真空电炉可移动式料台结构 |
CN103700585A (zh) * | 2013-11-26 | 2014-04-02 | 上海华力微电子有限公司 | 一种浅沟槽隔离氧化层的制备方法及其装置 |
CN104501599A (zh) * | 2015-01-16 | 2015-04-08 | 中国环境科学研究院 | 多功能高温炉 |
CN105371658A (zh) * | 2015-12-16 | 2016-03-02 | 广东昭信照明科技有限公司 | 一种陶瓷烧结炉 |
CN206247832U (zh) * | 2016-12-13 | 2017-06-13 | 无锡南方声学工程有限公司 | 一种真空清洗炉 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101432856B (zh) | 多层式负载锁定室、传送室及处理基板的方法 | |
CN105934837B (zh) | 允许低压工具替换的原子层沉积处理腔室 | |
US5997588A (en) | Semiconductor processing system with gas curtain | |
US20120052203A1 (en) | Substrate processing apparatus and method of processing substrate | |
KR20180056388A (ko) | 기판 처리 장치, 반응관 구조 및 반도체 장치의 제조 방법 | |
US20120076936A1 (en) | Substrate processing apparatus, gas nozzle and method of processing substrate | |
TW201618211A (zh) | 基板處理裝置及基板處理方法 | |
CN101379214A (zh) | 干式蚀刻以及外延沉积工艺及装置 | |
CN101097844B (zh) | 半导体处理装置 | |
CN101834119A (zh) | 衬底处理装置 | |
CN104471678B (zh) | 用于输送工艺气体至基板的方法和设备 | |
US8222161B2 (en) | Substrate processing apparatus and semiconductor devices manufacturing method | |
CN103298974B (zh) | 装置、方法以及反应腔室 | |
CN201901699U (zh) | 自动化基片传输和原位基片测试的mocvd处理系统 | |
CN207760425U (zh) | 双功能反应炉 | |
CN108018540A (zh) | 双功能反应炉 | |
CN108091589A (zh) | 基板处理装置及基板处理方法 | |
CN207664032U (zh) | 双功能反应设备 | |
JP2012069831A (ja) | 基板処理装置および半導体装置の製造方法 | |
CN108193193A (zh) | 基于双功能反应炉的工艺方法 | |
CN108039332A (zh) | 双功能反应设备 | |
CN201901700U (zh) | 一种实现自动化基片传输的mocvd处理系统 | |
US20160326648A1 (en) | Apparatus for selectively sealing a gas feedthrough | |
CN201908131U (zh) | 一种用于mocvd处理系统的预装片子系统 | |
CN103320852A (zh) | 用于外延沉积的反应腔 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20201026 Address after: Room 3494, building 2, 1899 Guangtai Road, Fengxian District, Shanghai 201400 Applicant after: Chu Yun precision technology (Shanghai) Co.,Ltd. Address before: 201306, No. 999, Huan Cheng Ring Road, Pudong New Area, Pudong New Area, Shanghai Applicant before: Liu Cheng |
|
CB02 | Change of applicant information | ||
CB02 | Change of applicant information |
Address after: No.66210, 3rd floor, Pudong Free Trade Zone, Shanghai, China Applicant after: Chu Yun precision technology (Shanghai) Co.,Ltd. Address before: Room 3494, building 2, No. 1899, Guangtai Road, Fengxian District, Shanghai 201400 Applicant before: Chu Yun precision technology (Shanghai) Co.,Ltd. |