CN107329296A - Liquid crystal panel dim spot method for repairing and mending and array base-plate structure - Google Patents

Liquid crystal panel dim spot method for repairing and mending and array base-plate structure Download PDF

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Publication number
CN107329296A
CN107329296A CN201710745222.XA CN201710745222A CN107329296A CN 107329296 A CN107329296 A CN 107329296A CN 201710745222 A CN201710745222 A CN 201710745222A CN 107329296 A CN107329296 A CN 107329296A
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electrode
liquid crystal
array base
crystal panel
thin film
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CN107329296B (en
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刘娜
徐向阳
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306Details
    • G02F1/1309Repairing; Testing
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136259Repairing; Defects
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/1368Active matrix addressed cells in which the switching element is a three-electrode device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • H01L27/1244Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits for preventing breakage, peeling or short circuiting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1259Multistep manufacturing methods
    • H01L27/1296Multistep manufacturing methods adapted to increase the uniformity of device parameters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136259Repairing; Defects
    • G02F1/136263Line defects

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
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  • Crystallography & Structural Chemistry (AREA)
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  • Condensed Matter Physics & Semiconductors (AREA)
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Abstract

The present invention provides a kind of liquid crystal panel dim spot method for repairing and mending and array base-plate structure.The liquid crystal panel dim spot method for repairing and mending is after the display abnormal pixel of liquid crystal panel is detected, region where first corresponding to display abnormal pixel on array base palte cuts off the connection of the source electrode and data wire of corresponding thin film transistor (TFT), corresponding pixel electrode and middle public electrode wire are connected by thin film-forming method again, because the middle public electrode wire is equal with the current potential of color membrane substrates side public electrode, voltage difference of the array base palte and color membrane substrates of liquid crystal panel between display abnormal pixel region is 0 so that dark-state is presented in abnormal pixel;Due to pixel electrode with middle public electrode wire positioned at same layer, corresponding pixel electrode is connected with thin film-forming method and realizes that dim spotization is repaired with middle public electrode wire, compared to existing punching repair mode, process more simplifies, also it will not be disturbed by color blocking layer in COA type liquid crystal panels, it is possible to increase the success rate of mending to showing abnormal pixel.

Description

Liquid crystal panel dim spot method for repairing and mending and array base-plate structure
Technical field
The present invention relates to display technology field, more particularly to a kind of liquid crystal panel dim spot method for repairing and mending and array base palte knot Structure.
Background technology
Thin Film Transistor-LCD (Thin Film Transistor Liquid Crystal Display, TFT- LCD TV, hand) are widely used in advantages such as its large scale, the flexible, low costs of highly integrated, powerful, technique The fields such as mechanical, electrical brain, become the main flow of flat-panel monitor.
Liquid crystal display panel, abbreviation liquid crystal panel is TFT-LCD critical piece, generally by a color membrane substrates (Color Filter, CF), a thin-film transistor array base-plate (Thin Film Transistor Array Substrate, TFT Array Substrate) and a filling liquid crystal layer (Liquid Crystal Layer) between two substrates constituted, its work It is to control the rotation of the liquid crystal molecule of liquid crystal layer by applying driving voltage on two panels glass substrate as principle, by backlight mould The light of group reflects generation picture.
The effective display area domain of liquid crystal panel is combined by multiple pel arrays, and non-display area is mainly by peripheral gold Category wiring is constituted.Referring to Fig. 1, the array base palte of available liquid crystal panel generally comprises the multiple pixel electrodes arranged in array 100th, correspondingly per one-row pixels electrode 100, the scan line 200 extended transversely of setting, each row pixel electrode 100 of correspondence are set The data wire 300 extended longitudinally put, the array base palte side public electrode wire correspondingly set per one-row pixels electrode 100 (Com) the 400 and thin film transistor (TFT) T ' that sets of each pixel electrode 100 of correspondence.Wherein, scan line 200 is used to provide switch Scanning signal, array base palte side public electrode wire 400 is used for the reference voltage for providing pixel voltage, and data wire 300 is used to provide Data-signal;Thin film transistor (TFT) T ' grid connects corresponding scan line 200, and source electrode connects corresponding data wire 300, drain electrode and connected Connect corresponding pixel electrode 100;Array base palte side public electrode wire 400 is arranged at pixel electrode below 100.
In the production process of array base palte, because production process is complicated, influenceed by production technology and power house environment, can It can cause situations such as pixel has foreign matter or broken film, can so occur the display that human eye is easier to identify in display picture Defect, has a strong impact on image display quality.Existing recovery technique is typically to do dim spotization processing to the abnormal pixel of display to come Realize simple repair.As shown in figure 1, traditional liquid crystal panel dim spotization repairs means, it is that first cut-out shows abnormal pixel at Z Corresponding thin film transistor (TFT) T ' source electrode and the connection of data wire 300, then connect pixel electrode by way of being punched at B 100 and array base palte side public electrode wire 400, it is 0 to make voltage difference of the upper and lower base plate between display abnormal pixel region, So that dark-state is presented in display abnormal pixel.This traditional restorative procedure success rate is relatively low, and battle array is arranged on especially for color film COA (Color Filter On Array) type product of row substrate-side, because color blocking layer is covered in the lower section of pixel electrode 100, as Plain electrode 100 and the distance between array base palte side public electrode wire 400 are larger, easily because the interference of color blocking layer causes pixel Electrode 100 and the connection failure of array base palte side public electrode wire 400, so as to cause repairing failure.
The content of the invention
It is an object of the invention to provide a kind of liquid crystal panel dim spot method for repairing and mending, it is possible to increase to display abnormal pixel Success rate of mending, and simplify reparing process.
Another object of the present invention is to provide a kind of array base-plate structure, it is easy to the display abnormal pixel of liquid crystal panel Carry out dim spot repairing.
To achieve the above object, present invention firstly provides a kind of liquid crystal panel dim spot method for repairing and mending, comprise the following steps:
Step S1, offer liquid crystal panel;
The liquid crystal panel includes array base palte and color membrane substrates;The array base palte is included in the multiple of array arrangement Pixel electrode, the multi-strip scanning line extended transversely correspondingly set per one-row pixels electrode, each row pixel electrode of correspondence are set The a plurality of data lines extended longitudinally put, a plurality of array base palte side public electrode wire correspondingly set per one-row pixels electrode, Multiple thin film transistor (TFT)s that each pixel electrode of correspondence is set and covered above each data wire corresponding data line and with picture Plain electrode is located at the middle public electrode wire of same layer;Color membrane substrates side public electrode is provided with the color membrane substrates;It is described Middle public electrode wire is equal with the current potential of color membrane substrates side public electrode;
If n, m are positive integer, the grid connection nth bar scan line of line n m row thin film transistor (TFT)s, source electrode connection m Data line, drain electrode connection line n m row pixel electrodes;
Step S2, the display abnormal pixel for detecting liquid crystal panel;
Step S3, the corresponding thin film transistor (TFT) of region cut-out first corresponded on array base palte where display abnormal pixel Source electrode and data wire connection, then corresponding pixel electrode and middle public electrode wire are connected by thin film-forming method.
The step S3 cuts off the connection of the source electrode and data wire of corresponding thin film transistor (TFT) by radium-shine cutting technique.
The step S3 connects corresponding pixel electrode and middle public electrode using laser repair process deposits film forming Line;And the material of the material and pixel electrode of film forming and middle public electrode wire is identical.
The material of the pixel electrode and middle public electrode wire is ITO.
The grid of the scan line, array base palte side public electrode wire and thin film transistor (TFT) is located on the first metal layer, institute The source electrode for stating data wire and thin film transistor (TFT) is located on second metal layer with drain electrode.
The first metal layer and the material of second metal layer are one or more of stacking groups in copper, aluminium, molybdenum, titanium Close.
The present invention also provides a kind of array base-plate structure, including multiple pixel electrodes for being arranged in array, correspondence are each What what the multi-strip scanning line extended transversely that row pixel electrode is set, each row pixel electrode of correspondence were set extended longitudinally is more Data line, a plurality of array base palte side public electrode wire correspondingly set per one-row pixels electrode, each pixel electrode of correspondence are set Multiple thin film transistor (TFT)s for putting and corresponding data line is covered above each data wire and is located at same layer with pixel electrode Middle public electrode wire;
If n, m are positive integer, the grid connection nth bar scan line of line n m row thin film transistor (TFT)s, source electrode connection m Data line, drain electrode connection line n m row pixel electrodes.
The material of the pixel electrode and middle public electrode wire is ITO.
The grid of the scan line, array base palte side public electrode wire and thin film transistor (TFT) is located on the first metal layer, institute The source electrode for stating data wire and thin film transistor (TFT) is located on second metal layer with drain electrode.
The first metal layer and the material of second metal layer are one or more of stacking groups in copper, aluminium, molybdenum, titanium Close.
Beneficial effects of the present invention:A kind of liquid crystal panel dim spot method for repairing and mending that the present invention is provided, is detecting liquid crystal After the display abnormal pixel of panel, the region where display abnormal pixel is first corresponded on array base palte cuts off corresponding film The connection of the source electrode and data wire of transistor, then corresponding pixel electrode and middle public electrode wire are connected by thin film-forming method, Because the middle public electrode wire is equal with the current potential of color membrane substrates side public electrode, the array base palte of liquid crystal panel and color film Voltage difference of the substrate between display abnormal pixel region is 0 so that dark-state is presented in abnormal pixel;Due to pixel electricity Pole is located at same layer with middle public electrode wire, and connect corresponding pixel electrode with thin film-forming method realizes with middle public electrode wire Dim spotization is repaired, compared to existing punching repair mode, and process more simplifies, also will not be by color blocking layer in COA type liquid crystal panels Interference, it is possible to increase to show abnormal pixel success rate of mending.A kind of array base-plate structure that the present invention is provided, each The middle public electrode wire for covering corresponding data line and being located at same layer with pixel electrode is provided with above data wire, works as liquid crystal surface When abnormal pixel occurs showing in plate, corresponding pixel electrode can be connected by thin film-forming method and middle public electrode wire realization is dark Reveal repairing, it is easy to operate.
Brief description of the drawings
In order to be able to be further understood that the feature and technology contents of the present invention, refer to below in connection with the detailed of the present invention Illustrate and accompanying drawing, however accompanying drawing only provide with reference to and explanation use, not for being any limitation as to the present invention.
In accompanying drawing,
Fig. 1 is the schematic diagram that traditional restorative procedure carries out dim spot reparation to liquid crystal panel;
Fig. 2 is the flow chart of the liquid crystal panel dim spot method for repairing and mending of the present invention;
Fig. 3 is the cross-sectional view of liquid crystal panel in liquid crystal panel dim spot method for repairing and mending of the invention;
Fig. 4 is the schematic diagram of the array base-plate structure of the present invention;
Fig. 5 is the step S3 of the liquid crystal panel dim spot method for repairing and mending of present invention schematic diagram.
Embodiment
Further to illustrate the technological means and its effect of the invention taken, below in conjunction with being preferable to carry out for the present invention Example and its accompanying drawing are described in detail.
Referring to Fig. 2, present invention firstly provides a kind of liquid crystal panel dim spot method for repairing and mending, comprising the following steps:
Step S1, offer liquid crystal panel LCD.
The liquid crystal panel is as shown in figure 3, including array base palte A and color membrane substrates C.
As shown in figure 4, it is in multiple pixel electrodes 1 of array arrangement, correspondingly per one-row pixels that the array base palte A, which includes, What what the multi-strip scanning line 2 extended transversely that electrode 1 is set, each row pixel electrode 1 of correspondence were set extended longitudinally is a plurality of Data wire 3, a plurality of array base palte side public electrode wire 4 correspondingly set per one-row pixels electrode 1, each pixel electrode 1 of correspondence Multiple thin film transistor (TFT) T for setting and cover corresponding data line 3 in the top of each data wire 3 and be located at pixel electrode 1 same One layer of middle public electrode wire 6.If n, m are positive integer, line n m row thin film transistor (TFT)s T grid G connection nth bar is swept Line 2 (scan line 2 sorts from top to bottom) is retouched, source S connection m data lines 3 (data wire 3 sorts from left to right), drain D connect Line n m row pixel electrode 1 is connect, the row thin film transistor (TFT) T of such as the 1st row the 1st grid G connects the 1st article of scan line 2, source S Connect the 1st data line 3, the drain D connection row pixel electrode 1 of the 1st row the 1st;The row thin film transistor (TFT) T of 1st row the 2nd grid G connects The 1st article of scan line 2 is connect, source S connects the 2nd data line 3, the drain D connection row pixel electrode 1 of the 1st row the 2nd;2nd row the 1st is arranged Thin film transistor (TFT) T grid G connects the 2nd article of scan line 2, and source S connects the 1st data line 3, drain D and connects the 2nd row the 1st row Pixel electrode 1;The rest may be inferred.
Specifically, the grid G of the scan line 2, array base palte side public electrode wire 4 and thin film transistor (TFT) T is located on One metal level;The source S of the data wire 3 and thin film transistor (TFT) T is located on second metal layer with drain D.First metal Layer and the material of second metal layer are one or more of stacked combinations in copper (Cu), aluminium (Al), molybdenum (Mo), titanium (Ti).
The pixel electrode 1 and the middle preferred indium tin oxide films (Indium of the other material of place layer of public electrode wire 6 Tin Oxide, ITO).
With reference to Fig. 3 and Fig. 4, color membrane substrates side public electrode 8, the middle common electrical are provided with the color membrane substrates C Polar curve 6 is equal with the current potential of color membrane substrates C sides public electrode 8, so positioned at the middle public electrode wire 6 and color membrane substrates side Dark-state can be presented in liquid crystal between public electrode 8, play a part of being in the light to the region of data wire 3.
Step S2, the display abnormal pixel for detecting liquid crystal panel LCD.
Step S3, as shown in E in Fig. 5, first pass through radium-shine cutting technique on array base palte A correspond to display extraordinary image Region where element cuts off corresponding thin film transistor (TFT) T source S and the connection of data wire 3;For another example in Fig. 5 shown in F, utilize ITO is deposited film forming to connect corresponding pixel electrode 1 and middle public electrode by vapour deposition principle by laser repair technique Line 6, so as to show that the pixel electrode 1 corresponding to abnormal pixel is equal with the current potential of middle public electrode wire 6.So, liquid crystal surface Voltage differences of the plate LCD array base palte A and color membrane substrates C between display abnormal pixel region is 0 so that abnormal pixel Dark-state is presented, that is, has reached the effect of dim spotization repairing.
Corresponding pixel is connected with thin film-forming method positioned at same layer with middle public electrode wire 6 due to the pixel electrode 1 Electrode 1 realizes that dim spotization is repaired with middle public electrode wire 6, compared to existing punching repair mode, and process more simplifies, also not It can be disturbed by color blocking layer in COA type liquid crystal panels, it is possible to increase the success rate of mending to showing abnormal pixel.
Referring to Fig. 4, the present invention also provides a kind of array base-plate structure, including the multiple pixel electrodes arranged in array 1st, each setting of row pixel electrode 1 of the multi-strip scanning line 2 extended transversely, correspondence correspondingly set per one-row pixels electrode 1 It is a plurality of data lines 3 that extends longitudinally, a plurality of array base palte side public electrode wire 4 correspondingly set per one-row pixels electrode 1, right Answer multiple thin film transistor (TFT) T that each pixel electrode 1 is set and in each top of data wire 3 cover corresponding data line 3 and with Pixel electrode 1 is located at the middle public electrode wire 6 of same layer.If n, m are positive integer, line n m row thin film transistor (TFT)s T's Grid G connection nth bar scan line 2 (scan line 2 sorts from top to bottom), (data wire 3 is certainly left for source S connection m data lines 3 To right sequence), drain D connection line n m row pixel electrode 1, the row thin film transistor (TFT) T of such as the 1st row the 1st grid G connects the 1 scan line 2, source S connects the 1st data line 3, the drain D connection row pixel electrode 1 of the 1st row the 1st;The row film of 1st row the 2nd Transistor T grid G connects the 1st article of scan line 2, and source S connects the 2nd data line 3, the drain D connection row pixel of the 1st row the 2nd Electrode 1;The row thin film transistor (TFT) T of 2nd row the 1st grid G connects the 2nd article of scan line 2, and source S connects the 1st data line 3, drain electrode The D connection row pixel electrodes 1 of the 2nd row the 1st;The rest may be inferred.
Specifically, the grid G of the scan line 2, array base palte side public electrode wire 4 and thin film transistor (TFT) T is located on One metal level;The source S of the data wire 3 and thin film transistor (TFT) T is located on second metal layer with drain D.First metal Layer and the material of second metal layer are one or more of stacked combinations in Cu, Al, Mo, Ti.
The pixel electrode 1 and the preferred ITO of the middle public electrode wire other material of 6 place layer.
The array base-plate structure of the present invention is applied to liquid crystal panel, and to middle public electrode wire 6 and liquid crystal panel Color membrane substrates side public electrode applies equal current potential, then when abnormal pixel occurs showing in liquid crystal panel, just can pass through The above method connects corresponding pixel electrode 1 using thin film-forming method and middle public electrode wire 6 realizes that dim spotization is repaired, it is easy to grasp Make, success rate of mending is higher.
In summary, liquid crystal panel dim spot method for repairing and mending of the invention, is detecting the display extraordinary image of liquid crystal panel After element, the region where display abnormal pixel is first corresponded on array base palte cuts off the source electrode and number of corresponding thin film transistor (TFT) Corresponding pixel electrode and middle public electrode wire are connected according to the connection of line, then by thin film-forming method, because the centre is public Electrode wires are equal with the current potential of color membrane substrates side public electrode, and array base palte and the color membrane substrates of liquid crystal panel are showing extraordinary image Voltage difference between plain region is 0 so that dark-state is presented in abnormal pixel;Due to the pixel electrode and middle public electrode Line is located at same layer, and connect corresponding pixel electrode with thin film-forming method realizes that dim spotization is repaired with middle public electrode wire, compares Existing punching repair mode, process more simplifies, and will not also be disturbed by color blocking layer in COA type liquid crystal panels, it is possible to increase Success rate of mending to showing abnormal pixel.The array base-plate structure of the present invention, is provided with covering phase above each data wire Answer data wire and be located at the middle public electrode wire of same layer with pixel electrode, when there is showing abnormal pixel in liquid crystal panel, Corresponding pixel electrode can be connected by thin film-forming method and realizes that dim spotization is repaired with middle public electrode wire, it is easy to is operated.
It is described above, for the person of ordinary skill of the art, can be with technique according to the invention scheme and technology Other various corresponding changes and deformation are made in design, and all these changes and deformation should all belong to the claim of the present invention Protection domain.

Claims (10)

1. a kind of liquid crystal panel dim spot method for repairing and mending, it is characterised in that comprise the following steps:
Step S1, offer liquid crystal panel (LCD);
The liquid crystal panel (LCD) includes array base palte (A) and color membrane substrates (C);The array base palte (A) includes being in array Multiple pixel electrodes (1) of arrangement, the multi-strip scanning line (2) extended transversely, right correspondingly set per one-row pixels electrode (1) Answer a plurality of data lines (3) extended longitudinally of each row pixel electrode (1) setting, the correspondingly setting per one-row pixels electrode (1) A plurality of array base palte side public electrode wire (4), multiple thin film transistor (TFT)s (T) for setting of each pixel electrode (1) of correspondence and Corresponding data line (3) is covered above each data wire (3) and is located at the middle public electrode wire of same layer with pixel electrode (1) (6);Color membrane substrates side public electrode (8) is provided with the color membrane substrates (C);The middle public electrode wire (6) and color film The current potential of substrate-side public electrode (8) is equal;
If n, m are positive integer, grid (G) the connection nth bar scan line (2) of line n m row thin film transistor (TFT) (T), source electrode (S) connection m data lines (3), drain electrode (D) connection line n m row pixel electrode (1);
Step S2, the display abnormal pixel for detecting liquid crystal panel (LCD);
Step S3, the corresponding thin film transistor (TFT) of region cut-out that first (A) corresponds to where display abnormal pixel on array base palte (T) connection of source electrode (S) and data wire (3), then corresponding pixel electrode (1) and middle common electrical are connected by thin film-forming method Polar curve (6).
2. liquid crystal panel dim spot method for repairing and mending as claimed in claim 1, it is characterised in that the step S3 is cut by radium-shine Cut technique and cut off the source electrode (S) of corresponding thin film transistor (TFT) (T) and the connection of data wire (3).
3. liquid crystal panel dim spot method for repairing and mending as claimed in claim 1, it is characterised in that the step S3 is repaiied using radium-shine Process deposits film forming is mended to connect corresponding pixel electrode (1) and middle public electrode wire (6);And the material and pixel of film forming Electrode (1) and the material of middle public electrode wire (6) are identical.
4. liquid crystal panel dim spot method for repairing and mending as claimed in claim 3, it is characterised in that the pixel electrode (1) is with Between public electrode wire (6) material be ITO.
5. liquid crystal panel dim spot method for repairing and mending as claimed in claim 1, it is characterised in that the scan line (2), array base The grid (G) of plate side public electrode wire (4) and thin film transistor (TFT) (T) is located on the first metal layer, the data wire (3) and thin The source electrode (S) of film transistor (T) is located on second metal layer with drain electrode (D).
6. liquid crystal panel dim spot method for repairing and mending as claimed in claim 5, it is characterised in that the first metal layer and second The material of metal level is one or more of stacked combinations in copper, aluminium, molybdenum, titanium.
7. a kind of array base-plate structure, it is characterised in that each including multiple pixel electrodes (1) for being arranged in array, correspondence The multi-strip scanning line (2) extended transversely that row pixel electrode (1) is set, each row pixel electrode (1) of correspondence set along vertical To a plurality of data lines (3) of extension, correspondingly per one-row pixels electrode (1) set a plurality of array base palte side public electrode wire (4), Multiple thin film transistor (TFT)s (T) and respective counts are covered above each data wire (3) that each pixel electrode (1) of correspondence is set It is located at the middle public electrode wire (6) of same layer according to line (3) and with pixel electrode (1);
If n, m are positive integer, grid (G) the connection nth bar scan line (2) of line n m row thin film transistor (TFT) (T), source electrode (S) connection m data lines (3), drain electrode (D) connection line n m row pixel electrode (1).
8. array base-plate structure as claimed in claim 7, it is characterised in that the pixel electrode (1) and middle public electrode The material of line (6) is ITO.
9. array base-plate structure as claimed in claim 7, it is characterised in that the scan line (2), array base palte side common electrical The grid (G) of polar curve (4) and thin film transistor (TFT) (T) is located on the first metal layer, the data wire (3) and thin film transistor (TFT) (T) source electrode (S) is located on second metal layer with drain electrode (D).
10. array base-plate structure as claimed in claim 9, it is characterised in that the first metal layer and second metal layer Material is one or more of stacked combinations in copper, aluminium, molybdenum, titanium.
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