CN107338414A - Conduction, anticorrosive, wear-resistant, the preparation method of high-hardness diamond-like coating - Google Patents
Conduction, anticorrosive, wear-resistant, the preparation method of high-hardness diamond-like coating Download PDFInfo
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- CN107338414A CN107338414A CN201610278839.0A CN201610278839A CN107338414A CN 107338414 A CN107338414 A CN 107338414A CN 201610278839 A CN201610278839 A CN 201610278839A CN 107338414 A CN107338414 A CN 107338414A
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- Prior art keywords
- anticorrosive
- resistant
- wear
- preparation
- high rigidity
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of conductive, it is anticorrosive, it is wear-resistant, the carbon-based thin preparation method of high rigidity, heated with vacuum chamber heating tube, ion gun carries out ionization to argon gas, the base material of clamping on vacuum chamber pivoted frame is cleaned and activated, after vacuum pressure to be achieved, magnetic control target deposition titanium, acetylene ionization is carried out with ion gun again, is cooled down in last inert gas.Thin film conductive prepared by the present invention, anticorrosive, wear-resistant, the performance such as high rigidity, meet numerous sector application demands such as semiconductor, mobile phone, chemical industry electrolysis, electrical discharge machining.
Description
Technical field
The invention belongs to thin-film material technical field, it is conductive to be related to a kind of collection, anticorrosive, wear-resistant, high rigidity performance in
The preparation method of the carbon-base film of one.
Background technology
Material corrosion refers to material from environmental effect and occurs to destroy or go bad so as to lose the phenomenon of original function.Corrosion
Spreading all trades and professions, wherein electrolytic etching is particularly acute, and unavoidably, and anticorrosion cost is larger, serious waste of resources, work
Part service life serious curtailment.DLC film is mainly by the sp3 carbon atoms of diamond lattic structure and the carbon of sp 2 of graphite-structure
Atom mutually mixes and formed, and has corrosion-resistant, wear-resistant, high rigidity and numerous excellent performances such as chemical stability is good,
It is practically insoluble in any acid, alkali and organic solution.The infiltration of oxygen and solution can effectively be stopped, so as to protect base material.It is but thin
Itself there is performance deficiency in film, this carbon-base film resistance is very big, non-conductive, is used in many industries and limitation be present.Metallic element
Easy conductive, wherein Ti metals have generally been used in film applications, can effectively more if Ti films are combined with carbon-base film
The defects of complementary class diamond, then obtain collection conduction, anticorrosive, wear-resistant, numerous premium properties such as high rigidity are in one
Protection film.
Ion gun is as generator, ionization hydrocarbon gas molecule.High with ionization level, rate of film build is fast, and cost is low.Ionization
Ionic hydrocarbon in the presence of back bias voltage, can DLC film be formed on base material.Magnetic control target makees the generator of Ti metals
The film of formation is finer and smoother, has nanoscale, is more easy to combine with ionic hydrocarbon, and then can increase the conduction of diamond-like coating
Property.
The content of the invention
It is anticorrosive it is an object of the invention to provide conduction, wear-resistant, the preparation method of high rigidity carbon-base film.
Realizing the object of the invention technical solution is：It is a kind of conductive, it is anticorrosive, it is wear-resistant, high rigidity carbon-base film
Preparation method, pivoted frame suspension base material is heated with K-type heater, magnetic control target makees generator and deposits certain thickness titanium transition
Layer, then start ion gun simultaneously, prepare carbon-base film, wherein Doped with Titanium, comprise the following steps that；
The first step：Substrate surface cleans；
Second step：Base material is installed on vacuum equipment pivoted frame；
3rd step：Vacuum equipment is evacuated and heated；
4th step：Ion gun is cleaned and activated to substrate surface；
5th step：In substrate surface titanium deposition intermediate metal；
6th step：The deposition doping titanium DLC film on titanium transition zone；
7th step：Base material after film forming is cooled down.
Advantages of the present invention is as follows：
(1) magnetic control target equipment is selected, amount of droplets significantly reduces, and the quality and performance of film obtain largely
Lifting；
(2) carry out the making of carbon-base film with ion gun, without bulky grain in film layer, easy control of temperature, be more easy to realize nanoscale
Coating；
(3) film prepared has numerous premium properties, such as conductive, anticorrosive, it is wear-resistant, high rigidity, the performance such as conduction,
Meet the application demand of numerous industries such as semiconductor, mobile phone, chemical industry electrolysis, electrical discharge machining.
Brief description of the drawings
Accompanying drawing 1 is that embodiment 1 prepares film, influence of the different duty to resistance；
Accompanying drawing 2 is that embodiment 1 prepares film, influence of the different duty to resistance to corrosion；
Accompanying drawing 3 is that embodiment 2 prepares film, influence of the different magnetic control target currents to film resistor；
Accompanying drawing 4 is that embodiment 2 prepares film, the influence of different magnetic control target current confrontation corrosive natures.
Embodiment：
The invention will be further described below in conjunction with the accompanying drawings.
Embodiment 1；
The first step：Base material is ultrasonically treated cleaning 20min in special solution successively, most adds afterwards through deionized water, alcohol, hair-dryer
Heat drying preserves；
Second step：Base material is installed on vacuum equipment pivoted frame, regulation rotating speed to 2.5r/min；
3rd step：Vacuum equipment door is closed, is vacuumized；Treat that vacuum chamber pressure reaches 5x10-2Pa, open heater heating；
4th step：Treat that vacuum chamber pressure reaches 1X10-3Pa, temperature is 50-100 degree, is passed through argon gas, ion gun ionization indifferent gas
Body, it is 10-20A to carry out Ion Cleaning and activation, ion ource electric current to substrate surface；
5th step：Ion gun is closed, opens bias 300V, dutycycle 20% opens magnetic control target, and magnetic control target current is 2-80A, titanium
Transition thickness 200-300nm；
6th step：Ion gun is opened, ion ource electric current 30-40A, acetylene gas is passed through, after hydrocarbon gas ionization, is coated in base material table
Face, the thickness of DLC doping titanium film is 1-2 μm；
7th step：Bias is closed, ion gun, magnetic control target, is passed through inert gas, until temperature drops to 40 degree, enabling is carried out and takes base
Material；
8th step：The repetition first step, second step, the 3rd step, the 4th step, the 6th step, the 7th step, the 5th step dutycycle are set to
50%, 80%；
Understood by Fig. 1, Fig. 2, film conductivity and anticorrosive different, the selection timeliness of dutycycle 20% prepared by different duty
Fruit is best.
Embodiment 2
The first step：Base material is ultrasonically treated cleaning 20min in special solution successively, most adds afterwards through deionized water, alcohol, hair-dryer
Heat drying preserves；
Second step：Base material is installed on vacuum equipment pivoted frame, regulation rotating speed to 2.5r/min；
3rd step：Vacuum equipment door is closed, vacuumizes, treats vacuum chamber pressure 5x10-2Pa, opens heater heating；
4th step：Treat that vacuum chamber pressure reaches 1X10-3Pa, temperature is 50-100 degree, is passed through argon gas, ion gun ionization indifferent gas
Body, substrate surface is cleaned and activated, electric current 10-20A；
5th step：Ion gun is closed, opens bias 300V, dutycycle 20% opens magnetic control target, and magnetic control target current is 10A, titanium mistake
Cross thickness degree 200-300nm；
6th step：Ion gun is opened, ion ource electric current 30-40A, is passed through acetylene gas, after hydrocarbon gas ionization, deposited base material table
Face, the thickness of diamond-like doping titanium film is 1-2 μm；
7th step：Bias is closed, ion gun, magnetic control target, is passed through inert gas, until temperature drops to 40 degree, enabling is carried out and takes base
Material；
8th step：Repeat the first step, second step, the 3rd step, the 4th step, the 6th step, the 7th step, the 5th step magnetic control target current difference
It is set to 40A, 70A.
Understood by Fig. 3, Fig. 4：Film conductivity and anticorrosive different, selection magnetic control target prepared by different magnetic control target currents
Effect is best during electric current 10A.
Claims (6)
1. a kind of conductive, anticorrosive, wear-resistant, the preparation method of high rigidity carbon-base film, it is characterised in that specifically include step
It is as follows：
The first step：Substrate surface cleans；
Second step：Base material is installed on vacuum equipment pivoted frame；
3rd step：Vacuum equipment is evacuated and heated；
4th step：Ion gun is cleaned and activated to substrate surface；
5th step：In substrate surface titanium deposition intermediate metal；
6th step：The deposition doping titanium DLC film on titanium transition zone.
2. the conduction as described in claim 1, anticorrosive, wear-resistant, the preparation method of high rigidity carbon-base film, its feature exists
In in the first step, pretreatment refers to base material being ultrasonically treated cleaning 20min in special solution successively.
3. the conduction as described in claim 1, anticorrosive, wear-resistant, the preparation method of high rigidity carbon-base film, its feature exists
In in the 4th step, using ion gun ionization argon gas to base material cleaning and activation 30min.
4. the conduction as described in claim 1, anticorrosive, wear-resistant, the preparation method of high rigidity carbon-base film, its feature exists
In temperature is 50-100 degree in the 4th step.
5. the conduction as described in claim 1, anticorrosive, wear-resistant, the preparation method of high rigidity carbon-base film, its feature exists
In in the 5th step, with magnetic control target deposition titanium, magnetic control target current is 2-60A, and ti interlayer thickness is 200-300nm.
6. the conduction as described in claim 1, anticorrosive, wear-resistant, the preparation method of high rigidity carbon-base film, its feature exists
In in the 6th step, using ion gun ionization acetylene, electric current 30-40A, titanium doped DLC carbon-base film is 1-2 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610278839.0A CN107338414A (en) | 2016-05-03 | 2016-05-03 | Conduction, anticorrosive, wear-resistant, the preparation method of high-hardness diamond-like coating |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610278839.0A CN107338414A (en) | 2016-05-03 | 2016-05-03 | Conduction, anticorrosive, wear-resistant, the preparation method of high-hardness diamond-like coating |
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| CN107338414A true CN107338414A (en) | 2017-11-10 |
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| CN201610278839.0A Pending CN107338414A (en) | 2016-05-03 | 2016-05-03 | Conduction, anticorrosive, wear-resistant, the preparation method of high-hardness diamond-like coating |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108330445A (en) * | 2018-03-09 | 2018-07-27 | 中国地质大学（北京） | A kind of method of the diamond-film-like of punching needle surface multi-arc ion coating Doped with Titanium |
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| CN102337497A (en) * | 2010-07-22 | 2012-02-01 | 中国科学院兰州化学物理研究所 | Method for preparing multi-element doped carbon-based nano composite film integrating functions of antiwear and lubrication |
| CN102965618A (en) * | 2012-12-07 | 2013-03-13 | 中国地质大学（北京） | Preparation method of metal doped hydrogen-free diamond-like carbon film |
| JP5418917B2 (en) * | 2008-03-28 | 2014-02-19 | 日立金属株式会社 | Manufacturing method of surface coated parts with excellent film adhesion |
| CN103866251A (en) * | 2012-12-18 | 2014-06-18 | 中国科学院兰州化学物理研究所 | Method for batch-deposition of diamond-like film on plunger surface |
| CN104894513A (en) * | 2015-04-13 | 2015-09-09 | 江苏惠丰润滑材料股份有限公司 | Silicon-doped diamond film on surface of spacecraft moving part and method for combining to surface of spacecraft moving part |
| CN105369199A (en) * | 2015-10-15 | 2016-03-02 | 南京理工大学 | Method for preparing frictional wear resisting and corrosion resisting carbon-based film |
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2016
- 2016-05-03 CN CN201610278839.0A patent/CN107338414A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP5418917B2 (en) * | 2008-03-28 | 2014-02-19 | 日立金属株式会社 | Manufacturing method of surface coated parts with excellent film adhesion |
| CN102337497A (en) * | 2010-07-22 | 2012-02-01 | 中国科学院兰州化学物理研究所 | Method for preparing multi-element doped carbon-based nano composite film integrating functions of antiwear and lubrication |
| CN102965618A (en) * | 2012-12-07 | 2013-03-13 | 中国地质大学（北京） | Preparation method of metal doped hydrogen-free diamond-like carbon film |
| CN103866251A (en) * | 2012-12-18 | 2014-06-18 | 中国科学院兰州化学物理研究所 | Method for batch-deposition of diamond-like film on plunger surface |
| CN104894513A (en) * | 2015-04-13 | 2015-09-09 | 江苏惠丰润滑材料股份有限公司 | Silicon-doped diamond film on surface of spacecraft moving part and method for combining to surface of spacecraft moving part |
| CN105369199A (en) * | 2015-10-15 | 2016-03-02 | 南京理工大学 | Method for preparing frictional wear resisting and corrosion resisting carbon-based film |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108330445A (en) * | 2018-03-09 | 2018-07-27 | 中国地质大学（北京） | A kind of method of the diamond-film-like of punching needle surface multi-arc ion coating Doped with Titanium |
| CN108330445B (en) * | 2018-03-09 | 2020-03-31 | 中国地质大学（北京） | Method for plating titanium-doped diamond-like film on surface of punching needle head through multi-arc ions |
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Effective date of registration: 20191113 Address after: 116600 Liaoning Dalian Development Zone bonded area storage ID-39 OBO Industrial Park Jintai Zheng Xin Technology Co., Ltd. Applicant after: Dalian Jintai New Technology Co., Ltd. Address before: 116600 No. IC-45, China Iron Industry Zone, Dalian Free Trade Zone, Liaoning Applicant before: DALIAN JINTAI SURFACE ENGINEERING TECHNOLOGY CO., LTD. |
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Application publication date: 20171110 |