CN107162438A - A kind of method of TFT LCD glass substrate double-sided coatings - Google Patents
A kind of method of TFT LCD glass substrate double-sided coatings Download PDFInfo
- Publication number
- CN107162438A CN107162438A CN201710462168.8A CN201710462168A CN107162438A CN 107162438 A CN107162438 A CN 107162438A CN 201710462168 A CN201710462168 A CN 201710462168A CN 107162438 A CN107162438 A CN 107162438A
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- China
- Prior art keywords
- film layer
- coating
- magnetron sputtering
- lcd glass
- niobium pentaoxide
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/218—V2O5, Nb2O5, Ta2O5
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
- C03C2217/231—In2O3/SnO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of method of TFT LCD glass substrate double-sided coatings, comprise the following steps：(1) with the method for magnetron sputtering plating, the first niobium pentaoxide film layer, the first silica coating, the second niobium pentaoxide film layer and the second silica coating are sequentially formed in the one side of TFT LCD glass substrates, to form the first antireflective coating；(2) using the method for magnetron sputtering plating, the 3rd niobium pentaoxide film layer, the 3rd silica coating, the 4th niobium pentaoxide film layer and the 4th silica coating are sequentially formed on the another side of TFT LCD glass substrates, to form the second antireflective coating；(3) using the method for magnetron sputtering plating, ito film layer is formed on the second antireflective coating, double-sided coated glass is produced.
Description
Technical field
The present invention relates to TFT-LCD technical field, and in particular to a kind of method of TFT-LCD glass substrates double-sided coating.
Background technology
The film layer that major part Glass for Liquid Crystal Display coated product is plated at present is SiO2+ITO film layers, and such plated film comes out
Product, transmitance is about 90% at 550nm, before and after plated film the ratio of transmitance be 97% or so, visual effect is poor, greatly
Partial liquid crystal, which is shown, can accomplish the touch screen products of this quality with glass producer, because technical indicator is relatively low, increasingly
Fierce touch-screen industry competition is in more and more unfavorable status, and the continuous pursuit with people to vision quality is produced more
The touch screen products of high transmittance will possess bigger market.
The content of the invention
The present invention is intended to provide a kind of method of TFT-LCD glass substrates double-sided coating.
The present invention provides following technical scheme：
A kind of method of TFT-LCD glass substrates double-sided coating, comprises the following steps：
(1) with the method for magnetron sputtering plating, the one or five oxidation two is sequentially formed in the one side of TFT-LCD glass substrates
Niobium film layer, the first silica coating, the second niobium pentaoxide film layer and the second silica coating, to form the first anti-reflection film
Layer；
(2) using the method for magnetron sputtering plating, the three or five oxygen is sequentially formed on the another side of TFT-LCD glass substrates
Change two niobium film layers, the 3rd silica coating, the 4th niobium pentaoxide film layer and the 4th silica coating, to form the second increasing
Permeable membrane layer；
(3) using the method for magnetron sputtering plating, ito film layer is formed on the second antireflective coating, double-sided coating glass is produced
Glass.
The thickness of the first niobium pentaoxide film layer and the 3rd niobium pentaoxide film layer is 15-18nm；Described
The thickness of two niobium pentaoxide film layers and the 4th niobium pentaoxide film layer is 90-96nm；First silica coating
And the thickness of the 3rd silica coating is 28-32nm；The thickness of second silica coating is 80-90nm；Institute
The thickness for stating the 4th silica coating is 60-68nm；The thickness of the ito film layer is 16-24nm.
The magnetron sputtering membrane process of first antireflective coating and second antireflective coating includes：By magnetron sputtering
The plated film case of film is vacuumized, and it is 1.4Pa-1.8Pa that argon gas and oxygen to vacuum are filled with the backward plated film case, in 25-30
Plated film is carried out at DEG C.
The magnetron sputtering membrane process of ito film layer includes in the step (3)：The plated film case of magnetron sputtering plating is taken out very
It is 0.4Pa-0.6Pa that argon gas and oxygen to vacuum are filled with sky, the backward plated film case, is carried out at -80 DEG C of temperature 60 C
Plated film.
Compared with prior art, the beneficial effects of the invention are as follows：The present invention utilizes the fluctuation and principle of interference of light, design
Go out to improve the membrane system of double-sided coated glass transmitance；Niobium pentaoxide and earth silicon material are coated with TFT-LCD glass substrates,
The double-sided coated glass is not easy yellowing on ageing, and light reflection is small, and transmitance is high, and picture image is clear；Meanwhile, above-mentioned double-sided coating
TFT-LCD glass substrates ratio of transmitance before and after the transmitance of 420nm-660nm wave bands reaches more than 96.5%, plated film reaches
To more than 108%, there is certain protective action to ultraviolet and infrared part, double-sided coating TFT-LCD glass substrates
Transmitance is higher, can preferably be applied to market.
Embodiment
Below in conjunction with the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described,
Obviously, described embodiment is only a part of embodiment of the invention, rather than whole embodiments.Based in the present invention
Embodiment, the every other embodiment that those of ordinary skill in the art are obtained under the premise of creative work is not made, all
Belong to the scope of protection of the invention.
A kind of method of TFT-LCD glass substrates double-sided coating of embodiment, comprises the following steps：
(1) with the method for magnetron sputtering plating, the one or five oxidation two is sequentially formed in the one side of TFT-LCD glass substrates
Niobium film layer, the first silica coating, the second niobium pentaoxide film layer and the second silica coating, to form the first anti-reflection film
Layer；
(2) using the method for magnetron sputtering plating, the three or five oxygen is sequentially formed on the another side of TFT-LCD glass substrates
Change two niobium film layers, the 3rd silica coating, the 4th niobium pentaoxide film layer and the 4th silica coating, to form the second increasing
Permeable membrane layer；
(3) using the method for magnetron sputtering plating, ito film layer is formed on the second antireflective coating, double-sided coating glass is produced
Glass.
The thickness of the first niobium pentaoxide film layer and the 3rd niobium pentaoxide film layer is 15-18nm；Described
The thickness of two niobium pentaoxide film layers and the 4th niobium pentaoxide film layer is 90-96nm；First silica coating
And the thickness of the 3rd silica coating is 28-32nm；The thickness of second silica coating is 80-90nm；Institute
The thickness for stating the 4th silica coating is 60-68nm；The thickness of the ito film layer is 16-24nm.
The magnetron sputtering membrane process of first antireflective coating and second antireflective coating includes：By magnetron sputtering
The plated film case of film is vacuumized, and it is 1.4Pa-1.8Pa that argon gas and oxygen to vacuum are filled with the backward plated film case, in 25-30
Plated film is carried out at DEG C.
The magnetron sputtering membrane process of ito film layer includes in the step (3)：The plated film case of magnetron sputtering plating is taken out very
It is 0.4Pa-0.6Pa that argon gas and oxygen to vacuum are filled with sky, the backward plated film case, is carried out at -80 DEG C of temperature 60 C
Plated film.
It is obvious to a person skilled in the art that the invention is not restricted to the details of the one exemplary embodiment, Er Qie
In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter
From the point of view of which point, embodiment all should be regarded as exemplary, and be nonrestrictive, the scope of the present invention is by appended power
Profit is required rather than the explanation is limited, it is intended that all in the implication and scope of the equivalency of claim by falling
Change is included in the present invention.Although not each moreover, it will be appreciated that the present specification is described in terms of embodiments
Embodiment is only comprising an independent technical scheme, and this narrating mode of specification is only this area for clarity
Technical staff should be using specification as an entirety, and the technical solutions in the various embodiments may also be suitably combined, forms this
Art personnel may be appreciated other embodiment.
Claims (4)
1. a kind of method of TFT-LCD glass substrates double-sided coating, it is characterised in that comprise the following steps：
(1) with the method for magnetron sputtering plating, the first niobium pentaoxide film is sequentially formed in the one side of TFT-LCD glass substrates
Layer, the first silica coating, the second niobium pentaoxide film layer and the second silica coating, to form the first antireflective coating；
(2) using the method for magnetron sputtering plating, the three or five oxidation two is sequentially formed on the another side of TFT-LCD glass substrates
Niobium film layer, the 3rd silica coating, the 4th niobium pentaoxide film layer and the 4th silica coating, to form the second anti-reflection film
Layer；
(3) using the method for magnetron sputtering plating, ito film layer is formed on the second antireflective coating, double-sided coated glass is produced.
2. a kind of method of TFT-LCD glass substrates double-sided coating according to claim 1, it is characterised in that：Described
The thickness of one niobium pentaoxide film layer and the 3rd niobium pentaoxide film layer is 15-18nm；The second niobium pentaoxide film
Layer and the thickness of the 4th niobium pentaoxide film layer are 90-96nm；First silica coating and the 3rd dioxy
The thickness of SiClx film layer is 28-32nm；The thickness of second silica coating is 80-90nm；4th silica
The thickness of film layer is 60-68nm；The thickness of the ito film layer is 16-24nm.
3. a kind of method of TFT-LCD glass substrates double-sided coating according to claim 1, it is characterised in that：Described
The magnetron sputtering membrane process of one antireflective coating and second antireflective coating includes：The plated film case of magnetron sputtering plating is taken out very
It is 1.4Pa-1.8Pa to be filled with argon gas and oxygen to vacuum in sky, the backward plated film case, and plated film is carried out at 25-30 DEG C.
4. a kind of method of TFT-LCD glass substrates double-sided coating according to claim 1, it is characterised in that：The step
Suddenly the magnetron sputtering membrane process of ito film layer includes in (3)：The plated film case of magnetron sputtering plating is vacuumized, the backward plating
It is 0.4Pa-0.6Pa that argon gas and oxygen to vacuum are filled with film case, and plated film is carried out at -80 DEG C of temperature 60 C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710462168.8A CN107162438A (en) | 2017-06-19 | 2017-06-19 | A kind of method of TFT LCD glass substrate double-sided coatings |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710462168.8A CN107162438A (en) | 2017-06-19 | 2017-06-19 | A kind of method of TFT LCD glass substrate double-sided coatings |
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| Publication Number | Publication Date |
|---|---|
| CN107162438A true CN107162438A (en) | 2017-09-15 |
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ID=59819279
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710462168.8A Pending CN107162438A (en) | 2017-06-19 | 2017-06-19 | A kind of method of TFT LCD glass substrate double-sided coatings |
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| Country | Link |
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| CN (1) | CN107162438A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110442268A (en) * | 2019-08-06 | 2019-11-12 | 江西沃格光电股份有限公司 | Flexible touch screen and its manufacturing method, display device |
| CN114196927A (en) * | 2021-11-25 | 2022-03-18 | 深圳先进技术研究院 | Ultraviolet anti-reflection glass based on sapphire substrate and preparation method and application thereof |
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| CN102351438A (en) * | 2011-07-15 | 2012-02-15 | 深圳市三鑫精美特玻璃有限公司 | Method for preparing membrane on glass substrate and glass substrate and membrane system structure |
| CN102909918A (en) * | 2012-09-29 | 2013-02-06 | 江西沃格光电科技有限公司 | Two-side coated glass and preparation method thereof |
| CN204674125U (en) * | 2015-05-13 | 2015-09-30 | 信义光伏产业(安徽)控股有限公司 | Transmission increasing disappears shadow AZO electro-conductive glass and contactor control device |
| CN204674116U (en) * | 2015-05-13 | 2015-09-30 | 信义光伏产业(安徽)控股有限公司 | A kind of blue light high reflecting glass and automobile rearview mirror |
| CN105084773A (en) * | 2015-05-13 | 2015-11-25 | 信义光伏产业(安徽)控股有限公司 | Anti-reflection vanishing AZO conductive glass, and manufacture method and touch control apparatus thereof |
| CN105291501A (en) * | 2015-05-13 | 2016-02-03 | 信义光伏产业(安徽)控股有限公司 | Blue-light high-reflective glass, production method of blue-light high-reflective glass, and automobile rearview mirror |
-
2017
- 2017-06-19 CN CN201710462168.8A patent/CN107162438A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102351438A (en) * | 2011-07-15 | 2012-02-15 | 深圳市三鑫精美特玻璃有限公司 | Method for preparing membrane on glass substrate and glass substrate and membrane system structure |
| CN102909918A (en) * | 2012-09-29 | 2013-02-06 | 江西沃格光电科技有限公司 | Two-side coated glass and preparation method thereof |
| CN204674125U (en) * | 2015-05-13 | 2015-09-30 | 信义光伏产业(安徽)控股有限公司 | Transmission increasing disappears shadow AZO electro-conductive glass and contactor control device |
| CN204674116U (en) * | 2015-05-13 | 2015-09-30 | 信义光伏产业(安徽)控股有限公司 | A kind of blue light high reflecting glass and automobile rearview mirror |
| CN105084773A (en) * | 2015-05-13 | 2015-11-25 | 信义光伏产业(安徽)控股有限公司 | Anti-reflection vanishing AZO conductive glass, and manufacture method and touch control apparatus thereof |
| CN105291501A (en) * | 2015-05-13 | 2016-02-03 | 信义光伏产业(安徽)控股有限公司 | Blue-light high-reflective glass, production method of blue-light high-reflective glass, and automobile rearview mirror |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110442268A (en) * | 2019-08-06 | 2019-11-12 | 江西沃格光电股份有限公司 | Flexible touch screen and its manufacturing method, display device |
| CN114196927A (en) * | 2021-11-25 | 2022-03-18 | 深圳先进技术研究院 | Ultraviolet anti-reflection glass based on sapphire substrate and preparation method and application thereof |
| CN114196927B (en) * | 2021-11-25 | 2024-02-27 | 深圳先进技术研究院 | Ultraviolet anti-reflection glass based on sapphire substrate and preparation method and application thereof |
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Application publication date: 20170915 |