CN107267922B - A kind of plane formula evaporation source and evaporation coating device - Google Patents
A kind of plane formula evaporation source and evaporation coating device Download PDFInfo
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- CN107267922B CN107267922B CN201710643162.0A CN201710643162A CN107267922B CN 107267922 B CN107267922 B CN 107267922B CN 201710643162 A CN201710643162 A CN 201710643162A CN 107267922 B CN107267922 B CN 107267922B
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- organic material
- soaking
- heating module
- evaporation source
- material film
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention relates to field of display technology, disclosing a kind of plane formula evaporation source and evaporation coating device, plane formula evaporation source includes pedestal, heating module and soaking flatness layer, and heating module is fixedly installed on the base；Soaking flatness layer is arranged on heating module, and soaking flatness layer forms the organic material film loading end for carrying organic material film away from the one side of heating module, soaking flatness layer is used to make organic material film be heated evenly to form evaporation direction perpendicular to the vapor of organic material of organic material film loading end in heating module heating, heat carries out soaking after conducting to soaking flatness layer, so that the temperature of entire plane has preferable homogeneity, guarantee that plane formula evaporation source can be uniformly vertically evaporated by the organic film of top, and since organic material film loading end is parallel with glass substrate to be deposited, it ensure that the evaporated film thickness formed on the glass substrate is uniform, it can reduce the shadow distance of vapor deposition, be conducive to improve resolution ratio.
Description
Technical field
The present invention relates to field of display technology more particularly to a kind of plane formula evaporation sources and evaporation coating device.
Background technique
With the progress of display technology, the screen of electronical display product increasingly develops towards high-resolution, especially VR
(virtual reality) equipment, AR (augmented reality) equipment show that the demand of screen is especially strong to high PPI (number of pixels of per inch)
It is strong, and OLED (Organic Light Emitting Diode) display technology with its self-luminous, wide viewing angle, almost infinite high contrast, compared with low consumption
The advantages that electric, high reaction speed, it is considered to be follow-on display technology, therefore the OLED display with high PPI has
Preferable market prospects.
Currently, luminous organic material is formed a film on the glass substrate by the method for vacuum evaporation for OLED display,
For the OLED display device (RGB OLED) of full color, the vapor deposition needs of emitting layer material use FMM (Fine Metal
Mask high-precision metal mask plate), as shown in Figure 1, evaporation source 03 makes organic material by means such as heating in existing evaporation process
Material evaporation, forms vapor of organic material 04, the masking of the mask plate 02 by being equipped with specific pierced pattern, on glass substrate 01
Form organic film 05.Since organic material is evaporated from the nozzle of evaporation source 03 after heating, so that is formed has
Machine material vapor 04 is that have certain angle；Along with the technique of mask plate 02 is limited, hollow out position can not be complete
It is close to glass substrate 01, this hollow out for resulting in the film formed on glass substrate 01 05 to be slightly larger than mask plate 02 is open
, and be that edge is relatively thin；This part having more compared with mask plate opening is known as shadow distance (shadow
distance).Shadow distance has seriously affected the resolution ratio of evaporated film, causes the size of light emitting sub-pixel by a fixed limit
System；In addition, shadow distance may will lead to colour mixture, phenomena such as light leakage, product quality is seriously affected, it is higher to be unfavorable for production
The display product of PPI.Therefore, the evaporation coating device for designing a kind of shadow distance that can reduce vapor deposition is particularly important.
Summary of the invention
The present invention, which provides a kind of plane formula evaporation source and evaporation coating device, the plane formula evaporation source, can reduce the yin of vapor deposition
Shadow distance, and then be conducive to improve resolution ratio.
In order to achieve the above objectives, the present invention the following technical schemes are provided:
A kind of plane formula evaporation source, including pedestal, heating module and soaking flatness layer, in which:
The heating module is fixed on the pedestal；
The soaking flatness layer is arranged on the heating module, and the soaking flatness layer is away from the heating module
The organic material film loading end for carrying organic material film is formed on one side, and the soaking flatness layer is used in the heating
Module is heated evenly organic material film to form evaporation direction perpendicular to the organic material film loading end when heating
Vapor of organic material.
In above-mentioned plane formula evaporation source, when the plane formula evaporation source for carrying organic material film is put into evaporation coating device
Vapor deposition chamber in when, organic material film loading end on soaking flatness layer towards glass substrate to be deposited and with it is to be deposited
Glass substrate and mask plate on glass substrate it is parallel, at this point, the heating module being located on pedestal is begun to warm up,
Heat is being conducted to soaking is carried out after soaking flatness layer, improves the uniformity of heat so that the temperature of entire plane have compared with
Good homogeneity, so that the organic material film for the organic material film loading end being located on soaking flatness layer is heated equal
It is even, guarantee that plane formula evaporation source can be uniformly vertically evaporated by the organic film of top, and then it is vertical to form evaporation direction
In the vapor of organic material of organic material film loading end, and due to organic material film loading end and glass substrate to be deposited
It is parallel, so that vapor of organic material and glass substrate to be deposited are perpendicular, it ensure that the vapor deposition formed on the glass substrate
Film thickness is uniform, can reduce the shadow distance of vapor deposition, be conducive to improve resolution ratio, improve glass substrate vapor deposition operation when
Yield, and then improve the product quality of organic luminescent device.
Preferably, the heating module includes at least one heating unit, and the heating unit is used based on square point
The Hilbert of shape-Peano curve shape is made.
Further, the surface that the heating module is in contact with the soaking flatness layer is square plane, each
The heating unit is made of Hilbert-Peano curve shape of at least three ranks.
Further, the heating unit is using quadravalence or Hilbert-Peano curve shape of five ranks or six ranks
It is made.
Preferably, the surface that the heating module is in contact with the soaking flatness layer is non-square plane, described to add
Thermal modules can use heating unit made of Hilbert-Peano curve shape to be composed at least two.
Further, the small positive direction shape where the central point for being used to form the Hilbert-Peano curve
Side length be the heating unit entirety square-shaped planar side length 1/960~1/120.
Preferably, the use Hilbert based on rectangle point shape-Peano curve shape of the heating module is made.
It preferably, further include cooling unit and heat reflection unit, the heat reflection unit setting is carried on the back in the heating module
Side from the soaking flatness layer, the cooling unit are arranged between the heat reflection unit and the pedestal.
In addition, the present invention also provides a kind of evaporation coating device, including organic material film, it further include any technical solution as above
The plane formula evaporation source, the organic material film is arranged on the organic material film loading end, described to have
Machine material film loading end is parallel with glass substrate to be deposited.
Since the plane formula evaporation source can reduce the shadow distance of vapor deposition, is conducive to improve resolution ratio, improves glass base
Yield when operation is deposited in plate, and then improves the product quality of organic luminescent device, therefore, the steaming with the plane formula evaporation source
Plating appts can be improved vapor deposition yield, further increase the product quality of organic luminescent device.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram for evaporation coating device that background of invention provides；
Fig. 2 is a kind of structural schematic diagram of evaporation coating device provided by the invention；
Fig. 3 is a kind of structural schematic diagram of plane formula evaporation source provided by the invention.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
As shown in Figure 2 and Figure 3, a kind of plane formula evaporation source 3, including pedestal 31, heating module 34 and soaking flatness layer
35, in which:
Heating module 34 is fixed on pedestal 31；
Soaking flatness layer 35 is arranged on heating module 34, and soaking flatness layer 35 is formed away from the one side of heating module 34
For carrying the organic material film loading end of organic material film 6, soaking flatness layer 35 is used for when heating module 34 heats
Organic material film 6 is heated evenly to form evaporation direction perpendicular to the vapor of organic material 4 of organic material film loading end.
In above-mentioned plane formula evaporation source 3, when the plane formula evaporation source 3 for carrying organic material film 6 is put into vapor deposition
When in the vapor deposition chamber of device, organic material film loading end on soaking flatness layer 35 towards glass substrate 1 to be deposited and with
Glass substrate 1 to be deposited and the mask plate 2 on glass substrate are parallel, at this point, being located at the heated mould on pedestal 31
Block 34 is begun to warm up, and heat carries out soaking after conducting to soaking flatness layer 35, improves the uniformity of heat, so that entire flat
The temperature in face has preferable homogeneity, so that the organic material film loading end being located on soaking flatness layer 35 is organic
Material film 6 is heated evenly, and guarantees that plane formula evaporation source 3 can be uniformly vertically evaporated by the organic film of top, in turn
Evaporation direction is formed perpendicular to the vapor of organic material 4 of organic material film loading end, and due to organic material film loading end
It is parallel with glass substrate 1 to be deposited, so that vapor of organic material 4 and glass substrate 1 to be deposited are perpendicular, ensure that
5 thickness of evaporated film formed on glass substrate 1 is uniform, can reduce the shadow distance of vapor deposition, is conducive to improve resolution ratio, mention
Yield when operation is deposited in high glass substrate 1, and then improves the product quality of organic luminescent device.
On the basis of above-mentioned plane formula evaporation source 3, in order to improve the uniformity of heating, a kind of preferred embodiment,
Heating module 34 includes at least one heating unit, and heating unit is used divides Hilbert-Piano of shape bent based on square
Wire shaped is made.
Hilbert-Peano curve is a kind of fractal graph, it can draw infinitely complicated, its initial pel is just
It is rectangular, during grey iterative generation, small square is constantly refined out, the line segment in figure is for connecting each square in fact
Line.Since Hilbert-Peano curve can be by point all in a certain square area in plane, as long as appropriately
Function is selected, a continuous parameter curve is drawn, when parameter t is in 0,1 section value, curve will be traversed in unit square
All points obtain the curve for being full of space.
In above-mentioned plane formula evaporation source 3, heating unit uses the Hilbert-Peano curve for dividing shape based on square
Shape is made to guarantee that heating unit has preferable heating uniformity, and the heated mould being made of at least one heating unit
Block 34 equally has preferable heating uniformity, so that the uniform heat provided when heating unit heats, and these are uniform
Heat carries out soaking using the effect of soaking flatness layer 35 after conducting to soaking flatness layer 35, improves the uniform of heat
Property, so that the temperature of entire plane has preferable homogeneity, be conducive to the plane vaporising device organic material on surface is thin
6 uniform vertical of film it is evaporated, can reduce the shadow distance of vapor deposition, be conducive to improve resolution ratio.
On the basis of above-mentioned plane formula evaporation source 3, specifically add to improve the uniformity of the heating of heating module 34
The surface that thermal modules 34 are in contact with soaking flatness layer 35 is square plane, each heating unit is using the uncommon of at least three ranks
You are made Bert-Peano curve shape.
For Hilbert-Peano curve, by the way that a square is divided into 4 small squares, then small square
The curve that connects of central point, referred to as single order Hilbert-Peano curve is small just by be divided into for the first time 4
Rectangular, each is separated into 4 small squares, then the central point of small square is connected to obtain the second order of second division
Hilbert-Peano curve；And so on the curves such as available three rank, quadravalence, due to single order, the Hilbert-of second order
Peano curve curve shape is relatively simple, after point it is less, in order to obtain preferable heating uniformity, each heating is single
Member using three ranks and its more than Hilbert-Peano curve shape be made, the point heated at this time is more, and heating region is more
Uniformly, the uniformity of the heating of entire heating module 34 is preferable.
More specifically, heating unit is made of Hilbert-Peano curve shape of quadravalence or five ranks or six ranks.
In above-mentioned plane formula evaporation source 3, according to the difference of 34 heated dimensions of heating module, heating unit can use four
Rank Hilbert-Peano curve shape is made, and can also be made of five rank Hilberts-Peano curve shape, may be used also
To be made of six rank Hilberts-Peano curve shape, Hilbert-Peano curve order can be according to heated mould
The specific actual conditions of 34 heated dimensions of block and plane formula evaporation source 3 are selected.
A kind of preferred embodiment, the surface that heating module 34 is in contact with soaking flatness layer 35 are flat for non-square
Face, heating module 34 can use heating unit made of Hilbert-Peano curve shape to be composed at least two.
In above-mentioned plane formula evaporation source 3, according to the difference of 34 heated dimensions of heating module, heating module 34 and soaking are flat
The surface that smooth layer 35 is in contact can be that non-square plane can use more when heating module 34 is non-square plane
Heating unit made of a Hilbert-Peano curve shape is composed, such as rectangular heating module 34, can be by two
A five ranks heating unit is composed；In addition, can also be adopted according to the difference of 3 marginal portion heat dispersal situations of plane formula evaporation source
The heating unit made of not same order Hilbert-Peano curve shape is combined.
Specifically, the side length for being used to form the small positive direction shape where Hilbert-Peano curve central point is to add
The 1/960~1/120 of hot cell entirety square-shaped planar side length.
In above-mentioned plane formula evaporation source 3, the width of heating unit is carried out according to 3 size difference of physical plane formula evaporation source
Optimization is used to form small where Hilbert-Peano curve central point to guarantee the uniformity of heating unit heats
Ratio between the side length and heating unit entirety square-shaped planar side length of positive direction shape can for 1/960,1/720,1/600,
1/480,1/360,1/240,1/120, it is used to form the small positive direction shape where Hilbert-Peano curve central point
Ratio between side length and heating unit entirety square-shaped planar side length can be according to the heated dimensions and plane of heating unit
The specific actual conditions of formula evaporation source 3 are selected.
The use of a kind of preferred embodiment, heating module 34 divides Hilbert-Piano of shape bent based on rectangle
Wire shaped is made.
In above-mentioned plane formula evaporation source 3, heating unit can not also use point shape mode of square, it can use
The other shapes such as rectangle, diamond shape；Other mutation curves of Hilbert-Peano curve can also be used, such as by each rank
Hilbert-Peano curve right angle portions are changed to arc-shaped or ellipse arc, in the column of protection.
In order to improve the utilization rate of heating module 34, guarantee that more heats are conducted to soaking flatness layer 35, one kind is preferably
Embodiment, plane formula evaporation source 3 further includes cooling unit 32 and heat reflection unit 33, and the setting of heat reflection unit 33 is being heated
Module 34 deviates from the side of soaking flatness layer 35, and cooling unit 32 is arranged between heat reflection unit 33 and pedestal 31.
In above-mentioned plane formula evaporation source 3, to away from soaking when heat reflection unit 33 heats most of heating modules 34
The heat of the side conduction of flatness layer 35 is reflected back heat reflection unit 33 towards the side of heating module 34, so that more heats
It conducts to soaking flatness layer 35, and cooling unit 32 is arranged between heat reflection unit 33 and pedestal 31, it can be to the small portion of absorption
Divide and heat of the heat reflection unit 33 towards the side of heating module 34 is not reflected back by heat reflection unit 33, avoids doing pedestal 31
At influence.
In addition, as shown in Fig. 2, the present invention also provides a kind of evaporation coating device, including organic material film 6, further include as
Plane formula evaporation source 3 in upper any technical solution, organic material film 6 is arranged on organic material film loading end, organic
Material film loading end is parallel with glass substrate 1 to be deposited.
Since the plane formula evaporation source 3 can reduce the shadow distance of vapor deposition, is conducive to improve resolution ratio, improves glass base
Yield when operation is deposited in plate 1, and then improves the product quality of organic luminescent device, therefore, with the plane formula evaporation source 3
Evaporation coating device can be improved vapor deposition yield, further increase the product quality of organic luminescent device.
Obviously, those skilled in the art can carry out various modification and variations without departing from this hair to the embodiment of the present invention
Bright spirit and scope.In this way, if these modifications and changes of the present invention belongs to the claims in the present invention and its equivalent technologies
Within the scope of, then the present invention is also intended to include these modifications and variations.
Claims (9)
1. a kind of plane formula evaporation source, which is characterized in that including pedestal, heating module and soaking flatness layer, in which:
The heating module is fixed on the pedestal；
The soaking flatness layer is arranged on the heating module, and the soaking flatness layer deviates from the one side of the heating module
The organic material film loading end for carrying organic material film is formed, the soaking flatness layer is used in the heating module
It is heated evenly organic material film when heating to form evaporation direction perpendicular to the organic of the organic material film loading end
Material vapor.
2. plane formula evaporation source according to claim 1, which is characterized in that the heating module includes at least one heating
Unit, the heating unit use Hilbert-Peano curve shape based on square point shape to be made.
3. plane formula evaporation source according to claim 2, which is characterized in that the heating module and the soaking flatness layer
The surface being in contact is square plane, each described heating unit uses Hilbert-Peano curve of at least three ranks
Shape is made.
4. plane formula evaporation source according to claim 3, which is characterized in that the heating unit using quadravalence or five ranks or
The Hilbert of six ranks-Peano curve shape is made.
5. plane formula evaporation source according to claim 2, which is characterized in that the heating module and the soaking flatness layer
The surface being in contact is non-square plane, and the heating module uses Hilbert-Peano curve shape by least two
Manufactured heating unit is composed.
6. plane formula evaporation source according to claim 5, which is characterized in that described to be used to form the Hilbert-skin
The side length of small positive direction shape where the central point of sub- promise curve is the 1/960 of the heating unit entirety square-shaped planar side length
~1/120.
7. plane formula evaporation source according to claim 1, which is characterized in that the use of the heating module is based on rectangle
Hilbert-Peano curve shape of point shape is made.
8. plane formula evaporation source according to claim 1, which is characterized in that it further include cooling unit and heat reflection unit,
The side that the heating module deviates from the soaking flatness layer is arranged in the heat reflection unit, and the cooling unit is arranged in institute
It states between heat reflection unit and the pedestal.
9. a kind of evaporation coating device, including organic material film, which is characterized in that further include according to claims 1-8 described
Plane formula evaporation source, the organic material film are arranged on the organic material film loading end, the organic material film
Loading end is parallel with glass substrate to be deposited.
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| CN201710643162.0A CN107267922B (en) | 2017-07-31 | 2017-07-31 | A kind of plane formula evaporation source and evaporation coating device |
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| CN1814854A (en) * | 2005-01-31 | 2006-08-09 | 三星Sdi株式会社 | Vapor deposition source and vapor deposition apparatus having the same |
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| CN1814854A (en) * | 2005-01-31 | 2006-08-09 | 三星Sdi株式会社 | Vapor deposition source and vapor deposition apparatus having the same |
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