CN107450285A - Developing apparatus - Google Patents
Developing apparatus Download PDFInfo
- Publication number
- CN107450285A CN107450285A CN201710864771.9A CN201710864771A CN107450285A CN 107450285 A CN107450285 A CN 107450285A CN 201710864771 A CN201710864771 A CN 201710864771A CN 107450285 A CN107450285 A CN 107450285A
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- China
- Prior art keywords
- cover plate
- housing
- developing apparatus
- pure water
- plate
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
A kind of developing apparatus provided by the invention, protruded by setting in the middle part of the second cover plate backwards to development station direction, so that the developer solution splashed on the second cover plate or pure water to be flowed down by the second deck side edge, the inwall of second cover plate and housing connects, that is the second cover plate forms the low shape in middle high side, when have splash the liquid on the second cover plate when, liquid flows down along the second deck side edge under gravity, and development work room is flowed to by the side wall of housing, foreign matter on film is formed on substrate so as to avoid dropping onto from the second cover plate.
Description
Technical field
The invention belongs to semiconductor manufacturing facility technical field, more particularly to a kind of developing apparatus.
Background technology
The main processing flow of semiconductor manufacturing industry substrate is coating → exposure → development；Development is will not with developer solution
The photoresistance of exposure dissolves, and the photoresistance of exposure remains, and forms the pattern (pattern) of design；Development need to be passed through multiple aobvious
Shadow and washing operating room (chamber), easily cause foreign matter on more film；To ensure the homogeneity and base of development effect simultaneously
The cleannes of back, flusher (shower) is provided with the surface of substrate and the back side, causes liquid often to splash
On chamber cover plates, and the equipment cover plate does not do specially treated at present, easily falls after rise to drip on substrate and causes foreign matter on film；
In the prior art, the outer cover plate of existing equipment is connected with lock (interlock), prevents liquid from spilling mainly by inner cover plate.Mesh
Before the inner cover plate taken be up concave type, it is middle low and surrounding is high, cause the liquid on cover plate to fall back in chamber, make
Foreign matter in film forming, and as developing procedure is run, (run) time is longer, causes the probability of foreign matter on film higher.
The content of the invention
It is an object of the invention to provide a kind of developing apparatus, can prevent from dripping liquid on cover plate and causing foreign matter on film.
To realize the purpose of the present invention, the invention provides following technical scheme：
In a first aspect, the invention provides a kind of developing apparatus, including development work room, the development work room includes shell
Body and the first cover plate, the housing tip set opening, and first cover plate is located at the opening and covers to the housing, institute
State the first sprinkling for setting in housing and being set for the fixed development station for treating developing device, relatively described development station top
Device, the second flusher of relatively described development station bottom setting, second located at the first flusher top
Cover plate, first cover plate are located at being filled away from the side of first flusher, first sprinkling for second cover plate
Put and be used to spray developing liquid or pure water with second flusher, to treat that developing device is developed or rinsed to described；
Protruded in the middle part of second cover plate backwards to the development station direction, the developer solution on second cover plate will be splashed
Or pure water is flowed down by second deck side edge, second cover plate is connected with the inwall of the housing.
In the first possible implementation of first aspect, in addition to guiding gutter, the guiding gutter is located at described the
The inwall link position lower section of two cover plates and the housing, the developer solution or pure water that second deck side edge is flowed down
Outflow.
With reference to the possible implementation of the first of first aspect and first aspect, second in first aspect is possible
In implementation, the guiding gutter relative level has angle of inclination, so that the guiding gutter has relative level higher
First end and the second relatively low end, second end leakage fluid dram of the housing bottom is connected to by pipeline.
With reference to the possible implementation of the first of first aspect and first aspect, the third in first aspect is possible
In implementation, the relatively described housing of the guiding gutter is separately provided and is fixed to the side wall of the housing.
With reference to the possible implementation of the first of first aspect and first aspect, the 4th kind in first aspect is possible
In implementation, the guiding gutter is the groove in the housing sidewall, is had between second cover plate and the groove
There is intermediate incline so that the developer solution or pure water are flowed into the groove.
With reference to the first of first aspect and first aspect to the 4th kind of possible implementation, the 5th of first aspect the
In the possible implementation of kind, second cover plate is tile, and is wire after the protrusion of middle part, so as to splash second lid
The developer solution or pure water on plate flow down in the middle part of second cover plate to two sides.
It is possible with reference to first aspect and the 5th kind of possible implementation of first aspect, the 6th kind in first aspect
In implementation, second cover plate is shaped as folded plate, and the knuckle scope in the middle part of the folded plate is 90 °~175 °.
It is possible with reference to first aspect and the 5th kind of possible implementation of first aspect, the 7th kind in first aspect
In implementation, second cover plate is shaped as arc plate.
It is possible with reference to first aspect and the 5th kind of possible implementation of first aspect, the 8th kind in first aspect
In implementation, second cover plate is shaped as the intersecting curved slab of two sections of circular arcs.
With reference to the first of first aspect and first aspect to the 5th kind of possible implementation, the 9th of first aspect the
In kind possible implementation, second cover plate be it is bowl-shape with four sides, and middle part protrude after be point-like, so as to splash
The developer solution or pure water on second cover plate flow down in the middle part of second cover plate to four sides.
It is possible with reference to first aspect and the 9th kind of possible implementation of first aspect, the tenth kind in first aspect
In implementation, second cover plate is shaped as polylith plane and intersected.
With reference to first aspect and the 9th kind of possible implementation of first aspect, the tenth in first aspect is a kind of possible
Implementation in, second cover plate is shaped as sphere.
With reference to first aspect and the 9th kind of possible implementation of first aspect, in the 12nd kind of possibility of first aspect
Implementation in, second cover plate is shaped as polylith arc surface and intersected.
Beneficial effects of the present invention：
A kind of developing apparatus provided by the invention, protruded by setting in the middle part of the second cover plate backwards to development station direction,
So that the developer solution splashed on the second cover plate or pure water to be flowed down by the second deck side edge, the inwall of the second cover plate and housing connects
Connect, i.e. the second cover plate forms the low shape in middle high side, when have splash the liquid on the second cover plate when, work of the liquid in gravity
Flowed down with the deck side edge of lower edge second, and development work room is flowed to by the side wall of housing, so as to avoid dripping from the second cover plate
Foreign matter on film is formed on to substrate.
Brief description of the drawings
, below will be to embodiment in order to illustrate more clearly of embodiment of the present invention or technical scheme of the prior art
Or the required accompanying drawing used is briefly described in description of the prior art, it should be apparent that, drawings in the following description are only
It is some embodiments of the present invention, for those of ordinary skill in the art, on the premise of not paying creative work,
Other accompanying drawings can also be obtained according to these accompanying drawings.
Fig. 1 is a kind of developing apparatus structural representation of embodiment；
Fig. 2 is a kind of guiding gutter cross section close-up schematic view of embodiment；
Fig. 3 is the guiding gutter cross section close-up schematic view of another embodiment；
Fig. 4 is a kind of front close-up schematic view of guiding gutter；
Fig. 5 is a kind of stereogram of embodiment of the second cover plate of developing apparatus in Fig. 1；
Fig. 6 is the top view of the second cover plate in Fig. 5；
Fig. 7 is a kind of front view of embodiment of the second cover plate in Fig. 5；
Fig. 8 is the front view of the another embodiment of the second cover plate in Fig. 5；
Fig. 9 is the front view of the another embodiment of the second cover plate in Fig. 5；
Figure 10 is the stereogram of the another embodiment of the second cover plate of developing apparatus in Fig. 1；
Figure 11 is the top view of the second cover plate in Figure 10；
Figure 12 is a kind of front view of embodiment of the second cover plate in Figure 10；
Figure 13 is the front view of the another embodiment of the second cover plate in Figure 10；
Figure 14 is the front view of the another embodiment of the second cover plate in Figure 10.
Embodiment
Below in conjunction with the accompanying drawing in embodiment of the present invention, the technical scheme in embodiment of the present invention is carried out clear
Chu, it is fully described by, it is clear that described embodiment only a part of embodiment of the present invention, rather than whole realities
Apply mode.Based on the embodiment in the present invention, those of ordinary skill in the art institute under the premise of creative work is not made
The every other embodiment obtained, belongs to the scope of protection of the invention.
Referring to Fig. 1, one embodiment of the present invention provides a kind of developing apparatus 100, including development work room 11,
The development work room 11 includes the cover plate 01 of housing 10 and first, and the top of housing 10 sets opening, and first cover plate 01 is set
In the opening and cover to the housing 10, set in the housing 10 for the fixed development station for treating developing device 05
06th, the first flusher 04 of the relatively described top of development station 06 setting, the relatively described bottom of development station 06 are set
The second flusher 07, the second cover plate 02 located at the top of the first flusher 04, first cover plate 01 is located at institute
State being filled away from the side of first flusher 04, first flusher 04 and second sprinkling for the second cover plate 02
Set to 07 and be used to spray developing liquid or pure water, to treat that developing device 05 is developed or rinsed to described；Second cover plate 02
Middle part is protruded backwards to the direction of development station 06, and the developer solution or pure water that splash on second cover plate 02 are led to
Cross the side of the second cover plate 02 to flow down, second cover plate 02 is connected with the inwall of the housing 10.
In present embodiment, development work room 11 can be applied in combination with multiple, such as multiple development work rooms 11 are combined as
Development work room group, by controlling the movement of gold-tinted to develop one by one to development work room 11 in gold-tinted processing procedure, or
Portable development work room 11 is arranged to, the development work room 11 of multiple movements is shown into the position of fixed gold-tinted one by one
Shadow.First cover plate 01 is transparent material, such as glass, resin material etc., and it, which is acted on, is easy for operating personnel and observes development work
The development situation of chamber interior.Housing 10 can be made up of metal material or alloy material, and its open top shape can be square
It is or circular, it is possible to understand that, or other shapes, the shape of the first cover plate 01 are corresponding with opening shape.Aperture area one
As be less than area of section inside corresponding development work room 11, now, the area of the first cover plate 01 is smaller, the opening pair of housing
The intensity effect of housing 10 is smaller, and particularly, the area of opening can also be equal to the section inside corresponding development work room 11
Area, now, the area of the first cover plate 01 is maximum, and the visual field that operating personnel are observed inside development work room 11 is best.First lid
The mode that plate 01 and opening cover can be by setting projection in edge of opening, be provided with the first cover plate 01 corresponding groove with
Engaged, or corresponding screw thread is provided with opening and the first cover plate 01, by the connection of screw thread to be covered, then
Or buckle is provided with the housing 10, fasten the first cover plate 01 by buckle is covered with realizing, it is possible to understand that, the mode covered
Can also be other forms.
Second cover plate 02 is transparent material, such as glass, resin material etc., operating personnel can pass through the He of the first cover plate 01
Second cover plate 02 observes development situation, can also observe the liquid for whether having sputtering on the second cover plate 02 in addition.Second cover plate
02 middle part protrudes backwards to the direction of development station 06, when having the liquid of sputtering on the second cover plate 02, due to the work of gravity
With liquid flows down from top to bottom, will not pollute from the middle part of the second cover plate 02 drippage and treat developing device 05.Second cover plate 02 with
The inwall connection of housing 10, when the interior contact of the liquid flowed down and housing 10, housing 10 is flowed to by the inwall of housing 10
Bottom, finally by leakage fluid dram it is (not shown) discharge.Development station 06 has development work face 061 and by a plurality of supporting leg
062 support, its size are less than the size of housing 10, and have gap between development station 06 and housing 10, from the second cover plate
02 liquid flowed down flows to the bottom of housing 10 by the gap, treats that developing device 05 is placed on development work face 061 and with first
The correspondence of flusher 04, development work face 061 have engraved structure so as to treat the corresponding second sprinkling dress in the lower surface of developing device 05
7 are set to 0, development station 06 is provided with fixture (not shown) and treats developing device 05 with fixation.First flusher 04 and the second spray
Spilling device 07 has pipeline and the shower nozzle positioned at line end, and developing device is treated for developer solution or pure water are uniformly sprayed at
On 05.
In a kind of embodiment, the developing apparatus also includes guiding gutter 03, and the guiding gutter 03 is located at the described second lid
The inwall link position lower section of plate 02 and the housing 10, the developer solution or pure that the side of the second cover plate 02 is flowed down
Water flows out.
In present embodiment, Fig. 2 is refer to, guiding gutter 03 can be separately provided with respect to housing 10 and be fixed to housing 10
Side wall, fixed mode can be fixed for screw, or buckle or neck are fixed or pasted fixed etc..Fig. 3 is refer to, is led
Chute 03 can also dig out groove on the housing 10 and be formed, now between the second cover plate 02 and guiding gutter 03 have inclined-plane 031 with
Developer solution or pure water is set to be flowed into by inclined-plane 031 in guiding gutter 03.Fig. 4 is refer to, guiding gutter 03 has in one direction
Inclined angle, so that the liquid in it can dredge outflow under gravity, specifically, the relative level of guiding gutter 03
Face has angle of inclination, so that guiding gutter has the higher first end 032 of relative level and the second relatively low end 033, it is described
Second end 033 is connected to the leakage fluid dram (not shown) of the housing bottom by pipeline (not shown), makes the liquid in guiding gutter 03
Body is flowed out by pipeline from leakage fluid dram.
The embodiment of some the second cover plates is provided below：
Refer to Fig. 5 and Fig. 6, in a kind of embodiment, second cover plate 02 is tile, and middle part protrude after be line
Shape, so that the developer solution or pure water that splash on second cover plate 02 flow from the middle part of the second cover plate 02 to two sides
Under.
In present embodiment, folding line of second cover plate 02 in the position of the protrusion at middle part is symmetrical along middle part, i.e., is put down with side
Row set, in other embodiments, the second cover plate 02 middle part folding line can also relative side there is angle.Second cover plate
02 extrusion position at middle part is higher than two sides, and due to the effect of gravity, liquid can be along the lower surface of the second cover plate 02
Flow down.
It refer to Fig. 7, in a kind of embodiment, second cover plate 02 is shaped as folded plate, the knuckle in the middle part of the folded plate
Scope is 90 °~175 °.
In present embodiment, knuckle refers to the angle between two blocks of plates being folded over, the extrusion position phase at the excessive middle part of knuckle
It is insufficient to allow liquid the too small then excessively space-consuming of knuckle, can be unfavorable for setting under the influence of gravity to the height of both sides
Standby structure design, therefore, further preferred knuckle scope be 120 °~175 °, particularly preferred angle be 135 °~
150°。
It refer to Fig. 8, in a kind of embodiment, second cover plate 02 is shaped as arc plate.
In present embodiment, arc plate is easy to process, generally use forging and stamping, casting etc., has low-cost advantage.
It refer to Fig. 9, in a kind of embodiment, second cover plate 02 is shaped as the intersecting curved slab of two sections of circular arcs.
In present embodiment, two sections of circular arcs are the same side that the center of circle is located at the second cover plate 02, for example, two in the present embodiment
The center of circle of section circular arc is respectively positioned on the upside of the second cover plate 02, and in other embodiments, the center of circle of two sections of circular arcs may be located on
The downside of second cover plate 02, or two sections of circular arcs the center of circle respectively be located at the second cover plate 02 not homonymy.
Refer to Figure 10 and Figure 11, in a kind of embodiment, second cover plate 02 is bowl-shape with four sides, and in
Portion be point-like after protruding, so as to splash the developer solution or pure water on second cover plate 02 in the middle part of second cover plate 02
Flowed down to four sides.
In present embodiment, the second cover plate 02 is connected with the inwall on four sides of housing 10, and 10 4 sides of housing is interior
Wall has liquid to be flowed down from the second cover plate 02, can accelerate under the liquid flow on the second cover plate 02, further reduces dropping onto
Treat the risk on developing device 05.It is point-like that the middle part of second cover plate 02, which protrudes, i.e. with respect to four, the middle part of the second cover plate 02 side
Only there is 1 high point, avoid the occurrence of multiple identical high points and cause liquid can not be flowed down by Action of Gravity Field.
It refer to Figure 12, in a kind of embodiment, second cover plate 02 is shaped as polylith plane and intersected.
In present embodiment, polylith plane intersects, i.e., the inclined plane of polylith enclose to be formed middle high surrounding it is low second
The shape of cover plate 02, has angle between adjacent two pieces of planes, and in present embodiment, the quantity of polylith plane is at least 4 pieces,
To form 4 sides of the second cover plate 02 respectively.
It refer to Figure 13, in a kind of embodiment, second cover plate 02 is shaped as sphere.
In present embodiment, the cover plate shape of sphere, transition is round and smooth, the ditch that no plane is crossed to form, more conducively liquid
Flowed down from the middle part of the second cover plate 02 to surrounding.
It refer to Figure 14, in a kind of embodiment, second cover plate 02 is shaped as polylith arc surface and intersected.
In present embodiment, the quantity of polylith arc surface is at least 4, the center of circle corresponding to polylith arc surface can simultaneously position
, can also be respectively positioned at the not homonymy of the second cover plate 02 in the upside or downside of the second cover plate 02.
Above disclosed be only a kind of better embodiment of the present invention, can not limit the present invention's with this certainly
Interest field, one of ordinary skill in the art will appreciate that all or part of flow of above-mentioned embodiment is realized, and Yi Benfa
The equivalent variations that bright claim is made, still fall within and invent covered scope.
Claims (10)
1. a kind of developing apparatus, including development work room, it is characterised in that the development work room includes housing and the first lid
Plate, the housing tip set opening, and first cover plate is located at the opening and covers to the housing, is set in the housing
It is the first flusher for being set for the fixed development station for treating developing device, relatively described development station top, relative
The second flusher, the second cover plate located at the first flusher top of the development station bottom setting, it is described
First cover plate be located at second cover plate away from the side of first flusher, first flusher and described
Two flushers are used to spray developing liquid or pure water, to treat that developing device is developed or rinsed to described；Second lid
Protruded in the middle part of plate backwards to the development station direction, the developer solution or pure water that splash on second cover plate are passed through
Second deck side edge is flowed down, and second cover plate is connected with the inwall of the housing.
2. developing apparatus as claimed in claim 1, it is characterised in that also including guiding gutter, the guiding gutter is located at described the
The inwall link position lower section of two cover plates and the housing, the developer solution or pure water that second deck side edge is flowed down
Outflow.
3. developing apparatus as claimed in claim 2, it is characterised in that the guiding gutter relative level has angle of inclination,
So that the guiding gutter has the higher first end of relative level and the second relatively low end, second end is connected by pipeline
To the leakage fluid dram of the housing bottom.
4. developing apparatus as claimed in claim 2, it is characterised in that the relatively described housing of the guiding gutter is separately provided and consolidated
The fixed side wall to the housing.
5. developing apparatus as claimed in claim 2, it is characterised in that the guiding gutter is recessed in the housing sidewall
Groove, there is intermediate incline between second cover plate and the groove so that the developer solution or pure water are flowed into the groove.
6. the developing apparatus as described in claim 1 to 5 is any, it is characterised in that second cover plate is tile, and middle part
It is wire after protrusion, so as to splash the developer solution or pure water on second cover plate in the middle part of second cover plate to two
Side flows down.
7. developing apparatus as claimed in claim 6, it is characterised in that second cover plate is shaped as folded plate, in the folded plate
The knuckle scope in portion is 90 °~175 °.
8. developing apparatus as claimed in claim 6, it is characterised in that second cover plate is shaped as arc plate.
9. developing apparatus as claimed in claim 6, it is characterised in that second cover plate is shaped as the intersecting song of two sections of circular arcs
Panel.
10. the developing apparatus as described in claim 1 to 5 is any, it is characterised in that second cover plate is with four sides
It is bowl-shape, and be point-like after the protrusion of middle part, so that the developer solution or pure water that splash on second cover plate cover from described second
Flowed down in the middle part of plate to four sides.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710864771.9A CN107450285A (en) | 2017-09-22 | 2017-09-22 | Developing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710864771.9A CN107450285A (en) | 2017-09-22 | 2017-09-22 | Developing apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107450285A true CN107450285A (en) | 2017-12-08 |
Family
ID=60497853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710864771.9A Pending CN107450285A (en) | 2017-09-22 | 2017-09-22 | Developing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107450285A (en) |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61259522A (en) * | 1985-05-13 | 1986-11-17 | Sony Corp | Developing device |
| JPS63193151A (en) * | 1987-02-06 | 1988-08-10 | Toshiba Corp | Automatic developing device |
| JP3602164B2 (en) * | 1994-08-12 | 2004-12-15 | 東京エレクトロン株式会社 | Development method |
| CN202332795U (en) * | 2011-11-15 | 2012-07-11 | 库特勒自动化系统(苏州)有限公司 | Sealing device for sealing etched groove |
| CN203071050U (en) * | 2013-01-24 | 2013-07-17 | 苏州锝耀电子有限公司 | Pickling tank |
| CN203551943U (en) * | 2013-11-19 | 2014-04-16 | 高志子 | Multifunctional drying cassette |
| CN104538332A (en) * | 2014-12-12 | 2015-04-22 | 深圳市华星光电技术有限公司 | Chamber structure for wet process machine |
| CN106940515A (en) * | 2017-05-08 | 2017-07-11 | 武汉华星光电技术有限公司 | Developing apparatus |
| CN106990678A (en) * | 2017-03-14 | 2017-07-28 | 武汉华星光电技术有限公司 | Developing apparatus |
| CN206400267U (en) * | 2017-01-12 | 2017-08-11 | 梅州市裕维电子有限公司 | A kind of overflow-prevent device of developing machine |
-
2017
- 2017-09-22 CN CN201710864771.9A patent/CN107450285A/en active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61259522A (en) * | 1985-05-13 | 1986-11-17 | Sony Corp | Developing device |
| JPS63193151A (en) * | 1987-02-06 | 1988-08-10 | Toshiba Corp | Automatic developing device |
| JP3602164B2 (en) * | 1994-08-12 | 2004-12-15 | 東京エレクトロン株式会社 | Development method |
| CN202332795U (en) * | 2011-11-15 | 2012-07-11 | 库特勒自动化系统(苏州)有限公司 | Sealing device for sealing etched groove |
| CN203071050U (en) * | 2013-01-24 | 2013-07-17 | 苏州锝耀电子有限公司 | Pickling tank |
| CN203551943U (en) * | 2013-11-19 | 2014-04-16 | 高志子 | Multifunctional drying cassette |
| CN104538332A (en) * | 2014-12-12 | 2015-04-22 | 深圳市华星光电技术有限公司 | Chamber structure for wet process machine |
| CN206400267U (en) * | 2017-01-12 | 2017-08-11 | 梅州市裕维电子有限公司 | A kind of overflow-prevent device of developing machine |
| CN106990678A (en) * | 2017-03-14 | 2017-07-28 | 武汉华星光电技术有限公司 | Developing apparatus |
| CN106940515A (en) * | 2017-05-08 | 2017-07-11 | 武汉华星光电技术有限公司 | Developing apparatus |
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Application publication date: 20171208 |