CN107881467B - A kind of low-refraction infrared optics Coating Materials and preparation method - Google Patents
A kind of low-refraction infrared optics Coating Materials and preparation method Download PDFInfo
- Publication number
- CN107881467B CN107881467B CN201711122473.9A CN201711122473A CN107881467B CN 107881467 B CN107881467 B CN 107881467B CN 201711122473 A CN201711122473 A CN 201711122473A CN 107881467 B CN107881467 B CN 107881467B
- Authority
- CN
- China
- Prior art keywords
- fluoride
- ytterbium
- calcirm
- mixture
- sintered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0694—Halides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Abstract
A kind of low-refraction infrared optics Coating Materials and preparation method, belong to optical filming material technical field.It is fluorinated the weight proportion of ytterbium and calcirm-fluoride：It is fluorinated ytterbium：85~99.5, calcirm-fluoride：0.5~15, the fluorination ytterbium and calcium fluoride mixture that obtain after proportion are sintered, between 700 DEG C~1250 DEG C of sintering temperature, melt step；By sintered sintered mixture 1260 DEG C or more progress vacuum fusion 3~6 hours, obtain fluorination ytterbium and calcirm-fluoride molten mixture.The invention has the advantages that in fluorination ytterbium material, introduce a certain amount of calcirm-fluoride, since fluorination ytterbium and calcirm-fluoride evaporate and are deposited on optical surface simultaneously, because of the difference of calcirm-fluoride and fluorination ytterbium crystalline form, the case where preventing oriented growth in original single fluorination ytterbium deposition process, in this way, it will form the small optical film layer of uniform internal stress, due to the reduction of internal stress, when plating multilayer film, the stabilization for guaranteeing multilayer film, solves the problems, such as that the film of multilayer film is split.
Description
Technical field
The present invention relates to a kind of low-refraction infrared optics Coating Materials and preparation methods, belong to optical filming material technology
Field.
Background technique
In optical coating field, being fluorinated ytterbium is a kind of common low-refraction infrared optics Coating Materials, since its is infrared
Through performance is good, and film strength is high, is usually used in being coated with the anti-reflection film of germanium, chalcogenide infrared glass, in film forming procedure, due to fluorination
Ytterbium optical component surface deposition, and optical surface recrystallize.Since the growth of crystal has certain directionality, such as water
It in the process of icing, usually first can first be grown towards specific direction, be formed by the microcosmic upper unevenness of film in this way, normally resulting in
It is even, it is this it is microcosmic on it is uneven, will form stress when plating multilayer film, film caused to split.
Summary of the invention
For overcome the deficiencies in the prior art, the present invention provides a kind of low-refraction infrared optics Coating Materials and preparation side
Method.
A kind of preparation method of low-refraction infrared optics Coating Materials, contains following steps；
Match step；To be fluorinated the weight proportion of ytterbium and calcirm-fluoride：It is fluorinated ytterbium：85~99.5, calcirm-fluoride：0.5~15, it presses
Weight proportion is stocked up,
Sintering step；The fluorination ytterbium and calcium fluoride mixture that obtain after proportion are sintered, 700 DEG C of sintering temperature~
Between 1250 DEG C, obtained sintered mixture is particle or various sizes of,
Melt step；By sintered sintered mixture 1260 DEG C or more progress vacuum fusion 3~6 hours, obtain fluorine
Change the molten mixture of ytterbium and calcirm-fluoride.
The plating steps of molten mixture；Molten mixture is used for plated film, plating conditions：Coating machine diameter 1100mm,
Evaporation rate in plated film is 10A °/S, 200 DEG C of base plate glass temperature.
A kind of low-refraction infrared optics Coating Materials, is made of fluorination ytterbium and calcirm-fluoride, is fluorinated the weight of ytterbium and calcirm-fluoride
Amount matches：It is fluorinated ytterbium：85~99.5, calcirm-fluoride：0.5~15.
Infrared optics Coating Materials is that fluorination ytterbium and calcium fluoride mixture are sintered, and is fluorinated ytterbium and calcium fluoride mixture
Sintering temperature is to be fluorinated ytterbium between 700 DEG C~1250 DEG C and calcium fluoride mixture can be particle, be also possible to various sizes of
Piece.
Infrared optics Coating Materials is the molten mixture to be fluorinated ytterbium and calcirm-fluoride, and the melting for being fluorinated ytterbium and calcirm-fluoride is mixed
The melting temperature of object is closed at 1260 DEG C or more.
It is an advantage of the invention that a certain amount of calcirm-fluoride is introduced, in this way, in Coating Materials in optics in fluorination ytterbium material
During being deposited on element, since fluorination ytterbium and calcirm-fluoride evaporate and are deposited on optical surface simultaneously, because of calcirm-fluoride and fluorination
The difference of ytterbium crystalline form, the case where preventing oriented growth in original single fluorination ytterbium deposition process, in this way, will form uniform interior
The small optical film layer of stress, due to the reduction of internal stress, when plating multilayer film, it is ensured that the stabilization of multilayer film solves more
The film of tunic splits problem.
Specific embodiment
Obviously, those skilled in the art belong to guarantor of the invention based on many modifications and variations that spirit of the invention is done
Protect range.
Those skilled in the art of the present technique are appreciated that unless otherwise defined, all terms used herein (including technology art
Language and scientific term) there is meaning identical with the general understanding of the those of ordinary skill in fields.
For convenient for the understanding to embodiment, below in conjunction with being further explained explanation, and each embodiment not structure
At limitation of the invention.
Embodiment 1：
A kind of low-refraction infrared optics Coating Materials, infrared optics Coating Materials are by two kinds of fluorine of fluorination ytterbium and calcirm-fluoride
Compound composition.
Infrared optics Coating Materials weight proportion is：
It is fluorinated ytterbium：85, calcirm-fluoride：0.5.
A kind of preparation method of low-refraction infrared optics Coating Materials, contains following steps；
Match step；It is according to infrared optics Coating Materials weight proportion：
It is fluorinated ytterbium：85, calcirm-fluoride：0.5, it stocks up by weight ratio,
Sintering step；The fluorination ytterbium and calcium fluoride mixture that obtain after proportion are sintered, 700 DEG C of sintering temperature, obtained
To sintered mixture can be particle, be also possible to various sizes of.
Embodiment 2：
A kind of low-refraction infrared optics Coating Materials, infrared optics Coating Materials are by two kinds of fluorine of fluorination ytterbium and calcirm-fluoride
Compound composition.
Infrared optics Coating Materials weight proportion is：
It is fluorinated ytterbium：89, calcirm-fluoride：12.
A kind of preparation method of low-refraction infrared optics Coating Materials, contains following steps；
Match step；It is according to infrared optics Coating Materials weight proportion：
It is fluorinated ytterbium：89, calcirm-fluoride：12, it stocks up by weight ratio,
Sintering step；The fluorination ytterbium and calcium fluoride mixture that obtain after proportion are sintered, 1250 DEG C of sintering temperature, obtained
To sintered mixture can be particle, be also possible to various sizes of.
Embodiment 3：
A kind of low-refraction infrared optics Coating Materials, infrared optics Coating Materials are by two kinds of fluorine of fluorination ytterbium and calcirm-fluoride
Compound composition.
Infrared optics Coating Materials weight proportion is：
It is fluorinated ytterbium：99.5 calcirm-fluoride：15.
A kind of preparation method of low-refraction infrared optics Coating Materials, contains following steps；
Match step；It is according to infrared optics Coating Materials weight proportion：
It is fluorinated ytterbium：99.5 calcirm-fluoride：15, it stocks up by weight ratio,
Sintering step；The fluorination ytterbium and calcium fluoride mixture that obtain after proportion are sintered, 1000 DEG C of sintering temperature, obtained
To sintered mixture can be particle, be also possible to various sizes of.
Embodiment 4：
Aiming at the problem that fluorination ytterbium material film layer Microinhomogeneity occurs in infrared coating technique, the present invention provides one kind
Low-refraction infrared optics Coating Materials, infrared optics Coating Materials are made of fluorination ytterbium and additive calcirm-fluoride.
The weight proportion of low-refraction infrared optics Coating Materials：It is fluorinated ytterbium 85~99.5, the calcirm-fluoride total amount 0.5 of addition
~15.
Infrared optics Coating Materials is also possible to the molten mixture of two kinds of fluorides, and fusion temperature is at 1260 DEG C or more.
Infrared optics Coating Materials is used for plated film multi-layered antireflection coating.
Difference due to the infrared transmission performance of calcirm-fluoride than being fluorinated ytterbium, thus, the introduction volume of calcirm-fluoride cannot be too high, otherwise
It will affect mixture refractive index, the amount of usually introducing is less than 15.
Embodiment 5：A kind of preparation method of low-refraction infrared optics Coating Materials, contains following steps；
Match step；It is matched by weight, fluorination ytterbium 99, calcirm-fluoride 1,
Sintering step；The fluorination ytterbium and calcium fluoride mixture that obtain after proportion are sintered, 700 DEG C of sintering temperature~
Between 1250 DEG C, obtained sintered mixture can be particle, be also possible to various sizes of,
Melt step；By sintered fluorination ytterbium and calcirm-fluoride sintered mixture in 1260 DEG C or more progress vacuum fusions 3
~6 hours, the molten mixture of fluorination ytterbium and calcirm-fluoride is obtained,
Plating steps；Plating conditions：Coating machine diameter 1100mm, the evaporation rate in plated film are 10A °/S, substrate glass
200 DEG C of glass temperature.
Embodiment 6：A kind of preparation method of low-refraction infrared optics Coating Materials, contains following steps；
Match step；It is matched by weight, fluorination ytterbium 98, calcirm-fluoride 2,
Sintering step；The fluorination ytterbium and calcium fluoride mixture that obtain after proportion are sintered, 700 DEG C of sintering temperature~
Between 1250 DEG C, obtained sintered mixture can be particle, be also possible to various sizes of,
Melt step；By sintered fluorination ytterbium and calcirm-fluoride sintered mixture in 1260 DEG C or more progress vacuum fusions 3
Hour, the molten mixture of fluorination ytterbium and calcirm-fluoride is obtained,
Plating steps；Plating conditions：Coating machine diameter 1100mm, the evaporation rate in plated film are 10A °/S, substrate glass
200 DEG C of glass temperature.
Embodiment 7：A kind of preparation method of low-refraction infrared optics Coating Materials, contains following steps；
Match step；It is matched by weight, fluorination ytterbium 95, calcirm-fluoride 5,
Sintering step；The fluorination ytterbium and calcium fluoride mixture that obtain after proportion are sintered, 700 DEG C of sintering temperature~
Between 1250 DEG C, obtained sintered mixture can be particle, be also possible to various sizes of,
Melt step；By sintered fluorination ytterbium and calcirm-fluoride sintered mixture in 1260 DEG C or more progress vacuum fusions 3
~6 hours, the molten mixture of fluorination ytterbium and calcirm-fluoride is obtained,
Plating steps；Plating conditions：Coating machine diameter 1100mm, the evaporation rate in plated film are 10A °/S, substrate glass
200 DEG C of glass temperature.
Embodiment 8：A kind of preparation method of low-refraction infrared optics Coating Materials, contains following steps；
Match step；It is matched by weight, fluorination ytterbium 97, calcirm-fluoride 3,
Sintering step；The fluorination ytterbium and calcium fluoride mixture that obtain after proportion are sintered, 700 DEG C of sintering temperature~
Between 1250 DEG C, obtained sintered mixture can be particle, be also possible to various sizes of,
Melt step；By sintered fluorination ytterbium and calcirm-fluoride sintered mixture in 1260 DEG C or more progress vacuum fusions 3
~6 hours, the molten mixture of fluorination ytterbium and calcirm-fluoride is obtained,
Plating steps；Plating conditions：Coating machine diameter 1100mm, the evaporation rate in plated film are 10A °/S, substrate glass
200 DEG C of glass temperature.
Embodiment 9：A kind of preparation method of low-refraction infrared optics Coating Materials, contains following steps；
Match step；It is matched by weight, fluorination ytterbium 90, calcirm-fluoride 10,
Sintering step；The fluorination ytterbium and calcium fluoride mixture that obtain after proportion are sintered, 700 DEG C of sintering temperature~
Between 1250 DEG C, obtained sintered mixture can be particle, be also possible to various sizes of,
Melt step；By sintered fluorination ytterbium and calcirm-fluoride sintered mixture in 1260 DEG C or more progress vacuum fusions 6
Hour, the molten mixture of fluorination ytterbium and calcirm-fluoride is obtained,
Plating steps；Plating conditions：Coating machine diameter 1100mm, the evaporation rate in plated film are 10A °/S, substrate glass
200 DEG C of glass temperature.
Embodiment 10：A kind of preparation method of low-refraction infrared optics Coating Materials, contains following steps；
Match step；It is matched by weight, fluorination ytterbium 87, calcirm-fluoride 13,
Sintering step；The fluorination ytterbium and calcium fluoride mixture that obtain after proportion are sintered, 700 DEG C of sintering temperature~
Between 1250 DEG C, obtained sintered mixture can be particle, be also possible to various sizes of,
Melt step；By sintered fluorination ytterbium and calcirm-fluoride sintered mixture in 1260 DEG C or more progress vacuum fusions 3
~6 hours, the molten mixture of fluorination ytterbium and calcirm-fluoride is obtained,
Plating steps；Plating conditions：Coating machine diameter 1100mm, the evaporation rate in plated film are 10A °/S, substrate glass
200 DEG C of glass temperature.
Above-described embodiment 5 the results are shown in Table 1 to embodiment 10：
1 comparing result of table (plated film tests 200 DEG C of 10A °/S)
As described above, embodiments of the present invention are described in detail, as long as but essentially without this hair of disengaging
Bright inventive point and effect can have many deformations, this will be readily apparent to persons skilled in the art.Therefore, this
The variation of sample is also integrally incorporated within protection scope of the present invention.
Claims (5)
1. a kind of preparation method of low-refraction infrared optics Coating Materials, it is characterised in that contain following steps；
Match step；To be fluorinated the weight proportion of ytterbium and calcirm-fluoride：It is fluorinated ytterbium：85~99.5, calcirm-fluoride：0.5~15, by weight
Proportion is stocked up,
Sintering step；The fluorination ytterbium and calcium fluoride mixture that obtain after proportion are sintered, 700 DEG C~1250 DEG C of sintering temperature
Between, obtained sintered mixture is particle or various sizes of,
Melt step；By sintered sintered mixture 1260 DEG C or more progress vacuum fusion 3~6 hours, obtain fluorination ytterbium
With the molten mixture of calcirm-fluoride.
2. a kind of preparation method of low-refraction infrared optics Coating Materials according to claim 1, it is characterised in that molten
Melt the plating steps of mixture；Molten mixture is used for plated film, plating conditions：Coating machine diameter 1100mm, in plated film
Evaporation rate be 10A °/S, 200 DEG C of base plate glass temperature.
3. a kind of low-refraction infrared optics Coating Materials of preparation method preparation according to claim 1, feature exist
It is formed in by fluorination ytterbium and calcirm-fluoride, the weight proportion for being fluorinated ytterbium and calcirm-fluoride is：It is fluorinated ytterbium：85~99.5, calcirm-fluoride：0.5
~15.
4. a kind of low-refraction infrared optics Coating Materials according to claim 3, it is characterised in that infrared optics plated film
Material is that fluorination ytterbium and calcium fluoride mixture are sintered, the sintering temperature for being fluorinated ytterbium and calcium fluoride mixture is 700 DEG C~
Between 1250 DEG C, it is fluorinated ytterbium and calcium fluoride mixture is particle or various sizes of.
5. a kind of low-refraction infrared optics Coating Materials according to claim 3, it is characterised in that infrared optics plated film
Material is the molten mixture to be fluorinated ytterbium and calcirm-fluoride, is fluorinated the melting temperature of the molten mixture of ytterbium and calcirm-fluoride 1260
DEG C or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711122473.9A CN107881467B (en) | 2017-11-14 | 2017-11-14 | A kind of low-refraction infrared optics Coating Materials and preparation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711122473.9A CN107881467B (en) | 2017-11-14 | 2017-11-14 | A kind of low-refraction infrared optics Coating Materials and preparation method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107881467A CN107881467A (en) | 2018-04-06 |
| CN107881467B true CN107881467B (en) | 2018-11-23 |
Family
ID=61776555
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711122473.9A Active CN107881467B (en) | 2017-11-14 | 2017-11-14 | A kind of low-refraction infrared optics Coating Materials and preparation method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107881467B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108983329A (en) * | 2018-07-11 | 2018-12-11 | 无锡奥夫特光学技术有限公司 | Prepare the process of infrared optical window |
| CN109082632B (en) * | 2018-08-20 | 2021-01-01 | 中国科学院上海技术物理研究所 | Infrared low-refractive-index mixed coating material and preparation method thereof |
| CN109456061B (en) * | 2018-12-21 | 2021-12-07 | 南京东瑞光电技术有限公司 | Ytterbium fluoride mixed material with good mechanical property and preparation process thereof |
| CN110283356A (en) * | 2019-06-26 | 2019-09-27 | 南京睿扬光电技术有限公司 | A kind of efficiently fluorination ytterbium mixing material and its preparation process |
| CN111592231B (en) * | 2020-05-25 | 2022-07-12 | 南京睿扬光电技术有限公司 | Ytterbium fluoride mixed coating material and preparation method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05132334A (en) * | 1991-01-18 | 1993-05-28 | Sumita Kogaku Glass:Kk | Infrared ray transmitting fluoride glass |
| WO2008023802A1 (en) * | 2006-08-25 | 2008-02-28 | Nalux Co., Ltd. | Optical device having multilayer film and method for producing the same |
| RU2431910C1 (en) * | 2010-05-06 | 2011-10-20 | Закрытое акционерное общество (ЗАО) "ИНКРОМ" | Polycrystalline laser material |
| CN102719252A (en) * | 2012-06-12 | 2012-10-10 | 北京工业大学 | Up-and-down-conversion luminescent high-transmittance amorphous fluoride film and preparation method thereof |
| CN105314853A (en) * | 2015-11-12 | 2016-02-10 | 中国科学院上海光学精密机械研究所 | Ytterbium doped calcium fluoride microcrystal and fluorophosphate glass composite and preparation method thereof |
-
2017
- 2017-11-14 CN CN201711122473.9A patent/CN107881467B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05132334A (en) * | 1991-01-18 | 1993-05-28 | Sumita Kogaku Glass:Kk | Infrared ray transmitting fluoride glass |
| WO2008023802A1 (en) * | 2006-08-25 | 2008-02-28 | Nalux Co., Ltd. | Optical device having multilayer film and method for producing the same |
| RU2431910C1 (en) * | 2010-05-06 | 2011-10-20 | Закрытое акционерное общество (ЗАО) "ИНКРОМ" | Polycrystalline laser material |
| CN102719252A (en) * | 2012-06-12 | 2012-10-10 | 北京工业大学 | Up-and-down-conversion luminescent high-transmittance amorphous fluoride film and preparation method thereof |
| CN105314853A (en) * | 2015-11-12 | 2016-02-10 | 中国科学院上海光学精密机械研究所 | Ytterbium doped calcium fluoride microcrystal and fluorophosphate glass composite and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107881467A (en) | 2018-04-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107881467B (en) | A kind of low-refraction infrared optics Coating Materials and preparation method | |
| CN107219567B (en) | A kind of uniform low-refraction optical filming material and preparation method of forming a film | |
| Dong et al. | Crystallization dynamics of Sn‐based perovskite thin films: toward efficient and stable photovoltaic devices | |
| EP1648034B9 (en) | Evaporation material comprising Ta2Ox with x = 4.81 bis 4.88, for the deposition of layers with high refraction | |
| Sertel et al. | Influences of annealing temperature on anti-reflective performance of amorphous Ta2O5 thin films | |
| Butt et al. | Thermal effect on the optical and morphological properties of TiO 2 thin films obtained by annealing a Ti metal layer | |
| WO2017044549A1 (en) | Optical coatings including buffer layers | |
| CN105074046A (en) | Niobium oxide sputtering target, production method therefor, and niobium oxide film | |
| CN109503149A (en) | A kind of high refractive index optical filming material and preparation method, optical anti-reflective film | |
| CN111893433A (en) | Coating material and preparation method thereof | |
| CN1043367C (en) | Vapour-deposition material for the production of optical coatings of medium refractive index | |
| Sood et al. | Experimental and theoretical study of the optical and electrical properties of nanostructured indium tin oxide fabricated by oblique-angle deposition | |
| Yoon et al. | Comparision of residual stress and optical properties in Ta2O5 thin films deposited by single and dual ion beam sputtering | |
| Huang et al. | Preparation and characterization of RuO2 thin films | |
| Adurodija et al. | The electro-optical properties of amorphous indium tin oxide films prepared at room temperature by pulsed laser deposition | |
| Pat et al. | Antireflective coating on polyethylene terephthalate by thermionic vacuum arc | |
| EP0735386B1 (en) | Optical layers with intermediate refractive index | |
| Makarova et al. | Technological features of the thick tin film deposition by with magnetron sputtering form liquid-phase target | |
| CN109507764A (en) | A kind of optical filming material and preparation method, optical anti-reflective film | |
| CN114335392B (en) | Preparation process of anti-reflection film for OLED flexible display | |
| US4257904A (en) | Dielectric glass coating composition containing polymethylmethacrylate fugative binder | |
| JPS6128027B2 (en) | ||
| US6045728A (en) | Method of treating a zinc sulfide body formed by chemical vapor deposition to increase its rain erosion durability | |
| CN112285811A (en) | Antistatic AF (aluminum fluoride) coating material and preparation method thereof | |
| FR2555613A1 (en) | PROCESS FOR CATHODE SPRAYING ON A SUPPORT OF A LOW RESISTANCE INDIUM OXIDE FILM |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20221031 Address after: 065500 Satellite Navigation Industrial Park, Emerging Industry Demonstration Zone, Gu'an County, Langfang City, Hebei Province Patentee after: Kaiyong (Gu'an) Photoelectric Technology Co.,Ltd. Address before: 14 Tianhe North Road, Huangcun Town, Daxing District, Beijing 102629 Patentee before: BEIJING FUXINGKAI PHOTO-ELECTRONIC TECH. Co.,Ltd. |
|
| TR01 | Transfer of patent right |