CN107328730B - 全集成式红外气体传感器及其工作方法 - Google Patents
全集成式红外气体传感器及其工作方法 Download PDFInfo
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- CN107328730B CN107328730B CN201710540697.5A CN201710540697A CN107328730B CN 107328730 B CN107328730 B CN 107328730B CN 201710540697 A CN201710540697 A CN 201710540697A CN 107328730 B CN107328730 B CN 107328730B
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
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CN201710540697.5A CN107328730B (zh) | 2017-07-05 | 2017-07-05 | 全集成式红外气体传感器及其工作方法 |
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CN107328730A CN107328730A (zh) | 2017-11-07 |
CN107328730B true CN107328730B (zh) | 2019-11-26 |
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Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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CN108426833B (zh) * | 2018-03-16 | 2021-01-01 | 中电科技集团重庆声光电有限公司 | 一种基于盒形气室结构的全集成式红外气体传感器 |
CN114324227B (zh) * | 2018-06-26 | 2024-05-14 | 浙江三花智能控制股份有限公司 | 红外气体传感器 |
CN109596560B (zh) * | 2018-12-19 | 2021-09-24 | 电子科技大学 | 一种多通道集成红外气体传感器 |
CN109813673A (zh) * | 2019-03-20 | 2019-05-28 | 电子科技大学 | 一种具有压电微泵和扰流结构的红外气体传感器 |
CN114122189B (zh) * | 2021-11-15 | 2024-06-28 | 山东大学 | 一种基于红外光源和pd的光收发一体芯片及其制备方法 |
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US5747808A (en) * | 1994-02-14 | 1998-05-05 | Engelhard Sensor Technologies | NDIR gas sensor |
FI100827B (fi) * | 1995-03-22 | 1998-02-27 | Vaisala Oy | NDIR-laitteiston kalibrointimenetelmä sekä kalibrointilaitteisto |
CN100365278C (zh) * | 2005-06-04 | 2008-01-30 | 胡军 | 一种用于制造微型泵的压电陶瓷片和微型气泵 |
CN103362786B (zh) * | 2013-07-12 | 2018-07-13 | 重庆中镭科技有限公司 | 一种压电微型隔膜泵 |
CN105181621A (zh) * | 2015-08-26 | 2015-12-23 | 电子科技大学 | 一种全集成红外气体传感器 |
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Inventor after: Hu Shaoqin Inventor after: Yang Jing Inventor after: Zhang Zuwei Inventor after: Ma Jinyi Inventor after: Yuan Yupeng Inventor after: Ma Kaiqi Inventor before: Hu Shaoqin Inventor before: Zhang Zuwei Inventor before: Ma Jinyi Inventor before: Yuan Yupeng Inventor before: Wu Chuangui Inventor before: Luo Wenbo Inventor before: Ma Kaiqi |
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Effective date of registration: 20180829 Address after: 401332 367, West Wing Road, Xiyong Town, Shapingba District, Chongqing Applicant after: CHINA ELECTRONICS TECHNOLOGY GROUP CORPORATION CHONGQING ACOUSTIC-OPTIC-ELECTRONIC CO.,LTD. Applicant after: CHINA ELECTRONICS TECHNOLOGY GROUP CORPORATION NO.26 Research Institute Address before: 401332 367, West Wing Road, Xiyong Town, Shapingba District, Chongqing Applicant before: CHINA ELECTRONICS TECHNOLOGY GROUP CORPORATION CHONGQING ACOUSTIC-OPTIC-ELECTRONIC CO.,LTD. |
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Address after: No.23 Xiyong Avenue, Shapingba District, Chongqing 401332 Patentee after: CETC Chip Technology (Group) Co.,Ltd. Patentee after: CHINA ELECTRONICS TECHNOLOGY GROUP CORPORATION NO.26 Research Institute Address before: 401332 367, West Wing Road, Xiyong Town, Shapingba District, Chongqing Patentee before: CHINA ELECTRONICS TECHNOLOGY GROUP CORPORATION CHONGQING ACOUSTIC-OPTIC-ELECTRONIC CO.,LTD. Patentee before: CHINA ELECTRONICS TECHNOLOGY GROUP CORPORATION NO.26 Research Institute |
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Effective date of registration: 20230517 Address after: No.23 Xiyong Avenue, Shapingba District, Chongqing 401332 Patentee after: CETC Chip Technology (Group) Co.,Ltd. Address before: No.23 Xiyong Avenue, Shapingba District, Chongqing 401332 Patentee before: CETC Chip Technology (Group) Co.,Ltd. Patentee before: CHINA ELECTRONICS TECHNOLOGY GROUP CORPORATION NO.26 Research Institute |
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