CN107102458A - A kind of device and method of liquid crystal display photoresist film forming - Google Patents
A kind of device and method of liquid crystal display photoresist film forming Download PDFInfo
- Publication number
- CN107102458A CN107102458A CN201710470757.0A CN201710470757A CN107102458A CN 107102458 A CN107102458 A CN 107102458A CN 201710470757 A CN201710470757 A CN 201710470757A CN 107102458 A CN107102458 A CN 107102458A
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- film forming
- photoresist
- movable plate
- mother matrix
- photoresist film
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention discloses a kind of device of liquid crystal display photoresist film forming, including article carrying platform, guide rail and movable plate, the front end of the first movable plate is connected with shifting adhesive dispenser, and the front end of the second movable plate is connected with plastic roll device；The article carrying platform is provided with photoetching glue groove and glass substrate fixing device, and photoetching glue groove is fixed with glass substrate built with film forming mother matrix in the glass substrate fixing device.Method is to form photoresist film layer in film forming mother matrix by plastic roll device first；Then glass baseplate surface is transferred to using moving adhesive dispenser by photoresist in film forming mother matrix；Solid-state photoresist film layer is formed finally by drying.Present device is simple, can complete batch (-type) photoresist film forming procedure, and process operation is easy, single photoresist consumption is less, by the displacement of photoresist film forming mother matrix, is suitable for the glass substrate of sizes and into film pattern, photoresist film forming possesses selectivity.
Description
Technical field
The invention belongs to liquid crystal display manufacturing technology field, and in particular to a kind of liquid crystal display manufactures photoetching process mistake
Photoresist film formation device and method in journey.
Background technology
Liquid crystal display device was fast-developing in recent years, it is necessary in multiple works in liquid crystal display device process for making
Be used for multiple times in sequence photoetching process manufacture component graphics, photoetching process mainly comprising photoresist film forming, preceding baking, exposure, development,
A series of processes such as post bake, etching, striping, figure inspection and cleaning-drying.
Current liquid crystal display panel photoresist film forming, the main method that roller coat is carried out using transfer wheel, this method be adapted to compared with
Large-area glass substrate, preferably, production efficiency is higher for continuity, but for single Film forming operations, it is multiple that rolling method has operation
The problems such as miscellaneous, glass substrate size is fixed, photoresist large usage quantity, cost high and photoresist film forming does not possess selective.Remove
Enterprise needs the repeated production process of continuity, is drilled in all kinds of liquid crystal display device processing performance researchs, experiment or impart knowledge to students
During showing, it is desirable to be that photoresist film forming procedure possesses the features such as intermittent, operating flexibility is big, Parameters variation is larger.
The content of the invention
In view of this, this patent provides the new equipment and method of a kind of liquid crystal display device batch (-type) photoresist film forming, tool
The advantages of standby equipment operation is simple, film layer figure possesses selectivity, few photoresist consumption and adjustable substrate size.
To achieve these goals, the present invention is adopted the following technical scheme that：
A kind of device of liquid crystal display photoresist film forming, including article carrying platform, the side of the article carrying platform are provided with guide rail branch
Two guide rails parallel to article carrying platform above and below being provided with frame, the rail brackets, two guide rails are respectively connected with movement
Plate, the movable plate on upper rail is the first movable plate, and the movable plate on lower guideway is the second movable plate, described
The front end of first movable plate is connected with shifting adhesive dispenser, and the front end of second movable plate is connected with plastic roll device；The loading is put down
Platform is provided with photoetching glue groove and glass substrate fixing device, and the photoetching glue groove is consolidated built with film forming mother matrix, the glass substrate
Determine to be fixed with glass substrate on device.
Further, the shifting adhesive dispenser moves glue head by pin, spring and convex surface and constituted, and the pin is moved through first
Plate, pin is located at the spring that partially passes through above movable plate, and glue head is moved on the lower section connection convex surface of pin.The top of pin is pressed,
Convex surface is moved glue head and declined, and unclamps pin, and convex surface moves glue head and returns to original position.
Further, the plastic roll device is constituted and is arranged on same bottom plate by roller and scraper plate, roller and scraper plate from
Side moves on to opposite side, and photoresist liquid is transferred to film forming mother matrix by roller from roller, and scraper plate was then scraped from film forming master surfaces,
Remove unnecessary photoresist liquid.
Further, the material of the roller and scraper plate is rubber, and the surface of the roller is intensive shape of threads, rubber
Material and screwed roller, can preferably adsorb photoresist liquid.
Further, connected between the roller and bottom plate using Spring hinge.Spring hinge is specific by loose-leaf, spring
Constituted with connecting pin, make the flexible effect of roller, such roller can be in close contact with film forming mother matrix.
Further, space of the film forming mother matrix between the cylinder and cylinder into matrix arrangement is constituted, described
The radius of cylinder is 0.5mm, high 0.2mm, and the spacing between cylinder is 1.2mm.Space between adjacent column body supplies light
Photoresist liquid is stored, and glue mobile phase in groove is preferable, and the arrangement architecture of cylinder can ensure that rubber flap scraped photoresist liquid
The uniformity of distribution, while being also easy to shift to form uniform film layer by convex surface shifting glue head.
The present invention also provides a kind of method of liquid crystal display photoresist film forming, including following several steps：
1）Designed film forming mother matrix is positioned in photoetching glue groove and the position of film forming mother matrix is fixed；
2）Second movable plate is moved to the side of film forming mother matrix, photoresist glue is poured into photoetching glue groove；
3）The plastic roll device of second movement front edge of board is rolled into another from the side of film forming mother matrix after fully being contacted with photoresist glue
Side；
4）The glass substrate for needing film forming is fixed on substrate fixed position, regulation moves adhesive dispenser and is positioned at the upper of film forming mother matrix
Side, starts shifting adhesive dispenser and the photoresist liquid on film forming mother matrix is adsorbed onto on shifting adhesive dispenser；
5）Shifting adhesive dispenser is moved to the top of glass substrate, adhesive dispenser is moved and photoresist liquid is transferred to glass baseplate surface；
6）The glass substrate with photoresist liquid film layer is removed from apparatus for fixing substrate, 60-80 DEG C of drying stream in baking oven is delivered to
Flat 30min, that is, form solid-state photoresist film layer.
Beneficial effect：Compared with prior art, the invention provides a kind of device of liquid crystal display device photoresist film forming
And method, photoresist film layer is formed in film forming mother matrix by plastic roll device first；Then using moving adhesive dispenser by film forming mother matrix
Middle photoresist is transferred to glass baseplate surface；Solid-state photoresist film layer is formed finally by drying.Present device is simple, can be complete
Into batch (-type) photoresist film forming procedure, process operation is easy, single photoresist consumption is less, passes through putting for photoresist film forming mother matrix
Change, be suitable for the glass substrate of sizes and into film pattern, photoresist film forming possesses selectivity.
Brief description of the drawings
Fig. 1 is the overall structure diagram of the present invention.
Fig. 2 is the roller structure schematic diagram of the present invention.
Fig. 3 is film forming master structure schematic diagram of the present invention.
Embodiment
In order to deepen the understanding of the present invention, below in conjunction with embodiment and accompanying drawing, the invention will be further described, should
Embodiment is only used for explaining the present invention, is not intended to limit the scope of the present invention..
Embodiment 1
A kind of device of liquid crystal display photoresist film forming, including article carrying platform 1, the side of article carrying platform 1 are provided with rail brackets
2, be provided with rail brackets 2 above and below two guide rails 3 parallel to article carrying platform, two guide rails 3 are respectively connected with movable plate, install
Movable plate on upper rail is the first movable plate 4, and the movable plate on lower guideway is the second movable plate 5, the first movement
The front end of plate 4 is connected with shifting adhesive dispenser 6, and the front end of the second movable plate 5 is connected with plastic roll device 7；Article carrying platform 1 is provided with photoetching
Glue groove 8 and glass substrate fixing device 9, photoetching glue groove 8 are fixed with glass substrate fixing device 9 built with film forming mother matrix 10
Glass substrate 11.
Move adhesive dispenser 6 to be made up of pin 601, spring 602 and convex surface shifting glue first 603, pin 601 passes through the first movable plate 4,
Pin 601, which is located above movable plate 4, partially passes through spring 602, and glue first 603 is moved on the lower section connection convex surface of pin 601.Pushpin
The top of nail 601, convex surface is moved glue first 603 and declined, and unclamps pin 601, and convex surface moves glue first 603 and returns to original position.
Plastic roll device 7 is made up of roller 701 and scraper plate 702 and on same bottom plate 703, roller 701 and scraper plate 702
Opposite side is moved on to from side, photoresist liquid is transferred to film forming mother matrix 10 by roller 701 from roller 701, and scraper plate 702 is then from film forming
The surface of mother matrix 10 was scraped, and removed unnecessary photoresist liquid.The material of roller 701 and scraper plate 702 is rubber, the table of roller 701
Face is intensive shape of threads, quality of rubber materials and screwed roller 701, can preferably adsorb photoresist liquid.
Connected between roller 701 and bottom plate 703 using Spring hinge.Spring hinge is specific by loose-leaf 704, spring 705
Constituted with connecting pin 706, make the flexible effect of roller 701, such roller 701 can be in close contact with film forming mother matrix 10.
Space 202 of the film forming mother matrix 10 between the cylinder 201 and cylinder into matrix arrangement is constituted, cylinder 201
Radius be 0.5mm, high 0.2mm, the spacing between cylinder 201 is 1.2mm.Space 202 between adjacent column body 201 is supplied
Photoresist liquid is stored, and glue mobile phase in space 202 is preferable, and the arrangement architecture of cylinder 201 can ensure that rubber flap 702 is scraped
The uniformity of photoresist liquid distribution is crossed, while being also easy to form uniform film layer by first 603 transfer of convex surface shifting glue.
A kind of method of liquid crystal display photoresist film forming, including following several steps：
1）Designed film forming mother matrix 10 is positioned in photoetching glue groove 8 and the position of film forming mother matrix 10 is fixed；
2）Second movable plate 5 is moved to the side of film forming mother matrix 10, photoresist glue is poured into photoetching glue groove 8；
3）After roller 701 on the front end plastic roll device of second movable plate 5 is fully contacted with photoresist liquid, from from film forming mother matrix 10
Side is rolled into opposite side, and scraper plate 702 was then scraped from the surface of film forming mother matrix 10, removes unnecessary photoresist liquid；
4）The glass substrate 11 for needing film forming is fixed on substrate fixed position 9, regulation moves adhesive dispenser and is positioned at film forming mother matrix
Convex surface shifting glue first 603 is touched film forming mother matrix 10, glue head is moved on convex surface by 10 top, the pin 601 that pressing is moved on adhesive dispenser
603 contacted with film forming mother matrix 10 after deformation, the photoresist liquid on film forming mother matrix 10 is transferred to convex surface and moves glue first 603 surface, is pressed
Pressure pressure and apart from influence film-formation result, by the photoresist liquid on film forming mother matrix 10 be adsorbed onto convex surface move glue first 603 on, releases pin
Nail, replys shifting adhesive dispenser and returns to original position,
5）Shifting adhesive dispenser is moved to the top of glass substrate 11, pin is pressed, convex surface is moved glue first 603 and touches glass substrate
11, photoresist liquid is transferred to the surface of glass substrate 11；
6）The glass substrate 11 with photoresist liquid film layer is removed from apparatus for fixing substrate 9,60-80 DEG C of drying in baking oven is delivered to
Levelling 30min, that is, form solid-state photoresist film layer.
The rubber flap 702 is made up of elastic caoutchouc, by adjust the distance between rubber flap and film forming mother matrix and
Pressure, can influence the thickness of photoresist film.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all essences in the present invention
God is with principle, and any modification, equivalent substitution and improvements made etc. should be included in the scope of the protection.
Claims (7)
1. a kind of device of liquid crystal display photoresist film forming, it is characterised in that including article carrying platform（1）, article carrying platform（1）'s
Side is provided with rail brackets（2）, rail brackets（2）On be provided with above and below two guide rails parallel to article carrying platform（3）, two are led
Rail（3）Movable plate is respectively connected with, the movable plate on upper rail is the first movable plate（4）, the shifting on lower guideway
Dynamic plate is the second movable plate（5）, the first movable plate（4）Front end be connected with shifting adhesive dispenser（6）, the second movable plate（4）Front end
It is connected with plastic roll device（7）；Article carrying platform（1）It is provided with photoetching glue groove（8）With glass substrate fixing device（9）, photoetching glue groove
（8）Built with film forming mother matrix（10）, glass substrate fixing device（9）On be fixed with glass substrate（11）.
2. the device of liquid crystal display photoresist film forming according to claim 1, it is characterised in that the shifting adhesive dispenser
（6）By pin（601）, spring（602）Glue head is moved with convex surface（603）Composition, the pin（601）Through the first movable plate 4, pin
Nail（601）Spring is partially passed through above movable plate（602）, pin（601）Lower section connection convex surface move glue head（603）.
3. the device of liquid crystal display photoresist film forming according to claim 1, it is characterised in that the plastic roll device
（7）By roller（701）And scraper plate（702）Constitute and be arranged on same bottom plate（703）On.
4. the device of liquid crystal display photoresist film forming according to claim 3, it is characterised in that the roller（701）
And scraper plate（702）Material be rubber, the roller（701）Surface be intensive shape of threads.
5. the device of liquid crystal display photoresist film forming according to claim 3, it is characterised in that the roller（701）
With bottom plate（703）Between using Spring hinge connection.
6. the device of liquid crystal display photoresist film forming according to claim 1, it is characterised in that the film forming mother matrix
（10）By the cylinder into matrix arrangement（201）Space between cylinder（202）Composition, the cylinder（201）Half
Footpath is 0.5mm, high 0.2mm, and the spacing between cylinder is 1.2mm.
7. a kind of device using described in claim 1-6 any one is come the method that carries out liquid crystal display photoresist film forming,
It is characterised in that it includes following several steps：
1）By designed film forming mother matrix（10）It is positioned over photoetching glue groove（8）In and fixed film forming mother matrix position；
2）By the second movable plate（5）It is moved to film forming mother matrix（10）Side, in photoetching glue groove（8）Inside pour into photoresist glue；
3）Second movable plate（5）The plastic roll device of front end（7）From film forming mother matrix after fully being contacted with photoresist glue（10）One
Sidewinder opposite side；
4）The glass substrate of film forming will be needed（11）It is fixed on substrate fixed position（9）On, regulation moves adhesive dispenser（6）It is positioned at into
Film mother matrix（10）Top, start move adhesive dispenser（6）By film forming mother matrix（10）On photoresist liquid be adsorbed onto shifting adhesive dispenser（6）
On；
5）Adhesive dispenser will be moved（6）It is moved to glass substrate（11）Top, move adhesive dispenser（6）Photoresist liquid is transferred to glass base
Plate（11）Surface；
6）From apparatus for fixing substrate（9）On remove the glass substrate with photoresist liquid film layer（11）, 60-80 DEG C is delivered in baking oven
Levelling 30min is dried, that is, forms solid-state photoresist film layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710470757.0A CN107102458B (en) | 2017-06-20 | 2017-06-20 | Device and method for forming film of photoresist of liquid crystal display |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710470757.0A CN107102458B (en) | 2017-06-20 | 2017-06-20 | Device and method for forming film of photoresist of liquid crystal display |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107102458A true CN107102458A (en) | 2017-08-29 |
| CN107102458B CN107102458B (en) | 2023-05-16 |
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ID=59663873
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710470757.0A Active CN107102458B (en) | 2017-06-20 | 2017-06-20 | Device and method for forming film of photoresist of liquid crystal display |
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| Country | Link |
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| CN (1) | CN107102458B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113960883A (en) * | 2021-11-25 | 2022-01-21 | 河南汇达印通科技股份有限公司 | Baking box for photosensitive material plate |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1527102A (en) * | 2003-03-06 | 2004-09-08 | ������������ʽ���� | Film forming method and apparatus, method and apparatus for producing base plate and electronic equipment |
| CN101661873A (en) * | 2008-08-28 | 2010-03-03 | 东京应化工业株式会社 | Substrate processing system, carrying device and coating device |
| CN102826762A (en) * | 2011-06-16 | 2012-12-19 | 株式会社日立工业设备技术 | Thin film forming apparatus and thin film forming method |
| CN206805038U (en) * | 2017-06-20 | 2017-12-26 | 南京信息职业技术学院 | A kind of device of liquid crystal display photoresist film forming |
-
2017
- 2017-06-20 CN CN201710470757.0A patent/CN107102458B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1527102A (en) * | 2003-03-06 | 2004-09-08 | ������������ʽ���� | Film forming method and apparatus, method and apparatus for producing base plate and electronic equipment |
| CN101661873A (en) * | 2008-08-28 | 2010-03-03 | 东京应化工业株式会社 | Substrate processing system, carrying device and coating device |
| CN102826762A (en) * | 2011-06-16 | 2012-12-19 | 株式会社日立工业设备技术 | Thin film forming apparatus and thin film forming method |
| CN206805038U (en) * | 2017-06-20 | 2017-12-26 | 南京信息职业技术学院 | A kind of device of liquid crystal display photoresist film forming |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113960883A (en) * | 2021-11-25 | 2022-01-21 | 河南汇达印通科技股份有限公司 | Baking box for photosensitive material plate |
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| Publication number | Publication date |
|---|---|
| CN107102458B (en) | 2023-05-16 |
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