CN107942594A - A kind of display base plate and preparation method thereof and display device - Google Patents
A kind of display base plate and preparation method thereof and display device Download PDFInfo
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- CN107942594A CN107942594A CN201711122688.0A CN201711122688A CN107942594A CN 107942594 A CN107942594 A CN 107942594A CN 201711122688 A CN201711122688 A CN 201711122688A CN 107942594 A CN107942594 A CN 107942594A
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- conductive pattern
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- base plate
- insulating film
- conductive
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
Abstract
The present invention, which provides a kind of display base plate and preparation method thereof and display device, the production method of the display base plate, to be included：Insulating film layer is formed on underlay substrate, and forms the via through the insulating film layer；Conductive pattern is formed, the conductive pattern includes the first conductive pattern at least covering the edge of the via and the via, and first conductive pattern is formed using flexible conducting material.In the embodiment of the present invention, traditional rigid conductive material is substituted using flexible conducting material, form first conductive pattern at the edge at least covering via and via, the first conductive pattern formed using flexible conducting material has the flexibility of higher, it is less likely to occur to be broken at via, improves the reliability of display base plate.
Description
Technical field
The present invention relates to display technology field, more particularly to a kind of display base plate and preparation method thereof and display device.
Background technology
Current thin film transistor liquid crystal display (TFT-LCD) (Thin Film Transistor-LiquidCrystal Display,
Abbreviation TFT-LCD) in product, in order to ensure product charge rate, the thickness of passivation (PVX) layer can increased to reduce storage electricity
Hold, but the problem of this can also cause correlation therewith, i.e., the segment difference at via edges on passivation layer can bigger, for connection work
Conductive pattern easily occurs to be broken (Open) at the edge of via, causes resistance at via abnormal, so as to cause pixel to show
Show the bad problem such as dim spot.
With the development of TFT-LCD technologies, the species of via is also increasingly abundanter, and conductive pattern is easy at via edges
The problem of being broken, is concentrated mainly on design or the process duct prosecutor face of conductive pattern, such as appropriate increase conductive pattern
The area of overlap joint, or improved by repairing (Repair), but the generation that can not really prevent conductive pattern to be broken.
The content of the invention
In view of this, the present invention provides a kind of display base plate and preparation method thereof and display device, for solving to show base
The problem of conductive pattern at the via of plate is easily broken.
In order to solve the above technical problems, the present invention provides a kind of production method of display base plate, including：
Insulating film layer is formed on underlay substrate, and forms the via through the insulating film layer；
Conductive pattern is formed, the first of edge of the conductive pattern including at least covering the via and the via leads
Electrograph shape, first conductive pattern are formed using flexible conducting material.
Preferably, the flexible conducting material is flexible knitting composite material, the flexible knitting composite material by
The conductive particle on the surface of flexible knitting body material and the parcel flexible knitting body material is formed.
Preferably, the step of the first conductive pattern for forming the edge at least covering the via and the via, includes：
Form the catalyst layer at the edge at least covering the via and the via；
The display base plate is placed in reative cell, has in the reative cell and is used to prepare the flexible knitting bluk recombination
The mixed material of material, the mixed material include being used to prepare the first raw material of the flexible knitting body material and are used to prepare
Second raw material of the conductive particle, in certain temperature range, first raw material is decomposed, in the catalyst layer table
Look unfamiliar long flexible knitting body material, during the flexible knitting body Material growth, second raw material is decomposed, point
The conductive particle formed is solved to deposit on the surface of the flexible knitting body material, so that flexible knitting composite material is generated, with
Form first conductive pattern.
Preferably, the formation insulating film layer, and formation includes through the step of via of the insulating film layer：
Form insulating film layer and cover the photoresist layer of the insulating film layer；
Using halftoning or gray tone mask plate, the photoresist layer is exposed and developed, it is complete to form photoresist layer
Reserved area, half reserved area of photoresist layer and photoresist layer remove area, wherein, the photoresist layer removes area and corresponds to via location
Domain, half reserved area of photoresist layer at least correspond to the edge region of the via；
The insulating film layer that the photoresist layer removes region is etched, forms the via through the insulating film layer；
The photoresist layer of half reserved area of photoresist layer is removed, exposes the edge of the via；
The step of catalyst layer at the edge that the formation at least covers the via and the via, includes：
Using the photoresist layer of the full reserved area of the photoresist layer as mask, the side for covering the via and the via is formed
The catalyst layer of edge；
Remove the photoresist layer.
Preferably, the flexible knitting body material is carbon nanotubes, carbon fiber or polyaniline, and the conductive particle is transparent
The conductive particle that metal conductive oxide material is formed.
Preferably, the conductive pattern further includes the second conductive pattern, second conductive pattern and first conduction
Orthographic projection region of the figure on the underlay substrate be not overlapping.
Preferably, second conductive pattern is formed using flexible conducting material, alternatively, being led using transparent metal oxide
Electric material is formed.
Preferably, the insulating film layer includes passivation layer, and the conductive pattern is pixel electrode layer pattern or common electrical
Pole layer pattern.
The present invention also provides a kind of display base plate, is formed using above-mentioned production method, and the display base plate includes：
Underlay substrate, and the insulating film layer and conductive pattern being arranged on the underlay substrate, on the insulating film layer
The via of the insulating film layer is provided through, the conductive pattern includes the edge at least covering the via and the via
The first conductive pattern, first conductive pattern formed using flexible conducting material.
Preferably, the flexible conducting material is flexible knitting composite material, the flexible knitting composite material by
The conductive particle on the surface of flexible knitting body material and the parcel flexible knitting body material is formed.
The present invention also provides a kind of display device, including above-mentioned display base plate.
The above-mentioned technical proposal of the present invention has the beneficial effect that：
Traditional rigid conductive material is substituted using flexible conducting material, formation at least covers the edge of via and via
First conductive pattern, the first conductive pattern formed using flexible conducting material are had the flexibility of higher, are not easy at via
It is broken, improves the reliability of display base plate.
Brief description of the drawings
In order to illustrate the technical solution of the embodiments of the present invention more clearly, below by institute in the description to the embodiment of the present invention
Attached drawing to be used is needed to be briefly described, it should be apparent that, drawings in the following description are only some implementations of the present invention
Example, for those of ordinary skill in the art, without having to pay creative labor, can also be according to these attached drawings
Obtain other attached drawings.
Fig. 1 is the flow diagram of the production method of the display base plate of the embodiment of the present invention；
Fig. 2 is the schematic diagram of the flexible knitting composite material of one embodiment of the invention；
Fig. 3 is the structure diagram of the display base plate of one embodiment of the invention；
Fig. 4 is the structure diagram of the display base plate of another embodiment of the present invention.
Embodiment
To make the purpose, technical scheme and advantage of the embodiment of the present invention clearer, below in conjunction with the embodiment of the present invention
Attached drawing, the technical solution of the embodiment of the present invention is clearly and completely described.Obviously, described embodiment is this hair
Bright part of the embodiment, instead of all the embodiments.Based on described the embodiment of the present invention, ordinary skill
Personnel's all other embodiments obtained, belong to the scope of protection of the invention.
Please refer to Fig.1, Fig. 1 be the embodiment of the present invention display base plate production method flow diagram, the making
Method includes：
Step 11：Insulating film layer is formed on underlay substrate, and forms the via through the insulating film layer；
Step 12：Conductive pattern is formed, the conductive pattern includes the edge at least covering the via and the via
The first conductive pattern, first conductive pattern formed using flexible conducting material.
In the embodiment of the present invention, traditional rigid conductive material is substituted using flexible conducting material, formation at least covered
Hole and first conductive pattern at the edge of via, the first conductive pattern formed using flexible conducting material have the soft of higher
Property, it is less likely to occur to be broken at via, improves the reliability of display base plate.
In the embodiment of the present invention, the insulating film layer can be single-layer insulating film layer, can also be including at least two layers insulation
Film layer.
In the embodiment of the present invention, the flexible conducting material can be any conductive and be flexible conductive material.
In some preferred embodiments, the flexible conducting material is flexible knitting composite material, the flexible knitting
Composite material is formed by the conductive particle on flexible knitting body material and the surface for wrapping up the flexible knitting body material.It is described soft
Property braiding composite material can be as shown in Figure 2.
The flexible knitting body material has knitted body structure such as can be carbon nanotubes, carbon fiber or polyaniline,
And conductive material.
The conductive particle that the conductive particle can be formed for transparent metal oxide conductive material, such as conductive of ITO
Grain or IZO conductive particles etc..The conductive particle is usually the particle of nano-scale.
The flexible knitting composite material is the composite material of nucleocapsid structure (core-shell structure), is had
There is the advantages of pliability is high low with resistivity, using conductive pattern made of flexible knitting composite material since pliability is high,
It is less likely to occur to be broken at via, further, since resistivity is low, it is possible to increase the conductive effect of conductive pattern.
In the embodiment of the present invention, first conductive pattern can be formed using various ways, for example with in-situ chemical
Sedimentation is formed, alternatively, being formed using solwution method.
In some currently preferred embodiments of the present invention, first conductive pattern is formed using in-situ chemical sedimentation.
In-situ chemical sedimentation is simply introduced below.
In certain embodiments, first conductive pattern at the edge at least covering the via and the via is formed
The step of can include：
Step 21：Form the catalyst layer at the edge at least covering the via and the via；
Step 22：The display base plate is placed in reative cell, has in the reative cell and is used to prepare the flexible volume
Knit the mixed material of composite material, the mixed material include being used to prepare the first raw material of the flexible knitting body material and
The second raw material of the conductive particle is used to prepare, in certain temperature range, first raw material is decomposed, and is urged described
Agent layer surface grows flexible knitting body material, during the flexible knitting body Material growth, the second raw material hair
Solution estranged, the conductive particle being decomposed to form are deposited on the surface of the flexible knitting body material, answered so as to generate flexible knitting body
Condensation material, to form first conductive pattern.
The certain temperature range can be set as needed, for example, the temperature range higher than 1000 degrees Celsius.
By taking the flexible knitting body material is carbon nanotubes as an example, described formed by in-situ chemical sedimentation at least covers
The step of first conductive pattern at the edge of the via and the via, can include：
Step 31：The catalyst layer at the edge at least covering the via and the via is formed, the catalyst layer
Component is mostly the 8th group 4 transition metal or its alloy, such as ferrocene etc..
Step 32：The display base plate is placed in reative cell, there is mixing liquid (i.e. above-mentioned mixing in the reative cell
Raw material), the mixing liquid includes ethanol and indium pink salt class, has hot environment in the reative cell, ethanol is in high temperature action
Under decompose, generate carbon nanotubes in the catalyst layer surface；During carbon nano tube growth, indium pink salt class exists
Decomposed under high temperature action, the ITO conductive particles being decomposed to form deposit on the surface of carbon nanotubes, are answered so as to generate flexible knitting body
Condensation material, to form first conductive pattern.
In some currently preferred embodiments of the present invention, the formation insulating film layer, and formed through the insulating film layer
The step of via, can include：
Step 41：Form insulating film layer and cover the photoresist layer of the insulating film layer；
Step 42：The photoresist layer is exposed and developed, forms the full reserved area of photoresist layer, photoresist layer half is protected
Area and photoresist layer is stayed to remove area, wherein, the photoresist layer removes area and corresponds to via region, and the photoresist layer half is protected
Area is stayed at least to correspond to the edge region of the via；
Step 43：The insulating film layer that the photoresist layer removes region is etched, forms the via through the insulating film layer；
Step 44：The photoresist layer of half reserved area of photoresist layer is removed, exposes the edge of the via；
Wherein, the step of catalyst layer at the edge that the formation at least covers the via and the via includes：With
The photoresist layer of the full reserved area of photoresist layer is mask, forms the catalyst at the edge for covering the via and the via
Layer, and remove the photoresist layer.
In the embodiment of the present invention, after the via of insulating film layer is formed, the photoetching of half reserved area of photoresist layer is first removed
Glue-line, exposes porous edge, and the photoresist layer without removing the full reserved area of photoresist layer, utilizes the full reserved area of photoresist layer
Photoresist layer forms the catalyst layer at the edge at least covering the via and the via, then removes photoresist layer again, from
And unnecessary mask plate need not be increased when forming catalyst layer, reduce production cost.
Certainly, in some other embodiment of the present invention, the catalyst layer can also use single mask plate shape
Into.
Flexible knitting composite material in the embodiment of the present invention can also be formed using solwution method, in solwution method, it is necessary to
Flexible knitting body material is initially formed, the raw material for being used to prepare conductive particle is then deposited in the flexibility by solution deposit
Knitted body material surface, forms the conductive particle for wrapping up the flexible knitting body material surface.
In the embodiment of the present invention, the conductive pattern can also include the second conductive pattern, second conductive pattern and
Orthographic projection region of first conductive pattern on the underlay substrate be not overlapping.
I.e. conductive pattern includes two parts, first conductive pattern at the edge of via and via is at least covered, positioned at other
Second conductive pattern of position.
Second conductive pattern can be formed using flexible conducting material, it is preferable that be used and first conductive pattern
The identical flexible conducting material of shape is formed, and conventional non-flexible conductive material can also be used to be made, for example with transparent metal
Oxide conducting material is made, and the transparent metal oxide conductive material is such as can be ITO or IZO.
It is described when second conductive pattern is using the flexible conducting material formation identical with first conductive pattern
First conductive pattern and the second conductive pattern can be formed by a patterning processes.When second conductive pattern uses and institute
State the first conductive pattern it is different conductive material formation when, first conductive pattern and the second conductive pattern usually require to distinguish
Formed by a patterning processes.
In some embodiments of the invention, the insulating film layer includes passivation layer, and the conductive pattern is pixel electrode
Layer pattern or public electrode layer pattern, when the conductive pattern is pixel electrode layer pattern, the via can include：With
In connection pixel electrode layer pattern and the via of the drain electrode of thin film transistor (TFT), and transfer hole positioned at non-display area etc.,
When the conductive pattern is public electrode layer pattern, the via can include：For connecting public electrode layer pattern and public affairs
The via of common electrode cabling, and transfer hole positioned at non-display area etc..
Based on same inventive concept, the embodiment of the present invention also provides a kind of display base plate, and the display base plate can use
The production method of display base plate described in any of the above-described embodiment is formed, and the display base plate includes：Underlay substrate, Yi Jishe
The insulating film layer and conductive pattern being placed on the underlay substrate, are provided through the insulating film layer on the insulating film layer
Via, first conductive pattern at edge of the conductive pattern including at least covering the via and the via, described first
Conductive pattern is formed using flexible conducting material.
In the embodiment of the present invention, traditional rigid conductive material is substituted using flexible conducting material, formation at least covered
Hole and first conductive pattern at the edge of via, the first conductive pattern formed using flexible conducting material have the soft of higher
Property, it is less likely to occur to be broken at via, improves the reliability of display base plate.
In the embodiment of the present invention, the insulating film layer can be single-layer insulating film layer, can also be including at least two layers insulation
Film layer.
In the embodiment of the present invention, the flexible conducting material can be any conductive and be flexible conductive material.
In some preferred embodiments, the flexible conducting material is flexible knitting composite material, the flexible knitting
Composite material is formed by the conductive particle on flexible knitting body material and the surface for wrapping up the flexible knitting body material.
The flexible knitting body material has knitted body structure such as can be carbon nanotubes, carbon fiber or polyaniline,
And conductive material.
The conductive particle that the conductive particle can be formed for transparent metal oxide conductive material, such as conductive of ITO
Grain or IZO conductive particles etc..The conductive particle is usually the particle of nano-scale.
The flexible knitting composite material is the composite material of nucleocapsid structure (core-shell structure), is had
There is the advantages of pliability is high low with resistivity, using conductive pattern made of flexible knitting composite material since pliability is high,
It is less likely to occur to be broken at via, further, since resistivity is low, it is possible to increase the conductive effect of conductive pattern.
In the embodiment of the present invention, the conductive pattern can also include the second conductive pattern, second conductive pattern and
Orthographic projection region of first conductive pattern on the underlay substrate be not overlapping.
I.e. conductive pattern includes two parts, first conductive pattern at the edge of via and via is at least covered, positioned at other
Second conductive pattern of position.
Second conductive pattern can be formed using flexible conducting material, it is preferable that be used and first conductive pattern
The identical flexible conducting material of shape is formed, and conventional non-flexible conductive material can also be used to be made, for example with transparent metal
Oxide conducting material is made, and the transparent metal oxide conductive material is such as can be ITO or IZO.
It is described when second conductive pattern is using the flexible conducting material formation identical with first conductive pattern
First conductive pattern and the second conductive pattern can be formed by a patterning processes.When second conductive pattern uses and institute
State the first conductive pattern it is different conductive material formation when, first conductive pattern and the second conductive pattern usually require to distinguish
Formed by a patterning processes.
In some embodiments of the invention, the insulating film layer includes passivation layer, and the conductive pattern is pixel electrode
Layer pattern or public electrode layer pattern, when the conductive pattern is pixel electrode layer pattern, the via can include：With
In connection pixel electrode layer pattern and the via of the drain electrode of thin film transistor (TFT), and transfer hole positioned at non-display area etc.,
When the conductive pattern is public electrode layer pattern, the via can include：For connecting public electrode layer pattern and public affairs
The via of common electrode cabling, and transfer hole positioned at non-display area etc..
Below by taking the via in above-described embodiment is transfer hole as an example, to the structure of the display base plate in the embodiment of the present invention
Citing illustrates.
Please refer to Fig.3, Fig. 3 be one embodiment of the invention in display base plate structure diagram, the display base plate bag
Include：Underlay substrate 101, barrier metal layer figure 102, gate insulation layer 103, Source and drain metal level figure 104, passivation layer 105 and first
There is the via 107 through passivation layer 105 and gate insulation layer 103 on conductive pattern 106, passivation layer 105 and gate insulation layer 103,
First conductive pattern 106 is formed using flexible conducting material, and 106 part of the first conductive pattern is arranged in via,
Part is arranged at via edges (i.e. the upper surface of passivation layer 105), and first conductive pattern 106 passes through via 107 and grid gold
Belong to layer pattern 102 and Source and drain metal level figure 104 connects.The first conductive pattern 106 formed using flexible conducting material is had
The flexibility of higher, in via and is less likely to occur to be broken, improves the reliability of display base plate at via edges.
Please refer to Fig.4, Fig. 4 be another embodiment of the present invention in display base plate structure diagram, the display base plate
Including：Underlay substrate 101, barrier metal layer figure 102, gate insulation layer 103, Source and drain metal level figure 104, passivation layer 105 and
There is the via through passivation layer 105 and gate insulation layer 103 on one conductive pattern 106, passivation layer 105 and gate insulation layer 103
107, also there is the via 108 through passivation layer 105, first conductive pattern 106 uses compliant conductive material on passivation layer 105
Material is formed, and 106 part of the first conductive pattern is arranged in via, and being partly arranged at via edges, (i.e. passivation layer 105 is upper
Surface).First conductive pattern 106 is connected by via 107 with barrier metal layer figure 102, passes through via 108 and source and drain gold
Belong to layer pattern 104 to connect.The first conductive pattern 106 formed using flexible conducting material has the flexibility of higher, in via
Be less likely to occur to be broken at via edges, improve the reliability of display base plate.
The embodiment of the present invention also provides a kind of display device, including above-mentioned display base plate.The display device can be aobvious
Show panel, or the display device including display panel and drive circuit.
Unless otherwise defined, the technical term or scientific terminology used in the present invention is should be in fields of the present invention
The ordinary meaning that personage with general technical ability is understood." first ", " second " and the similar word used in the present invention
Any order, quantity or importance are not offered as, and is used only to distinguish different parts.Equally, "one" or
The similar word such as " one " does not indicate that quantity limits yet, but represents that there are at least one." connection " or " connected " etc. are similar
Word is not limited to physics or mechanical connection, but can include electrical connection, either directly or between
Connect." on ", " under ", "left", "right" etc. are only used for representing relative position relation, when the absolute position for being described object changes
Afterwards, then the relative position relation also correspondingly changes.
The above is the preferred embodiment of the present invention, it is noted that for those skilled in the art
For, without departing from the principles of the present invention, some improvements and modifications can also be made, these improvements and modifications
It should be regarded as protection scope of the present invention.
Claims (11)
- A kind of 1. production method of display base plate, it is characterised in that including：Insulating film layer is formed on underlay substrate, and forms the via through the insulating film layer；Conductive pattern is formed, the conductive pattern includes the first conductive pattern at least covering the edge of the via and the via Shape, first conductive pattern are formed using flexible conducting material.
- 2. the production method of display base plate according to claim 1, it is characterised in that the flexible conducting material is flexibility Composite material is woven, the flexible knitting composite material is by flexible knitting body material and wraps up the flexible knitting body material The conductive particle on surface formed.
- 3. the production method of display base plate according to claim 2, it is characterised in that formation at least cover the via and The step of first conductive pattern at the edge of the via, includes：Form the catalyst layer at the edge at least covering the via and the via；The display base plate is placed in reative cell, has in the reative cell and is used to prepare the flexible knitting composite material Mixed material, the mixed material includes being used to prepare the first raw material of the flexible knitting body material and is used to prepare described Second raw material of conductive particle, in certain temperature range, first raw material is decomposed, and is given birth in the catalyst layer surface Long flexible knitting body material, during the flexible knitting body Material growth, second raw material is decomposed, decomposing shape Into conductive particle deposited on the surface of the flexible knitting body material, so as to generate flexible knitting composite material, to be formed First conductive pattern.
- 4. the production method of display base plate according to claim 3, it is characterised in thatThe formation insulating film layer, and formation includes through the step of via of the insulating film layer：Form insulating film layer and cover the photoresist layer of the insulating film layer；Using halftoning or gray tone mask plate, the photoresist layer is exposed and developed, formed photoresist layer all risk insurance and stay Area, half reserved area of photoresist layer and photoresist layer remove area, wherein, the photoresist layer removes area and corresponds to via region, Half reserved area of photoresist layer at least corresponds to the edge region of the via；The insulating film layer that the photoresist layer removes region is etched, forms the via through the insulating film layer；The photoresist layer of half reserved area of photoresist layer is removed, exposes the edge of the via；The step of catalyst layer at the edge that the formation at least covers the via and the via, includes：Using the photoresist layer of the full reserved area of the photoresist layer as mask, the edge of the covering via and the via is formed Catalyst layer；Remove the photoresist layer.
- 5. the production method of display base plate according to claim 2, it is characterised in that the flexible knitting body material is carbon Nanotube, carbon fiber or polyaniline, the conductive particle are the conductive particle that transparent metal oxide conductive material is formed.
- 6. the production method of display base plate according to claim 1, it is characterised in that the conductive pattern further includes second Conductive pattern, the orthographic projection region of second conductive pattern and first conductive pattern on the underlay substrate do not weigh It is folded.
- 7. the production method of display base plate according to claim 6, it is characterised in that second conductive pattern is using soft Property conductive material is formed, alternatively, being formed using transparent metal oxide conductive material.
- 8. according to the production method of claim 1-7 any one of them display base plates, it is characterised in that the insulating film layer bag Passivation layer is included, the conductive pattern is pixel electrode layer pattern or public electrode layer pattern.
- A kind of 9. display base plate, it is characterised in that formed using such as claim 1-8 any one of them production methods, it is described Display base plate includes：Underlay substrate, and the insulating film layer and conductive pattern being arranged on the underlay substrate, are set on the insulating film layer There is a via through the insulating film layer, the conductive pattern includes the of the edge at least covering the via and the via One conductive pattern, first conductive pattern are formed using flexible conducting material.
- 10. display base plate according to claim 9, it is characterised in that the flexible conducting material is answered for flexible knitting body Condensation material, the flexible knitting composite material is by the surface of flexible knitting body material and the parcel flexible knitting body material Conductive particle is formed.
- 11. a kind of display device, it is characterised in that including the display base plate described in claim 9 or 10.
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| CN201711122688.0A CN107942594B (en) | 2017-11-14 | 2017-11-14 | Display substrate, manufacturing method thereof and display device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109031846A (en) * | 2018-08-29 | 2018-12-18 | 合肥鑫晟光电科技有限公司 | Flexible fiber substrate and flexible display apparatus including it |
| CN111326532A (en) * | 2020-03-18 | 2020-06-23 | 深圳市华星光电半导体显示技术有限公司 | Array substrate and display panel |
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