A kind of metal droplet injection increasing material manufacturing system and method for processing micro-nano device
Technical field
The invention belongs to a kind of homogeneous metal droplet ejection increases material manufacturing technology field, more particularly to a kind of processing micro-nano device
The metal droplet injection increasing material manufacturing system and method for part.
Background technology
With the development that science and technology is with rapid changepl. never-ending changes and improvements, RP technique, particularly 3D printing technique are gradually in manufacturing industry
In show one's promises, and as its indispensable part.3D printing technique quickly changes the traditional mode of production of people
With life style.Future, the 3D printing manufacturing technology with the characteristics of digitlization, networking, personalization will promote third time industry
Revolution.
It is in a kind of increasing material system that 1993 propose and grow up based on the 3D printing technique of homogeneous metal droplet ejection
Make technology.It is the forming principle based on discrete superposition, and homogeneous metal droplet is produced by liquid drop ejector, while control three
Substrate motion is tieed up, makes metal droplet accurate deposition in ad-hoc location, and mutually merges, solidify, pointwise is successively accumulated, and then is realized
The printing speed of complex three-dimensional structure.In small complicated metalwork preparation, circuit printing and Electronic Packaging and structure function one
The fields such as body part manufacture, with wide application prospect.
Existing increases material manufacturing technology, its machining accuracy can not meet the production requirement of micro-nano device, and processing every time
A kind of material can be used.Existing homogeneous metal droplet ejection technology, it is impossible to realize the accurate control to molten drop, therefore can only
The extremely simple structure of processing, it is helpless to the micro-nano device of complexity.So there is great limitation in existing solution
Property.
The content of the invention
In order to solve the technical problem present in prior art, the invention provides a kind of new processing micro-nano device
Metal droplet sprays increasing material manufacturing system and method.
The technical scheme that is used of system of the present invention is:A kind of metal droplet injection increasing material manufacturing for processing micro-nano device
System, it is characterised in that:Constituted by producing area, screening area, turning to area and processing district, the generation area, screening area, turn to area and
Processing district is vacuum;
The generation area is used to produce charged metal drop, drop is obtained initial velocity;
The screening area is used to produce uniform electric field and produces uniform magnetic field;
The steering area is used to produce uniform electric field and produces uniform magnetic field;
The processing district is used for the printing processing for realizing complicated micro-nano structure, and need not support single-candidate outer frame.
The technical scheme that is used of method of the present invention is:A kind of metal droplet injection increasing material manufacturing for processing micro-nano device
Method, it is characterised in that comprise the following steps:
Step 1:Spray nozzle device is moved forward and backward by being suspended on fixed support, is reached behind assigned position, negatively charged
Molten drop is produced from spray nozzle device, does the movement of falling object under gravity, obtains an initial velocity, and then drop is from production
Raw area outlet and screening area entrance inject screening area;
Step 2:First uniform electric field generator produces uniform electric field, and the first uniform magnetic field generator produces uniform magnetic field;
In the presence of uniform electric field, drop is by by upward electric field force, with the gravitational equilibrium suffered by drop;Drop is in uniform magnetic field
Under effect, by long-range navigation magnetic force, uniform circular motion is done, the drop for meeting particular process condition is exported and turn to area from screening area
Entrance, which is injected, turns to area, is unsatisfactory for the drop of processing conditions, beats and is reclaiming in incline device region, is recovered and recycles;
Step 3:Second uniform electric field generator produces uniform electric field, and the second uniform magnetic field generator produces uniform magnetic field;
In the presence of uniform electric field, drop is by by upward electric field force, with the gravitational equilibrium suffered by drop;Drop is in uniform magnetic field
Under effect, by long-range navigation magnetic force, uniform circular motion is done so that drop direction changes, enter from area outlet is turned to processing district
Mouth is vertical to inject processing district;
Step 4:3rd uniform electric field generator produces uniform electric field, it is assumed that now electric-field intensity is E1, and the electric field makes band
Electro-hydraulic just slow down when dropping onto set Working position is zero, the first layer of device can be processed complete accordingly;When second
Layer drop enters fashionable, and electric-field intensity increase is E2, and it is zero second layer drop is just slowed down when falling on Working position;It is same with this
When, first layer is changed to the quantity of electric charge of Working position drop by electric charge adjusting means, it is made in the new uniform electric field
With lower still stress balance;When second layer drop falls on processing district, it can be contacted with first layer, so as to occur dividing again for electric charge
Match somebody with somebody, the drop of the second layer can be made also to be balanced in the electric field lower stress;By that analogy, when making any one layer of processing micro-nano device, make
The each layer processed remains stress balance, so that the printing processing of complicated micro-nano structure is realized, and need not
Support single-candidate outer frame.
The invention has the advantages that:1. by the combination in electric field and magnetic field, the accurate control of charged metal drop can be achieved
System;2. using electromagnetic field control, produced molten drop is screened, it can be ensured that the drop for entering processing district is satisfied by
Condition, it is ensured that machining accuracy;3. the micro-nano device with labyrinth can be printed, and printing support single-candidate outrigger need not be added
Structure, saves material, eliminates the follow-up process for removing support.
Brief description of the drawings
Fig. 1 is the system structure diagram of the embodiment of the present invention.
Fig. 2 is the structural representation of the spray nozzle device of the embodiment of the present invention.
Fig. 3 is the structural representation in the generation area of the embodiment of the present invention.
Fig. 4 is the structural representation of the screening area front view of the embodiment of the present invention.
Fig. 5 is the structural representation of the screening area side view of the embodiment of the present invention.
Fig. 6 is the structural representation of steering area's front view of the embodiment of the present invention.
Fig. 7 is the structural representation of steering area's side view of the embodiment of the present invention.
Fig. 8 is the structural representation of the processing district front view of the embodiment of the present invention.
Fig. 9 is the structural representation of the processing district bottom plate of the embodiment of the present invention.
Figure 10 is the structural representation of the screening area retracting device of the embodiment of the present invention.
In figure, 1- spray nozzle devices;2- suspensions;3- fixed supports;4- produces area;5- produces area outlet;6- screening areas entrance;
7- screening areas are exported;8- screening areas;9- the first uniform electric field generators;10- the first uniform magnetic field generators;11- second is even strong
Field generator;12- turns to area;13- turns to area's entrance;14- turns to area outlet;15- the second uniform magnetic field generators;16- adds
Work area entrance;17- processing districts;The uniform electric field generators of 18- the 3rd;19- substrates;20- electrode layers;21- placed layers;22- voltages
Adjusting means;23- electric charge adjusting meanss;24- reclaims incline device.
Embodiment
Understand for the ease of those of ordinary skill in the art and implement the present invention, below in conjunction with the accompanying drawings and embodiment is to this hair
It is bright to be described in further detail, it will be appreciated that implementation example described herein is merely to illustrate and explain the present invention, not
For limiting the present invention.
See the metal droplet injection increasing material manufacturing system of Fig. 1-Figure 10, the present invention a kind of processing micro-nano device provided,
Constituted by producing area 4, screening area 8, steering area 12 and processing district 17, produce area 4, screening area 8, steering area 12 and processing district 17 equal
For vacuum;
Produce area 4 be provided with produce the spray nozzle device 1 of charged metal drop, fixed fixed support 3 be used for track,
With connection spray nozzle device 1 and the suspension 2 of fixed support 3;In vertical plane, spray nozzle device 1, can be along fixation under the effect of suspension 2
Support 3 is moved forward and backward, and realizes the positioning of drippage drop;Produce area 4 and be provided with generation area outlet 5;
Screening area 8 includes the first uniform electric field generator 9 for being used to produce uniform electric field, and produces the first of uniform magnetic field
Uniform magnetic field generator 10;Screening area 8 is provided with screening area entrance 6 and screening area outlet 7;Inclined-plane dress is also reclaimed in screening area 8
24 are put, the drop of processing conditions is unsatisfactory for, beats and is reclaiming in the region of incline device 24, be recovered and recycle;
Turning to area 12 includes being used for producing the second uniform electric field generator 11 of uniform electric field, and produces the of uniform magnetic field
Two uniform magnetic field generators 15;Area 12 is turned to be provided with steering area's entrance 13 and turn to area outlet 14;
Processing district 17 includes the 3rd uniform electric field generator 18, substrate 19, electrode layer 20, placed layer 21, voltage-regulation dress
Put 22 and electric charge adjusting means 23;Processing district 17 is provided with processing district entrance 16;3rd uniform electric field generator 18 is used to produce
Uniform electric field, substrate 19 is used to processing and placing processing device;Placed layer 21 is piezoceramics layer, is produced under the effect of different voltages
Raw corresponding deformation;Substrate 19 is fixed on electrode layer 20, and substrate 19 is connected with electric charge adjusting means 23;Electrode layer 20 is arranged on
On placed layer 21, electrode layer 20 is connected with voltage regulating device 22, and placed layer 21 is piezoceramic material, when its both end voltage hair
During changing, corresponding deformation can be produced therewith, and control accuracy is high, it is possible to using voltage is changed, control, which is placed on, puts
Put the position of the electrode layer 20 and substrate 19 of layer 21 in the plane.
A kind of metal droplet injection increasing material manufacturing method for processing micro-nano device that the present invention is provided, it is characterised in that bag
Include following steps:
Step 1:Producing in area 4, spray nozzle device 1 is moved forward and backward by suspension 2 on fixed support 3, reaches predetermined bits
Postpone, negatively charged molten drop is produced from spray nozzle device 1, the movement of falling object is done under gravity, obtain at the beginning of one
Speed, then drop from produce area outlet 5 and screening area entrance 6 inject screening area 8;
Step 2:In screening area 8, the first uniform electric field generator 9 produces uniform electric field, the first uniform magnetic field generator
10 produce uniform magnetic field.In the presence of uniform electric field, drop is put down by upward electric field force with the gravity suffered by drop
Weighing apparatus.Drop, by long-range navigation magnetic force, does uniform circular motion under uniform magnetic field effect.Its moving radius can pass through added magnetic field
Size is adjusted, you can only allows the drop for meeting particular process condition from screening area outlet 7 and turns to the injection turn of area's entrance 13
To area 12, that is, realize screening.The drop of processing conditions is unsatisfactory for, can beat and reclaim in the region of incline device 24, be recovered circulation
Utilize;
Step 3:Area 12 is being turned to, the second uniform electric field generator 11 produces uniform electric field, the second uniform magnetic field generator
15 produce uniform magnetic field.In the presence of uniform electric field, drop is put down by upward electric field force with the gravity suffered by drop
Weighing apparatus.Drop, by long-range navigation magnetic force, does uniform circular motion under uniform magnetic field effect.So that drop direction changes, from steering
Area outlet 14 and processing district entrance 16 vertically inject processing district 17;
Step 4:In processing district 17, the 3rd uniform electric field generator 18 produces uniform electric field, it is assumed that now electric-field intensity is
E1, it is zero that the electric field, which can make charged drop just slow down when falling on set Working position,.Accordingly can be the first of device
Layer processing is complete.When second layer drop enters fashionable, electric-field intensity increase is E2, when the second layer drop is fallen on Working position just
Deceleration is zero.At the same time, because substrate 19 is electrically conductive, first layer can be changed by electric charge adjusting means 23 and arrives machining position
The quantity of electric charge of drop is put, makes its stress balance that remained unchanged under the new uniform electric field effect.When second layer drop falls on processing district
When, it can be contacted with first layer, so as to occur redistributing for electric charge, the drop of the second layer can be made also flat in the electric field lower stress
Weighing apparatus.By that analogy, when the method can make any one layer of processing micro-nano device, make each layer processed remain by
Dynamic balance.So as to realize the printing processing of complicated micro-nano structure, and single-candidate outer frame need not be supported.
One nozzle can spray a kind of rapidoprint, and the present embodiment can be achieved with same by changing the quantity of nozzle
The technique processed in the process of one device with different materials.
Specific embodiment described herein is only to spirit explanation for example of the invention.Technology neck belonging to of the invention
The technical staff in domain can be made various modifications or supplement to described specific embodiment or be replaced using similar mode
Generation, but without departing from the spiritual of the present invention or surmount scope defined in appended claims.
Although more having used various terms herein, the possibility using other terms is not precluded from.Use these
Term is used for the purpose of more easily describing and explaining the essence of the present invention;It is construed as any additional limitation all
Disagreed with spirit of the present invention.