CN107365964A - A kind of TiAl base multilayer hard films of hobboing cutter cutter ring and preparation method thereof - Google Patents

A kind of TiAl base multilayer hard films of hobboing cutter cutter ring and preparation method thereof Download PDF

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Publication number
CN107365964A
CN107365964A CN201710587159.1A CN201710587159A CN107365964A CN 107365964 A CN107365964 A CN 107365964A CN 201710587159 A CN201710587159 A CN 201710587159A CN 107365964 A CN107365964 A CN 107365964A
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Prior art keywords
gas
tial
hobboing cutter
cutter ring
cutter
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CN201710587159.1A
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Chinese (zh)
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刘刚
郭岩
李太江
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Xian Thermal Power Research Institute Co Ltd
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Xian Thermal Power Research Institute Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/021Cleaning or etching treatments
    • C23C14/022Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641Nitrides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0664Carbonitrides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

A kind of TiAl base multilayer hard films of hobboing cutter cutter ring of the present invention and preparation method thereof, the film include Cr bottoms, TiAl transition zones, TiAlN resistances to oxidation transition zone and the TiAlCrCN wear-resistance thin film layers for being sequentially deposited to hobboing cutter cutter ring surface;The TiAlCrCN wear-resistance thin films layer is nanocrystalline (Ti, Cr) (C, the N) of face-centred cubic structure and AlN Two-phase composite structure, and the former is main phase.The preparation method, comprises the following steps:Clean the surface of hobboing cutter cutter ring, hobboing cutter cutter ring is placed on the rotating device in vacuum chamber again and rotated, and carry out plasma clean, then multi-arc ion coating physical vaporous deposition is used on hobboing cutter cutter ring surface again, Cr bottoms, TiAl transition zones, TiAlN resistances to oxidation transition zone and TiAlCrCN wear-resistance thin film layers are sequentially depositing, prepared by the TiAl bases multilayer hard film for completing hobboing cutter cutter ring.

Description

A kind of TiAl base multilayer hard films of hobboing cutter cutter ring and preparation method thereof
Technical field
The present invention relates to cutter field, the TiAl bases multilayer hard film of specially a kind of hobboing cutter cutter ring and its preparation side Method.
Background technology
This hobboing cutter is the important component of the heavy mechanical equipment of subsurface rock matter tunnel (hole) engineering tunneling boring construction, main It is used for the construction of the tunneling borings such as Rail Highway traffic tunnel, coal mine roadway, Urban Underground Passage, water power water conservancy tunnel.Hobboing cutter Main parts size is cutter hub, cutter ring, cutter ring snap ring, sealing, bearing, mandrel and end cap etc..During tunnel excavation, hobboing cutter cutter ring Mutually worn between rock (abrasive material) and extrude the abrasion for causing cutter ring, heating and deformation, it is hard that the heating of hobboing cutter cutter ring can reduce its Degree, so as to accelerate to wear.Inspection, change, maintenance cutter, time and effort consuming, directly affect cost and the duration of its construction work.According to Count, hobboing cutter consumption costs accounts for the 1/5-1/3 of construction costs in construction work, wherein the cutter ring number changed by hob abrasion For amount up to 80%, cutter ring loss is maximum.
The content of the invention
For problems of the prior art, the present invention provide a kind of hobboing cutter cutter ring TiAl bases multilayer hard film and Its preparation method, preparation method is simple, easy to operate, and cost is low, and it is green, without any pollutant effluents waste gas produce.
The present invention is to be achieved through the following technical solutions:
A kind of TiAl base multilayer hard films of hobboing cutter cutter ring, including be sequentially deposited to hobboing cutter cutter ring surface Cr bottoms, TiAl transition zones, TiAlN resistances to oxidation transition zone and TiAlCrCN wear-resistance thin film layers;The TiAlCrCN wear-resistance thin films layer is the center of area Nanocrystalline (Ti, Cr) (C, the N) of cubic structure and AlN Two-phase composite structure, the former is main phase.
Preferably, the TiAl transition zones are made up of Ti elements and Al elements.
Preferably, the TiAlN resistances to oxidation transition zone is made up of Ti elements, Al elements and N element.
Preferably, the TiAlCrCN wear-resistance thin films layer is made up of Ti elements, Al elements, Cr elements, C element and N element.
Preferably, the thickness of metal Cr bottoms is 300nm, and TiAl transition zones are 100nm, TiAlN resistance to oxidation transition zones Thickness is 200nm, and the thickness of TiAlCrCN wear-resistance thin film layers is 10 μm.
The preparation method of the TiAl base multilayer hard films of hobboing cutter cutter ring of the present invention, comprises the following steps:
The surface of hobboing cutter cutter ring is cleaned, then hobboing cutter cutter ring is placed on the rotating device in vacuum chamber and rotated, And plasma clean is carried out, multi-arc ion coating physical vaporous deposition then is used on hobboing cutter cutter ring surface again, is sequentially depositing Cr bottoms, TiAl transition zones, TiAlN resistances to oxidation transition zone and TiAlCrCN wear-resistance thin film layers, complete the TiAl bases of hobboing cutter cutter ring It is prepared by multilayer hard film.
Preferably, during depositing Cr bottoms using multi-arc ion coating physical gas-phase deposite method, into vacuum chamber The Ar gas that flow is 250sccm, air pressure is 1.4Pa is passed through, depositing temperature is 300 DEG C, and deposition targets are used as using Cr in deposition process Material, arc current 60A, bias voltage 16V.
Preferably, during using multi-arc ion coating physical gas-phase deposite method depositing Ti Al transition zones, to vacuum chamber Interior is passed through the Ar gas that flow is 300sccm, air pressure is 1.6Pa, and depositing temperature is 300 DEG C, in deposition process using TiAl as Deposition targets, arc current 60A, bias voltage 18V.
Preferably, the process of resistance to oxidation TiAlN ganoine thin film layers is deposited using multi-arc ion coating physical gas-phase deposite method In, N is passed through into vacuum chamber2The mixed gas of gas and Ar gas, wherein, N2The flow of gas is 380sccm, and the flow of Ar gas is 200sccm, the air pressure of mixed gas is 1.6Pa, and depositing temperature is 300 DEG C, and deposition targets are used as using TiAl alloy in deposition process Material, arc current 62A, bias voltage 19V.
Preferably, the process of wear resistant friction reducing TiAlCrCN film layers is deposited using multi-arc ion coating physical gas-phase deposite method In, N is passed through into vacuum chamber2Gas, Ar gas and CH4The mixed gas of gas, wherein, N2The flow of gas, the flow and CH of Ar gas4 The flow of gas is respectively 500sccm, 150sccm and 150sccm, and the air pressure of mixed gas is 1.3Pa, with TiAl in deposition process For alloy as deposition targets, depositing temperature is 300 DEG C, arc current 60A, bias voltage 19V;Cr is as deposition targets, arc Electric current is 40A, bias voltage 16V.
Compared with prior art, the present invention has technique effect beneficial below:
The TiAl bases multilayer hard film of hobboing cutter cutter ring of the present invention includes metal Cr bottoms, TiAl transition zones, TiAlN oxytolerants Change transition zone and TiAlCrCN wear-resistance thin film layers, wherein, pass through the adhesion of metal Cr bottoms raising film and hobboing cutter cutter ring;It is logical The antioxygenic property that TiAlN resistances to oxidation transition zone improves hobboing cutter is crossed, wear-resisting effect is played by TiAlCrCN wear-resistance thin film layers, from And effectively improve the service life of tunnel piercing cutter cutter ring.
TiAl bases multilayer hard film of the present invention in the preparation, first cleans, so to the surface of hobboing cutter cutter ring Metal Cr bottoms, TiAl transition zones, TiAlN resistance to oxidation transition zones are sequentially depositing using multi-arc ion coating physical vaporous deposition afterwards And TiAlCrCN wear-resistance thin film layers, easy to operate, cost is low, and it is green, without any pollutant effluents waste gas produce.By TiN ganoine thin films prepared by chemical vapor deposition (CVD) and physical vapour deposition (PVD) (PVD) method largely improve part Surface property, with high-wearing feature, high rigidity and less coefficient of friction.Binary ganoine thin film is in severe friction or high temperature In use, its wearability, heat resistance and high-temperature oxidation resistance etc. are not ideal enough in environment.Added on the basis of TiN ganoine thin films TiAlN, TiAlCrCN ganoine thin film that Al, Cr and C element are formed, make anti-wear performance, mechanical property and the inoxidizability of film Significantly improve.By the consistency height of projectile energy height, ganoine thin film in PVD ion film plating plated films, can use more The evaporation source of individual electric arc, improves sedimentation rate, and the transition zone that base material produces atoms permeating composition with ganoine thin film interface can improve Interface performance, internal stress is reduced, film/film-substrate binding strength is high, coating process non-environmental-pollution, it is possible to increase its service life.
Brief description of the drawings
Fig. 1 is the structural representation of hobboing cutter cutter ring described in present example.
Fig. 2 is the TiAl base multilayer hard film structural representations of hobboing cutter cutter ring described in present example.
Fig. 3 is the XRD spectra of the TiAlCrCN wearing layers described in present example.
In figure:Hobboing cutter cutter ring 1, Cr bottoms 2, TiAl transition zones 3, TiAlN resistances to oxidation transition zone 4, the resistance to wear downs of TiAlCrCN Film layer 5.
Embodiment
With reference to specific embodiment, the present invention is described in further detail, it is described be explanation of the invention and It is not to limit.
With reference to figure 1, the TiAl bases multilayer hard film of hobboing cutter cutter ring of the present invention includes being sequentially deposited to hobboing cutter knife Enclose Cr bottoms 2, TiAl transition zones 3, TiAlN resistances to oxidation transition zone 4 and the TiAlCrCN wear-resistance thin films layer 5 on 1 surface.
It should be noted that the TiAlN resistances to oxidation transition zone is made up of Ti elements, Al elements and N element;TiAlCrCN Wear-resistance thin film layer is made up of Ti elements, Al elements, Cr elements, C element and N element;The thickness of Cr bottoms is 300nm, TiAl mistakes It is 100nm to cross thickness degree, and the thickness of TiAlN resistance to oxidation transition zones is 200nm, and the thickness of TiAlCrCN wear-resistance thin film layers is 10 μ m。
The preparation method of the TiAl base multilayer hard films of hobboing cutter cutter ring of the present invention comprises the following steps:
The surface of hobboing cutter cutter ring is cleaned, then hobboing cutter cutter ring is placed on the rotating device in vacuum chamber and rotated, And plasma clean is carried out, then it is sequentially depositing again on the surface of hobboing cutter cutter ring using multi-arc ion coating physical vaporous deposition Cr bottoms, TiAl transition zones, TiAlN resistances to oxidation transition zone and TiAlCrCN wear-resistance thin film layers, complete the TiAl bases of hobboing cutter cutter ring It is prepared by multilayer hard film.
Wherein, during depositing Cr bottoms using multi-arc ion coating physical gas-phase deposite method, lead into vacuum chamber The Ar gas that inbound traffics are 250sccm, air pressure is 1.4Pa, depositing temperature is 300 DEG C, using Cr as deposition targets in deposition process, Arc current is 60A, bias voltage 16V.
During using multi-arc ion coating physical gas-phase deposite method depositing Ti Al transition zones, it is passed through into vacuum chamber The Ar gas that flow is 300sccm, air pressure is 1.6Pa, depositing temperature is 300 DEG C, using TiAl as deposition targets in deposition process, Arc current is 60A, bias voltage 18V.
During using multi-arc ion coating physical gas-phase deposite method depositing Ti AlN resistance to oxidation transition zones, to vacuum chamber Interior is passed through N2The mixed gas of gas and Ar gas, wherein, N2The flow of gas is 380sccm, and the flow of Ar gas is 200sccm, mixing The air pressure of gas is 1.6Pa, and using TiAl alloy as deposition targets in deposition process, depositing temperature is 300 DEG C, and arc current is 62A, bias voltage 19V.
Using the process of the TiAlCrCN wear-resistance thin film layers of multi-arc ion coating physical gas-phase deposite method deposition wear resistant friction reducing In, N is passed through into vacuum chamber2Gas, Ar gas and CH4The mixed gas of gas, wherein, N2The flow of gas, the flow and CH of Ar gas4 The flow of gas is respectively 500sccm, 150sccm and 150sccm, and the air pressure of mixed gas is 1.3Pa, and depositing temperature is 300 DEG C, Using TiAl alloy as deposition targets in deposition process, arc current 60A, bias voltage 19V;Cr is as deposition targets, arc Electric current is 40A, bias voltage 16V.
The rotating device includes pivoted frame, support plate, support bar and motor, wherein, the output shaft of motor is connected with pivoted frame Connect, support plate is fixed on pivoted frame by support bar, and hobboing cutter cutter ring is positioned in support plate.
Fig. 3 is the XRD spectra of the TiAlCrCN wear-resistance thin film layers of wear resistant friction reducing, and as can be known from Fig. 3, wear-resistance thin film layer is face Nanocrystalline (Ti, Cr) (C, the N) of heart cubic structure and nanocrystalline Al N Two-phase composite structure, the former is main phase.

Claims (10)

1. the TiAl base multilayer hard films of a kind of hobboing cutter cutter ring, it is characterised in that including being sequentially deposited to hobboing cutter cutter ring surface Cr bottoms, TiAl transition zones, TiAlN resistances to oxidation transition zone and TiAlCrCN wear-resistance thin film layers;The resistance to wear downs of TiAlCrCN Film layer is nanocrystalline (Ti, Cr) (C, the N) of face-centred cubic structure and AlN Two-phase composite structure, and the former is main phase.
2. the TiAl base multilayer hard films of hobboing cutter cutter ring according to claim 1, it is characterised in that the TiAl transition Layer is made up of Ti elements and Al elements.
3. the TiAl base multilayer hard films of hobboing cutter cutter ring according to claim 1, it is characterised in that the TiAlN is resistance to Oxide buffer layer is made up of Ti elements, Al elements and N element.
4. the TiAl base multilayer hard films of hobboing cutter cutter ring according to claim 1, it is characterised in that the TiAlCrCN Wear-resistance thin film layer is made up of Ti elements, Al elements, Cr elements, C element and N element.
5. the TiAl base multilayer hard films of hobboing cutter cutter ring according to claim 1, it is characterised in that metal Cr bottoms Thickness is 300nm, and TiAl transition zones are 100nm, and the thickness of TiAlN resistance to oxidation transition zones is 200nm, TiAlCrCN wear-resistance thin films The thickness of layer is 10 μm.
A kind of 6. preparation method of the TiAl base multilayer hard films of the hobboing cutter cutter ring described in claim 1, it is characterised in that bag Include following steps:
The surface of hobboing cutter cutter ring is cleaned, then hobboing cutter cutter ring is placed on the rotating device in vacuum chamber and rotated, is gone forward side by side Row plasma clean, multi-arc ion coating physical vaporous deposition then is used on hobboing cutter cutter ring surface again, is sequentially depositing Cr bottoms Layer, TiAl transition zones, TiAlN resistances to oxidation transition zone and TiAlCrCN wear-resistance thin film layers, complete TiAl Quito layer of hobboing cutter cutter ring It is prepared by ganoine thin film.
7. the preparation method of the TiAl base multilayer hard films of hobboing cutter cutter ring according to claim 6, it is characterised in that adopt With multi-arc ion coating physical gas-phase deposite method deposit Cr bottoms during, be passed through into vacuum chamber flow for 250sccm, Air pressure is 1.4Pa Ar gas, and depositing temperature is 300 DEG C, using Cr as deposition targets in deposition process, arc current 60A, and biasing Voltage is 16V.
8. the preparation method of the TiAl base multilayer hard films of hobboing cutter cutter ring according to claim 6, it is characterised in that adopt During with multi-arc ion coating physical gas-phase deposite method depositing Ti Al transition zones, into vacuum chamber being passed through flow is 300sccm, the Ar gas that air pressure is 1.6Pa, depositing temperature is 300 DEG C, using TiAl as deposition targets in deposition process, arc current For 60A, bias voltage 18V.
9. the preparation method of the TiAl base multilayer hard films of hobboing cutter cutter ring according to claim 6, it is characterised in that adopt During depositing resistance to oxidation TiAlN ganoine thin film layers with multi-arc ion coating physical gas-phase deposite method, lead into vacuum chamber Enter N2The mixed gas of gas and Ar gas, wherein, N2The flow of gas is 380sccm, and the flow of Ar gas is 200sccm, mixed gas Air pressure is 1.6Pa, and depositing temperature is 300 DEG C, using TiAl alloy as deposition targets in deposition process, arc current 62A, and biasing Voltage 19V.
10. the preparation method of the TiAl base multilayer hard films of hobboing cutter cutter ring according to claim 6, it is characterised in that During depositing wear resistant friction reducing TiAlCrCN film layers using multi-arc ion coating physical gas-phase deposite method, into vacuum chamber It is passed through N2Gas, Ar gas and CH4The mixed gas of gas, wherein, N2The flow of gas, the flow and CH of Ar gas4The flow of gas is respectively 500sccm, 150sccm and 150sccm, the air pressure of mixed gas are 1.3Pa, and deposition targets are used as using TiAl alloy in deposition process Material, depositing temperature are 300 DEG C, arc current 60A, bias voltage 19V;Cr is as deposition targets, arc current 40A, biasing Voltage is 16V.
CN201710587159.1A 2017-07-18 2017-07-18 A kind of TiAl base multilayer hard films of hobboing cutter cutter ring and preparation method thereof Pending CN107365964A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108265271A (en) * 2018-01-18 2018-07-10 精研(东莞)科技发展有限公司 A kind of method that physical vaporous deposition makes blue film on product
CN113403582A (en) * 2021-05-10 2021-09-17 华电电力科学研究院有限公司 Nanocrystalline multilayer hard film resistant to solid particle erosion and used for steam turbine blade and preparation method thereof
CN115181945A (en) * 2021-04-01 2022-10-14 复盛应用科技股份有限公司 Method for coating film on golf club head

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101720365A (en) * 2007-05-16 2010-06-02 奥尔利康贸易股份公司(特吕巴赫) The cutting tool of band coating
CN103572289A (en) * 2012-08-07 2014-02-12 现代自动车株式会社 Multi-layer mold coating
CN104894512A (en) * 2015-06-24 2015-09-09 洛阳理工学院 Low-friction-coefficient CrTiAlCN abrasion-resistant coating and preparation method thereof
CN105971617A (en) * 2016-05-12 2016-09-28 西安热工研究院有限公司 Multi-layer film of tool ring of tunnel boring machine and preparation method thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101720365A (en) * 2007-05-16 2010-06-02 奥尔利康贸易股份公司(特吕巴赫) The cutting tool of band coating
CN103572289A (en) * 2012-08-07 2014-02-12 现代自动车株式会社 Multi-layer mold coating
CN104894512A (en) * 2015-06-24 2015-09-09 洛阳理工学院 Low-friction-coefficient CrTiAlCN abrasion-resistant coating and preparation method thereof
CN105971617A (en) * 2016-05-12 2016-09-28 西安热工研究院有限公司 Multi-layer film of tool ring of tunnel boring machine and preparation method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108265271A (en) * 2018-01-18 2018-07-10 精研(东莞)科技发展有限公司 A kind of method that physical vaporous deposition makes blue film on product
CN115181945A (en) * 2021-04-01 2022-10-14 复盛应用科技股份有限公司 Method for coating film on golf club head
CN113403582A (en) * 2021-05-10 2021-09-17 华电电力科学研究院有限公司 Nanocrystalline multilayer hard film resistant to solid particle erosion and used for steam turbine blade and preparation method thereof

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