CN107475691B - Heating device based on electromagnetic induction - Google Patents
Heating device based on electromagnetic induction Download PDFInfo
- Publication number
- CN107475691B CN107475691B CN201710738799.8A CN201710738799A CN107475691B CN 107475691 B CN107475691 B CN 107475691B CN 201710738799 A CN201710738799 A CN 201710738799A CN 107475691 B CN107475691 B CN 107475691B
- Authority
- CN
- China
- Prior art keywords
- magnetizer
- tray
- reaction chamber
- electromagnetic induction
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Induction Heating (AREA)
Abstract
The invention provides a heating device based on electromagnetic induction. The magnetizer is arranged around the tray, so that most of magnetic lines of force are concentrated near the tray, the heating temperature is higher, and the heating speed is higher; the magnetic lines of force in the tray are uniformly distributed, so that the temperature uniformity is better; the magnetizer is utilized to gather magnetic lines of force, guide the direction of the magnetic lines of force, reduce magnetic resistance and reflect the heat radiated from the tray to the lower part of the reaction chamber back to the tray, thus improving the energy utilization efficiency; most of the magnetic force lines are concentrated around the tray, so that the spatial range of the distribution of the magnetic force lines is reduced, and the electromagnetic influence on other equipment in the device and the external environment of the device is reduced.
Description
Technical Field
The invention relates to a heating device, in particular to a heating device based on electromagnetic induction.
Background
In the field of thin film material growth and preparation, Metal Organic Chemical Vapor Deposition (MOCVD) equipment is one of the key equipment for epitaxial growth of compound semiconductor thin film materials, is particularly suitable for large-scale production of semiconductor industry, and is the most important equipment for epitaxial growth of compound semiconductors such as gallium nitride, indium phosphide, gallium arsenide, zinc oxide and the like in recent years.
In the process of growing the thin film material, various chemical reactions occur on the substrate sheet under high temperature conditions to form the thin film material. The substrate slice is arranged on a tray for bearing the substrate slice, and the substrate slice is heated by heating the tray and transferring heat to the substrate slice in a heat conduction mode to heat the substrate slice. While there are two main forms of heating the tray: thermal radiation heating and induction heating. The heat radiation heating heats the tray by applying direct current to the heating wires or the heating sheets, and then transfers the heat to the tray in a heat radiation mode to realize indirect heating of the tray; the induction heating is realized by applying medium-frequency or high-frequency alternating current to the coil to generate an alternating magnetic field in space, and the tray is positioned in the alternating magnetic field to induce eddy current inside so as to realize direct heating of the tray.
The heat radiation heating has the advantages of simple design, good temperature uniformity and the like, but also has the defects of low energy utilization efficiency, slow temperature rise, low temperature and the like. Induction heating has overcome above shortcoming, and the intensification is fast, and energy utilization efficiency is high, but temperature homogeneity is difficult to control, simultaneously because produced alternating magnetic field in the space, can produce the vortex in the part that need not be heated equally, and magnetic field also can produce electromagnetic interference to other electrical equipment. However, the requirements of the growth of the thin film material on the heating temperature and the temperature uniformity of the heating device are high, and the existing heating equipment is difficult to simultaneously meet the requirements of high heating temperature and uniform heating temperature.
In summary, it is a technical problem to be solved by researchers in the field how to provide a heating device based on electromagnetic induction, which has high heating temperature, high heating speed, good temperature uniformity, high energy utilization efficiency, small influence on other devices in the device, and small electromagnetic influence on the environment outside the device.
Disclosure of Invention
Technical problem to be solved
In view of the above technical problems, the present invention provides a heating device based on electromagnetic induction, which has high heating temperature, high heating speed, good temperature uniformity, high energy utilization efficiency, small influence on other devices in the device, and small electromagnetic influence on the environment outside the device.
(II) technical scheme
The invention provides a heating device based on electromagnetic induction, which comprises: an alternating current coil 04, a tray 05, a ceramic disc 07 and a magnetizer assembly;
tray 05 sets up in ceramic dish 07 top, and ceramic dish 07 sets up in ac coil 04 top, and the magnetizer subassembly forms a holding chamber, and tray 05, ceramic dish 07 and ac coil 04 are located in the holding chamber.
In some embodiments of the invention, the magnetizer assembly includes:
a first magnetizer 08a, a second magnetizer 08b, and a third magnetizer 08 c;
the first magnetizer 08a is arranged at the outer side of the second magnetizer 08b and is used for concentrating magnetic lines and guiding the directions of the magnetic lines;
the second magnetizer 08b is formed between the ceramic disk 07 and the third magnetizer 08c and is used for fixedly supporting the ceramic disk 07 and guiding the direction of magnetic lines of force;
the third magnetizer 08c is arranged below the alternating-current coil 04 and is used for concentrating magnetic lines and guiding the directions of the magnetic lines;
the accommodating cavity is of a semi-closed barrel-shaped structure, and a through hole is formed in the center of the third magnetizer 08 c.
In some embodiments of the present invention, the upper surface of the first magnetic conductor 08a is flush with the upper surface of the tray 05.
In some embodiments of the present invention, the first magnetic conductor 08a is placed on the upper surface of the third magnetic conductor 08c, and the outer side surface of the third magnetic conductor 08c is flush with the outer side surface of the first magnetic conductor 08 a.
In some embodiments of the present invention, in the horizontal direction, the outer side surface of the third magnetic conductor 08c is fixed to the inner side surface of the first magnetic conductor 08a, and the lower surface of the third magnetic conductor 08c is flush with the lower surface of the first magnetic conductor 08 a.
In some embodiments of the present invention, the first magnetic conductor 08a, the second magnetic conductor 08b, and the third magnetic conductor 08c are spaced apart from the ac coil 04 and the tray 05.
In some embodiments of the invention, there is a gap between the ceramic disk 07 and the ac coil 04.
The invention provides metal organic chemical vapor deposition equipment, which comprises: a heating device as claimed in any one of claims 1 to 7.
In some embodiments of the invention, further comprising: the device comprises an air inlet pipeline 01, a reaction chamber cavity 02, a rotating motor 03 and a reaction chamber cavity cover 06;
the air inlet pipeline 01 is arranged on the reaction chamber cavity cover 06, the rotating motor 03 is vertically arranged at the bottom of the reaction chamber cavity 02, and the reaction chamber cavity cover 06 is arranged on the reaction chamber cavity 02.
In some embodiments of the invention, there is a gap between the rotating electrical machine 03 and the ac coil 04, the ceramic disc 07, and the third magnetizer 08 c.
(III) advantageous effects
According to the technical scheme, the heating device based on electromagnetic induction has the following beneficial effects:
(1) the magnetizer arranged around the tray enables most of magnetic lines of force to be concentrated nearby the tray, so the heating temperature is high, and the heating speed is high;
(2) the magnetic lines of force in the tray are uniformly distributed, so the temperature uniformity of the invention is good;
(3) the magnetizer can gather magnetic lines of force, guide the direction of the magnetic lines of force, reduce magnetic resistance and the ceramic disk reflects the heat radiated from the tray to the lower part of the reaction cavity back to the tray, so the energy utilization efficiency of the invention is high;
(4) most magnetic force lines are concentrated around the tray, and the spatial range of the distribution of the magnetic force lines is reduced, so that the electromagnetic influence on other equipment in the device and the external environment of the device is small.
Drawings
Fig. 1 is a schematic cross-sectional structure diagram of a heating device based on electromagnetic induction according to the present invention;
fig. 2 is a partial schematic view of a heating device based on electromagnetic induction according to the present invention;
FIG. 3 is a spatial magnetic field distribution diagram in a reaction chamber of a conventional thin film material growth apparatus;
FIG. 4 is a spatial magnetic field distribution diagram of a reaction chamber according to an embodiment of the present invention;
FIG. 5 is a graph of time versus temperature for a heated tray in accordance with an embodiment of the present invention.
[ notation ] to show
01-an air inlet pipeline; 02-a reaction chamber cavity; 03-a rotating electrical machine; 04-alternating current coil; 05-a tray; 06-reaction chamber cover; 07-a ceramic disc; 08a, 08b, 08 c-magnetizers.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to specific embodiments and the accompanying drawings. It should be noted that in the drawings or description, the same drawing reference numerals are used for similar or identical parts. Implementations not depicted or described in the drawings are well known to those of ordinary skill in the art. Additionally, while exemplifications of parameters including particular values may be provided herein, it is to be understood that the parameters need not be exactly equal to the respective values, but may be approximated to the respective values within acceptable error margins or design constraints.
The invention provides a heating device based on electromagnetic induction. As shown in fig. 1, fig. 1 is a schematic cross-sectional structure diagram of a heating device based on electromagnetic induction according to the present invention, where the heating device based on electromagnetic induction includes an ac coil 04, a tray 05, a ceramic plate 07, a first magnetizer 08a, a second magnetizer 08b, and a third magnetizer 08 c. The heating device is disposed in the reaction chamber 02.
The rotating motor 03 is vertically arranged at the bottom of the reaction chamber, vertically penetrates through the through holes of the alternating current coil 04 and the ceramic disc 07, and the through hole of the third magnetizer 08c, and is used for driving the tray 05 to rotate so as to improve the uniformity of material growth; an ac coil 04 horizontally disposed at a lower portion of the ceramic plate 07 for heating the tray 05; a tray 05 vertically arranged on the rotary motor, having a center coinciding with the axis of the rotary motor, for carrying an object to be heated; a ceramic plate 07 horizontally disposed at a lower portion of the tray 05 for reflecting heat radiation of the tray 05 to a lower space; the magnetizer assembly includes: a first magnetizer 08a, a second magnetizer 08b, and a third magnetizer 08 c. A first magnetizer 08a disposed outside the second magnetizer 08b for concentrating magnetic lines and guiding the directions of the magnetic lines; the second magnetizer 08b is vertically arranged between the ceramic disk 07 and the third magnetizer 08c, and is used for fixedly supporting the ceramic disk 07 and guiding the direction of magnetic lines of force, and keeping the ceramic disk 07 not to be contacted with the alternating current coil 04 and the third magnetizer 08 c; and a third magnetizer 08c horizontally disposed at the lower portion of the ac coil for concentrating and guiding the direction of the magnetic lines.
The heating device based on electromagnetic induction of the embodiment is a heating device used in a metal organic chemical gas deposition device. The air inlet pipeline 01 is arranged on the reaction chamber cavity cover 06 and is used for introducing carrier gas and various raw materials required by the growth of the film material into the reaction chamber; when the film material grows, high-frequency or medium-frequency alternating current is conducted to the alternating current coil 04, the alternating current coil 04 is an air coil, and water is conducted into the coil to cool the temperature of the coil. The ac coil 04 excites an alternating magnetic field having the same period as the current in the surrounding space, and the conductor in the alternating magnetic field induces an eddy current in the conductor due to the electromagnetic induction effect to generate heat and increase the temperature.
The distribution of the magnetic field in the reaction chamber of the conventional thin film material growth apparatus is shown in fig. 3, in which the curve is the magnetic force line. It can be known that the magnetic field is distributed in the whole chamber, and the rotating electrical machine 03 and the reaction chamber 02 are both in the range of the alternating magnetic field, so that these conductor parts are also heated by the eddy current. Meanwhile, a weak magnetic field is also generated in the ambient environment outside the reaction chamber 02, which causes electromagnetic pollution to the environment and influences the normal operation of other electrical equipment.
FIG. 4 shows the spatial magnetic field distribution in the reaction chamber of this embodiment, and the curve shows the magnetic field distribution. It can be seen that most of the magnetic field is concentrated in the region formed by the tray 05, the first magnetizer 08a, the second magnetizer 08b and the third magnetizer 08c, so that the energy utilization efficiency of the magnetic field in this embodiment is high, the heating temperature to the tray is high, the heating speed is high, and the temperature uniformity is good. Only a very small amount of magnetic lines of force are distributed outside the area formed by the tray 05, the first magnetizer 08a, the second magnetizer 08b and the third magnetizer 08c, so that the heating device of the embodiment hardly generates eddy currents in other equipment in the reaction chamber and has small electromagnetic influence on the external environment of the device.
By arranging the magnetizers 08a, 08b and 08c around the alternating current coil 04, the distribution of magnetic lines of force is changed, the spatial range of the distribution of the magnetic field can be limited, and the magnetic field is mainly limited in the area where the alternating current coil 04 and the tray 05 are located. As shown in fig. 4, a substantial portion of the magnetic flux may be concentrated near the tray 05.
In this embodiment, the tray 05 is a circular tray; the ceramic disc 07 is a circular ceramic disc, the center of the ceramic disc is a through hole, the ceramic disc 07 reflects heat radiated from the tray 05 to the lower space of the reaction chamber back to the tray 05, and the rotating motor 03 and the magnetizers 08a, 08b and 08c are prevented from being heated by the radiated heat, so that the energy utilization efficiency of the invention is high. However, this is merely an example, the shape of the tray 05 and the ceramic disk 07 is not limited to a circular shape, and the shape and size of the magnetic conductors 08a, 08b, 08c may be adjusted according to the shape and size of the tray 05 and the ceramic disk 07.
The first magnetizer 08a is a hollow circular ring and is arranged on the third magnetizer 08c, and the inner surface of the first magnetizer 08a is vertically contacted with the outer side of the ceramic plate 07; the second magnetizer 08b is a hollow circular ring and is arranged between the ceramic plate 07 and the third magnetizer 08c, and the outer side of the second magnetizer 08b is contacted with the inner side of the first magnetizer 08 a; the third magnetizer 08c is a disk, and the center thereof is a through hole. In the vertical direction, the outer side surface of the third magnetic conductor 08c is flush with the outer side surface of the first magnetic conductor 08a, so that most of magnetic lines of force can be concentrated in the magnetic conductor. The upper surface of the first magnetizer 08a is flush with the upper surface of the tray 05, and most of the magnetic lines of force can pass through the tray 05. However, this is merely an exemplary illustration, the position and the positional relationship between the first magnetizer 08a and the third magnetizer 08c are not limited to that the first magnetizer 08a is disposed on the upper surface of the third magnetizer 08c, and the outer side surface of the third magnetizer 08c is flush with the outer side surface of the first magnetizer 08a in the vertical direction, and in addition, the third magnetizer 08c may be disposed in the inner hollow region of the first magnetizer 08a, and in the horizontal direction, the outer side surface of the third magnetizer 08c is fixed to the inner side surface of the first magnetizer 08a, and the lower surface of the third magnetizer 08c is flush with the lower surface of the first magnetizer 08 a. The shapes of the first magnetizer 08a, the second magnetizer 08b and the third magnetizer 08c are not limited to the shapes described in the embodiment, and because the limit degree of the hollow area formed by combining the first magnetizer 08a, the second magnetizer 08b and the third magnetizer 08c to the magnetic field is increased along with the increase of the length, the width, the height and the thickness of the accommodating cavity of the hollow area, the limit capability of the magnetic field of the invention can be improved by designing the length, the width and the height of the accommodating cavity formed by combining the first magnetizer 08a, the second magnetizer 08b and the third magnetizer 08c and the thickness of the accommodating cavity.
A simulation of the time-temperature curve of the heated tray of this example is shown in fig. 5. Fig. 5 is a solid line showing a change in heating temperature of the tray by the heating device with time in the absence of the magnetic conductor; the dotted line shows the change of the heating temperature of the tray with the heater with the magnetizer. Through the comparison, when the heating device with the magnetizer and the heating device without the magnetizer heat the same tray, the temperature rise time of the tray is shorter under the condition of the magnetizer, namely, the heating speed is faster. And the heating temperature of the same heating device under the condition of no magnetizer is obviously lower than that under the condition of the magnetizer.
Another embodiment of the present invention further provides a metal organic chemical vapor deposition apparatus, including: the heating device comprises the heating device, an air inlet pipeline 01, a reaction chamber cavity 02, a rotating motor 03 and a reaction chamber cavity cover 06. The air inlet pipeline 01 is arranged on the reaction chamber cavity cover, the rotating motor 03 is vertically arranged at the bottom of the reaction chamber cavity 02, and the reaction chamber cavity cover 06 is arranged on the reaction chamber cavity 02. Gaps exist among the rotating electric machine 03, the alternating current coil 04, the ceramic disc 07 and the third magnetizer 08 c.
Up to this point, the present embodiment has been described in detail with reference to the accompanying drawings. From the above description, a person skilled in the art should have a clear understanding of the electromagnetic induction based heating apparatus of the present invention.
It is to be noted that, in the attached drawings or in the description, the implementation modes not shown or described are all the modes known by the ordinary skilled person in the field of technology, and are not described in detail. In addition, the definitions of the various elements and steps described above are not limited to the specific structures, shapes or manners mentioned in the embodiments, and those skilled in the art can easily modify or replace them, and the directional terms mentioned in the embodiments, such as "upper", "lower", "front", "back", "left", "right", etc., refer to the directions of the drawings only, and are not intended to limit the protection scope of the present invention; the embodiments described above may be mixed and matched with each other or with other embodiments based on design and reliability considerations, i.e. technical features in different embodiments may be freely combined to form further embodiments.
In summary, the heating device based on electromagnetic induction provided by the invention has the advantages of high heating temperature, high heating speed, good temperature uniformity, high energy utilization efficiency, small influence on other devices in the device and small electromagnetic influence on the external environment of the device.
The above-mentioned embodiments are intended to illustrate the objects, technical solutions and advantages of the present invention in further detail, and it should be understood that the above-mentioned embodiments are only exemplary embodiments of the present invention, and are not intended to limit the present invention, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (8)
1. An electromagnetic induction based heating device comprising: the alternating current coil (04), the tray (05), the ceramic disc (07) and the magnetizer component;
the tray (05) is arranged above the ceramic disc (07), the ceramic disc (07) is arranged above the alternating current coil (04), the magnetizer assembly forms an accommodating cavity, and the tray (05), the ceramic disc (07) and the alternating current coil (04) are positioned in the accommodating cavity;
the magnetizer assembly includes:
a first magnetizer (08a), a second magnetizer (08b), and a third magnetizer (08 c);
the first magnetizer (08a) is arranged at the outer side of the second magnetizer (08b) and is used for concentrating magnetic lines and guiding the directions of the magnetic lines;
the second magnetizer (08b) is arranged between the ceramic disk (07) and the third magnetizer (08c) and is used for fixedly supporting the ceramic disk (07) and guiding the direction of magnetic lines;
the third magnetizer (08c) is arranged below the alternating current coil (04) and is used for concentrating magnetic lines and guiding the directions of the magnetic lines;
the accommodating cavity is of a semi-closed barrel-shaped structure, and a through hole is formed in the center of the third magnetizer (08 c).
2. The heating device based on electromagnetic induction according to claim 1, characterized in that the upper surface of the first magnetizer (08a) is flush with the upper surface of the tray (05).
3. The heating apparatus based on electromagnetic induction according to claim 1, characterized in that the first magnetizer (08a) is placed on the upper surface of the third magnetizer (08c), and the outer side surface of the third magnetizer (08c) is flush with the outer side surface of the first magnetizer (08 a).
4. The heating apparatus based on electromagnetic induction according to claim 1, wherein, in the horizontal direction, an outer side surface of the third magnetizer (08c) is fixed to an inner side surface of the first magnetizer (08a), and a lower surface of the third magnetizer (08c) is flush with the lower surface of the first magnetizer (08 a).
5. The heating apparatus based on electromagnetic induction according to claim 1, wherein the first magnetizer (08a), the second magnetizer (08b), and the third magnetizer (08c) are spaced apart from the ac coil (04) and the tray (05).
6. Heating device based on electromagnetic induction, according to claim 1, characterized in that there is a gap between the ceramic disc (07) and the ac coil (04).
7. A metal organic chemical vapor deposition apparatus comprising: the heating device of any one of claims 1 to 6; further comprising: the device comprises an air inlet pipeline (01), a reaction chamber cavity (02), a rotating motor (03) and a reaction chamber cavity cover (06);
the air inlet pipeline (01) is arranged on the reaction chamber cavity cover (06), the rotating motor (03) is vertically arranged at the bottom of the reaction chamber cavity (02), and the reaction chamber cavity cover (06) is arranged on the reaction chamber cavity (02).
8. The MOCVD apparatus according to claim 7, wherein a gap is formed between the rotating electric machine (03) and the AC coil (04), the ceramic disk (07), and the third magnetic conductor (08 c).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710738799.8A CN107475691B (en) | 2017-08-24 | 2017-08-24 | Heating device based on electromagnetic induction |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710738799.8A CN107475691B (en) | 2017-08-24 | 2017-08-24 | Heating device based on electromagnetic induction |
Publications (2)
Publication Number | Publication Date |
---|---|
CN107475691A CN107475691A (en) | 2017-12-15 |
CN107475691B true CN107475691B (en) | 2020-07-07 |
Family
ID=60601572
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710738799.8A Active CN107475691B (en) | 2017-08-24 | 2017-08-24 | Heating device based on electromagnetic induction |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN107475691B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109536928B (en) * | 2018-11-23 | 2020-10-09 | 中国科学院半导体研究所 | Tray supporting and fixing device |
CN110162897B (en) * | 2019-05-28 | 2020-10-02 | 燕山大学 | Optimization method for heating magnetizer of large-diameter bent pipe |
CN110996419B (en) * | 2019-12-11 | 2022-09-16 | 北京北方华创微电子装备有限公司 | Induction heating device and semiconductor processing equipment |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1563477A (en) * | 2004-04-20 | 2005-01-12 | 南昌大学 | Heating unit in use for metal-organic chemical vapor deposition system |
CN201429067Y (en) * | 2009-04-29 | 2010-03-24 | 中冶京诚工程技术有限公司 | Multi-position electromagnetic steam-superheating gas supply regulating system |
CN201522075U (en) * | 2009-10-16 | 2010-07-07 | 陈家显 | Built-in electromagnetic induction heating device |
CN103014673A (en) * | 2012-12-27 | 2013-04-03 | 济南大学 | Electromagnetic heating device for metal organic chemical vapor deposition (MOCVD) reaction chamber |
CN106811739A (en) * | 2015-12-02 | 2017-06-09 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Semiconductor processing equipment |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20050052081A (en) * | 2003-11-29 | 2005-06-02 | Samsung Electronics Co Ltd | A composite cooking apparatus |
JP5453768B2 (en) * | 2008-11-05 | 2014-03-26 | 豊田合成株式会社 | Compound semiconductor manufacturing apparatus, compound semiconductor manufacturing method, and compound semiconductor manufacturing jig |
CN201854463U (en) * | 2009-07-05 | 2011-06-01 | 莆田市恒达机电实业有限公司 | High-frequency induction heating device employing magnetic conductor |
-
2017
- 2017-08-24 CN CN201710738799.8A patent/CN107475691B/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1563477A (en) * | 2004-04-20 | 2005-01-12 | 南昌大学 | Heating unit in use for metal-organic chemical vapor deposition system |
CN201429067Y (en) * | 2009-04-29 | 2010-03-24 | 中冶京诚工程技术有限公司 | Multi-position electromagnetic steam-superheating gas supply regulating system |
CN201522075U (en) * | 2009-10-16 | 2010-07-07 | 陈家显 | Built-in electromagnetic induction heating device |
CN103014673A (en) * | 2012-12-27 | 2013-04-03 | 济南大学 | Electromagnetic heating device for metal organic chemical vapor deposition (MOCVD) reaction chamber |
CN106811739A (en) * | 2015-12-02 | 2017-06-09 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Semiconductor processing equipment |
Also Published As
Publication number | Publication date |
---|---|
CN107475691A (en) | 2017-12-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN107475691B (en) | Heating device based on electromagnetic induction | |
KR100694351B1 (en) | Apparatus and method for epitaxially processing a substrate | |
KR101349945B1 (en) | Film forming apparatus and film forming method | |
US20170365493A1 (en) | Heating device and heating chamber | |
CN103938186B (en) | Pallet, MOCVD reaction chamber and MOCVD device | |
CN202230996U (en) | Electrostatic chuck capable of carrying out regional temperature control | |
WO2012086268A1 (en) | Induction heating apparatus and induction heating method | |
CN104717817A (en) | Heating device used for radio frequency window of inductive coupling-type plasma processor | |
CN107326343B (en) | Induction heating device for thin film material growth | |
CN103014673A (en) | Electromagnetic heating device for metal organic chemical vapor deposition (MOCVD) reaction chamber | |
CN103451621B (en) | MOCVD reaction chamber and processing unit | |
WO2015145974A1 (en) | Heat treatment device | |
CN104372310B (en) | Reaction chamber and epitaxial growth equipment | |
CN104498906A (en) | MOCVD reactor | |
CN107523807B (en) | Fixing control device of heating tray and equipment thereof | |
KR101081462B1 (en) | Production apparatus and method for thin film compound semiconductor solar cell using induction heating method | |
JP2017084989A (en) | Silicon carbide epitaxial growth device, method of manufacturing silicon carbide epitaxial wafer, and method of manufacturing silicon carbide semiconductor device | |
CN110996419B (en) | Induction heating device and semiconductor processing equipment | |
CN210765582U (en) | Heating device for silicon carbide epitaxy | |
CN103614709B (en) | For the combination base type electromagnetic heater of MOCVD reaction chamber | |
Mei et al. | Simulation and optimization of temperature distribution in induction heating reactor | |
JP2013115264A (en) | Processed wafer support structure and plasma processing apparatus | |
CN110023537B (en) | Base seat | |
JP2020015642A (en) | Crystal growth apparatus | |
CN115632013B (en) | Wafer heating device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20180614 Address after: 100083 No. 35, Qinghua East Road, Beijing, Haidian District Applicant after: Semiconductor Inst., Chinese Academy of Sciences Applicant after: University of Chinese Academy of Sciences Address before: 100083 No. 35, Qinghua East Road, Beijing, Haidian District Applicant before: Semiconductor Inst., Chinese Academy of Sciences |
|
GR01 | Patent grant | ||
GR01 | Patent grant |