CN1074715A - The arc sowrce-multi-ion beam material surface modification tecbnique - Google Patents

The arc sowrce-multi-ion beam material surface modification tecbnique Download PDF

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CN1074715A
CN1074715A CN 92100416 CN92100416A CN1074715A CN 1074715 A CN1074715 A CN 1074715A CN 92100416 CN92100416 CN 92100416 CN 92100416 A CN92100416 A CN 92100416A CN 1074715 A CN1074715 A CN 1074715A
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ion beam
ion
source
arc
workpiece
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陈宝清
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Dalian University of Technology
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Dalian University of Technology
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Abstract

The arc sowrce-multi-ion beam material surface modification tecbnique is realized in having devices such as ion beam injection source, ion beam sputtering source, arc source and workpiece negativing high-voltage power.Handling the workpiece surface modification layer has the broad transition layer, and tack is good, the sedimentation rate height; Can form modified layer such as single or multiple lift nitride, carbide, nitrogen-carbide at workpiece surface; One machine can be finished ion plating, Ion Mixing, ion implantation.Can be used for parts such as all kinds of cutters, mould, bearing, gear wheel brill, wrist-watch, light fixture; Present technique is nuisanceless, has wide application prospects.

Description

The arc sowrce-multi-ion beam material surface modification tecbnique
The invention belongs to the material surface modifying method, be specially adapted to metal surface properties modification, be called for short the Arc-MIB technology.
In existing technology, the material surface modifying method adopts ion plating, Ion Mixing, technology such as ion implantation usually, but because modified layer is thin, sedimentation rate is low, and transition layer is narrow between matrix, so use range is restricted, and the equipment manufacturing cost height, customer investment is big.
The purpose of this invention is to provide a kind of arc sowrce-multi-ion beam material surface modification tecbnique, this technology can make between modified layer and matrix does not have sharp interface, and the transition layer (2～4 μ m) of broad is arranged, and tack is good, improves resistance to shock loads and anti-fatigue ability; Ionization is effective, and sedimentation rate is fast, can form the thin-film material of single or multiple lift; Can finish on the equipment and decorate ion plating, functional coating ion plating, Ion Mixing, a function such as ion implantation.Range of application is enlarged, and equipment manufacturing cost reduces.
Particular content of the present invention is as follows:
Principle of the present invention:
The interior workpiece of vacuum chamber (1) (5) is placed on that worktable (3) need to rotate and water-cooled, ejects atoms metal such as Ti, Cr, Zr, Nb from arc source (2) ... available Me represents, deposits on workpiece (5) surface, with feeding vacuum chamber (1) reaction gases such as N 2, CH 4Ion after the ionization such as N +, C +Use A +Expression interacts and forms TiN, TiC, TiO 2, ZrN, BN etc. represent with MeA.In deposition process, workpiece (5) adds negative high voltage.Can form at workpiece surface and decorate ion coating plating such as golden yellow TiN, silvery white TiC etc., or functional ion plating coating such as superhard TiN, TiC, BN etc.
When ion beam sputtering source (6) feed argon gas (Ar), form ar-ion beam (Σ Ar +) be mapped on the target platform (8), deposit on workpiece (5) surface from the last sputter metal atoms bundle of target (7) such as Ti, Cr, Nb etc., simultaneously, ion beam injection source (9) feeds gas such as N 2, CH 4, O 2Penetrate ionic fluid such as N after the plasma +, C +, O +Deng using A +Expression is mapped on the workpiece surface synchronously, and deposit and inject and interacts, on workpiece time top layer, the intermetallic compound that top layer formation has superhard or other functions.
Can work simultaneously in arc source (2), ion beam sputtering source (6), the metal refining atom raising deposition shape film speed that provide are carried out Ion Mixing more.
Ion beam injection source (9) feeds N 2, CH 4, O 2Deng through being ionized into all kinds of ionic fluids such as N +, C +, O +Carry out material surface modifying Deng being injected into workpiece (5) surface, improve the wear resistance of material and solidity to corrosion etc.
Workpiece (5) band negative high voltage electricity (4) atoms metal ionization level improves (work of DC I), further attracts the ionic fluid that penetrates from ion beam injection source (9), finishes comprehensive injection, improve deposited coatings around plating property (work of DC II).
Technological process of the present invention
1. workpiece (5) surface must strict ultrasonic cleaning, and degreasing dewaters, and puts in the vacuum chamber (1), vacuumizes, and vacuum tightness reaches 10 -4Pa.
2. sputter clean, vacuum chamber (1) feeds argon gas (Ar), and vacuum tightness is reduced to 5pa-10 -1Pa, workpiece (5) add negative high voltage electricity-1000～-3000V, sputter clean time 15～20min; Vacuumize, vacuum tightness reaches 10 again -4Pa.
3. decoration ion plating
(1). vacuum chamber (1) feeds argon gas (Ar) and nitrogen (N 2) vacuum tightness reduces to 2.5～4pa;
(2). arc source (2) energising work, arc source (2) electric current 40-60A; Workpiece (5) adds negative voltage 500-150V, and workpiece (5) temperature can reach 250 ℃, depositing time 1～2 hour;
(3). workpiece (5) surface deposition TiN is golden yellow, and TiC is silvery white in color.
4. functional coating ion plating
(1). vacuum chamber (1) feeds argon gas (Ar) nitrogen (N 2) vacuum tightness reduces to 2.5～4pa;
(2). arc source (2) energising work, arc source (2) electric current 40-60A; Workpiece (5) adds negative voltage 500-150V, and workpiece (5) temperature can reach 400 ℃, depositing time 1～2 hour;
(3). its hardness of workpiece (5) surface deposition TiN is Hv1800～2400, its hardness of TiC Hv2800～3400.
5. Ion Mixing
(1). vacuum chamber (1) vacuumizes, and vacuum tightness reaches 10 -4Pa;
(2). ion beam injection source (9) work feeds nitrogen (N 2), vacuum tightness is reduced to (1～6) * 10 -3Pa;
(3). ion beam sputtering source (6) work feeds argon gas (Ar), and vacuum tightness is reduced to (4～8) * 10 -3Pa;
(4). work simultaneously in two kinds of sources, deposition and injection synchronously on workpiece (5) surface.
6. ion implantation
(1). vacuum chamber (1) vacuumizes, and vacuum tightness reaches 10 -4Pa;
(2). ion beam injection source (9) work feeds nitrogen (N 2), methane (CH 4) ... vacuum tightness is reduced to (1～6) * 10 -3Pa, ionic fluid N +, C +Be injected into workpiece surface;
(3). implantation dosage elect as (0.8～9 ... 17) * 10 17Number of ions/cm 2
Main technical details of the present invention:
1. vacuum chamber (1) base vacuum degree: 10 -4Pa
2. ion beam injection source (9)
Energy: 10-100kev; Line: 2-25mA;
Quantity: 1
3. ion beam sputtering source (6)
Energy: 2-6kev; Line: 30-250mA;
Quantity: 1～2.
4. workpiece negative bias power supply (4), two:
DC I: voltage: 0-1000V; Electric current: 0-60A;
DC II: voltage: 300-5000V; Electric current: 0-6A.
5. arc source (2)
Voltage: 10-100V; Electric current: 10-100A;
Quantity: 2～16.
The technology of the present invention can be used for following scope:
1. ornament: as wrist-watch, watchband, tableware, light fixture etc.
2. cutter class: as lathe tool, drill bit, gearcutter, cutter knife, broaching tool, profile cutter etc., material can be high speed steel W 18Cr4V, W6Mo5Cr4V2 etc., Wimet YG6, YG8 etc.
3. mould class: as finisher of cold-punching mold, wortle, mould of plastics, extrusion mould, hot-forging die etc.
Material can be Cr12, Cr12MoV, 6OSi2Mn, W18Cr4V, LD steel (7Cr17Mo2V2Si), YG8, YG20, CrWMn, 9CrSi, 5CrNiMo, 5CrMnMo, 3Cr2W8,45 steel etc.
4. oil pump nozzle precision pair, material can be W18Cr4V, GCr15 etc.
5. precision bearing, material can be GCr15, GCr15SiMn, Cr18 etc.
6. crankshaft type, material can be QT60-2, QT70-2, QT120-1 etc.
7. roll class, material can be cold hard cast-iron, cast alloy iron, spheroidal graphite cast iron.
8. titanium base alloy is as Ti-6Al-4V
9. aluminum base alloy
10. can form following intermetallic compound, as:
Nitride: TiN, AlN, VN, NbN, MoN, Mo 2N, BN, TaN, HfN, Cr 2N, Fe 2N, Fe 4N etc.;
Carbide: TiC, WC, VC, NbC, TaC, ZrC, MoC, Mo 2C, W 2C 3, Ta 2C, Nb 4C, B 4C, SiC, Cr 3C 2Deng;
Nitrogen-carbide: Ti(CN), Ta(CN), Al(CN) etc.;
Boride: TiB 2, ZrB 2, NbB 2, TaB 2, WB, MoB 2Deng;
Multiple metallic element complex nitride, carbide:
(Ti, W, V) N, (Ta, Nb) N etc.
(Ti, W, V) C, (TaNb) C etc.
Description of drawings of the present invention:
Accompanying drawing is an arc sowrce-multi-ion beam material surface modification tecbnique principle schematic.Among the figure:
(1) vacuum chamber, (2) arc source, (3) worktable, (4) workpiece negativing high-voltage power (DC I, DC II), (5) workpiece, (6) ion beam sputtering source, (7) target, (8) target platform, (9) ion beam injection source.
Describe the concrete technology that adopts the present invention to realize material surface modifying embodiment in detail below in conjunction with accompanying drawing.
Adopt the present invention to realize that the concrete technology of material embodiment is as follows:
Surface modification:
1. imitative golden TiN ion is decorated plating
Vacuum chamber (1) feeds N 2, vacuum tightness 2.5pa～4.0 * 10 -1Pa, workpiece add negative voltage 250-600V, arc source (2) work, and electric current 25-70A, target (7) be the Ti material, workpiece temperature～250 ℃, part is golden yellow.
2. the ion plating of superhard TiN coating
Vacuum chamber (1) feeds N 2, vacuum tightness 2.5pa～4.0 * 10 -1Pa, workpiece add negative voltage 250-600V, arc source (2) work, and electric current 25～70A, target (7) is the Ti material, workpiece temperature～400 ℃, tool surface depositing TiN superhard coating.
3. superhard modified layer Ion Mixing
1. technology (1):
W18Cr4V, QT80-2, GCr15 material are handled through Arc-MIB, its technology:
(I) nitrogen ion beam (N +) inject: energy 80kev, dosage (0.8～1) * 10 17N +/ cm 2, injection length 80min.
(II) ionic fluid (Ti, N +) mix ion beam injection source (9) energy 60kev.Ion beam sputtering source (6) energy 6kev.
Beam current density 10.10～29.2 μ A/cm 2, mixing time 120min.
After Arc-MIB handles, produce the extra small hardness tester of DMH-ZLS type with Japan, test knoop hardness (Hk), load 5g, its result is as shown in table 1.
2. technology (2):
W18Cr4V, QT80-2, GCr15 material are handled through Arc-MIB, its technology:
(I) nitrogen ion beam (N +) inject: energy 80keV, dosage 1 * 10 17N +/ cm 2, injection length 80min.
(II) ionic fluid (Ti, N +) mixing (I): ion beam injection source (9) energy 60kev, ion beam sputtering source (6) energy 6kev, beam current density 10.10～29.2 μ A/cm 2120min during mixing.
(III) ionic fluid (Ti+N +) mixing (II); Ion beam injection source (9) energy 40kev, ion beam sputtering source (6) energy 6kev, beam current density 10.10～29.2 μ A/cm 2, 120min.Sample testing knoop hardness (HK), its hardness value is as shown in table 2.
3. technology (3):
Cr12MoV, 60Si2Mn material are handled through Arc-MIB, its technology: ionic fluid (N +, Ti) mix ion beam injection source (9) energy 25kev, ion beam sputtering source (6) energy 6kev, beam current density 10.10～29.2 μ A/cm 2, test knoop hardness (HK), its result is as shown in table 3.
4. technology (4):
The YG20 material is handled through Arc-MIB, its technology:
(I) nitrogen ion (N +) inject: energy 60kev, dosage 3 * 10 17N +/ cm 2, injection length 50min.
(II) ionic fluid (Ti+N +) mix: ion beam injection source (9) energy 25kev, ion beam sputtering source (6) energy 5kev, beam current density 10.10～29.2 μ A/cm 2, mixing time 60min, sample testing knoop hardness (HK), its result is as shown in table 4.
4. Surface Modification of Ion Implanted
1. rapid steel (M2) nitrogen ion (N +) inject ion beam injection source (9) energy 50kev, (2～8) * 10 under various dose 17N +/ cm 2Sample hardness (Hv) test result is as shown in table 5 after Arc-MIB handles.
2. Wimet (YG20) nitrogen ion (N +) inject ion beam injection source (9) energy 60kev, (1～7) * 10 under various dose 17N +/ cm 2, after Arc-MIB handled, sample hardness (Hv) test result was as shown in table 6
3. Cr12MoV nitrogen ion (N +) inject
Ion beam injection source (9) energy 80kev, (0.8～7) * 10 under various dose 17, after Arc-MIB handled, sample hardness (Hv) test result was as shown in table 7.
Table 1 technology (1) sample hardness (HK) test result
Figure 921004168_IMG1
Table 2 technology (2) sample hardness (HK) test result
Figure 921004168_IMG3
Table 4 YG20 material is handled through Arc-MIB technology (4)
Sample hardness (HK) test result
Figure 921004168_IMG4
Table 5 rapid steel (M2-W6Mo5Cr4V2) is handled through Arc-MIB
Sample hardness (HV) test result
Figure 921004168_IMG5
Figure 921004168_IMG6

Claims (4)

1, a kind of arc source one multiple ion-beam material surface modifying technology is to realize that its technology principal character is in the equipment configuration of being made up of vacuum chamber (1), arc source (2), ion beam injection source (9), ion beam sputtering source (6), worktable (3), workpiece negativing high-voltage power (4), target platform (8) etc.:
With arc source (2), ion beam injection source (9), ion beam sputtering source (6), workpiece negativing high-voltage power (4) electric supply installation, produce metal atomic beam and gaseous ion bundle as arc source one multiple ion-beam material surface modifying technology system; Workpiece (5) adds negative high voltage electric field attracts gaseous ion bundle.
2, according to claim 1, the arc sowrce-multi-ion beam material surface modification tecbnique is characterized in that:
Ion beam injection source (9) energy 10-100kev, line 2-25mA; Ion beam sputtering source (6) energy 1-6kev, line 30-250mA; Arc source (2) electric current 10-100A, voltage 10-100V; Workpiece negativing high-voltage power (4) DC I voltage 0-1000V, electric current 0-60A, DC II voltage 300-5000V, electric current 0-6A.
3, according to claim 1, the arc sowrce-multi-ion beam material surface modification tecbnique is characterized in that:
Can work simultaneously in ion beam injection source (9), ion beam sputtering source (6), arc source (2), workpiece (5) adds negative high voltage electric field attracts ionic fluid, help comprehensive injection and sedimentation rate and improve; Can form 2～4 μ m transition layers, improve the modified layer tack; One machine can be finished and decorate ion plating, functional coating ion plating, Ion Mixing, technology such as ion implantation.
4, according to claim 1, the arc sowrce-multi-ion beam material surface modification tecbnique is characterized in that:
Ion beam injection source (9) feeds reactant gasess such as nitrogen, hydrocarbons, arc source (2) and ion beam sputtering source (6) can adopt multiple metal targets (7) to produce multiple metal atomic beam (as Ti, Zr, Nb ...) on workpiece (5) surface, form single or multiple, the intermetallic compound of single or multiple lift such as nitride, carbide, nitrogen-carbide.
CN 92100416 1992-01-21 1992-01-21 The arc sowrce-multi-ion beam material surface modification tecbnique Pending CN1074715A (en)

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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100389918C (en) * 2003-07-15 2008-05-28 复旦大学 Multicomponent composite coated cutting tool and its preparation method
CN101017761B (en) * 2006-12-08 2010-05-12 珠海市恩博金属表面强化有限公司 Metal gas mixing ion injector
CN1868941B (en) * 2005-05-25 2010-07-14 奥林巴斯株式会社 Optical element forming mould and its manufacturing method and device
CN102242346A (en) * 2011-06-29 2011-11-16 中国计量学院 Device and process for growing TiAlN film on surface of aluminum alloy in situ
CN102978615A (en) * 2012-12-24 2013-03-20 常州大学 Ion arc induced metal surface layer composite TiN reinforcing method with TiO2 and N2 gas as components
CN104195521A (en) * 2014-09-16 2014-12-10 朱忠良 Method for modifying metal surface by mixed implantation of plasma source ion beams
CN110484881A (en) * 2019-08-15 2019-11-22 广东工业大学 A kind of densification titanium diboride coating and its preparation method and application
CN110712094A (en) * 2019-09-06 2020-01-21 中国兵器科学研究院宁波分院 Method for reducing ion beam polishing optical element surface pollution
CN111647859A (en) * 2020-06-01 2020-09-11 天津职业技术师范大学(中国职业培训指导教师进修中心) Preparation process of Zr-Ti-B-N nano composite coating in reducing atmosphere
CN115287587A (en) * 2022-07-21 2022-11-04 厦门建霖健康家居股份有限公司 Method for plating wire drawing film on plastic substrate

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100389918C (en) * 2003-07-15 2008-05-28 复旦大学 Multicomponent composite coated cutting tool and its preparation method
CN1868941B (en) * 2005-05-25 2010-07-14 奥林巴斯株式会社 Optical element forming mould and its manufacturing method and device
CN101017761B (en) * 2006-12-08 2010-05-12 珠海市恩博金属表面强化有限公司 Metal gas mixing ion injector
CN102242346A (en) * 2011-06-29 2011-11-16 中国计量学院 Device and process for growing TiAlN film on surface of aluminum alloy in situ
CN102978615B (en) * 2012-12-24 2014-12-24 常州大学 Ion arc induced metal surface layer composite TiN reinforcing method with TiO2 and N2 gas as components
CN102978615A (en) * 2012-12-24 2013-03-20 常州大学 Ion arc induced metal surface layer composite TiN reinforcing method with TiO2 and N2 gas as components
CN104195521A (en) * 2014-09-16 2014-12-10 朱忠良 Method for modifying metal surface by mixed implantation of plasma source ion beams
CN110484881A (en) * 2019-08-15 2019-11-22 广东工业大学 A kind of densification titanium diboride coating and its preparation method and application
CN110712094A (en) * 2019-09-06 2020-01-21 中国兵器科学研究院宁波分院 Method for reducing ion beam polishing optical element surface pollution
CN110712094B (en) * 2019-09-06 2021-07-23 中国兵器科学研究院宁波分院 Method for reducing ion beam polishing optical element surface pollution
CN111647859A (en) * 2020-06-01 2020-09-11 天津职业技术师范大学(中国职业培训指导教师进修中心) Preparation process of Zr-Ti-B-N nano composite coating in reducing atmosphere
CN111647859B (en) * 2020-06-01 2022-09-06 天津职业技术师范大学(中国职业培训指导教师进修中心) Preparation process of Zr-Ti-B-N nano composite coating in reducing atmosphere
CN115287587A (en) * 2022-07-21 2022-11-04 厦门建霖健康家居股份有限公司 Method for plating wire drawing film on plastic substrate

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