CN107486421A - Top layer cleaning device is used in a kind of silicon rod production - Google Patents
Top layer cleaning device is used in a kind of silicon rod production Download PDFInfo
- Publication number
- CN107486421A CN107486421A CN201710905703.2A CN201710905703A CN107486421A CN 107486421 A CN107486421 A CN 107486421A CN 201710905703 A CN201710905703 A CN 201710905703A CN 107486421 A CN107486421 A CN 107486421A
- Authority
- CN
- China
- Prior art keywords
- grit
- cleaning device
- absorber
- silicon rod
- shell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 43
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 21
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 21
- 239000010703 silicon Substances 0.000 title claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 239000006096 absorbing agent Substances 0.000 claims abstract description 26
- 230000000694 effects Effects 0.000 claims abstract description 9
- 239000000428 dust Substances 0.000 claims description 11
- 239000004744 fabric Substances 0.000 claims description 11
- 235000004443 Ricinus communis Nutrition 0.000 claims description 7
- 230000003014 reinforcing effect Effects 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 abstract description 8
- 238000000034 method Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/14—Wipes; Absorbent members, e.g. swabs or sponges
- B08B1/143—Wipes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
- B08B15/04—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area from a small area, e.g. a tool
Landscapes
- Cleaning In General (AREA)
- Cleaning Implements For Floors, Carpets, Furniture, Walls, And The Like (AREA)
Abstract
The invention discloses a kind of silicon rod production top layer cleaning device,Including apparatus main body and top cover,Grit absorber is nested with the top of apparatus main body,Apparatus main body bottom is fixed with shell,The bottom of shell is closely connected with fine, soft fur silk,The inside of shell is provided with wiper,The both sides of wiper are provided with air dryer,Rotating shaft is fixed with the right side of air dryer,Top layer cleaning device is used in this kind of silicon rod production,The advantages of employing other cleaning devices,By under the collective effect of grit absorber and elastic plate,Solve the problems, such as the not reasonable of original cleaning device design,The grit absorber of setting is communicated with the outside,The grit of absorption can be sent to outside cleaning device,Due to the small volume of cleaning device,The grit that grit absorber can be adsorbed is sent to the outside of cleaning device,Do not have to thus periodically clean the grit of grit absorber absorption,And it can further lift cleaning effect.
Description
Technical field
The present invention relates to cleaning device technical field, top layer cleaning device is used in specially a kind of silicon rod production.
Background technology
Generally, silicon rod is used as semiconductor device, solar cell, chemical process equipment, industrial system or small size
And other highly integrated precision apparatus important source material, they are respectively by the material structure with high-purity or semiconducting behavior
Into with a large amount of uses of silicon rod, its process units is also varied, but the cleaning of process units is always a problem.
But existing cleaning device design is not quite reasonable, and device does not connect with outside, and the grit for causing to absorb can not
Discharge, causes the grit in device cumulative, it is impossible to periodically the grit of grit absorber absorption is cleaned, influences the later stage
Cleaning, in wiping process, it is impossible to fully contacted with base station surface so that cleaning carry out it is not comprehensive enough.
So how to design a kind of silicon rod production top layer cleaning device, turning into us will currently solve the problems, such as.
The content of the invention
It is an object of the invention to provide a kind of silicon rod production top layer cleaning device, to solve to carry in above-mentioned background technology
The problem of going out.
To achieve the above object, the present invention provides following technical scheme：Top layer cleaning device is used in a kind of silicon rod production, including
Apparatus main body and top cover, grit absorber is nested with the top of described device main body, described device bottom part body is fixed with shell,
The bottom of the shell is closely connected with fine, soft fur silk, and the inside of the shell is provided with wiper, the both sides peace of the wiper
Equipped with air dryer, rotating shaft is fixed with the right side of the air dryer, conduction axis and the first belt, institute are installed on the left of the rotating shaft
State rotating shaft to be flexibly connected with conduction axis by the first belt, the bottom of the wiper is connected with elastic plate, the shell
Inside be fixedly connected with slideway, the side of the slideway is fixedly connected with motion rail, the side of the motion rail be nested with from
Driving wheel, castor and the second belt are installed on the right side of the driven pulley, and castor passes through the activity of the second belt with driven pulley
Connect, reinforced column is fixedly connected with above the top cover.
Further, the grit absorber is provided with two, and grit absorber is evenly distributed in device body
Top, the grit absorber are communicated with the outside.
Further, the top cover is located at same horizontal line, and top cover and the shape on device body border with device body
It is adapted.
Further, the top of the motion rail is provided with flow straightener, and the flow straightener is brought into close contact with motion rail.
Further, the fine, soft fur silk surrounds the bottom of shell, in complete " rectangle " shape.
Further, non-dust cloth is covered with the elastic plate, and elastic plate is projective structure, and be in " arc " shape.
Compared with prior art, the beneficial effects of the invention are as follows：Top layer cleaning device is used in this kind of silicon rod production, employs it
The advantages of his cleaning device, by under the collective effect of grit absorber and elastic plate, solving original cleaning device design not
The problem of enough reasonable, the grit absorber of setting is communicated with the outside, and the grit of absorption can be sent to outside cleaning device, by
In the small volume of cleaning device, the grit that can adsorb grit absorber is sent to the outside of cleaning device, thus not
Cleaned, the grit of absorption is discharged, and can further lift cleaning with the grit periodically adsorbed to grit absorber
Effect, non-dust cloth is covered on the elastic plate of setting, and elastic plate is in " arc " shape so that the bottom protrusion of cleaning device, so
Non-dust cloth is covered on elastic plate, and non-dust cloth can fully contact in wiping process with base station surface, improves wiping effect,
Certainly, the elastic plate can also be disc-shaped, square etc., as long as it can form the flat surface of protrusion, be easy to non-dust cloth
Base station is wiped.
Brief description of the drawings
Fig. 1 is the overall structure diagram of the present invention；
Fig. 2 is the wiper partial structural diagram of the present invention；
Fig. 3 is the slideway partial structural diagram of the present invention.
In figure：1st, apparatus main body, 101, grit absorber, 2, shell, 201, fine, soft fur silk, 3, top cover, 301, reinforced column, 4,
Wiper, 401, air dryer, 402, conduction axis, 403, elastic plate, the 404, first belt, 405, rotating shaft, 5, slideway, 501, current stabilization
Device, 502, driven pulley, 503, castor, the 504, second belt, 505, motion rail.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation describes, it is clear that described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art are obtained every other under the premise of creative work is not made
Embodiment, belong to the scope of protection of the invention.
Fig. 1-3 are referred to, the present invention provides a kind of technical scheme：A kind of silicon rod production top layer cleaning device, including dress
Main body 1 and top cover 3 are put, the top of apparatus main body 1 is nested with grit absorber 101, and the bottom of apparatus main body 1 is fixed with shell 2, outside
The bottom of shell 2 is closely connected with fine, soft fur silk 201, and the inside of shell 2 is provided with wiper 4, and the both sides of wiper 4 are provided with air-dried
Device 401, the right side of air dryer 401 are fixed with rotating shaft 405, and the left side of rotating shaft 405 is provided with the belt 404 of conduction axis 402 and first,
Rotating shaft 405 is flexibly connected by the first belt 44 with conduction axis 402, and the bottom of wiper 4 is connected with elastic plate 403, outside
The inside of shell 2 is fixedly connected with slideway 5, and the side of slideway 5 is fixedly connected with motion rail 505, and the side of motion rail 505 is nested with
Driven pulley 502, the right side of driven pulley 502 are provided with the belt 504 of castor 503 and second, and castor 503 and driven pulley 502
It is flexibly connected by the second belt 504, the top of top cover 3 is fixedly connected with reinforced column 301.
Further, grit absorber 101 is provided with two, and grit absorber 101 is evenly distributed in device body 1
Top, grit absorber 101 is communicated with the outside, the grit of absorption can be sent to outside cleaning device.
Further, top cover 3 is located at same horizontal line, and top cover 3 and the shape on the border of device body 1 with device body 1
It is adapted, top cover 3 plays a part of fixed and covered, and top cover 3 can be structure as a whole with cleaning device.
Further, the top for moving rail 505 is provided with flow straightener 501, and flow straightener 501 is brought into close contact with motion rail 505,
Set flow straightener 501 effectively make the micro-machine in device because electric current is unstable, cause can not normal operation, avoiding the occurrence of need not
The error wanted.
Further, fine, soft fur silk 201 surrounds the bottom of shell 2, in complete " rectangle " shape, and fine, soft fur silk 201
A diameter of 0.01cm, the cleanable side corner angle to silicon rod process units of superfine fine, soft fur silk 201, increase the cleaning energy of device
Power.
Further, non-dust cloth is covered with elastic plate 403, and elastic plate 403 is projective structure, and be in " arc " shape,
So non-dust cloth is covered on elastic plate 403, and non-dust cloth can fully contact in wiping process with base station surface, is improved and is wiped
Wipe effect.
Operation principle：First, startup power supply device enters working condition, will clean the base station of placement silicon rod process units,
By the rotation of rotating shaft 405, the motion of the first belt 404 is driven so that the non-woven fabrics deformation on elastic plate 403, wipe base station
Surface, cleaning device can also be risen, then by micro-machine, rotate driven pulley 502 and castor 503, wiped
The non-dust cloth for crossing base station is wrapped on slideway 5, so as to cover clean non-dust cloth in the bottom of cleaning device, is further continued for base station
Cleaned, a diameter of 0.01cm of fine, soft fur silk 201 on shell 2, superfine fine, soft fur silk 201 is cleanable to silicon rod process units
Side corner angle, increase the cleaning capacity of device, grit absorber 101 is communicated with the outside, and can be sent to the grit of absorption clearly
Outside clean device, due to the small volume of cleaning device, the grit that can adsorb grit absorber is sent to cleaning device
Outside, do not have to thus periodically clean the grit of grit absorber absorption, and can further lift cleaning effect.
Although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with
A variety of changes, modification can be carried out to these embodiments, replace without departing from the principles and spirit of the present invention by understanding
And modification, the scope of the present invention is defined by the appended.
Claims (6)
1. top layer cleaning device, including apparatus main body are used in a kind of silicon rod production（1）And top cover（3）, it is characterised in that：Described device
Main body（1）Top be nested with grit absorber（101）, described device main body（1）Bottom is fixed with shell（2）, the shell
（2）Bottom be closely connected with fine, soft fur silk（201）, the shell（2）Inside wiper is installed（4）, the wiper（4）
Both sides air dryer is installed（401）, the air dryer（401）Right side be fixed with rotating shaft（405）, the rotating shaft（405）'s
Left side is provided with conduction axis（402）With the first belt（404）, the rotating shaft（405）Pass through the first belt（44）With conduction axis
（402）It is flexibly connected, the wiper（4）Bottom be connected with elastic plate（403）, the shell（2）Inside fix
It is connected with slideway（5）, the slideway（5）Side be fixedly connected with motion rail（505）, the motion rail（505）Side it is embedding
It is cased with driven pulley（502）, the driven pulley（502）Right side castor is installed（503）With the second belt（504）, and activity
Wheel（503）With driven pulley（502）Pass through the second belt（504）It is flexibly connected, the top cover（3）Top be fixedly connected with reinforcing
Post（301）.
2. top layer cleaning device is used in a kind of silicon rod production according to claim 1, it is characterised in that：The grit absorber
（101）It is provided with two, and grit absorber（101）It is evenly distributed in device body（1）Top, the grit absorber
（101）It is communicated with the outside.
3. top layer cleaning device is used in a kind of silicon rod production according to claim 1, it is characterised in that：The top cover（3）With
Device body（1）Positioned at same horizontal line, and top cover（3）With device body（1）The shape on border is adapted.
4. top layer cleaning device is used in a kind of silicon rod production according to claim 1, it is characterised in that：The motion rail
（505）Top be provided with flow straightener（501）, and the flow straightener（501）With moving rail（505）It is brought into close contact.
5. top layer cleaning device is used in a kind of silicon rod production according to claim 1, it is characterised in that：The fine, soft fur silk
（201）Around shell（2）Bottom, in complete " rectangle " shape.
6. top layer cleaning device is used in a kind of silicon rod production according to claim 1, it is characterised in that：The elastic plate
（403）On be covered with non-dust cloth, and elastic plate（403）For projective structure, and it is in " arc " shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710905703.2A CN107486421A (en) | 2017-09-29 | 2017-09-29 | Top layer cleaning device is used in a kind of silicon rod production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710905703.2A CN107486421A (en) | 2017-09-29 | 2017-09-29 | Top layer cleaning device is used in a kind of silicon rod production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107486421A true CN107486421A (en) | 2017-12-19 |
Family
ID=60653819
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710905703.2A Pending CN107486421A (en) | 2017-09-29 | 2017-09-29 | Top layer cleaning device is used in a kind of silicon rod production |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107486421A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09103394A (en) * | 1995-10-13 | 1997-04-22 | Matsushita Electric Ind Co Ltd | Electric floor polisher |
| CN201389530Y (en) * | 2009-03-20 | 2010-01-27 | 中芯国际集成电路制造(上海)有限公司 | Wafer box cleaning device |
| CN103316868A (en) * | 2013-05-16 | 2013-09-25 | 北京京东方光电科技有限公司 | Cleaning device |
| CN205301744U (en) * | 2015-12-03 | 2016-06-08 | 东莞市依科净化材料科技有限公司 | High -efficient LCD screen cleaning device |
| CN206104408U (en) * | 2016-08-29 | 2017-04-19 | 智璘测试技术（苏州）有限公司 | Dustless cloth wiping arrangement of full self -cleaning machine of cell -phone outward appearance |
| CN206523816U (en) * | 2017-03-10 | 2017-09-26 | 武汉东湖学院 | A kind of computer display dust guard |
-
2017
- 2017-09-29 CN CN201710905703.2A patent/CN107486421A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09103394A (en) * | 1995-10-13 | 1997-04-22 | Matsushita Electric Ind Co Ltd | Electric floor polisher |
| CN201389530Y (en) * | 2009-03-20 | 2010-01-27 | 中芯国际集成电路制造(上海)有限公司 | Wafer box cleaning device |
| CN103316868A (en) * | 2013-05-16 | 2013-09-25 | 北京京东方光电科技有限公司 | Cleaning device |
| CN205301744U (en) * | 2015-12-03 | 2016-06-08 | 东莞市依科净化材料科技有限公司 | High -efficient LCD screen cleaning device |
| CN206104408U (en) * | 2016-08-29 | 2017-04-19 | 智璘测试技术（苏州）有限公司 | Dustless cloth wiping arrangement of full self -cleaning machine of cell -phone outward appearance |
| CN206523816U (en) * | 2017-03-10 | 2017-09-26 | 武汉东湖学院 | A kind of computer display dust guard |
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| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20171219 |
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| WD01 | Invention patent application deemed withdrawn after publication |