CN107692702B - LED pattern mirror and preparation method thereof - Google Patents

LED pattern mirror and preparation method thereof Download PDF

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Publication number
CN107692702B
CN107692702B CN201710976340.1A CN201710976340A CN107692702B CN 107692702 B CN107692702 B CN 107692702B CN 201710976340 A CN201710976340 A CN 201710976340A CN 107692702 B CN107692702 B CN 107692702B
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Prior art keywords
groove area
base
led
led lamp
lamp strip
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CN107692702A (en
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沈荣炎
曹辉
宫力有
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Zhejiang Donna Home Furnishing Co ltd
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Zhejiang Donna Home Furnishing Co ltd
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    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47G—HOUSEHOLD OR TABLE EQUIPMENT
    • A47G1/00—Mirrors; Picture frames or the like, e.g. provided with heating, lighting or ventilating means
    • A47G1/02—Mirrors used as equipment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/28—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases more than one element being applied in one step
    • C23C8/30—Carbo-nitriding
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V33/00—Structural combinations of lighting devices with other articles, not otherwise provided for
    • F21V33/0004—Personal or domestic articles
    • F21V33/004—Sanitary equipment, e.g. mirrors, showers, toilet seats or paper dispensers
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
    • F21Y2115/00—Light-generating elements of semiconductor light sources
    • F21Y2115/10—Light-emitting diodes [LED]

Abstract

The invention relates to an LED pattern mirror, and belongs to the technical field of life mirrors. The LED pattern mirror comprises a long outer frame and a base, wherein glass is embedded on the outer frame, a diffusion plate is arranged between the base and the glass, an edge groove area is formed between the outer frame and the base, a bottom groove area is formed between the lower part of the base and the outer frame, a middle groove area is formed in the middle of the base, a driving power supply is arranged in the middle groove area, reflective films are arranged at the bottoms of the edge and bottom groove areas, a first LED lamp strip is attached to a luminescent film of the edge groove area, a second LED lamp strip is attached to a reflective film of the bottom groove area, and the first LED lamp strip and the second LED lamp strip are connected to the driving power supply in parallel. The reflective film takes aluminum as a matrix, and a light blue AlCrCN layer is arranged on the upper surface of the matrix. The LED patterned mirror can conveniently carry out personalized qualitative design on the LED lamp belt according to the requirements of customers; the adopted reflective film is light blue, has better reflective effect and good durability, and can be used in humid environments such as bathrooms.

Description

LED pattern mirror and preparation method thereof
Technical Field
The invention relates to the technical field of life mirrors, in particular to an LED pattern mirror and a preparation method thereof.
Background
Mirrors have been a necessity for human life for thousands of years. In life, a common mirror mainly comprises a mirror frame and a front glass plate, and a reflecting film or a reflecting plate can be arranged in the mirror frame for enhancing the reflecting effect. The LED light source has the advantages of high luminous efficiency, long service life, low heat productivity, no heat radiation and soft light color, and is used in the mirror to develop the LED mirror in recent years along with the popularization of the LED light source, and in order to enhance the rendering effect, a reflective film is usually arranged in the base of the LED mirror.
Disclosure of Invention
In order to solve the technical problems in the prior art, the invention aims to provide an LED pattern mirror and a preparation method thereof.
The utility model provides a LED decorative pattern mirror, includes rectangular frame and the base that is located the frame, inlay on the frame and be equipped with glass, and be provided with the diffuser plate, its characterized in that between base and the glass: an edge groove area is formed between the outer frame and the base, a bottom groove area is formed between the lower portion of the base and the bottom edge of the outer frame, a middle groove area is formed in the middle of the base, a driving power supply is arranged in the middle groove area, reflective films are arranged at the bottoms of the edge groove area and the bottom groove area, a first LED lamp strip is attached to a luminescent film of the edge groove area, a second LED lamp strip is attached to a reflective film of the bottom groove area, the first LED lamp strip and the second LED lamp strip are connected in parallel to the driving power supply, and the driving power supply comprises an LED controller.
The second LED lamp strip is formed by connecting a plurality of lamp strips in parallel and forms a customizable pattern area. The customizable pattern area refers to an LED lamp strip pattern area which can be spliced according to the shape pattern required by customers or design development.
Wherein the diffusion plate is selected from one of polycarbonate, polyethylene, polypropylene, polyvinyl chloride, polystyrene or polyethylene terephthalate.
The light reflecting film takes aluminum as a matrix, an AlCr alloy layer is arranged on the bottom surface of the matrix, and a light blue AlCrCN layer is arranged on the upper surface of the matrix.
Wherein, the light blue AlCrCN layer is expressed by Lab color system that the L value is 60-82, the a value is-5 to-15, and the b value is-12 to-35. Preferably, L is 69-81, a is-6 to-12, and b is-15 to-32; further preferably, L is 70 to 79, a is-7 to-10, and b is-15 to-22.
Wherein the AlCrCN layer contains 57.8-65.2 wt% of Al, 23.7-31.2 wt% of Cr, 7.4-9.7 wt% of N and 1.6-3.9 wt% of C.
The second aspect of the invention also relates to a preparation method of the LED patterned mirror.
The preparation method comprises the following steps:
(1) Preparing a rectangular outer frame comprising a base, wherein an edge groove area is formed between the outer frame and the base, a bottom groove area is formed between the lower part of the base and the bottom edge of the outer frame, and a middle groove area is formed in the middle of the base;
(2) A driving power supply is arranged in the middle groove area, and reflective films are arranged at the bottoms of the edge groove area and the bottom groove area;
(3) A first LED lamp strip is attached to the luminous film of the edge groove area, a second LED lamp strip is attached to the reflecting film of the bottom groove area, the first LED lamp strip and the second LED lamp strip are connected to the driving power supply in parallel, and the driving power supply comprises an LED controller;
(4) The diffusion plate is arranged on the base, and then the glass is embedded on the outer frame.
The second LED lamp strip is formed by connecting a plurality of lamp strips in parallel and forms a customizable pattern area.
The preparation method of the reflective film comprises the following steps:
preparing an aluminum substrate with the thickness of more than 0.05 mm;
depositing chromium Cr on the bottom surface and the upper surface of the aluminum foil substrate, wherein the thickness of the deposited chromium Cr is 0.01-0.50 mu m;
performing heat treatment at 390-520 ℃ to diffuse aluminum in the aluminum foil matrix and deposited chromium to form an aluminum-chromium alloy layer;
carbonitriding is carried out on the surface of one of the aluminum chrome alloy layers in a heat treatment furnace, and a light blue AlCrCN layer can be obtained by controlling the gas atmosphere in the co-cementation furnace.
Wherein, a plasma infiltration process is adopted, and N in a heat treatment furnace 2 The ventilation amount is 22-50 sccm, CH 4 The ventilation amount is 4-12 sccm, the applied direct current voltage is 400V, and the carbonitriding time is 50-60 min.
The LED pattern mirror has the following beneficial effects:
the LED pattern mirror can not only realize artistic combination of light and shadow, but also conveniently carry out personalized qualitative design on the LED lamp strip according to the requirements of customers; the adopted reflective film is light blue, has better reflective effect and good durability, and can be used in humid environments such as bathrooms.
Drawings
Fig. 1 is a schematic structural view of an LED patterned mirror according to the present invention.
Fig. 2 is a schematic view of a layered structure of a reflective film used in the present invention.
Detailed Description
The LED pattern mirrors according to the present invention will be further described below with reference to specific embodiments, so as to help those skilled in the art to more fully understand the inventive concept, technical solution of the present invention.
As shown in fig. 1, the LED pattern mirror of the present invention includes a rectangular outer frame 10 and a base 12 located in the outer frame, an edge groove region (not shown) is formed between the outer frame 10 and the base 12, a bottom groove region 11 is formed between the lower portion of the base 12 and the bottom edge of the outer frame 10, a middle groove region 13 is formed in the middle of the base 12, and a driving power supply 30 is disposed in the middle groove region 13. The bottoms of the edge groove area and the bottom groove area 11 are flatly attached with the reflective film, the luminous film of the edge groove area is attached with the first LED lamp strip 21, the reflective film of the bottom groove area 11 is attached with the second LED lamp strip 22, the first LED lamp strip 21 is formed by connecting four lamp strips around the edge in parallel, for example, 3528 soft adhesive dropping lamp strips can be adopted to cut the size according to the length around the edge groove area of the outer frame 10, the four lamp strips are connected in parallel and welded by using a silica gel wire, then the lamp strips are orderly attached to the reflective film at the bottom of the edge groove, the position is centered, and the welding position of the lamp strips is fixed by using hot melt adhesive to prevent tilting. The second LED lamp strip is formed by connecting a plurality of lamp strips in parallel and forms a customizable pattern area. The customizable pattern area refers to an LED lamp strip pattern area which can be spliced according to the shape pattern required by customers or design development. As an example, as shown in fig. 1, the LED strip pattern areas are mounted in parallel at intervals by 7 strips of the same length, and welded in parallel. The first LED strip 21 and the second LED strip 22 are connected to the driving power supply 30 through outgoing lines, the driving power supply 30 comprises an LED controller, the first LED strip 21 and the LED strip 22 are controlled by the LED controller to check whether the strip can work normally, the LED controller can select touch control, wireless control and other types, and for example, the opening and closing, brightness, color and the like of the LED strip can be controlled by touching or a mobile phone APP. After finishing, the impurities and dust in the grooves of the base are cleaned, the diffusion plate with the size being cut down is mounted on the base through double faced adhesive tape, and the diffusion plate is noticed that the diffusion plate cannot have defects such as black spots and scratches at the lighting position of the lamp strip, so that the lamp strip can be lighted for repeated inspection. And (3) coating a proper amount of glass cement on the inner wall of the outer frame, placing the glass on the base, and compacting, wherein the glass and four sides are flush and assembled.
As shown in fig. 2, the reflective film of the present invention uses aluminum as the substrate 50, and an AlCr alloy layer 51 is provided on the bottom surface of the substrate 50, and a light blue AlCrCN layer 52 is provided on the upper surface of the substrate 50, and the thickness of the aluminum substrate that can be used is not limited, and is preferably 0.050mm or more and 2.0mm or less, preferably 0.050mm to 0.50mm, more preferably 0.050 to 0.20mm, in order to keep flexibility and from the viewpoint of economy. The AlCr alloy layer has a thickness of 0.1 to 10.0. Mu.m, preferably 0.5 to 5.0. Mu.m, more preferably 0.5 to 3.0. Mu.m. Similarly, the thickness of the light blue AlCrCN layer is 0.10-1.0 μm, preferably 0.10-0.50 μm. The reflectance of the light reflecting film to visible light is 78% or more, more preferably 85% or more. The light blue AlCrCN layer is characterized in that the L value is 60-82, the a value is-5 to-15, and the b value is-12 to-35; preferably, L is 69-81, a is-6 to-12, and b is-15 to-32; further preferably, L is 70 to 79, a is-7 to-10, and b is-15 to-22. Preferably, the AlCrCN layer contains 57.8-65.2 wt% of Al, 23.7-31.2 wt% of Cr, 7.4-9.7 wt% of N and 1.6-3.9 wt% of C. The AlCr alloy layer arranged on the bottom surface of the aluminum substrate can endow the reflecting film with good weather resistance and water resistance, and the light blue AlCrCN layer is not only providedThe aesthetic feeling and the texture of the reflective film are improved, and the water resistance, weather resistance, wear resistance and discoloration resistance of the reflective film are improved. The preparation method of the reflective film comprises the following steps: firstly, an aluminum substrate, preferably a flexible aluminum foil substrate, is prepared, the thickness of which is, for example, 0.050mm to 2.0mm, preferably 0.050mm to 0.50mm, more preferably 0.050 to 0.20mm, and which is mirror finished so as to have good reflectivity to visible light, and is preferably subjected to pretreatment prior to use, which may include, for example, alkali washing and water washing to remove greasy dirt impurities and the like from the surface, thereby improving the adhesion between the aluminum substrate and the provided coating. Then, chromium Cr is deposited on the bottom surface and the upper surface of the aluminum foil substrate, and the thickness of the deposited chromium Cr is 0.01 to 0.50 μm, preferably 0.05 to 0.50 μm, more preferably 0.05 to 0.30 μm. The method for depositing the chromium can adopt PVD (physical vapor deposition) coating methods such as vapor deposition, sputtering, ion plating and the like, and also can adopt CVD coating methods such as chemical vapor deposition, plasma enhanced chemical vapor deposition and the like, and for aluminum foil, a roll-to-roll coating mode can be adopted for improving coating efficiency. In the present invention, the sputtering coating method or the ion coating method is preferable. Then, a heat treatment is performed to diffuse aluminum in the aluminum foil matrix and the deposited chromium to form an aluminum chromium alloy layer, and the temperature of the heat treatment is preferably 390 to 520 ℃, more preferably 420 to 480 ℃. Finally, carbonitriding is carried out on the surface of one of the aluminum chrome alloy layers in a heat treatment furnace, and a light blue AlCrCN layer can be obtained by controlling the gas atmosphere in the heat treatment furnace, and the carburizing gas can be, for example, common methane, ethane, propane and the like, and is preferably CH 4 The nitriding gas may be nitrogen, for example, preferably, a plasma cementation process, and N in a heat treatment furnace 2 The ventilation amount is 22-50 sccm, CH 4 The ventilation amount is 4-12 sccm, the applied direct current voltage is 400V, and the carbonitriding time is 50-60 min. Inert gases such as argon and the like can be added for conveniently controlling the atmosphere of the carbonitriding gas. In the present invention, in order to improve efficiency, a roll-to-roll continuous process, i.e., a process step of continuously performing Cr deposition, heat treatment, and carbonitriding, is preferably employedThe steps are all carried out in vacuum equipment.
Example 1
The present example prepares an aluminum-based reflective film. Firstly, an aluminum foil with the thickness of 50 mu m is selected as a matrix, alkaline degreasing liquid is adopted for alkaline cleaning and degreasing, and then water cleaning and drying are carried out. Cleaning in the pretreatment cavity, vacuumizing and preheating the pretreatment cavity to make the vacuum degree in the pretreatment cavity be 5×10 -3 And (3) introducing argon gas below Pa, and cleaning to remove an oxide film layer on the surface of the aluminum foil. Then, chromium was deposited on the surface of the aluminum foil in a vacuum plating chamber provided with a chromium target, 10sccm of Ar was introduced into the vacuum plating chamber after the vacuum plating chamber was evacuated, and a direct current voltage of 400V was applied to generate Ar plasma, the ionization voltage of the chromium target was set to 50V, the ionization current was set to 30A, and a chromium layer having a thickness of 0.03 μm was formed on both the bottom surface and the upper surface of the aluminum foil. Subsequently, forming an AlCr alloy layer by heat treatment at 390 ℃ for 50 minutes in a vacuum heat treatment furnace; finally, carbonitriding AlCr alloy layer on one surface in a heat treatment furnace, and N in the carbonitriding furnace 2 The passage amount of (C) is 22sccm, CH 4 The resulting film was subjected to a 10sccm passage, a 400V DC voltage was applied, and carbonitriding was performed for 50 minutes, and then cooled to room temperature to obtain a reflective film having a layer structure shown in FIG. 2.
Example 2
The present example prepares an aluminum-based reflective film. Firstly, an aluminum foil with the thickness of 50 mu m is selected as a matrix, alkaline degreasing liquid is adopted for alkaline cleaning and degreasing, and then water cleaning and drying are carried out. Cleaning in the pretreatment cavity, vacuumizing and preheating the pretreatment cavity to make the vacuum degree in the pretreatment cavity be 5×10 -3 And (3) introducing argon gas below Pa, and cleaning to remove an oxide film layer on the surface of the aluminum foil. Then, chromium was deposited on the surface of the aluminum foil in a vacuum plating chamber provided with a chromium target, 10sccm of Ar was introduced into the vacuum plating chamber after the vacuum plating chamber was evacuated, and a direct current voltage of 400V was applied to generate Ar plasma, the ionization voltage of the chromium target was set to 50V, the ionization current was set to 30A, and a chromium layer having a thickness of 0.05 μm was formed on both the bottom surface and the upper surface of the aluminum foil. Subsequently, at 42 in a vacuum heat treatment furnaceHeat treatment is carried out for 60 minutes at 0 ℃ to form an AlCr alloy layer; finally, carbonitriding AlCr alloy layer on one surface in a heat treatment furnace, and N in the carbonitriding furnace 2 The passage amount of (C) is 22sccm, CH 4 The resulting film was subjected to a 10sccm passage, a 400V DC voltage was applied, and carbonitriding was performed for 60 minutes, and then cooled to room temperature to obtain a reflective film having a layer structure shown in FIG. 2.
Example 3
The present example prepares an aluminum-based reflective film. Firstly, an aluminum foil with the thickness of 50 mu m is selected as a matrix, alkaline degreasing liquid is adopted for alkaline cleaning and degreasing, and then water cleaning and drying are carried out. Cleaning in the pretreatment cavity, vacuumizing and preheating the pretreatment cavity to make the vacuum degree in the pretreatment cavity be 5×10 -3 And (3) introducing argon gas below Pa, and cleaning to remove an oxide film layer on the surface of the aluminum foil. Then, chromium was deposited on the surface of the aluminum foil in a vacuum plating chamber provided with a chromium target, 10sccm of Ar was introduced into the vacuum plating chamber after the vacuum plating chamber was evacuated, and a direct current voltage of 400V was applied to generate Ar plasma, the ionization voltage of the chromium target was set to 50V, the ionization current was set to 30A, and a chromium layer having a thickness of 0.05 μm was formed on both the bottom surface and the upper surface of the aluminum foil. Subsequently, forming an AlCr alloy layer by heat treatment at 420 ℃ for 60 minutes in a vacuum heat treatment furnace; finally, carbonitriding AlCr alloy layer on one surface in a heat treatment furnace, and N in the carbonitriding furnace 2 The passage amount of the catalyst is 30sccm, CH 4 The resulting film was subjected to a direct current voltage of 400V at a rate of 12sccm for a carbonitriding time of 60 minutes, and cooled to room temperature to obtain a reflective film having a layer structure shown in FIG. 2.
Example 4
The present example prepares an aluminum-based reflective film. Firstly, an aluminum foil with the thickness of 50 mu m is selected as a matrix, alkaline degreasing liquid is adopted for alkaline cleaning and degreasing, and then water cleaning and drying are carried out. Cleaning in the pretreatment cavity, vacuumizing and preheating the pretreatment cavity to make the vacuum degree in the pretreatment cavity be 5×10 -3 And (3) introducing argon gas below Pa, and cleaning to remove an oxide film layer on the surface of the aluminum foil. Then in a vacuum coating chamber provided with a chromium target on the surface of the aluminum foilAnd (3) depositing chromium, vacuumizing a vacuum coating chamber, introducing 10sccm Ar into the vacuum coating chamber, applying 400V direct current voltage to generate Ar plasma, setting the ionization voltage of a chromium target to be 50V, setting the ionization current to be 30A, and forming a chromium layer with the thickness of 0.10 μm on the bottom surface and the upper surface of the aluminum foil. Subsequently, forming an AlCr alloy layer by heat treatment at 450 ℃ for 60 minutes in a vacuum heat treatment furnace; finally, carbonitriding AlCr alloy layer on one surface in a heat treatment furnace, and N in the carbonitriding furnace 2 The passage amount of the catalyst is 30sccm, CH 4 The resulting film was subjected to a direct current voltage of 400V at a rate of 12sccm for a carbonitriding time of 60 minutes, and cooled to room temperature to obtain a reflective film having a layer structure shown in FIG. 2.
Example 5
The present example prepares an aluminum-based reflective film. Firstly, an aluminum foil with the thickness of 50 mu m is selected as a matrix, alkaline degreasing liquid is adopted for alkaline cleaning and degreasing, and then water cleaning and drying are carried out. Cleaning in the pretreatment cavity, vacuumizing and preheating the pretreatment cavity to make the vacuum degree in the pretreatment cavity be 5×10 -3 And (3) introducing argon gas below Pa, and cleaning to remove an oxide film layer on the surface of the aluminum foil. Then, chromium was deposited on the surface of the aluminum foil in a vacuum plating chamber provided with a chromium target, 10sccm of Ar was introduced into the vacuum plating chamber after the vacuum plating chamber was evacuated, and a direct current voltage of 400V was applied to generate Ar plasma, the ionization voltage of the chromium target was set to 50V, the ionization current was set to 30A, and a chromium layer having a thickness of 0.10 μm was formed on both the bottom surface and the upper surface of the aluminum foil. Subsequently, forming an AlCr alloy layer by heat treatment at 450 ℃ for 50 minutes in a vacuum heat treatment furnace; finally, carbonitriding AlCr alloy layer on one surface in a heat treatment furnace, and N in the carbonitriding furnace 2 The passage amount of (C) is 35sccm, CH 4 The resulting film was subjected to carbonitriding for 50 minutes at a flow rate of 5sccm, a flow rate of Ar of 20sccm, a DC voltage of 400V and a carbonitriding time of 50 minutes, and then cooled to room temperature to obtain a reflective film having a layer structure shown in FIG. 2.
Example 6
The present example prepares an aluminum-based reflective film. Firstly, selecting an aluminum foil with the thickness of 50 mu m as a matrix, adopting alkaline degreasing liquid to perform alkaline cleaning and degreasing, and thenWashing with water and drying. Cleaning in the pretreatment cavity, vacuumizing and preheating the pretreatment cavity to make the vacuum degree in the pretreatment cavity be 5×10 -3 And (3) introducing argon gas below Pa, and cleaning to remove an oxide film layer on the surface of the aluminum foil. Then, chromium was deposited on the surface of the aluminum foil in a vacuum plating chamber provided with a chromium target, 10sccm of Ar was introduced into the vacuum plating chamber after the vacuum plating chamber was evacuated, and a direct current voltage of 400V was applied to generate Ar plasma, the ionization voltage of the chromium target was set to 50V, the ionization current was set to 30A, and a chromium layer having a thickness of 0.20 μm was formed on both the bottom surface and the upper surface of the aluminum foil. Subsequently, forming an AlCr alloy layer by heat treatment at 480 ℃ for 60 minutes in a vacuum heat treatment furnace; finally, carbonitriding AlCr alloy layer on one surface in a heat treatment furnace, and N in the carbonitriding furnace 2 The passage amount of (C) is 50sccm, CH 4 The resulting film was subjected to a 4sccm passage, a 400V DC voltage was applied, and carbonitriding was performed for 60 minutes, and then cooled to room temperature to obtain a reflective film having a layer structure shown in FIG. 2.
Example 7
The present example prepares an aluminum-based reflective film. Firstly, an aluminum foil with the thickness of 50 mu m is selected as a matrix, alkaline degreasing liquid is adopted for alkaline cleaning and degreasing, and then water cleaning and drying are carried out. Cleaning in the pretreatment cavity, vacuumizing and preheating the pretreatment cavity to make the vacuum degree in the pretreatment cavity be 5×10 -3 And (3) introducing argon gas below Pa, and cleaning to remove an oxide film layer on the surface of the aluminum foil. Then, chromium was deposited on the surface of the aluminum foil in a vacuum plating chamber provided with a chromium target, 10sccm of Ar was introduced into the vacuum plating chamber after the vacuum plating chamber was evacuated, and a direct current voltage of 400V was applied to generate Ar plasma, the ionization voltage of the chromium target was set to 50V, the ionization current was set to 30A, and a chromium layer having a thickness of 0.20 μm was formed on both the bottom surface and the upper surface of the aluminum foil. Subsequently, forming an AlCr alloy layer by heat treatment at 480 ℃ for 60 minutes in a vacuum heat treatment furnace; finally, carbonitriding AlCr alloy layer on one surface in a heat treatment furnace, and N in the carbonitriding furnace 2 The passage amount of the catalyst is 40sccm, CH 4 The flux of (C) was 5sccm, the flux of Ar was 20sccm, the DC voltage applied was 400V, and the carbon content wasThe time of nitrogen co-permeation is 60 minutes, and then the reflective film with the layer structure shown in figure 2 can be obtained after cooling to room temperature.
Comparative example 1
An aluminum-based reflective film was prepared in this comparative example. Firstly, an aluminum foil with the thickness of 50 mu m is selected as a matrix, alkaline degreasing liquid is adopted for alkaline cleaning and degreasing, and then water cleaning and drying are carried out. Cleaning in the pretreatment cavity, vacuumizing and preheating the pretreatment cavity to make the vacuum degree in the pretreatment cavity be 5×10 -3 And (3) introducing argon gas below Pa, and cleaning to remove an oxide film layer on the surface of the aluminum foil. Then, chromium was deposited on the surface of the aluminum foil in a vacuum plating chamber provided with a chromium target, 10sccm of Ar was introduced into the vacuum plating chamber after the vacuum plating chamber was evacuated, and a direct current voltage of 400V was applied to generate Ar plasma, the ionization voltage of the chromium target was set to 50V, the ionization current was set to 30A, and a chromium layer having a thickness of 0.20 μm was formed on both the bottom surface and the upper surface of the aluminum foil. Then carbonitriding the Cr alloy layer on one side in a heat treatment furnace, N in the carbonitriding furnace 2 The passage amount of (C) is 50sccm, CH 4 The amount of the introduced solution was 8sccm, the applied DC voltage was 400V, the carbonitriding time was 60 minutes, and the color of the obtained CrCN layer was yellow.
Comparative example 2
An aluminum-based reflective film was prepared in this comparative example. Firstly, an aluminum foil with the thickness of 50 mu m is selected as a matrix, alkaline degreasing liquid is adopted for alkaline cleaning and degreasing, and then water cleaning and drying are carried out. Cleaning in the pretreatment cavity, vacuumizing and preheating the pretreatment cavity to make the vacuum degree in the pretreatment cavity be 5×10 -3 And (3) introducing argon gas below Pa, and cleaning to remove an oxide film layer on the surface of the aluminum foil. Then, chromium was deposited on the surface of the aluminum foil in a vacuum plating chamber provided with a chromium target, 10sccm of Ar was introduced into the vacuum plating chamber after the vacuum plating chamber was evacuated, and a direct current voltage of 400V was applied to generate Ar plasma, the ionization voltage of the chromium target was set to 50V, the ionization current was set to 30A, and a chromium layer having a thickness of 0.20 μm was formed on both the bottom surface and the upper surface of the aluminum foil. Subsequently, forming an AlCr alloy layer by heat treatment at 480 ℃ for 60 minutes in a vacuum heat treatment furnace; finally, in a heat treatment furnaceNitriding AlCr alloy layer on one side, and N 2 The aeration rate was 50sccm, the applied DC voltage was 400V, the nitriding time was 60 minutes, and the AlCrN layer was yellow in color.
Comparative example 3
An aluminum-based reflective film was prepared in this comparative example. Firstly, an aluminum foil with the thickness of 50 mu m is selected as a matrix, alkaline degreasing liquid is adopted for alkaline cleaning and degreasing, and then water cleaning and drying are carried out. Cleaning in the pretreatment cavity, vacuumizing and preheating the pretreatment cavity to make the vacuum degree in the pretreatment cavity be 5×10 -3 And (3) introducing argon gas below Pa, and cleaning to remove an oxide film layer on the surface of the aluminum foil. Then, chromium was deposited on the surface of the aluminum foil in a vacuum plating chamber provided with a chromium target, 10sccm of Ar was introduced into the vacuum plating chamber after the vacuum plating chamber was evacuated, and a direct current voltage of 400V was applied to generate Ar plasma, the ionization voltage of the chromium target was set to 50V, the ionization current was set to 30A, and a chromium layer having a thickness of 0.20 μm was formed on both the bottom surface and the upper surface of the aluminum foil. Subsequently, forming an AlCr alloy layer by heat treatment at 480 ℃ for 60 minutes in a vacuum heat treatment furnace; finally, carbonitriding AlCr alloy layer on one surface in a heat treatment furnace, and N in the carbonitriding furnace 2 The passage amount of (C) is 50sccm, CH 4 The amount of the introduced AlCrCN layer was 20sccm, the applied DC voltage was 400V, and the carbonitriding time was 60 minutes, and the AlCrCN layer was gray-white in color.
Comparative example 4
An aluminum-based reflective film was prepared in this comparative example. Firstly, an aluminum foil with the thickness of 50 mu m is selected as a matrix, alkaline degreasing liquid is adopted for alkaline cleaning and degreasing, and then water cleaning and drying are carried out. Cleaning in the pretreatment cavity, vacuumizing and preheating the pretreatment cavity to make the vacuum degree in the pretreatment cavity be 5×10 -3 And (3) introducing argon gas below Pa, and cleaning to remove an oxide film layer on the surface of the aluminum foil. Then depositing chromium on the surface of aluminum foil in a vacuum coating chamber provided with a chromium target, vacuumizing the vacuum coating chamber, introducing 10sccm Ar into the vacuum coating chamber, applying 400V direct current voltage to generate Ar plasma, setting the ionization voltage of the chromium target to be 50V, setting the ionization current to be 30A, and forming a film on the aluminum foilA chromium layer having a thickness of 0.20 μm was formed on both the bottom surface and the upper surface of the substrate. Subsequently, forming an AlCr alloy layer by heat treatment at 480 ℃ for 60 minutes in a vacuum heat treatment furnace; finally, carbonitriding AlCr alloy layer on one surface in a heat treatment furnace, and N in the carbonitriding furnace 2 The passage amount of the catalyst was 20sccm, CH 4 The amount of the introduced AlCrCN layer was 30sccm, the applied DC voltage was 400V, and the carbonitriding time was 60 minutes, and the AlCrCN layer was obtained as off-white in color.
Comparative example 5
An aluminum-based reflective film was prepared in this comparative example. Firstly, an aluminum foil with the thickness of 50 mu m is selected as a matrix, alkaline degreasing liquid is adopted for alkaline cleaning and degreasing, and then water cleaning and drying are carried out. Cleaning in the pretreatment cavity, vacuumizing and preheating the pretreatment cavity to make the vacuum degree in the pretreatment cavity be 5×10 -3 And (3) introducing argon gas below Pa, and cleaning to remove an oxide film layer on the surface of the aluminum foil. Then, chromium was deposited on the surface of the aluminum foil in a vacuum plating chamber provided with a chromium target, 10sccm of Ar was introduced into the vacuum plating chamber after the vacuum plating chamber was evacuated, and a direct current voltage of 400V was applied to generate Ar plasma, the ionization voltage of the chromium target was set to 50V, the ionization current was set to 30A, and a chromium layer having a thickness of 0.20 μm was formed on both the bottom surface and the upper surface of the aluminum foil. Subsequently, forming an AlCr alloy layer by heat treatment at 480 ℃ for 60 minutes in a vacuum heat treatment furnace; finally, carburizing AlCr alloy layer on one surface in a heat treatment furnace, wherein CH is in the carburizing furnace 4 The amount of the introduced AlCrC layer was 30sccm, the applied DC voltage was 400V, the carburizing time was 60 minutes, and the color of the AlCrC layer obtained was off-white.
The thicknesses and average elemental compositions of the AlCrCN layers (or CrCN layer, alCrN layer, alCrC layer) and the AlCrCN layers (or CrCN layer, alCrN layer, alCrC layer) in the light-reflective films prepared in examples 1 to 7 and comparative examples 1 to 5 are shown in Table 1 together with the chromaticity (L value, A value, B value) of the AlCrCN layer (or CrCN layer, alCrN layer, alCrC layer) measured by a colorimeter (D65 light source).
TABLE 1
Figure BDA0001438590800000101
Durability test
1. The reflective films prepared in examples and comparative examples were set in a constant temperature and humidity box at a temperature of 25 ℃ and a relative humidity of 75% rh for 100 days, and then a color difference Δe of the reflective surface before and after the setting was calculated using a colorimeter (D65 light source), and it was evaluated that weather resistance was excellent when the color difference Δe was less than 3, weather resistance was good when the color difference Δe was 3 to 6, and weather resistance was poor when the color difference was greater than 6.
2. The reflective films prepared in examples and comparative examples were set in an incubator at 120℃for 24 hours, and then the color difference DeltaE of the reflective surfaces before and after the setting was calculated using a colorimeter (D65 light source), and it was evaluated that the oxidation discoloration resistance was excellent when the color difference DeltaE was less than 3, that the oxidation discoloration resistance was good when the color difference DeltaE was 3 to 6, and that the oxidation discoloration resistance was poor when the color difference was more than 6.
3. The reflective films prepared in examples and comparative examples were placed in a salt spray test box of NaCl at a concentration of 5wt% for 24 hours, and then color difference DeltaE of the reflective surfaces before and after the placement was calculated using a colorimeter (D65 light source), and it was evaluated that the anti-corrosive discoloration was excellent when the color difference DeltaE was less than 3, that the anti-corrosive discoloration was good when the color difference DeltaE was 3 to 6, and that the anti-corrosive discoloration was poor when the color difference was more than 6.
The durability test results are shown in table 2.
TABLE 2
Weather resistance Oxidation resistance and discoloration resistance Resistance to corrosion discoloration
Example 1 Excellent (excellent) Excellent (excellent) Excellent (excellent)
Example 2 Excellent (excellent) Excellent (excellent) Excellent (excellent)
Example 3 Excellent (excellent) Excellent (excellent) Excellent (excellent)
Example 4 Excellent (excellent) Excellent (excellent) Excellent (excellent)
Example 5 Excellent (excellent) Excellent (excellent) Excellent (excellent)
Example 6 Excellent (excellent) Excellent (excellent) Excellent (excellent)
Example 7 Excellent (excellent) Excellent (excellent) Excellent (excellent)
Comparative example 1 Good grade (good) Good grade (good) Excellent (excellent)
Comparative example 2 Good grade (good) Good grade (good) Excellent (excellent)
Comparative example 3 Difference of difference Difference of difference Excellent (excellent)
Comparative example 4 Difference of difference Difference of difference Excellent (excellent)
Comparative example 5 Difference of difference Difference of difference Excellent (excellent)
It will be apparent to those skilled in the art that the present invention has been described in detail by way of illustration only, and it is not intended to be limited by the above-described embodiments, as long as various insubstantial modifications of the method concepts and aspects of the invention are employed or the inventive concepts and aspects of the invention are directly applied to other applications without modification, all within the scope of the invention.

Claims (5)

1. The utility model provides a LED decorative pattern mirror, includes rectangular frame and the base that is located the frame, inlay on the frame and be equipped with glass, and be provided with the diffuser plate, its characterized in that between base and the glass:
an edge groove area is formed between the outer frame and the base, a bottom groove area is formed between the lower part of the base and the bottom edge of the outer frame, a middle groove area is formed in the middle of the base, a driving power supply is arranged in the middle groove area, reflective films are arranged at the bottoms of the edge groove area and the bottom groove area, a first LED lamp strip is attached to a luminescent film of the edge groove area, a second LED lamp strip is attached to a reflective film of the bottom groove area, and a pattern area is formed by connecting a plurality of lamp strips in parallel; the first LED lamp strip and the second LED lamp strip are connected in parallel to the driving power supply, and the driving power supply comprises an LED controller;
wherein:
the reflective film takes aluminum foil as a matrix, the thickness of the aluminum foil is more than or equal to 0.050mm and less than or equal to 2.0mm, an AlCr alloy layer is arranged on the bottom surface of the matrix, a light blue AlCrCN layer is arranged on the upper surface of the matrix, and the light blue AlCrCN layer is obtained by carbonitriding the AlCr alloy layer; the AlCrCN layer contains 57.8-65.2 wt% of Al, 23.7-31.2 wt% of Cr, 7.4-9.7 wt% of N and 1.6-3.9 wt% of C; the light blue AlCrCN layer is expressed by Lab color system that the L value is 60-82, the a value is-5 to-15, and the b value is-12 to-35.
2. The LED pattern mirror of claim 1, wherein: the pattern area is an LED lamp strip pattern area formed by splicing according to the shape and the pattern.
3. The LED pattern mirror of claim 1, wherein: the diffusion plate is selected from one of polycarbonate, polyethylene, polypropylene, polyvinyl chloride, polystyrene or polyethylene terephthalate.
4. The method for manufacturing the LED pattern mirror according to claim 1, characterized by comprising the steps of:
(1) Preparing a rectangular outer frame comprising a base, wherein an edge groove area is formed between the outer frame and the base, a bottom groove area is formed between the lower part of the base and the bottom edge of the outer frame, and a middle groove area is formed in the middle of the base;
(2) A driving power supply is arranged in the middle groove area, and reflective films are arranged at the bottoms of the edge groove area and the bottom groove area;
(3) A first LED lamp strip is attached to the luminous film of the edge groove area, a second LED lamp strip is attached to the reflecting film of the bottom groove area, the first LED lamp strip and the second LED lamp strip are connected to the driving power supply in parallel, and the driving power supply comprises an LED controller;
(4) A diffusion plate is arranged on the base, and then glass is embedded on the outer frame;
the preparation method of the reflective film comprises the following steps:
preparing an aluminum substrate with the thickness of more than 0.05 mm;
continuously depositing chromium Cr on the bottom surface and the upper surface of the aluminum foil matrix in a roll-to-roll manner, wherein the thickness of the deposited chromium Cr is 0.01-0.50 mu m; performing heat treatment at 390-520 ℃ to diffuse aluminum in the aluminum foil matrix and deposited chromium to form an aluminum-chromium alloy layer;
carbonitriding the surface of one of the aluminum chromium alloy layers in a heat treatment furnace to obtain a light blue AlCrCN layer; the carbonitriding adopts a plasma process, and N in a heat treatment furnace 2 The ventilation amount is 22-50 sccm, CH 4 The ventilation amount is 4-12 sccm, the applied direct current voltage is 400V, and the carbonitriding time is 50-60 min.
5. The method for manufacturing the LED pattern mirror according to claim 4, wherein: the second LED lamp strip is formed by connecting a plurality of lamp strips in parallel and forms a customizable pattern area.
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