CN107860945A - Scan the multi-functional coupling in-situ measuring method of probe elliptical polarization - Google Patents
Scan the multi-functional coupling in-situ measuring method of probe elliptical polarization Download PDFInfo
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- CN107860945A CN107860945A CN201711042837.2A CN201711042837A CN107860945A CN 107860945 A CN107860945 A CN 107860945A CN 201711042837 A CN201711042837 A CN 201711042837A CN 107860945 A CN107860945 A CN 107860945A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/02—Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
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Abstract
The invention discloses one kind to scan the multi-functional coupling in-situ measuring method of probe elliptical polarization, and tested region is selected with XYZ coarse motions scanner, will scan probe close to sample surfaces and is arranged on the center of measurement of elliptically polarized li mechanism launching spot；Using center as measurement origin, the certain relative XY coordinates of control XY scanner movements carry out the scanning survey of sample microscopic appearance, and writing scan track, obtain scanning element sequence number in X/Y plane；Probe will be scanned along Z-direction and removes the launching spot scope of measurement of elliptically polarized li mechanism, while XY fine motion scanners are returned into measurement origin position according to scanning track；Measurement of elliptically polarized li is carried out according to scanning track, obtains the point-by-point optics and material property of sample；Obtain the optics and surface topography information in scanning area.Present invention has the advantages that：Can in situ, synchronous, real-time measurement sample macroscopic view optical property and thickness and microscopic information.Easy to operate, test is accurate, improves efficiency.
Description
Technical field
The present invention relates to a kind of thin-film material macro property and the in-situ testing technique field of microstructure, more particularly to one
The kind scanning probe-multi-functional coupling in-situ measuring method of elliptical polarization.
Background technology
As advanced manufacturing technology an important branch thin-film material research, the sign of thin-film material characteristic parameter with
Detection method is its key foundation.Probe micrometering (Scanning Probe Microscope, SPM) is scanned, is a kind of right
Material surface microstructure and the analysis method of property measurement.This microscopic method have high resolution, cost are low, consumption is low,
The series of advantages such as working range is wide；It can obtain the three-dimensional appearance of high-resolution body surface；Continuous dynamic analysis can be carried out；
Shortcoming is to be only capable of carrying out microcosmic partial analysis；Measurement of elliptically polarized li instrument (Ellipsometer) measures, and is that one kind passes through measure
The change (amplitude ratio and phase difference) of polarization state before and after sample surfaces incident light and reflected light, so as to obtain the information of testing sample
Measuring method.And as the complication of device architecture is, it is necessary to which the unknown quantity of measurement is continuously increased so that conventional elliptical is inclined
The film thickness measuring and shape characteristic of optical measuring instrument for film etc. of shaking all shows certain limitation.
In recent years, with the continuous development of thin-film material, the measurement of simple atomic force microscopy and measurement of elliptically polarized li are
Can not meet in situ, microcosmic to couple while the needs of measure with macroscopical, multi-functional.The present invention is in order to meet Multifunctional photoelectric processor in situ
The macro property of coupling needs with microcosmic test, proposes that scanning probe micrometering is combined by one kind with measurement of elliptically polarized li
Measuring method, expand existing measurement measurement ＆ characterization function and application scope, improve detection with characterize efficiency, will be to film
Good facilitation is played in the research and development of material.
The content of the invention
The technical problems to be solved by the invention be to provide one kind can meet scientific research personnel sample is carried out it is in situ, synchronous,
The requirement that real-time macro property test and Microstructure characterization are combined scans probe micrometering-ellipse based on in-situ investigation
The multi-functional coupling detecting method of polarized light measurement.
In order to solve the above-mentioned technical problem, the technical solution adopted by the present invention is：One kind scanning more work(of probe-elliptical polarization
In-situ measuring method can be coupled, step is as follows：
Step 1：Pass through XYZ with the coaxial-illuminating observation element and imaging CCD detectors of scanning probe micrometering mechanism
The Z axis of coarse motion scanner makes scanning probe micrometering machine from the scanning of face coarse motion and the micrometer feed of Z axis piezoelectric micromotion scanner
The probe of structure is close to sample surfaces and is arranged on laser spot center position on the incident sample of measurement of elliptically polarized li measuring mechanism
Put；Step 2：Using spot center position as measurement origin, control XY fine motions scanner moves certain relative XY in the horizontal plane
Coordinate is scanning area, carries out the scanning probe micrometering of sample microscopic appearance, and writing scan track, obtain (X,
Y, Z) ij, i, j are scanning element sequence number in X/Y plane；Step 3：The spiral micrometer for passing through coaxial-illuminating observation element along Z-direction
Instrument will scan the incident light of the probe removal measurement of elliptically polarized li mechanism of probe micrometering mechanism along Z axis progress coarse motion regulation
Spot scope, while according to scanning track, XY fine motion scanners are returned into measurement origin position；Step 4：Foundation scanning track,
Measurement of elliptically polarized li is carried out, obtains the point-by-point optics and material property (Ψ, Δ) ij of sample；Step 5：Scan process terminates,
Each scanning element in scanning area contains (Ψ, Δ, X, Y, Z) ij, wherein：(Ψ, Δ) ij is optical information, (X, Y,
Z) ij is surface topography information.
The scanning probe micrometering mechanism of the step 1 and the scanning point coordinates and rail of measurement of elliptically polarized li mechanism
Mark is identical, forms in site measurement.
Probe micrometering mechanism is scanned in measurement, scanning probe is in measurement of elliptically polarized li mechanism launching spot
Contact or non-contact measured surface when the heart and measurement.
Probe and sample measured surface are scanned during the non-cpntact measurement is smaller than 20nm.
After probe is left the spot area of spectral type measurement of elliptically polarized li mechanism along Z axis, elliptical polarization flash ranging is carried out
Amount.
The beneficial effects of the invention are as follows：The method and function of measurement of elliptically polarized li and scanning probe micrometering is organic
It is combined together, can in situ, synchronous, measurement sample in real time macroscopical optical property (such as refractive index and extinction coefficient) and thickness
Degree and microscopic information (such as surface topography and roughness).Compared with the method for other off-line tests, probe-elliptical polarization is scanned
Multi-functional coupling in-situ measuring method is easy to operate, and test result is more accurate, in situ, synchronous, real-time can measure the grand of sample
Performance and microstructure information are seen, two kinds of instruments had both been solved and has measured respectively it cannot be guaranteed that being the ex situ survey in unified measurement region
Amount problem, while a few houres, the time of measuring of several days will be needed to shorten to a few minutes, improve measurement ＆ characterization efficiency.
Brief description of the drawings
Fig. 1 is that a kind of multi-functional coupling in-situ measurement device of probe-elliptical polarization that scans of the present invention faces entire block diagram
Schematic diagram；
Fig. 2 is the side view logic diagram schematic diagram of Fig. 1 scanning probe micrometering mechanism,
Fig. 3 is a kind of each several part mechanism for scanning the multi-functional coupling in-situ measurement device of probe-elliptical polarization of the present invention
Side view relative position schematic diagram；
Fig. 4 is the multi-functional coupling in-situ measuring method flow chart of scanning probe-elliptical polarization.
Wherein：
101：CCD detectors
102：Coaxial-illuminating observation element
1021：Light collimating mirror 1022：Speculum 1023：Semi-transparent semi-reflecting lens
103：Z axis piezoelectric micromotion scanner
104：Scan probe and holding frame
105：Fine motion scanner driver
106：Scan probe actuation controller
107：Probe signals preamplifier
108：Spiral micrometer
109：External lighting source
201：Elliptical polarization radiant
202：The polarizer
203：Analyzer
204：Photodetector
205：XYZ coarse motion scanners
1：Scan probe micrometering mechanism
2：Measurement of elliptically polarized li mechanism
3：Sample holder
4：XY fine motion scanners
5：Pedestal
Embodiment
The present invention is described in further detail with reference to the accompanying drawings and detailed description.It is understood that herein
Described specific embodiment is used only for explaining with the present invention, rather than to this clearly demarcated restriction.It also should be noted that
For the ease of description, part related to the present invention rather than entire infrastructure are illustrate only in accompanying drawing.
The invention provides a kind of scanning probe micrometering-multi-functional coupling of measurement of elliptically polarized li for in-situ investigation
Close the technical scheme of detection means.As shown in Figure 1, Figure 2 and Figure 3, in situ, synchronous, measurement working prototype in real time macroscopic view
Optical information, such as refractive index and extinction coefficient, and thickness and microcosmic geometric sense information, such as surface topography and roughness it is micro-
Information is seen, the detection means includes：Probe micrometering mechanism 1 is scanned, for obtaining the microscopic appearance of testing sample, i.e., (Z)
ij；XY fine motions sweep mechanism 4, dot position information is scanned in X/Y plane for obtaining, i.e. (X, Y) ij, collectively formed (X, Y, Z)
Ij, i, j are scanning element sequence number in X/Y plane；Measurement of elliptically polarized li mechanism 2, the point-by-point optics and material for obtaining sample are special
Property (Ψ, Δ) ij.
Testing sample support 3, XY fine motions scanner 4, XYZ coarse motions scanner 205 are connected along Z axis, testing sample support 3 with
XY fine motions scanner 4 is connected by magnetic force or air negative pressure, and XY fine motions scanner 4 is connected with XYZ coarse motions scanner 205 by screw
Connect fixation；XY fine motions scanner 4 is two-dimensional piezoelectric ceramics mechanism；XYZ coarse motions scanner 205 is stepper motor feed screw nut machine
Structure, the large area scanning of the ellipsometric measurement hot spot in horizontal plane is not only provided and surveyed jointly with scanning probe measurement mechanism 1
The coarse motion scanning in region is measured, the coarse motion position adjustment of the probe and sample interval of Z-direction from face is also provided；Z axis piezoelectricity is swept
Retouch the fine motion scan tracing that device 103 completes Z-direction；Measurement of elliptically polarized li mechanism 2, XYZ coarse motions scanner 205 and scanning are visited
Pin measuring mechanism 1 is rigidly attached on the pedestal 5 of detection means by mechanical structure；The needle point of probe is in measurement of elliptically polarized li
On the incident light of mechanism 2 and the intersection point of reflected light, and the YZ planes that probe is formed with Z axis are perpendicular to measurement of elliptically polarized li mechanism
Incident light and reflected light where XZ planes.
Scanning probe micrometering mechanism 1 includes：Spiral micrometer 108, Z axis piezoelectric micromotion scanner 103, fine motion scanning
Device driver 105, scan probe and holding frame 104, scanning probe actuation controller 106, probe signals preamplifier 107；
The Z axis piezoelectricity coarse motion sweep mechanism and spiral micrometer 108 of XYZ coarse motions scanner 205 are respectively used to electronic and manual mode
The probe of probe micrometering mechanism 1 and the adjustment of sample surfaces spacing are scanned, and probe is arranged on measurement of elliptically polarized li
Mechanism 2 incides the Position of Laser-Spot Center on sample；Spiral micrometer 108 is additionally operable to after completing scanning probe micrometering
After probe is removed into laser facula along Z axis, measurement of elliptically polarized li mechanism 2 carries out the measurement of optical parametric and thickness；Z axis piezoelectricity
Fine motion scanner 103 is connected with spiral micrometer 108 and scanning probe holding frame 104 respectively, scanning probe actuation controller 106
The pumping signal of probe is respectively configured to provide with probe signals preamplifier 107 and is believed by the excitation of sample surface morphology modulation
Number detection and preposition amplification.
Coaxial-illuminating observation element 102, the phase of probe and testing sample for observing scanning probe micrometering mechanism 1
To position, and provide field illumination.External light source 109 sends beam of white light and collimated by light collimating mirror 1021 passes through speculum again
1022 reflex to after semi-transparent semi-reflecting lens 1023 and incide sample surfaces illumination observation visual field, and the image of sample and probe is by semi-transparent
Semi-reflective mirror 1023 is reflexed on CCD detectors 101 and is imaged.
The multi-functional coupling detection dress of scanning probe micrometering-measurement of elliptically polarized li for in-situ investigation of the present invention
The operation principle put is：
Utilize the external light in the coaxial-illuminating observation element for the surface for being placed in scanning probe micrometering mechanism probe
Source 109 sends beam of white light and collimates after speculum 1022 reflexes to semi-transparent semi-reflecting lens 1023 to enter again by light collimating mirror 1021
It is mapped to sample surfaces illumination observation visual field, the image of sample and probe reflexes to CCD detectors 101 by semi-transparent semi-reflecting lens 1023
Upper imaging, divided according to imaging by the Z axis piezoelectricity coarse motion sweep mechanism and spiral micrometer 108 of XYZ coarse motions scanner 205
Not with the probe and sample surfaces spacing of electronic and manual mode adjustment scanning probe micrometering mechanism 1, and probe is set
In the laser light incident optical spot centre position of the sample stage of measurement of elliptically polarized li mechanism 2, the point is recorded as measurement origin；
On the basis of measuring origin, sat by controlling XY rough micro-moving mechanisms scanning platform to move certain relative XY in the horizontal plane
Mark is scanning area, and scanning probe actuation controller 106 and preamplifier 107 provide the pumping signal of probe and by sample respectively
The detection and preposition amplification of the pumping signal of product surface topography modulation, show so as to carry out the scanning probe of sample microscopic appearance
Micrometering measuring mechanism measures, and writing scan track；
Coarse motion and fine motion scanner along Z-direction by Z axis, the probe for scanning probe micrometering mechanism 1 is removed
The launching spot scope of measurement of elliptically polarized li mechanism 2, and according to scanning track, it is former that XY fine motions scanner 4 is returned into measurement
Point position；
According to above-mentioned scanning area and scanning track, measurement of elliptically polarized li mechanism 2 is launched by LASER Light Source 201
Non-polarized light is changed into linearly polarized light after the polarizer 202, and the regulation polarizer 202 changes the polarization direction of light beam, linearly polarized light
It is changed into elliptically polarized light after the wave plate of λ/4, elliptically polarized light retrodeviates the change of polarization state by being radiated on film sample, utilize
Analyzer 203 measures the polarization state (amplitude and phase) of its reflected light to obtain the point-by-point light that the scanning area obtains sample
And material property；
So, it is scanning element sequence number that each scanning element, which actually contains (Ψ, Δ, X, Y, Z) ij, i, both includes light
Information (Ψ, Δ) ij is learned, contains surface topography information (X, Y, Z) ij again.
It is identical with track with the coordinate of measurement of elliptically polarized li scanning element to scan probe micrometering, forms in site measurement；
Probe micrometering mechanism 1 is scanned in measurement, its probe will at the center of measurement of elliptically polarized li incidence luminous point and measurement
Contact or non-contact measured surface.Probe and sample measured surface are scanned when non-cpntact measurement is smaller than 20nm, though not
The measurement of elliptically polarized light can be carried out simultaneously, but is shown using spectral type measurement of elliptically polarized li time short (second level), scanning probe
Micro- time of measuring (classification), it is to measure simultaneously that can be approximately considered.
, can in situ, synchronous, survey in real time by innovative design of the present invention in system by above-described embodiment
Thin-film material macroscopic view optical property parameter and thickness information and microcosmic geometric sense information are tried, more can accurately analyze microstructure to light
The corresponding relation and modulating action of information are learned, can directly explain that the Film Optics caused by the microstructure change of thin-film material is special
The change of property.
The invention provides one kind to scan the multi-functional coupling in-situ measuring method of probe-elliptical polarization.As shown in figure 4, tool
Body implementation steps are as follows：
Utilize the coaxial-illuminating observation element 102 and imaging being placed in directly over the probe of scanning probe micrometering mechanism 1
CCD detectors 101, from the scanning of face coarse motion and Z axis piezoelectric micromotion scanner 103, make to sweep by the Z axis of XYZ coarse motions scanner 205
The probe of probe micrometering mechanism 1 is retouched close to sample surfaces, and is arranged on the incident sample of measurement of elliptically polarized li measuring mechanism 2
Position of Laser-Spot Center on product, the point is recorded as measurement origin；On the basis of measuring origin, by controlling XY fine motion scanners
Certain relative XY coordinates i.e. scanning area is moved in the horizontal plane, carries out the micro- survey of scanning probe of sample microscopic appearance
Amount, and writing scan track；According to scanning track, XY fine motion scanners are returned to measurement origin position, then along Z-direction
The launching spot scope of removal measurement of elliptically polarized li mechanism of probe micrometering mechanism will be scanned；Measurement of elliptically polarized li according to
Above-mentioned scanning area and scanning track, obtain point-by-point optics and material property that the scanning area obtains sample.So, it is each
It is scanning element sequence number that individual scanning element, which actually contains (Ψ, Δ, X, Y, Z) ij, i, has both included optical information (Ψ, Δ) ij,
Surface topography information (X, Y, Z) ij is contained again.
Above-described embodiment, the Z axis of scanning probe micrometering mechanism 1 is from face coarse motion by measurement of elliptically polarized li mechanism 2
XYZ coarse motions scanner 205 is provided, and the fine motion scan tracing of Z axis is swept by the Z axis piezoelectric micromotion being fixed on spiral micrometer 108
Device 103 is retouched to provide；XY fine motions scanning is provided by the XY fine motions scanner 4 for also serving as sample stage, using air negative pressure or magnetic by sample
Product are fixed on 3 on sample platform bracket, and sample platform bracket links together with XY fine motion scanners；XY fine motions scanner 4 and ellipse
The XYZ coarse motions scanner 205 of polarized light measurement mechanism 2 is fixed together, and provides scanning probe by XYZ coarse motions scanner 205
The coarse motion scanning of micrometering mechanism 1；Scan probe micrometering mechanism 1 and coaxial-illuminating observation element 102 therein with it is ellipse
Circularly polarized light measuring mechanism 2 is fixed together by pedestal 5.In the case where temperature pressure is certain, sweeping based on in-situ investigation
Retouch probe micrometering-measurement of elliptically polarized li multi-functional coupling detecting method measurement sample, can under same measuring condition,
Obtain original position, synchronization, the macroscopical optical property and thickness information and microstructure information of real-time sample device.
Comparative analysis：Respectively its microstructure and macroscopic view are tested using scanning probe microscopy and measurement of elliptically polarized li instrument
Optical property, what is obtained is the respective independent microstructure of non-equal measuring condition, non-same measured zone, non-simultaneous measurement
With optical performance parameter and thickness, test result can not illustrate corresponding between the microstructure of sample and macroscopical optical parametric or
Modulation relation.
, can be in situ, same by innovative design of the present invention in system by above-described embodiment and comparative example
Step, real-time testing thin-film material macroscopic view optical property parameter and thickness information and microstructure information, more can accurately be analyzed microcosmic
Structure can be explained directly thin caused by the microstructure change of thin-film material the corresponding relation and modulating action of optical information
The change of film optical characteristics.
It is pointed out that although described above and embodiment have done more detailed word description to the present invention, this
Simply mentality of designing of the present invention is briefly described for a little descriptions, rather than the limitation to thinking of the present invention.It is any to be no more than this hair
The combination of bright mentality of designing, increase or modification, each fall within protection scope of the present invention.
Claims (5)
1. one kind scanning multi-functional coupling in-situ measuring method of probe-elliptical polarization, step are as follows：
Step 1：Coaxial-illuminating observation element (102) and imaging CCD detectors with scanning probe micrometering mechanism (1)
(101) entered by the Z axis of XYZ coarse motions scanner (205) from the scanning of face coarse motion and the fine motion of Z axis piezoelectric micromotion scanner (103)
Give, make the probe of scanning probe micrometering mechanism (1) close to sample surfaces and be arranged on measurement of elliptically polarized li measuring mechanism
(2) Position of Laser-Spot Center on incident sample；
Step 2：Certain phase is moved in the horizontal plane by measurement origin, control XY fine motions scanner (2) of spot center position
It is scanning area to XY coordinates, carries out the scanning probe micrometering of sample microscopic appearance, and writing scan track, obtain
(X, Y, Z) ij, i, j are scanning element sequence number in X/Y plane；
Step 3：Coarse motion tune is carried out along Z axis by the spiral micrometer (108) of coaxial-illuminating observation element (102) along Z-direction
Section will scan the launching spot scope of the probe removal measurement of elliptically polarized li mechanism (2) of probe micrometering mechanism (1), simultaneously
According to scanning track, XY fine motion scanners are returned into measurement origin position；
Step 4：According to scanning track, carry out measurement of elliptically polarized li, obtain sample point-by-point optics and material property (Ψ,
Δ)ij；
Step 5：Data coupling processing：Each scanning element in scanning area contains (Ψ, Δ, X, Y, Z) ij, wherein：
(Ψ, Δ) ij is optical information, and (X, Y, Z) ij is surface topography information, and scan process terminates.
2. a kind of scanning multi-functional coupling in-situ measuring method of probe-elliptical polarization according to claim 1, its feature
It is：The scanning probe micrometering mechanism (1) of the step 1 and the scanning point coordinates and rail of measurement of elliptically polarized li mechanism (2)
Mark is identical, forms in site measurement.
3. a kind of scanning multi-functional coupling in-situ measuring method of probe-elliptical polarization according to claim 1, its feature
It is：Probe micrometering mechanism (1) is scanned in measurement, scanning probe is in measurement of elliptically polarized li mechanism (2) launching spot
Contact or non-contact measured surface when center and measurement.
4. a kind of scanning multi-functional coupling in-situ measuring method of probe-elliptical polarization according to claim 3, its feature
It is：Probe and sample measured surface are scanned during the non-cpntact measurement is smaller than 20nm.
5. a kind of scanning multi-functional coupling in-situ measuring method of probe-elliptical polarization according to claim 1, its feature
It is：After probe is left the spot area of spectral type measurement of elliptically polarized li mechanism along Z axis, measurement of elliptically polarized li is carried out.
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| CN1255625A (en) * | 1998-12-02 | 2000-06-07 | 西门子公司 | Device and method for measuring critical measurement by ellipsometry |
| CN101688768A (en) * | 2007-11-14 | 2010-03-31 | 韩国标准科学研究院 | The minute measuring instrument for high speed and large area and the method of thereof |
| CN202329574U (en) * | 2011-11-15 | 2012-07-11 | 武汉理工大学 | Elliptical polarization three-dimensional scanning device |
| US20160116271A1 (en) * | 2014-10-22 | 2016-04-28 | National Applied Research Laboratories | Multi-functioned optical measurement device and method for optically measuring a plurality of parameters |
| CN106595521A (en) * | 2016-12-12 | 2017-04-26 | 武汉颐光科技有限公司 | Vertical objective lens type Muller matrix imaging ellipsometer based on liquid crystal phase modulation |
| CN107144529A (en) * | 2017-06-06 | 2017-09-08 | 大连理工大学 | A kind of device and method that measurement is accurately positioned for ellipsometer |
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2017
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1255625A (en) * | 1998-12-02 | 2000-06-07 | 西门子公司 | Device and method for measuring critical measurement by ellipsometry |
| CN101688768A (en) * | 2007-11-14 | 2010-03-31 | 韩国标准科学研究院 | The minute measuring instrument for high speed and large area and the method of thereof |
| CN202329574U (en) * | 2011-11-15 | 2012-07-11 | 武汉理工大学 | Elliptical polarization three-dimensional scanning device |
| US20160116271A1 (en) * | 2014-10-22 | 2016-04-28 | National Applied Research Laboratories | Multi-functioned optical measurement device and method for optically measuring a plurality of parameters |
| CN106595521A (en) * | 2016-12-12 | 2017-04-26 | 武汉颐光科技有限公司 | Vertical objective lens type Muller matrix imaging ellipsometer based on liquid crystal phase modulation |
| CN107144529A (en) * | 2017-06-06 | 2017-09-08 | 大连理工大学 | A kind of device and method that measurement is accurately positioned for ellipsometer |
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