CN107462978A - A kind of large visual field high resolution object lens - Google Patents
A kind of large visual field high resolution object lens Download PDFInfo
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- CN107462978A CN107462978A CN201710878584.6A CN201710878584A CN107462978A CN 107462978 A CN107462978 A CN 107462978A CN 201710878584 A CN201710878584 A CN 201710878584A CN 107462978 A CN107462978 A CN 107462978A
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- 230000000007 visual effect Effects 0.000 title claims abstract description 28
- 230000003287 optical effect Effects 0.000 claims abstract description 27
- 238000003384 imaging method Methods 0.000 claims abstract description 8
- 239000000571 coke Substances 0.000 claims abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 15
- 239000013078 crystal Substances 0.000 claims description 7
- 230000002093 peripheral effect Effects 0.000 claims description 7
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 6
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 6
- 239000010453 quartz Substances 0.000 claims description 5
- 230000008859 change Effects 0.000 claims description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 229910052791 calcium Inorganic materials 0.000 claims 1
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- 239000000377 silicon dioxide Substances 0.000 description 11
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- 238000001514 detection method Methods 0.000 description 7
- 238000012545 processing Methods 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
- G02B13/0015—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras characterised by the lens design
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/06—Panoramic objectives; So-called "sky lenses" including panoramic objectives having reflecting surfaces
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
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Abstract
The present invention discloses a kind of large visual field high resolution object lens, for by the pattern imaging in object plane to image plane, from object plane side to image plane side along its optical axis direction, successively including the first microscope group, the second microscope group.First microscope group, the second microscope group are respectively provided with positive light coke, and the first microscope group is the catadioptric microscope group with least two plane of refraction and at least two reflecting surface, and the middle body of at least two reflecting surface of catadioptric microscope group does not have reflection characteristic and light can be allowed to pass through.The light that object plane is sent forms intermediary image after the first microscope group, and intermediary image reimaging after the second microscope group to image plane, and meets relational expression：1.2 ＜ | Rm |/f1 ＜ 2.8, wherein, f1 is the combined focal length of the first microscope group；Rm is the radius of curvature of the minimum reflecting surface of radius of curvature in all reflectings surface of the first microscope group.The present invention can effectively correct the various aberrations of heavy caliber system, especially high-order spherical aberration.
Description
Technical field
The present invention relates to a kind of wide spectrum large visual field high resolution object lens, more particularly to a kind of 200nm's to 350nm is dark purple
What outer wave-length coverage used, there are the large visual field high resolution object lens of wide spectrum high magnification and its corresponding Optical devices.
Background technology
As the integration density of semiconductor chip and device improves, it is desirable to which it checks that optical system has high-resolution ability
Detect more accurate details.In order to improve the resolution ratio for checking optical system, it is desirable to which optical system uses shorter wavelengths of photograph
Mingguang City；It is required that the numerical aperture of objective lens is bigger.In ultraviolet wavelength region, especially 200nm to 350nm deep ultraviolet wavelength
Region, the absorption of ordinary optical materials is very big, and light transmittance is very low.With the increase of numerical aperture, only dioptric system is used
It is also highly difficult to carry out aberration correction.
With the development of detection technique, high-resolution large-viewing-field optical detection requirement and demand increasingly strengthen.Have simultaneously
Wide spectrum, high-resolution, big visual field performance object lens design and manufacture it is very difficult, also rare precedent at present.
The content of the invention
Effectively to correct the various aberrations of heavy caliber system, the present invention provides a kind of large visual field high resolution object lens, this
This structure of invention can effectively correct the various aberrations of heavy caliber system, especially high-order spherical aberration.
The present invention is realized using following technical scheme：A kind of large visual field high resolution object lens, it is used in object plane
Pattern imaging is in image plane, and the large visual field high resolution object lens are from object plane side to image plane side along its optical axis side
To successively including the first microscope group, the second microscope group；First microscope group, the second microscope group are respectively provided with positive light coke, and the first microscope group is with extremely
The catadioptric microscope group of few 2 planes of refraction and at least two reflecting surface, and the middle body of at least two reflecting surface of catadioptric microscope group
There is no reflection characteristic and light can be allowed to pass through；The light that object plane is sent forms intermediary image, intermediary image warp after the first microscope group
Reimaging is to image plane after crossing the second microscope group, and meets relational expression：
1.2 ＜ | Rm | the formulas (1) of/f1 ＜ 2.8
Wherein, f1 is the combined focal length of the first microscope group；Rm is in all reflectings surface of the first microscope group, and radius of curvature is minimum
The radius of curvature of reflecting surface.
This structure can effectively correct the various aberrations of heavy caliber system, especially high-order spherical aberration.First microscope group
Focal power is mainly provided by the minimum reflecting surface of radius of curvature, and the function of other refractions and reflecting surface is the various pictures of correction system
Difference, if it is out of this range, the problem of excessive or insufficient can be corrected when correcting various aberrations.
As the further improvement of such scheme, at least 1 be distributed between 2 reflectings surface wherein be present in the first microscope group
Individual refractor, the light that object plane is sent after the first microscope group and before intermediary image is formed, in the first microscope group 3 times it is logical
Cross at least one refractor；Near the element of object plane, it is on the surface of object plane side, middle body tool
Having and pass through refracting characteristic, peripheral part has reflection characteristic, and middle body and peripheral part have identical radius of curvature, and
Meet relational expression：
| R1/Rm | the formulas of ＞ 3 (2)
Wherein, R1 is near the element of object plane, its radius of curvature close to the surface of object plane side.
Peripheral part close to the surface of object plane has the critical function for changing radiation direction in structure, it is undesirable to it
Excessive aberration is brought, or reduces operating distance, so using the larger surface of radius of curvature, this effect can be reached.
As the further improvement of such scheme, the second microscope group does not include nonplanar reflecting surface, and intermediary image passes through second
After microscope group re-imaging to unlimited distance image plane when, meet relational expression：
The formulas (3) of 0.25 ＜ f1/f2 ＜ 1.5
The formulas (4) of 0.25 ＜ D2/D1 ＜ 1.2
Wherein, f2 is the combined focal length of the second microscope group；
D2 is the maximum clear aperture of the second microscope group；
D1 is the maximum clear aperture of the first microscope group.
The combining structure of first microscope group and the second microscope group needs effectively to correct the various aberrations of system, makes final image planes
Close to preferable image planes.First microscope group and the second microscope group only combine in such focal length, and the condition of maximum clear aperture combination
Under, the various aberrations of system can be just corrected to greatest extent, make final image planes close to preferable image planes.
As the further improvement of such scheme, intermediary image meets relational expression：
1.2 ＜ | β 1 | the formulas of ＜ 3.5 (5)
Wherein, β 1 is the enlargement ratio of the first microscope group.
Under the conditions of bigbore, when the enlargement ratio of the first microscope group is in the range of this, the various pictures of the first microscope group remaining
Difference, especially high-order spherical aberration are more appropriate.Second microscope group does not include nonplanar reflecting surface, is made up of refractor, Neng Gouliang
The various aberrations of the first microscope group remaining, especially high-order spherical aberration are corrected well.
As the further improvement of such scheme, intermediary image meets relational expression：
| WD1/Rm | the formulas of ＜ 0.3 (6)
Wherein, WD1 be intermediary image to the first microscope group mean curvature radius be the distance between Rm reflectings surface.
Under the conditions of bigbore, | WD1/Rm | the clear aperture that the first microscope group mean curvature radius is Rm reflectings surface is had influence on,
Too conference reduces the clear aperture that radius of curvature is Rm reflectings surface, not only makes the resolution ratio of optical system reduce, and make optics
The luminance-reduction of system.
As the further improvement of such scheme, all lens are made of same material.
As the further improvement of such scheme, all lens are made of quartz or a kind of material of calcium fluoride crystal.
In ultraviolet wavelength region, especially 200nm to 350nm deep ultraviolet wavelength region, the absorption of ordinary optical materials
Very big, light transmittance is very low, and the light transmittance of optical system can be improved using quartz glass or calcium fluoride crystal.With numerical aperture
Increase, this lens arrangement can effectively correct every optical aberration of system.
As the further improvement of such scheme, the lensed surface of institute does not include aspherical.
Eyeglass bore is small, not comprising aspherical lens, considerably reduces processing, detection and the difficulty and cost for filling school.
As the further improvement of such scheme, the middle body of all refractors does not have thang-kng in catadioptric microscope group
Hole.
Using refraction catoptric arrangement and thang-kng hole need not be processed in lens center part, considerably reduce processing,
Detection and the difficulty and cost in dress school.
As the further improvement of such scheme, the reflection characteristic of reflecting surface is to add to have reflection function in lens surface
Film formed.
Brief description of the drawings
Fig. 1 is the structural representation for the large visual field high resolution object lens that better embodiment of the present invention provides.
The transmission function MTF figures of Fig. 2 optical systems.
Embodiment
In order to make the purpose , technical scheme and advantage of the present invention be clearer, it is right below in conjunction with drawings and Examples
The present invention is further elaborated.It should be appreciated that specific embodiment described herein is only to explain the present invention, not
For limiting the present invention.
It is an object of the invention to the deep ultraviolet wavelength region in ultraviolet wavelength region, especially 200nm to 350nm, carry
For a kind of large visual field high resolution object lens, using only the optical material of limited kinds, using refraction catoptric arrangement and need not be
Lens center part processes thang-kng hole, has reached the effect for making the various aberrations of optical system all obtain well-corrected.Structure
Simply, number of optical devices used is few, reduces the difficulty and cost of the processing of camera lens, test and dress school.
The large visual field high resolution object lens of the present invention are used in the pattern imaging in object plane O to image plane I, big visual field
High-resolution object lens are from object plane O sides to image plane I sides along its optical axis direction, successively including the first microscope group G1, the second mirror
Group G2.
First microscope group G1, the second microscope group G2 are respectively provided with positive light coke, and the first microscope group G1 is with least two plane of refraction and extremely
The catadioptric microscope group of few 2 reflectings surface, and the middle body of at least two reflecting surface of catadioptric microscope group does not have a reflection characteristic and energy
Light is allowed to pass through.The light that object plane O is sent forms intermediary image M after the first microscope group G1, and intermediary image M passes through the second mirror G2 groups
Reimaging is to image plane I afterwards, and meets relational expression：
1.2 ＜ | Rm | the formulas (1) of/f1 ＜ 2.8
Wherein, f1 is the first microscope group G1 combined focal length；
Rm is the radius of curvature of the minimum reflecting surface of radius of curvature in the first microscope group G1 all reflectings surface.
This structure can effectively correct the various aberrations of heavy caliber system, especially high-order spherical aberration.First microscope group
Focal power is mainly provided by the minimum reflecting surface of radius of curvature, and the function of other refractions and reflecting surface is the various pictures of correction system
Difference, if it is out of this range, the problem of excessive or insufficient can be corrected when correcting various aberrations.
Referring to Fig. 1, by taking the objective lens arrangement shown in Fig. 1 as an example, the first microscope group G1 includes two lens and two reflections
Mirror, the second microscope group G2 include 6 lens.
The parameter value of object lens：
NA=0.9；
True field diameter：1.2mm；
Wavelength：330nm.
NA is the numerical aperture of object space.
Wherein, at least one refractor being distributed between 2 reflectings surface wherein, object plane O in the first microscope group G1 be present
The light sent passes through described at least 13 times after the first microscope group G1 and before intermediary image M is formed in the first microscope group G1
Individual refractor.
Near object plane O element, on the surface of object plane O sides, middle body has special through refraction for it
Property, peripheral part has reflection characteristic, and middle body and peripheral part have identical radius of curvature, and meets relational expression：
| R1/Rm | the formulas of ＞ 3 (2)
Wherein, R1 is near object plane O element, its radius of curvature close to the surface of object plane O sides.
Peripheral part close to object plane O surface has reflection characteristic, has change radiation direction simultaneously in structure
Critical function.Because being not intended to it brings excessive aberration, or reduces operating distance, so using the larger table of radius of curvature
Face, this effect can be reached.
The optical parametric of the element of two microscope groups is as shown in table 1.
Table 1
| Surface | Radius | Thickness/spacing | Material | Clear aperture |
| [mm] | [mm] | [mm] | ||
| (object plane) | ∞ | 0.658 | 1.2 | |
| (1) | ∞ | 8.304219 | SILICA | 3.9 |
| (2) | -100.4465 | 3.85824 | 16.2 | |
| (3) | -119.6492 | 6.622884 | SILICA | 27.2 |
| (4) | -382.5189 | 20.02554 | 38.2 | |
| (5) | -46.43246 | -20.02554 | MIRROR | 65.3 |
| (6) | -382.5189 | -6.622884 | SILICA | 57.5 |
| (7) | -119.6492 | -3.85824 | 51.6 | |
| (8) | -100.4465 | -8.304219 | SILICA | 48.3 |
| (9) | ∞ | 8.304219 | MIRROR | 44.5 |
| (10) | -100.4465 | 3.85824 | 40.2 | |
| (11) | -119.6492 | 6.622884 | SILICA | 33.1 |
| (12) | -382.5189 | 20.02554 | 27.4 | |
| (13) | ∞ | 0.02 | 1.5 | |
| (intermediary image) | ∞ | 7.737298 | 1.5 | |
| (15) | -1701.837 | 3.051645 | SILICA | 12.1 |
| (16) | -25.1197 | 1.87192 | 13.8 | |
| (17) | 82.15039 | 4 | SILICA | 16.9 |
| (18) | -48.60268 | 2.899619 | 18.4 | |
| (19) | 41.34442 | 5 | SILICA | 21.5 |
| (20) | -645.4405 | 33.1677 | 22.2 | |
| (21) | -135.6802 | 6 | SILICA | 32.2 |
| (22) | -34.69112 | 0.2 | 33.2 | |
| (23) | 234.2426 | 4 | SILICA | 32.6 |
| (24) | 42.85436 | 4.5 | 33.0 | |
| (25) | 424.1275 | 6 | SILICA | 33.6 |
| (26) | -66.94973 | ∞ | 34.3 | |
| (image planes) | ∞ |
Characteristic parameter is as shown in table 2.
Table 2
| f1 | 24.8 |
| f2 | 32.2 |
| R1 | ∞ |
| Rm | -46.43 |
| D1 | 65.3 |
| D2 | 33.0 |
| β1 | -1.78 |
| WD1 | 0.02 |
The calculated value of relational expression is respectively shown in table 3.
Table 3
| (1) | |Rm|/f1 | 1.87 |
| (2) | |R1/Rm| | ∞ |
| (3) | f1/f2 | 0.77 |
| (4) | D2/D1 | 0.51 |
| (5) | |β1| | 1.78 |
| (6) | |WD1/Rm| | 0.00043 |
First microscope group G1 meets relational expression：
1.2 ＜ | Rm | the formulas (1) of/f1 ＜ 2.8
Wherein, f1 is the first microscope group G1 combined focal length；Rm is that radius of curvature is most in the first microscope group G1 all reflectings surface
The radius of curvature of small reflecting surface.
| R1/Rm | the formulas of ＞ 3 (2)
Wherein, R1 is near object plane O element, its radius of curvature close to the surface of object plane O sides.
Second microscope group G2 does not include nonplanar reflecting surface, intermediary image M after the second microscope group G2 re-imaging to unlimited
During the image plane I of distant place, meet relational expression：
The formulas (3) of 0.25 ＜ fl/f2 ＜ 1.5
The formulas (4) of 0.25 ＜ D2/D1 ＜ 1.2
Wherein, f2 is the second microscope group G2 combined focal length；
D2 is the second microscope group G2 maximum clear aperture；
D1 is the first microscope group G1 maximum clear aperture.
First microscope group G1 and the second microscope group G2 combining structure need effectively to correct the various aberrations of system, make final
Image plane I is close to preferable image planes.First microscope group G1 and the second microscope group G2 only combines in such focal length, and maximum clear aperture
Under conditions of combination, the various aberrations of system can be just corrected to greatest extent, make final image plane I close to preferable image planes.
Intermediary image meets relational expression：
1.2 ＜ | β 1 | the formulas of ＜ 3.5 (5)
WD1/Rm | the formulas of ＜ 0.3 (6)
Wherein, β 1 is the first microscope group G1 enlargement ratio；
WD1 be intermediary image to the first microscope group G1 mean curvature radiuses be the distance between Rm reflectings surface.
Under the conditions of bigbore, the first microscope group G1 enlargement ratio is in this scope, the various pictures of the first microscope group G1 remainings
Difference, especially high-order spherical aberration are more appropriate.Second microscope group G2 does not include nonplanar reflecting surface, is made up of refractor, can
The various aberrations of the first microscope group G1 remainings, especially high-order spherical aberration are corrected well.| WD1/Rm | have influence in the first microscope group G1
Radius of curvature is the clear aperture of Rm reflectings surface, and too conference reduces the clear aperture that radius of curvature is Rm reflectings surface, not only makes light
The resolution ratio of system reduces, and makes the luminance-reduction of optical system.
In the transmission function MTF figures of Fig. 2 optical systems, transverse axis is resolution ratio, unit be line it is right/millimeter (1p/mm), one
A line pair, every millimeter of demand pairs that can be distinguished are exactly the numerical value of resolution ratio to a black white two lines at last.The longitudinal axis is modulation
Transmission function MTF (Modulation Transfer Function), it is a quantitative description to resolution of lens.
Curve in Fig. 2 can be seen that 0.5 representative visual field, and the mtf value of 0.75 visual field and maximum field of view is
Very close diffraction limit value.When diffraction limit refers to a preferable object point through optical system imaging, due to physioptial light
Diffraction limitation, it is impossible to obtain ideal image point, but obtain a Fu Lang and fraunhofer-diffraction picture, this diffraction image is physical light
Diffraction limit, i.e. maximum.
As can be seen that the present invention can be in whole visual field close to physioptial diffraction limit.
The result of the analysis of specialty optics design software shows that the wave aberration WFE (RMS) of whole visual field is less than 0.035 ripple
It is long.
All lens can be made of same material, if all lens are using a kind of material in quartz or calcium fluoride crystal
Material is made；Or it is made of quartz and two kinds of materials of calcium fluoride crystal.In ultraviolet wavelength region, especially 200nm to 350nm's
Deep ultraviolet wavelength region, the absorption of ordinary optical materials is very big, and light transmittance is very low, can be with using quartz glass or calcium fluoride crystal
Improve the light transmittance of optical system.With the increase of numerical aperture, this lens arrangement can effectively correct the items of system
Optical aberration.
The lensed surface of institute does not include aspherical, can considerably reduce processing, detection and fill school difficulty and into
This.
The middle body of all refractors does not have thang-kng hole in catadioptric microscope group.Using refraction catoptric arrangement and not
Need to process thang-kng hole in lens center part, considerably reduce the difficulty and cost of processing, detection and dress school.
The reflection characteristic of reflecting surface is formed in the additional film with reflection function of lens surface, makes system architecture simple
It is compact, it is easily worked and fills school.
In summary, the invention reside in the deep ultraviolet wavelength region in ultraviolet wavelength region, especially 200nm to 350nm,
Using only the optical material of limited kinds, the effect for making the various aberrations of optical system all obtain well-corrected is reached, simultaneously
With high-resolution, big field-of-view characteristics, also rare precedent at present.Meanwhile eyeglass bore of the invention is small, not comprising aspherical mirror
Piece, using refraction catoptric arrangement and thang-kng hole need not be processed in lens center part, considerably reduce processing, detection with
Fill the difficulty and cost in school.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all essences in the present invention
All any modification, equivalent and improvement made within refreshing and principle etc., should be included in the scope of the protection.
Claims (10)
1. a kind of large visual field high resolution object lens, it is used in the pattern imaging in object plane to image plane, the big visual field
High-resolution object lens are from object plane side to image plane side along its optical axis direction, successively including the first microscope group (G1), the second mirror
Group (G2)；It is characterized in that：
First microscope group (G1), the second microscope group (G2) are respectively provided with positive light coke, the first microscope group (G1) be with least two plane of refraction and
The catadioptric microscope group of at least two reflecting surface, and the middle body of at least two reflecting surface of catadioptric microscope group there is no reflection characteristic and
Light can be allowed to pass through；
The light that object plane is sent forms intermediary image after the first microscope group (G1), intermediary image after the second microscope group (G2) again into
As arriving image plane, and meet relational expression：
1.2 ＜ | Rm | the formulas (1) of/f1 ＜ 2.8
Wherein, f1 is the combined focal length of the first microscope group (G1)；Rm is that radius of curvature is most in all reflectings surface of the first microscope group (G1)
The radius of curvature of small reflecting surface.
2. large visual field high resolution object lens as claimed in claim 1, it is characterised in that：Exist in first microscope group (G1) and be distributed in
At least one refractor between wherein 2 reflectings surface, the light that object plane is sent is after the first microscope group (G1) and is being formed
Before intermediary image, pass through at least one refractor 3 times in the first microscope group (G1)；
Near the element of object plane, on the surface of object plane side, middle body, which has, passes through refracting characteristic, periphery for it
Part has reflection characteristic, and middle body and peripheral part have identical radius of curvature, and meets relational expression：
| R1/Rm | the formulas of ＞ 3 (2)
Wherein, R1 is near the element of object plane, its radius of curvature close to the surface of object plane side.
3. large visual field high resolution object lens as claimed in claim 1 or 2, it is characterised in that：Second microscope group (G2) does not include non-
The reflecting surface of plane, intermediary image after the second microscope group (G2) re-imaging to unlimited distance image plane when, and meet relation
Formula：
The formulas (3) of 0.25 ＜ f1/f2 ＜ 1.5
The formulas (4) of 0.25 ＜ D2/D1 ＜ 1.2
Wherein, f2 is the combined focal length of the second microscope group (G2)；
D2 is the maximum clear aperture of the second microscope group (G2)；
D1 is the maximum clear aperture of the first microscope group (G1).
4. large visual field high resolution object lens as claimed in claim 1 or 2, it is characterised in that：Intermediary image meets relational expression：
1.2 ＜ | β 1 | the formulas of ＜ 3.5 (5)
Wherein, β 1 is the enlargement ratio of the first microscope group (G1).
5. large visual field high resolution object lens as claimed in claim 1 or 2, it is characterised in that：Intermediary image meets relational expression：
| WD1/Rm | the formulas of ＜ 0.3 (6)
Wherein, WD1 be intermediary image to the first microscope group (G1) mean curvature radius be the distance between Rm reflecting surface.
6. large visual field high resolution object lens as claimed in claim 1 or 2, it is characterised in that：All lens are all using same
Material is made.
7. large visual field high resolution object lens as claimed in claim 1 or 2, it is characterised in that：All lens are using quartz or fluorine
Change a kind of material of calcium crystal to be made；Or it is made of quartz and two kinds of materials of calcium fluoride crystal.
8. large visual field high resolution object lens as claimed in claim 1 or 2, it is characterised in that：The lensed surface of institute does not include
It is aspherical.
9. large visual field high resolution object lens as claimed in claim 1 or 2, it is characterised in that：All foldings in catadioptric microscope group
Penetrating the middle body of lens does not have thang-kng hole.
10. large visual field high resolution object lens as claimed in claim 1 or 2, it is characterised in that：The reflection characteristic of reflecting surface be
The additional film with reflection function of lens surface is formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710878584.6A CN107462978B (en) | 2017-09-26 | 2017-09-26 | Large-view-field high-resolution objective lens |
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| CN110824669A (en) * | 2019-11-25 | 2020-02-21 | 杭州环峻科技有限公司 | 8K high-resolution panoramic annular optical lens |
| CN114859515A (en) * | 2022-05-23 | 2022-08-05 | 张家港中贺自动化科技有限公司 | Catadioptric objective optical system for projection lithography and projection lithography system |
| CN115598819A (en) * | 2022-10-17 | 2023-01-13 | 佛山迈奥光学科技有限公司（Cn） | High-resolution large-view-field immersion liquid microobjective |
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| CN114859515B (en) * | 2022-05-23 | 2024-01-12 | 张家港中贺自动化科技有限公司 | Catadioptric objective optical system for projection lithography and projection lithography system |
| CN115598819A (en) * | 2022-10-17 | 2023-01-13 | 佛山迈奥光学科技有限公司（Cn） | High-resolution large-view-field immersion liquid microobjective |
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