CN107976869A - A kind of nonopiate bearing calibration of work stage and means for correcting - Google Patents
A kind of nonopiate bearing calibration of work stage and means for correcting Download PDFInfo
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- CN107976869A CN107976869A CN201610925970.1A CN201610925970A CN107976869A CN 107976869 A CN107976869 A CN 107976869A CN 201610925970 A CN201610925970 A CN 201610925970A CN 107976869 A CN107976869 A CN 107976869A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
Abstract
The invention discloses a kind of nonopiate bearing calibration of work stage and means for correcting, which includes：Nonopiate measurement markers, are arranged on the coarse motion turntable for being used for bearing substrate in work stage, the nonopiate measurement markers are not at least provided with three, and not point-blank；Visual unit, for obtaining the position of the nonopiate measurement markers；Interferometer measurement unit, for measuring the position of the work stage；Further include correction unit, the position of the nonopiate measurement markers and the position of the work stage obtained according to nominal position, the visual unit of the nonopiate measurement markers under coarse motion turntable coordinate system calculates the nonopiate amount of the work stage, and sends to the interferometer measurement unit and compensate correction.The present invention efficiently solves workpiece mesa and influence to TP control accuracies is thermally deformed in exposure process, so as to reduce the use cost of material.
Description
Technical field
The present invention relates to technical field of lithography, and in particular to a kind of nonopiate bearing calibration of work stage and means for correcting.
Background technology
Projection scanning formula TFT (Thin Film Transistor, thin film transistor (TFT)) litho machine is used for the upper figure of mask
Shape is clear, is correctly imaged on the substrate for scribbling photoresist, increases the plane mirror, it is necessary to using bigger with substrate size
Face type change as work stage interferometer measurement speculum, therefore Fang Jing has become restriction TP (Total Pitch) precision
Principal element.
It is usually offline periodically to demarcate when type change in mirror face is little, but when type is thermally deformed larger face to face,
The off-line calibration cycle can not meet needs.In addition, the rotation attitude change of mirror can also influence nonorthogonality, make
There is non-orthogonal situation in the mark of base plate exposure.
It is as shown in Figure 1 plane mirror schematic diagram in work stage, including：Work stage X is to speculum 10, workpiece platform micro-motion
Module 20 and interferometer support 30.By monitoring the change of interferometer light path the X of work stage is measured and controlled to amount of movement.Reason
In the case of thinking, work stage along Y-direction move when, to X to no crosstalk, however, to ensure that along Y-direction move when, X is to measurement
Be worth constant, i.e., light path is constant, when work stage X to speculum 10 there are during the type of face, in order to ensure that light path is constant, work stage need into
The movement of row X-direction is influenced with compensating, and work stage measuring coordinate is nonideal coordinate system at this time, but curved coordinate system, no
It can meet complete machine demand.In order to make worktable coordinate system be preferable coordinate system, it would be desirable to periodically carry out calibration mirror face
Type, but change is serious if the rapidoprint of mirror is influenced by heat, when volume production, off-line calibration frequency is far away from mirror
Change frequency, it is therefore desirable to its influence of on-line measurement.The existing high terrace type scaling method generally use step motion work of mirror
Part platform realizes that is, work stage needs to stop in test, and disadvantage of this is that the nominal time is longer, efficiency is low.
The content of the invention
It is existing in the prior art to solve the present invention provides a kind of nonopiate bearing calibration of work stage and means for correcting
Problem.
In order to solve the above-mentioned technical problem, the technical scheme is that：A kind of nonopiate bearing calibration of work stage, including
Following steps：
S1：Nonopiate measurement markers are set on the coarse motion turntable of bearing substrate in work stage, it is described nonopiate
Measurement markers are not at least provided with three, and not point-blank；
S2：Choose three nonopiate measurement markers, travelling workpiece platform, make visual unit be respectively aligned to three it is described nonopiate
Measurement markers, obtain the position of three nonopiate measurement markers, while measure alignment when institute by interferometer measurement unit
State position x_s_i, y_s_i of work stage, wherein i=1,2,3；
S3：The position of the three nonopiate measurement markers measured according to the visual unit and the visual unit exist
Position under complete machine zero-bit coordinate system, calculates position x_ of three nonopiate measurement markers under complete machine zero-bit coordinate system
PZCS_i, y_PZCS_i, and exist with reference to position three nonopiate measurement markers of x_s_i, y_s_i calculating of the work stage
Measurement position x_PSCS_i, y_PSCS_i under worktable coordinate system：
S4：According to measurement position x_PSCS_i, y_ of three nonopiate measurement markers under worktable coordinate system
PSCS_i and nominal position x_PTCS_i, y_PTCS_i under the coarse motion turntable coordinate system calculate the non-of the work stage
Amount of quadrature Non_ortho：
Non_ortho=rpux-rpuy；
Cpux, cpuy represent translational movement of three nonopiate measurement markers relative to work stage；
Rpux, rpuy represent three nonopiate measurement markers relative to work stage in X, the rotation amount of Y-direction；
Mpux represents three nonopiate measurement markers relative to work stage in X, the swell increment of Y-direction；
S5：The changing value that the nonopiate amount of the standard substrate of the nonopiate amount absolute presupposition of obtained work stage will be measured is made
For compensation rate, and compensate into the interferometer measurement unit.
Further, three speculums are set on the coarse motion turntable, at least provided with an institute on each speculum
State nonopiate measurement markers.
Further, the edge of the substrate is measured while the visual unit measures the nonopiate measurement markers
Line, for substrate prealignment.
Further, two in three nonopiate measurement markers are measured in step S2 at the same time using two visual units
The position of a nonopiate measurement markers, moves the work stage afterwards, makes described in remaining one nonopiate measurement markers alignment
One in two visual units.
The present invention also provides a kind of means for correcting for realizing the nonopiate bearing calibration of the work stage, including：
Nonopiate measurement markers, are arranged on the coarse motion turntable for being used for bearing substrate in work stage, the nonopiate survey
Amount is marked at least provided with three, and not point-blank；
Visual unit, for obtaining the position of the nonopiate measurement markers；
Interferometer measurement unit, for measuring the position of the work stage；
Further include correction unit, according to nominal position of the nonopiate measurement markers under coarse motion turntable coordinate system,
The position for the nonopiate measurement markers that the visual unit obtains and the position of the work stage calculate the work stage
Nonopiate amount, and send to the interferometer measurement unit and compensate correction.
Further, the coarse motion turntable is equipped with three speculums, and each speculum is equipped with least one described
Nonopiate measurement markers.
The nonopiate bearing calibration of work stage provided by the invention and means for correcting, the device include：Nonopiate measurement markers,
The coarse motion turntable for being used for bearing substrate in work stage is arranged on, the nonopiate measurement markers are not at least provided with three, and not
Point-blank；Visual unit, for obtaining the position of the nonopiate measurement markers；Interferometer measurement unit, for surveying
Measure the position of the work stage；Correction unit is further included, according to the nonopiate measurement markers under coarse motion turntable coordinate system
Nominal position, the visual unit obtain the nonopiate measurement markers position and the work stage position calculate
The nonopiate amount of the work stage, and send to the interferometer measurement unit and compensate correction.By visual unit to non-
Orthogonal measuring mark position measure, and according to the position of at least three nonopiate measurement markers calculate work stage it is non-just
Friendship amount, realizes the measurement to the nonopiate amount of work stage, will measure the mark of the nonopiate amount absolute presupposition of obtained work stage
The changing value of the nonopiate amount of quasi- substrate is compensated into interferometer model as compensation rate, efficiently solves workpiece mesa
The influence to TP control accuracies is thermally deformed in exposure process, so as to reduce the use cost of material.Moreover, workpiece of the present invention
The nonopiate bearing calibration of platform can measure while the edge line that the visual unit measures the substrate carries out substrate prealignment
Three nonopiate measurement markers so that bearing calibration of the present invention can be carried out when work stage works online, and can not only be solved
Off-line calibration frequency influences the technical problem of correction accuracy far away from mirror change frequency in existing off-line correction method, moreover it is possible to
The defects of realizing work stage on-line correction, avoiding off-line correction from influencing yield.
Brief description of the drawings
Fig. 1 is plane mirror schematic diagram in work stage in the prior art；
Fig. 2 is the structure diagram of means for correcting of the present invention；
Fig. 3 is the schematic layout pattern of speculum of the present invention；
Fig. 4 is speculum of the present invention and nonopiate measurement markers position view.
Shown in Fig. 1：10th, work stage X is to speculum；20th, workpiece platform micro-motion module；30th, interferometer support；
Shown in Fig. 2-4：1st, projection objective；2nd, work stage；3rd, substrate；4th, speculum；5th, visual unit；6th, nonopiate survey
Amount mark；7th, coarse motion turntable；8th, visual unit.
Embodiment
The present invention is described in detail below in conjunction with the accompanying drawings：
As in Figure 2-4, the present invention provides a kind of nonopiate bearing calibration of work stage, comprises the following steps：
S1：Nonopiate measurement markers 6 are set on the coarse motion turntable 7 of bearing substrate 3 in work stage 2, it is described non-
Orthogonal measuring mark 6 is at least provided with three, and not point-blank, to carry out on-line measurement to the face type of work stage 2, this
In embodiment, three speculums 4 are set on the coarse motion turntable 7, three nonopiate measurement markers 6 are corresponded
Ground is arranged on three speculums 4, and visual unit 5 is also correspondingly provided with 3.
S2：Choose three nonopiate measurement markers 6, travelling workpiece platform 2, make visual unit 5 be respectively aligned to three it is described non-
Orthogonal measuring mark 6, obtains the position of three nonopiate measurement markers 6, while passes through the measurement pair of interferometer measurement unit
Position x_s_i, y_s_i of the punctual work stage 2, wherein i=1,2,3；Specifically, the visual unit 5 measures three institutes
The edge line of the substrate 3 is measured while stating nonopiate measurement markers 6, for 3 prealignment of substrate.In addition, further include use
Two visual units 5 measure the position of two nonopiate measurement markers 6 in three nonopiate measurement markers 6 at the same time, it
After move the work stage 2, remaining one nonopiate measurement markers 6 is directed at one in described two visual units 5.
S3：The position of the three nonopiate measurement markers 6 measured according to the visual unit 5 and the visual unit
5 position under complete machine zero-bit coordinate system, calculates position of three nonopiate measurement markers 6 under complete machine zero-bit coordinate system
X_PZCS_i, y_PZCS_i, and calculate three nonopiate measurement marks with reference to position x_s_i, y_s_i of the work stage 2
Remember 6 measurement position x_PSCS_i, y_PSCS_i under 2 coordinate system of work stage：
S4：According to measurement position x_PSCS_i, y_ of three nonopiate measurement markers 6 under worktable coordinate system
PSCS_i and nominal position x_PTCS_i, y_PTCS_i under 7 coordinate system of coarse motion turntable calculate the work stage 2
Nonopiate amount Non_ortho：
Non_ortho=rpux-rpuy；
Cpux, cpuy represent translational movement of three nonopiate measurement markers relative to work stage；
Rpux, rpuy represent three nonopiate measurement markers relative to work stage in X, the rotation amount of Y-direction；
Mpux represents three nonopiate measurement markers relative to work stage in X, the swell increment of Y-direction；
S5：The changing value of the nonopiate amount of the standard substrate of the nonopiate amount absolute presupposition of obtained work stage 2 will be measured
As compensation rate, and compensate into the interferometer measurement unit.Although three nonopiate measurement markers 6 can be rotated with coarse motion
Platform 7 rotates, but nonopiate amount can't change, online three measured if 2 nonopiate amount of work stage is not drifted about
The nonopiate amount of nonopiate measurement markers 6 and the difference of default (i.e. off-line test) standard substrate nonopiate amount are fixation
Value, therefore change that can be by monitoring the value and realizes compensation come the change of 2 nonopiate amount of monitoring workpiece platform.
The present invention also provides a kind of means for correcting for realizing the nonopiate bearing calibration of work stage as described above, including projection thing
Mirror 1, further includes：
Nonopiate measurement markers 6, be arranged in work stage 2 be used for bearing substrate 3 coarse motion turntable 7, it is described it is non-just
Measurement markers 6 are handed at least provided with three, and not point-blank, to carry out on-line measurement, this reality to the face type of work stage 2
Apply in example, the coarse motion turntable 7 is equipped with three speculums 4, and each speculum 4 is equipped with least one nonopiate survey
Measure mark 6.
Visual unit 5, for obtaining the position of the nonopiate measurement markers 6, specifically, the visual unit 5 measures
The edge line of the substrate 3 is measured while three nonopiate measurement markers 6, for 3 prealignment of substrate.In addition, also wrap
Include using two visual units 5 while measure the position of two nonopiate measurement markers 6 in three nonopiate measurement markers 6
Put, move the work stage 2 afterwards, remaining one nonopiate measurement markers 6 is directed at one in described two visual units 5
It is a.
Interferometer measurement unit, for measuring position x_s_i, y_s_i of the work stage 2, wherein i=1,2,3.
The means for correcting further includes correction unit, according to the nonopiate measurement markers 6 under 7 coordinate system of coarse motion turntable
Nominal position, the visual unit 5 obtain the position of the nonopiate measurement markers 6 and the position of the work stage 2
The nonopiate amount of the work stage 2 is calculated, and sends to the interferometer measurement unit and compensates correction.
In conclusion 2 nonopiate bearing calibration of work stage provided by the invention and means for correcting, the device include：It is non-just
Hand over measurement markers 6, be arranged in work stage 2 be used for bearing substrate 3 coarse motion turntable 7, the nonopiate measurement markers 6 to
Three are equipped with less, and not point-blank；Visual unit 5, for obtaining the position of the nonopiate measurement markers 6；Interference
Instrument measuring unit, for measuring the position of the work stage 2；Correction unit is further included, is existed according to the nonopiate measurement markers 6
The position for the nonopiate measurement markers 6 that nominal position under 7 coordinate system of coarse motion turntable, the visual unit 5 obtain with
And the position of the work stage 2 calculates the nonopiate amount of the work stage 2, and send to the interferometer measurement unit and mended
Repay correction.The position of nonopiate measurement markers 6 is measured by visual unit 5, and according at least three nonopiate measurements
The position of mark 6 calculates the nonopiate amount of work stage 2, realizes the measurement to the nonopiate amount of work stage 2, will measure what is obtained
The changing value of the nonopiate amount of the standard substrate of the nonopiate amount absolute presupposition of work stage 2 is compensated to interference as compensation rate
In instrument model, efficiently solve 2 face type of work stage and influence to TP control accuracies is thermally deformed in exposure process, so as to reduce
The use cost of material.
Although embodiments of the present invention are illustrated in specification, these embodiments are intended only as prompting,
It should not limit protection scope of the present invention.It is equal that various omission, substitution, and alteration are carried out without departing from the spirit and scope of the present invention
It should include within the scope of the present invention.
Claims (6)
1. a kind of nonopiate bearing calibration of work stage, it is characterised in that comprise the following steps：
S1：Nonopiate measurement markers, the nonopiate measurement are set on the coarse motion turntable of bearing substrate in work stage
Mark at least provided with three, and not point-blank；
S2：Choose three nonopiate measurement markers, travelling workpiece platform, make visual unit be respectively aligned to three it is described nonopiate
Measurement markers, obtain the position of three nonopiate measurement markers, while measure alignment when institute by interferometer measurement unit
State position x_s_i, y_s_i of work stage, wherein i=1,2,3；
S3：The position of the three nonopiate measurement markers measured according to the visual unit and the visual unit are in complete machine
Position under zero-bit coordinate system, calculates position x_PZCS_ of three nonopiate measurement markers under complete machine zero-bit coordinate system
I, y_PZCS_i, and three nonopiate measurement markers are calculated in workpiece with reference to position x_s_i, y_s_i of the work stage
Measurement position x_PSCS_i, y_PSCS_i under platform coordinate system：
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S4：According to measurement position x_PSCS_i, y_PSCS_i of three nonopiate measurement markers under worktable coordinate system
The nonopiate amount of the work stage is calculated with the nominal position x_PTCS_i, y_PTCS_i under the coarse motion turntable coordinate system
Non_ortho：
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Non_ortho=rpux-rpuy；
Cpux, cpuy represent translational movement of three nonopiate measurement markers relative to work stage；
Rpux, rpuy represent three nonopiate measurement markers relative to work stage in X, the rotation amount of Y-direction；
Mpux represents three nonopiate measurement markers relative to work stage in X, the swell increment of Y-direction；
S5：The changing value of the nonopiate amount of the standard substrate of the nonopiate amount absolute presupposition of the work stage obtained measuring is as benefit
The amount of repaying, and compensate into the interferometer measurement unit.
2. bearing calibration according to claim 1, it is characterised in that three reflections are set on the coarse motion turntable
Mirror, at least provided with the nonopiate measurement markers on each speculum.
3. bearing calibration according to claim 1, it is characterised in that the visual unit measurement nonopiate measurement mark
The edge line of the substrate is measured while note, for substrate prealignment.
4. bearing calibration according to claim 1, it is characterised in that measured at the same time using two visual units in step S2
The position of two nonopiate measurement markers in three nonopiate measurement markers, moves the work stage, makes to be left afterwards
Nonopiate measurement markers be directed at one in described two visual units.
A kind of 5. means for correcting for realizing the nonopiate bearing calibration of work stage described in claim 1, it is characterised in that including：
Nonopiate measurement markers, are arranged on the coarse motion turntable for being used for bearing substrate in work stage, the nonopiate measurement mark
Remember at least provided with three, and not point-blank；
Visual unit, for obtaining the position of the nonopiate measurement markers；
Interferometer measurement unit, for measuring the position of the work stage；
Correction unit is further included, according to nominal position of the nonopiate measurement markers under coarse motion turntable coordinate system, described
The position for the nonopiate measurement markers that visual unit obtains and the position of the work stage calculate the non-of the work stage
Amount of quadrature, and send to the interferometer measurement unit and compensate correction.
6. means for correcting according to claim 5, it is characterised in that the coarse motion turntable is equipped with three speculums,
Each speculum is equipped with least one nonopiate measurement markers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610925970.1A CN107976869B (en) | 2016-10-24 | 2016-10-24 | Workpiece table non-orthogonal correction method and correction device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610925970.1A CN107976869B (en) | 2016-10-24 | 2016-10-24 | Workpiece table non-orthogonal correction method and correction device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107976869A true CN107976869A (en) | 2018-05-01 |
| CN107976869B CN107976869B (en) | 2023-06-30 |
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