CN107255456A - It is a kind of to calculate the scaling method in place that holographic substrates etch error - Google Patents
It is a kind of to calculate the scaling method in place that holographic substrates etch error Download PDFInfo
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- CN107255456A CN107255456A CN201710532268.3A CN201710532268A CN107255456A CN 107255456 A CN107255456 A CN 107255456A CN 201710532268 A CN201710532268 A CN 201710532268A CN 107255456 A CN107255456 A CN 107255456A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
Abstract
Holographic substrates etching error scaling method in place is calculated the invention discloses one kind.This method can keep calculating holographic light path position constant under the conditions of the aspherical light path of Holographic test is calculated, and realize and calculate the demarcation in place that holographic substrates etch error.Specific light channel structure be by it is to be measured it is aspherical be substituted for spherical mirror, and add compensator calculating holographic with spherical mirror, system spherical aberration compensated.Before calculating holography performs etching processing, the parallel flat substrate is put into progress first time detection in light path；Second of detection of progress in light path is put into after the holographic lithography of holographic substrate completion is calculated, then by calculating holography, the difference of testing result is that calculating holographic substrates obtained by calibrating etch error twice.This method breaches F number restricted problems aspherical in existing calibration technique in place, and stated accuracy is not limited to the face form quality amount for making precision level and sphere to be measured of compensator, without being demarcated to compensator and surface shape error of spherical surface to be measured.
Description
Technical field
The invention belongs to field of optical measuring technologies, and in particular to be a kind of to calculate holographic scaling method in place.
Background technology
With continuing to develop for modern semiconductor processes technology and optical technology, holography (Computer- is calculated
Generated-Hologram) due to its good versatility, it compensates detection technique with the aspherical high accuracy for representative
Surface testing field has obtained extremely wide application.Because aspherical surface testing required precision is being improved constantly, and count
It is the principal element for limiting its precision to calculate holography CGH substrate errors, is further to improve aspherical surface testing precision level,
Need to carry out accurate calibration to CGH substrates error.
At present, the demarcation for CGH substrate errors mainly has two ways：One is under original optical path, to be replaced aspherical
Demarcated in place into sphere；Two are demarcated under parallel light path.
When being demarcated in place under original optical path, sphere is substituted for by aspherical.The is carried out when CGH is in interference cavity
One-shot measurement；Then take out CGH and carry out second of measurement.The difference of measurement result is substrate error and extra ball twice
Difference.Extra spherical aberration be due to CGH substrates be in diverging light road when it is caused.Due to spherical aberration and the 4 of the detection aspherical F numbers of light path
Power is inversely proportional, and when F numbers are smaller, can introduce larger spherical aberration, and the interference bar than comparatively dense occurs in detection light path in place
It line or even can not parse, so as to cause larger non-co- path error, greatly reduce stated accuracy.Using refractive index as 1.5, thickness
Exemplified by 6.35mm substrate, when F numbers are 7, spherical aberration is about 0.6nm rms；But when F numbers are changed into 3, spherical aberration is rapidly increased to
16.9nm rms.Therefore this scaling method is only applicable to demarcate the larger system of F numbers, for more conventional smaller F numbers
System is present compared with big limitation.
To avoid the influence of spherical aberration, substrate can be demarcated under parallel light path.Carried out when CGH is in interference cavity
Measure for the first time；Then take out CGH and carry out second of measurement.The difference of measurement result is substrate error twice.Due to parallel
Light path condition and CGH Aspherical-surface testing light path conditions are not consistent, and substrate error so obtained by calibrating can not be directly from non-
Directly subtracted in spherical surface shape testing result.There is obvious lateral shear between the two, the corresponding relation between them wants root
Calculated according to the mapping relations between CGH coordinate and aspherical coordinate.Due to the complicated calculations that coordinate maps, both it
Between carry out data and inevitably introduce location matches error when subtracting each other, slope of the error also with CGH substrate transmission wavefronts
It is related.When CGH substrate transmission wavefront slopes are larger, location matches error can further increase, and then reduce CGH demarcation essences
Degree.Demarcated in place compared under the conditions of original optical path, this is the greatest problem of scaling method under the conditions of parallel light path, in reality
Exist in compared with big limitation.
The content of the invention
The scaling method in place that holographic substrates etch error is calculated it is an object of the invention to provide a kind of, to calculating holographic base
Bottom etching error is demarcated in place.
The present invention use technical scheme for：It is a kind of to calculate the scaling method in place that holographic substrates etch error, implement
Step is as follows：
The first step, the calculating holographic substrates parallel flat (3) before etching is put into the holographic demarcation light path of calculating, measurement knot
Fruit W1Including calculating holographic substrates parallel flat error Wsub, compensator errorWith the error W of tested spherical mirrorsphere, i.e.,：
Second step, the calculating holography CGH (4) after the completion of etching is put into the holographic demarcation light path of calculating, measurement result W2
Including calculating total error Wcgh, compensator errorWith the error W of tested spherical mirrorsphere, i.e.,：
3rd step, measurement result is subtracted each other twice by more than, can obtain calculating holographic substrate etching error, i.e.,：
The advantage of the present invention compared with prior art is：
(1) present invention can be achieved calculate holographic substrates etch error high-precision calibrating in place, calibration result can directly from
Calculate and directly cut in the aspherical surface testing data of holographic compensation detection, and breach aspheric in existing calibration technique in place
The F number restricted problems in face, with larger versatility.
(2) stated accuracy of the invention is not limited to the face form quality amount for making precision level and spherical mirror of compensator,
Without being demarcated to the error of compensator and the face shape error of spherical mirror, with larger flexibility.
Brief description of the drawings
Fig. 1 is that the calculating holographic substrates parallel flat before lithography is put into demarcation light path to carry out showing for surface testing
It is intended to；
Fig. 2 is that the calculating holographic substrates parallel flat completed after lithography is put into demarcation light path to carry out surface testing
Schematic diagram；
In each figure, 1. interferometers, 2. standard lens, 3. calculate holographic substrates parallel flat, and 4. calculate holographic, 5. compensation
Device, 6. spherical mirrors.
Embodiment
Below in conjunction with the accompanying drawings and embodiment further illustrates the present invention.
Fig. 1 and Fig. 2 are the schematic diagrames measured twice needed for the present invention.
In fig. 1 and 2, the light beam for carrying out interferometer 1 passes through standard lens 2, incides the calculating before lithography complete
Cease substrate parallel flat 3 or calculate in holography 4, then by compensator 5, incide on spherical mirror.With reference to example, it was measured
Journey is as follows：
The first step, the calculating holographic substrates parallel flat 3 before etching is put into the holographic demarcation light path of calculating, such as Fig. 1 institutes
Show, measurement result W1Including calculating holographic substrates parallel flat error Wsub, compensator errorWith the error of tested spherical mirror
Wsphere,
Second step, the calculating holography 4 after the completion of etching is put into the holographic demarcation light path of calculating, as shown in Fig. 2 measurement knot
Fruit W2Including calculating total error Wcgh, compensator errorWith the error W of tested spherical mirrorsphere, i.e.,
3rd step, measurement result is subtracted each other twice by more than, can obtain calculating holographic substrate etching error, i.e.,
This method breaches F number restricted problems aspherical in existing calibration technique in place, and stated accuracy is not limited
In the face form quality amount for making precision level and sphere to be measured of compensator, without to compensator and surface shape error of spherical surface to be measured progress
Demarcation, calibration result can directly be cut from the holographic surface testing data of aspherical calculating, with great versatility and flexibly
Property.Achievement in research can be applied to calculate the association area of holographic high-precision surface shape detection, with larger engineering application value.
Description of the invention does not elaborate and partly belongs to techniques well known.
It is described above, it is only the embodiment in the present invention, but protection scope of the present invention is not limited thereto, and appoints
What be familiar with the people of the technology disclosed herein technical scope in local modifications or substitutions, should all cover of the invention
Within scope.
Claims (1)
1. one kind calculates holographic substrates etching error scaling method in place, it is characterised in that：The device that methods described is used includes：
Interferometer (1), standard lens (2), calculating holographic substrates parallel flat (3), calculating holographic (4), compensator (5) and spherical mirror
(6), to implement step as follows for methods described：
The first step, the calculating holographic substrates parallel flat (3) before etching is put into the holographic demarcation light path of calculating, measurement result W1
Including calculating holographic substrates parallel flat error Wsub, compensator errorWith the error W of tested spherical mirrorsphere, i.e.,：
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Second step, the calculating holography CGH (4) after the completion of etching is put into the holographic demarcation light path of calculating, measurement result W2Including meter
Calculate total error Wcgh, compensator errorWith the error W of tested spherical mirrorsphere, i.e.,：
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3rd step, measurement result is subtracted each other twice by more than, can obtain calculating holographic substrate etching error, i.e.,：
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1
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| CN201710532268.3A CN107255456B (en) | 2017-07-03 | 2017-07-03 | A kind of scaling method in place calculating holographic substrates etching error |
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| CN107255456B CN107255456B (en) | 2019-08-13 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07229721A (en) * | 1994-02-16 | 1995-08-29 | Canon Inc | Device for generating aspherical wave and method for measuring aspherical shape |
| CN102778210A (en) * | 2012-07-13 | 2012-11-14 | 中国科学院光电技术研究所 | Computer-generated hologram-based aspheric surface absolute detection method |
| CN103196389A (en) * | 2013-04-02 | 2013-07-10 | 中国科学院光电技术研究所 | Device and method for detecting surface shape and material non-uniformity error of computer-generated holography substrate |
| US8941837B1 (en) * | 2013-03-13 | 2015-01-27 | Exelis, Inc. | Phased array of computer generated holograms for waveform or surface measurement |
| CN105157598A (en) * | 2015-04-30 | 2015-12-16 | 西安工业大学 | Transmitted wavefront detection apparatus and method for meniscus lens |
-
2017
- 2017-07-03 CN CN201710532268.3A patent/CN107255456B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07229721A (en) * | 1994-02-16 | 1995-08-29 | Canon Inc | Device for generating aspherical wave and method for measuring aspherical shape |
| CN102778210A (en) * | 2012-07-13 | 2012-11-14 | 中国科学院光电技术研究所 | Computer-generated hologram-based aspheric surface absolute detection method |
| US8941837B1 (en) * | 2013-03-13 | 2015-01-27 | Exelis, Inc. | Phased array of computer generated holograms for waveform or surface measurement |
| CN103196389A (en) * | 2013-04-02 | 2013-07-10 | 中国科学院光电技术研究所 | Device and method for detecting surface shape and material non-uniformity error of computer-generated holography substrate |
| CN105157598A (en) * | 2015-04-30 | 2015-12-16 | 西安工业大学 | Transmitted wavefront detection apparatus and method for meniscus lens |
Non-Patent Citations (1)
| Title |
|---|
| 冯婕: "基于CGH高精度非球面检测技术研究", 《中国博士学位论文全文数据库基础科学辑》 * |
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