CN108015496B - The preparation method of vacuum chamber and vacuum chamber - Google Patents
The preparation method of vacuum chamber and vacuum chamber Download PDFInfo
- Publication number
- CN108015496B CN108015496B CN201711251569.5A CN201711251569A CN108015496B CN 108015496 B CN108015496 B CN 108015496B CN 201711251569 A CN201711251569 A CN 201711251569A CN 108015496 B CN108015496 B CN 108015496B
- Authority
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- China
- Prior art keywords
- supporting element
- vacuum chamber
- threaded hole
- clean area
- chamber wall
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- 238000002360 preparation method Methods 0.000 title claims abstract description 11
- 238000000034 method Methods 0.000 claims description 9
- 238000003466 welding Methods 0.000 claims description 9
- 230000003749 cleanliness Effects 0.000 abstract description 3
- 230000000149 penetrating effect Effects 0.000 abstract 1
- 238000012545 processing Methods 0.000 description 8
- 239000012535 impurity Substances 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 239000002173 cutting fluid Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004807 localization Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 238000007730 finishing process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011796 hollow space material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23P—METAL-WORKING NOT OTHERWISE PROVIDED FOR; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS
- B23P15/00—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Pressure Vessels And Lids Thereof (AREA)
Abstract
The invention discloses the preparation methods of a kind of vacuum chamber and vacuum chamber, and wherein vacuum chamber has supporting element and chamber wall, wherein is formed with positioning surface on the chamber wall；The clean area of recess is formed on the bottom surface of the supporting element, the bottom surface is located on the positioning surface, also, the supporting element and the chamber wall are tightly connected；The first threaded hole is formed on the top surface of the supporting element, first threaded hole is penetrated through to the clean area.In vacuum chamber of the invention, bottom surface and positioning surface are tightly connected, and without side seam, will not be sheltered evil people and countenance evil practices, and there is clean area on bottom surface, there is the first threaded hole for penetrating through with clean area on top surface, can smoothly deflate, it will not nest gas of gas reservoir, simultaneously, directly clear area can be cleaned by the first threaded hole, to improve the cleanliness in vacuum chamber on the whole, avoid the pollution of part.
Description
Technical field
The present invention relates to the preparation methods of a kind of vacuum chamber and vacuum chamber.
Background technique
Currently, vacuum system equipment is according to product demand and workplace to the clean of equipment key part in vacuum industry
Cleanliness requires different.Vacuum chamber is the supporting body of various execution units, while it is also mentioned as a critical component in equipment
A kind of vacuum clean environment is supplied.
Existing vacuum chamber supporting element is mainly made of the part of cylindrical body, cuboid or combined shaped, they
Be directly welded on chamber wall, have a biggish contact area with chamber wall, and the requirement in view of deflating, these parts with
Welding between chamber wall is all intermittently welded.Such frame mode makes to form narrow hemi-closure space between the two, holds very much
It easily shelters evil people and countenance evil practices and not easy-clear, is also unfavorable for deflating well.This makes in the not high equipment of general vacuum or purity requirements
With being possible, but for solar film plating equipment, will cause part hiding gas, hide impurity be difficult to clean off, impurity everywhere
The problem of drifting can also impact quality of forming film.
Summary of the invention
The object of the present invention is to provide the preparation method of a kind of vacuum chamber and vacuum chamber, solve support parts locally hiding it is dirty,
The problem of hiding gas, and it is easy to clean, other parts will not be polluted.
Vacuum chamber of the invention has supporting element and chamber wall, wherein be formed with positioning surface on the chamber wall；It is described
The clean area of recess is formed on the bottom surface of supporting element, the bottom surface is located on the positioning surface, also, the supporting element and institute
State chamber wall sealed connection；The first threaded hole is formed on the top surface of the supporting element, first threaded hole is penetrated through to institute
State clean area.
Vacuum chamber as described above, wherein the supporting element is fully welded with the chamber wall and connect.
Vacuum chamber as described above, wherein there are two first threaded hole at least has.
Vacuum chamber as described above, wherein be additionally provided with the second threaded hole on the top surface, second threaded hole with
It is blocked between the clean area.
Vacuum chamber as described above, wherein deflation through-hole is formed on the supporting element, the deflation through-hole penetrates through institute
Supporting element is stated, and is communicated with second threaded hole bottom.
Vacuum chamber as described above, wherein the positioning surface is the concave face being formed on the chamber wall.
Vacuum chamber as described above, wherein the depth of the positioning surface recess is 1mm-2mm.
Vacuum chamber as described above, wherein the depth of the clean area recess is 2mm-5mm；The clean area is tapered
Uncovered structure.
The preparation method of vacuum chamber of the present invention, including positioning surface is formed on chamber wall；It is formed on the bottom surface of supporting element
The clean area of recess forms the first threaded hole of perforation to the clean area on the top surface of the supporting element；By the bottom surface
It is placed on the positioning surface, and the supporting element and chamber wall is tightly connected；Use screw and the first threaded hole spiral shell
After connecing, top surface described in attrition process.
The preparation method of vacuum chamber as described above, wherein the supporting element and the chamber wall are fully welded welding, and/or,
Gasket is provided between the screw and first threaded hole.
In vacuum chamber of the invention, bottom surface and positioning surface are tightly connected, and without side seam, will not be sheltered evil people and countenance evil practices, and bottom surface
It is upper that there is clean area, there is the first threaded hole penetrated through with clean area on top surface, can smoothly deflate, will not nest gas of gas reservoir,
Meanwhile directly clear area can be cleaned by the first threaded hole, so that the cleanliness in vacuum chamber is improved on the whole,
Avoid the pollution of part.
Detailed description of the invention
Fig. 1 is the schematic diagram of supporting element part in vacuum chamber of the present invention；
Fig. 2 is the schematic diagram of vacuum chamber lumen chamber wall portion of the present invention；
Fig. 3 is the cross-sectional view of vacuum chamber of the present invention；
Fig. 4 is the cross-sectional view after Fig. 3 mounting screw.
Appended drawing reference:
Supporting element 1；Chamber wall 2；Top surface 3；Bottom surface 4；Clean area 5；First threaded hole 6；Second threaded hole 7；Deflation through-hole
8；Positioning surface 9；Screw 10；Gasket 11.
Specific embodiment
The embodiment of the present invention is described below in detail, examples of the embodiments are shown in the accompanying drawings, wherein from beginning to end
Same or similar label indicates same or similar element or element with the same or similar functions.Below with reference to attached
The embodiment of figure description is exemplary, and for explaining only the invention, and is not construed as limiting the claims.
The present invention discloses a kind of vacuum chamber, includes supporting element 1 and chamber wall 2.Supporting element 1 in the vacuum chamber, should
Supporting element 1 is that fixed support or positioning support are played the role of in the assembly of other component, this needs supporting element 1 to have certain morpheme public
Difference.
Positioning surface 9 is formed on chamber wall 2, the bottom surface 4 of supporting member 1 is located on positioning surface 9, and supporting element 1 and chamber wall 2 are close
Envelope connection, the part that the side wall that the mode of sealed connection can be supporting element 1 is contacted with chamber wall 2 is welded.Meanwhile it supporting
It is also formed with the clean area 5 of recess on the bottom surface 4 of part 1, clean area 5 is towards positioning surface 9, that is to say, that clean area 5 is open
Structure, opening are buckled on positioning surface 9, and such clean area 5 is formed a hollow structure.In some embodiments, bottom surface 4
It the modes such as can also be brazed between positioning surface 9 to be tightly connected.The first threaded hole is formed on the top surface of supporting element 13
6, the first threaded hole 6 perforation to clean area 5 is deflated for clean area 5.
Preferably, supporting element 1 and chamber wall 2 are fully welded connection.It is usually according at chamber interior positioning in machining
Reason, part preprocessing-welding-heat treatment-finishing process route execute.
For supporting element 1 higher for positioning requirements, positioning surface 9 is to be formed in the face being recessed on chamber wall 2, recess
Depth is that the basic size of 1mm-2mm positioning surface 9 and tolerance are determined according to the outer dimension of supporting element 1.Not for positioning requirements
For high supporting element 1, positioning surface 9 can not be recessed, for example, can according to the outer dimension of supporting element 1 on chamber wall 2 hand
The dynamic contour line for marking main positioning surface 9, and it is directed at welding.The contour line can be macroscopic, practical lines,
It is also possible to what the program on process equipment limited out, by process control process equipment by the bottom surface of supporting element 1 and contour line
Alignment, and place, then carry out the operations such as subsequent welding.
In general, in the preparation, by the pre-processed portion size of supporting element 1, and there are certain in the height direction
Machining allowance is prepared for later finishing.Process support part 1 is illustrated how below, and the knot of the supporting element 1 processed
Structure.
Clean area 5 is processed on bottom surface 4, clean area 5, which is processed into the conical surface, maximizes contact area, that is, the opening of taper
The outer diameter of structure, open-mouth is larger, and the diameter of the recess bottom surface after recess is smaller.It is clean on the direction that bottom surface 4 is directed toward in top surface 3
The diameter in net area 5 is gradually increased.Clean area 5 forms a hollow space.The depth of the clean area 5 recess is preferably 2mm-
5mm。
Certainly, above-mentioned clean area 5 is processed into the conical surface only as a preferred embodiment, being not limited to this Shen
Please, can also be used for the application with other shapes, such as cylindrical surface can be processed into etc..
It is machined at least two first threaded holes 6, preferably countersunk head threaded hole on top surface 3, is penetrated through with clean area 5,
Clean area 5 is thus set to become open space.The space of certain opening, can be sealed by screw 10, screw 10 and the
One threaded hole 6 is spirally connected, and the first threaded hole 6 is blocked, in order to improve the effect for blocking and sealing in other words, in screw 10 and the first spiral shell
Gasket 11 is provided between pit 6.Corresponding above-mentioned first threaded hole 6 is countersunk head threaded hole, and screw 10 can be countersunk head herein
Screw.It is to be understood that the use of screw 10 is usually to use when processing vacuum chamber, such as need to supporting element 1
Height is adjusted, and the processing of modes such as is ground, is cut, and processing waste material is entered clean by the first threaded hole 6 in order to prevent
Net area 5, therefore it is screwed to the first threaded hole 6 using screw 10, to play sealing function.
Certainly, after the completion of vacuum chamber use, screw 10 can also be screwed to the first threaded hole 6, dust is avoided to enter.
Further, also there is the second threaded hole 7, blocked between the second threaded hole 7 and clean area 5；It is formed on supporting element 1
There is deflation through-hole 8, the deflation through-hole penetrates through the supporting element, and communicates with 7 bottom of the second threaded hole.The deflation through-hole
8 preferably on any side wall of supporting element 1, and deflation through-hole 8 can be to be pre-machined out, certainly, can also be in multiple sides
The deflation through-hole 8 is all set on wall.Be spirally connected in the second threaded hole 7 bolt or screw when, bolt or screw and the second screw thread
Air between hole 7 in gap can be discharged via deflation through-hole 8.
Illustrate the preparation method of vacuum chamber below: forming positioning surface 9 on chamber wall 2；The shape on the bottom surface of supporting element 14
At the clean area 5 of recess, the first threaded hole 6 of perforation to clean area 5 is formed on the top surface of supporting element 13；Bottom surface 4 is placed
In on positioning surface 9, and supporting element 1 and chamber wall 2 are tightly connected；After being spirally connected using screw and first threaded hole 6, grinding
Process the top surface 3.It states and is provided with gasket 11 between screw 10 and first threaded hole 6；Supporting element 1 and the chamber wall
2 are fully welded welding.
In simple terms, it can be understood as by the supporting element 1 processed, (supporting member 1 processed is it is to be understood that process
Clear area 5 and the isostructural supporting member 1 of the first threaded hole 6, naturally it is also possible to including above-mentioned second threaded hole 7 and deflation through-hole 8,
Here only as explanation, each structure is not enumerated) it is placed into localization region, according to welding process requirement in welding branch
It carries out being fully welded processing between support member 1 and chamber wall 2.Localization region refers to the contour line of positioning surface 9 or positioning surface 9, and purpose is exactly to be
Positioning when welding.
Heat treatment release stress can be done after having welded, when finishing can finish each components, such as support
The height of part 1 can do machining, usually carry out on the top surface 3, when finishing on the first above-mentioned threaded hole 6, meeting
Gasket 11 and screw 10 are successively installed, prevents cutting fluid from flowing into clean area and pollutes.
Second threaded hole 7 and deflation through-hole 8 can also be in the post-processings of supporting element 1 and 2 sealed connection of chamber wall.It needs to manage
Solution when processing the second threaded hole 7 and deflation through-hole 8, also should successively install gasket 11 and screw under this processing sequence
10, it prevents from polluting clean area 5 when processing.
When cleaning, the outside of supporting element 1 is easy to wiped clean, and inside only needs to be rinsed by the first threaded hole 6
?.
In addition, other necessary operation workpiece can be also set on supporting element 1 after the completion of the finishing of supporting element 1, it should
Operation workpiece is vacuum chamber used in the subsequent applications, then this is not repeated them here.
The pollution of cutting fluid in processing, and benefit can be reduced or avoided when manufacture by screw 10 for vacuum chamber of the invention
In secondary cleaning.The connection type being fully welded can reduce hiding for various impurity.First threaded hole 6 and clean area 5 form opening
Region, facilitate the later period to clean.
Structure, feature and effect of the invention, the above institute are described in detail based on the embodiments shown in the drawings
Only presently preferred embodiments of the present invention is stated, but the present invention does not limit the scope of implementation as shown in the drawings, it is all according to structure of the invention
Think made change or equivalent example modified to equivalent change, when not going beyond the spirit of the description and the drawings,
It should all be within the scope of the present invention.
Claims (10)
1. a kind of vacuum chamber comprising:
Supporting element (1) and chamber wall (2), wherein
Positioning surface (9) are formed on the chamber wall (2)；
The clean area (5) of recess is formed on the bottom surface (4) of the supporting element (1), the bottom surface (4) is located at the positioning surface
(9) on, also, the supporting element (1) and the chamber wall (2) are tightly connected；
It is formed with the first threaded hole (6) on the top surface (3) of the supporting element (1), first threaded hole (6) penetrates through to described
Clean area (5).
2. vacuum chamber according to claim 1, which is characterized in that
The supporting element (1) is fully welded with the chamber wall (2) to be connect.
3. vacuum chamber according to claim 1, which is characterized in that
There are two first threaded hole (6) at least has.
4. vacuum chamber according to claim 1, which is characterized in that
It is additionally provided on the top surface (3) the second threaded hole (7), between second threaded hole (7) and the clean area (5)
It blocks.
5. vacuum chamber according to claim 4, which is characterized in that
It is formed on the supporting element (1) deflation through-hole (8), the deflation through-hole penetrates through the supporting element, and with described the
Two threaded holes (7) bottom communicates.
6. vacuum chamber according to claim 1, which is characterized in that
The positioning surface (9) is the concave face being formed on the chamber wall (2).
7. vacuum chamber according to claim 6, which is characterized in that
The depth of positioning surface (9) recess is 1mm-2mm.
8. vacuum chamber according to claim 1, which is characterized in that
The depth of clean area (5) recess is 2mm-5mm；
The tapered uncovered structure of the clean area (5).
9. a kind of preparation method of vacuum chamber, which is characterized in that
Positioning surface (9) are formed on chamber wall (2)；
The clean area (5) that recess is formed on the bottom surface (4) of supporting element (1) is formed on the top surface (3) of the supporting element (1)
It penetrates through to the first threaded hole (6) of the clean area (5)；
The bottom surface (4) are placed on the positioning surface (9), and the supporting element (1) and chamber wall (2) is tightly connected；
After being spirally connected using screw and first threaded hole (6), top surface described in attrition process (3).
10. the preparation method of vacuum chamber according to claim 9, which is characterized in that
The supporting element (1) and the chamber wall (2) are fully welded welding；
And/or
Gasket (11) are provided between the screw (10) and first threaded hole (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711251569.5A CN108015496B (en) | 2017-12-01 | 2017-12-01 | The preparation method of vacuum chamber and vacuum chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711251569.5A CN108015496B (en) | 2017-12-01 | 2017-12-01 | The preparation method of vacuum chamber and vacuum chamber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108015496A CN108015496A (en) | 2018-05-11 |
| CN108015496B true CN108015496B (en) | 2019-05-28 |
Family
ID=62078184
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711251569.5A Active CN108015496B (en) | 2017-12-01 | 2017-12-01 | The preparation method of vacuum chamber and vacuum chamber |
Country Status (1)
| Country | Link |
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| CN (1) | CN108015496B (en) |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0239589B2 (en) * | 1984-05-10 | 1990-09-06 | Ulvac Corp | USUGATABEROONOSEIZOSOCHI |
| JP2000237574A (en) * | 1999-02-18 | 2000-09-05 | Nissin Electric Co Ltd | Airtight locking device |
| ITTO20030691A1 (en) * | 2003-09-11 | 2005-03-12 | Edison Termoelettrica Spa | METHOD AND EQUIPMENT FOR FORMING A LAYER |
| CN1941597A (en) * | 2005-09-28 | 2007-04-04 | 北京太阳河技术发展有限责任公司 | Vacuum receiver with solar electrothermal symbiont |
| CN101062499B (en) * | 2005-12-21 | 2011-06-15 | 国家科技发展机构 | Solar battery manufacturing mechanism with high performance and low cost |
| KR20100000146A (en) * | 2008-06-24 | 2010-01-06 | 주성엔지니어링(주) | Vacuum chamber for treatmenting substrate including chamber lid |
| WO2013037802A1 (en) * | 2011-09-12 | 2013-03-21 | Mapper Lithography Ip B.V. | Vacuum chamber with base plate |
| JP5723801B2 (en) * | 2012-02-06 | 2015-05-27 | 株式会社日立ハイテクノロジーズ | Charged particle beam apparatus and wiring method |
| CN105502965A (en) * | 2015-12-28 | 2016-04-20 | 太仓耀华玻璃有限公司 | Automatic vacuum glass laser sealing device |
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- 2017-12-01 CN CN201711251569.5A patent/CN108015496B/en active Active
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Address after: 102200 room A129-1, Zhongxing Road, Changping District science and Technology Park, Beijing, China, 10 Patentee after: DONGTAI HI-TECH EQUIPMENT TECHNOLOGY Co.,Ltd. Address before: 102200 room A129-1, Zhongxing Road, Changping District science and Technology Park, Beijing, China, 10 Patentee before: DONGTAI HI-TECH EQUIPMENT TECHNOLOGY (BEIJING) Co.,Ltd. |
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Address after: 102200 room A129-1, Zhongxing Road, Changping District science and Technology Park, Beijing, China, 10 Patentee after: DONGTAI HI-TECH EQUIPMENT TECHNOLOGY (BEIJING) Co.,Ltd. Address before: 102299 room A129-1, No. 10, Zhongxing Road, Changping District science and Technology Park, Beijing Patentee before: Beijing Chuangyu Technology Co.,Ltd. |
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Effective date of registration: 20200618 Address after: 518112 Room 403, unit 2, building C, Dongfang Shengshi, Jinpai community, Buji street, Longgang District, Shenzhen City, Guangdong Province Patentee after: Shenzhen yongshenglong Technology Co.,Ltd. Address before: 102200 room A129-1, Zhongxing Road, Changping District science and Technology Park, Beijing, China, 10 Patentee before: DONGTAI HI-TECH EQUIPMENT TECHNOLOGY Co.,Ltd. |
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Effective date of registration: 20210219 Address after: Room a129-1, No. 10, Zhongxing Road, science and Technology Park, Changping District, Beijing Patentee after: DONGTAI HI-TECH EQUIPMENT TECHNOLOGY Co.,Ltd. Address before: Room 403, unit 2, building C, Dongfang Shengshi, Jinpai community, Buji street, Longgang District, Shenzhen, Guangdong 518112 Patentee before: Shenzhen yongshenglong Technology Co.,Ltd. |
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