CN107462165A - High optical fine dual-frequency grating interferometer based on bigrating structures - Google Patents
High optical fine dual-frequency grating interferometer based on bigrating structures Download PDFInfo
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- CN107462165A CN107462165A CN201710731850.2A CN201710731850A CN107462165A CN 107462165 A CN107462165 A CN 107462165A CN 201710731850 A CN201710731850 A CN 201710731850A CN 107462165 A CN107462165 A CN 107462165A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
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Abstract
The present invention discloses a kind of high optical fine dual-frequency grating interferometer based on bigrating structures, and the grating interferometer includes the components such as double frequency orthogonal laser device, unpolarized beam splitter, polarizing beam splitter mirror, quarter-wave plate, speculum, scale grating, indication grating, polarizer, photodetector, data acquisition and procession unit.According to Doppler effect, for laser non-normal incidence in mobile measurement grating, diffraction light can carry Doppler frequency shift item, and the interferometer utilizes the laser repeatedly diffraction between scale grating and indication grating, measure light and carry multiple frequence shifting component, therefore the grating interferometer has high optics sub-structure.To improve measuring beam signal intensity, the influence of ambient noise is reduced, scale grating and indication grating are all 1 level high-diffraction efficiency reflective gratings.The invention has important value in the fields of measurement such as the resolution ratio of raising grating interferometer and stability.
Description
Technical field
The invention belongs to high precision displacement measurement field, feature is the high optical fine double frequency light based on bigrating structures
Grating interferometer.
Background technology
As high-precision manufacturing industry develops towards miniaturization, portable direction, for micro/nano level high accuracy positioning and survey
The demand of amount technology is improving constantly, and is particularly processing and being accurately positioned and measuring in measuring system.Mainly have two at present
Class system is used to measure micro-nano Accuracy Displacement, and one kind is laser interferometer, and another kind of is grating interferometer.Laser interferometer quilt
It is widely used in various measuring systems.Laser interferometer has the advantages such as high-resolution, high accuracy, wide range, but it is produced
Cost is high, and device is complicated, and because laser interferometer is to be vulnerable to the shadow of environmental factor using optical maser wavelength as measuring basis
Ring, cause random meausrement error big, therefore the use of laser interferometer receives a definite limitation.Grating interferometer preferably makes up
This defect, because grating interferometer measuring basis is screen periods, therefore grating interferometer for environmental disturbances factor
Repellence it is strong, therefore grating interferometer is widely used.
Either laser interferometer or grating interferometer, resolution ratio is improved, electronic fine-grained and optical fine can all be entered
Row improves.Electronic fine-grained is the identification on the basis of optical fine for signal.Therefore it is thin raising optics to be improved by light path
Divide most important for improving resolution ratio.The present wide variety of German Heidenhain in market, the grating such as Reinshaw of Britain are done
Interferometer typically uses two times of optical fines of a diffraction, or four times of optical fines of re-diffraction.Such as the patent of Heidenhain
US5574558, the patent US5442172 of IBM Corporation of the U.S..China has patented invention to use high magnification numbe optical fine such as
CN104729411A, CN104729402B, CN104613865A.The present invention invents compared to more than, more compact using structure
Different cycles double grating auto-collimation structure, manufacture craft is simple, and cost is low, and location tolerance is small.The present invention uses double grating knot
Structure, it is intended to improve optical fine and reduce alignment error, the final resolution ratio and accuracy for improving grating interferometer, if grating
It is perfect in workmanship, negative one order diffraction ultrahigh in efficiency, reach 90% and its more than, then optical fine can bring up to 32 in theory
Subdivision and its more than.
The content of the invention
The present invention is the high optical fine dual-frequency grating interferometer based on double grating, it is intended to solves present market extensive use
Grating interferometer optical fine multiple it is low the problem of.The present invention uses bigrating structures, and a scale grating, another is finger
Show grating, double grating is all negative one level high-diffraction efficiency grating.Using measuring beam with approximate Littrow angle incidence scale grating,
Negative one level beam exit chooses the suitable indication grating cycle to indication grating so that negative one level light beam is again with approximate Li Te
Sieve angle incidence scale grating, high efficiency negative one order diffraction occurs again.Measuring beam diffraction back and forth in bigrating structures, finally
With Littrow angle incidence indication grating, light beam is along backtracking.Measuring beam carries out negative one on the scale grating more inferior to movement
Order diffraction, therefore grating interferometer optical fine is improved.
The technical solution of the present invention:
A kind of high optical fine dual-frequency grating interferometer based on bigrating structures, its feature is, including double frequency is orthogonal
Linearly polarized laser light source, non-polarizing beamsplitter, polarization beam apparatus, the first quarter-wave plate, the second quarter-wave plate, first
Speculum, the second speculum, scale grating, indication grating, and by first analyzer at 45 ° with double frequency crossed polarized light and
Corresponding first photodetector, with the second analyzer that double frequency crossed polarized light is at 45 ° and therewith corresponding second photoelectricity
The demodulation phase unit that detector and data acquisition collectively form with processing and control element (PCE);
The double frequency crossed polarized light projected by LASER Light Source is divided into reflected light and transmitted light two by non-polarizing beamsplitter
Point, wherein, reflected light enters first analyzer at 45 ° with double frequency crossed polarized light, the first photodetector as reference quantity
The interference signal of the reference light as double frequency difference interference art is detected, and is transmitted to data acquisition and procession control unit;
Transmitted light is divided into two beams, a branch of P parallel with the plane of incidence for polarization state as measurement signal by polarization beam apparatus
Light, another beam are the polarization state S light vertical with the plane of incidence, and S light becomes left-handed rotatory polarization by the first quarter-wave plate, through the
Entering scale light grid after the reflection of one speculum, -1 order diffraction light through scale grating enters indication grating, and -1 through indication grating
Order diffraction light incident scale grating again, left-handed rotatory polarization diffraction back and forth between scale grating and indication grating successively, finally
With Littrow angle incidence indication grating, and it is again introduced into the first quarter-wave plate through the first speculum according to backtracking and is changed into
P light;The P light being emitted by the polarization beam apparatus becomes dextrorotation rotatory polarization by the second quarter-wave plate, through the second speculum
Enter scale light grid after mirror reflection, -1 order diffraction light through scale grating enters indication grating, -1 order diffraction through indication grating
Light incident scale grating again, dextrorotation rotatory polarization diffraction back and forth between scale grating and indication grating successively, finally with Li Te
Sieve angle incidence indication grating, dextrorotation rotatory polarization are again introduced into the second quarter-wave plate through the second speculum according to backtracking and become
For S light;The P light of described backtracking reflects through the S light of polarizing beam splitter mirror and described backtracking through polarizing beam splitter mirror
Overlap in same light path, co-incident forms interference signal to the second described analyzer, is connect by the second described detector
Measurement signal after receipts as double frequency difference interference art is transmitted to data acquisition and processing (DAP) and control unit.
Compared with prior art, technique effect of the invention:
Using compact different cycles double grating auto-collimation structure so that measuring beam is in bigrating structures constantly with approximation
Littrow angle carries out negative one order diffraction back and forth.Due to Doppler effect, measuring beam carries out negative one level in measurement grating every time and spread out
A Doppler frequency shift component will be carried by penetrating.Final measuring beam is with Littrow angle incidence grating, and along backtracking, now
Frequency-shifted components double, the measurement interference of light of two beams and polarization beam apparatus.
The present invention is the environmental resistance of enhancing grating interference system, symmetrical structure is used, if single channel measuring beam is measuring
Grating carries out N=3 negative one order diffraction, then the structure has carried out 12 optical fines.
Brief description of the drawings
Fig. 1 is the structural representation of the high optical fine dual-frequency grating interferometer of the invention based on bigrating structures
Fig. 2 is unilateral two times of optical fine double grating schematic diagrames
Fig. 3 is unilateral four times of optical fine double grating schematic diagrames
Fig. 4 is unilateral six times of optical fine double grating schematic diagrames
Embodiment
With reference to embodiment and accompanying drawing, the invention will be further described, but the protection model of the present invention should not be limited with this
Enclose.
Fig. 1 is the structural representation of the high optical fine dual-frequency grating interferometer of the invention based on bigrating structures, is such as schemed
Shown, double frequency orhtogonal linear polarizaiton LASER Light Source 9 sends orthogonal Two frequency Polarization light beam and is divided to through non-polarizing beamsplitter 8 for two beams, a branch of
Inject the first analyzer 10 and form interference signal, the reference signal after being received by the first detector 12 as double frequency difference interference art
Transmit to data acquisition and processing (DAP) and control unit 14, another beam and divide the P light for transmission and the S light of reflection through polarization beam apparatus 7.
It is changed into left-handed rotatory polarization through the first quarter-wave plate 5 from the described S light that polarization beam apparatus 7 comes out, enters through the first speculum 3
High density scale grating 1 is mapped to, -1 level diffraction light through the diffraction of scale grating 1 gets to indication grating 2, enters through indication grating 2
- 1 order diffraction of row is again incident on high density scale grating 1, and left-handed rotatory polarization is between scale grating 1 and indication grating 2 according to this
Diffraction back and forth, and finally incided with Littrow angle on indication grating 2, left-handed rotatory polarization is returned through the first speculum along original optical path
3, it is changed into P light through the first quarter-wave plate 5.The described P light come out by polarization beam apparatus 7 is through the second quarter-wave plate 6
It is changed into dextrorotation rotatory polarization, high density scale grating 1 is incided through the second speculum 4, -1 level diffraction through the diffraction of scale grating 1
Light gets to indication grating 2, and -1 diffraction light through indication grating 2 is again incident on high density scale grating 1, according to this dextrorotation rotatory polarization
The diffraction, and finally with Littrow angle incidence indication grating 2, dextrorotation rotatory polarization edge back and forth between scale grating 1 and indication grating 2
Original optical path is returned through the second speculum 4, becomes 6 through the second quarter-wave plate as S light.The S light of backtracking passes through polarization spectro
Mirror and the P light of backtracking are overlapped in same light path through the reflection of polarization spectroscope 7, jointly through inciding the shape of the second analyzer 11
Into interference signal, the measurement signal after being received by the second detector 13 as double frequency difference interference art transmit to data acquisition and
Reason and control unit 14.The displacement of scale grating 1 can be obtained by analyzing reference signal and measurement signal.
Because two beams measure light symmetrically incident bigrating structures, therefore one-sided configuration is analyzed.
As shown in Figure 2, light beam is after the outgoing of polarization spectroscope 7, by quarter-wave plate 6, incident second speculum
(4) bigrating structures, are reflected into.The angle of second speculum 4 and scale grating 1 is:
η is the second speculum 4 and the angle of scale grating 1, inFor the incidence angle of light first time incident scale grating.Light
Line enters scale grating and indication grating by the second speculum 4, and the incidence angle into scale grating is respectively in,in-1,in-2…
i3,i2,i1, the angle of diffraction on scale grating is followed successively by θn,θn-1,θn-2…θ3,θ2,θ1, after light is by scale optical grating diffraction, enter
Indication grating, incidence angle are followed successively by i'n,i'n-1,i'n-2…i'3,i'2,i1' the angles of diffraction of indication gratings is αn,αn-1,αn-2…
α3,α2,α1。
On measurement grating, incidence angle inAnd diffraction anglenMeet grating equation:
d1*(sin in+sinθn)=m λ (1)
D in formula1For the cycle of scale grating, λ is optical maser wavelength, and m is diffraction time, in this patent m=-1
On scale grating, incidence angle i'nWith angle of diffraction αnEqually meet grating equation:
d2*sin(i'n+αn)=m λ (2)
D in formula2To measure screen periods, λ is optical maser wavelength, and m is diffraction time, in this patent m=-1
And meet following angular relationship:
θn=i'n (3)
αn=in-1 (4)
i'1=α1 (5)
When it is determined that d1、d2And during measuring beam diffraction frequency n, 5 equations it can determine in scale grating and refer to more than
Show the light path on grating, and the setting angle of the second speculum 4.
In instances, as shown in Figure 2, n=1, d1=1000nm, d2=1500nm, λ=632.8nm, on scale grating
Incidence angle is i1=24.9525 °, angle of diffraction θ1=12.1771 °, the incidence angle on indication grating is i '1=12.1771 °, spread out
Firing angle is α1=12.1771 °.The angle of speculum and scale grating is 79.9788 °, it is assumed that grating bears first-order diffraction efficiency and is
95%, backtracking light intensity is the 85.7375% of incident intensity, i.e., the detection of optical power of incident scale optical grating construction is 20mw,
The luminous power that backtracking reaches polarization beam apparatus is 19mw, can reach photodetector threshold power.
As shown in Figure 3, n=2, d1=1000nm, d2=1300nm, λ=632.8nm, incidence angle on scale grating according to
Secondary is i1=22.9181 °, i2=32.3741 °, the angle of diffraction is followed successively by θ1=14.0864 °, θ2=5.5868 °, on indication grating
Incidence angle be followed successively by i '1=14.0864 °, i'2=5.5868 °, the angle of diffraction is followed successively by α1=14.0864 °, α2=
22.9181°.The angle of speculum and scale grating is 83.6871 °, it is assumed that it is 95% that grating, which bears first-order diffraction efficiency, and former road is returned
Light echo is the 69.8337% of incident intensity by force, i.e., the detection of optical power of incident scale optical grating construction is 20mw, and backtracking reaches
The luminous power of polarization beam apparatus is 13.96674mw, can reach photodetector threshold power.
As shown in Figure IV, n=3, d1=1000nm, d2=1100nm, λ=632.8nm, incidence angle on scale grating according to
Secondary is i1=20.1918 °, i2=23.7645 °, i3=27.4012 °, the angle of diffraction is followed successively by θ1=16.7165 °, θ2=
13.3035 °, θ3=9.9380 °.Incidence angle on indication grating is followed successively by i '1=16.7165 °, i'2=13.3035 °, i'3=
9.9380 °, the angle of diffraction is followed successively by, α1=16.7165 °, α2=20.1918 °, α3=23.7465 °.Speculum and scale grating
Angle is 81.2006 °.Assuming that it is 95% that grating, which bears first-order diffraction efficiency, backtracking light intensity is the 56.88% of incident intensity,
The detection of optical power of i.e. incident scale optical grating construction is 20mw, and the luminous power that backtracking reaches polarization beam apparatus is 11.376mw
It can reach photodetector threshold power.Three kinds of diffraction situations are as shown in table 1.
Table 1
Claims (1)
1. a kind of high optical fine dual-frequency grating interferometer based on bigrating structures, it is characterised in that including double frequency cross line
Polarization laser light source (9), non-polarizing beamsplitter (8), polarization beam apparatus (7), the first quarter-wave plate (5), the two or four/
One wave plate (6), the first speculum (3), the second speculum (4), scale grating (1), indication grating (2), and by with double frequency just
Polarised light the first analyzer (10) and corresponding first photodetector (12) at 45 ° are handed over, with double frequency crossed polarized light
Second analyzer (11) at 45 ° and the second photodetector (13) and data acquisition and processing and control element (PCE) (14) are corresponded to therewith
The demodulation phase unit (15) collectively formed;
The double frequency crossed polarized light projected by LASER Light Source (9) is divided into reflected light and transmitted light two by non-polarizing beamsplitter (8)
Part, wherein, reflected light enters first analyzer (10) at 45 ° with double frequency crossed polarized light, the first photoelectricity as reference quantity
Detector (12) detects the interference signal of the reference light as double frequency difference interference art, and transmits to data acquisition and procession control
Unit (14) processed;
Transmitted light is divided into two beams, a branch of P parallel with the plane of incidence for polarization state as measurement signal by polarization beam apparatus (7)
Light, another beam are the polarization state S light vertical with the plane of incidence, and S light becomes left-handed rotatory polarization by the first quarter-wave plate (5),
Enter scale light grid (1) after the first speculum (3) reflection, -1 order diffraction light through scale grating (1) enters indication grating
(2), the incident scale grating (1) again of -1 order diffraction light through indication grating (2), left-handed rotatory polarization is in scale grating (1) successively
The diffraction back and forth between indication grating (2), finally with Littrow angle incidence indication grating (2), and according to backtracking through first
Speculum (3) is again introduced into the first quarter-wave plate (5) and is changed into P light;Passed through by the P light of the polarization beam apparatus (7) outgoing
Second quarter-wave plate (6) becomes dextrorotation rotatory polarization, enters scale light grid (1) after the second mirror (4) reflection, through mark
- 1 order diffraction light of chi grating (1) enters indication grating (2), the incident scale light again of -1 order diffraction light through indication grating (2)
Grid (1), dextrorotation rotatory polarization diffraction back and forth between scale grating (1) and indication grating (2), finally incident with Littrow angle successively
Indication grating (2), dextrorotation rotatory polarization are again introduced into the second quarter-wave plate (6) according to backtracking through the second speculum (4)
It is changed into S light;The P light of described backtracking is through polarizing beam splitter mirror (7) and the S light of described backtracking through polarizing beam splitter mirror
(7) reflection is overlapped in same light path, co-incident to described second analyzer (11) formation interference signal, by described the
Measurement signal after two detectors (13) reception as double frequency difference interference art is transmitted to data acquisition and processing (DAP) and control unit
(14)。
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Cited By (8)
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CN108692663A (en) * | 2018-04-11 | 2018-10-23 | 南京师范大学 | Phase modulation-type cross-polarization Laser feedback grating interferometer and its measurement method |
CN108775878A (en) * | 2018-05-31 | 2018-11-09 | 中国科学院高能物理研究所 | Grating Heterodyne Interferometer System Based and its roll angle measurement method |
CN110849967A (en) * | 2019-10-31 | 2020-02-28 | 江苏大学 | Device and method for detecting plant leaf frosting by using grating |
CN110849593A (en) * | 2019-11-22 | 2020-02-28 | 中国科学院长春光学精密机械与物理研究所 | Measuring equipment for measuring wave aberration of optical system based on heterodyne interference of acousto-optic modulator |
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CN117146870A (en) * | 2023-11-01 | 2023-12-01 | 中国科学院长春光学精密机械与物理研究所 | Two-dimensional grating interferometry device and measurement method |
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CN104729402A (en) * | 2015-03-23 | 2015-06-24 | 中国科学院上海光学精密机械研究所 | High-optical-subdivision grating interferometer based on plane mirrors |
CN104729411A (en) * | 2015-03-10 | 2015-06-24 | 中国科学院上海光学精密机械研究所 | High-resolution grating interferometer based on high-density gratings |
CN105203031A (en) * | 2015-09-14 | 2015-12-30 | 中国科学院上海光学精密机械研究所 | Quadruple optical subdivision two-axis heterodyne grating interferometer |
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CN104729411A (en) * | 2015-03-10 | 2015-06-24 | 中国科学院上海光学精密机械研究所 | High-resolution grating interferometer based on high-density gratings |
CN104729402A (en) * | 2015-03-23 | 2015-06-24 | 中国科学院上海光学精密机械研究所 | High-optical-subdivision grating interferometer based on plane mirrors |
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CN110849593A (en) * | 2019-11-22 | 2020-02-28 | 中国科学院长春光学精密机械与物理研究所 | Measuring equipment for measuring wave aberration of optical system based on heterodyne interference of acousto-optic modulator |
CN110849593B (en) * | 2019-11-22 | 2021-06-01 | 中国科学院长春光学精密机械与物理研究所 | Measuring equipment for measuring wave aberration of optical system based on heterodyne interference of acousto-optic modulator |
CN111207674A (en) * | 2020-01-17 | 2020-05-29 | 中北大学 | Displacement sensor based on multiple diffraction of single-layer grating |
CN111207674B (en) * | 2020-01-17 | 2021-08-24 | 中北大学 | Displacement sensor based on multiple diffraction of single-layer grating |
CN112097650A (en) * | 2020-09-11 | 2020-12-18 | 中国科学院长春光学精密机械与物理研究所 | Heterodyne grating displacement measuring method |
CN115824061A (en) * | 2023-02-14 | 2023-03-21 | 中国科学院长春光学精密机械与物理研究所 | Littrow diffraction-based grating displacement measurement device and method |
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Application publication date: 20171212 |