CN107941154A - A kind of displacement measurement system and measuring method - Google Patents
A kind of displacement measurement system and measuring method Download PDFInfo
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- CN107941154A CN107941154A CN201710984847.1A CN201710984847A CN107941154A CN 107941154 A CN107941154 A CN 107941154A CN 201710984847 A CN201710984847 A CN 201710984847A CN 107941154 A CN107941154 A CN 107941154A
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- alvarez lens
- displacement
- alvarez
- light
- pin hole
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
The invention discloses a kind of displacement measurement system, it is characterised in that the system comprises：Light source；Alvarez lens groups, the Alvarez lens groups are made of the first Alvarez lens and the 2nd Alvarez lens of the complementation of face shape, and the 2nd Alvarez lens are moved relative to the first Alvarez lens along perpendicular to optical axis direction, the Alvarez lens groups focal length is adjusted by adjusting displacement distance, and then controls the light energy of the directional light arrival pin hole；Pin hole, for projecting converging light through the Alvarez lens groups；Optical detector, for detecting the light energy passed through from the pin hole.Simple in measurement system structure provided by the invention, only several device junction closing lights, which are gained knowledge, can be achieved with the high-acruracy survey of displacement, and measurement accuracy is up to 1.33nm.For this application for high precision displacement sensory field, tool has very important significance.
Description
Technical field
The invention belongs to displacement measurement field, and in particular to a kind of displacement measurement system and measuring method.
Background technology
In the prior art, measuring the mode of displacement has very much, generally use displacement sensing when accurately measuring micro-displacement
Device.Displacement sensor is also applied to the measurement of the geometric senses such as the displacement of object, thickness, vibration, distance, diameter, in civilian and army
Had a wide range of applications with field.
Alvarez lens be by Alvarez propose a kind of polynomial surface face shape lens, by one group of two panels so
Lens can produce focal length variations along perpendicular to the relative motion of optical axis direction.
In the prior art, displacement sensor is broadly divided into inductive displacement transducer, capacitive displacement transducer, photo-electric
Displacement sensor, ultrasonic type displacement sensor, Hall displacement transducer.
The content of the invention
In view of above-mentioned, the present invention proposes a kind of displacement measurement system and measuring method, which can be high-precision
Ground measures displacement.
The first embodiment of the present invention provides a kind of displacement measurement system, including：
Light source；
Alvarez lens groups, the Alvarez lens groups by the complementation of face shape the first Alvarez lens and second
Alvarez lens form, and the 2nd Alvarez lens relative to the first Alvarez lens along perpendicular to optical axis side
To movement, the Alvarez lens groups focal length is adjusted by adjusting displacement distance, and then control the directional light to reach pin hole
Light energy；
Pin hole, for the converging light projected through the Alvarez lens groups；
Detector, for detecting the light energy passed through from the pin hole.
The operation principle of measuring system that embodiment of the present invention provides is：
Alvarez lens surface polynomial equations are：
Producing focal length f is：
Wherein, f is two Alvarez lens combination focal lengths, and A is multinomial coefficient, and 2 δ are between two Alvarez lens
Movement distance, n be Alvarez lens Refractive Index of Material；
When two Alvarez lens are having a small displacement perpendicular to optical axis direction, combined focal length can be caused to produce
Raw big change, from formula (2)：
When two Alvarez lens produce the distance change of Δ δ, cause combined focal length to produce the change of Δ f, originally gather
The burnt spot size in pin hole position is changed into：
Wherein r is the size of the spot radius in the situation of change lower pinhole plane of focal length, and D is saturating to be radiated at Alvarez
Beam size on mirror；
It can be obtained by formula (3) and (4)：
Assuming that the radius of pin hole is r0, and the Energy distribution of hot spot is uniform, due to the change of focal length, what pin hole received
Energy μ is changed into：
It can be seen from formula (6) Alvarez lens position produce change, cause through pin hole energy production very
Sensitive change.The displacement of Alvarez lens can be accurately measured by the energy detected through pin hole.
Preferably, be equipped with collimation lens between the light source and the Alvarez lens groups, for by the light source
The transmitting light of transmitting projects after becoming directional light.
Preferably, the light source is laser, LED etc..
Preferably, the optical detector could alternatively be light power meter.
Second embodiment of the invention provides a kind of method of the systematic survey displacement provided using first embodiment,
Comprise the following steps：
After the 2nd Alvarez lens are fixed in measurand, the light source, collimation lens, the first Alvarez
Lens, the 2nd Alvarez lens, pin hole and optical detector are sequentially arranged along optical axis direction；
The opposite position of the first Alvarez lens and the 2nd Alvarez lens is calculated according to the light energy through pin hole
Move, which is the displacement of measurand.
Simple in measurement system structure provided by the invention, only several device junction closing lights, which are gained knowledge, can be achieved with the high-precision of displacement
Degree measurement, measurement accuracy is up to 1.33nm.For this application for high precision displacement sensory field, there is critically important meaning
Justice.
Brief description of the drawings
Fig. 1 is the structure diagram for the displacement measurement system that embodiment provides；
Fig. 2 is the structure diagram for the displacement measurement system with collimation lens that embodiment provides；
Fig. 3, Fig. 4 are the schematic diagrams that the movement of Alvarez lens produces power variation in embodiment.
Embodiment
In order to more specifically describe the present invention, below in conjunction with the accompanying drawings and embodiment is to technical scheme
It is described in detail.
Embodiment
Fig. 1 is the structure diagram for the displacement measurement system that embodiment provides.Referring to Fig. 1, displacement provided in this embodiment
Measuring system includes light source 101；The Alvarez lens groups being arranged in light source emergent light light path, Alvarez lens groups are by face shape
Complementary the first Alvarez lens 102 and the 2nd Alvarez lens 103 form, and the 2nd Alvarez lens 103 are relative to the
One Alvarez lens 102 are moved along perpendicular to optical axis direction, and Alvarez lens group focal lengths are adjusted by adjusting displacement distance, into
And 101 emergent lights of light source are controlled to reach the light energy of pin hole；Pin hole 104, is assembled for being projected through Alvarez lens groups
Light；Optical detector 105 is used to detect the light energy passed through from the pin hole.
In the present embodiment, light source 101 is laser and LED etc..
Fig. 3, Fig. 4 give the schematic diagram that the movement of Alvarez lens produces power variation., can be with from Fig. 3 and Fig. 4
It is clearly not available：When the 2nd Alvarez lens 103 relative to the first Alvarez lens 102 along being moved perpendicular to optical axis direction,
When producing micro-displacement, the focal length of whole Alvarez lens groups can produce change, become f Δ f by original f, hot spot is by original
A point become radius be r hot spot.
As shown in Fig. 2, collimation lens 106 is also equipped with the present embodiment between Alvarez lens grant light source 101, this
Become directional light after the collimated lens 106 of diverging light that sample light source 101 is emitted to be mapped on Alvarez lens rent.
In this example, it is assumed that the multinomial coefficient A of the first Alvarez lens 102 and the 2nd Alvarez lens 103
=1.0E-2 (1/mm2), the material of lens is PMMA (refractive index n is 1.5), and clear aperture D is 10mm, the radius r of pin hole0For
2um.Assuming that the distance of pin hole plane to Alvarez lens is 20mm；When focus is located just at pin hole plane, the energy of all light
Amount can all pass through, at this moment the 2nd Alvarez lens 103 relative to 102 displacement distance δ of the first Alvarez lens=
2.5mm.When δ change 1um when (the 2nd Alvarez lens 103 relative to the first Alvarez lens 102 move 1um away from
From), i.e. during Δ δ=1um, it can be obtained by formula (5)：
In pin hole plane, the radius r of hot spot is：
Assuming that the energy of hot spot is uniformly distributed in pin hole plane, the energy that pin hole can must be passed through by formula (6) is light beam
Energy (focus is just at pin hole plan-position through the energy of pin hole)：
Assuming that detector can accurately measure 1/1000 variable quantity of beam energy, then it is saturating to calculate Alvarez
The precision of mirror displacement distance measurement can reach：
Therefore, the measurement accuracy of 1.33nm can be reached, can realize nano level accurate measurement.
In the present embodiment, above displacement test system is applied in measurement displacement, measuring method is：
After 2nd Alvarez lens 103 are fixed in measurand, light source 101, collimation lens 106, first
Alvarez lens 102, the 2nd Alvarez lens 103, pin hole 104 and optical detector 105 are sequentially arranged along optical axis direction；
First Alvarez lens 102 and the 2nd Alvarez lens 103 are calculated according to the light energy through pin hole 104
Relative displacement, the displacement be measurand displacement.
Technical scheme and beneficial effect is described in detail in above-described embodiment, Ying Li
Solution is the foregoing is merely presently most preferred embodiment of the invention, is not intended to limit the invention, all principle models in the present invention
Interior done any modification, supplementary, and equivalent replacement etc. are enclosed, should all be included in the protection scope of the present invention.
Claims (5)
- A kind of 1. displacement measurement system, it is characterised in that the system comprises：Light source；Alvarez lens groups, the Alvarez lens groups are saturating by the first Alvarez lens of face shape complementation and the 2nd Alvarez Microscope group into, and the 2nd Alvarez lens relative to the first Alvarez lens along moving perpendicular to optical axis direction, lead to Cross adjustment displacement distance and adjust the Alvarez lens groups focal length, and then control the emergent light of the light source to reach the light of pin hole Energy；Pin hole, for projecting converging light through the Alvarez lens groups；Optical detector, for detecting the light energy passed through from the pin hole.
- 2. displacement measurement system as claimed in claim 1, it is characterised in that in the light source and the Alvarez lens groups Between be equipped with collimation lens, the transmitting light for the light source to be launched projects after becoming directional light.
- 3. displacement measurement system as claimed in claim 1, it is characterised in that the light source is laser, LED.
- 4. displacement measurement system as claimed in claim 1, it is characterised in that the optical detector replaces with light power meter.
- 5. a kind of method using any systematic survey displacement of claims 1 to 33, comprises the following steps：After the 2nd Alvarez lens are fixed in measurand, the light source, collimation lens, the first Alvarez are saturating Mirror, the 2nd Alvarez lens, pin hole and optical detector are sequentially arranged along optical axis direction；The relative displacement of the first Alvarez lens and the 2nd Alvarez lens is calculated according to the light energy through pin hole, should Displacement is the displacement of measurand.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710984847.1A CN107941154B (en) | 2017-10-20 | 2017-10-20 | Displacement measurement system and measurement method |
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| CN201710984847.1A CN107941154B (en) | 2017-10-20 | 2017-10-20 | Displacement measurement system and measurement method |
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| CN107941154A true CN107941154A (en) | 2018-04-20 |
| CN107941154B CN107941154B (en) | 2020-01-21 |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108845382A (en) * | 2018-06-12 | 2018-11-20 | 杭州电子科技大学 | A kind of Alvarez lens zoom system containing harmonic diffraction surfaces |
| CN108931192A (en) * | 2018-06-12 | 2018-12-04 | 杭州电子科技大学 | A kind of displacement measurement system and measurement method |
| CN109001915A (en) * | 2018-08-28 | 2018-12-14 | 杭州电子科技大学 | A kind of Alvarez zoom intelligent glasses |
| CN109116580A (en) * | 2018-08-28 | 2019-01-01 | 杭州电子科技大学 | A kind of humorous diffraction Alvarez zoom intelligent glasses of sandwich style |
| CN109116581A (en) * | 2018-08-28 | 2019-01-01 | 杭州电子科技大学 | A kind of humorous diffraction Alvarez zoom intelligent glasses |
| CN109164596A (en) * | 2018-08-28 | 2019-01-08 | 杭州电子科技大学 | A kind of sandwich style Alvarez zoom intelligent glasses |
| CN114296155A (en) * | 2021-12-02 | 2022-04-08 | 华中科技大学 | Wide-spectrum optical zoom system based on double-layer medium super-surface |
| US20220206119A1 (en) * | 2020-12-28 | 2022-06-30 | Beijing Voyager Technology Co., Ltd. | Mems actuated alvarez lens for tunable beam spot size in lidar |
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| CN101449193A (en) * | 2006-03-06 | 2009-06-03 | 全视Cdm光学有限公司 | Zoom lens systems with wavefront coding |
| CN103988109A (en) * | 2011-10-07 | 2014-08-13 | 新加坡国立大学 | Mems-based zoom lens system |
| CN105122129A (en) * | 2012-11-08 | 2015-12-02 | 威动光有限公司 | Miniature optical zoom lens |
| US20150370092A1 (en) * | 2013-02-15 | 2015-12-24 | Adlens Ltd. | Variable-Power Lens |
| CN107041156A (en) * | 2014-01-08 | 2017-08-11 | 威动光有限公司 | The lens subassembly and actuator and its method of optical system |
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2017
- 2017-10-20 CN CN201710984847.1A patent/CN107941154B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101449193A (en) * | 2006-03-06 | 2009-06-03 | 全视Cdm光学有限公司 | Zoom lens systems with wavefront coding |
| CN103988109A (en) * | 2011-10-07 | 2014-08-13 | 新加坡国立大学 | Mems-based zoom lens system |
| CN105122129A (en) * | 2012-11-08 | 2015-12-02 | 威动光有限公司 | Miniature optical zoom lens |
| US20150370092A1 (en) * | 2013-02-15 | 2015-12-24 | Adlens Ltd. | Variable-Power Lens |
| CN107041156A (en) * | 2014-01-08 | 2017-08-11 | 威动光有限公司 | The lens subassembly and actuator and its method of optical system |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108845382A (en) * | 2018-06-12 | 2018-11-20 | 杭州电子科技大学 | A kind of Alvarez lens zoom system containing harmonic diffraction surfaces |
| CN108931192A (en) * | 2018-06-12 | 2018-12-04 | 杭州电子科技大学 | A kind of displacement measurement system and measurement method |
| CN109001915A (en) * | 2018-08-28 | 2018-12-14 | 杭州电子科技大学 | A kind of Alvarez zoom intelligent glasses |
| CN109116580A (en) * | 2018-08-28 | 2019-01-01 | 杭州电子科技大学 | A kind of humorous diffraction Alvarez zoom intelligent glasses of sandwich style |
| CN109116581A (en) * | 2018-08-28 | 2019-01-01 | 杭州电子科技大学 | A kind of humorous diffraction Alvarez zoom intelligent glasses |
| CN109164596A (en) * | 2018-08-28 | 2019-01-08 | 杭州电子科技大学 | A kind of sandwich style Alvarez zoom intelligent glasses |
| US20220206119A1 (en) * | 2020-12-28 | 2022-06-30 | Beijing Voyager Technology Co., Ltd. | Mems actuated alvarez lens for tunable beam spot size in lidar |
| CN114296155A (en) * | 2021-12-02 | 2022-04-08 | 华中科技大学 | Wide-spectrum optical zoom system based on double-layer medium super-surface |
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| CN107941154B (en) | 2020-01-21 |
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Effective date of registration: 20210507 Address after: Room 405, 6-8 Jiaogong Road, Xihu District, Hangzhou City, Zhejiang Province, 310013 Patentee after: Hangzhou Taoyi Data Technology Co.,Ltd. Address before: 310018 No. 2 street, Xiasha Higher Education Zone, Hangzhou, Jianggan District, Zhejiang Patentee before: HANGZHOU DIANZI University |
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