CN107068861B - Electroluminescent device and its preparation method and application - Google Patents
Electroluminescent device and its preparation method and application Download PDFInfo
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- CN107068861B CN107068861B CN201610565876.XA CN201610565876A CN107068861B CN 107068861 B CN107068861 B CN 107068861B CN 201610565876 A CN201610565876 A CN 201610565876A CN 107068861 B CN107068861 B CN 107068861B
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/821—Patterning of a layer by embossing, e.g. stamping to form trenches in an insulating layer
Abstract
The present invention relates to a kind of electroluminescent device and its preparation method and application, preparation method includes the following steps: to obtain underlay substrate；Impression block is obtained, which is provided with multiple protrusions；One layer of bank thin-film material is coated on the underlay substrate, using impression block imprinted on bank thin-film material, so that bank thin-film material is formed multiple recess portions to match with the protrusion, then remove the bank thin-film material of the concave bottom, forms pixel defining layer；Functional layer material is filled in the recess portion with inkjet printing or coating process, is dried in vacuo, then coining manipulation is carried out using the impression block, obtains functional layer after baking is dry；It repeats the above steps and prepares multiple functional layers；Another electrode in a pair of electrodes is prepared to get electroluminescent device.Method of the invention can effectively solve the uniformity of film problem faced in printed electroluminescent device processing procedure, obtain smooth film, promote the service life of electroluminescent device.
Description
Technical field
The present invention relates to field of display technology, more particularly to electro-luminance device displays part and preparation method thereof and answer
With.
Background technique
At present in the manufacture craft of printed form electroluminescent device display panel, one layer of material for being used to define pixel must be used
Material, the pixel defining layer are commonly known as bank.The process flow being widely used at present is to use InkJet printing processes by ink
When inserting each pixel region, ink is sprawled in the region that bank is surrounded；Then, it is carried out under certain temperature (such as low temperature)
Vacuum drying, by parameters such as the rate of volatilization of strict control solvent, vapor pressure solvents with guarantee as far as possible different zones in pixel,
It is obtained between different pixels uniform dry；Finally, drying film thoroughly by baking.But using existing method, set
Standby and process conditions are still difficult to ensure inside pixel and obtain uniform film between different pixels, cause to use
The service life for the device that inkjet printing mode obtains seriously is lower than the device lifetime obtained using spin coating mode, seriously constrains printing
Type electroluminescent device technique is applied to actual production.
Cause film non-uniform many because being known as, for example, ink the wellability of substrate surface, substrate condition it is uniform
The crystallization of dissolubility difference, material of the rate of volatilization difference, material of mixed solvent in different solvents ingredient is inclined in property, ink
To, the shape of material particles and coffee ring effect etc..It needs to carry out strict control to Multiple factors simultaneously, after capable of just promoting drying
Film reach the more uniform degree of thickness.The sensibility and multifactor complexity of ink dried film forming, so that
Even if each factor has obtained good control, existing drying and forming-film technique is still highly prone to the small of any factor
Disturbance or defect and cause the uniformity of film to go wrong.Therefore, it is necessary to which it is equal to obtain to develop a kind of new preparation process
The film of even densification promotes the uniformity and the service life of printed electroluminescent device.
Summary of the invention
Based on this, the object of the present invention is to provide a kind of preparation sides of electroluminescent device for enabling to film to planarize
Method.
Specific technical solution is as follows:
A kind of preparation method of electroluminescent device, the electroluminescent device include a pair of electrodes and are arranged in the electricity
Multiple functional layers between pole, include the following steps:
S1, the underlay substrate comprising an electrode in tft array and a pair of electrodes is obtained；
S2, impression block is obtained, the impression block is equipped with multiple protrusions；
S3, one layer of pixel defining layer thin-film material is coated on the underlay substrate, by the impression block imprinted on institute
State on pixel defining layer thin-film material, make the pixel defining layer thin-film material formed it is multiple match with the protrusion it is recessed
Portion, each corresponding pixel of the recess portion, removes the pixel defining layer thin-film material of the concave bottom, forms pixel
Define layer；
S4, the thin-film material for filling the functional layer in the recess portion with inkjet printing or coating process, vacuum drying, so
Coining manipulation is carried out using the impression block afterwards, forms functional layer after baking is dry；
S5, step S4 is repeated, prepares multiple functional layers；
Another electrode in S6, formation a pair of electrodes is to get the electroluminescent device.
In wherein some embodiments, the surface roughness of the impression block is less than 5nm.
In wherein some embodiments, the surface roughness of the impression block is less than 1nm.
In wherein some embodiments, the impression block is plane or curved surface, and material is metal, macromolecule resin or nothing
Machine is one or more of nonmetallic.
In wherein some embodiments, step S4, in S5, the pressure of coining manipulation is 0-200bar (preferably 10-
200bar)。
It is before coining manipulation that the functional layer film material is dry to rear step S4, in S5 in wherein some embodiments
Film volumetric variation is no more than 5% caused by the continuous volatilization because of solvent.
In wherein some embodiments, pixel defining layer thin-film material is selected from polyimides and its modified polymer material.
It is a further object of the present invention to provide a kind of electroluminescent devices.
Specific technical solution is as follows:
The electroluminescent device that above-mentioned preparation method is prepared.
It is a further object of the present invention to provide a kind of display panels, include above-mentioned electroluminescent device.
It is a further object of the present invention to provide a kind of display devices, include above-mentioned display panel.
Beneficial effects of the present invention:
The present invention uneven, service life bad problem for the film in solwution method printed electroluminescent device process, with coining
Mode to electroluminescent device film carry out planarizing process, to improve the uniformity of film and longevity in electroluminescent device
Life；In addition, using method and technique of the invention, the inclination angle that can be improved between pixel defining layer surface and substrate (is passed through in the industry
The frequently referred to angle taper) without the planarization of influence film, be conducive to the resolution ratio for improving display.
(1) method of the invention can effectively solve the uniformity of film faced in printed electroluminescent device processing procedure and ask
Topic, obtains smooth film, promotes the service life of electroluminescent device；
(2) method of the invention is a kind of quick film planarization process, can improve production efficiency, be conducive to final reality
The production of existing roll-to-roll (roll to roll).
Detailed description of the invention
Fig. 1 is the state diagram in embodiment 1 before hole injection layer coining；
Fig. 2 is the state diagram in embodiment 1 after hole injection layer coining.
Description of symbols:
10, substrate (including substrate, TFT backplate)；11, anode layer (pixel electrode)；12, pixel defining layer (bank)；
13, impression block；14, the electroluminescent device material film of out-of-flatness；15, the electroluminescent device material film after flattening.
Specific embodiment
Below in conjunction with specific embodiments and drawings, a specific embodiment of the invention is further elaborated.With
Lower explanation is only used for the description present invention, makes it be easy to be understood by reader, but be not intended to limit practical range of the invention.
Embodiment 1 (impression block is plane):
A kind of preparation method of printed form electroluminescent device of the present embodiment, step include:
(1) impression block preparation can be equipped with one or more identical in the production line in a planar structure
Impression block is carried out planarizing processing respectively with the functional layer material film to different layers and avoids cross contamination；
(2) underlay substrate is obtained, prepares anode layer on the underlay substrate according to a conventional method, in anode layer (pixel electricity
Pole) on one layer of bank thin-film material of coating process coating (specially polyimide macromolecule), by the impression block pressure
It is printed on the bank thin-film material, so that the bank thin-film material is formed multiple recess portions to match with the protrusion, each
The corresponding pixel of the recess portion, the bank thin-film material of the concave bottom is removed using photoetching technique, forms pixel
Define layer；
(3) (such as empty with the first layer film of inkjet printing or coating process coating electroluminescent device in the recess portion
Layer material is injected in cave, as shown in Figure 1), when that the solvent in film is largely evaporated completely is (such as thin caused by the subsequent volatilization because of solvent
When membrane volume variation is no more than 5%), film is flattened using impression block, obtains thickness, the uniform hole of Density Distribution
Implanted layer (as shown in Figure 2)；
(4) drying process under vacuum and heating condition is carried out to the first layer film (hole injection layer) of acquisition, makes the
Thin film is sufficiently dry；
(5) on the first layer film, above (3) are repeated, (4) step is sequentially prepared the other layer thin of electroluminescent device
Film, such as hole transmission layer (HTL), luminescent layer (EML) etc.；
(6) when necessary, the remaining film of electroluminescent device, such as electronics note are prepared using vacuum evaporation or sputtering technology
Enter layer (EIL), cathode etc. to get the electroluminescent device.
Comparative example 1: referring to the step in above embodiments 1, but and the device that impression block is planarized is not used.
The device of device and comparative example 1 in embodiment 1 is subjected to the service life relatively.The LT50 service life of comparative example 1
(50% time of the brightness decay to 1000 nit of original intensity) is normalized to 1, measures the LT50 longevity of the device in embodiment 1
Life reaches 1.8, i.e. the device lifetime of embodiment 1 has reached 1.8 times of the device lifetime of comparative example 1.
Embodiment 2 (impression block is curved surface):
A kind of preparation method of printed form electroluminescent device of the present embodiment, step include:
(1) impression block is fixed or is directly processed in roll-to-roll (roll to roll, hereinafter abbreviated as R2R) equipment
On one or more rollers, period of pattern etc., parameters were set according to actual substrate size on the diameter of roller, impression block
It is fixed, one or more identical impression block rollers can be installed in the production line, it is thin with the functional layer material to different layers
Film carries out planarizing processing respectively and avoids cross contamination；
(2) underlay substrate (flexible base board) is obtained, makes sun on the underlay substrate (flexible base board) according to a conventional method
Pole layer (pixel electrode)；With one layer of bank thin-film material of R2R coating process coating, (specially polyimide is high on the anode layer
Molecular material), by the impression block imprinted on the bank thin-film material, make the bank thin-film material formed it is multiple with
The recess portion that the protrusion matches, each corresponding pixel of the recess portion, removes the concave bottom using photoetching technique
The bank thin-film material forms pixel defining layer；
(3) in the recess portion with the first layer membrane materials (example of inkjet printing or coating process coating electroluminescent device
Such as hole injection layer (HIL) material), when that the solvent in film is largely evaporated completely is (such as thin caused by the subsequent volatilization because of solvent
When membrane volume variation is no more than 5%), the roller using surface with impression block is to the electroluminescent device material in the recess portion
Material film is flattened, and thickness, the uniform hole injection layer of Density Distribution are obtained；
(4) drying process under vacuum and heating condition is carried out to the first layer film of acquisition, keeps the first layer film abundant
It is dry；
(5) on the first layer film, above (3) are repeated, (4) step is sequentially prepared the other layer thin of electroluminescent device
Film, such as hole transmission layer (HTL) film, luminescent layer (EML) film etc.；
(6) when necessary, the remaining film of electroluminescent device, such as electronics note are prepared using vacuum evaporation or sputtering technology
Enter layer (EIL), cathode etc. to get the electroluminescent device.
Comparative example 2: referring to the step in above embodiments 2, but and the device that impression block is planarized is not used.
The device of device and comparative example 2 in embodiment 2 is subjected to the service life relatively.The LT50 service life of comparative example 2
(50% time of the brightness decay to 1000 nit of original intensity) is normalized to 1, measures the LT50 longevity of the device in embodiment 2
Life reaches 1.5, i.e. the device lifetime of embodiment 2 has reached 1.5 times of the device lifetime of comparative example 2.
Each technical characteristic of embodiment described above can be combined arbitrarily, for simplicity of description, not to above-mentioned reality
It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, all should be considered as described in this specification.
The embodiments described above only express several embodiments of the present invention, and the description thereof is more specific and detailed, but simultaneously
It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art
It says, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to protection of the invention
Range.Therefore, the scope of protection of the patent of the invention shall be subject to the appended claims.
Claims (9)
1. a kind of preparation method of electroluminescent device, the electroluminescent device includes a pair of electrodes and is arranged the pair of
Multiple functional layers between electrode, which comprises the steps of:
S1, the underlay substrate comprising an electrode in tft array and a pair of electrodes is obtained；
S2, impression block is obtained, the impression block is equipped with multiple protrusions；
S3, one layer of pixel defining layer thin-film material is coated on the underlay substrate, by the impression block imprinted on the picture
Element defines on layer membrane materials, so that the pixel defining layer thin-film material is formed multiple recess portions to match with the protrusion, often
A corresponding pixel of the recess portion, removes the pixel defining layer thin-film material of the concave bottom, forms pixel and define
Layer；
S4, the thin-film material for filling the functional layer in the recess portion with inkjet printing or coating process, vacuum drying, then make
Coining manipulation is carried out with the impression block, the pressure of coining manipulation is greater than zero, forms functional layer after baking is dry；
S5, step S4 is repeated, prepares multiple functional layers；
Another electrode in S6, formation a pair of electrodes is to get the electroluminescent device；
Step S4, in S5, by film caused by functional layer film material drying to the subsequent volatilization because of solvent before coining manipulation
Volume change is no more than 5%.
2. the preparation method of electroluminescent device according to claim 1, which is characterized in that the surface of the impression block
Roughness is less than 5nm.
3. the preparation method of electroluminescent device according to claim 1, which is characterized in that the surface of the impression block
Roughness is less than 1nm.
4. the preparation method of electroluminescent device according to claim 1-3, which is characterized in that the making ide
Plate is plane or curved surface, and material is one of metal, macromolecule resin or inorganic non-metallic or a variety of.
5. the preparation method of electroluminescent device according to claim 1-3, which is characterized in that step S4, S5
In, the pressure of coining manipulation is greater than 0, is less than or equal to 200bar.
6. the preparation method of electroluminescent device according to claim 1-3, which is characterized in that pixel defining layer
Thin-film material is selected from polyimides or polyimide modified high molecular material.
7. the electroluminescent device that preparation method described in any one of claims 1-6 is prepared.
8. a kind of display panel, which is characterized in that include electroluminescent device as claimed in claim 7.
9. a kind of display device, which is characterized in that include display panel according to any one of claims 8.
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Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107994134B (en) * | 2017-11-09 | 2020-01-03 | 武汉华星光电半导体显示技术有限公司 | Flexible substrate and preparation method thereof |
| CN108123070A (en) * | 2017-12-18 | 2018-06-05 | 京东方科技集团股份有限公司 | A kind of pressuring flat device, display base plate and preparation method thereof |
| CN108922908A (en) * | 2018-07-26 | 2018-11-30 | 京东方科技集团股份有限公司 | A kind of pixel defining layer, preparation method and display device |
| CN109301093A (en) * | 2018-09-30 | 2019-02-01 | 华南理工大学 | A kind of preparation method of conduction light-permeable perovskite quantum dot film |
| KR102613734B1 (en) * | 2018-12-24 | 2023-12-13 | 엘지디스플레이 주식회사 | Organic light emitting display device |
| CN109728165B (en) * | 2019-01-04 | 2021-09-21 | 京东方科技集团股份有限公司 | Display back plate, manufacturing method thereof and display device |
| CN112319081A (en) * | 2019-12-12 | 2021-02-05 | 广东聚华印刷显示技术有限公司 | Ink jet printing method, ink jet printing apparatus, and light emitting device |
| CN110993834B (en) * | 2019-12-17 | 2022-08-30 | 京东方科技集团股份有限公司 | OLED display substrate, manufacturing method thereof and display device |
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| CN105070651A (en) * | 2015-08-17 | 2015-11-18 | Tcl集团股份有限公司 | Method for manufacturing pixel defining layer structure and OLED device |
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| JP5702625B2 (en) * | 2011-02-22 | 2015-04-15 | ソニー株式会社 | Image sensor, image sensor manufacturing method, pixel design method, and electronic device |
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| CN1210355A (en) * | 1997-05-22 | 1999-03-10 | 三星电管株式会社 | Method and apparatus for manufacturing partition wall of plasma display device |
| CN101455121A (en) * | 2006-06-14 | 2009-06-10 | 株式会社半导体能源研究所 | Method for manufacturing semiconductor device |
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