CN107783378B - A kind of vertical micromotion structure of litho machine and control method - Google Patents
A kind of vertical micromotion structure of litho machine and control method Download PDFInfo
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70766—Reaction force control means, e.g. countermass
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
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Abstract
The present invention provides a kind of vertical micromotion structure of litho machine and control method, at least four sensors will be arranged below photo-etching machine exposal platform in it, and use the calculating analysis system of the measurement transition matrix comprising capableing of Measurement redundancy position, position signal transmitted by four sensors is analyzed, using the desired locations of photo-etching machine exposal platform as target, analyze acceleration when photo-etching machine exposal platform catenary motion to desired locations, due to using above-mentioned calculating analysis system that can measure redundant position, therefore these useless redundant datas can be filtered when calculating analysis, accurately analyze driving force and acceleration required when photo-etching machine exposal platform catenary motion to desired locations, therefore the present invention can be improved the precision to photo-etching machine exposal platform vertical fine motion control compared with the existing technology.
Description
Technical field
The present invention relates to semiconductor lithography machine field, in particular to the vertical micromotion structure of a kind of litho machine and control method.
Background technique
Lithographic equipment is a kind of machine that mask pattern is applied on target silicon wafer, be mainly used for integrated circuit IC or
The manufacture of other microdevices.By lithographic equipment, the layered mask with different mask patterns in the case where precisely aligning successively at
Picture is on the silicon wafer for being coated with photoresist, such as semi-conductor silicon chip or LCD panel.Lithographic equipment is generally divided into two classes, Yi Leishi
Stepping lithographic equipment, by the exposure area that whole mask pattern single exposures are imaged on to silicon wafer；Another kind of is scanning
Lithographic equipment, by the way that the pattern of mask plate is imaged in silicon in the forward direction of scanning direction projection exposure field or reverse scan movement
On piece.
In precise motion equipment, object gravity is affected to catenary motion, needs to take measures to compensate.Close
In litho machine over year, the combination that gravity compensator adds vertical motor, the special balance drive object of gravity compensator are generallyd use
Gravity, it is most common with gas-powered, also have by magnetic suspension or spring driven, and vertical motor is then responsible for driving object
Catenary motion carries out decoupling control.
In existing technology, the vertical control of exposure desk generally uses three gravity compensators and three vertical motors common
Driving.Gravity compensator provides stable static force, balances the gravity of exposure desk；Vertical motor provides dynamic force, driving exposure
Platform catenary motion.Design level and rotation air-bearing make it have the freedom degree in the direction Z, Rx and Ry in gravity compensator, lead to
It crosses vertical motor driven object and does decoupling motion relative to lower lying body.
In precise motion equipment in the prior art, the control of vertical motor and gravity compensator is generally controlled using separated
The mode of system controls Z, Rx and Ry Three Degree Of Freedom of object.As Chinese patent CN201210104004.5 (publication number:
CN103365108A, publication date: on October 23rd, 2013) described in, three motor vertical to exposure desk and three pneumatically supported controls point
For two control loops: the first via is used to control vertical motor, and the second tunnel is used to control gravity compensator, vertical motor and gravity
Compensator Parallel Control moving object can be adjusted respective control object by debugging two paths respectively, but still
So do not overcome the problems, such as that vertical bandwidth is relatively low, response speed is partially slow.
Summary of the invention
To solve the above problems, the invention proposes a kind of vertical micromotion structure of litho machine and control methods, to improve
The precision of control.
In order to achieve the above objectives, the present invention provides a kind of vertical micromotion structure of litho machine, including
Several gravity compensators are symmetrically distributed in the lower surface of photo-etching machine exposal platform；
Several driving devices are symmetrically distributed in the lower surface of the photo-etching machine exposal platform；
Several sensors are symmetrically distributed in the quadrangle of the photo-etching machine exposal platform, for the photo-etching machine exposal platform
Position carry out redundant measurement, and send amount of redundancy data-signal；
The mass center and the litho machine of mass center, all driving device formation that all gravity compensators are formed expose
The mass center of light table is overlapped；
Further include a calculating analysis system, is sent according to the physical location of the photo-etching machine exposal platform measured and the sensor
Amount of redundancy data-signal, after carrying out data analysis conversion, Xiang Suoshu driving device and the gravity compensator send control letter
Number, the driving device and the gravity compensator adjust institute after receiving the control signal that the calculating analysis system is sent
State the position of photo-etching machine exposal platform.
Preferably, the number of the sensor is at least four.
Preferably, the calculating analysis system and the driving device, the sensor form control loop, the control
Circuit processed includes sequentially connected analysis module, control module, the driving device, the sensor, feedback module, described anti-
It presents module and connects the analysis module.
Preferably, there is the feedback module redundant position to measure transition matrix.
Preferably, the analysis module includes the generator module being sequentially connected in series, summation comparator, feedover summer,
It further include the feedforward gain module in parallel with the summation comparator.
Preferably, the generator module includes setting value generator parallel with one another, command generator and track letter
Number generator.
Preferably, the setting value generator is digital signal processor or microprocessor.
Preferably, making X-axis with horizontal direction, it is in the horizontal plane Y-axis perpendicular to the direction of X-axis, is made with vertical direction
For Z axis, XYZ coordinate system is established in litho machine, the summation comparator includes Z axis summation comparator, Rx axis summation comparator
And Ry axis summation comparator.
Preferably, the control module includes signal controller parallel with one another, the signal controller includes Z axis position
Set controller, Rx axis Position Control device and Ry axis Position Control device.
Preferably, being also in series with gain transition matrix module between the control module and the driving device.
Preferably, being also in series with configuration state equation model module between the driving device and the sensor.
Preferably, the calculating analysis system is also connected with exciter response device.
Preferably, the exciter response device is symmetrically distributed in photo-etching machine exposal platform quadrangle, the exciter response
The node of vibration mode of position where device different from the photo-etching machine exposal platform.
Preferably, the gravity compensator is magnetic gravitation compensator.
Preferably, the driving device is voice coil motor.
The present invention also provides a kind of vertical fine motion control methods of litho machine, are symmetrical arranged in the lower surface of photo-etching machine exposal platform
Several gravity compensators, several driving devices, in several symmetrical sensors of the quadrangle of the photo-etching machine exposal platform,
Mass center, the mass center of all driving device formation and the matter of the photo-etching machine exposal platform that all gravity compensators are formed
The heart is overlapped, using the calculating analysis system with redundant position measurement transition matrix, according to the reality of the photo-etching machine exposal platform measured
The amount of redundancy data-signal that border position and the sensor are sent, after carrying out data analysis conversion, Xiang Suoshu driving device and institute
It states gravity compensator and sends control signal, the driving device and the gravity compensator are receiving the calculating analysis system
The position that the photo-etching machine exposal platform is adjusted after the control signal of transmission makes it reach desired locations.
Preferably, the following steps are included:
Step S1: three voice coil motors, four sensors and four gravity are installed on the photo-etching machine exposal platform and are mended
Device is repaid, and the voice coil motor, sensor are all connect with calculating analysis system with the gravity compensator；
Step S2: the actual position coordinate for calculating analysis system and measuring the photo-etching machine exposal platform at this time, the meter
Setting value generator in point counting analysis system sets the desired locations coordinate and desired acceleration of the photo-etching machine exposal platform；
Step S3: the command generator calculated in analysis system is by actual position coordinate described in step S2 and described
Desired locations coordinate compares in summation comparator, the error signal compared is sent to signal controller, and by described
The error signal is converted logic axle control force signal by signal controller；Trajectory signal hair in the calculating analysis system
Raw device is calculated according to the result compared generates Acceleration Control signal；
Step S4: the Acceleration Control signal in step S3 forms feedforward compensation letter after feedforward gain module
Number, and control force signal is formed by feedforward summer；
Step S5: by all signals in step S3 neutralization procedure S4 by redundant position measurement transition matrix conversion
The driving signal for obtaining the voice coil motor afterwards, after receiving the driving signal, the voice coil motor drives the photoetching
The movement of machine exposure desk.
It is in the horizontal plane Y-axis perpendicular to the direction of X-axis, to hang down preferably, making X-axis with horizontal direction
Histogram establishes XYZ coordinate system, the redundant position measures transition matrix to as Z axis in litho machineWherein lyi, lxiIt (i=1,2,3......n) is respectively the sensor position
To photo-etching machine exposal platform center of gravity distance projection in the Y direction with the length in X-direction, ξi(i=1,2,3,4) it shakes for the i-th rank
The Mode Shape parameter in the sensor position is moved, n is the number of the sensor, n >=4.
Preferably, Mode Shape parameter ξi(i=1,2,3,4) determination method are as follows: in the photo-etching machine exposal platform four
The symmetrical exciter response device in angle, tapping the photo-etching machine exposal platform using power hammer vibrates the photo-etching machine exposal platform, together
The exercise data at four exciter response devices when photo-etching machine exposal platform described in Shi Suoshu sensor measurement vibrates is concurrent
It send to the calculating analysis system, the calculating analysis system obtains the photo-etching machine exposal by Mode Shape discrimination method
The vibration amplitude of the Mode Shape of platform and each exciter response device position.
Preferably, the calculating analysis system obtains the vibration amplitude of each exciter response device position
Method is the movement of vibration at the photo-etching machine exposal platform four exciter response devices places for sending the sensor
Data are sent to A/D converter, the signal of the exercise data are converted into digital signal, and carry out Fu to the digital signal
In leaf transformation, frequency response function is formed by digital signal processing method, the calculating analysis system is by all exciter responses
The frequency response function that the exercise data that device is sent is formed carries out parameter identification, estimates the Mode Shape of the photo-etching machine exposal platform
With the vibration amplitude at each exciter response device place.
Compared with prior art, the beneficial effects of the present invention are: the present invention provide a kind of vertical micromotion structure of litho machine and
At least four sensors will be arranged in control method below photo-etching machine exposal platform, and using comprising capableing of Measurement redundancy position
The calculating analysis system for measuring transition matrix, analyzes position signal transmitted by four sensors, with photo-etching machine exposal
The desired locations of platform are target, analyze acceleration when photo-etching machine exposal platform catenary motion to desired locations, above-mentioned due to using
It calculates analysis system and is able to carry out redundant measurement, therefore be able to suppress maximum frequency in vibration frequency curve when calculating analysis
The Mode Shape that rate is shown, accurately analyze driving force required when photo-etching machine exposal platform catenary motion to desired locations and
Acceleration, therefore the present invention can be improved the precision to photo-etching machine exposal platform vertical fine motion control compared with the existing technology.
Detailed description of the invention
Fig. 1 is vertical micromotion structure schematic diagram provided by the invention；
Fig. 2 is the control system architecture schematic diagram of vertical micromotion structure provided by the invention；
Fig. 3 is that the exposure desk vertical mode parameter method of determination that the present invention provides motivates respective point schematic diagram；
Fig. 4 compares figure to letter is passed for Ry under normal triaxial driving and redundant drive provided by the invention；
Fig. 5 is parameter identification method flow chart provided by the invention.
In figure: 100- photo-etching machine exposal platform, the first voice coil motor of 101a-, the second voice coil motor of 101b-, 101c- third sound
Enclose motor, the first gravity compensator of 102a-, the second gravity compensator of 102b-, 102c- third gravity compensator, 102d- the 4th
Gravity compensator, 103a- first sensor, 103b- second sensor, 103c- 3rd sensor, the 4th sensor of 103d-,
201- configuration state equation model, 202- gain transition matrix, 203- measurement transition matrix, 204- generator module, 205- letter
Number controller, 206- feedforward gain module, 207- summation comparator, 208- feedforward summer, the first exciter response of 301a- device,
The second exciter response of 301b- device, 301c- third exciter response device, the 4th exciter response device of 301d-.
Specific embodiment
In order to make the foregoing objectives, features and advantages of the present invention clearer and more comprehensible, with reference to the accompanying drawing to the present invention
Specific embodiment be described in detail.
Fig. 1 is please referred to, the present invention provides a kind of vertical micromotion structure of litho machine, including
Several gravity compensators are symmetrically distributed in the lower surface of photo-etching machine exposal platform 100, in the present embodiment, share
Four symmetrical gravity compensators, respectively the first gravity compensator 102a, the second gravity compensator 102b, third gravity
Compensator 102b, the 4th gravity compensator 102d, gravity compensator are specially that magnetic compensation device can with vertical repulsion
To be compensated to gravity；
Several driving devices are symmetrically distributed in the lower surface of the photo-etching machine exposal platform 100, in the present embodiment, drive
Dynamic device is specially voice coil motor, and 100 lower surface of photo-etching machine exposal platform is dispersed with three symmetrical voice coil motors, respectively
First voice coil motor 101a, the second voice coil motor 101b, third voice coil motor 101c；
Several sensors are symmetrically distributed in the quadrangle of the photo-etching machine exposal platform 100, for the photo-etching machine exposal
The position of platform 100 carries out redundant measurement, and sends amount of redundancy data-signal, and there are four symmetrical biographies altogether in the present embodiment
Sensor, respectively first sensor 103a, second sensor 103b, 3rd sensor 103c, the 4th sensor 103d；
The mass center and the litho machine of mass center, all voice coil motor formation that all gravity compensators are formed expose
The mass center of light table 100 is overlapped；
It further include a calculating analysis system, according to the physical location of the photo-etching machine exposal platform 100 measured and the sensor
The redundant position data-signal of transmission, after carrying out data analysis conversion, Xiang Suoshu driving device and the gravity compensator are sent
Signal, the driving device and the gravity compensator are controlled after receiving the control signal that the calculating analysis system is sent
Adjust the position of the photo-etching machine exposal platform 100.
Specifically, referring to figure 2., the calculating analysis system is to be formed and controlled with three voice coil motors, four sensors
Circuit, the control loop include sequentially connected analysis module, control module, three voice coil motors, four sensors and
Feedback module, the feedback module connect the analysis module.
Analysis module includes the generator module 204 being sequentially connected in series, summation comparator 207, feedforward summer 208, is also wrapped
Include the feedforward gain module 206 in parallel with the summation comparator 207.
Preferably, the feedback module is the measurement transition matrix 203 with redundant position.
Preferably, the generator module 204 include setting value generator in parallel, command generator (not shown) and
Trajectory signal generator (not shown).
Preferably, the setting value generator is digital signal processor or microprocessor.
Preferably, making X-axis with horizontal direction, it is in the horizontal plane Y-axis perpendicular to the direction of X-axis, is made with vertical direction
For Z axis, XYZ coordinate system is established in litho machine, the summation comparator 207 includes that Z axis summation comparator, the Rx axis of parallel connection are asked
With comparator and Ry axis summation comparator.
Preferably, the control module includes signal controller 205, the signal controller 205 includes Z axis in parallel
Positioner, Rx axis Position Control device and Ry axis Position Control device.
Preferably, being also in series with gain transition matrix 202 between the control module and the voice coil motor.
Preferably, being also in series with configuration state equation model 201 between the voice coil motor and the measuring device.
Preferably, being symmetrically distributed with exciter response device at 100 4 jiaos of the photo-etching machine exposal platform, respectively first swashs
Responsor 301a, the second exciter response device 301b, third exciter response device 301c, the 4th exciter response device 301d are encouraged, it is all to swash
The position where responding device is encouraged different from the node of vibration mode of the photo-etching machine exposal platform 100.
The present invention also provides a kind of fine motion control method using the vertical micromotion structure of above-mentioned litho machine, specifically:
Step S1: the photoetching machine equipment with the vertical micromotion structure of above-mentioned litho machine is provided；
Step S2: the actual position coordinate for calculating analysis system and measuring the photo-etching machine exposal platform 100 at this time, it is described
Calculate analysis system in setting value generator set the photo-etching machine exposal platform 100 desired locations coordinate (Z, Rx, Ry) and
It is expected that acceleration (acc_z, acc_rx, acc_ry)；
Step S3: the command generator calculated in analysis system is by actual position coordinate described in step 1 and described
Desired locations coordinate (Z, Rx, Ry) compares in summation comparator, and the error signal compared is sent to signal controller
205, and logic axle control force signal is converted by the error signal by the signal controller 205Generator
Trajectory signal generator in module 204 is calculated according to the result compared generates Acceleration Control signal, Acceleration Control
Signal is by obtaining the distance between the actual position coordinate and the desired locations coordinate (Z, Rx, Ry) differential；
Step S4: the Acceleration Control signal in step S3 forms feedforward compensation after feedforward gain module 206
SignalAnd control force signal is formed by feedforward summer 208；
Step S5: by all signals in step S4 after the measurement transition matrix 203 of the redundant position converts
To the driving signal of three voice coil motors, its calculation formula isWherein lyi,
lxi(i=1,2,3,4) be respectively all the sensors position to photo-etching machine exposal platform 100 center of gravity distance projection in the Y direction and X
Length on direction, φ are contribution amount of the sensor to the i-th first order mode.When φ is taken as 0, then the i-th rank vibration frequency will be by
Inhibit, ξi(i=1,2,3,4) is Mode Shape parameter of the i-th rank vibration in sensor position, Z1、Z2、Z3、Z4Respectively four
The vertical position coordinate of sensor, after receiving driving signal, three voice coil motors drive the photo-etching machine exposal platform 100 to transport
It is dynamic.
Measurement transition matrix 203 is not limited to only receive the signal of 4 sensor transmissions, when needing multiple sensors,
Calculation matrix is shown asWherein n is the number of sensor, n >=4.Institute as above
It states, general 4 sensors can only compensate first-order modal, that is to say, that the mode of certain single order in can inhibiting vertical, due to photoetching
Machine exposure desk 100 is high-frequency vibration, and influence of this vibration to control precision is relatively small, so 4 sensors only need to inhibit
Peak value namely maximum vibration frequency of the photo-etching machine exposal platform 100 on vibration frequency curve.
Referring to figure 4., it can be seen from the figure that Ry is provided to the first order frequency showed on letter is passed using the present invention
Be capable of Measurement redundancy position measurement transition matrix measurement after be effectively suppressed, it is possible thereby to effectively improve control precision.
Preferably, Mode Shape parameter ξiThe determination method of (i=1,2,3,4) are as follows: referring to figure 3. and Fig. 5, described
100 4 jiaos of photo-etching machine exposal platform symmetrical exciter response devices are made described using the power hammer percussion photo-etching machine exposal platform 100
Photo-etching machine exposal platform 100 vibrate, while photo-etching machine exposal platform 100 described in sensor measurement vibrate when exercise data and be sent to
The calculating analysis system, the photo-etching machine exposal platform 100 for calculating analysis system and sending the exciter response device
Vibration motion data are sent to A/D converter, so that the signal of 100 exercise data of photo-etching machine exposal platform is converted into digital signal,
And Fourier transformation is carried out to the digital signal, frequency response function, the calculating analysis are formed by digital signal processing method
The frequency response function that the exercise data that all exciter response devices are sent is formed is carried out parameter identification by system, utilizes multinomial
Curve-fitting method estimate the photo-etching machine exposal platform 100 Mode Shape and each exciter response device position
Vibration amplitude, the as Mode Shape of the position.
In view of each point has an x, y, z three degree of freedom, then 4 points totally 12 vibration amplitudes.Current embodiment require that at least
Determine 4 Mode Shape parameters, theoretically at least four point can just be met the requirements, it is contemplated that sensor can be added, inhibit more
Mode, therefore the points that can be chosen are greater than 4 points, that is to say, that number can be set greater than four sensors.In this reality
It applies in example, ξ1,ξ2,ξ3,ξ4Respectively the first exciter response device 301a, the second exciter response device 301b, third exciter response device
Z at 301c, the 4th position exciter response device 301d is to amplitude.
The present invention provides a kind of vertical micromotion structure of photoetching and control method, will be arranged below photo-etching machine exposal platform 100
At least four sensors, and using the calculating analysis system of the measurement transition matrix 203 comprising capableing of Measurement redundancy position, to four
Position signal transmitted by a sensor is analyzed, and using the desired locations of photo-etching machine exposal platform 100 as target, analyzes litho machine
Acceleration when 100 catenary motion of exposure desk to desired locations is surveyed due to using above-mentioned calculating analysis system to be able to carry out redundancy
Amount, therefore it is able to suppress the Mode Shape that maximum frequency is shown in vibration frequency curve when calculating analysis, accurately
Driving force and acceleration required when 100 catenary motion of photo-etching machine exposal platform to desired locations are analyzed, therefore the present invention is opposite
It can be improved the precision to the vertical fine motion of photo-etching machine exposal platform 100 control in the prior art.
Above-described embodiment is described in the present invention, but the present invention is not limited only to above-described embodiment.Obvious this field
Technical staff can carry out various modification and variations without departing from the spirit and scope of the present invention to invention.If in this way, this hair
These bright modifications and variations within the scope of the claims of the present invention and its equivalent technology, then the invention is also intended to include
Including these modification and variations.
Claims (20)
1. a kind of vertical micromotion structure of litho machine, which is characterized in that including
Several gravity compensators are symmetrically distributed in the lower surface of photo-etching machine exposal platform；
Several driving devices are symmetrically distributed in the lower surface of the photo-etching machine exposal platform；
Several sensors are symmetrically distributed in the quadrangle of the photo-etching machine exposal platform, for the position to the photo-etching machine exposal platform
Carry out redundant measurement is set, and sends amount of redundancy data-signal；
The mass center and the photo-etching machine exposal platform of mass center, all driving device formation that all gravity compensators are formed
Mass center be overlapped；
Further include a calculating analysis system, is sent according to the physical location of the photo-etching machine exposal platform measured and the sensor superfluous
Headroom data signal, after carrying out data analysis conversion, Xiang Suoshu driving device and the gravity compensator send control signal, institute
It states driving device and the gravity compensator and adjusts the light after receiving the control signal that the calculating analysis system is sent
Quarter machine exposure desk position；
The calculating analysis system and the driving device, the sensor form control loop.
2. the vertical micromotion structure of litho machine as described in claim 1, which is characterized in that the number of the sensor is at least four
It is a.
3. the vertical micromotion structure of litho machine as described in claim 1, which is characterized in that the calculating analysis system and the drive
Dynamic device, the sensor form control loop, and the control loop includes sequentially connected analysis module, control module, institute
Driving device, the sensor, feedback module are stated, the feedback module connects the analysis module.
4. the vertical micromotion structure of litho machine as claimed in claim 3, which is characterized in that the feedback module has redundant position
Measure transition matrix.
5. the vertical micromotion structure of litho machine as claimed in claim 3, which is characterized in that the analysis module includes being sequentially connected in series
Generator module, summation comparator, feedforward summer, further include and summation comparator feedforward gain module in parallel.
6. the vertical micromotion structure of litho machine as claimed in claim 5, which is characterized in that the generator module includes mutually simultaneously
Setting value generator, command generator and the trajectory signal generator of connection.
7. the vertical micromotion structure of litho machine as claimed in claim 6, which is characterized in that the setting value generator is number letter
Number processor or microprocessor.
8. the vertical micromotion structure of litho machine as claimed in claim 5, which is characterized in that make X-axis with horizontal direction, in horizontal plane
On perpendicular to the direction of X-axis be that Y-axis using vertical direction as Z axis establishes XYZ coordinate system in litho machine, the summation is compared
Device includes Z axis summation comparator, Rx axis summation comparator and Ry axis summation comparator.
9. the vertical micromotion structure of litho machine as claimed in claim 8, which is characterized in that the control module includes parallel with one another
Signal controller, the signal controller includes Z axis positioner, Rx axis Position Control device and Ry axis Position Control
Device.
10. the vertical micromotion structure of litho machine as claimed in claim 3, which is characterized in that the control module and the driving
Gain transition matrix module is also in series between device.
11. the vertical micromotion structure of litho machine as claimed in claim 3, which is characterized in that the driving device and the sensing
Configuration state equation model module is also in series between device.
12. the vertical micromotion structure of litho machine as claimed in claim 3, which is characterized in that the calculating analysis system is also connected with
There is exciter response device.
13. the vertical micromotion structure of litho machine as claimed in claim 12, which is characterized in that the exciter response device symmetrically divides
Cloth is in the position where photo-etching machine exposal platform quadrangle, the exciter response device different from the vibration shape of the photo-etching machine exposal platform
Node.
14. the vertical micromotion structure of litho machine as described in claim 1, which is characterized in that the gravity compensator is magnetic force weight
Force compensating device.
15. the vertical micromotion structure of litho machine as described in claim 1, which is characterized in that the driving device is voice coil motor.
16. a kind of vertical fine motion control method of litho machine, which is characterized in that if being symmetrical arranged in the lower surface of photo-etching machine exposal platform
Dry gravity compensator, several driving devices, in several symmetrical sensors of the quadrangle of the photo-etching machine exposal platform, institute
Mass center, the mass center of all driving device formation and the mass center of the photo-etching machine exposal platform for thering is the gravity compensator to be formed
It is overlapped, using the calculating analysis system with redundant position measurement transition matrix, according to the reality of the photo-etching machine exposal platform measured
The amount of redundancy data-signal that position and the sensor are sent, after carrying out data analysis conversion, Xiang Suoshu driving device and described
Gravity compensator sends control signal, the driving device and the gravity compensator and is receiving the calculating analysis system hair
The position that the photo-etching machine exposal platform is adjusted after the control signal sent makes it reach desired locations；
The calculating analysis system and the driving device, the sensor form control loop.
17. the vertical fine motion control method of litho machine as claimed in claim 16, which comprises the following steps:
Step S1: installing three voice coil motors, four sensors and four gravity compensators on the photo-etching machine exposal platform,
And the voice coil motor, sensor are all connect with calculating analysis system with the gravity compensator；
Step S2: the actual position coordinate for calculating analysis system and measuring the photo-etching machine exposal platform at this time, described calculate are divided
Setting value generator in analysis system sets the desired locations coordinate and desired acceleration of the photo-etching machine exposal platform；
Step S3: the command generator calculated in analysis system is by actual position coordinate described in step S2 and the expectation
Position coordinates compare in summation comparator, the error signal compared are sent to signal controller, and by the signal
The error signal is converted logic axle control force signal by controller；Trajectory signal generator in the calculating analysis system
It is calculated according to the result compared and generates Acceleration Control signal；
Step S4: the Acceleration Control signal in step S3 forms feedforward compensation signal after feedforward gain module, and
Control force signal is formed by feedforward summer；
Step S5: by all signals in step S3 neutralization procedure S4 after redundant position measurement transition matrix conversion
To the driving signal of the voice coil motor, after receiving the driving signal, the voice coil motor drives the litho machine to expose
Light table movement.
18. the vertical fine motion control method of litho machine as claimed in claim 16, which is characterized in that X-axis is made with horizontal direction,
XYZ coordinate system is established in litho machine using vertical direction as Z axis for Y-axis perpendicular to the direction of X-axis on horizontal plane, it is described superfluous
Remaining position measures transition matrixWherein lyi, lxi(i=1,2,3......n) divide
Not Wei the sensor position to photo-etching machine exposal platform center of gravity distance projection in the Y direction with the length in X-direction, ξi(i=
It 1,2,3,4) is the vibration of the i-th rank in the Mode Shape parameter of the sensor position, n is the number of the sensor, n >=4.
19. the vertical fine motion control method of litho machine as claimed in claim 18, which is characterized in that Mode Shape parameter ξi(i=
1,2,3,4) determination method are as follows: in the symmetrical exciter response device in photo-etching machine exposal platform quadrangle, hammered into shape and tapped using power
The photo-etching machine exposal platform vibrates the photo-etching machine exposal platform, while photo-etching machine exposal platform described in the sensor measurement vibrates
When four exciter response devices at exercise data and be sent to the calculating analysis system, the calculating analysis system
By Mode Shape discrimination method, obtain the photo-etching machine exposal platform Mode Shape and each exciter response device institute
Vibration amplitude in position.
20. the vertical fine motion control method of litho machine as claimed in claim 19, which is characterized in that the calculating analysis system obtains
The method for taking the vibration amplitude of each exciter response device position is the litho machine for sending the sensor
The exercise data vibrated at where the exposure desk four exciter response devices is sent to A/D converter, by the exercise data
Signal be converted into digital signal, and Fourier transformation is carried out to the digital signal, is formed by digital signal processing method
Frequency response function, it is described calculate frequency response function that the exercise data that analysis system sends all exciter response devices is formed into
The identification of row parameter estimates the vibration at the Mode Shape and each exciter response device place of the photo-etching machine exposal platform
Amplitude.
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