CN107168015B - A kind of immersion liquid limiting mechanism and temperature-compensation method - Google Patents
A kind of immersion liquid limiting mechanism and temperature-compensation method Download PDFInfo
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- CN107168015B CN107168015B CN201610113097.6A CN201610113097A CN107168015B CN 107168015 B CN107168015 B CN 107168015B CN 201610113097 A CN201610113097 A CN 201610113097A CN 107168015 B CN107168015 B CN 107168015B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
Abstract
The invention discloses a kind of immersion liquid limiting mechanism and temperature-compensation methods, the immersion liquid limiting mechanism includes submergence head, it is successively arranged from outside to inside on submergence head for the gentle liquid reclaiming chamber of air cavity, it is connected to for air cavity with the first air feed equipment, it is used to form the gas curtain to immersion liquid sealing, gas-liquid reclaiming chamber includes the inner chamber body being coaxially disposed from the inside to the outside and outer chamber, inner chamber body is connected to by exhaust pipe with gas-liquid reclaimer, for pump drainage gas-liquid mixture, outer chamber is connected to by air inlet pipe with the second air feed equipment, the gas and inner chamber body outer wall that second air feed equipment provides, heat release is condensed after the contact of outer chamber inner wall.The present invention by be passed through in outer chamber condensed gas to inner chamber body carry out can comprehensive thermal compensation, and carry out thermal compensation directly on inner layer wall, reduce thermal resistance, increase thermal compensation area, improve efficiency;Inner chamber body and other positions are thermally isolated outer chamber simultaneously, reduce the refrigeration work consumption that refrigeration " cold source " acts on remaining position.
Description
Technical field
The present invention relates to photoetching machine technique fields, and in particular to a kind of immersion liquid limiting mechanism and temperature-compensation method.
Background technique
Based on optical lithography, it accurately projects the figure on mask plate modern lithographic equipment using optical system
It is exposed on the substrate (such as substrate) of coated photoresist.Liquid immersion lithography refer between exposure cameras and substrate full of water (or
The immersion liquid of higher refraction) to replace corresponding air in conventional dry photoetching technique.Since the refractive index of water is bigger than air,
The numerical aperture of lens group can be made to increase, and then can get smaller characteristic line breadth.
The structure of existing immersed photoetching machine as shown in Figure 1, in the apparatus, main frame 1 ' support a lighting system 2 ',
One projection objective 4 ' and a base station 8 ' place a substrate 7 ' for being coated with light sensitive photoresist in base station 8 '.The liquid immersion lithography
Immersion liquid (such as water) 5 is filled between projection objective 4 ' and substrate 7 ' in gap by machine.When work, base station 8 ' drives substrate 7 ' to make
The scanning of high speed, stepwise operation, immersion liquid limiting mechanism includes the motion state according to base station 8 ', in the visual field of projection objective 4 '
Range provides a stable apparatus soaking liquid flow field, while guaranteeing that apparatus soaking liquid flow field is isolated from the outside world, and guarantees that liquid does not leak.Mask plate
The figure of integrated circuit is transferred to through lighting system 2 ', projection objective 4 ' and apparatus soaking liquid flow field in a manner of Imagewise exposure on 3 '
It is coated in the substrate 7 ' of light sensitive photoresist, completes exposure process.The immersion system working principle that the immersed photoetching machine is related to is such as
Shown in Fig. 2, by the submergence head 6 ' in immersion liquid limiting mechanism, immersion liquid 5 ' is limited in gap between projection objective 4 ' and substrate 7 '
It is interior.Liquid supply equipment 9 ' is also set up in the immersed photoetching machine, supplies immersion liquid 5 ' to submergence head 6.Liquid is equipped in liquid supply equipment 9 '
Body pressure, flow controlling unit, in a certain range by the pressure of immersion liquid supply, flow restriction;Furthermore in liquid supply equipment 9 '
Be arranged water pollution processing unit, by pollution in water handle to meet immersion liquid pollution require;Temperature control is additionally provided in liquid supply equipment 9 '
Unit processed, by water supply handle to meet dip temperature requirement.It is additionally provided with air feed equipment 10 ' in the immersed photoetching machine and gas-liquid is returned
Receiving unit 11 ', for the compensation of ultra-clean humid air and gas-liquid recycling.It is equipped in air feed equipment 10 ' and gas-liquid reclaimer 11 '
Ultra-clean humid air pressure, flow controlling unit, within limits by the pressure of gas supply, flow control;Air feed equipment 10 '
With gas-liquid pressure recovery, flow controlling unit are additionally provided in gas-liquid reclaimer 11 ', by gas-liquid recycle pressure and flow control
Within limits;Ultra-clean humid air contamination control list is additionally provided in air feed equipment 10 ' and gas-liquid reclaimer 11 '
Member handles pollution in ultra-clean humid air to meeting the requirements;It is additionally provided in air feed equipment 10 ' and gas-liquid reclaimer 11 '
Ultra-clean humid air temperature and humidity control unit, by ultra-clean humid air handle to meet temperature and humidity requirement.
The general structure of existing immersion liquid limiting mechanism is as shown in Fig. 2, the outer profile form of submergence head 6 ' is different, but inner wheel
Exterior feature is substantially and the matched pyramidal structure of lens geometry shape.The immersion liquid 5 ' that liquid supply equipment 9 ' supplies passes through in submergence head 6 '
Gap between projection objective 4 ' and substrate 7 ' is filled after the outflow of immersion liquid supply channel, immersion liquid 5 ' is returned by the immersion liquid in submergence head 6 '
After receiving runner outflow, recycled by gas-liquid reclaimer 11 '.Immersion liquid 5 ' forms leaching between projection objective 4 ' and substrate 7 ' in slit
Liquid stream field, it is desirable that the liquid in apparatus soaking liquid flow field is in constant flow state, no reflux, and the ingredient of liquid, pressure field, speed
Field, temperature field transient state and stable state variation are respectively less than a certain range.
As seen from Figure 2, there are the gap of certain altitude, in order to prevent immersion liquid between the lower surface and substrate 7 ' of submergence head 6 '
Immersion liquid 5 ' in flow field is leaked from this gap, air feed equipment 10 ' by supply air line 622 ' to submergence head 6 ' in for air cavity
621 ' supply compressed airs, as shown in Fig. 2, compressed air is after for buffering in air cavity 621 ', by for 621 ' bottom of air cavity
Air supply opening 620 ' sprays, and forms " air knife " towards substrate surface." air knife ", which forms, stops immersion liquid 5 ' in apparatus soaking liquid flow field to leak
Gas " curtain ", the gas-liquid mixture at apparatus soaking liquid flow field edge by 630 ' pump drainage of gas-liquid pump drainage mouth into gas-liquid reclaiming chamber 631 ', gas
Liquid mixture after buffering, pumps out submergence head through pump drainage pipeline 632 ' by gas-liquid reclaimer 11 ' in gas-liquid reclaiming chamber 631 '
6 ', to realize the sealing effect of apparatus soaking liquid flow field.
In order to guarantee sealing effect, " air knife " air demand and gas-liquid pump drainage negative pressure are larger, pump drainage flow and flow rate equally compared with
Greatly, since " air knife " air demand is larger, the gas in gas-liquid mixture is in undersaturated condition, since pump drainage flow velocity is larger, gas
Liquid mixture is flowed in gas-liquid reclaiming chamber 631 ' and 632 ' inside vortex of pump drainage pipeline, and the big drop in gas-liquid mixture is in pump drainage mistake
Cheng Zhonghui is constantly mutually collided or the collision with wall with gas-liquid reclaiming chamber 631 ', the big liquid in collision process in gas-liquid mixture
Drop is converted into droplet, and droplet keeps mutual collision, and part droplet can be atomized to direct evaporation, some is small
Drop keeps with the collision with wall of gas-liquid reclaiming chamber 631 ' and forms liquid film, thin liquid in the wall surface of gas-liquid reclaiming chamber 631 '
Film continues to evaporate during pump drainage.Due to 5 ' palpus sustainable supply of immersion liquid and pump drainage, so in the inside of gas-liquid reclaiming chamber 631 '
Liquid evaporation persistently occurs for wall surface.Immersion liquid 5 ' must constantly absorb the latent heat of vaporization during evaporative phase-change;For example, in an atmosphere
Pressure, the water of 1kg, which becomes steam, will absorb the heat of 2256kJ.
The continuous evaporation endothermic of immersion liquid will make to submerge the decline of 6 ' temperature of head, through testing, when without temperature-compensating, and gas
Sweat cooling in liquid removal process will lead to submergence 6 ' temperature of head and decline 1 DEG C or more, and local temperature decline can be more than 2 DEG C.Leaching
It not will affect the temperature stability of immersion liquid 5 ' after the decline of 6 ' temperature of head, to influence the refractive index of immersion liquid 5 ', and then finally influence
Equipment exposure performance.
In view of the above-mentioned problems, existing method arranges several resistance type heaters or electric heater in the structure of submergence head
Or temperature sensor etc. carries out temperature control and compensation.However at least there are following several respects in above scheme: first is that submergence
No enough spaces are used to arrange enough heaters, temperature sensor and its lead on head;Second is that single heater is only
Controllable submergence head " single-point " temperature, it is difficult to realize submergence head bulk temperature uniformity;Third is that cannot be preferably by cold source (i.e. gas
Liquid reclaiming chamber) it is isolated with other components, it is difficult to prevent " cold draining ";Fourth is that between heater and the wall surface of gas-liquid reclaiming chamber thermal resistance compared with
Greatly, it is difficult to realize direct temperature-compensating, thermal compensation inefficiency.
Summary of the invention
The present invention provides a kind of immersion liquid limiting mechanism and temperature-compensation methods, to solve the above technical problems.
In order to solve the above-mentioned technical problem, the technical scheme is that a kind of immersion liquid limiting mechanism, is set to projection objective
Between substrate, including head is submerged, is successively arranged from outside to inside on the submergence head for the gentle liquid reclaiming chamber of air cavity, the gas supply
Chamber is connected to the first air feed equipment, is used to form the gas curtain to immersion liquid sealing, and the gas-liquid reclaiming chamber includes from the inside to the outside
The inner chamber body and outer chamber of coaxial arrangement, the inner chamber body are connected to by exhaust pipe with gas-liquid reclaimer, and pump drainage gas-liquid is used for
Mixture, the outer chamber are connected to by air inlet pipe with the second air feed equipment, the gas and institute that second air feed equipment provides
Heat release is condensed after stating inner chamber body outer wall, the contact of outer chamber inner wall.
Further, the air inlet pipe is sheathed on the exhaust pipe periphery.
Further, second air feed equipment includes sequentially connected compressed air supply arrangement, humidifier and adjusting
Compressed air after humidification is passed through in the outer chamber by valve.
Further, escape pipe is additionally provided on the outer chamber, the escape pipe is connected to the gas-liquid by negative pressure valve and returns
Receiving unit.
Further, second air feed equipment includes sequentially connected condensed gas supply arrangement and regulating valve, will be cold
Solidifying gas is passed through in the outer chamber.
Further, escape pipe is additionally provided on the outer chamber, the escape pipe is connected to the condensing gas by negative pressure valve
Body supply arrangement.
Further, the air inlet pipe and an air outlet pipe is spaced apart.
Further, the gas supply rounded or rectangular or rectangle of opening or oblong or triangle, the gas supply are opened
The diameter or width of mouth is 0.1~0.2mm.
Further, several fins are equipped between the outer wall of the inner chamber body and the inner wall of the outer chamber, in described
Cavity provides radial support.
Further, the fin is distributed along the axis direction distribution for being parallel to the inner chamber body or twist.
Further, the condensed gas is vapor, hydrocarbon vapour, the mixture of hydrocarbon steam or ammonia steam.
Further, the circular in cross-section or polygon of the submergence head.
Further, the circular in cross-section or polygon for air cavity.
Further, it is described for air cavity be equipped with the gas supply slit that is connected to of the submergence head bottom surface, gas is from the gas supply
It is blown out in slit, forms gas curtain between the submergence head and the substrate, the width in the gas supply gap is 0.1~0.2mm.
Further, described to be equipped with several gas supply opening being connected to the submergence head bottom surface, the adjacent confession for air cavity
The distance between gas opening is 0.2~0.3mm.
Further, the longitudinal section of the inner chamber body and outer chamber is rounded or polygon.
Further, the cross section of the inner chamber body and outer chamber is rounded or polygon.
Further, the inner chamber body is equipped with the pump drainage slit being connected to the submergence head bottom surface, the pump drainage gap
Width is greater than 0.2mm.
Further, the inner chamber body is equipped with several pump drainages being connected to the submergence head bottom surface and is open, and the pump drainage is opened
The diameter or width of the rounded or rectangular or rectangle of mouth or oblong or triangle, the pump drainage opening is greater than 0.3mm.
Further, the submergence head is made of aviation aluminium or Steel material.
The present invention also provides a kind of temperature-compensation methods of immersion liquid limiting mechanism, in the pump drainage for extracting gas-liquid mixture
It is arranged condensation chamber except chamber, gas is passed through in condensation chamber, makes the outer wall of the gas and the pump drainage chamber, the condensation chamber
Heat release is condensed after inner wall contact.
Further, the flow direction of the flow direction of the condensation intracavity gas and the intracavitary gas-liquid mixture of the pump drainage
On the contrary, forming counterflow heat exchange.
Further, the gas is the compressed air after humidification.
Further, the gas is condensed gas.
Further, the condensed gas is vapor, hydrocarbon vapour, the mixture of hydrocarbon steam or ammonia steam.
The present invention provides a kind of immersion liquid limiting mechanism and temperature-compensation method, there is following advantages compared with prior art:
(1) the gas-liquid reclaiming chamber by setting including inner chamber body and outer chamber, inner chamber body are used for the pump drainage of gas-liquid mixture,
Outer chamber is supplied for condensed gas, is vulcanized by condensing exothermic method the inner chamber body that sweat cooling phenomenon occurs
Repay, outer chamber coat inner chamber body, can to inner chamber body carry out can comprehensive thermal compensation, increase the area of thermal compensation, improve
Thermal compensation efficiency;
(2) inner chamber body and other positions are thermally isolated outer chamber, reduce refrigeration " cold source " (i.e. inner chamber body) work
With the refrigeration work consumption on submergence remaining position of head;
(3) the condensation entrance of outer chamber is corresponding with the outlet port of inner chamber body, makes the flowing of condensed gas in outer chamber
On the contrary, forming counterflow heat exchange, realization is in the thermal compensation of non-uniform Distribution for the flow direction of gas-liquid mixture in direction and inner chamber body
The corresponding refrigeration work consumption in non-uniform Distribution of power greatly improves entire submergence temperature controlled uniformity;
(4) thermal compensation is carried out directly on inner layer wall, is reduced the thermal resistance on thermal compensation path, is substantially increased thermal compensation
Efficiency;
(5) electrical components such as multiple heaters and its lead are not used, improve the reliability of immersion liquid limiting mechanism.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of existing immersed photoetching machine;
Fig. 2 is the structural schematic diagram of existing immersion liquid limiting mechanism;
Fig. 3 is the structural schematic diagram of 1 immersion liquid limiting mechanism of the embodiment of the present invention;
Fig. 4 is the cross-sectional view at the A-A of Fig. 3;
Fig. 5 a, 5b are the structural schematic diagram of 1 gas-liquid reclaiming chamber of the embodiment of the present invention respectively;
Fig. 6 is the gas flow schematic diagram in the embodiment of the present invention 1 in gas-liquid reclaiming chamber;
Fig. 7 is the gas flow schematic diagram in the embodiment of the present invention 2 in gas-liquid reclaiming chamber.
Shown in Fig. 1-2: 1 ', main frame;2 ', lighting system;3 ' mask plates;4 ', projection objective;5 ', immersion liquid;6 ', it soaks
No head;620 ', air supply opening;621 ', for air cavity;622 ', supply air line;630 ', gas-liquid pump drainage mouth;631 ', gas-liquid reclaiming chamber;
632 ', pump drainage pipeline;7 ', substrate;8 ', base station;9 ', liquid supply equipment;10 ', air feed equipment;11 ', gas-liquid reclaimer;
Shown in Fig. 3-7: 4, projection objective;5, immersion liquid;6, head is submerged;62, for air cavity;621, air supply opening;63, gas-liquid is returned
Receive chamber;631, inner chamber body;632, outer chamber;633, gas-liquid pump drainage mouth;634, condensate outlet;635, entrance is condensed;636, internal layer
Wall;637, outer wall;638, fin;7, substrate;8, the second air feed equipment;9, gas-liquid reclaimer;10, exhaust pipe;11, air inlet
Pipe;12, humidifier;13, regulating valve;14, negative pressure valve;15, condensed gas supply arrangement;16, condensate liquid reclaimer.
Specific embodiment
The present invention is described in detail with reference to the accompanying drawing.
Embodiment 1
As shown in Figure 3-4, the present invention provides a kind of immersion liquid limiting mechanism, is set between projection objective 4 and substrate 7, according to
The motion state of base station provides a stable apparatus soaking liquid flow field in the field range of projection objective 4, while guaranteeing immersion liquid stream
Field is isolated from the outside world, and guarantees that liquid does not leak.This immersion liquid limiting mechanism includes submergence head 6, it is preferred that the cross of the submergence head 6
Section is rounded or polygon, and in the present embodiment, the cross section for submerging head 6 is square, as shown in Figure 4.On the submergence head 6
It is successively arranged from outside to inside for air cavity 62 and gas-liquid reclaiming chamber 63, i.e. gas-liquid reclaiming chamber 63 is located at the periphery for air cavity 62, described
For the outlet of air cavity 62 and the first air feed equipment (not marked in figure), and several confessions of underrun with the submergence head 6
Port 621 is connected to, and is used to form the gas curtain to immersion liquid sealing;The gas-liquid reclaiming chamber 63 includes interior to outsourcing coaxial arrangement
Inner chamber body 631 and outer chamber 632, wherein inner chamber body 631 is surrounded by inner layer wall 636, and outer chamber 632 is surrounded by outer wall 637,
The inner chamber body 631 is connected to by exhaust pipe 10 with gas-liquid reclaimer 9, and pump drainage gas-liquid mixture, the outer chamber 632 are used for
It is connected to by air inlet pipe 11 with the second air feed equipment 8, outside the gas of the offer of the second air feed equipment 8 and the inner chamber body 631
Heat release is condensed after wall, the contact of 632 inner wall of outer chamber.Specifically, inner chamber body 631 and the quantity of outer chamber 632 can for one or
Multiple, mutually indepedent between inner chamber body 631, each outer chamber 632 is corresponding with an inner chamber body 631, is coated on the inner chamber body 631
Outside is respectively used to the pump drainage of gas-liquid mixture by the way that the gas-liquid reclaiming chamber 63 including inner chamber body 631 and outer chamber 632 is arranged
It is supplied with condensed gas, thermal compensation, exocoel is carried out to the inner chamber body 631 that sweat cooling phenomenon occurs by condensing exothermic method
Body 632 coat inner chamber body 631, can to inner chamber body 631 carry out can comprehensive thermal compensation, increase the area of thermal compensation, improve
Thermal compensation efficiency.
Preferably, the circular in cross-section or polygon for air cavity 62, in the present embodiment, for the cross section of air cavity 62
Rounded, several air supply openings 621 are continuous type air supply opening, and form round or polygon in the bottom surface of the submergence head 6
Gap, be as shown in Figure 4 round gap, the width in the gap is 0.1~0.2mm.Several air supply openings 621 can also
Think that discrete type air supply opening, the distance between adjacent air supply opening 621 are 0.2~0.3mm, several air supply openings 621 are rounded
Or rectangular or rectangle or oblong or triangle, the diameter or width of the air supply opening 621 are 0.1~0.2mm.Specifically,
First air feed equipment to submergence head 6 in for 62 supply gas of air cavity, the gas is preferably compressed air, and compressed air is supplying
In air cavity 62 after buffering, the air supply opening 621 by supplying bottom of chamber portion sprays, and forms " air knife " towards substrate surface, stops leaching
Immersion liquid 5 in liquid stream field leaks.
Preferably, the cross section of the inner chamber body 631 and outer chamber 632 is rounded or polygon, interior in the present embodiment
The cross section of cavity 631 and outer chamber 632 is rounded, and the longitudinal section of inner chamber body 631 and outer chamber 632 is rounded or polygon
Shape is square in the present embodiment, and as shown in Figure 5 a, and the sectional area of inner chamber body 631 is the same as the ratio between the sectional area of outer chamber 632 perseverance
It is fixed, to guarantee that inner chamber body 631 runs through with the circulation path having the same of outer chamber 632 and continuous flow.As shown in figure 3, interior
Gas-liquid pump drainage mouth 633 is equipped with below cavity 631, the gas-liquid mixture for pump drainage submergence 6 edge of head.Preferably, the gas-liquid
Pump drainage mouth 633 can be continuous type gas-liquid pump drainage mouth, such as gap, and form round or polygon in the bottom surface of the submergence head 6
Gap, be as shown in Figure 3 round gap, the width in the gap is greater than 0.2mm.The gas-liquid pump drainage mouth 633 can also be with
For several rounded or rectangular or rectangle or oblong or the opening of triangle, the diameter or width of the opening is greater than
0.3mm。
With continued reference to Fig. 6, further, the outlet of the inner chamber body 631 and the entrance of gas-liquid reclaimer 9 pass through pump drainage
Pipe 10 is connected to, and the condensation entrance 635 of the outer chamber 632 is connect with the second air feed equipment 8 by air inlet pipe 11, the air inlet pipe
11 are sheathed on 10 periphery of exhaust pipe, and certain air inlet pipe 11 can also be set to the side of the exhaust pipe 10, it is preferred that described the
Humidifier 12 and regulating valve 13 are also sequentially connected between two air feed equipments 8 and the air inlet pipe 11.It is also set on the outer chamber 632
There is the condensate outlet 634 being spaced apart with condensation entrance 635, the condensate outlet 634 is equipped with escape pipe, and the escape pipe passes through
Negative pressure valve 14 is connected to the gas-liquid reclaimer 9.Specifically, humidifier 13 to the gas from the second air feed equipment 8 (preferably
Compressed air) it humidifies, the Wet Compression air after humidification is supplied by air inlet pipe 11 to outer chamber 632 after regulating valve 13 adjusts flow
To the compressed air humidified, flow direction flow to the discharge of condensate outlet 634 through negative pressure valve 14 to wet compressed air as shown in Figure 6
After adjusting into gas-liquid reclaimer 9.
As shown in Figure 5 b, it is equipped with several fins 638 between the inner layer wall 636 and outer wall 637, is mentioned for inner layer wall 636
For radial support, several fins 638 are in be parallel to the axis direction distribution of inner chamber body 632 or be twist distributed.It needs
Illustrate, structure described in the present embodiment also can be used 3D printing technique and be made in addition to using Conventional machining methods processing
The increasingly complex internal structure that Conventional machining methods are difficult to realize.
Please continue to refer to Fig. 6, the outlet of the inner chamber body 631 and the condensation entrance 635 of the outer chamber 632 are equipped with two
It is a, it is arranged along X-axis, and between the outlet of two inner chamber bodies 631 and the condensation entrance 635 of two outer chambers 632
Between it is symmetrical respectively about Y-axis, the condensate outlet 634 of the outer chamber 632 also is provided with two, along Y-axis arrange, and about
X-axis is symmetrical.Condensed gas enters outer chamber 632 from the condensation entrance 635 of the left and right sides, and vertically two sides flow to condensate outlet
It is expelled to after 634 in gas-liquid reclaimer 9;Along left and right after gas-liquid mixture is from gas-liquid pump drainage mouth 633 into inner chamber body 631 simultaneously
Two sides flow to behind the outlet of inner chamber body 631 through 10 pump drainage of exhaust pipe into gas-liquid reclaimer 9.Due to 631 He of inner chamber body
The liquid evaporation refrigeration work consumption persistently occurred on inner layer wall 636 is smaller further away from exporting, and sweat cooling power is in uneven distribution,
And the saturation degree of the condensed gas in outer chamber 632 is smaller further away from condensation entrance 635, and condensation heat release power is caused gradually to drop
It is low, therefore condensing heat release power is equally in uneven distribution.Due to the outlet port of inner chamber body 631 and the condensation of outer chamber 632
Entry position is corresponding, therefore the compressed air flowing direction in outer chamber 632 and the gas-liquid mixture in inner chamber body 631 flow
It is contrary, counterflow heat exchange is formed, i.e., is exactly corresponded in the refrigeration work consumption distribution gradually decreased in the heating function gradually decreased
Rate distribution;With the refrigeration work consumption of the corresponding compensation non-uniform Distribution of the thermal compensation power of non-uniform Distribution, entire leaching is greatly improved
Not temperature controlled uniformity.
Preferably, the submergence head 6 is made of aviation aluminium or Steel material, therefore the thermal conductivity for submerging head 6 is far longer than ring
The thermal conductivity of compressed gas in the outer chamber 632 of inner chamber body 631, thus outer chamber 632 play be insulated well it is heat-insulated
It acts on, the refrigeration work consumption of gas-liquid mixture is difficult to the other positions " leaked " to head 6 is submerged in the inner chamber body 631 wrapped up, and has
Conducive to effective control of the bulk temperature uniformity to submergence head 6.Specifically, the thermal resistance of outer chamber 631 is as described in following formula:
In formula, RThermal resistanceIndicate the thermal resistance between inner layer wall 636 and outer wall 637, unit DEG C/W;D indicates inner layer wall 636 and outer
Distance between layer wall 637, unit m;A indicates the heat transfer area between inner layer wall 636 and outer wall 637, unit m2;λ indicates internal layer
The coefficient of heat conduction between wall 636 and outer wall 637, W/m DEG C of unit.If being equivalent to outer chamber 632 without outer chamber 632
Set the coefficient of heat conduction of material such as aviation aluminium or steel etc. that place coefficient of heat conduction λ be submergence head 6, generally 100-200W/m DEG C or
20-50W/m℃.And in outer chamber 632 of the present invention based on Wet Compression air, thermal coefficient is less than 0.5W/m DEG C.As it can be seen that setting
Set R after outer chamber 632Thermal resistanceWill increase hundred times even more than, around inner chamber body 631 formed outer chamber 632 play good guarantor
Temperature effect, prevents the refrigeration work consumption " leakage " in inner chamber body 631, is conducive to the effective control for submerging the bulk temperature uniformity of head 6
System.
Embodiment 2
As shown in fig. 7, unlike the first embodiment, in the present embodiment, the outlet of the inner chamber body 631 and gas-liquid are recycled
The entrance of equipment 9 is connected to by exhaust pipe 10, and the condensation entrance 635 and condensed gas supply arrangement 15 of the outer chamber 632 are logical
The connection of air inlet pipe 11 is crossed, the air inlet pipe 11 is sheathed on the periphery of the exhaust pipe 10, and the condensate outlet 634 passes through escape pipe
It is connected to the entrance of condensate liquid reclaimer 16, i.e., individually setting up condensed gas supply arrangement 15 is that outer chamber 632 provides condensation
Gas, it is preferred that the condensed gas is vapor, hydrocarbon vapour, the mixture of hydrocarbon steam or ammonia steam, while being arranged independent
Condensate liquid reclaimer 16 condensate liquid in outer chamber 632 is recycled, the condensed gas supply arrangement 15 with it is described
It is also connected with regulating valve 13 between air inlet pipe 11, is additionally provided between the condensate outlet 634 and the entrance of condensate liquid reclaimer 16
Negative pressure valve 14.Specifically, the condensed gas in condensed gas supply arrangement 15 passes through air inlet pipe after regulating valve 13 adjusts flow
11 are passed into outer chamber 632, and flow direction flow to condensate outlet 634 to condensed gas as shown in Figure 7, and recycles through negative pressure valve 14
Into condensate liquid reclaimer 16.Preferably, condensed gas enters outer chamber 632 from the condensation entrance 635 of the left and right sides, along upper
After lower two sides flow to condensate outlet 634, it is expelled in condensate liquid reclaimer 16 by escape pipe;Simultaneously gas-liquid mixture from
Gas-liquid pump drainage mouth 633 enters passes through 10 pump drainage of exhaust pipe behind the outlet that the left and right sides flows to inner chamber body 631 after inner chamber body 631
Into gas-liquid reclaimer 9.Due to the liquid evaporation refrigeration work consumption that persistently occurs in inner chamber body 631 and inner layer wall 636 further away from
Export it is smaller, sweat cooling power be in uneven distribution, and the saturation degree of the condensed gas in outer chamber 632 further away from condense into
Mouth 635 is smaller, and condensation heat release power is caused to gradually decrease, therefore condensing heat release power is equally in uneven distribution.Due to inner cavity
The outlet port of body 631 is corresponding with the condensation entry position of outer chamber 632, therefore the compressed air flowing in outer chamber 632
Gas-liquid mixture flow direction in direction and inner chamber body 631 is on the contrary, form counterflow heat exchange, i.e., in the refrigeration work consumption gradually decreased
Distribution is exactly corresponded in the heating power distribution gradually decreased;It is non-homogeneous with the corresponding compensation of the thermal compensation power of non-uniform Distribution
The refrigeration work consumption of distribution greatly improves entire submergence temperature controlled uniformity.
In conclusion the present invention provides a kind of immersion liquid limiting mechanism and temperature-compensation method, exist compared with prior art
Following advantages:
(1) the gas-liquid reclaiming chamber 63 by setting including inner chamber body 631 and outer chamber 632, inner chamber body 631 are mixed for gas-liquid
The pump drainage of object is closed, outer chamber 632 is supplied for condensed gas, by condensing exothermic method in generation sweat cooling phenomenon
Cavity 631 carry out thermal compensation, outer chamber 632 coat inner chamber body 631, can to inner chamber body 631 carry out can comprehensive thermal compensation, increase
The big area of thermal compensation, improves thermal compensation efficiency;
(2) inner chamber body 631 and other positions are thermally isolated outer chamber 632, are reduced refrigeration " cold source " and are acted on
Submerge the refrigeration work consumption on remaining position of head 6;
(3) the condensation entrance 635 of outer chamber 632 is corresponding with the outlet port of inner chamber body 631, makes cold in outer chamber 632
The flow direction of gas-liquid mixture in the flow direction and inner chamber body 631 of gas is coagulated on the contrary, forming counterflow heat exchange, is realized in non-equal
It is temperature controlled to greatly improve entire submergence head 6 for the corresponding refrigeration work consumption in non-uniform Distribution of the thermal compensation power of even distribution
Uniformity;
(4) thermal compensation is directly carried out on inner layer wall 636, is reduced the thermal resistance on thermal compensation path, is substantially increased heat
Compensation efficiency;
(5) electrical components such as multiple heaters and its lead are not used, improve the reliability of immersion liquid limiting mechanism.
Although embodiments of the present invention are illustrated in specification, these embodiments are intended only as prompting,
It should not limit protection scope of the present invention.It is equal that various omission, substitution, and alteration are carried out without departing from the spirit and scope of the present invention
It should be included within the scope of the present invention.
Claims (25)
1. a kind of immersion liquid limiting mechanism is set between projection objective and substrate, including submergence head, on the submergence head from outside to inside
It is successively arranged for the gentle liquid reclaiming chamber of air cavity, it is described to be connected to for air cavity with the first air feed equipment, it is used to form close to the immersion liquid
The gas curtain of envelope, which is characterized in that the gas-liquid reclaiming chamber includes the inner chamber body being coaxially disposed from the inside to the outside and outer chamber, it is described in
Cavity be connected to by exhaust pipe with gas-liquid reclaimer, is used for pump drainage gas-liquid mixture, and the outer chamber passes through air inlet pipe and the
The connection of two air feed equipments, the gas that second air feed equipment provides are cold after contacting with the inner chamber body outer wall, outer chamber inner wall
Solidifying heat release.
2. immersion liquid limiting mechanism according to claim 1, which is characterized in that the air inlet pipe is sheathed on outside the exhaust pipe
Week.
3. immersion liquid limiting mechanism according to claim 1, which is characterized in that second air feed equipment includes being sequentially connected
Compressed air supply arrangement, humidifier and regulating valve, the compressed air after humidification is passed through in the outer chamber.
4. immersion liquid limiting mechanism according to claim 3, which is characterized in that be additionally provided with escape pipe, institute on the outer chamber
It states escape pipe and the gas-liquid reclaimer is connected to by negative pressure valve.
5. immersion liquid limiting mechanism according to claim 1, which is characterized in that second air feed equipment includes being sequentially connected
Condensed gas supply arrangement and regulating valve, condensed gas is passed through in the outer chamber.
6. immersion liquid limiting mechanism according to claim 5, which is characterized in that the condensed gas be vapor, hydrocarbon vapour,
The mixture or ammonia steam of hydrocarbon steam.
7. immersion liquid limiting mechanism according to claim 5, which is characterized in that be additionally provided with escape pipe, institute on the outer chamber
It states escape pipe and the condensed gas supply arrangement is connected to by negative pressure valve.
8. the immersion liquid limiting mechanism according to claim 4 or 7, which is characterized in that the air inlet pipe and an air outlet pipe interval point
Cloth.
9. immersion liquid limiting mechanism according to claim 7, which is characterized in that the gas supply bottom of chamber portion is provided with air supply opening,
The air supply opening is rounded, rectangular, oval or triangle, and the diameter or width of the air supply opening is 0.1~0.2mm.
10. immersion liquid limiting mechanism according to claim 1, which is characterized in that the outer wall of the inner chamber body and the exocoel
It is equipped with several fins between the inner wall of body, provides radial support for the inner chamber body.
11. immersion liquid limiting mechanism according to claim 10, which is characterized in that the fin edge is parallel to the inner chamber body
Axis direction distribution or be twist distributed.
12. immersion liquid limiting mechanism according to claim 1, which is characterized in that it is described submergence head circular in cross-section or
Polygon.
13. immersion liquid limiting mechanism according to claim 1, which is characterized in that the circular in cross-section for air cavity or
Polygon.
14. immersion liquid limiting mechanism according to claim 1, which is characterized in that described to be equipped with and the submergence head for air cavity
The gas supply gap of bottom surface connection, gas are blown out from the gas supply gap, form gas between the submergence head and the substrate
The width of curtain, the gas supply gap is 0.1~0.2mm.
15. immersion liquid limiting mechanism according to claim 1, which is characterized in that described to be equipped with and the submergence head for air cavity
Several gas supply opening of bottom surface connection, the distance between adjacent described gas supply opening is 0.2~0.3mm.
16. immersion liquid limiting mechanism according to claim 1, which is characterized in that the longitudinal section of the inner chamber body and outer chamber
Rounded or polygon.
17. immersion liquid limiting mechanism according to claim 1, which is characterized in that the cross section of the inner chamber body and outer chamber
Rounded or polygon.
18. immersion liquid limiting mechanism according to claim 1, which is characterized in that the inner chamber body is equipped with and the submergence head
The width in the pump drainage gap of bottom surface connection, the pump drainage gap is greater than 0.2mm.
19. immersion liquid limiting mechanism according to claim 1, which is characterized in that the inner chamber body is equipped with and the submergence head
Several pump drainages opening of bottom surface connection, the pump drainage rounded or rectangular or rectangle of opening or oblong or triangle, it is described
The diameter or width of pump drainage opening is greater than 0.3mm.
20. immersion liquid limiting mechanism according to claim 1, which is characterized in that the submergence head is by aviation aluminium or Steel material
It is made.
21. a kind of temperature-compensation method of immersion liquid limiting mechanism, which is characterized in that in the pump drainage chamber for extracting gas-liquid mixture
Except be arranged condensation chamber, gas is passed through in condensation chamber, make the outer wall of the gas and the pump drainage chamber, the condensation chamber it is interior
Heat release is condensed after wall contact.
22. the temperature-compensation method of immersion liquid limiting mechanism according to claim 21, which is characterized in that in the condensation chamber
The flow direction of gas and the flow direction of the intracavitary gas-liquid mixture of the pump drainage are on the contrary, form counterflow heat exchange.
23. the temperature-compensation method of immersion liquid limiting mechanism according to claim 21, which is characterized in that the gas is to add
Compressed air after wet.
24. the temperature-compensation method of immersion liquid limiting mechanism according to claim 21, which is characterized in that the gas is cold
Solidifying gas.
25. the temperature-compensation method of immersion liquid limiting mechanism according to claim 24, which is characterized in that the condensed gas
It is vapor, hydrocarbon vapour, the mixture of hydrocarbon steam or ammonia steam.
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CN113138541B (en) * | 2020-01-17 | 2022-02-01 | 浙江启尔机电技术有限公司 | Immersion fluid is supplied with and is retrieved device with novel pump drainage chamber |
Citations (4)
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CN1746775A (en) * | 2004-08-13 | 2006-03-15 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
US20060103816A1 (en) * | 2004-11-12 | 2006-05-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
CN1885171A (en) * | 2005-06-21 | 2006-12-27 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
US20080297744A1 (en) * | 2007-06-01 | 2008-12-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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CN1746775A (en) * | 2004-08-13 | 2006-03-15 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
US20060103816A1 (en) * | 2004-11-12 | 2006-05-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
CN1885171A (en) * | 2005-06-21 | 2006-12-27 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
US20100245791A1 (en) * | 2005-06-21 | 2010-09-30 | Johannes Henricus Wilhelmus Jacobs | Lithographic apparatus and device manufacturing method |
US20080297744A1 (en) * | 2007-06-01 | 2008-12-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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