CN107228876B - Method for evaluating thermal shrinkage of glass substrate - Google Patents
Method for evaluating thermal shrinkage of glass substrate Download PDFInfo
- Publication number
- CN107228876B CN107228876B CN201710494719.9A CN201710494719A CN107228876B CN 107228876 B CN107228876 B CN 107228876B CN 201710494719 A CN201710494719 A CN 201710494719A CN 107228876 B CN107228876 B CN 107228876B
- Authority
- CN
- China
- Prior art keywords
- glass substrate
- origin
- point
- measured
- bottom plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011521 glass Substances 0.000 title claims abstract description 180
- 239000000758 substrate Substances 0.000 title claims abstract description 175
- 238000000034 method Methods 0.000 title claims abstract description 75
- 238000005259 measurement Methods 0.000 claims abstract description 13
- 238000010438 heat treatment Methods 0.000 claims description 46
- 230000003287 optical effect Effects 0.000 claims description 10
- 244000137852 Petrea volubilis Species 0.000 claims description 9
- 235000012149 noodles Nutrition 0.000 claims description 4
- 238000011156 evaluation Methods 0.000 abstract description 5
- 238000010835 comparative analysis Methods 0.000 abstract description 3
- 238000001816 cooling Methods 0.000 description 15
- 238000004364 calculation method Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 2
- 238000012854 evaluation process Methods 0.000 description 2
- 238000009776 industrial production Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000007573 shrinkage measurement Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N25/00—Investigating or analyzing materials by the use of thermal means
- G01N25/16—Investigating or analyzing materials by the use of thermal means by investigating thermal coefficient of expansion
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention relates to the field of glass and discloses a method for evaluating thermal shrinkage of a glass substrate. The method comprises extractingBy means of coordinate axis calibration, in accordance with the difference Delta alpha of axial shrinkageShaftSurface shrinkage factor alphaNoodleAnd linear shrinkage factor alphaThreadThe measurement of the index realizes the overall evaluation of the thermal shrinkage of the glass substrate. Particularly, the grid division mode is adopted, so that the thermal shrinkage condition of each area of the glass substrate can be observed and analyzed more intuitively, and the problem of nonuniform thermal shrinkage of the glass substrate and the comparative analysis among different glass substrates are reflected more favorably.
Description
Technical Field
The invention relates to the field of glass, in particular to a method for evaluating thermal shrinkage of a glass substrate.
Background
In recent years, portable electronic products such as notebook computers, tablet computers, smart phones, and smart wearable devices have been rapidly popularized, and Liquid Crystal Display (LCD) products having characteristics such as lightness, thinness, high resolution, and high image quality have been popular. The glass substrate is an important component of LCD, and with the development of LCD technology, higher and higher requirements are put on the performance of the glass substrate material. For example, in an active matrix liquid crystal display, a thin film transistor and a color filter layer are formed directly on a glass substrate through a plurality of heating and photolithography processes, and in order to ensure proper alignment of the plurality of photolithography processes, a strict requirement is imposed on the dimensional thermal stability of the glass substrate, and not only is the linear shrinkage rate not more than a prescribed value required, but also a strict requirement is imposed on the difference between the longitudinal thermal shrinkage rate and the transverse thermal shrinkage rate.
At present, the glass substrate thermal shrinkage measurement mostly adopts small-sized glass strips, the size is generally hundreds of millimeters, and the method can only measure the local linear shrinkage rate. For large-size glass substrates on the market at present, such as a 5 generation line (1100mm × 1250mm) and a 10 generation line (2880mm × 3080mm), there is no method for measuring the heat shrinkage of the whole plate, especially the difference between the shrinkage rates in the two coordinate directions of X, Y; meanwhile, since large-sized glass substrates have some unevenness of thermal shrinkage, a reliable method for measuring different regions is required.
Disclosure of Invention
The present invention is directed to overcoming the above problems in the prior art, and providing a method for evaluating thermal shrinkage of a glass substrate, which can evaluate thermal shrinkage of different regions of a glass substrate, especially a large-sized glass substrate, so as to comprehensively reflect the thermal shrinkage of the entire glass substrate.
In order to achieve the above object, the present invention provides a method of evaluating thermal shrinkage of a glass substrate, the method comprising the steps of:
(1) preparing a bottom plate according to the size of a glass substrate, marking an original point O ' on the bottom plate, then calibrating an X axis and a Y axis which are perpendicular to each other through the original point O ', and marking a coordinate point A ' on the bottom plate;
(2) marking an origin O on the glass substrate, overlapping the origin O on the glass substrate with the origin O' on the bottom plate, and fixing the relative position of the glass substrate and the bottom plate;
(3) marking a point A to be measured on the glass substrate, overlapping the points A and A', and respectively measuring the distance x between the point A to be measured and the Y axis1And the distance y between the point A to be measured and the X axis1；
(4) Carrying out heat treatment on the glass substrate, superposing the origin O of the glass substrate subjected to heat treatment with the origin O' on the bottom plate, and fixing the glass substrate and the bottom plate according to the relative position in the step (2);
(5)respectively measuring the distance x between the points A and Y on the glass substrate after heat treatment2And the distance Y between the point A to be measured and the Y axis2；
(6) According to x1、x2、y1And y2Determining the difference Delta alpha of the axial shrinkage rates of the glass substrateShaftAnd/or area shrinkage alphaNoodle。
Preferably, in the step (6), the difference Δ α in the axial shrinkage rate of the glass substrate is determined by formula (I)ShaftAnd/or determining the area shrinkage alpha of the glass substrate by formula (II)Noodle；
Wherein, Δ x ═ x1-x2；△y＝y1-y2。
Preferably, the glass substrate is rectangular, and the long side of the glass substrate is 830-3320m, preferably 1800-2500 m; the short side is 650-3000m, preferably 1500-2200 m;
preferably, the bottom plate is rectangular, and the size of the bottom plate is not smaller than that of the glass substrate;
preferably, in step (1), the origin O' is located at the center of the base plate;
preferably, in step (1), the X-axis is parallel to a long side or a short side of the base plate;
preferably, in step (1), the origin points O ', a' are marked on the base plate by laser dotting and/or sandpaper marking, preferably laser dotting;
preferably, in step (1), the origin O' is marked in the form of a cross;
preferably, in the step (1), the calibration mode is laser scribing calibration and/or sand paper scribing calibration, preferably laser scribing calibration;
preferably, in the step (2), the origin O is marked on the glass substrate by laser dotting and/or sandpaper marking, preferably laser dotting;
preferably, in step (2), the origin O is marked in the form of a cross;
preferably, in the step (2), the fixing is performed by using an optical precision positioning device;
preferably, in step (3), the measuring means is optical measurement;
preferably, in the step (3), the marking mode of the point A to be measured is laser dotting and/or sand paper marking, preferably laser dotting;
preferably, in step (4), the heat treatment conditions include: the heating rate is 30-60 ℃/min, the heat treatment temperature is 400-;
preferably, in step (5), the measuring means is optical measurement;
preferably, the method further comprises the steps of:
(S1) measuring the distance L between the point A to be measured and the origin O on the glass substrate before the heat treatment1；
(S2) measuring the distance L between the point A to be measured and the origin O on the glass substrate after the heat treatment2；
(S3) determining the linear shrinkage rate alpha of the glass substrate by the formula (III)Thread；
Preferably, in the step (1), the X axis and the Y axis are divided into equal parts to form grids on the base plate, and the intersection of any one grid is taken as a coordinate point a';
preferably, the equal division mode is laser scribing;
preferably, the length of the grid is 200-600mm, preferably 300-500 mm; the width is 200-600mm, preferably 300-500 mm;
the glass substrate is a glass substrate for a display, preferably a TFT-LCD glass substrate, an OLED glass substrate or an LTPS glass substrate.
In the method, the difference Delta alpha of the axial shrinkage rate is matched in a mode of adopting coordinate axis calibrationShaftSurface shrinkage factor alphaNoodleAnd linear shrinkage factor alphaThreadThe measurement of the index realizes the overall evaluation of the thermal shrinkage of the glass substrate.
In addition, in the process of evaluating the thermal shrinkage of the glass substrate, the invention prepares the bottom plate which is marked with the original point and is divided into areas (by calibrating the X axis and the Y axis), and in a preferable case, the invention divides the bottom plate into grids, selects any grid cross point in each area as a coordinate point, and uses the bottom plate as a reference, thereby being capable of observing and analyzing the thermal shrinkage condition of each area of the glass substrate more intuitively, and being more beneficial to reflecting the problem of uneven thermal shrinkage of the glass substrate and carrying out comparative analysis among different glass substrates. Particularly, the bottom plate can be repeatedly used, so that the evaluation process is simplified, the evaluation time is shortened, the defect that a small-size glass strip sample needs to be repeatedly prepared in the prior art is overcome, and the bottom plate has a good application prospect in the actual industrial production process.
Drawings
Fig. 1 shows a schematic diagram of the meshing of a backplane used in the present invention.
Detailed Description
The endpoints of the ranges and any values disclosed herein are not limited to the precise range or value, and such ranges or values should be understood to encompass values close to those ranges or values. For ranges of values, between the endpoints of each of the ranges and the individual points, and between the individual points may be combined with each other to give one or more new ranges of values, and these ranges of values should be considered as specifically disclosed herein.
The invention provides a method for evaluating the thermal shrinkage of a glass substrate, which comprises the following steps:
(1) preparing a bottom plate according to the size of a glass substrate, marking an original point O ' on the bottom plate, then calibrating an X axis and a Y axis which are perpendicular to each other through the original point O ', and marking a coordinate point A ' on the bottom plate;
(2) marking an origin O on the glass substrate, overlapping the origin O on the glass substrate with the origin O' on the bottom plate, and fixing the relative position of the glass substrate and the bottom plate;
(3) marking a point A to be measured on the glass substrate, overlapping the points A and A', and respectively measuring the distance x between the point A to be measured and the Y axis1And the distance y between the point A to be measured and the X axis1；
(4) Carrying out heat treatment on the glass substrate, superposing the origin O of the glass substrate subjected to heat treatment with the origin O' on the bottom plate, and fixing the glass substrate and the bottom plate according to the relative position in the step (2);
(5) respectively measuring the distance x between the points A and Y on the glass substrate after heat treatment2And the distance Y between the point A to be measured and the Y axis2；
(6) According to x1、x2、y1And y2Determining the difference Delta alpha of the axial shrinkage rates of the glass substrateShaftAnd/or area shrinkage alphaNoodle。
Preferably, in the step (6), the difference Δ α in the shrinkage rate in the axial direction of the glass substrate is determined by the formula (I)ShaftAnd/or determining the area shrinkage alpha of the glass substrate by formula (II)Noodle；
Wherein, Δ x ═ x1-x2；△y＝y1-y2。
According to the present invention, the glass substrate of the present invention may be various glass substrates conventionally used in the art, and preferably, the glass substrate is rectangular, and the length of the long side of the glass substrate is equal to or greater than the length of the short side of the glass substrate. More preferably, the long side of the glass substrate is 830-3320m, preferably 1800-2500 m; the short side is 650-3000m, preferably 1500-2200 m.
In the present invention, there is no particular limitation on the material of the base plate as long as the surface thereof is flat and can be used for measuring the above x1、x2、y1And y2The material of the bottom plate may be glass and/or plastic, for example. Preferably, for convenience of marking, the bottom plate is made of plastic.
In the present invention, the shape and size of the base plate are not particularly limited as long as they can be used for measuring the distance between the point to be measured on the glass substrate and the X-axis and the Y-axis on the base plate, and in a preferred case, the base plate is rectangular and has a size not smaller than that of the glass substrate, and/or the size not smaller than that of the glass substrate after heat treatment.
In the present invention, the sources of the glass substrate and the base plate are not particularly limited, and they can be obtained by a conventional commercially available method.
According to the present invention, in step (1), the origin O' is preferably located at the center of the base plate.
Preferably, when the base plate has a rectangular shape, in step (1), the X-axis is parallel to a long side or a short side of the base plate.
In the present invention, the method of marking the origins O ' and a ' on the base plate is not particularly limited as long as the position of the origin O ' can be clearly displayed, and for example, in the step (1), the method of marking the origins O ' and a ' on the base plate is laser dotting and/or sandpaper marking, preferably laser dotting.
Preferably, the origin O' is marked in the form of a cross to facilitate the determination of the glass substrate and/or backplane placement direction.
Similarly, in the step (2), the origin O may be marked on the glass substrate by laser dotting and/or sandpaper marking, preferably by laser dotting. Preferably, the origin O is marked in the form of a cross to facilitate determination of the glass substrate and/or backplane placement direction.
In the present invention, the laser dotting can be realized by a conventional laser dotting instrument.
In the present invention, the method of calibrating the X-axis and the Y-axis on the base plate is not particularly limited as long as the positions of the X-axis and the Y-axis can be clearly displayed. Preferably, in step (1), the calibration is performed by laser scribing and/or sand paper scribing, preferably laser scribing. The laser scribing calibration can be realized by a conventional laser scribing instrument.
In the present invention, the fixing method is not particularly limited as long as the origin O of the glass substrate and the origin O 'on the base plate can be kept coincident with each other and the relative position therebetween can be kept constant, and for example, the relative position between the glass substrate and the base plate can be kept constant by coinciding the direction of intersection of the cross of the origin O with the direction of intersection of the cross of the origin O'. Preferably, in step (2), the fixing is performed by using an optical precision positioning device.
In the present invention, x can be obtained by a measurement method conventionally used in the art1、x2、y1And y2Preferably, in step (3), the measurement is by optical measurement.
In the present invention, the manner of marking the point a 'to be measured on the bottom plate is not particularly limited as long as the position of the point a' to be measured can be clearly displayed. In a preferred case, in step (3), the point a' to be measured is marked on the base plate by laser dotting and/or sand paper marking, preferably laser dotting.
Similarly, in step (3), the way of marking the point a to be measured on the glass substrate may also be laser dotting and/or sand paper marking, preferably laser dotting.
According to the present invention, the conditions of the heat treatment are not particularly limited, and may be any heat treatment process that is experienced in the production or manufacturing process of a glass substrate, and in a preferable case, in step (4), the conditions of the heat treatment include: the heating rate is 30-60 ℃/min, the heat treatment temperature is 400-. More preferably, in step (4), the heat treatment conditions include: the heating rate is 50-60 ℃/min, the heat treatment temperature is 400-.
In a preferred embodiment of the present invention, the heat treatment comprises the steps of:
(R1) warming from room temperature (25 ℃) to T1 and holding at T1;
(R2) cooling from T1 to T2, then cooling in air (air cooling) to room temperature (25 ℃);
wherein, in the step (R1), the temperature rising rate is 30-60 ℃/min, preferably 50-60 ℃/min; the T1 is 400-700 ℃, preferably 400-600 ℃; the heat preservation time is 40-80s, preferably 40-60 s;
in the step (R2), the cooling rate is 30-60 ℃/min, preferably 50-60 ℃/min; the T2 is 200 ℃ to 300 ℃, preferably 220 ℃ to 280 ℃.
In the present invention, in step (5), reference may be made to the measurement manner described in step (3), and details are not repeated here.
According to the invention, the method further comprises the steps of:
(S1) measuring the distance L between the point A to be measured and the origin O on the glass substrate before the heat treatment1；
(S2) measuring the distance L between the point A to be measured and the origin O on the glass substrate after the heat treatment2；
(S3) determining the linear shrinkage rate alpha of the glass substrate by the formula (III)Thread；
In a preferred embodiment of the present inventionIn the embodiment of (1), in step (1), the X axis and the Y axis are divided into equal parts to form grids on the substrate, and the intersection of any one grid is used as a coordinate point a' (as shown in fig. 1). In FIG. 1, A'1、A’2、A’3And A'4Respectively showing a coordinate point selected in each of the four regions of the base plate; o' denotes the origin of the mark on the base plate.
In a preferred case, the dividing manner of the equal parts is laser scribing.
In the present invention, the length and width of the mesh are the same and/or different. Preferably, the length of the grid is greater than or equal to the width of the grid. More preferably, the length of the grid is 200-600mm, preferably 300-500 mm; the width is 200-600mm, preferably 300-500 mm.
According to the invention, the glass substrate can be a glass substrate for a display, preferably a TFT-LCD glass substrate, an OLED glass substrate or an LTPS glass substrate.
The present invention will be described in detail below by way of examples. In the following examples, unless otherwise specified, each material and reagent was commercially available and each method was a method which was conventional in the art.
Example 1
This example is for explaining the method of evaluating the thermal shrinkage of a glass substrate provided by the present invention.
(1) Preparation of the base plate
According to the size of a glass substrate to be measured (TFT-LCD G40.5mm glass substrate purchased from Corning company and having the size of 830mm multiplied by 650mm), a rectangular bottom plate which is larger than the glass substrate in size and is made of plastic is prepared, a laser dotter is used for marking an original point O 'in a cross form at the center of the bottom plate, then a laser scribing instrument is used for marking an X axis and a Y axis which are perpendicular to each other through the original point O', the glass substrate to be measured is divided into four areas, wherein the X axis is parallel to the long edge of the bottom plate, and the X axis and the Y axis are divided into equal parts respectively so as to form grids on the bottom plate. The grid is rectangular, the length and width of which are both 200mm, and one intersection of the grid is taken as a coordinate point a'.
(2) Measurement of shrinkage ratio of glass substrate
Marking an original point O in a cross form at the center of the glass substrate to be detected by using a laser dotting instrument, superposing the original point O on the glass substrate to be detected and an original point O' on the bottom plate, and fixing the relative position of the glass substrate and the bottom plate by using an optical precision positioning device. Then, marking a point A to be measured on the glass substrate, coinciding the point A with the coordinate point A', and respectively measuring the distance x between the point A to be measured and the Y axis1Distance y between point A to be measured and X axis1And the distance L between the point A to be measured and the origin O1。
Carrying out heat treatment on the glass substrate to be detected, wherein the heat treatment conditions are as follows: heating from room temperature (25 ℃) to 700 ℃ at a heating rate of 30 ℃/min, preserving heat for 80s, then cooling to 250 ℃ at a cooling rate of 40 ℃/min, and then cooling to room temperature (25 ℃). The origin O of the glass substrate after heat treatment is superposed on the origin O' on the base plate, and the relative position of the glass substrate and the base plate is fixed using an optical precision positioning device. Respectively measuring the distance x between the points A and Y on the glass substrate after heat treatment2And the distance Y between the point A to be measured and the Y axis2And the distance L between the point A to be measured and the origin O2。
Determining the difference Delta alpha of the axial shrinkage rates of the glass substrate by the formula (I)Shaft：
Determining the surface shrinkage rate alpha of the glass substrate by the formula (II)Noodle：
Wherein, Δ x ═ x1-x2；△y＝y1-y2；△αShaftAnd alphaNoodleIn ppm.
Determining the linear shrinkage rate alpha of the glass substrate by the formula (III)Thread；
Wherein alpha isThreadIn ppm.
As shown in FIG. 1, four regions of the base plate are marked with one coordinate point (A'1、A’2、A’3And A'4) Respectively corresponding to four points to be measured (A respectively) on the glass substrate to be measured1、A2、A3And A4) Respectively obtaining the points A to be measured according to the method and the calculation formula1、A2、A3And A4Delta alpha ofShaft、αNoodleAnd alphaThreadMeasured 5 times per point to be tested to obtain the average value of the test results
And Relative Standard Deviation (RSD), which is calculated as follows:
wherein,
n is an average value of 5.
The results are shown in Table 1.
TABLE 1
Example 2
This example is intended to illustrate the method of evaluating shrinkage of a glass substrate according to the present invention.
The procedure was followed as in example 1, except that the glass substrate to be tested was a TFT-LCD G60.4mm glass substrate (available from Corning Inc., size 1800 mm. times.1500 mm), and a plastic backplane having a size larger than that of the glass substrate to be tested was selected accordingly; in the step (1), the grid is rectangular, the length of the grid is 500mm, and the width of the grid is 300 mm; in the step (2), the heat treatment conditions are as follows: raising the temperature from room temperature (25 ℃) to 400 ℃ at a heating rate of 60 ℃/min, preserving the temperature for 40s, then reducing the temperature to 250 ℃ at a cooling rate of 50 ℃/min, and then cooling the mixture to room temperature (25 ℃).
Four regions of the base plate are each marked with a coordinate point (A'5、A’6、A’7And A'8) Respectively corresponding to four points to be measured (A respectively) on the glass substrate to be measured5、A6、A7And A8) Respectively obtaining the points A to be measured according to the method and the calculation formula5、A6、A7And A8Delta alpha ofShaft、αNoodleAnd alphaThreadMeasured 5 times per point to be tested to obtain the average value of the test results
And Relative Standard Deviation (RSD). The results are shown in Table 2.
TABLE 2
Example 3
This example is intended to illustrate the method of evaluating shrinkage of a glass substrate according to the present invention.
The procedure is as in example 1, except that the glass substrate to be tested is a TFT-LCD G8.50.5mm glass substrate (available from Corning Corp., size 2500 mm. times.2200 mm) and, correspondingly, a plastic base plate having a size larger than that of the glass substrate to be tested is selected; in the step (1), the grid is rectangular, the length of the grid is 500mm, and the width of the grid is 400 mm; in the step (2), the heat treatment conditions are: heating from room temperature (25 ℃) to 600 ℃ at a heating rate of 50 ℃/min, preserving heat for 60s, then cooling to 250 ℃ at a cooling rate of 60 ℃/min, and then cooling to room temperature (25 ℃).
Four regions of the base plate are each marked with a coordinate point (A'9、A’10、A’11And A'12) Respectively corresponding to four points to be measured (A respectively) on the glass substrate to be measured9、A10、A11And A12) Respectively obtaining the points A to be measured according to the method and the calculation formula9、A10、A11And A12Delta alpha ofShaft、αNoodleAnd alphaThreadMeasured 5 times per point to be tested to obtain the average value of the test results
And Relative Standard Deviation (RSD). The results are shown in Table 3.
TABLE 3
Example 4
This example is intended to illustrate the method of evaluating shrinkage of a glass substrate according to the present invention.
The procedure was followed as in example 1, except that the glass substrate to be tested was a TFT-LCD G110.5mm glass substrate (available from Corning Inc., dimension 3320 mm. times.3000 mm) and a plastic base plate having a dimension larger than that of the glass substrate to be tested was selected accordingly; in the step (1), the grid is rectangular, and the length and the width of the grid are both 600 mm; in the step (2), the heat treatment conditions are: heating from room temperature (25 ℃) to 600 ℃ at a heating rate of 40 ℃/min, preserving heat for 70s, then cooling to 250 ℃ at a cooling rate of 30 ℃/min, and then cooling to room temperature (25 ℃).
Four regions of the base plate are each marked with a coordinate point (A'13、A’14、A’15And A'16) Respectively corresponding to four points to be measured (A respectively) on the glass substrate to be measured13、A14、A15And A16) Respectively obtaining the points A to be measured according to the method and the calculation formula13、A14、A15And A16Delta alpha ofShaft、αNoodleAnd alphaThreadMeasured 5 times per point to be measured to obtain a measurementAverage of test results
And Relative Standard Deviation (RSD). The results are shown in Table 4.
TABLE 4
From the results of examples 1-4 above, it can be seen that the present invention utilizes coordinate axis calibration to match the difference Δ α between the axial shrinkage ratesShaftSurface shrinkage factor alphaNoodleAnd linear shrinkage factor alphaThreadThe measurement of the index realizes the comprehensive evaluation of the thermal shrinkage condition of the glass substrate; and, the Δ α measured by the method of the present inventionShaft、αNoodleAnd alphaThreadThe RSD values of the results are all less than 5%, indicating that the process of the invention has good stability.
In addition, in the process of evaluating the shrinkage of the glass substrate, the invention prepares the bottom plate marked with the original point and divided into areas (by calibrating the X axis and the Y axis), and preferably, the invention divides the bottom plate into grids, selects any grid intersection point in each area as a coordinate point, and uses the bottom plate as a reference, so that the thermal shrinkage condition of each area of the glass substrate can be observed and analyzed more intuitively, and the problem of uneven thermal shrinkage of the glass substrate and the comparative analysis among different glass substrates can be reflected more favorably. Particularly, the bottom plate can be repeatedly used, so that the evaluation process is simplified, the evaluation time is shortened, the defect that a small-size glass strip sample needs to be repeatedly prepared in the prior art is overcome, and the bottom plate has a good application prospect in the actual industrial production process.
In addition, as can be seen by comparing the results of examples 1 and 4 with those of examples 2 and 3, the RSD values of the results of evaluating the shrinkage of the TFT-LCD G6 and G8 glass substrates using the method of the present invention are smaller than those of the TFT-LCD G4 and G11 glass substrates, which indicates that the method of the present invention is more suitable for evaluating the shrinkage of the TFT-LCD G6 and G8 glass substrates.
The preferred embodiments of the present invention have been described above in detail, but the present invention is not limited thereto. Within the scope of the technical idea of the invention, many simple modifications can be made to the technical solution of the invention, including combinations of various technical features in any other suitable way, and these simple modifications and combinations should also be regarded as the disclosure of the invention, and all fall within the scope of the invention.
Claims (31)
1. A method of evaluating thermal shrinkage of a glass substrate, the method comprising the steps of:
(1) preparing a bottom plate according to the size of a glass substrate, marking an original point O ' on the bottom plate, then calibrating an X axis and a Y axis which are perpendicular to each other through the original point O ', and marking a coordinate point A ' on the bottom plate;
(2) marking an origin O on the glass substrate, overlapping the origin O on the glass substrate with the origin O' on the bottom plate, and fixing the relative position of the glass substrate and the bottom plate;
(3) marking a point A to be measured on the glass substrate, overlapping the points A and A', and respectively measuring the distance x between the point A to be measured and the Y axis1And the distance y between the point A to be measured and the X axis1；
(4) Carrying out heat treatment on the glass substrate, superposing the origin O of the glass substrate subjected to heat treatment with the origin O' on the bottom plate, and fixing the glass substrate and the bottom plate according to the relative position in the step (2);
(5) respectively measuring the distance x between the points A and Y on the glass substrate after heat treatment2And the distance Y between the point A to be measured and the Y axis2；
(6) According to x1、x2、y1And y2Determining the difference Delta alpha of the axial shrinkage rates of the glass substrateShaftAnd/or area shrinkage alphaNoodle；
In the step (1), dividing the X axis and the Y axis equally by adopting a laser scribing mode respectively to form grids on a bottom plate, and taking the intersection point of any one grid as a coordinate point A'; the length of the grid is 200-600 mm; the width is 200-600 mm.
2. The method according to claim 1, wherein in step (6), the difference Δ α in the axial shrinkage rate of the glass substrate is determined by formula (I)ShaftAnd/or determining the area shrinkage alpha of the glass substrate by formula (II)Noodle；
Wherein, Δ x ═ x1-x2；△y＝y1-y2。
3. The method as claimed in claim 1, wherein the glass substrate is rectangular and has a long side of 830-3320 mm; the short side is 650-3000 mm.
4. The method as claimed in claim 1, wherein the glass substrate is rectangular and the long side of the glass substrate is 1800-2500 mm; the short side is 1500-2200 mm.
5. The method of claim 1, wherein the base plate is rectangular and has a size not smaller than that of the glass substrate.
6. The method of claim 1, wherein in step (1), the origin O' is located at the center of the base plate.
7. The method of claim 1, wherein in step (1), the X-axis is parallel to a long side or a short side of the base plate.
8. Method according to claim 1, characterized in that in step (1) the origin points O ', a' are marked on the base plate by means of laser dotting and/or sand paper marking.
9. The method of claim 1, wherein in step (1), the origin points O ', a' are marked on the base plate by laser dotting.
10. The method according to claim 1, wherein in step (1), the origin O' is marked in the form of a cross.
11. The method according to claim 1, wherein in step (1), the calibration is performed by laser scribing and/or sand paper scribing.
12. The method according to claim 1, wherein in step (1), the calibration is performed by laser scribing.
13. The method according to claim 1, wherein in step (2), the origin O is marked on the glass substrate by laser dotting and/or sand paper marking.
14. The method according to claim 1, wherein in step (2), the origin O is marked on the glass substrate by laser dotting.
15. The method of claim 1, wherein in step (2), the origin O is marked in the form of a cross.
16. The method of claim 1, wherein in step (2), the fixing employs an optical precision positioning device.
17. The method according to claim 1, wherein in step (3), the measurement is by optical measurement.
18. The method according to claim 1, characterized in that in step (3), the points A to be measured are marked by laser dotting and/or sand paper marking.
19. The method according to claim 1, wherein in step (3), the point A to be measured is marked by laser dotting.
20. The method according to claim 1, wherein in step (4), the conditions of the heat treatment include: the heating rate is 30-60 ℃/min, the heat treatment temperature is 400-.
21. The method according to claim 1, wherein in step (5), the measurement is by optical measurement.
22. The method according to any one of claims 1-21, characterized in that the method further comprises the steps of:
(S1) measuring the distance L between the point A to be measured and the origin O on the glass substrate before the heat treatment1；
(S2) measuring the distance L between the point A to be measured and the origin O on the glass substrate after the heat treatment2；
(S3) determining the linear shrinkage rate alpha of the glass substrate by the formula (III)Thread；
23. The method as claimed in claim 1, wherein the length of the mesh is 300-500 mm; the width is 300-500 mm.
24. The method of any one of claims 1-21, wherein the glass substrate is a display glass substrate.
25. The method of any one of claims 1-21, wherein the glass substrate is a TFT-LCD glass substrate, an OLED glass substrate, or an LTPS glass substrate.
26. The method of claim 22, wherein the glass substrate is a glass substrate for a display.
27. The method of claim 22, wherein the glass substrate is a TFT-LCD glass substrate, an OLED glass substrate, or an LTPS glass substrate.
28. The method of claim 23, wherein the glass substrate is a glass substrate for a display.
29. The method of claim 23, wherein the glass substrate is a TFT-LCD glass substrate, an OLED glass substrate, or an LTPS glass substrate.
30. The method of claim 23, wherein the glass substrate is a glass substrate for a display.
31. The method of claim 23, wherein the glass substrate is a TFT-LCD glass substrate, an OLED glass substrate, or an LTPS glass substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710494719.9A CN107228876B (en) | 2017-06-26 | 2017-06-26 | Method for evaluating thermal shrinkage of glass substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710494719.9A CN107228876B (en) | 2017-06-26 | 2017-06-26 | Method for evaluating thermal shrinkage of glass substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107228876A CN107228876A (en) | 2017-10-03 |
| CN107228876B true CN107228876B (en) | 2021-01-12 |
Family
ID=59935659
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710494719.9A Active CN107228876B (en) | 2017-06-26 | 2017-06-26 | Method for evaluating thermal shrinkage of glass substrate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107228876B (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108152324B (en) * | 2018-01-31 | 2021-04-13 | 彩虹显示器件股份有限公司 | Method for testing thermal shrinkage of glass |
| CN108519402B (en) * | 2018-03-28 | 2020-12-22 | 北京工业大学 | Device and method for measuring re-heating wire shrinkage rate of ultrathin glass by laser method |
| CN108675633A (en) * | 2018-07-24 | 2018-10-19 | 彩虹显示器件股份有限公司 | A kind of electronic glass and its shrinking percentage test method of low-shrinkage |
| CN109187623A (en) * | 2018-08-01 | 2019-01-11 | 彩虹显示器件股份有限公司 | A method of measurement base plate glass shrinking percentage |
| CN109239125B (en) * | 2018-08-07 | 2022-03-22 | 东旭光电科技股份有限公司 | Thermal shrinkage rate measuring method |
| CN109725019A (en) * | 2018-12-29 | 2019-05-07 | 东旭集团有限公司 | Detection device, measuring system and the measurement method that base plate glass is heat-shrinked |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06144856A (en) * | 1992-11-06 | 1994-05-24 | Asahi Glass Co Ltd | Method for measuring very small amount of thermal shrinkage of plate glass |
| US5399016A (en) * | 1991-10-21 | 1995-03-21 | Institut Francais Du Petrole | Device and method for continuously and non-destructively monitoring variation in the thickness of shaped sections |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004333355A (en) * | 2003-05-09 | 2004-11-25 | Sumitomo Chem Co Ltd | Line width measuring method |
| JP2007230817A (en) * | 2006-02-28 | 2007-09-13 | Nippon Sheet Glass Co Ltd | Float glass and its manufacturing method as well as panel for display using the float glass |
| CN102346157A (en) * | 2011-06-25 | 2012-02-08 | 潍坊恒联玻璃纸有限公司 | Method for measuring thermal shrinkage performance of glass paper |
| CN103308548A (en) * | 2013-07-06 | 2013-09-18 | 国家烟草质量监督检验中心 | Measuring method of thermal shrinkage rate of cigarette packaging film |
| CN205038089U (en) * | 2015-08-21 | 2016-02-17 | 四川烟草工业有限责任公司 | Packaging film sample processing apparatus |
| CN105527313B (en) * | 2015-12-30 | 2019-01-11 | 东旭科技集团有限公司 | The measuring method of also retract rate |
| CN105973927A (en) * | 2016-05-03 | 2016-09-28 | 芜湖东旭光电装备技术有限公司 | Method for determining shrinkage rate of glass |
-
2017
- 2017-06-26 CN CN201710494719.9A patent/CN107228876B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5399016A (en) * | 1991-10-21 | 1995-03-21 | Institut Francais Du Petrole | Device and method for continuously and non-destructively monitoring variation in the thickness of shaped sections |
| JPH06144856A (en) * | 1992-11-06 | 1994-05-24 | Asahi Glass Co Ltd | Method for measuring very small amount of thermal shrinkage of plate glass |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107228876A (en) | 2017-10-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107228876B (en) | Method for evaluating thermal shrinkage of glass substrate | |
| KR101319730B1 (en) | Method of manufacturing photomask, lithography apparatus, method and apparatus for inspecting photomask | |
| US10094792B2 (en) | Method for analysis of thermal resistance | |
| WO2016155190A1 (en) | Substrate detecting device and bulge height detecting method | |
| US20100096539A1 (en) | Calibration plate and calibration method | |
| WO2017114098A1 (en) | Display substrate motherboard, manufacturing and detection method therefor and display panel motherboard | |
| TWI749227B (en) | Inspection system and temperature measurement method in inspection system | |
| CN106502058B (en) | Scaling method and caliberating device | |
| TWI512276B (en) | Method of measuring optical axis of light-emitting diode module | |
| WO2016192314A1 (en) | Method for manufacturing alignment identifier of spacer, method for detecting position accuracy, and color filter and manufacturing method thereof | |
| CN102749064A (en) | Method and device for measuring backboard planeness of liquid crystal display device | |
| CN104931238A (en) | Device and method for testing transparent effect of transparent display substrate | |
| CN103134806A (en) | Inspecting device of substrate membrane-forming | |
| CN100455445C (en) | Apparatus for measuring the physical properties of a surface and a pattern generating apparatus | |
| CN114235885A (en) | Thermal expansion real-time measurement method based on temperature-sensitive fluorescent speckle and DIC measurement technology | |
| US10359554B2 (en) | Attaching device | |
| EP2400262A1 (en) | Method for inspecting quality of glass plate and quality inspection program | |
| CN111837072B (en) | Method for determining leakage of adhesive from polarizing plate or leakage degree of adhesive | |
| CN109239125B (en) | Thermal shrinkage rate measuring method | |
| US9310176B2 (en) | Method of measuring flatness of chamfering table | |
| CN111721255A (en) | Flatness detection method and system | |
| JP6838393B2 (en) | Glass substrate inspection method and manufacturing method | |
| CN206563550U (en) | Device for the high-precision dimensional measurement of finding | |
| CN110109945B (en) | AOI detection method and device applied to substrate, storage medium and AOI detection equipment | |
| TWI307426B (en) | Carrier and electrical apparatus and manufacturing process thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20200911 Address after: 050035 No. 9, the Yellow River Avenue, hi tech Zone, Hebei, Shijiazhuang Applicant after: DONGXU OPTOELECTRONIC TECHNOLOGY Co.,Ltd. Address before: The 100075 Beijing Seahawks Fengtai District Science City Road No. 9 Building No. 2 room 266 (Park) Applicant before: TUNGHSU TECHNOLOGY GROUP Co.,Ltd. Applicant before: TUNGHSU GROUP Co.,Ltd. |
|
| GR01 | Patent grant | ||
| GR01 | Patent grant |