CN107093487B - Manufacturing method of high-density grating - Google Patents
Manufacturing method of high-density grating Download PDFInfo
- Publication number
- CN107093487B CN107093487B CN201710278740.5A CN201710278740A CN107093487B CN 107093487 B CN107093487 B CN 107093487B CN 201710278740 A CN201710278740 A CN 201710278740A CN 107093487 B CN107093487 B CN 107093487B
- Authority
- CN
- China
- Prior art keywords
- grating
- density
- low
- gratings
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 62
- 238000010030 laminating Methods 0.000 claims abstract description 30
- 238000000034 method Methods 0.000 claims description 26
- 238000003825 pressing Methods 0.000 claims description 12
- 238000003475 lamination Methods 0.000 claims description 10
- 239000000853 adhesive Substances 0.000 claims description 6
- 230000001070 adhesive effect Effects 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 claims description 6
- 238000001259 photo etching Methods 0.000 claims description 5
- 239000012790 adhesive layer Substances 0.000 claims description 4
- 238000005406 washing Methods 0.000 claims description 3
- 238000003384 imaging method Methods 0.000 abstract description 7
- 230000009286 beneficial effect Effects 0.000 abstract description 4
- 238000011161 development Methods 0.000 abstract description 3
- 238000002474 experimental method Methods 0.000 abstract description 3
- 230000003287 optical effect Effects 0.000 abstract description 3
- 238000012545 processing Methods 0.000 description 5
- 238000000025 interference lithography Methods 0.000 description 4
- 229920001651 Cyanoacrylate Polymers 0.000 description 2
- MWCLLHOVUTZFKS-UHFFFAOYSA-N Methyl cyanoacrylate Chemical compound COC(=O)C(=C)C#N MWCLLHOVUTZFKS-UHFFFAOYSA-N 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000013077 scoring method Methods 0.000 description 2
- 229920000297 Rayon Polymers 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A30/00—Adapting or protecting infrastructure or their operation
- Y02A30/60—Planning or developing urban green infrastructure
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
The invention is suitable for the field of optical elements, and discloses a manufacturing method of a high-density grating and the high-density grating, wherein the manufacturing method of the high-density grating comprises the following steps: manufacturing a low-density grating, namely manufacturing n low-density gratings with grating strip widths of a and grating period distances of A, wherein n is a natural number greater than or equal to 2, and n is a < A; and laminating, namely laminating and fixing n low-density gratings together to obtain the high-density grating with the grating strip width of a and the grating period distance of A/n. According to the manufacturing method of the high-density grating, the low-density grating with the grating width of a and the grating period distance of A is manufactured by adopting the traditional technology, then n low-density gratings are laminated and fixed together to manufacture the high-density grating with the grating width of a and the grating period distance of A/n, so that the manufacturing of the high-density grating is realized, and the manufacturing method is simple and easy to realize, and is beneficial to the development of X-ray phase contrast imaging experiments.
Description
Technical Field
The invention belongs to the field of optical elements, and particularly relates to a manufacturing method of a high-density grating and the high-density grating.
Background
The X-ray phase contrast imaging technology has the advantages of high resolution, high penetrability and the like, can observe the three-dimensional structure inside a thick substance, and has wide application in the fields of biomedicine and nano materials. Currently, research into X-ray phase contrast imaging using an X-ray grating has become a research hotspot. However, the X-ray phase contrast imaging requires a high-density (resolution capability of nanometer level, steep profile) and large-size (millimeter level) grating, and the grating manufacturing methods commonly used in the conventional technology mainly comprise a mechanical scribing method and a holographic lithography method, by adopting the two manufacturing methods, a low-density grating can be manufactured, a high-density and large-size grating meeting the X-ray phase contrast imaging requirement is difficult to manufacture, and the mechanical scribing method requires a complex precise mechanical control system, so that the manufacturing difficulty and the cost are high.
Disclosure of Invention
The invention aims to overcome at least one defect of the prior art, and provides a manufacturing method of a high-density grating and the high-density grating, which solve the technical problem that the high-density grating is difficult to manufacture.
In order to achieve the above purpose, the invention adopts the following technical scheme: the manufacturing method of the high-density grating comprises the following steps:
manufacturing a low-density grating, namely manufacturing n low-density gratings with grating strip widths of a and grating period distances of A, wherein n is a natural number greater than or equal to 2, and n is a < A;
and laminating, namely laminating and fixing n low-density gratings together to obtain the high-density grating with the grating strip width of a and the grating period distance of A.
Optionally, in the laminating step, the low-density gratings are laminated together in a mode that grating strips alternate with each other along a straight line; and/or the number of the groups of groups,
each low-density grating is manufactured by adopting a mechanical scribing method or a holographic photoetching method.
Optionally, in the laminating step, each of the low-density gratings is laminated and fixed together by an adhesive manner.
Optionally, a fixed cleaning step is further provided after the lamination step, where the fixed cleaning step is: fixing the periphery of each low-density grating by adopting a fixing frame, adhering and covering a pressing ring on the fixing frame, and washing off an adhesive layer in the middle of each low-density grating.
Optionally, n is equal to 2, and in the laminating step, the laminating positional relationship of the 2 low-density gratings is: wherein the grating strips of one low-density grating are just positioned at the position of 1/2 of the grating period distance of the other low-density grating; or,
n is equal to 3, 3 low-density gratings are defined to be a first low-density grating, a second low-density grating and a third low-density grating respectively, and in the laminating step, the lamination position relationship of the 3 low-density gratings is as follows: the grating strips of the second low-density grating are just positioned at the position of 1/3 of the grating period distance of the first low-density grating, and the grating strips of the third low-density grating are just positioned at the position of 2/3 of the grating period distance of the first low-density grating.
The method for manufacturing the high-density grating provided by the invention firstly adopts the traditional technology to manufacture the low-density grating with the grating width of a and the grating period distance of A, then stacks and fixes n low-density gratings together to manufacture the high-density grating with the grating width of a and the grating period distance of A, thereby realizing the manufacture of the grating with high density (the resolution capacity of nano level and the steep profile) and large size (millimeter level), and the manufacturing method is simple and easy to realize, is beneficial to the development of X-ray phase contrast imaging experiments and is beneficial to popularization and application.
Further, the invention also provides a high-density grating, which comprises n low-density gratings which are laminated and fixed together, wherein the grating stripe width of each low-density grating is a, the grating period distance is A, n is a natural number which is more than or equal to 2, and n is equal to a < A; the grating stripe width of the high-density grating is a, and the grating period distance is A.
Optionally, the grating bars of each low-density grating are alternately arranged along a straight line; and/or each low-density grating is manufactured by adopting a mechanical scribing method or a holographic photoetching method.
Optionally, the low-density gratings are stacked and fixed together in an adhesive mode; and/or the high-density grating further comprises a fixing frame for fixing the peripheral edge of each low-density grating and a pressing ring covered on the surface of the fixing frame for pressing each low-density grating.
Optionally, n is 2, the grating stripe width of the high-density grating is a, and the grating period distance is A/2; or,
n is 3, the grating stripe width of the high-density grating is a, and the grating period distance is A/3.
Optionally, the high-density grating comprises 2 low-density gratings bonded together, and the grating strips of one low-density grating are just positioned at a position with a grating period distance of 1/2 of that of the other low-density grating; or,
the high-density grating comprises 3 low-density gratings bonded together, wherein the 3 low-density gratings are defined as a first low-density grating, a second low-density grating and a third low-density grating respectively, grating strips of the second low-density grating are just positioned at the position of 1/3 of the grating period distance of the first low-density grating, and grating strips of the third low-density grating are just positioned at the position of 2/3 of the grating period distance of the first low-density grating.
The high-density grating provided by the invention has the advantages of high density, high precision, simple structure, easiness in processing and manufacturing, low processing cost and good application prospect.
Drawings
Fig. 1 is a schematic diagram of a manufacturing process of a high-density grating according to an embodiment of the invention.
Detailed Description
The present invention will be described in further detail with reference to the drawings and examples, in order to make the objects, technical solutions and advantages of the present invention more apparent. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention.
It will be understood that when an element is referred to as being "mounted" or "disposed" on another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present.
It should be noted that, in the following embodiments, terms of left, right, upper, lower, top, bottom, and the like are merely relative concepts or references to normal use states of the product, and should not be construed as limiting.
Example 1
As shown in fig. 1, a method for manufacturing a high-density grating 2 according to an embodiment of the present invention includes the following steps:
manufacturing a low-density grating 1, namely manufacturing n low-density gratings 1 with the grating strips 11 of which the width is a and the grating period distance is A, wherein the grating period distance A is specifically the center distance of two adjacent grating strips 11 on any low-density grating 1, n is a natural number which is more than or equal to 2, and n is equal to a < A;
and laminating, namely laminating and fixing n low-density gratings 1 together to obtain the high-density grating 2 with the width of the grating strip 11 being a and the grating period distance being A.
The high-density grating 2 has a resolution of nanometer level and a steep profile, and the low-density grating 1 has a resolution smaller than that of the high-density grating 2.
The manufacturing technology of the low-density grating 1 is mature and easy to manufacture, so the manufacturing method of the high-density grating 2 provided by the embodiment of the invention firstly manufactures the low-density grating 1, and then the low-density grating 1 is laminated to manufacture the high-density grating 2 meeting the requirements, and the manufacturing method is simple, easy to realize and easy to popularize and apply.
Preferably, in the laminating step, the low-density gratings 1 are laminated together in a manner that the grating strips 11 alternate with each other along a straight line, and each grating strip 11 of any two low-density gratings 1 is staggered, that is, one grating strip 11 of the other n-1 low-density gratings 1 is sandwiched between two adjacent grating strips 11 of any one low-density grating 1. Each low-density grating 1 is provided with a plurality of grating bars 11 which are arranged in a protruding and interval manner and a plurality of slits 12 which are respectively positioned between every two adjacent grating bars 11, and in the laminating step, the grating bars 11 of any low-density grating 1 are aligned and laminated with the slits 12 of other low-density gratings 1.
Preferably, each low-density grating 1 is made using a mechanical scoring method or a holographic lithography method. The mechanical ruling method is a method for ruling a grating by using a grating ruling machine; the holographic lithography method is to expose the photoresist using interference fringes of laser, and then transfer the photoresist pattern to the underlying substrate by etching or form a metal structure by micro-plating. The low-density grating 1 is manufactured by adopting a mechanical scribing method or a holographic photoetching method, so that the manufacturing difficulty is low and the realization is easy.
Preferably, in the lamination step, the low-density gratings 1 are laminated and fixed together by adhesion. Before laminating any two low-density gratings 1, at least one low-density grating 1 may be coated with a viscose solution, and then the two low-density gratings 1 are laminated and bonded together in a set positional relationship. The low-density gratings 1 are stacked and fixed together in an adhesive mode, and the operation mode is simple and easy to realize.
Preferably, a fixed cleaning step is further provided after the lamination step, and the fixed cleaning step is as follows: fixing the periphery of each low-density grating 1 by a fixing frame (not shown), adhering and covering a pressing ring (not shown) on the fixing frame, and washing off an adhesive layer in the middle of each low-density grating 1. The fixing frame is mainly used for fixing the periphery of each low-density grating 1, and the pressing ring is used for keeping the relative position of each low-density grating 1 unchanged. Here, in the lamination step, each low-density grating 1 is laminated and fixed together by an adhesive manner, which is easy for assembly operation, and is easy for alignment lamination in the lamination process of each low-density grating 1; after the laminating step is finished, fixing the periphery of the low-density gratings 1 by adopting a fixing frame, and covering a pressing ring on the fixing frame to keep the relative positions of the low-density gratings 1 unchanged, so that the locking and positioning of the low-density gratings 1 after lamination can be realized; finally, the adhesive layer is washed away, which is beneficial to improving the optical performance and accuracy of the finally formed high-density grating 2.
Preferably, the pressing ring and the fixing frame are bonded by cyano acrylate glue, the connection is reliable, the assembly is easy, and the assembly cost is low.
Preferably, n is equal to 2, and in the laminating step, the laminating position relationship of the 2 low-density gratings 1 is as follows: the grating strips 11 of one low-density grating 1 are just positioned at the position of 1/2 of the grating period distance of the other low-density grating 1, namely, the grating strips 11 of one low-density grating 1 are aligned with the middle positions of the slits 12 of the other low-density grating 1 and are overlapped together, so that the high-density grating 2 with the width of the grating strips 11 being a and the grating period distance being A/2 can be manufactured, and the high-density grating 2 has high density and high precision.
The high-density grating 2 provided by the embodiment comprises n low-density gratings 1 which are stacked and fixed together, wherein the width of grating strips 11 of each low-density grating 1 is a, the grating period distance is A, n is a natural number which is more than or equal to 2, and n is equal to a < A; the grating stripe 11 of the high-density grating 2 has a width a and a grating period distance a. The high-density grating 2 provided by the embodiment has the advantages of high density, high precision, simple structure, easiness in processing and manufacturing, low processing cost and good application prospect.
Preferably, the grating bars 11 of each low-density grating 1 are alternately arranged along a straight line, and each grating bar 11 of any two low-density gratings 1 is alternately arranged, that is, one grating bar 11 of the other n-1 low-density gratings 1 is sandwiched between two adjacent grating bars 11 of any one low-density grating 1. Each low-density grating 1 is provided with a plurality of grating bars 11 which are arranged in a protruding mode at intervals and a plurality of slits 12 which are respectively positioned between two adjacent grating bars 11; in each of the laminated low-density gratings 1, the grating bars 11 of any one of the low-density gratings 1 are laminated and fixed in the slits 12 of the other low-density gratings 1.
Preferably, each low-density grating 1 is made using a mechanical scoring method or a holographic lithography method. The low-density grating 1 is manufactured by adopting a mechanical scribing method or a holographic photoetching method, so that the manufacturing difficulty is low and the realization is easy.
Preferably, the low-density gratings 1 are stacked and fixed together by bonding; and/or, the high-density gratings 2 further comprise a fixing frame for fixing the peripheral edge of each low-density grating 1 and a pressing ring covered on the surface of the fixing frame for pressing each low-density grating 1.
Preferably, the pressing ring is fixed on the fixing frame in an adhesive mode, the connection is reliable, the assembly is easy, and the assembly cost is low.
Preferably, the pressing ring and the fixing frame are bonded by cyano acrylate glue, and the bonding is reliable and the cost is low.
Preferably, n is 2, the grating stripe 11 of the high density grating 2 has a width a and a grating period distance a/2. The high-density grating 2 provided by the embodiment is manufactured by laminating two low-density gratings 1 with the width of the grating strips 11 being a and the grating period distance being A, wherein the grating strips 11 are a and the grating period distance is A/2, so that the high-density and high-precision grating is manufactured, and the high-density and high-precision grating is easy to manufacture and form.
Preferably, the high-density grating 2 comprises 2 low-density gratings 1 bonded together, and the grating bars 11 of one low-density grating 1 are just at the position of the grating period distance 1/2 of the other low-density grating 1, i.e. the grating bars 11 of one low-density grating 1 are just overlapped at the middle position of the slits 12 of the other low-density grating 1.
The manufacturing method of the high-density grating 2 and the high-density grating 2 provided by the embodiment use the traditional method to produce the low-density grating 1, the low-density gratings 1 are bonded together according to a certain rule, the high-density grating 2 with the period being the period 1 of the original low-density grating 1 is produced, the precision of the high-density grating 2 is effectively improved, the processing difficulty of the high-density grating 2 is reduced, and the development of an X-ray phase contrast imaging experiment is facilitated.
Example two
The main difference between the manufacturing method of the high-density grating 2 provided in this embodiment and the first embodiment is that: as shown in fig. 1, in the first embodiment, n is equal to 2, and in the laminating step, the laminating positional relationship of the 2 low-density gratings 1 is: the grating strips 11 of one low-density grating 1 are just positioned at the position of 1/2 of the grating period distance of the other low-density grating 1; in this embodiment, n is equal to 3, and 3 low-density gratings are defined as a first low-density grating, a second low-density grating and a third low-density grating, where in the laminating step, the lamination positional relationship of the 3 low-density gratings is as follows: the grating strips of the second low-density grating are just positioned at the position of 1/3 of the grating period distance of the first low-density grating, and the grating strips of the third low-density grating are just positioned at the position of 2/3 of the grating period distance of the first low-density grating, namely: the grating strips of the second low-density grating are just overlapped at 1/3 position of the slits of the first low-density grating, and the grating strips of the third low-density grating are just overlapped at 2/3 position of the slits of the first low-density grating. The manufacturing method of the high-density grating provided by the embodiment and the manufacturing method of the high-density grating provided by the embodiment I are used for manufacturing the high-density gratings with two different density specifications, and in particular, the manufacturing method of the high-density grating provided by the embodiment I is mainly used for manufacturing the high-density grating with the grating strip width of a and the grating period distance of A/2; the method for manufacturing the high-density grating provided by the embodiment is mainly used for manufacturing the high-density grating with the grating strip width of a and the grating period distance of A/3. Although the embodiment and the first embodiment are used for manufacturing the high-density gratings with two different density specifications, the manufacturing principles of the two are consistent, namely, the low-density gratings are manufactured by adopting the traditional technology, and then the high-density gratings are manufactured by laminating the low-density gratings, so that the manufacturing method for manufacturing the high-density gratings, which is provided by the embodiment, is used for manufacturing the high-density gratings with the grating strip width of a and the grating period distance of A/3, and has the advantages of simple manufacturing method, easiness in realization and easiness in popularization and application.
The main difference between the high-density grating provided in this embodiment and the first embodiment is that: as shown in fig. 1, in the first embodiment, n is 2, the grating strips 11 of the high-density grating 2 have a width a and a grating period distance a/2, the high-density grating 2 includes 2 low-density gratings 1 bonded together, and the grating strips 11 of one low-density grating 1 are just located at the position of 1/2 of the grating period distance of the other low-density grating 1; in this embodiment, n is 3, the grating stripe width of the high-density grating is a, the grating period distance is a/3, the high-density grating includes 3 low-density gratings bonded together, the 3 low-density gratings are defined as a first low-density grating, a second low-density grating and a third low-density grating, where the grating stripe of the second low-density grating is just located at the position of 1/3 of the grating period distance of the first low-density grating, and the grating stripe of the third low-density grating is just located at the position of 2/3 of the grating period distance of the first low-density grating, that is, the high-density grating provided in this embodiment and the high-density grating provided in the first embodiment are two high-density gratings with different density specifications.
In addition to the above-mentioned differences, the method for manufacturing the high-density grating and other arrangement modes of the high-density grating according to the present embodiment can be optimized according to the first embodiment, and will not be described in detail herein.
The foregoing description of the preferred embodiments of the invention is not intended to be limiting, but rather is intended to cover all modifications, equivalents, or alternatives falling within the spirit and principles of the invention.
Claims (4)
1. The manufacturing method of the high-density grating is characterized by comprising the following steps of: the method comprises the following steps:
manufacturing a low-density grating, namely manufacturing n low-density gratings with grating strip widths of a and grating period distances of A, wherein n is a natural number greater than or equal to 2, and n is a < A;
laminating, namely laminating and fixing n low-density gratings together to manufacture a high-density grating with a grating strip width of a and a grating period distance of A/n;
n is equal to 2, and in the laminating step, the laminating position relationship of the 2 low-density gratings is as follows: wherein the grating strips of one low-density grating are just positioned at the position of 1/2 of the grating period distance of the other low-density grating; or,
n is equal to 3, 3 low-density gratings are defined to be a first low-density grating, a second low-density grating and a third low-density grating respectively, and in the laminating step, the lamination position relationship of the 3 low-density gratings is as follows: the grating strips of the second low-density grating are just positioned at the position of 1/3 of the grating period distance of the first low-density grating, and the grating strips of the third low-density grating are just positioned at the position of 2/3 of the grating period distance of the first low-density grating.
2. The method for manufacturing a high-density grating according to claim 1, wherein: in the laminating step, the low-density gratings are laminated together in a mode that grating strips alternate with each other along a straight line; and/or the number of the groups of groups,
each low-density grating is manufactured by adopting a mechanical scribing method or a holographic photoetching method.
3. A method of fabricating a high density grating as claimed in claim 1 or 2, wherein: in the laminating step, the low-density gratings are laminated and fixed together in an adhesive mode.
4. A method of fabricating a high density grating as defined in claim 3, wherein: a fixed cleaning step is further arranged after the laminating step, and the fixed cleaning step is as follows: fixing the periphery of each low-density grating by adopting a fixing frame, adhering and covering a pressing ring on the fixing frame, and washing off an adhesive layer in the middle of each low-density grating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710278740.5A CN107093487B (en) | 2017-04-25 | 2017-04-25 | Manufacturing method of high-density grating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710278740.5A CN107093487B (en) | 2017-04-25 | 2017-04-25 | Manufacturing method of high-density grating |
Publications (2)
Publication Number | Publication Date |
---|---|
CN107093487A CN107093487A (en) | 2017-08-25 |
CN107093487B true CN107093487B (en) | 2023-06-27 |
Family
ID=59638037
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710278740.5A Active CN107093487B (en) | 2017-04-25 | 2017-04-25 | Manufacturing method of high-density grating |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN107093487B (en) |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07151910A (en) * | 1993-11-29 | 1995-06-16 | Ricoh Co Ltd | Method for exposing diffraction grating |
WO2007108723A1 (en) * | 2006-03-20 | 2007-09-27 | Parmenov, Vladimir Vasilevith | Wavelength-division multiplexing device (variants) and an optical automatic telephone system |
CN101261331A (en) * | 2008-04-21 | 2008-09-10 | 南京大学 | Self-supporting transmission metal grating based on nanometer stamping technology and its preparation method |
JP2011075850A (en) * | 2009-09-30 | 2011-04-14 | Japan Atomic Energy Agency | Multilayer film laminar diffraction grating and spectrometer |
CN102540298A (en) * | 2012-02-01 | 2012-07-04 | 中国科学技术大学 | Soft X-ray double-frequency gratings and manufacture method thereof |
CN105139913A (en) * | 2015-09-08 | 2015-12-09 | 清华大学 | Grating and radiation imaging device |
CN105304130A (en) * | 2014-07-29 | 2016-02-03 | 华邦电子股份有限公司 | Flash memory apparatus and method for performing synchronous operation |
CN206907499U (en) * | 2017-04-25 | 2018-01-19 | 中国科学院深圳先进技术研究院 | High dencity grating |
-
2017
- 2017-04-25 CN CN201710278740.5A patent/CN107093487B/en active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07151910A (en) * | 1993-11-29 | 1995-06-16 | Ricoh Co Ltd | Method for exposing diffraction grating |
WO2007108723A1 (en) * | 2006-03-20 | 2007-09-27 | Parmenov, Vladimir Vasilevith | Wavelength-division multiplexing device (variants) and an optical automatic telephone system |
CN101261331A (en) * | 2008-04-21 | 2008-09-10 | 南京大学 | Self-supporting transmission metal grating based on nanometer stamping technology and its preparation method |
JP2011075850A (en) * | 2009-09-30 | 2011-04-14 | Japan Atomic Energy Agency | Multilayer film laminar diffraction grating and spectrometer |
CN102540298A (en) * | 2012-02-01 | 2012-07-04 | 中国科学技术大学 | Soft X-ray double-frequency gratings and manufacture method thereof |
CN105304130A (en) * | 2014-07-29 | 2016-02-03 | 华邦电子股份有限公司 | Flash memory apparatus and method for performing synchronous operation |
CN105139913A (en) * | 2015-09-08 | 2015-12-09 | 清华大学 | Grating and radiation imaging device |
CN206907499U (en) * | 2017-04-25 | 2018-01-19 | 中国科学院深圳先进技术研究院 | High dencity grating |
Also Published As
Publication number | Publication date |
---|---|
CN107093487A (en) | 2017-08-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI510993B (en) | Touch screen sensing module, manufacturing method thereof and display device | |
KR101536573B1 (en) | Double-layered transparent conductive film and manufacturing method thereof | |
WO2019242280A1 (en) | Mask plate, exposure method, and touch panel | |
KR101556314B1 (en) | Bridge structure in conductive mesh and method for manufacturing the same | |
WO2017145925A1 (en) | Display panel production method | |
CN103885118A (en) | Two-dimensional V groove-free fiber array apparatus and manufacturing method thereof | |
CN104620205A (en) | Touch panel, and touch panel production method | |
CN104865744A (en) | 3D display device and manufacturing method thereof | |
CN102122102B (en) | Motherboard and substrate of LCD (Liquid Crystal Display) panel and manufacture method of substrate | |
CN110515485B (en) | Method for preparing large-size touch screen functional sheet by using small screen printing plate | |
CN107093487B (en) | Manufacturing method of high-density grating | |
CN104503133A (en) | Liquid crystal display panel | |
TW201520837A (en) | Touch panel and manufacturing method of the same | |
WO2020253772A1 (en) | Electromagnetic shielding film | |
CN107340651B (en) | Frame glue coating method | |
CN206907499U (en) | High dencity grating | |
TW201635512A (en) | Method of making a current collecting grid for solar cells and thin film organic solar cell | |
CN203275838U (en) | Optical film and backlight source | |
CN203366779U (en) | Conductive film | |
CN111667941A (en) | Integrated composite structure transparent conductive film and preparation method thereof | |
CN111665974A (en) | Flexible touch display screen | |
CN210142513U (en) | Ultrathin composite transparent conductive film | |
CN210379763U (en) | Can improve BAR strip structure of quantity of putting | |
US9313896B2 (en) | Double-layered transparent conductive film and manufacturing method thereof | |
CN103700708B (en) | A kind of thin film transistor (TFT), its preparation method, array base palte and display device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |