CN107413290A - Cleaning device and there is its UV reactor - Google Patents
Cleaning device and there is its UV reactor Download PDFInfo
- Publication number
- CN107413290A CN107413290A CN201710657250.6A CN201710657250A CN107413290A CN 107413290 A CN107413290 A CN 107413290A CN 201710657250 A CN201710657250 A CN 201710657250A CN 107413290 A CN107413290 A CN 107413290A
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- Prior art keywords
- flow
- cleaning
- stopping plate
- cleaning device
- socket tube
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- 238000004140 cleaning Methods 0.000 title claims abstract description 159
- 239000010453 quartz Substances 0.000 claims abstract description 83
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 83
- 238000004026 adhesive bonding Methods 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims 1
- 238000009472 formulation Methods 0.000 abstract description 24
- 239000000203 mixture Substances 0.000 abstract description 24
- 230000000694 effects Effects 0.000 abstract description 12
- 230000000844 anti-bacterial effect Effects 0.000 abstract description 6
- 239000012530 fluid Substances 0.000 description 20
- 230000033001 locomotion Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 230000001954 sterilising effect Effects 0.000 description 4
- 238000004659 sterilization and disinfection Methods 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 238000009434 installation Methods 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/123—Ultraviolet light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0006—Controlling or regulating processes
- B01J19/002—Avoiding undesirable reactions or side-effects, e.g. avoiding explosions, or improving the yield by suppressing side-reactions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0053—Details of the reactor
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Cleaning In General (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The invention provides a kind of cleaning device, the cleaning device is installed in UV reactor, and is movingly arranged on quartz socket tube, and the cleaning device includes：Flow-stopping plate, have on the flow-stopping plate and be sheathed on the mounting hole on the quartz socket tube and the flowing hole on the outside of the mounting hole；And cleaning part, it is arranged in the mounting hole, the cleaning part is in contact with the outer wall of the quartz socket tube.Cleaning device can be while empir-ical formulation effect be played, moreover it is possible to quartz socket tube is cleaned, cleaning function is realized and is coexisted with empir-ical formulation function, ensures to ensure cleaning performance while bactericidal effect, improves performance.The present invention also provides a kind of UV reactor.
Description
Technical field
The present invention relates to ultraviolet consersion unit technical field, more particularly to a kind of cleaning device and with the ultraviolet of its
Line reactor.
Background technology
Generally, there is quartz socket tube in various UV reactors, ultraviolet lamp is put into quartz socket tube.Due to quartz sleeve
Pipe and water contact are, it is necessary to periodic cleaning.At present, there is an implacable contradiction during UV reactor structure design：When setting
When having the baffle plate of increase empir-ical formulation effect, quartz socket tube cleaning device can not be installed；When installing quartz socket tube cleaning device,
The baffle plate of increase empir-ical formulation effect can not be installed.Both interfere with each other in structure, can not coexist, and then it is anti-to influence ultraviolet
Answer the use of device.
The content of the invention
Based on this, it is necessary to incompatible for the cleaning device of cleaning quartz socket tube at present and the baffle plate of empir-ical formulation
Problem, there is provided cleaning device that is a kind of while realizing mixed flow function and cleaning function, while one kind is also provided and contains above-mentioned cleaning
The ultraviolet reaction chamber of device.
Above-mentioned purpose is achieved through the following technical solutions：
A kind of cleaning device, is installed in UV reactor, and is movingly arranged on quartz socket tube, the cleaning
Device includes：
Flow-stopping plate, have on the flow-stopping plate and be sheathed on the mounting hole on the quartz socket tube and outside the mounting hole
The flowing hole of side；And
Part is cleaned, is arranged in the mounting hole, the cleaning part can connect with the outer wall of the quartz socket tube
Touch.
In one of the embodiments, the quantity of the flow-stopping plate is multiple, and multiple flow-stopping plates are along the quartz sleeve
The axial direction of pipe is equidistantly arranged.
In one of the embodiments, the quantity of the cleaning part is one, and the cleaning part is installed on multiple institutes
In one of them the described mounting hole for stating flow-stopping plate；
Or the quantity of the cleaning part is multiple, and the quantity of the cleaning part is less than the number of the flow-stopping plate
Amount, multiple cleaning parts are respectively arranged in the mounting hole of certain several flow-stopping plate.
In one of the embodiments, the quantity of the cleaning part is equal to the quantity of the flow-stopping plate, each gear
There is the cleaning part in the mounting hole of flowing plate.
In one of the embodiments, part is fixed by gluing, buckle, fixture is fixed or is interference fitted for the cleaning
It is fixed in the mounting hole.
In one of the embodiments, the quantity of the flowing hole on the flow-stopping plate is multiple that multiple flowing holes enclose
Set around the mounting hole.
In one of the embodiments, the cleaning device also includes driving part, the driving part and the baffle
Plate connects, and the driving part can drive the flow-stopping plate to be moved along the quartz socket tube.
In one of the embodiments, the cleaning device also includes connecting rod, and the connecting rod connects multiple gears
Flowing plate, the driving part drive the flow-stopping plate to move by the connecting rod.
In one of the embodiments, the quantity of the flow-stopping plate is seven, and seven flow-stopping plates are equidistantly arranged, often
Four flowing holes are opened up on the individual flow-stopping plate, four flowing holes are uniformly distributed around the mounting hole；
The quantity of the cleaning part is four, and four cleaning parts are disposed therein the institute of four flow-stopping plates
State in mounting hole.
Further relate to a kind of UV reactor, including outer sleeve, quartz socket tube, ultraviolet lamp and any technology is special as described above
The described cleaning device of sign；
The quartz socket tube is installed in the outer sleeve, and the ultraviolet lamp is installed in the quartz socket tube, described
Cleaning device is movingly sheathed on the quartz socket tube.
After adopting the above technical scheme, the beneficial effects of the invention are as follows：
The UV reactor and its cleaning device of the present invention, the quartz socket tube of UV reactor can be carried out clear
Wash, simultaneously, moreover it is possible to improve the mixing of lateral current.Flow-stopping plate with flowing hole can increase fluid in UV reactor
Empir-ical formulation, to cause the development of the turbulent flow of fluid in UV reactor more abundant, improve ultraviolet sterilization efficiency；Work as quartz sleeve
When pipe needs cleaning, flow-stopping plate moves on quartz socket tube enables to outer wall of the cleaning part in mounting hole to quartz socket tube
Cleaned；The effective incompatible problem of baffle plate for solving the cleaning device and empir-ical formulation of cleaning quartz socket tube at present,
Cleaning device can play empir-ical formulation effect while, moreover it is possible to quartz socket tube is cleaned, realize cleaning function with
Empir-ical formulation function coexists, and so, for UV reactor in horizontal mixed flow, flow-stopping plate convection body carries out empir-ical formulation；Clear
When washing, cleaning part cleans to quartz socket tube, ensures cleaning performance while bactericidal effect is ensured, it is anti-to improve ultraviolet
Answer the performance of device.
Brief description of the drawings
Fig. 1 is that the cleaning device of the UV reactor of one embodiment of the invention moves to the structural representation of a position
Figure；
Fig. 2 is that the cleaning device of the UV reactor shown in Fig. 1 moves to the structural representation of another position；
Fig. 3 cleans the schematic diagram of part for installation on flow-stopping plate in the cleaning device shown in Fig. 1；
Fig. 4 be Fig. 1 shown in cleaning device in flow-stopping plate schematic diagram；
Wherein：
100- UV reactors；
110- cleaning devices；
111- flow-stopping plates；
1111- mounting holes；
1112- flowing holes；
112- cleans part；
120- quartz socket tubes；
130- outer sleeves；
131- feed tubes；
132- drain pipes.
Embodiment
In order to make the purpose , technical scheme and advantage of the present invention be clearer, by the following examples, and combine attached
Figure, the UV reactor and its cleaning device of the present invention are further elaborated.It is it should be appreciated that described herein
Specific embodiment only to explain the present invention, is not intended to limit the present invention.
Referring to Fig. 1 and Fig. 2, Fig. 1 is that the cleaning device 110 of the UV reactor 100 of one embodiment of the invention moves to
The structural representation of one position, Fig. 2 are that the cleaning device 110 of the UV reactor 100 shown in Fig. 1 moves to another position
The structural representation put.The invention provides a kind of cleaning device 110, the cleaning device 110 is installed on UV reactor 100
In, and be movingly arranged on quartz socket tube 120.Certainly, cleaning device 110 of the invention can be additionally used in other kinds of post
Describe that device meets the requirement of horizontal mixed flow while cleaning.The cleaning device 110 of the present invention can be to UV reactor 100
Quartz socket tube 120 carry out periodic cleaning, while the empir-ical formulation of fluid in UV reactor 100 can also be realized, realized
Cleaning function coexists with empir-ical formulation function, ensures cleaning performance while bactericidal effect is ensured, improves UV reactor
Performance.
In the present invention, cleaning device 110 includes flow-stopping plate 111 and cleaning part 112.Flow-stopping plate 111 is for realizing
Fluid in UV reactor 100 carries out horizontal mixed flow so that fluid turbulent development is abundant, improves the sterilization effect of ultraviolet
Rate.Part 112 is cleaned for being cleaned to quartz socket tube 120, to avoid grime shadow on quartz socket tube 120
The irradiation of the middle-ultraviolet lamp of quartz socket tube 120 is rung, realizes the periodic cleaning of quartz socket tube 120, ensures killing for UV reactor 100
Bacterium performance, ensure performance.Specifically, there is mounting hole 1111 and the position being sheathed on quartz socket tube 120 on flow-stopping plate 111
Flowing hole 1112 in the outside of mounting hole 1111.Mounting hole 1111 is installed for the ease of flow-stopping plate 111, and mounting hole 1111 is set
Put the central region in flow-stopping plate 111.During installation, flow-stopping plate 111 is sheathed on the outer of quartz socket tube 120 by mounting hole 1111
Side, moreover, the outward flange of flow-stopping plate 111 has necessarily pre- also between the inwall of the outer sleeve 130 of UV reactor 100
If spacing, flow in the default spacing that such fluid can be between the outward flange of flow-stopping plate 111 and sleeve 130, further protect
Demonstrate,prove empir-ical formulation effect；Simultaneously, moreover it is possible to reduce resistance when flow-stopping plate 111 moves.
Cleaning part 112 is arranged in mounting hole 1111, and cleaning part 112 is in contact with the outer wall of quartz socket tube 120.When
When cleaning device 110 carries out horizontal mixed flow to the fluid in UV reactor 100, the energy of flowing hole 1112 on flow-stopping plate 111
Enough so that fluid passes through so that fluid turbulent mixing is abundant, plays a part of horizontal mixed flow, improves ultraviolet sterilization efficiency.When
When cleaning device 110 cleans to the quartz socket tube 120 in UV reactor 100, due to the mounting hole of flow-stopping plate 111
Cleaning part 112 in 1111 is in contact with the outer wall of quartz socket tube 120, when flow-stopping plate 111 can be in UV reactor 100
Moved along the axial direction of quartz socket tube 120, cleaning part 112 can continue and quartz along the axial direction of quartz socket tube 120
The outer wall of sleeve pipe 120 is in contact, and realizes the cleaning of quartz socket tube 120.
Referring to Fig. 3 and Fig. 4, Fig. 3 is installation cleaning part 112 on flow-stopping plate 111 in the cleaning device 110 shown in Fig. 1
Schematic diagram, Fig. 4 be Fig. 1 shown in cleaning device 110 in flow-stopping plate 111 schematic diagram.Moreover, in order to improve flow-stopping plate 111
Empir-ical formulation effect, the quantity of the flowing hole 1112 on flow-stopping plate 111 is multiple, and multiple flowing holes 1112 surround mounting hole 1111
Set.Multiple flowing holes 1112 can facilitate fluid to pass through so that fluid turbulent flowing is fierce, and then causes fluid empir-ical formulation
Uniformly, ultraviolet sterilization effect is improved.Moreover, multiple flowing holes 1112 can be uniformly distributed, also can be in that heterogeneous fashion is distributed.
In the present embodiment, multiple flowing holes 1112 are distributed in non-uniform manner.Also, the quantity of flowing hole 1112 is four, is realized
While empir-ical formulation is uniform, ensure bactericidal effect.Certainly, in the other embodiment of the present invention, the number of flowing hole 1112
Amount can be three, five it is even more more, as long as can ensure that fluid empir-ical formulation is uniform.
The cleaning device 110 of the present invention integrates cleaning function and horizontal mixed flow function so that cleaning device 110 can either
Cleaning operation is carried out to quartz socket tube 120, can also empir-ical formulation be carried out to the fluid in UV reactor 100, realize
The part of cleaning function and the part of empir-ical formulation function coexist, it is effective solve at present the cleaning device of cleaning quartz socket tube with
The incompatible problem of baffle plate of empir-ical formulation, ensure cleaning performance while bactericidal effect is ensured, improve ultraviolet reaction
The performance of device 100.
It is preferred that cleaning part 112 is cleaning brush, to ensure stain removal effect；Certainly, in the other embodiment of the present invention
In, cleaning part 112 or other types can realize the structure that quartz socket tube 120 cleans.Moreover, cleaning brush can be steel
Wire brush.Certainly, cleaning brush can also be the brush made of the material that other are capable of antiultraviolet.The cleaning device 110 of the present invention
The cleaning operation of quartz socket tube 120 is realized by cleaning brush, ensures that quartz socket tube 120 cleans up, and then ensure ultraviolet lamp
The radiation response through quartz socket tube 120, improve bactericidal effect.
Further, the quantity of flow-stopping plate 111 is multiple, and multiple flow-stopping plates 111 are along axial direction of quartz socket tube 120 etc.
Spacing is arranged.Multiple flow-stopping plates 111 are arranged at intervals the contact area that can increase flow-stopping plate 111 and fluid, improve mixing efficiency,
Further improve the empir-ical formulation effect of fluid.Meanwhile multiple flow-stopping plates 111 can also clean to quartz socket tube 120 respectively,
So that each cleaning the outer wall of the quartz socket tube 120 of 112 cleaning parts of part, cleaning efficiency, convenient use are improved.When
So, in the other embodiment of the present invention, multiple flow-stopping plates 111 also can be in non-spaced set, and so also disclosure satisfy that makes
With requiring.It is preferred that the quantity of flow-stopping plate 111 is seven, seven flow-stopping plates 111 are first-class in the axial direction of quartz socket tube 120
Spacing is set, so can be while horizontal mixed flow effect is ensured, moreover it is possible to ensure cleaning performance.
Further, when the quantity for cleaning part 112 is one, cleaning part 112 is installed on one of flow-stopping plate
In 111 mounting hole 1111；When the quantity for cleaning part 112 is multiple, and the quantity for cleaning part 112 is less than flow-stopping plate
111 quantity；Multiple cleaning parts 112 are respectively arranged in the mounting hole 1111 in certain several flow-stopping plate 111.Optionally, may be used
Only to set cleaning part 112 in the mounting hole 1111 of a flow-stopping plate 111, quartz socket tube 120 so can be also realized
Cleaning.
It is preferred that cleaning part is set in the wherein mounting hole 1111 of certain several flow-stopping plate 111 of multiple flow-stopping plates 111
112, so can be cost-effective, while can also reduce because cleaning part 112 be in contact with quartz socket tube 120 caused by energy consumption,
Facilitate the driving of multiple flow-stopping plates 111, facilitate flow-stopping plate 111 to drive cleaning part 112 to be carried out on the outer wall of quartz socket tube 120
Washing and cleaning operation, ensure cleaning performance.Certainly, in the other embodiment of the present invention, the mounting hole 1111 of each flow-stopping plate 111
In have cleaning part 112.The quantity for cleaning part 112 is equal to the quantity of flow-stopping plate 111, can so ensure to clean part
The cleaning performance of the outer wall of 112 pairs of quartz socket tubes 120, avoids the occurrence of blind area, ensures cleaning performance, simply clean part 112 with
The contact area increase of quartz socket tube 120, so need to consider the power consumption problem caused by frictional resistance.
Alternatively, part 112 is fixed by gluing, buckle, fixture is fixed or is interference fitted and is fixed on mounting hole for cleaning
In 1111.So enable to cleaning part 112 to be reliably fixed in the mounting hole 1111 of flow-stopping plate 111, avoid cleaning part
Play occurs for position of the part 112 in mounting hole 1111, ensures cleaning performance.Certainly, cleaning part 112 of the invention can also be adopted
Mode is such as integrally formed in other ways to be fixed on part 112 is cleaned on the inwall of mounting hole 1111.
As a kind of embodiment, cleaning device 110 also includes driving part, and driving part is connected with flow-stopping plate 111,
Driving part can drive flow-stopping plate 111 to be moved along quartz socket tube 120.Driving part provides power for the motion of flow-stopping plate 111
Source, for realizing the motion of flow-stopping plate 111, driving part can drive axial direction of the flow-stopping plate 111 along quartz socket tube 120
Motion so that flow-stopping plate 111 can carry out empir-ical formulation in motion to the fluid in UV reactor 100, ensure mixing
Effect, while can also make it that clean axial direction of the part 112 along quartz socket tube 120 is carried out to the outer wall of quartz socket tube 120
Cleaning, ensure cleaning performance.Alternatively, driving part is the power parts such as motor or cylinder, to realize driving flow-stopping plate
111 motions.
Further, cleaning device 110 also includes connecting rod, and connecting rod connects multiple flow-stopping plates 111, and driving part passes through
Connecting rod driving flow-stopping plate 111 moves.Connecting rod is the connection for realizing multiple flow-stopping plates 111, is so enabled to more
Individual flow-stopping plate 111 is synchronized with the movement, and avoids two adjacent flow-stopping plates 111 from being collided because of Asynchrony, ensure mixed flow with
Cleaning performance.Moreover, multiple flow-stopping plates 111 are equally spaced, driving part can drive multiple baffles by connecting rod
Axial direction of the plate 111 along quartz socket tube 120 moves back and forth, and while horizontal mixed flow, realizes to the outer wall of quartz socket tube 120
Cleaning so that the outer wall of quartz socket tube 120 is cleaned completely, ensures cleaning performance.
Referring to Fig. 1 and Fig. 2, in the present embodiment, the quantity of flow-stopping plate 111 is seven, and seven flow-stopping plates 111 are equidistantly arranged
Cloth, four flowing holes 1112 is opened up on each flow-stopping plate 111, four flowing holes 1112 are uniformly distributed around mounting hole 1111.Clearly
The quantity for washing part 112 is three, and three cleaning parts 112 are disposed therein in the mounting hole 1111 of three flow-stopping plates 111.Three
Individual cleaning part 112 is separately positioned in the mounting hole 1111 of flow-stopping plate 111 separately.That is, seven flow-stopping plates 111 are pacified respectively
1~No. 7 order is filled to arrange, wherein No. 1 flow-stopping plate 111 of flow-stopping plate 111,5 of flow-stopping plate 111,3 and No. 7 flow-stopping plates 111
Cleaning part 112 is set respectively in mounting hole 1111, so, as shown in figure 1, when driving part drives seven flow-stopping plates 111 to transport
When moving high order end, the cleaning part 112 in No. 1 flow-stopping plate 111 can clean to the outer wall of the end of quartz socket tube 120；
As shown in Fig. 2 when driving part drives seven flow-stopping plates 111 to move to low order end, the cleaning part in No. 7 flow-stopping plates 111
112 can clean to the outer wall of the end of quartz socket tube 120.When cleaning part 112 cleans to quartz socket tube 120, multiple gears
Flowing plate 111 can move change between the high order end position shown in Fig. 1 and the low order end position shown in Fig. 2, ensure quartz sleeve
The outer wall washing of pipe 120 is clean, and then ensures cleaning performance.
Present invention also offers a kind of UV reactor 100, including outer sleeve 130, quartz socket tube 120, ultraviolet lamp
And the cleaning device 110 in above-described embodiment.Quartz socket tube 120 is installed in outer sleeve 130, and ultraviolet lamp is installed on quartz sleeve
In pipe 120, cleaning device 110 is movingly sheathed on quartz socket tube 120.Moreover, it is provided with feed tube on outer sleeve 130
131 and drain pipe 132, fluid entered by feed tube 131 in outer sleeve 130, and flowed out by drain pipe 132.The present invention
UV reactor 100 empir-ical formulation is carried out to the fluid in outer sleeve 130 by cleaning device 110, while can also be to stone
The outer wall of English sleeve pipe 120 is cleaned, specifically, the flow-stopping plate 111 of cleaning device 110 can be to the fluid in outer sleeve 130
Empir-ical formulation is carried out, the cleaning part 112 in the mounting hole 1111 of flow-stopping plate 111 can be to the outer wall progress of quartz socket tube 120
Cleaning, ensure the clean and tidy of quartz socket tube 120.
Each technical characteristic of embodiment described above can be combined arbitrarily, to make description succinct, not to above-mentioned reality
Apply all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, the record scope of this specification is all considered to be.
Embodiment described above only expresses the several embodiments of the present invention, and its description is more specific and detailed, but simultaneously
Therefore the limitation to the scope of the claims of the present invention can not be interpreted as.It should be pointed out that for one of ordinary skill in the art
For, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to the guarantor of the present invention
Protect scope.Therefore, the protection domain of patent of the present invention should be determined by the appended claims.
Claims (10)
1. a kind of cleaning device, it is characterised in that the cleaning device is installed in UV reactor, and is movingly set
In on quartz socket tube, the cleaning device includes：
Flow-stopping plate, have on the flow-stopping plate and be sheathed on the mounting hole on the quartz socket tube and on the outside of the mounting hole
Flowing hole；And
Part is cleaned, is arranged in the mounting hole, the cleaning part can be in contact with the outer wall of the quartz socket tube.
2. cleaning device according to claim 1, it is characterised in that the quantity of the flow-stopping plate is multiple described to be multiple
Axial direction of the flow-stopping plate along the quartz socket tube is equidistantly arranged.
3. cleaning device according to claim 2, it is characterised in that the quantity of the cleaning part is one, described clear
Part is washed to be installed in the mounting hole of one of them flow-stopping plate；
Or the quantity of the cleaning part is multiple, and the quantity of the cleaning part is less than the quantity of the flow-stopping plate, more
The individual cleaning part is respectively arranged in the mounting hole of certain several flow-stopping plate.
4. cleaning device according to claim 2, it is characterised in that the quantity of the cleaning part is equal to the flow-stopping plate
Quantity, there is the cleaning part in the mounting hole of each flow-stopping plate.
5. the cleaning device according to claim 3 or 4, it is characterised in that it is described cleaning part by it is gluing, buckle is solid
Fixed, fixture is fixed or is interference fitted and is fixed in the mounting hole.
6. according to the cleaning device described in any one of Claims 1-4, it is characterised in that flowing hole on the flow-stopping plate
Quantity is multiple, and multiple flowing holes are set around the mounting hole.
7. according to the cleaning device described in any one of Claims 1-4, it is characterised in that also including driving part, the driving
Part is connected with the flow-stopping plate, and the driving part can drive the flow-stopping plate to be moved along the quartz socket tube.
8. cleaning device according to claim 7, it is characterised in that the cleaning device also includes connecting rod, the company
Extension bar connects multiple flow-stopping plates, and the driving part drives the flow-stopping plate to move by the connecting rod.
9. cleaning device according to claim 3, it is characterised in that the quantity of the flow-stopping plate is seven, described in seven
Flow-stopping plate is equidistantly arranged, and opens up four flowing holes on each flow-stopping plate, four flowing holes surround the mounting hole
It is uniformly distributed；
The quantity of the cleaning part is four, and four cleaning parts are disposed therein the peace of four flow-stopping plates
Fill in hole.
10. a kind of UV reactor, it is characterised in that including outer sleeve, quartz socket tube, ultraviolet lamp and such as claim 1
To the cleaning device described in 9 any one；
The quartz socket tube is installed in the outer sleeve, and the ultraviolet lamp is installed in the quartz socket tube, the cleaning
Device is movingly sheathed on the quartz socket tube.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710657250.6A CN107413290A (en) | 2017-08-03 | 2017-08-03 | Cleaning device and there is its UV reactor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710657250.6A CN107413290A (en) | 2017-08-03 | 2017-08-03 | Cleaning device and there is its UV reactor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107413290A true CN107413290A (en) | 2017-12-01 |
Family
ID=60437453
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710657250.6A Pending CN107413290A (en) | 2017-08-03 | 2017-08-03 | Cleaning device and there is its UV reactor |
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| Country | Link |
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| CN (1) | CN107413290A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108742434A (en) * | 2018-04-28 | 2018-11-06 | 台州艾斐科技有限公司 | Push up position water delivery formula high cleaning dish-washing machine |
| CN111320229A (en) * | 2018-12-13 | 2020-06-23 | 斯坦雷电气株式会社 | Fluid sterilizing device |
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| CN207324776U (en) * | 2017-08-03 | 2018-05-08 | 深圳清华大学研究院 | Cleaning device and there is its UV reactor |
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Application publication date: 20171201 |