CN107553314A - The large scale erratic star wheel of adjusting thickness - Google Patents
The large scale erratic star wheel of adjusting thickness Download PDFInfo
- Publication number
- CN107553314A CN107553314A CN201710988281.XA CN201710988281A CN107553314A CN 107553314 A CN107553314 A CN 107553314A CN 201710988281 A CN201710988281 A CN 201710988281A CN 107553314 A CN107553314 A CN 107553314A
- Authority
- CN
- China
- Prior art keywords
- wheel
- erratic star
- jog
- unit
- star wheel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 claims abstract description 24
- 230000005540 biological transmission Effects 0.000 claims 1
- 230000007704 transition Effects 0.000 claims 1
- 238000005516 engineering process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000003754 machining Methods 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003032 molecular docking Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
Landscapes
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The present invention relates to a kind of large scale erratic star wheel of adjusting thickness, the erratic star wheel is made up of at least one unit wheel, the diameter of the unit wheel is more than the half of polishing machine diameter and is less than polishing machine diameter, the center of the unit wheel is provided with driving hole, and the driving hole is engaged with the central gear of polishing machine；At least one of the hole, the upper surface or lower surface of the unit wheel that is further opened with polishing in the unit wheel is provided with continuous jog, and the jog is covered with unit wheel surface, and the shape of the recess and convex portion matches；Difference in height scope between the recess and convex portion is 0.2~0.5cm.The optics that can be adapted to different-thickness by the erratic star wheel grinds work, and the difficulty of processing of the erratic star wheel is relatively low.
Description
Technical field
The present invention relates to a kind of lapping device, the large scale erratic star wheel of particularly a kind of adjusting thickness.
Background technology
Existing 9B types Twp-sided polishing machine, the processing bit quantity on its erratic star wheel is more, and the area of machining position is smaller, maximum
The range of work is 200mm, can not process the workpiece of larger area, and must assure that the uniform of optics in process
Polishing, (processing method is submitted " big before see the applicant when using the workpiece of 9B types twin polishing machining large area
Substrate erratic star wheel " is applied), because the workpiece of part large area be non-standard, its thickness, therefore it is difficult to pass through a kind of wandering star
Wheel meets that different thickness grindings requires.
The content of the invention
The technical problems to be solved by the invention are to provide a kind of large scale erratic star wheel of adjusting thickness, pass through the wandering star
Wheel can be adapted to the optics of different-thickness to grind work, and the difficulty of processing of the erratic star wheel is relatively low.
Technical scheme is used by the present invention solves above-mentioned technical problem
A kind of large scale erratic star wheel of adjusting thickness, the erratic star wheel are made up of at least one unit wheel, the unit
The diameter of wheel is more than the half of polishing machine diameter and is less than polishing machine diameter, and the center of the unit wheel is provided with driving hole, described
Driving hole is engaged with the central gear of polishing machine；Hole of polishing, the upper surface of the unit wheel are further opened with the unit wheel
Or at least one of lower surface is provided with continuous jog, the jog is covered with unit wheel surface, the recess and convex portion
Shape match；Difference in height scope between the recess and convex portion is 0.2~0.5cm.
Preferably, the erratic star wheel is at least made up of first module wheel and second unit wheel, on the first module wheel
The jog on surface and the jog of second unit wheel lower surface are bonded to each other.
Preferably, the jog is seamlessly transits, the summit of the jog is in circular arc.
Preferably, the erratic star wheel includes horizontal jog and longitudinal jog.
Preferably, at least one of upper surface or lower surface of the unit wheel are provided with fixing hole, the fixing hole
Indent is arranged on around polishing hole, is set in the connecting hole that first module wheel upper surface and second unit wheel lower surface are engaged
There is centring ring.
The present invention compared with the existing technology has advantages below and effect：Erratic star wheel is made by the setting of jog structure
Thickness can be adjusted freely, and the difference in height of jog ensure that between it can ensure unit wheel in the case of not influenceing erratic star wheel processing
Bonding strength, the smooth setting of jog ensure that the smaller and horizontal and vertical jog of abrasion in rotation process between unit wheel
Setting ensure that positioning between unit wheel on four direction, the processing of different non-standards is met by the unit wheel superposition of standard
It is required that because the cooperation between unit wheel there may be error, therefore the size in hole of polishing can be slightly larger than workpiece size, and pass through
Centring ring is set to limit position when workpiece is ground in fixing hole, so as to the difficulty of processing of reduction unit wheel.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments of invention, for those of ordinary skill in the art, without having to pay creative labor, may be used also
To obtain other accompanying drawings according to these accompanying drawings.
Fig. 1 is the structural representation of the present invention.
Fig. 2 is the sectional view of the present invention.
Label declaration：
The driving hole 11 of erratic star wheel 1 polishing hole 2
The longitudinal jog 5 of the horizontal jog 4 of fixing hole 3
The polishing layer 7 of optics 6
Embodiment
With reference to embodiment, the present invention is described in further detail, following examples be explanation of the invention and
The invention is not limited in following examples.
Embodiment 1：
As shown in Fig. 1 to 2, this erratic star wheel 1 is made up of first module wheel 1A and second unit wheel 1B, each unit wheel it is straight
Footpath is 640mm, and unit wheel is provided centrally with driving hole 11, and the tooth on driving hole 11 can be with polishing machine (not shown)
Central gear is mutually ratcheting, and polishing hole 2 is offered in same position to accommodate optics 6 on each unit wheel, and
The fixing hole 3 of indent is offered around polishing hole 2, each unit wheel upper and lower surface, which is provided with, to be engaged horizontal jog 4 and indulge
To jog 5, two groups of transverse direction jogs 4 and longitudinal jog 5 are diagonally positioned respectively and be covered with the surface of unit wheel, its concave
Difference in height between portion and convex portion could be arranged to any value in 0.2~0.5cm, and jog is to seamlessly transit, jog
Summit be in circular arc, the jog of first module wheel 1B upper surfaces and the jog of second unit wheel 1B lower surfaces mutually paste
Close, so as to realize 1A drive 1B while rotate, the size in hole of polishing can be slightly larger than the size of optics 6, both 1A and 1B
Fixing hole 21A and 21B docking, and in fixing hole 21 set centring ring 7 limit optics 6 grind when position.
Furthermore, it is necessary to illustrate, the specific embodiment described in this specification, the shape of its parts and components, it is named
Title etc. can be different.The equivalent or simple change that all construction, feature and principles according to described in inventional idea of the present invention are done, is wrapped
Include in the protection domain of patent of the present invention.Those skilled in the art can be to described specific implementation
Example is made various modifications or supplement or substituted using similar mode, structure without departing from the present invention or surmounts this
Scope as defined in the claims, protection scope of the present invention all should be belonged to.
Claims (5)
- A kind of 1. large scale erratic star wheel of adjusting thickness, it is characterised in that：The erratic star wheel is made up of at least one unit wheel, The diameter of the unit wheel is more than the half of polishing machine diameter and is less than polishing machine diameter, and the center of the unit wheel is provided with transmission Hole, the driving hole are engaged with the central gear of polishing machine；Hole of polishing is further opened with the unit wheel, the unit wheel At least one of upper surface or lower surface are provided with continuous jog, and the jog is covered with unit wheel surface, the recess Match with the shape of convex portion；Difference in height scope between the recess and convex portion is 0.2~0.5cm.
- 2. the large scale erratic star wheel of adjusting thickness according to claim 1, it is characterised in that：The erratic star wheel at least by First module wheel and second unit wheel composition, the jog of the first module wheel upper surface and second unit wheel lower surface it is recessed Convex portion is bonded to each other.
- 3. the large scale erratic star wheel of adjusting thickness according to claim 2, it is characterised in that：The jog is smooth Transition, the summit of the jog is in circular arc.
- 4. the large scale erratic star wheel of adjusting thickness according to claim 3, it is characterised in that：The erratic star wheel includes horizontal stroke To jog and longitudinal jog.
- 5. the adjustable large scale erratic star wheel of thickness according to claim 2, it is characterised in that：The upper table of the unit wheel At least one of face or lower surface are provided with fixing hole, and the fixing hole indent is arranged on around polishing hole, in first module wheel Centring ring is provided with the connecting hole that upper surface and second unit wheel lower surface are engaged.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710988281.XA CN107553314B (en) | 2017-10-21 | 2017-10-21 | Large-size planetary wheel with adjustable thickness |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710988281.XA CN107553314B (en) | 2017-10-21 | 2017-10-21 | Large-size planetary wheel with adjustable thickness |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107553314A true CN107553314A (en) | 2018-01-09 |
| CN107553314B CN107553314B (en) | 2023-10-27 |
Family
ID=60985777
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710988281.XA Active CN107553314B (en) | 2017-10-21 | 2017-10-21 | Large-size planetary wheel with adjustable thickness |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107553314B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2935843B1 (en) * | 1998-09-17 | 1999-08-16 | 株式会社 リバースチール | Wrapping carrier |
| JP2014144500A (en) * | 2013-01-28 | 2014-08-14 | Sumitomo Metal Mining Co Ltd | One-side polishing method for sapphire wafer, and method for producing sapphire wafer |
| CN105150091A (en) * | 2015-07-16 | 2015-12-16 | 河海大学 | Grinding and polishing device for automatic grinding and polishing machine |
| CN106078492A (en) * | 2016-06-15 | 2016-11-09 | 江苏吉星新材料有限公司 | A kind of sapphire rectangular-shaped piece double-side grinding method |
| CN207344359U (en) * | 2017-10-21 | 2018-05-11 | 德清凯晶光电科技有限公司 | A kind of large scale erratic star wheel of adjusting thickness |
-
2017
- 2017-10-21 CN CN201710988281.XA patent/CN107553314B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2935843B1 (en) * | 1998-09-17 | 1999-08-16 | 株式会社 リバースチール | Wrapping carrier |
| JP2014144500A (en) * | 2013-01-28 | 2014-08-14 | Sumitomo Metal Mining Co Ltd | One-side polishing method for sapphire wafer, and method for producing sapphire wafer |
| CN105150091A (en) * | 2015-07-16 | 2015-12-16 | 河海大学 | Grinding and polishing device for automatic grinding and polishing machine |
| CN106078492A (en) * | 2016-06-15 | 2016-11-09 | 江苏吉星新材料有限公司 | A kind of sapphire rectangular-shaped piece double-side grinding method |
| CN207344359U (en) * | 2017-10-21 | 2018-05-11 | 德清凯晶光电科技有限公司 | A kind of large scale erratic star wheel of adjusting thickness |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107553314B (en) | 2023-10-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2011026195A5 (en) | ||
| CN204183355U (en) | Optical mirror slip cold forming rigid plate | |
| CN107457438A (en) | Slotting cutter week sword rake face spiral camber parametrization mathematical modeling construction method | |
| CN207344359U (en) | A kind of large scale erratic star wheel of adjusting thickness | |
| CN101318303B (en) | Abrasive machining method for ball end mill and four-shaft linkage equipment for abrasive machining | |
| CN206455519U (en) | Grinding/grinding complex machining device and lapping device | |
| CN107553314A (en) | The large scale erratic star wheel of adjusting thickness | |
| JP2000254845A (en) | Chamfering method of notch groove of wafer, and wafer | |
| CN207344364U (en) | A kind of adjustable large scale erratic star wheel of thickness | |
| CN107571145A (en) | The adjustable large scale erratic star wheel of thickness | |
| CN104476357B (en) | The top method for grinding of hexagonal | |
| CN203993559U (en) | Lapping liquid supply system and lapping device | |
| CN207548485U (en) | Grinding device | |
| CN207642896U (en) | A kind of erratic star wheel of uniform grinding | |
| CN207344362U (en) | A kind of erratic star wheel for single side polishing | |
| CN208483650U (en) | Cut grinding device | |
| CN102672597B (en) | Double-side polishing apparatus | |
| CN107457689A (en) | Erratic star wheel for one side polishing | |
| JP5349550B2 (en) | Scribing equipment | |
| CN209615027U (en) | Achievable Large Crankshaft turns the clamping tooling of neck rubbing down | |
| CN101367186A (en) | Tilting axis processing device | |
| CN206588730U (en) | A kind of silicon chip falls small radian fillet frock | |
| JP5705663B2 (en) | Substrate transfer robot | |
| CN205201246U (en) | Semicircle automatic grinding device | |
| WO2014002447A1 (en) | Substrate-edge grinding method, and substrate-edge grinding device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |