CN107949905A - Nozzle unit - Google Patents
Nozzle unit Download PDFInfo
- Publication number
- CN107949905A CN107949905A CN201680050938.1A CN201680050938A CN107949905A CN 107949905 A CN107949905 A CN 107949905A CN 201680050938 A CN201680050938 A CN 201680050938A CN 107949905 A CN107949905 A CN 107949905A
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- Prior art keywords
- nozzle
- gas
- foup7
- nozzle unit
- nitrogen
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The present invention provides a kind of nozzle unit for preventing that air enters when to FOUP filling gas.Therefore, which includes：Nozzle body (71), its have be communicated in for the container (7) of storing storage item gas supply port (72) and be communicated in the gas flow paths (77) of gas supply port (72)；Supply nozzle (78), it is connected to gas flow path (77), for via gas supply port (72) to supply for receptacles gas；And exhaust nozzle (83), it is connected to gas flow path (77), for gas flow path (77) to be exhausted.
Description
Technical field
The present invention relates to a kind of nozzle unit of the accommodating container filling gas for the wafer for being used to convey to storage.
Background technology
In the past, the manufacture of semiconductor was carried out by implementing various treatment process to the wafer for being used as substrate.It is first in recent years
Highly integrated, circuit the miniaturization of part gradually develops, in order not to which there is a situation where particulate, attachment of moisture in crystal column surface
Ask and wafer peripheral is maintained to higher cleannes.Also, in order not to which the shape of the surface textures such as wafer surface oxidation change occurs
Condition, has also carried out making wafer peripheral become non-active gas i.e. blanket of nitrogen or the operation as vacuum state.
In order to suitably maintain the atmosphere of such wafer peripheral, wafer is put into referred to as FOUP (Front-
Opening Unified Pod) the inside of closed storage cabin be managed, nitrogen is filled inside this.Also, in order to
The handing-over of wafer is carried out between the processing unit for being handled wafer and FOUP, and utilizes EFEM (Equipment
Front End Module).The wafer conveying chamber that the inside that EFEM is formed in housing generally closes off, and in its relative wall
A wall there is the loading depot (Load Port) that is played function as the interface portion between FOUP, and in another wall
A part, that is, load lock of face connection processing device.It is defeated that the wafer for being used to convey wafer is equipped with wafer conveying chamber
Device is sent, wafer is carried out using the wafer conveyance device and deposits being connected between the FOUP of loading depot and load lock
Take.Wafer conveying chamber is typically to be sent into clean air all the time from the fan filtering unit for being configured at conveying chamber top to decline
Stream.
Also, in recent years, in the front end technique of wafer, or even it is used in conjunction and makees contained by the clean air of sinking
Oxygen, moisture etc. are likely to make the character of wafer to change.It is therefore desirable to injected as patent document 1 into FOUP non-
Active gases causes wafer peripheral to become the technical application of blanket of nitrogen.
Prior art literature
Patent document
Patent document 1：2011-No. 187539 publications of Japanese Unexamined Patent Publication
The content of the invention
Problems to be solved by the invention
But in the nozzle unit described in patent document 1, it is flow path remaining air still in injection nozzle, micro-
Grain.As a result, there are the following problems：In the FOUP for requiring more low oxygen concentration, low humidity, these remaining air, micro- are mixed into
Grain, and the character for being likely to result in wafer changes.
Therefore, the present invention is to be completed to solve the problems, such as described above, its purpose is to provide one kind to
FOUP prevents the nozzle unit that air enters when filling non-active gas.
The solution used to solve the problem
The nozzle unit of 1st invention includes：
Nozzle body, it has the gas supply port for being communicated in the container for storing storage item and is communicated in the gas
The gas flow path of supply mouth；
Supply nozzle, it is connected to the gas flow path, for via the gas supply port to the supply for receptacles gas
Body；And
Exhaust nozzle, it is connected to the gas flow path, for being exhausted in the gas flow path.
In the nozzle unit, air is discharged using exhaust nozzle.Thus, after container and nozzle body contact, row
Go out the air in the nozzle unit comprising nozzle body, supply nozzle and exhaust nozzle, then from supply nozzle to supply for receptacles
Gas.Thereby, it is possible to prevent the air in nozzle unit to be flowed into the inside of container.In addition, here, air means that receipts can be made
Be contained in wafer oxidation of container etc., as oxygen, moisture, particulate there is a possibility that the changed material of the character of wafer and
Gas containing these materials.Due to preventing the air to be flowed into container, it can prevent from being accommodated in the property of the wafer of container
Shape changes.
In the nozzle unit of the 2nd invention,
The nozzle body has：
Stem portion, it forms the gas supply port；
1st perisporium, it is erected from the upper surface of the stem portion；And
Superjacent air space, it is formed by the upper surface and the 1st perisporium of the stem portion,
The gas flow path is connected via the gas supply port with the superjacent air space.
In the nozzle unit, in exhaust nozzle discharge supply nozzle, gas flow path, superjacent air space and exhaust nozzle
Air.Thus, after container and nozzle body contact, big air-flow is reliably prevented when supply nozzle is to supply for receptacles gas
Enter to container.Character change thereby, it is possible to the wafer for preventing from being accommodated in container.
In the nozzle unit of the 3rd invention,
The supply nozzle and the exhaust nozzle are integrated.
In the nozzle unit, by the way that supply nozzle and exhaust nozzle are wholely set, so that structure becomes simple, can
Cut down manufacture cost.
In the nozzle unit of the 4th invention,
The nozzle unit has the pressure adjustment unit part for being used for adjusting the pressure in the nozzle body,
When being replaced into gas in by the nozzle body, the pressure adjustment unit part is by the pressure in the nozzle body
Control as below predetermined value.
In the nozzle unit, pressure adjustment unit part is by the pressure control in nozzle body for below predetermined value.Thus,
When discharging the air in nozzle body and supplying non-active gas, namely nonactive gas will be replaced into from air in nozzle body
During body, non-active gas can be prevented to be flowed into container.
The nozzle unit of 5th invention includes：
The nozzle body；
Switching mechanism, it is used to close the gas supply port；And
Opening means, it is used to open the gas supply port closed by the switching mechanism.
In the nozzle unit, after container and nozzle body contact, opening means will be opened and closed the gas of mechanism closing
Body supply mouth opens, the air in exhaust nozzle discharge nozzle unit.Thus, the air in exhaust nozzle discharge nozzle unit
Afterwards, supply nozzle is to supply for receptacles non-active gas, therefore the air in nozzle unit can be prevented to be flowed into the interior of container
Portion.
In the nozzle unit of the 6th invention,
The switching mechanism has：Elastomeric closure member, it is located at the superjacent air space and utilizes outer peripheral edge portion closing institute
State the periphery of gas supply port；And fixed part, it is used to the elastomeric closure member being fixed on the stem portion,
The opening means is to make its elastic deformation by pressing the elastomeric closure member to release the non-of the closing
Active gases.
In the nozzle unit, the pressure by making non-active gas reaches more than predetermined value, so that non-active gas
Pressing elastomeric closure member makes its elastic deformation, to release the closing of gas supply port.Thereby, it is possible to be supplied using easy structure
To gas.
The effect of invention
In the 1st invention, air is discharged using exhaust nozzle.Thus, after container and nozzle body contact, discharge bag
Air in nozzle unit containing nozzle body, supply nozzle and exhaust nozzle, then it is non-live from supply nozzle to supply for receptacles
Property gas.Thereby, it is possible to prevent the air in nozzle unit to be flowed into the inside of container.In addition, here, air includes possibility
Wafer oxidation for making to be accommodated in container etc., the changed oxygen of character for making wafer, moisture, particulate etc..Due to preventing the air
Container is flowed into, therefore can prevent from being accommodated in the character change of the wafer of container.
It is big in exhaust nozzle discharge supply nozzle, gas flow path, superjacent air space and exhaust nozzle in the 2nd invention
Gas.Thus, after container and nozzle body contact, reliably prevent air from flowing into when supply nozzle is to supply for receptacles gas
To container.Character change thereby, it is possible to the wafer for preventing from being accommodated in container.
In the 3rd invention, by the way that supply nozzle and exhaust nozzle are wholely set, so that structure becomes simple, Neng Gouxiao
Subtract manufacture cost.
In the 4th invention, pressure adjustment unit part is by the pressure control in nozzle body for below predetermined value.Thus, arranging
Air in delivery nozzle main body and when supplying non-active gas, namely will be replaced into non-active gas from air in nozzle body
When, non-active gas can be prevented to be flowed into container.
In 5th invention, after container and nozzle body contact, opening means supplies the gas for being opened and closed mechanism closing
Mouth is open, the air in exhaust nozzle discharge nozzle unit.Thus, after the air in exhaust nozzle discharge nozzle unit,
Supply nozzle can prevent the air in nozzle unit to be flowed into the inside of container to supply for receptacles non-active gas.
In 6th invention, the pressure by making non-active gas reaches more than predetermined value, so that non-active gas press bullet
Property closure member makes its elastic deformation, to release the closing of gas supply port.It is non-live thereby, it is possible to be supplied using easy structure
Property gas.
Brief description of the drawings
Fig. 1 is the side view of state obtained from representing to have dismantled the side walls of EFEM.
Fig. 2 is the stereogram of the loading depot shown in Fig. 1.
Fig. 3 is to represent FOUP and the side view cutaway drawing of loading depot.
Fig. 4 is enlargedly to represent to form the windows units of EFEM and the major part amplification stereogram in door portion.
Fig. 5 is the enlarged partial isometric view of alignment sensor.
Fig. 6 is the sectional view of the nozzle unit of the 1st embodiment.
Fig. 7 is the sectional view for making the nozzle unit in Fig. 6 be moved towards FOUP.
Fig. 8 is the sectional view for representing the nozzle unit in Fig. 6 being installed on the state of FOUP.
Fig. 9 is the block diagram for the connection status for representing control unit.
Figure 10 is the flow chart for representing to act the gas injection that FOUP is carried out.
Figure 11 is the sectional view of the nozzle unit of the 2nd embodiment.
Figure 12 is the sectional view for making the nozzle unit in Figure 11 be moved towards FOUP.
Figure 13 is to make nozzle unit in Figure 12 towards the further movement of sectional views of FOUP.
Figure 14 is the sectional view for representing the nozzle unit in Figure 12 being installed to the state of FOUP.
Figure 15 is the sectional view of the variation for the nozzle unit for representing the 2nd embodiment.
Figure 16 is the sectional view for representing the nozzle unit of the variation of Figure 15 being installed to the state of FOUP.
Figure 17 is to represent the nozzle unit of the variation of Figure 15 being installed on FOUP and inject the sectional view of the state of gas.
Figure 18 is the sectional view using the nozzle unit of the elastomeric closure member different from Figure 15.
Figure 19 is the sectional view for representing the state that the elastomeric closure member in Figure 18 opens.
Figure 20 is the sectional view of the nozzle unit of the variation for the 2nd embodiment for substituting spring and using balancing gate pit.
Figure 21 is the section view using the nozzle unit of the variation of the 2nd embodiment of the adjuster of opening and closing gas supply port
Figure.
Figure 22 is the section view on the mounting table periphery for the variation for making gas displacement mechanism be fixed without lifting
Figure.
Figure 23 is the sectional view on the mounting table periphery for the variation that boost pressure sensor is used as to alignment sensor.
Embodiment
Hereinafter, embodiments of the present invention are illustrated with reference to the accompanying drawings.
Fig. 1 is to see the side view of inside by removing the wall of the side of EFEM1.As shown in Figure 1, EFEM1 includes：
Wafer conveyance device 2, it is used for the conveying that wafer W is carried out between predetermined delivery position；Housing 3, it is for box and with bag
The mode for enclosing the wafer conveyance device 2 is set；Loading depot 4, it is connected to the outside of the wall of the front-surface side of housing 3；And control
Component 5 processed.Here, in this application by from housing 3 when the direction of side that is connected for loading depot 4 be defined as front, will
The direction of the side opposite with the side connected for loading depot 4 is defined as rear when from housing 3.
The action of wafer conveyance device 2 is controlled by control unit 5, it is empty to the conveying inside housing 3 so as to realize
Between 9 conveyings be accommodated in wafer (storage item) W of the FOUP (container) 7 loaded in loading depot 4 and be once again entrained into FOUP7
The wafer W after various processing is gone.
Loading depot 4 has door portion 51 (with reference to Fig. 2), is connected by this portion 51 and the lid 32 arranged on FOUP7 and one
With movement, so that FOUP7 is opened relative to conveying space 9.It is equipped with multiple mounting portions along the vertical direction in FOUP7, thus, it is possible to
Enough store multiple wafer W.In addition, being generally filled with nitrogen in FOUP7, and the control of control unit 5 can also be utilized by dress
The atmosphere gas carried in the 4 couples of FOUP7 in station carries out nitrogen displacement.
Control unit 5 is configured to the control unit of the upper space arranged on housing 3.In addition, the progress wafer of control unit 5 is defeated
Send the drive control of device 2, nitrogen displacement control, the open and close controlling in door portion 51 and the shell carried out using loading depot 4 to FOUP7
Nitrogen cycle control in body 3 etc..Control unit 5 is made of common microprocessor including CPU, memory and interface etc.,
The required program of processing is prestored in memory, and CPU is successively read and performs required program, set with surrounding hardware
Function expected from being realized for cooperation.In addition, nitrogen cycle control is seen below.
The inner space of housing 3 is by partition member 8 is divided into gas return path 10 and wafer conveyance device 2 is worked
Space, that is, conveying space 9.Conveying space 9 and gas return path 10 are only being extended on conveying space 9 in the width direction
The gas on top sends out mouth 11 and is connected at the gas suction port 12 for the lower part for being extended on conveying space 9 in the width direction
It is logical.Moreover, sending out mouth 11 and gas suction port 12 by gas makes to produce down current in conveying space 9, gas is set to return to road
Ascending air is produced in footpath 10, so that nitrogen is circulated.In addition, in the present embodiment, make as non-active gas
Nitrogen circulation in housing 3, but the gas circulated is not limited to this, and can also use other gases.
The gas supply member 16 for importing nitrogen into housing 3 is connected with the back side upper lateral part of return path 10.Gas
Body supply part 16 can control the stopping of supply and the supply of nitrogen based on the order from control unit 5.Therefore, in nitrogen
In the case that a part flows out to the outside of housing 3, can by gas supply member 16 for give the corresponding nitrogen of discharge and
Blanket of nitrogen in housing 3 is kept constant.In addition, overleaf side lower part is connected with the gas for discharging the nitrogen in housing 3
Discharge member 17.Evacuation component 17 can be acted based on the order from control unit 5, by by lock (not shown)
Door is open and the inside of housing 3 is connected with arranged on exterior nitrogen discharge destination.Moreover, by with utilizing above-mentioned gas
The nitrogen supply that supply part 16 carries out is used together, so as to be replaced into housing 3 in blanket of nitrogen or control housing 3
Pressure.In addition, in the present embodiment, in order to make the gas circulated become nitrogen, gas supply member 16 supplies nitrogen, but
In the case where being circulated other gases, gas supply member 16 supplies the gas circulated.
In addition, mouth 11 is sent out equipped with the wind formed by filter 13b and as the fan 13a of the 1st blower part in gas
Fan filter element 13 (FFU13).Fan filtering unit 13 removes particulate contained in the nitrogen of circulation in housing 3, and
And by blowing into conveying space 9 downward, so that producing down current in conveying space 9.In addition, FFU13 is utilized
It is linked to partition member 8 and horizontally extending supporting member 18 is supported.
Moreover, using the fan 13a and fan 15 of above-mentioned FFU13, the nitrogen in housing 3 passes through in conveying space 9
Decline and rise in gas return path 10 to be circulated.Mouth 11 is sent out due to gas to be open downward, is utilized
FFU13 sends out downward nitrogen.Since gas suction port 12 is open upward, it can not upset and utilize FFU13
The down current of generation and aspirate nitrogen downward with maintaining the original state, thus, it is possible to produce smoothly nitrogen flow.Separately
Outside, it will attach to the particulate on wafer W tops, temporary from the wafer being disposed by producing down current in the conveying space 9
When the releasing gas released remove, and moved by the grade device of wafer conveyance device 2 in conveying space 9 to prevent this
A little releasing gases, particulate swim.
Fig. 2 represents the stereogram of loading depot 4.Hereinafter, the structure of loading depot 4 is illustrated.
Loading depot 4 makes pedestal 21 be erected from the rear vertical for the foot 25 for being provided with castor and setting foot, from the pedestal
21 about 60% or so height and position is equipped with horizontal base 23 towards front.Also, it is equipped with the top of the horizontal base 23
For loading the mounting table 24 of FOUP7.
As showed schematically in Fig. 3, FOUP7 includes main body 31 and lid 32, which, which has, is used to store wafer W
The inner space Sf of (with reference to Fig. 1), which is used for opening and closing should be as the moving mouth of wafer W arranged on the one of main body 31
The opening 31a in face.In the case where FOUP7 is correctly placed in mounting table 24, lid 32 is opposite with pedestal 21.
Back to Fig. 2, the positioning pin 24a for the positioning for being used to carry out FOUP7 is equipped with mounting table 24, and is equipped with and is used for
The lock pawl 24b of the fixation of FOUP7 is carried out relative to mounting table 24.After FOUP7 is properly located in mounting table 24, lock
FOUP7 can be fixed by carrying out lock out action by determining pawl 24b, can oneself by being unlocked action become FOUP7
The separated state of mounting table 24.In addition, mounting table 24 can utilize mounting table drive division (not in the state of FOUP7 has been loaded
Diagram) move along the longitudinal direction.Here, being properly located means that the bottom surface of FOUP7 is self-contained relative to the height of mounting table 24
The upper surface for putting platform 24 is in preset range.
Using the alignment sensor 60 (with reference to Fig. 5) being disposed near positioning pin 24a detect FOUP7 whether be positioned at it is suitable
When position.Alignment sensor 60 includes：Sensor 61, it is formed by leaf spring；Hood 62, it is provided projectingly downward
In sensor 61；Photoelectric sensor 63, it is transmission-type and is configured at the lower section of hood 62；And sensor wire 64, its
It is connected to photoelectric sensor 63.Preferably, which is respectively arranged near each positioning pin 24a.
When FOUP7 is placed in mounting table 24, the locating slot (not shown) of FOUP7 is inserted into positioning pin 24a, FOUP7's
Bottom is contacted with sensor 61.Then, decline hood 62 under the weight effect of FOUP7 and electric transducer 63 is hidden
Light, therefore can identify (detection) FOUP7.Testing result is sent to controller using sensor wire 64.In this way, in shading
FOUP7, which can be detected, during 62 pairs of progress shadings of photoelectric sensors 63 of cover is properly located in mounting table 24.Specifically, in order to examine
Survey FOUP7 whether be the state being properly located, be designed as FOUP7 be in be properly located state when hood 62 to light
Electric transducer 63 carries out shading.In addition it is also possible to it is the shading amount for comparing the hood 62 that photoelectric sensor 63 is detected
With predetermined threshold value, and it is detected.
In addition, for the nozzle unit 70 of supply nitrogen into FOUP7 and the 2nd row for discharging nitrogen out of FOUP7
Gas jets 104 are respectively arranged at the two of mounting table 24.70 and the 2nd exhaust nozzle 104 of nozzle unit is usually located at than in appropriate
The bottom surface position on the lower of the FOUP7 of the state of ground positioning, when in use, 70 and the 2nd exhaust nozzle 104 of nozzle unit to
Top is stretched out and is linked to air supply valve 33 possessed by FOUP7 (with reference to Fig. 3) and gas exhaust valve 34 respectively.
When in use, the upper end of nozzle unit 70 is contacted with the air supply valve 33 of FOUP7, equally, the 2nd exhaust nozzle
104 upper end is contacted with the gas exhaust valve 34 of FOUP7.Thus, it is possible to via air supply valve 33 from nozzle unit 70 to
The inner space Sf supply gases such as drying nitrogen of FOUP7, and in discharging from the 2nd exhaust nozzle 104 via gas exhaust valve 34
The gas of portion space S f.In addition it is also possible to by making nitrogen quantity delivered be more than nitrogen purge amount, and into enforcement inner space Sf's
Positive pressure setting of the pressure higher than the pressure of exterior, housing 3 conveying space 9.
Here, usually so-called packing ring is known as in the air supply valve 33 for being placed in the FOUP7 of loading depot 4
(grommet) in the case of the elastic component of type, the upper end of corresponding nozzle unit 70 is by the firm of ratio of rigidity air supply valve 33
Spend high material for example as metal, plastics or the elastic component identical with grommet-type is formed.In the present embodiment,
The upper end of nozzle unit 70 is made of plastics.
Pedestal 21 for forming loading depot 4 forms a part for the face wall for making conveying space 9 isolate with exterior space.
As shown in Fig. 2, pedestal 21 includes：Pillar 21a, 21a, it is erected in both sides；Base body 21b, it is by these pillars 21a, 21a
Supporting；And windows units 40, it is installed on the window portion 21c opened in the form of a substantially rectangular in Base body 21b.Here, this Shen
Please be described substantially rectangular refer to smoothly connect using the rectangle with four sides as basic configuration and using circular arc by four angles
The shape connect.
Windows units 40 are arranged on the position opposite (with reference to Fig. 3) with the lid 32 of above-mentioned FOUP7.Due to windows units 40
It is equipped with substantially rectangular opening portion 42 (with reference to Fig. 4) as being described in detail as after, therefore can will via the opening portion 42
The conveying space 9 of housing 3 opens.
Windows units 40 include：Window frame portion 41；1O shape sealing rings 43,2O shape sealing rings 44, the 1O shape sealing rings
43rd, 2O shape sealing rings 44 as elastic component and are installed on the window frame portion 41；And clamping unit 45, it is as making
FOUP7 pulls in component across what 1O shape sealing rings 43 were sealed at window frame portion 41.
Window frame portion 41 is in frame shape of the inner side formed with substantially rectangular opening portion 42.Since window frame portion 41 is used as window
The inscape of unit 40 and the part for forming above-mentioned pedestal 21 (with reference to Fig. 2), therefore opening portion 42 can be described as shell
The part that the face wall of body 3 opens.Front surface in window frame portion 41 is equipped in a manner of the adjacent peripheral edges around opening portion 42
1O shape sealing rings 43.It is close that rear surface in window frame portion 41 is equipped with 2O shapes in a manner of the adjacent peripheral edges around opening portion 42
Seal 44.
Opening portion 42 is slightly more than the periphery of the lid 32 of FOUP7, and lid 32 can be moved by 42 ground of opening portion
It is dynamic.In addition, in the state of FOUP7 is placed in mounting table 24, the front surface conduct formed around lid 32 of main body 31
Bearing surface 31b is connected to the front surface in window frame portion 41 across 1O shape sealing rings 43.Thus, windows units are installed in FOUP7
When 40,1O shape sealing rings 43 will seal between the periphery and FOUP7 of opening portion 42 (pedestal 21).
In addition, above-mentioned door portion 51 is connected to the rear surface in window frame portion 41 across 2O shape sealing rings 44.Thus, 2O shapes
Sealing ring 44 will seal between the periphery of opening portion 42 and door portion 51.
Clamping unit 45 is arranged on 4 positions of total of separate configuration in the up-down direction in the both sides in window frame portion 41.Respectively
Clamping unit 45 generally includes snap-latch piece 46 and the cylinder 47 for being acted the snap-latch piece 46, each clamping unit 45
In the state of FOUP7 is installed to windows units 40, FOUP7 is pushed to 21 side of pedestal.
Moreover, snap-latch piece 46 forwards protrude in the case of, its top upward to, snap-latch piece 46 become by
In the case of the state that rear pulls in, its top becomes the direction of the FOUP7 towards inner side.Utilize clamp operation, snap-latch piece 46
Can be by making its top engage towards inner side with the flange part highlighted from FOUP7 to side direction.
In addition, loading depot 4 has the switching mechanism 50 for being used for being opened and closed windows units 40, which is configured to
FOUP7 is installed.
As shown in figure 3, switching mechanism 50 includes：Door portion 51, it is used to be opened and closed opening portion 42；Scaffold 52, it is used for
Support this portion 51；Moveable block 54, it supports the scaffold 52 for can be along the longitudinal direction by slidably supported component 53
It is mobile；And sliding rail 55, it supports the moveable block 54 as that can be moved along the vertical direction relative to Base body 21b.
Also, all directions be designed with being used in each direction make a portion 51 mobile along the longitudinal direction and along the vertical direction
Mobile driver (not shown), by assigning the driving instruction from control unit Cp to these drivers, so as to make door
Moved along the longitudinal direction with above-below direction in portion 51.In this way, loading depot 4 by by control unit Cp to each portion assign driving instruction come into
Action is made.
Door portion 51 includes：Adsorption section 56 (with reference to Fig. 4), it is used for the lid 32 for adsorbing FOUP7；And connecting member 57,
It is used to carry out the locking operation of the lid 32 for being opened and closed FOUP7, keeps lid 32.Door portion 51 carry out lid 32 fixation and
Fixed releasing, can dismantle lid 32 from FOUP7 and install the lid 32.Using connecting member 57, by carrying out lid
32 unlocking motion, so as to be set to that the state of lid 32 can be opened, and be set to lid 32 being linked to a portion 51 and
Integrated state.In addition, in contrast, the link between lid 32 and door portion 51 can be also released, and lid 32 is pacified
Closed state is set to loaded on main body 31.
Hereinafter, with reference to the accompanying drawings of the nozzle unit 70 of the present invention.
The 1st embodiment ＞ of ＜
As shown in fig. 6, the gas injection apparatus 70 of the 1st embodiment includes：Nozzle body 71, its have be used for
FOUP7 supplies the gas supply port 72 of non-active gas；And driving part 96, it is used to move up and down nozzle body 71.
Nozzle body 71 has：Stem portion 73, it is used to form gas supply port 72；1st perisporium 74, it is from stem portion 73
The outer peripheral edge of upper surface erect upward；And the 2nd perisporium 75, it hangs down downwards from the outer peripheral edge of the lower face of stem portion 73
Under.
Stem portion 73 is the axially extending cylindrical shape along nozzle body 71.Stem portion 73 includes：Gas flow path 77,
It is communicated in gas supply port 72；And circular engaging portion 86, the outer circumferential surface of its from stem portion 73 are radially oriented foreign side and dash forward
Go out.
Gas flow path 77 is linear in the inside of stem portion 73 along the horizontal direction orthogonal with the axial direction of nozzle body 71
Shape extends, and is communicated in gas supply port 72 in central portion.One opening of gas flow path 77 is connected with supply nozzle 78, and
Form supply line 79.Supply nozzle 78 is connected to nitrogen supply source (not shown) via supply valve 80 (with reference to Fig. 3), to
FOUP7 supplies nitrogen.Another opening of gas flow path 77 is connected to the 1st exhaust nozzle 81, and forms exhaust flow path 82.1st
Exhaust nozzle 81 is connected to vacuum pump (not shown) via air bleeding valve 83, empty for flow of exhaust road 77 and top described later
Between 87 air.
Formed with the superjacent air space 87 than stem portion 73 by the top between the 1st perisporium 74 and the upper surface of stem portion 73.
The 1st perisporium 74 top ends formed with the highlighted wall 88 protruded towards FOUP7.
Formed with the underlying space 89 than stem portion 73 on the lower between the 2nd perisporium 75 and the lower face of stem portion 73.
The lower end of 2nd perisporium 75 is supported on the base 90 fixed in mounting table 24.
In addition, it is equipped with contact-detection sensor (not shown) in said nozzle main body 71 and is connected to the pressure of supply valve 80
Adjust component, that is, flow controller 76 (with reference to Fig. 3).
Contact-detection sensor is used to detect whether FOUP7 contacts with nozzle unit 70.The detection both can be according to cylinder
101 path increment carries out, or can also be detected indirectly according to the pressure of cylinder 101.
Flow controller 76, so as to control the flow of supplied nitrogen, adjusts by adjusting the aperture of supply nozzle 80
Pressure in nozzle unit 70.Specifically, when the air discharged in nozzle unit 70 supplies nitrogen, by nozzle unit 70
Interior pressure control is below predetermined value.Here, gas flow path 77, superjacent air space 87, supply nozzle are included in nozzle unit 70
The inside of 78 and the 1st exhaust nozzle 81.
Driving part 96 have discoideus supporting member (supporting part) 97 and from the upper surface of supporting member 97 upward
The circular wall 98 erected.Supporting member 97 wall 98 inner side formed with penetrating through supporting member in a thickness direction
97 the 99, the 2nd perisporium 75 of through hole is through through hole 99.
The lower end of cylinder 101 of the radial outside of supporting member 97 with being arranged in mounting table 24 is connected.Thus, gas is passed through
The lifting driving supporting member 97 of cylinder 101, so as to be driven in a manner of lifting nozzle body 71 to it.
In addition, as shown in figure 9, the input side of control unit Ct and the positioning for detecting the situation that FOUP7 is properly located
Sensor 60 and the contact-detection sensor of the situation contacted for detecting FOUP7 with nozzle body 71 are connected, control unit Ct
Outlet side be connected with supply valve 80, air bleeding valve 83 and cylinder 101.Control unit Ct is arranged at EFEM1, is built-in with various deposit
The controller of reservoir, operation input for receiving user.
Hereinafter, the action example in the case of illustrating the nozzle unit 70 using the 1st embodiment using Fig. 6~Figure 10.Separately
Outside, in an initial condition, supply valve 80 and air bleeding valve 83 are closed.
As shown in Figure 10, in step sl, alignment sensor 60 detects FOUP7 and has been appropriately positioned in mounting table 24, into
Enter step S2.
In step s 2, after FOUP7 navigates to mounting table 24, cylinder 101 makes nozzle unit by supporting member 97
70 rise (with reference to Fig. 7) towards FOUP7.At this time, the lower end of the 2nd perisporium 75 is separated from pedestal 90.
In step s3, whether contacted with the highlighted wall 88 of nozzle body 71 using contact-detection sensor detection FOUP7
.In addition, in the case of without using contact-detection sensor, with the state for being properly located in mounting table 24
On the basis of the bottom surface of FOUP7, the lifting position of nozzle body 71 is preset.Thereby, it is possible to by detecting cylinder 101
Path increment, the pressure of cylinder 101 detect contacts of the FOUP7 with the highlighted wall 88 of nozzle body 71 indirectly.
In step s 4, air bleeding valve 83 is opened, is vented from gas flow path 77, superjacent air space 87, supply nozzle 78 and the 1st
The inside discharge air of nozzle 81.At the end of exhaust, air bleeding valve 83 is closed.But it's not limited to that or,
When 1st exhaust nozzle 81 discharges the air in nozzle unit 70, while spray of the supply nozzle 78 to including comprising superjacent air space 87
Mouth unit 70 supplies nitrogen and air into line replacement.In addition, when supplying nitrogen from the upward side space 87 of supply nozzle 78, flow
Controller 76 is by the pressure control in nozzle unit 70 for below predetermined value.In addition, predetermined value mentioned here means to be arranged on
The pressure of open and close valve (not shown) nonopen degree as the check-valves of gas supply port 72.Shape of the open and close valve in closing
Sealing gas supply mouth 72 under state, prevents the gas in FOUP7 from being flowed out to outside FOUP7, and prevent air outside FOUP7 to
Flowed into FOUP7.But the open and close valve can be opened by bearing predetermined pressure, make nitrogen via gas supply port 72
Into FOUP, 7 flow into.
Afterwards, in step s 5, supply valve 80 is opened, nitrogen is from supply nozzle 78 in order in supply line 79, gas
Flow in supply mouth 72 and superjacent air space 87 and be fed into FOUP7.Thus, using nitrogen to being filled in FOUP7, into
The displacement of row nitrogen.But during the replacement completion, close supply valve 80.
In step s 6, when loading depot 4 receives when ceasing and desisting order of nitrogen, closing supply valve 80, stops from nozzle unit
70 supply nitrogen.Afterwards, in the step s 7, supporting member 97 is made to move downwards by cylinder 101, so that nozzle unit 70
Move downwards and opened (with reference to Fig. 7) from FOUP7 points.Then, when the lower end of the 2nd perisporium 75 is connected to pedestal 90, nozzle list
The decline of member 70 terminates (with reference to Fig. 6).
[feature of the nozzle unit of present embodiment]
The nozzle unit 70 of present embodiment has following feature.
In the nozzle unit 70 of the 1st embodiment, air is discharged using exhaust nozzle 83.Thus, in FOUP7 and nozzle
Main body 71 contact after, by comprising nozzle body 71,78 and the 1st exhaust nozzle 81 of supply nozzle nozzle unit 70 in it is big
Gas is discharged, and then supply nozzle 78 supplies nitrogen to FOUP7.Thereby, it is possible to prevent the air in nozzle unit 70 to FOUP7's
Inside flows into.Due to preventing the air from being flowed into FOUP7, it can prevent from being accommodated in the character change of the wafer of FOUP7.
In the nozzle unit 70 of the 1st embodiment, the 1st exhaust nozzle 81 discharge supply nozzle 80, gas flow path 77, on
Air in 87 and the 1st exhaust nozzle 81 of side space.Thus, reliably prevent after FOUP7 is contacted with nozzle body 71
When supply nozzle 78 supplies nitrogen to FOUP7, air is flowed into FOUP7.Thereby, it is possible to prevent from being accommodated in the wafer of FOUP7
Character changes.
In the nozzle unit 70 of the 1st embodiment, the pressure control in nozzle body 71 is pre- by flow controller 76
Below definite value.Thus, it is interior from air when the air discharged in nozzle body 71 supplies nitrogen, namely by nozzle body 71
When being replaced into nitrogen, it can prevent nitrogen from being flowed into FOUP7.
The 2nd embodiment ＞ of ＜
Hereinafter, the nozzle unit 70 of the 2nd embodiment is illustrated.In addition, pair key element identical with the 1st embodiment mark phase
Reference numeral together simultaneously omits the description.
As shown in figure 11, nozzle unit 70 includes：Nozzle body 71, it has the gas being used for FOUP7 supply nitrogen
Supply mouth 72；Switching mechanism 92, it is used for sealing gas supply mouth 72；And opening means 96, it is used for by switching mechanism
The gas supply port 72 of 92 sealings opens.
Stem portion 73 includes：Gas flow path 77, it is communicated in gas supply port 72；1st sealing 85, it is supplied arranged on gas
Upper edge part to mouth 72；And circular engaging portion 86, the outer circumferential surface of its from stem portion 73 are radially oriented foreign side's protrusion.
Switching mechanism 92 is section tee shape, its lower surface central portion with discoideus cap 93 and from cap 93
The extension 94 of the cylindrical shape extended downwards.The space 87 above of cap 93, the outer peripheral edge portion of its lower surface and the 1st close
Envelope portion 85 abuts against and the periphery of sealing gas supply mouth 72.Extension 94 penetrates through stem portion 73 from cap 93 and extends to lower section
Space 89.The 2nd sealing 95 using the lower end for being disposed in stem portion 73 will seal between extension 94 and stem portion 73.
Opening means 96 is connected to the lower end of extension 94, and extension 94 is pushed upward and make switching mechanism 92 to
Move top.Opening means 96 has the upper surface of discoideus supporting member (supporting part) 97 and self-supporting component 97 upward
The circular wall 98 erected.In the inner side of the wall 98 of supporting member 97 supporting member 97 is penetrated through formed with through-thickness
Through hole 99.By the 2nd perisporium 75 through through hole 99, so that by opening means 96 so as to being transported relative to stem portion about 73
Dynamic mode is installed on underlying space 89.In addition, the opening means 96 of the 2nd embodiment is the drive division with the 1st embodiment
The identical key element of part 96, the title of component is changed according to the difference of the function of each embodiment.
The radial outside of supporting member 97 is connected to the lower end of the cylinder 101 arranged in mounting table 24.Thus, cylinder is passed through
101 lifting driving supporting members 97, so as to be driven in a manner of lifting nozzle body 71 by spring 102 (with reference to figure
12nd, Figure 13).
Force application component i.e. spring 102 is equipped between stem portion 73 and supporting member 97.Opening means 96 overcomes spring
102 elastic force pushes switching mechanism 92 upward.In addition, opening means 96 and switching mechanism 92 are formed as one.
[feature of the nozzle unit of present embodiment]
The nozzle unit 70 of present embodiment has following feature.
, can will be by being opened and closed after being vented to gas flow path 77 in the nozzle unit 70 of the 2nd embodiment
The gas supply port 72 that mechanism 82 seals opens (with reference to Figure 14).Thus, prevent air in gas flow path 77 to receiving nitrogen
The inside of the FOUP7 of supply flows into, so as to prevent from being accommodated in the character of the wafer of FOUP7 to change.Further, since opening portion
Part 96 opens the gas supply port 72 sealed by switching mechanism 92, therefore can readily supply nitrogen from gas supply port 72
Gas.
In the nozzle unit 70 of the 2nd embodiment, switching mechanism can just be made by being only moved upward opening means 96
92 are also moved upward, and release the sealing that cap 93 carries out gas supply port 72.It is thus, it is possible to easy from gas supply port 72
Ground supplies nitrogen.
In the nozzle unit 70 of the 2nd embodiment, due to making opening means 96 relative to nozzle body using spring 102
71 are exerted a force downwards, therefore the cap 93 for being connected to the switching mechanism 92 of opening means 96 can reliably sealing gas supply
Mouth 72.Even if in addition, be moved upward opening means 96, since spring 102 exerts a force stem portion 73 towards cap 93,
Also the sealing that cap 93 carries out gas supply port 72 can be securely maintained.
In the nozzle unit 70 of the 2nd embodiment, the upper end of nozzle body 71 is connected to FOUP7 and supplied from gas
Before supplying nitrogen to mouth 72, the air in 81 flow of exhaust road 77 of the 1st exhaust nozzle can be utilized.Thus, it is possible to prevent
Air when supplying nitrogen in gas flow path 77 is flowed into inside the FOUP7 for receiving nitrogen supply.
In the nozzle unit 70 of the 2nd embodiment, using the air in 81 flow of exhaust road 77 of the 1st exhaust nozzle,
Nozzle body 71 upper-end contact to after FOUP7, open gas supply port 72 and start to inject gas to FOUP7.Thus,
The air when starting to inject nitrogen to FOUP7 in gas flow path 77 can be prevented to be flowed into the inside of FOUP7.Thereby, it is possible to
Prevent from being accommodated in the character of the wafer of FOUP7 to change.Here, it is preferable that the upper-end contact in nozzle body 71 arrives
After FOUP7, by open gas supply port 72 while to being exhausted in nozzle while making opening means 96 upward
Move to discharge the air in superjacent air space 87.Moreover it is preferred that after the air in above-mentioned superjacent air space has been discharged
Carry out the nitrogen injection to FOUP7.So long as doing, it becomes possible to prevent the air in superjacent air space from entering in FOUP7.
In the nozzle unit 70 of the 2nd embodiment, after the nitrogen injection to FOUP7 terminates, switching mechanism 92 is close
Seal gas supply port 72.Then, nozzle body 71 is separated with FOUP7.Thus, it is possible to prevent the nitrogen after nitrogen injection terminates
Gas is leaked out from gas supply port 72.In addition, can also be after the nitrogen injection to FOUP7 terminates, by nozzle body 71
The barotropic state below predetermined value is maintained, in this condition, after nozzle body 71 has been separated with FOUP7 or is being divided
From while using switching mechanism 92 close (sealing) gas supply port.In addition, predetermined value mentioned here means to be arranged on gas
The pressure of open and close valve (not shown) nonopen degree as the check-valves of body supply mouth 72.
More than, embodiments of the present invention are illustrated with reference to the accompanying drawings, but specific structure is considered as being not limited to this
A little embodiments.The scope of the present invention simultaneously is not only to be indicated using the explanation of above-mentioned embodiment, also will using right
Book is sought to represent, is further included and being had altered in the meaning and scope of claims equalization.
In the 2nd embodiment, by moving up and down switching mechanism 92 sealing that carries out gas supply port 72 and close
The releasing of envelope.But it's not limited to that, can also use as shown in figure 15 with elastomeric closure member 111 and fixed part 112
Switching mechanism 110, the elastomeric closure member 111 space 87 above, the elastomeric closure member 111 utilize the periphery of lower surface
The periphery of edge sealing gas supply mouth 72, the fixed part 112 are used to elastomeric closure member 111 being fixed on stem portion 73.Separately
Outside, in following variation, pair key element identical with the embodiment marks identical reference numeral and omission in figure
Explanation.
In the switching mechanism 110, cylinder (not shown) makes stem portion 73 be moved upward (with reference to Figure 16), makes highlighted wall
88 contact with the air supply valve 33 of FOUP7.In this condition, when making nitrogen, from supply nozzle 78, space 87 is flowed upward
When, make 111 elastic deformation of elastomeric closure member under the action of the pressure of nitrogen as shown in figure 17 and release gas supply port 72
Sealing.In this way, by making the pressure of nitrogen reach more than predetermined value, so that nitrogen pressing elastomeric closure member 111 makes it
Elastic deformation, releases the sealing of gas supply port 72.Predetermined value said here means to become the elasticity of elastomeric closure member 111
Shape can simultaneously release the pressure value of sealing of the check-valves to gas supply port 72.Thereby, it is possible to utilize easy structure from supply stream
Road 79 supplies nitrogen via superjacent air space 87 to FOUP7.In addition, in this case, exhaust stream as the above embodiment
Road 82 is not required, and is made supply nozzle 78 integrated with the 1st exhaust nozzle 81 and is used in conjunction with.Such as make nozzle body 71
Stop the sealing that nitrogen is supplied and gas supply port 72 is carried out using elastomeric closure member 111 before being opened with FOUP7 points.Thus,
Even in nozzle body 71 from after opening FOUP7 points, substantially also it can prevent air from remaining in supply line 79.The opening and closing
Mechanism 110 plays the function as check-valves, can use known check-valves.
As another variation of switching mechanism 110, can also use as shown in figure 18 has elastomeric closure member 113
With the switching mechanism 110 of fixed part 114, which is abutted closely sealed by gas supply port by its central portion
72 sealings, which is formed at the radial outside of the elastomeric closure member 113, for elastomeric closure member 113 to be fixed
In stem portion 73.
In the switching mechanism 110, when making nitrogen from the flowing of space 87 upward of supply nozzle 78, such as Figure 19 institutes
Show, 113 elastic deformation of elastomeric closure member is made under the action of the pressure of nitrogen and is bent outward, release gas supply port 72
Sealing.Thereby, it is possible to supply nitrogen to FOUP7 using simple structure.
In the 2nd embodiment, exerted a force upward to nozzle body 71 relative to supporting member 97 by spring 102, from
And maintain sealing of the switching mechanism 92 to gas supply port 72., can also be by the way that balancing gate pit 115 be used but it's not limited to that
Make force application component and substitute spring 102 to carry out the releasing of the sealing of gas supply port 72 or sealing.As shown in figure 20, pressure
Room 115 is formed between integrated with nozzle body 71 supporting member 97 and stem portion 73.In addition, balancing gate pit 115 is connected to
Pressure for supplying or discharging gas adjusts nozzle 116.
Pressure adjusts nozzle 116 by improving pressure to 115 supply gas of balancing gate pit, presses switching mechanism 92 downwards
Bottom 117, exert a force downwards to switching mechanism 92.Thus, 93 sealing gas supply mouth 72 of cap.On the other hand, pass through
Pressure adjusts nozzle 116 discharges gas from balancing gate pit 115 reduces pressure, bottom 117 upward lifted using negative pressure and
It is moved upward switching mechanism 92.Thus, sealing of the cap 93 to gas supply port 72 is released.
In the 2nd embodiment, the air supply valve 33 as FOUP7 employs the elastic component referred to as grommet-type.
But as air supply valve 33, can also use rigidity as referred to as so-called lip type, such as metal, plastics compared with
High raw material.In this case, the upper end of corresponding gas injection apparatus 70 37 (reference of elastic component as grommet-type
Figure 20) form.In this way, the upper end of air supply valve 33 and nozzle unit 70 is set as to the pass of elastic component and rigid member
System or be all each other elastic component relation.Thus, gas injection apparatus 70 upper-end contact to air supply valve 33
When, the projection 33a and elastic component 37 of air supply valve 33 are contacted, and can have seal.Thus, it is possible to prevent from being supplied to
Nitrogen in FOUP7 is to External leakage.
In the 2nd embodiment, opening means 96 and switching mechanism 92 are integrally formed.But in order to make assembling easy,
Respective independence can also be set to, such as is set to external screw thread of the limitation switching mechanism 92 relative to the relative position of opening means 96
133 and internal thread 134 relation and be configured to assemble and disassemble.Thus, assembling and the replacement of valve system 92 become easy.
In addition it is also possible to by adjusting the pressure of the nitrogen in gas flow path 77 come carry out the sealing of gas supply port 72 or
The releasing of person's sealing.Specifically, as shown in figure 21, the 1st be connected in parallel in the link of supply nozzle 78 with flow controller 120
121 and the 2nd adjuster 122 of adjuster.Thus, the 1st adjuster 121 of high pressure nitrogen is sprayed by driving makes the nitrogen stream of high pressure
To supply nozzle 78.Using the pressure of the nitrogen, switching mechanism 92 is set to be moved upward and release cap 93 to gas supply port
72 sealing.At this time, air bleeding valve 83 is closed.On the other hand, the 2nd adjuster 122 for low-pressure nitrogen being sprayed by driving makes low pressure
Nitrogen flow to supply nozzle 78.Using the low-pressure nitrogen, switching mechanism 92 is set to move downwards and utilize 93 blanket gas of cap
Body supply mouth 72.
In the 1st embodiment and the 2nd embodiment, lift nozzle unit 70 using cylinder 101.It is but and unlimited
Due to this, the structure for lifting nozzle unit 70 can also be used.As shown in figure 22, gas displacement mechanism 125 has filling
The gas supply device of the illustration omitted of non-active gas, for be configured in the FOUP7 of mounting table 24 supply it is nonactive
Gas.Gas supply port 126 and gas exhaust port 127 are equipped with gas displacement mechanism 125.Gas supply port 126 is connected to load
Put being taken into for platform 24 and be connected to the taking-up purging port 129 of mounting table 24 with purging port 128, gas discharge outlet 127.By
This, gas supply port 126 and gas exhaust port 127 become the structure fixed relative to mounting table 24, do not lifted.
In the 1st embodiment and the 2nd embodiment, using alignment sensor 60 come detect FOUP7 whether be fixed on it is suitable
When position.But it's not limited to that, as shown in figure 23 or by detecting the protuberance arranged on the bottom of FOUP7
130 whether pressed the boost pressure sensor 131 arranged on the top of mounting table 24 press section 131a it is whether appropriate to detect FOUP7
Ground positions.
In said embodiment, non-active gas are by taking nitrogen as an example, but it's not limited to that, can use drying
The desired gas such as gas, argon gas.
In said embodiment, alignment sensor be by taking optical sensor, pressure sensor as an example, it is but and unlimited
Due to this, mechanical sensor, electrodynamic transducers etc. can be used.
In said embodiment, it is to be applied to loading depot, but it's not limited to that.Such as can also be applied to be used for
Purging station (blow device) device of non-active gas is supplied in FOUP, there are multiple mounting tables and for taking care of multiple FOUP's
FOUP storage cabinets or the buffer unit for placing FOUP temporarily.
Description of reference numerals
70th, nozzle unit；71st, nozzle body；72nd, gas supply port；73rd, stem portion；76th, flow controller (pressure tune
Integeral part)；77th, gas flow path；78th, supply nozzle；81st, the 1st exhaust nozzle；87th, superjacent air space；89th, underlying space；92nd, open
Close mechanism；93rd, cap；94th, extension；96th, opening means；97th, supporting member (supporting part)；102nd, spring (force application component)；
111st, elastomeric closure member；112nd, fixed part.
Claims (6)
- A kind of 1. nozzle unit, it is characterised in thatThe nozzle unit includes：Nozzle body, it has the gas supply port for being communicated in the container for storing storage item and is communicated in the gas supply The gas flow path of mouth；Supply nozzle, it is connected to the gas flow path, for via the gas supply port to the supply for receptacles gas；With AndExhaust nozzle, it is connected to the gas flow path, for being exhausted in the gas flow path.
- 2. nozzle unit according to claim 1, it is characterised in thatThe nozzle body has：Stem portion, it forms the gas supply port；1st perisporium, it is erected from the upper surface of the stem portion；AndSuperjacent air space, it is formed by the upper surface and the 1st perisporium of the stem portion,The gas flow path is connected via the gas supply port with the superjacent air space.
- 3. nozzle unit according to claim 1 or 2, it is characterised in thatThe supply nozzle and the exhaust nozzle are integrated.
- 4. according to nozzle unit according to any one of claims 1 to 3, it is characterised in thatThe nozzle unit has the pressure adjustment unit part for being used for adjusting the pressure in the nozzle body,When being replaced into gas in by the nozzle body, the pressure adjustment unit part controls the pressure in the nozzle body Below predetermined value.
- 5. nozzle unit according to any one of claims 1 to 4, it is characterised in thatThe nozzle unit includes：The nozzle body；Switching mechanism, it is used to close the gas supply port；AndOpening means, it is used to open the gas supply port closed by the switching mechanism.
- 6. according to the nozzle unit described in the claim 5 for quoting claim 2, it is characterised in thatThe switching mechanism has：Elastomeric closure member, it is located at the superjacent air space and closes the gas using outer peripheral edge portion The periphery of body supply mouth；And fixed part, it is used to the elastomeric closure member being fixed on the stem portion,The opening means is to make its elastic deformation by pressing the elastomeric closure member to release the nonactive of the closing Gas.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015175193A JP6623627B2 (en) | 2015-09-04 | 2015-09-04 | Nozzle unit |
| JP2015-175193 | 2015-09-04 | ||
| PCT/JP2016/074227 WO2017038501A1 (en) | 2015-09-04 | 2016-08-19 | Nozzle unit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107949905A true CN107949905A (en) | 2018-04-20 |
| CN107949905B CN107949905B (en) | 2022-05-31 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201680050938.1A Active CN107949905B (en) | 2015-09-04 | 2016-08-19 | Nozzle unit |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6623627B2 (en) |
| KR (1) | KR102577608B1 (en) |
| CN (1) | CN107949905B (en) |
| TW (1) | TWI715624B (en) |
| WO (1) | WO2017038501A1 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6794898B2 (en) | 2017-03-29 | 2020-12-02 | 株式会社ダイフク | Storage rack |
| JP7251091B2 (en) * | 2018-10-12 | 2023-04-04 | Tdk株式会社 | BOTTOM GAS PURGE DEVICE, LOAD PORT DEVICE AND BOTTOM GAS PURGE METHOD |
| JP7363066B2 (en) * | 2019-03-18 | 2023-10-18 | Tdk株式会社 | Load port device and container placement method |
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| JPH09139410A (en) * | 1995-11-13 | 1997-05-27 | Shinko Electric Co Ltd | Mechanical interface device |
| JP2005150706A (en) * | 2003-11-12 | 2005-06-09 | Samsung Electronics Co Ltd | Substrate transfer container, device, and method |
| JP2006005193A (en) * | 2004-06-18 | 2006-01-05 | Hirata Corp | System for purging gas in vessel and gas purging method |
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| JPH0748004A (en) * | 1993-08-04 | 1995-02-21 | Dainippon Screen Mfg Co Ltd | Substrate holding container and substrate processing device using said container |
| KR19990040591A (en) * | 1997-11-19 | 1999-06-05 | 구자홍 | Backflow check valve of dishwasher |
| JP5155848B2 (en) * | 2008-12-18 | 2013-03-06 | 日本ケンブリッジフィルター株式会社 | N2 purge device for FOUP |
| JP2011187539A (en) | 2010-03-05 | 2011-09-22 | Sinfonia Technology Co Ltd | Gas charging apparatus, gas discharging apparatus, gas charging method, and gas discharging method |
| JP5887719B2 (en) * | 2011-05-31 | 2016-03-16 | シンフォニアテクノロジー株式会社 | Purge device, load port, bottom purge nozzle body, bottom purge unit |
| JP6044169B2 (en) * | 2012-08-10 | 2016-12-14 | シンフォニアテクノロジー株式会社 | Purge device, load port |
| JP2015035612A (en) * | 2014-09-24 | 2015-02-19 | シンフォニアテクノロジー株式会社 | Nozzle driving unit and gas injection device |
-
2015
- 2015-09-04 JP JP2015175193A patent/JP6623627B2/en active Active
-
2016
- 2016-08-19 CN CN201680050938.1A patent/CN107949905B/en active Active
- 2016-08-19 KR KR1020187005709A patent/KR102577608B1/en active IP Right Grant
- 2016-08-19 WO PCT/JP2016/074227 patent/WO2017038501A1/en active Application Filing
- 2016-09-02 TW TW105128476A patent/TWI715624B/en active
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|---|---|---|---|---|
| JPH09139410A (en) * | 1995-11-13 | 1997-05-27 | Shinko Electric Co Ltd | Mechanical interface device |
| JP2005150706A (en) * | 2003-11-12 | 2005-06-09 | Samsung Electronics Co Ltd | Substrate transfer container, device, and method |
| JP2006005193A (en) * | 2004-06-18 | 2006-01-05 | Hirata Corp | System for purging gas in vessel and gas purging method |
| TW201219102A (en) * | 2010-07-30 | 2012-05-16 | Kondoh Ind Ltd | Breathing filter unit for n2 gas purge, and purge device for n2 gas purging semiconductor wafer housing container equipped with the filter unit |
| TW201350220A (en) * | 2012-06-11 | 2013-12-16 | Sinfonia Technology Co Ltd | Purge nozzle unit, purge apparatus and load port |
| JP2014036185A (en) * | 2012-08-10 | 2014-02-24 | Sinfonia Technology Co Ltd | Purge nozzle unit, purge device, load port |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20180048650A (en) | 2018-05-10 |
| WO2017038501A1 (en) | 2017-03-09 |
| CN107949905B (en) | 2022-05-31 |
| TWI715624B (en) | 2021-01-11 |
| KR102577608B1 (en) | 2023-09-13 |
| JP6623627B2 (en) | 2019-12-25 |
| JP2017050518A (en) | 2017-03-09 |
| TW201718109A (en) | 2017-06-01 |
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