CN107699857B - 一种方便散热的靶材安装装置 - Google Patents
一种方便散热的靶材安装装置 Download PDFInfo
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- CN107699857B CN107699857B CN201710894600.0A CN201710894600A CN107699857B CN 107699857 B CN107699857 B CN 107699857B CN 201710894600 A CN201710894600 A CN 201710894600A CN 107699857 B CN107699857 B CN 107699857B
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- side wall
- fixedly mounted
- block
- slide
- heat dissipation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cooling Or The Like Of Electrical Apparatus (AREA)
- Devices That Are Associated With Refrigeration Equipment (AREA)
Abstract
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Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201710894600.0A CN107699857B (zh) | 2017-09-28 | 2017-09-28 | 一种方便散热的靶材安装装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201710894600.0A CN107699857B (zh) | 2017-09-28 | 2017-09-28 | 一种方便散热的靶材安装装置 |
Publications (2)
Publication Number | Publication Date |
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CN107699857A CN107699857A (zh) | 2018-02-16 |
CN107699857B true CN107699857B (zh) | 2020-01-17 |
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Application Number | Title | Priority Date | Filing Date |
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CN201710894600.0A Active CN107699857B (zh) | 2017-09-28 | 2017-09-28 | 一种方便散热的靶材安装装置 |
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CN (1) | CN107699857B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN115069715A (zh) * | 2021-03-10 | 2022-09-20 | 上海墨睿实业有限公司 | 一种低温等离子废气的收集装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH665057A5 (de) * | 1984-07-20 | 1988-04-15 | Balzers Hochvakuum | Targetplatte fuer kathodenzerstaeubung. |
JPH11323542A (ja) * | 1998-05-13 | 1999-11-26 | Sony Corp | スパッタリング装置 |
CN1836307A (zh) * | 2003-06-20 | 2006-09-20 | 卡伯特公司 | 溅镀靶安装到垫板上的方法和设计 |
CN105714255A (zh) * | 2016-04-27 | 2016-06-29 | 芜湖真空科技有限公司 | 易冷却的玻璃溅射机构 |
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2017
- 2017-09-28 CN CN201710894600.0A patent/CN107699857B/zh active Active
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Date | Code | Title | Description |
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PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20201204 Address after: 241000 No.32 Chunjiang Road, Qingshui street, Jiujiang District, Wuhu City, Anhui Province Patentee after: Yang Jiawei Address before: 210000 No. 89, double high road, Gaochun Economic Development Zone, Jiangsu, Nanjing, China Patentee before: NANJING BAOLIJING ELECTRONIC TECHNOLOGY Co.,Ltd. |
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TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20220519 Address after: 518132 first floor, No. 16, second industrial zone, Xiacun community, Gongming street, Guangming District, Shenzhen, Guangdong Province Patentee after: SHENZHEN APG MATERIAL TECHNOLOGY Co.,Ltd. Address before: 241000 No.32 Chunjiang Road, Qingshui street, Jiujiang District, Wuhu City, Anhui Province Patentee before: Yang Jiawei |
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TR01 | Transfer of patent right | ||
CP03 | Change of name, title or address |
Address after: 518000 1st floor, No.16, second industrial zone, Xiacun community, Gongming street, Guangming District, Shenzhen City, Guangdong Province Patentee after: Shenzhen Zhongchengda Applied Materials Co.,Ltd. Address before: 518132 first floor, No. 16, second industrial zone, Xiacun community, Gongming street, Guangming District, Shenzhen, Guangdong Province Patentee before: SHENZHEN APG MATERIAL TECHNOLOGY Co.,Ltd. |
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CP03 | Change of name, title or address |