CN111893433A - Coating material and preparation method thereof - Google Patents
Coating material and preparation method thereof Download PDFInfo
- Publication number
- CN111893433A CN111893433A CN202010753356.8A CN202010753356A CN111893433A CN 111893433 A CN111893433 A CN 111893433A CN 202010753356 A CN202010753356 A CN 202010753356A CN 111893433 A CN111893433 A CN 111893433A
- Authority
- CN
- China
- Prior art keywords
- parts
- coating
- fluoride
- coating material
- silicon dioxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Abstract
The invention provides a coating material and a preparation method thereof, and particularly relates to the field of coating materials, wherein the coating material comprises, by mass, 30-70 parts of silicon dioxide, 5-20 parts of zirconium dioxide, 30-70 parts of praseodymium fluoride and 20-40 parts of barium fluoride. The silicon dioxide and the zirconium dioxide can form a zirconium silicate compound, so that the coating hardness can be improved, and the service life of the coating material can be prolonged; and the fluoride can form a film layer with small uniform stress, so that the uniformity of the coating film can be ensured.
Description
Technical Field
The invention belongs to the field of coating materials, and particularly relates to a coating material and a preparation method thereof.
Background
The coating material is generally that a target material is heated to enable surface components to be evaporated in a radical or ion form and to be deposited on the surface of a substrate, the uniformity of the components of a thin film evaporation coating formed through a film forming process (scattering point-island structure-labyrinth structure-layered growth) is not very easy to guarantee, and the specific adjustable factors are the same as the above, but due to the limitation of the principle, the uniformity of the components of the evaporation coating is not good for the coating of non-single components; the reliability of the coating material is greatly reduced due to the uneven coating; therefore, the uniformity of the coating material is ensured, and the coating material is an important index for inspecting the quality of the coating material; the uniformity of the existing coating material is still to be further improved;
in view of the above disadvantages, there is a need for a coating material and a method for preparing the same, wherein silicon dioxide and zirconium dioxide can form a zirconium silicate compound, so that the coating hardness can be improved, and the service life of the coating material can be prolonged; and the fluoride can form a film layer with small uniform stress, so that the uniformity of the coating film can be ensured.
Disclosure of Invention
The invention aims to provide a coating material and a preparation method thereof, silicon dioxide and zirconium dioxide can form a zirconium silicate compound, so that the coating hardness can be improved, and the service life of the coating material can be prolonged; and the fluoride can form a film layer with small uniform stress, so that the uniformity of the coating film can be ensured.
The invention provides the following technical scheme:
a coating material comprises the following substances, by mass, 30-70 parts of silicon dioxide, 5-20 parts of zirconium dioxide, 30-70 parts of praseodymium fluoride and 20-40 parts of barium fluoride;
preferably, the material composition comprises, by mass, 40-60 parts of silicon dioxide, 10-15 parts of zirconium dioxide, 40-60 parts of praseodymium fluoride and 25-35 parts of barium fluoride.
Preferably, the coating comprises, by mass, 50 parts of silicon dioxide, 13 parts of zirconium dioxide, 50 parts of praseodymium fluoride and 30 parts of barium fluoride.
A preparation method of a coating material comprises the following specific steps:
s1, mixing and melting silicon dioxide, zirconium dioxide, praseodymium fluoride and barium fluoride at 1700-1900 ℃ in proportion;
s2, sintering the melt at 900-1000 ℃ for 4-7 hours to obtain the product.
Preferably, 50 parts of silicon dioxide, 13 parts of zirconium dioxide, 50 parts of praseodymium fluoride and 30 parts of barium fluoride are mixed and melted at 1800 ℃ for 3 hours
Preferably, the melt is sintered at 950 ℃ or higher for 6 hours.
Preferably, the diameter of the coating machine is 1200mm when coating is carried out, the evaporation speed of the product during coating is 9A DEG/S, and the temperature of the substrate is 190 ℃.
The invention has the beneficial effects that:
the zirconium dioxide has high hardness, and the silicon dioxide and the zirconium dioxide can form a zirconium silicate compound, so that the coating hardness can be improved, and the service life of the coating material can be prolonged; and the fluoride can form a film layer with small uniform stress, so that the uniformity of the coating film can be ensured.
Detailed Description
Example 1:
a coating material comprises, by mass, 30 parts of silicon dioxide, 5 parts of zirconium dioxide, 30 parts of praseodymium fluoride and 20 parts of barium fluoride
The preparation method comprises the following steps:
s1, mixing 30 parts of silicon dioxide, 5 parts of zirconium dioxide, 30 parts of praseodymium fluoride and 20 parts of barium fluoride in proportion
Mixing and melting at 1700 ℃; s2, sintering the melt at 900 ℃ for 4 hours to obtain the product.
Example 2:
the coating material comprises, by mass, 50 parts of silicon oxide, 13 parts of zirconium dioxide, 50 parts of praseodymium fluoride and 30 parts of barium fluoride.
The preparation method comprises the following steps:
s1, mixing and melting silicon dioxide, zirconium dioxide, praseodymium fluoride and barium fluoride at 1800 ℃ in proportion; s2, sintering the melt at 950 ℃ for 6 hours to obtain the product.
Example 3:
a coating material comprises, by mass, 70 parts of silicon dioxide, 20 parts of zirconium dioxide, 70 parts of praseodymium fluoride and 40 parts of barium fluoride
The preparation method comprises the following steps:
s1, mixing and melting silicon dioxide, zirconium dioxide, praseodymium fluoride and barium fluoride at 900 ℃ in proportion; s2, sintering the melt at 1000 ℃ for 7 hours to obtain the product.
Experimental analysis, the products obtained in examples 1 to 3 are coated with films, the diameter of a coating machine is 1200mm, the evaporation speed of the products during coating is 9A DEG/S, and the substrate temperature is 190 ℃; the evaporation uniformity is good, the strength is good, and the product prepared in the embodiment 2 is optimal;
although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art will understand that various changes, modifications and substitutions can be made without departing from the spirit and scope of the invention as defined by the appended claims. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (7)
1. A coating material is characterized in that: the material composition comprises, by mass, 30-70 parts of silicon dioxide, 5-20 parts of zirconium dioxide, 30-70 parts of praseodymium fluoride and 20-40 parts of barium fluoride.
2. The plating material according to claim 1, wherein: the material composition comprises, by mass, 40-60 parts of silicon dioxide, 10-15 parts of zirconium dioxide, 40-60 parts of praseodymium fluoride and 25-35 parts of barium fluoride.
3. The plating material according to claim 2, wherein: the material composition comprises, by mass, 50 parts of silicon dioxide, 13 parts of zirconium dioxide, 50 parts of praseodymium fluoride and 30 parts of barium fluoride.
4. The preparation method of the coating material is characterized by comprising the following specific steps:
s1, mixing and melting silicon dioxide, zirconium dioxide, praseodymium fluoride and barium fluoride at 1700-1900 ℃ in proportion;
s2, sintering the melt at 900-1000 ℃ for 4-7 hours to obtain the product.
5. The method for preparing a coating material according to claim 4, wherein: 50 parts of silicon dioxide, 13 parts of zirconium dioxide, 50 parts of praseodymium fluoride and 30 parts of barium fluoride are mixed and melted at 1800 ℃ for 3 hours.
6. The method for preparing a coating material according to claim 4, wherein: the melt is sintered at 950 ℃ or higher for 6 hours.
7. The method for preparing a coating material according to claim 4, wherein: when coating is carried out, the diameter of the coating machine is 1200mm, the evaporation speed of the product during coating is 9A DEG/S, and the substrate temperature is 190 ℃.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010753356.8A CN111893433A (en) | 2020-07-30 | 2020-07-30 | Coating material and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010753356.8A CN111893433A (en) | 2020-07-30 | 2020-07-30 | Coating material and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111893433A true CN111893433A (en) | 2020-11-06 |
Family
ID=73182785
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010753356.8A Pending CN111893433A (en) | 2020-07-30 | 2020-07-30 | Coating material and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111893433A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112285811A (en) * | 2020-11-30 | 2021-01-29 | 江苏中新瑞光学材料有限公司 | Antistatic AF (aluminum fluoride) coating material and preparation method thereof |
| CN115385673A (en) * | 2022-09-26 | 2022-11-25 | 武汉科技大学 | High-strength silica brick for hydrogen metallurgy and preparation method thereof |
| CN116496078A (en) * | 2023-04-12 | 2023-07-28 | 上海新倬壮印刷科技有限公司 | Screen coating material and preparation method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106019428A (en) * | 2016-08-08 | 2016-10-12 | 北京富兴凯永兴光电技术有限公司 | Low-refractive-index optical coating material |
| CN107219567A (en) * | 2017-06-21 | 2017-09-29 | 北京富兴凯永兴光电技术有限公司 | A kind of uniform low-refraction optical filming material of film forming and preparation method |
| CN109082632A (en) * | 2018-08-20 | 2018-12-25 | 中国科学院上海技术物理研究所 | A kind of infrared low-refraction the admixture plates the film material and preparation method |
-
2020
- 2020-07-30 CN CN202010753356.8A patent/CN111893433A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106019428A (en) * | 2016-08-08 | 2016-10-12 | 北京富兴凯永兴光电技术有限公司 | Low-refractive-index optical coating material |
| CN107219567A (en) * | 2017-06-21 | 2017-09-29 | 北京富兴凯永兴光电技术有限公司 | A kind of uniform low-refraction optical filming material of film forming and preparation method |
| CN109082632A (en) * | 2018-08-20 | 2018-12-25 | 中国科学院上海技术物理研究所 | A kind of infrared low-refraction the admixture plates the film material and preparation method |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112285811A (en) * | 2020-11-30 | 2021-01-29 | 江苏中新瑞光学材料有限公司 | Antistatic AF (aluminum fluoride) coating material and preparation method thereof |
| CN115385673A (en) * | 2022-09-26 | 2022-11-25 | 武汉科技大学 | High-strength silica brick for hydrogen metallurgy and preparation method thereof |
| CN116496078A (en) * | 2023-04-12 | 2023-07-28 | 上海新倬壮印刷科技有限公司 | Screen coating material and preparation method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN111893433A (en) | Coating material and preparation method thereof | |
| US6787003B2 (en) | Sputtering target and methods of making and using same | |
| CN107881467B (en) | A kind of low-refraction infrared optics Coating Materials and preparation method | |
| CN106567045B (en) | The preparation method of tubular rotary HIGH-PURITY SILICON sputtering target material | |
| CN106498350A (en) | The preparation method of sial sputtering target material | |
| CN105174720A (en) | Manufacturing method for light reflecting mirror | |
| EP2664690B1 (en) | A magnetron sputtering coating device and the preparation method of a nano-multilayer film | |
| CN107219567B (en) | A kind of uniform low-refraction optical filming material and preparation method of forming a film | |
| CN109385886A (en) | A kind of carbon fiber production method of molten-salt growth method applying silicon carbide layer | |
| CN112851118A (en) | Tellurate glass with high refractive index and preparation method thereof | |
| JP2008514816A (en) | Manufacturing method of hermetic crystalline mullite layer using thermal spraying method | |
| CN113529033B (en) | Preparation method of protective coating and protective coating prepared by preparation method | |
| JPH1072666A (en) | Formation of apatite thin coating | |
| CN105621897A (en) | Coated glass and preparation process thereof | |
| CN106141507B (en) | A kind of preparation method of the ceramic granule reinforced composite material film of low content of organics | |
| CN108359976A (en) | A method of for reducing laser melting coating alumina base composite coating crackle | |
| CN112624614B (en) | High-wear-resistance ceramic glaze and preparation method thereof | |
| CN112285811A (en) | Antistatic AF (aluminum fluoride) coating material and preparation method thereof | |
| US4596721A (en) | Vacuum evaporating films of alkali metal polyphosphide | |
| WO2002027057A2 (en) | Sputtering target and method of making same | |
| KR20190002538A (en) | TiCN with reduced growth defects by HiPIMS | |
| SU583199A1 (en) | Method of depositing aluminium and aluminium oxide coating on carbon anode | |
| CN115679260A (en) | Method for improving binding degree of titanium pentoxide raw material and base material for optical coating | |
| CN116043165B (en) | Coating material for nondestructively stripping coating layer on surface of part | |
| FR2555613A1 (en) | PROCESS FOR CATHODE SPRAYING ON A SUPPORT OF A LOW RESISTANCE INDIUM OXIDE FILM |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20201106 |