CN107817657A - Wet method peel-off device and its stripping means - Google Patents
Wet method peel-off device and its stripping means Download PDFInfo
- Publication number
- CN107817657A CN107817657A CN201711025369.8A CN201711025369A CN107817657A CN 107817657 A CN107817657 A CN 107817657A CN 201711025369 A CN201711025369 A CN 201711025369A CN 107817657 A CN107817657 A CN 107817657A
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- China
- Prior art keywords
- unit
- displacement
- wet method
- substrate
- liquid
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
Abstract
The invention discloses a kind of wet method peel-off device, and the photoresist on substrate is removed for wet method；The wet method peel-off device includes being sequentially communicated the gateway unit of setting, stripping unit, displacement unit, washing unit, drying unit and outlet port unit；Wherein, replacing unit provides displacement liquid flushing the substrate, and the stripper remained after the stripped unit of substrate is removed with displacement.Present invention also offers the stripping means based on above-mentioned wet method peel-off device.The present invention between stripping unit and washing unit by setting displacement unit, and the stripper remained on substrate is removed by displacement liquid, so as to when being washed to substrate, water generation alkaline matter can be met from the monoethanolamine that generally there are in stripper, and the problem of then corroding other aluminum elements on substrate, so as to which the wet method peel-off device and its stripping means are applied in liquid crystal panel manufacturing process, it can avoid influenceing the electrical of product, also mura bad phenomenon will not be consequently formed, product yield will be greatly improved.
Description
Technical field
The invention belongs to liquid crystal panel processing technique field, it relates in particular to which a kind of be used to remove the photoetching on substrate
The wet method peel-off device of glue, and the stripping means based on the wet method peel-off device.
Background technology
In the manufacturing process of liquid crystal panel, generally require using photoresist to form the mask of predetermined purpose, and making
Make after completion other elements, it is necessary to be removed to the photoresist mask on substrate.Typically removed using wet method, wet method, which removes, to be needed
Wet method peel-off device is based on, photoresist obtains in the wet method peel-off device in the infiltration, expansion and course of dissolution of stripper
To remove, then via stripper removal of the washing by substrate surface residual and dry substrate.
The stripper of currently used solvent system includes monoethanolamine, when the laggard water-filling of strippable substrate is washed, due to remaining in
Monoethanolamine in the stripper of substrate surface is dissolved in water, and generates alkaline matter, will cause the corruption of other aluminum elements on substrate
Lose phenomenon.The process is shown below：
Alkaline matter generates：HOCH2CH2NH2+H2O=HOCH2CH2NH3 ++OH-
Al corrosion of elements：2Al+2H2O+2OH-=2AlO2 -+3H2↑
The electrical of product is most directly influenced at last and forms mura (i.e. display brightness is uneven, causes various vestiges
Phenomenon), cause product yield to reduce.
The content of the invention
To solve the above-mentioned problems of the prior art, the invention provides a kind of wet method peel-off device and wet based on this
The stripping means of method peel-off device, the wet method peel-off device can effectively avoid washing anti-with stripper during the stripper remained
Should, the problem of so as to corrode other elements on substrate.
In order to reach foregoing invention purpose, present invention employs following technical scheme：
A kind of wet method peel-off device, the photoresist on substrate is removed for wet method；The wet method peel-off device is included successively
Connect the gateway unit set, stripping unit, displacement unit, washing unit, drying unit and outlet port unit；Wherein, it is described to put
Changing unit provides displacement liquid flushing the substrate, the stripper remained with the displacement removal substrate after the stripping unit.
Further, the stripper includes dimethyl sulfoxide (DMSO) and monoethanolamine.
Further, the displacement unit includes entrance liquid cutter and outlet air knife；The displacement liquid is that dimethyl sulfoxide (DMSO) is molten
Liquid, the entrance liquid cutter connects the supply side of the displacement liquid, described to export air knife to remove the substrate through the entrance
The displacement liquid remained after liquid cutter.
Further, the displacement unit also includes displacement liquid collecting terminal, and the displacement liquid collecting terminal connects the supply
End, the displacement liquid blown off through the outlet air knife is back to the supply side.
Further, the displacement unit also includes the spraying being folded between the entrance liquid cutter and the outlet air knife
Nozzle, the spray nozzle is tentatively removing the displacement liquid that the substrate remains after the entrance liquid cutter.
Further, the displacement unit also includes displacement liquid collecting terminal, and the displacement liquid collecting terminal connects the supply
End, the supply side is back to by the displacement liquid blown off through the spray nozzle.
Further, the purity of dimethyl sulfoxide (DMSO) is not less than 99% in the displacement liquid.
Further, the wet method peel-off device also includes connection between the gateway unit and the stripping unit
Buffer cell, the buffer cell spread to the gateway unit to suppress the stripper in the stripping unit.
Another object of the present invention also resides in a kind of method of wet method stripping photoresist that provides, and methods described is based on such as taking up an official post
Wet method peel-off device described in one, methods described include step：
S1, the substrate with photoresist transmitted to the stripping unit by the gateway unit, the photoresist is in institute
State and be removed under the infiltration, expansion and dissolution of stripper in stripping unit；
S2, the substrate transmitted to the displacement unit by the stripping unit, the displacement liquid in the displacement unit
The stripper of wash and remove residual on the substrate；
S3, the substrate by displacement is transmitted to washing unit, drying unit successively by the displacement unit and washed
And drying, and leave the wet method peel-off device through outlet port unit.
The present invention is derived from removing light for wet method by setting displacement unit between stripping unit and washing unit
The wet method peel-off device of photoresist；Displacement unit in the wet method peel-off device can provide displacement liquid, stripped to remove substrate
The stripper on surface is remained in after unit, so as to when being washed to substrate, you can from the second that generally there are in stripper
Hydramine meets water generation alkaline matter, and the problem of then corrode other aluminum elements on substrate, so as to by the wet method peel-off device
And its stripping means is applied in liquid crystal panel manufacturing process, it can avoid influenceing the electrical of product, will not also be consequently formed
Mura bad phenomenon, product yield will be greatly improved.
Brief description of the drawings
The following description carried out in conjunction with the accompanying drawings, above and other aspect, feature and the advantage of embodiments of the invention
It will become clearer, in accompanying drawing：
Fig. 1 is the process flow diagram of wet method peel-off device according to an embodiment of the invention.
Embodiment
Hereinafter, with reference to the accompanying drawings to embodiments of the invention are described in detail.However, it is possible to come in many different forms real
Apply the present invention, and the specific embodiment of the invention that should not be construed as limited to illustrate here.Conversely, there is provided these implementations
Example is in order to explain the principle and its practical application of the present invention, so that others skilled in the art are it will be appreciated that the present invention
Various embodiments and be suitable for the various modifications of specific intended application.In the accompanying drawings, for the sake of clarity, element can be exaggerated
Shape and size, and identical label will be used to indicate same or analogous element all the time.
Present embodiment discloses a kind of wet method peel-off device, and it is used in wet method removal liquid crystal panel manufacturing process be formed to exist
Photoresist on substrate.
Referring in particular to Fig. 1, the wet method peel-off device include be disposed adjacent successively gateway unit 1, stripping unit 3, displacement
Unit 4, washing unit 5, drying unit 6 and outlet port unit 7.
Specifically, the substrate (not shown) provided with photoresist carries out the stripping of photoresist in stripping unit 3, and
Displacement unit 3 can provide displacement liquid, to replace remove the stripped photoresist of substrate after remain in the stripper on surface.
Usually, when removing photoresist using wet method, in used stripper bulk composition be dimethyl sulfoxide (DMSO) and
Monoethanolamine, thus, displacement liquid are specially then dimethyl sulphoxide solution, and preferably control the pure of dimethyl sulfoxide (DMSO) in the displacement liquid
Degree is not less than 99% (wt%), to prevent wherein impurity or moisture etc. from adverse reaction occurs with monoethanolamine.
Preferably, replacing unit 4 includes entrance liquid cutter (not shown) and outlet air knife (not shown)；Enter oral fluid
The supply side (not shown) of knife linker substitution liquid, to rinse on the substrate after stripped unit 3 stripper remained, and
It is able to remove the displacement liquid remained on substrate through exporting air knife.
Replacement result is preferably rinsed in order to obtain, is preferably additionally provided with spraying spray before entrance liquid cutter and outlet air knife
Mouth (not shown), the stripper remained on the substrate after air knife tentatively blows off stripped unit 3 is exported to coordinate.
In order to reduce the loss of stripper and the follow-up washing reclaimed water of unit 5, the displacement unit 4 also includes displacement liquid and collected
(not shown) is held, the displacement liquid collecting terminal is corresponding with spray nozzle and/or outlet air knife, and the connection of displacement liquid collecting terminal supplies
To end, to collect the displacement liquid blown off through spray nozzle, and the displacement liquid of this portion collection is back to supply side and recycled.
Preferably, the wet method peel-off device also includes the buffer cell 2 being folded between gateway unit 1 and stripping unit 3；
The stripper being present in stripping unit 3 can produce corrosiveness, thus, the setting of buffer cell 2 to the material of gateway unit 1
Stripper can effectively be suppressed and spread to gateway unit 1.
When removing the photoresist on substrate using the wet method peel-off device wet method, first by the base with photoresist
Plate is transmitted to stripping unit 3 by the buffered unit 2 of gateway unit 1, and photoresist is the infiltration, expansion and dissolution in stripper
Under removed；Then substrate is transmitted to displacement unit 4 by stripping unit 3, displacement liquid wash and remove residual is on substrate
Stripper；Finally the substrate by displacement is transmitted to washing unit 5, drying unit 6 successively by displacement unit 4 washed and
Dry, and the wet method peel-off device is left through outlet port unit 7.
Thus, the displacement liquid replaced in unit 4 can wash off the stripper remained on substrate totally, when the base
When plate continues washing process, then monoethanolamine will not occur and meet water generation alkaline matter and then corrode other aluminium on substrate
The problem of matter element, therefore when the wet method peel-off device and its stripping means are applied in liquid crystal panel manufacturing process, can
Avoid influenceing the electrical of product, will not also be consequently formed mura bad phenomenon, product yield will be greatly improved.
Although the present invention has shown and described with reference to specific embodiment, it should be appreciated by those skilled in the art that：
In the case where not departing from the spirit and scope of the present invention limited by claim and its equivalent, can carry out herein form and
Various change in details.
Claims (9)
1. a kind of wet method peel-off device, the photoresist on substrate is removed for wet method；Characterized in that, the wet method peel-off device
Gateway unit, stripping unit, displacement unit, washing unit, drying unit and outlet port unit including being sequentially communicated setting；Its
In, the displacement unit provides displacement liquid and rinses the substrate, and remove the substrate with displacement remains after the stripping unit
Stripper.
2. wet method peel-off device according to claim 1, it is characterised in that the stripper includes dimethyl sulfoxide (DMSO) and second
Hydramine.
3. wet method peel-off device according to claim 2, it is characterised in that the displacement unit includes entrance liquid cutter and gone out
One's intention as revealed in what one says knife；The displacement liquid is dimethyl sulphoxide solution, and the entrance liquid cutter connects the supply side of the displacement liquid, the outlet
Air knife is removing the displacement liquid that the substrate remains after the entrance liquid cutter.
4. wet method peel-off device according to claim 3, it is characterised in that the displacement unit also includes displacement liquid and collected
End, the displacement liquid collecting terminal connect the supply side, and the displacement liquid blown off through the outlet air knife is back into the confession
To end.
5. wet method peel-off device according to claim 3, it is characterised in that the displacement unit is also described including being folded in
Spray nozzle between entrance liquid cutter and the outlet air knife, the spray nozzle enter tentatively to remove described in the substrate warp
The displacement liquid remained after oral fluid knife.
6. wet method peel-off device according to claim 5, it is characterised in that the displacement unit also includes displacement liquid and collected
End, the displacement liquid collecting terminal connect the supply side, the displacement liquid blown off through the spray nozzle are back into the confession
To end.
7. wet method peel-off device according to claim 3, it is characterised in that the purity of dimethyl sulfoxide (DMSO) in the displacement liquid
Not less than 99%.
8. according to any described wet method peel-off devices of claim 1-7, it is characterised in that the wet method peel-off device also includes
The buffer cell between the gateway unit and the stripping unit is connected, the buffer cell peels off list to suppress described
Stripper in member spreads to the gateway unit.
A kind of 9. method of wet method stripping photoresist, it is characterised in that methods described is based on as described in claim 1-8 is any
Wet method peel-off device, methods described include step：
S1, the substrate with photoresist transmitted to the stripping unit by the gateway unit, the photoresist is in the stripping
From being removed under the infiltration, expansion and dissolution of stripper in unit；
S2, the substrate is transmitted to the displacement unit, the displacement liquid replaced in unit by the stripping unit and rinsed
Remove the stripper of residual on the substrate；
S3, the substrate by displacement is transmitted to washing unit, drying unit successively by the displacement unit and is washed and is done
It is dry, and leave the wet method peel-off device through outlet port unit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711025369.8A CN107817657A (en) | 2017-10-26 | 2017-10-26 | Wet method peel-off device and its stripping means |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711025369.8A CN107817657A (en) | 2017-10-26 | 2017-10-26 | Wet method peel-off device and its stripping means |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107817657A true CN107817657A (en) | 2018-03-20 |
Family
ID=61604076
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711025369.8A Pending CN107817657A (en) | 2017-10-26 | 2017-10-26 | Wet method peel-off device and its stripping means |
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| Country | Link |
|---|---|
| CN (1) | CN107817657A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110161812A (en) * | 2019-06-06 | 2019-08-23 | 成都中电熊猫显示科技有限公司 | Heavy industry medical fluid and preparation method thereof, reworking apparatus |
| CN110187614A (en) * | 2019-05-13 | 2019-08-30 | 深圳市华星光电技术有限公司 | Photoresistive striping process and optical resistance-stripping device |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1391139A (en) * | 2001-06-08 | 2003-01-15 | 住友精密工业株式会社 | Substrate processing devices |
| JP2003090989A (en) * | 2001-09-19 | 2003-03-28 | Matsushita Electric Ind Co Ltd | Sheet-fed resist peeling equipment for single substrate |
| JP2007103565A (en) * | 2005-10-03 | 2007-04-19 | Dainippon Screen Mfg Co Ltd | System and method of recovering and reusing resist stripper |
| CN103995441A (en) * | 2014-06-11 | 2014-08-20 | 深圳市华星光电技术有限公司 | Light resistance stripping method and light resistance stripping device |
| CN104617018A (en) * | 2015-01-23 | 2015-05-13 | 深圳市华星光电技术有限公司 | Substrate processing device and substrate processing method |
| CN104716072A (en) * | 2013-12-16 | 2015-06-17 | 昆山国显光电有限公司 | Array substrate stripping system and method |
-
2017
- 2017-10-26 CN CN201711025369.8A patent/CN107817657A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1391139A (en) * | 2001-06-08 | 2003-01-15 | 住友精密工业株式会社 | Substrate processing devices |
| JP2003090989A (en) * | 2001-09-19 | 2003-03-28 | Matsushita Electric Ind Co Ltd | Sheet-fed resist peeling equipment for single substrate |
| JP2007103565A (en) * | 2005-10-03 | 2007-04-19 | Dainippon Screen Mfg Co Ltd | System and method of recovering and reusing resist stripper |
| CN104716072A (en) * | 2013-12-16 | 2015-06-17 | 昆山国显光电有限公司 | Array substrate stripping system and method |
| CN103995441A (en) * | 2014-06-11 | 2014-08-20 | 深圳市华星光电技术有限公司 | Light resistance stripping method and light resistance stripping device |
| CN104617018A (en) * | 2015-01-23 | 2015-05-13 | 深圳市华星光电技术有限公司 | Substrate processing device and substrate processing method |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110187614A (en) * | 2019-05-13 | 2019-08-30 | 深圳市华星光电技术有限公司 | Photoresistive striping process and optical resistance-stripping device |
| CN110161812A (en) * | 2019-06-06 | 2019-08-23 | 成都中电熊猫显示科技有限公司 | Heavy industry medical fluid and preparation method thereof, reworking apparatus |
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Application publication date: 20180320 |
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